USPTO Art Unit 1716 Prosecution Statistics

Art Unit Information

Art Unit: 1716
Group: 1710
Tech Center: 1700
Total Cases: 10,732
Last Active: February 2025

Recent Applications

Detailed information about the 100 most recent patent applications.

Application NumberTitleFiling DateDisposal DateDispositionTime (months)Office ActionsRestrictionsInterviewAppeal
19055567DEVICE AND METHOD FOR PRODUCING THIN-FILM CATALYSTFebruary 2025April 2025Allow200YesNo
18980720ROTATABLE ELECTROCHEMICAL ETCHING CELLDecember 2024July 2025Allow711YesNo
18850990INTEGRATION OF DRY DEVELOPMENT AND ETCH PROCESSES FOR EUV PATTERNING IN A SINGLE PROCESS CHAMBERSeptember 2024April 2025Allow600NoNo
18826224PROCESSING AND RECYCLING METHOD AND PRODUCT OF ULTRATHIN LITHIUM FOILSeptember 2024November 2024Allow200NoNo
18805861SUBSTRATE STRUCTURING METHODAugust 2024October 2024Allow200NoNo
18804455METHOD FOR FORMING PATTERNS ON A SUBSTRATEAugust 2024December 2024Allow400YesNo
18750473METHOD OF PERFORMING MAINTENANCE ON SUBSTRATE PROCESSING APPARATUSJune 2024February 2025Allow710NoNo
18740531GAS TUBE, GAS SUPPLY SYSTEM AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE USING THE SAMEJune 2024April 2025Allow1010NoNo
18740411SOLIDS VAPORIZERJune 2024March 2025Allow910NoNo
18679784APPARATUS FOR AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICEMay 2024March 2025Allow900YesNo
18679771INTEGRATED SHOWERHEAD WITH THERMAL CONTROL FOR DELIVERING RADICAL AND PRECURSOR GAS TO A DOWNSTREAM CHAMBER TO ENABLE REMOTE PLASMA FILM DEPOSITIONMay 2024January 2025Allow800YesNo
18673409CHEMICAL LIQUID AND CHEMICAL LIQUID STORAGE BODYMay 2024July 2025Allow1310NoNo
18671779SURFACE TREATMENT OF A SULFIDE GLASS SOLID ELECTROLYTE LAYERMay 2024April 2025Allow1110NoNo
18670879POLISHING COMPOSITIONS AND METHODS OF USING THE SAMEMay 2024February 2025Allow900NoNo
18671508SUBSTRATE PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICEMay 2024March 2025Abandon910NoNo
18670641ION BEAM ETCHING WITH SIDEWALL CLEANINGMay 2024January 2025Allow800NoNo
18664004WAFER TREATMENT DEVICEMay 2024June 2025Allow1310NoNo
18647944SEMICONDUCTOR DEVICE FABRICATION APPARATUSApril 2024August 2024Allow300YesNo
18631589CMP System and Method of UseApril 2024May 2025Allow1300YesNo
18632060APPARATUS AND METHOD FOR PLASMA ETCHINGApril 2024November 2024Allow800YesNo
18630603SYSTEMS AND METHODS FOR METASTABLE ACTIVATED RADICAL SELECTIVE STRIP AND ETCH USING DUAL PLENUM SHOWERHEADApril 2024December 2024Allow820YesNo
18630683SYSTEMS AND METHODS FOR METASTABLE ACTIVATED RADICAL SELECTIVE STRIP AND ETCH USING DUAL PLENUM SHOWERHEADApril 2024November 2024Allow820YesNo
18699313VAPOR DEPOSITION DEVICE CAPABLE OF RECIPROCATING ROTATION AND LIFTINGApril 2024November 2024Allow710NoNo
18626719SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEMApril 2024February 2025Allow1000NoNo
18612807TWO-COLOR SELF-ALIGNED DOUBLE PATTERNING (SADP) TO YIELD STATIC RANDOM ACCESS MEMORY (SRAM) AND DENSE LOGICMarch 2024February 2025Allow1100NoNo
18693438METHOD FOR MANUFACTURING A MOULD FOR NANOPRINTING AND ASSOCIATED MOULDMarch 2024October 2024Allow701NoNo
18604257CAPACITIVE SENSOR FOR MONITORING GAS CONCENTRATIONMarch 2024October 2024Allow700YesNo
18599767Processing Chamber With Multiple Plasma UnitsMarch 2024October 2024Allow700NoNo
18589252SHOWERHEAD DEVICE FOR SEMICONDUCTOR PROCESSING SYSTEMFebruary 2024October 2024Allow800YesNo
18582329SUBSTRATE SUPPORT AND PLASMA PROCESSING APPARATUSFebruary 2024January 2025Allow1111YesNo
18442865APPARATUS AND ASSOCIATED ACCESSORIES, METHODS AND USES FOR VISUALISING A PRINT ON AN OBJECTFebruary 2024May 2025Allow1510NoNo
18438148MONOLITHIC PLATENFebruary 2024January 2025Allow1210NoNo
18435545PECVD APPARATUSFebruary 2024July 2024Allow610NoNo
18427348SPATIALLY TUNABLE DEPOSITION TO COMPENSATE WITHIN WAFER DIFFERENTIAL BOWJanuary 2024April 2025Allow1410YesNo
18419890SUBSTRATE PROCESSING APPARATUS, METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND RECORDING MEDIUMJanuary 2024September 2024Allow800YesNo
18419389MONOLITHIC MODULAR MICROWAVE SOURCE WITH INTEGRATED PROCESS GAS DISTRIBUTIONJanuary 2024September 2024Allow800YesNo
18417567REMOTE LASER-BASED SAMPLE HEATER WITH SAMPLE EXCHANGE TURRETJanuary 2024June 2025Allow1731YesNo
18412399METHOD AND APPARATUS FOR INSITU ADJUSTMENT OF WAFER SLIP DETECTION DURING WORK PIECE POLISHINGJanuary 2024April 2025Allow1510NoNo
18400180PROCESSING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, PROCESSING APPARATUS, AND RECORDING MEDIUMDecember 2023February 2025Allow1310NoNo
18397941PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHODDecember 2023April 2025Allow1611YesNo
18392294PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHODDecember 2023November 2024Allow1011NoNo
18392987Microneedle Fabrication and Device ImplantationDecember 2023September 2024Allow900NoNo
18537574METHOD FOR CMP TEMPERATURE CONTROLDecember 2023September 2024Allow920YesNo
18534182MULTI-PLATE ELECTROSTATIC CHUCKS WITH CERAMIC BASEPLATESDecember 2023June 2025Allow1811YesNo
18567025DEVICE AND METHOD FOR PRODUCING THIN-FILM CATALYSTDecember 2023June 2025Abandon1821YesNo
18529763POLISHING COMPOSITIONDecember 2023September 2024Allow920YesNo
18529465POLISHING METHOD AND POLISHING COMPOSITIONDecember 2023June 2024Allow610NoNo
18527999SUBSTRATE PROCESSING APPARATUSDecember 2023May 2024Allow510YesNo
18526215HIGH POWER CABLE FOR HEATED COMPONENTS IN RF ENVIRONMENTDecember 2023September 2024Allow1000YesNo
18526472SUBSTRATE PROCESSING APPARATUS, PROCESSING METHOD, AND NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUMDecember 2023March 2025Allow1600YesNo
18526411SYSTEMS AND METHODS FOR PULSE WIDTH MODULATED DOSE CONTROLDecember 2023September 2024Allow1000YesNo
18525473Semiconductor Device and MethodNovember 2023February 2025Allow1410NoNo
18525005MASK DEVICE AND EVAPORATION DEVICENovember 2023March 2025Allow1511YesNo
18525636FORMULATIONS TO SELECTIVELY ETCH SILICON-GERMANIUM RELATIVE TO SILICONNovember 2023January 2025Allow1410NoNo
18522090CAPACITANCE MEASUREMENT WITHOUT DISCONNECTING FROM HIGH POWER CIRCUITNovember 2023April 2025Allow1700NoNo
18517341SUBSTRATE PROCESSING METHODNovember 2023December 2024Allow1310NoNo
18516991SHOWER HEAD STRUCTURE AND PLASMA PROCESSING APPARATUS USING THE SAMENovember 2023September 2024Allow1000YesNo
18516087PRECURSOR CONTAINERNovember 2023September 2024Allow1000YesNo
18514494SUBSTRATE PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICENovember 2023September 2024Allow1000YesNo
18505043ALTERNATING ETCH AND PASSIVATION PROCESSNovember 2023January 2025Allow1420NoNo
18387132CRUCIBLE COVER FOR COATING WITH AN ELECTRON BEAM SOURCENovember 2023November 2024Allow1200YesNo
18499667VACUUM PROCESSING APPARATUS AND OXIDIZING GAS REMOVAL METHODNovember 2023May 2025Allow1821YesNo
18498084Ceramic SusceptorOctober 2023January 2025Allow1520YesNo
18495452APPARATUS TO CONTROL ION ENERGYOctober 2023February 2025Allow1521YesNo
18383943PLASMA SOURCE AND METHOD FOR REMOVING MATERIALS FROM SUBSTRATES UTILIZING PRESSURE WAVESOctober 2023February 2025Allow1620NoNo
18493618SUBSTRATE PROCESSING DEVICE AND SUBSTRATE PROCESSING METHODOctober 2023June 2024Allow700YesNo
18382062PLASMA PROCESSING APPARATUSOctober 2023July 2025Abandon2020YesNo
18381192METHOD, DEVICE, AND SYSTEM FOR MANUFACTURING COMPOSITE METAL FOILOctober 2023October 2024Abandon1220YesNo
18286306SURFACE TREATMENT METHOD, DRY ETCHING METHOD, CLEANING METHOD, SEMICONDUCTOR DEVICE MANUFACTURING METHOD, AND ETCHING DEVICEOctober 2023March 2025Allow1700NoNo
18377371EDGE SEAL FOR LOWER ELECTRODE ASSEMBLYOctober 2023March 2025Allow1711YesNo
18375207SELECTIVE ETCHING OF SILICON-AND-GERMANIUM-CONTAINING MATERIALS WITH INCREASED SURFACE PURITIESSeptember 2023June 2025Allow2110NoNo
18475355ATOMIC LAYER DEPOSITION APPARATUSSeptember 2023November 2023Allow200NoNo
18475006METHODS AND APPARATUS FOR CONTROLLING PLASMA IN A PLASMA PROCESSING SYSTEMSeptember 2023April 2025Allow1811YesNo
18372123PE-CVD APPARATUS AND METHODSeptember 2023April 2024Allow700YesNo
18370750CONTINUOUS LINER FOR USE IN A PROCESSING CHAMBERSeptember 2023July 2024Allow1010YesNo
18282775PLASMA PROCESSING APPARATUS, AND PLASMA PROCESSING METHODSeptember 2023June 2025Allow2100NoNo
18368285DIFFERENTIAL CAPACITIVE SENSOR FOR IN-SITU FILM THICKNESS AND DIELECTRIC CONSTANT MEASUREMENTSeptember 2023September 2024Allow1200NoNo
18464805DYNAMIC MULTI ZONE FLOW CONTROL FOR A PROCESSING SYSTEMSeptember 2023June 2024Allow901NoNo
18242598CHEMICAL SOURCE VESSEL WITH DIP TUBESeptember 2023January 2025Allow1620YesNo
18239856SUBSTRATE PROCESSING DEVICEAugust 2023August 2024Allow1110NoNo
18457061UNIFORM IN SITU CLEANING AND DEPOSITIONAugust 2023March 2025Allow1820YesNo
18454350Device for the Thermal Processing of Metallurgy PartsAugust 2023February 2025Abandon1821NoNo
18453843Etch Selectivity Modulation by Fluorocarbon TreatmentAugust 2023June 2025Allow2200NoNo
18547343METHOD FOR ETCHING AT LEAST ONE SURFACE OF A PLASTIC SUBSTRATEAugust 2023June 2025Allow2200NoNo
18452918SUBSTRATE TREATING METHOD AND SUBSTRATE TREATING APPARATUSAugust 2023January 2025Allow1710YesNo
18447943Plasma-Assisted Etching Of Metal OxidesAugust 2023August 2024Allow1220NoNo
18446816HIGH-THROUGHPUT, PRECISE SEMICONDUCTOR SLURRY BLENDING TOOLAugust 2023February 2025Allow1910YesNo
18275266POLISHING COMPOSITIONAugust 2023July 2024Abandon1110NoNo
18275285POLISHING METHOD AND POLISHING COMPOSITIONAugust 2023December 2024Abandon1710NoNo
18362463Method of Forming a Semiconductor DeviceJuly 2023March 2025Allow1910NoNo
18228201SHOWERHEAD ASSEMBLY AND METHOD OF SERVICING ASSEMBLY FOR SEMICONDUCTOR MANUFACTURINGJuly 2023April 2024Allow900YesNo
18361555METHOD FOR ETCHING ETCH LAYERJuly 2023March 2025Allow1920NoNo
18227524GAS MIXING SYSTEM FOR SEMICONDUCTOR FABRICATIONJuly 2023August 2024Allow1310YesNo
18357856THERMAL ATOMIC LAYER ETCHING PROCESSESJuly 2023February 2025Allow1810NoNo
18356084WAFER PROCESSING METHODJuly 2023June 2025Allow2330YesNo
18355224METHOD FOR USING SHIELD PLATE IN A CVD REACTORJuly 2023May 2024Allow1000YesNo
18223156SELECTIVE ETCHING BETWEEN SILICON-AND-GERMANIUM-CONTAINING MATERIALS WITH VARYING GERMANIUM CONCENTRATIONSJuly 2023June 2025Allow2300NoNo
18222024TEMPERATURE CONTROL ASSEMBLY FOR SUBSTRATE PROCESSING APPARATUS AND METHOD OF USING SAMEJuly 2023April 2024Allow900YesNo
18351260Carrier Head Membrane With Regions of Different RoughnessJuly 2023August 2024Allow1320YesNo
18350207PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUSJuly 2023June 2024Allow1110NoNo

Appeals Overview

This analysis examines appeal outcomes and the strategic value of filing appeals for art-unit 1716.

Patent Trial and Appeal Board (PTAB) Decisions

Total PTAB Decisions
363
Examiner Affirmed
225
(62.0%)
Examiner Reversed
138
(38.0%)
Reversal Percentile
74.0%
Higher than average

What This Means

With a 38.0% reversal rate, the PTAB reverses the examiner's rejections in a meaningful percentage of cases. This reversal rate is above the USPTO average, indicating that appeals have better success here than typical.

Strategic Value of Filing an Appeal

Total Appeal Filings
955
Allowed After Appeal Filing
300
(31.4%)
Not Allowed After Appeal Filing
655
(68.6%)
Filing Benefit Percentile
42.0%
Lower than average

Understanding Appeal Filing Strategy

Filing a Notice of Appeal can sometimes lead to allowance even before the appeal is fully briefed or decided by the PTAB. This occurs when the examiner or their supervisor reconsiders the rejection during the mandatory appeal conference (MPEP § 1207.01) after the appeal is filed.

In this dataset, 31.4% of applications that filed an appeal were subsequently allowed. This appeal filing benefit rate is below the USPTO average, suggesting that filing an appeal has limited effectiveness in prompting favorable reconsideration.

Strategic Recommendations

✓ Appeals to PTAB show good success rates. If you have a strong case on the merits, consider fully prosecuting the appeal to a Board decision.

⚠ Filing a Notice of Appeal shows limited benefit. Consider other strategies like interviews or amendments before appealing.

Art Unit 1716 - Prosecution Statistics Summary

Executive Summary

Art Unit 1716 is part of Group 1710 in Technology Center 1700. This art unit has examined 10,732 patent applications in our dataset, with an overall allowance rate of 58.6%. Applications typically reach final disposition in approximately 39 months.

Comparative Analysis

Art Unit 1716's allowance rate of 58.6% places it in the 13% percentile among all USPTO art units. This art unit has a significantly lower allowance rate than most art units at the USPTO.

Prosecution Patterns

Applications in Art Unit 1716 receive an average of 2.38 office actions before reaching final disposition (in the 87% percentile). The median prosecution time is 39 months (in the 8% percentile).

Strategic Considerations

When prosecuting applications in this art unit, consider the following:

  • The art unit's allowance rate suggests a more challenging examination environment compared to the USPTO average.
  • With more office actions than average, plan for multiple rounds of prosecution.
  • The median prosecution time is longer than average and should be factored into your continuation and client communication strategies.
  • Review individual examiner statistics within this art unit to identify examiners with particularly favorable or challenging prosecution patterns.

Important Disclaimer

Not Legal Advice: The information provided in this report is for informational purposes only and does not constitute legal advice. You should consult with a qualified patent attorney or agent for advice specific to your situation.

No Guarantees: We do not provide any guarantees as to the accuracy, completeness, or timeliness of the statistics presented above. Patent prosecution statistics are derived from publicly available USPTO data and are subject to data quality limitations, processing errors, and changes in USPTO practices over time.

Limitation of Liability: Under no circumstances will IronCrow AI be liable for any outcome, decision, or action resulting from your reliance on the statistics, analysis, or recommendations presented in this report. Past prosecution patterns do not guarantee future results.

Use at Your Own Risk: While we strive to provide accurate and useful prosecution statistics, you should independently verify any information that is material to your prosecution strategy and use your professional judgment in all patent prosecution matters.