Detailed information about the 100 most recent patent applications.
| Application Number | Title | Filing Date | Disposal Date | Disposition | Time (months) | Office Actions | Restrictions | Interview | Appeal |
|---|---|---|---|---|---|---|---|---|---|
| 18825717 | SYSTEM AND METHOD FOR CONTROLLING FILM THICKNESS, AND FILM DEPOSITION SYSTEM AND METHOD USING SAME | September 2024 | November 2025 | Allow | 15 | 2 | 1 | No | No |
| 18631589 | CMP System and Method of Use | April 2024 | May 2025 | Allow | 13 | 0 | 0 | Yes | No |
| 18526215 | HIGH POWER CABLE FOR HEATED COMPONENTS IN RF ENVIRONMENT | December 2023 | September 2024 | Allow | 10 | 0 | 0 | Yes | No |
| 18349666 | SUBSTRATE PROCESSING APPARATUS AND PROCESSING METHOD | July 2023 | June 2025 | Abandon | 23 | 1 | 1 | Yes | No |
| 18197455 | SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE TRANSFER APPARATUS AND METHOD | May 2023 | July 2025 | Abandon | 26 | 2 | 0 | Yes | No |
| 18193253 | SYSTEM AND METHOD FOR CONTROLLING FILM THICKNESS, AND FILM DEPOSITION SYSTEM AND METHOD USING SAME | March 2023 | September 2025 | Abandon | 30 | 1 | 0 | No | No |
| 18174318 | SEMICONDUCTOR REACTION CHAMBER AND SEMICONDUCTOR PROCESSING APPARATUS | February 2023 | August 2025 | Allow | 30 | 4 | 0 | Yes | No |
| 18161888 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD | January 2023 | October 2025 | Allow | 32 | 1 | 1 | Yes | No |
| 17887101 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD | August 2022 | January 2025 | Abandon | 29 | 3 | 0 | No | No |
| 17799406 | STRUCTURE MANUFACTURING METHOD AND STRUCTURE MANUFACTURING APPARATUS | August 2022 | October 2025 | Abandon | 39 | 2 | 1 | No | No |
| 17811121 | WORKPIECE PLACEMENT APPARATUS AND PROCESSING APPARATUS | July 2022 | November 2023 | Allow | 16 | 2 | 0 | No | No |
| 17851638 | SYSTEM FOR UNIFORM TEMPERATURE CONTROL OF CLUSTER PLATFORMS | June 2022 | March 2025 | Abandon | 33 | 0 | 1 | No | No |
| 17837241 | APPARATUS FOR TREATING SUBSTRATE | June 2022 | June 2025 | Allow | 36 | 2 | 0 | No | No |
| 17741787 | ETCHING DEVICE AND ETCHING METHOD | May 2022 | October 2024 | Abandon | 29 | 2 | 1 | No | No |
| 17707316 | ETCHING METHOD AND ETCHING PROCESSING APPARATUS | March 2022 | October 2025 | Abandon | 43 | 2 | 1 | Yes | No |
| 17656315 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD | March 2022 | April 2025 | Allow | 37 | 3 | 1 | Yes | No |
| 17654640 | SUBSTRATE PROCESSING DEVICE AND ETCHING LIQUID | March 2022 | September 2024 | Allow | 30 | 2 | 1 | Yes | No |
| 17653252 | Radiation of Substrates During Processing and Systems Thereof | March 2022 | November 2025 | Abandon | 44 | 4 | 1 | No | No |
| 17629362 | CERAMIC AIR INLET RADIO FREQUENCY CONNECTION TYPE CLEANING DEVICE | January 2022 | October 2025 | Allow | 45 | 2 | 0 | Yes | No |
| 17562986 | PRESSURE ADJUSTMENT APPARATUS FOR CONTROLLING PRESSURE IN CHAMBER AND SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME | December 2021 | September 2025 | Allow | 44 | 3 | 0 | No | No |
| 17554972 | CHUCK PIN ASSEMBLY, AND SUBSTRATE HOLDING APPARATUS AND LIQUID PROCESSING APPARATUS INCLUDING SAME | December 2021 | June 2025 | Allow | 42 | 3 | 1 | No | No |
| 17456998 | ETCHING APPARATUS AND ETCHING METHOD | November 2021 | November 2024 | Abandon | 36 | 2 | 1 | No | No |
| 17533507 | PLASMA PROCESSING APPARATUS AND METHOD FOR FABRICATING SEMICONDUCTOR DEVICE USING THE SAME | November 2021 | March 2026 | Abandon | 51 | 4 | 1 | No | No |
| 17522660 | PROCESSING APPARATUS AND PROCESSING METHOD | November 2021 | September 2025 | Allow | 46 | 3 | 1 | Yes | No |
| 17519785 | SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS | November 2021 | March 2025 | Abandon | 40 | 3 | 0 | Yes | No |
| 17513991 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD | October 2021 | January 2025 | Abandon | 39 | 3 | 1 | No | No |
| 17513986 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD | October 2021 | December 2025 | Allow | 50 | 4 | 1 | Yes | No |
| 17441850 | SEMICONDUCTOR DEPOSITION METHOD AND SEMICONDUCTOR DEPOSITION SYSTEM | September 2021 | April 2025 | Abandon | 43 | 2 | 0 | No | No |
| 17465440 | ETCHING METHOD | September 2021 | March 2025 | Abandon | 42 | 4 | 1 | Yes | No |
| 17464007 | SEMICONDUCTOR MANUFACTURING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | September 2021 | March 2024 | Allow | 30 | 1 | 0 | Yes | No |
| 17446477 | SUBSTRATE PROCESSING SYSTEM AND STATE MONITORING METHOD | August 2021 | November 2025 | Allow | 51 | 5 | 1 | No | No |
| 17433777 | LARGE AREA METROLOGY AND PROCESS CONTROL FOR ANISOTROPIC CHEMICAL ETCHING | August 2021 | November 2024 | Abandon | 39 | 1 | 1 | No | No |
| 17393737 | ACTIVE WORKPIECE HEATING OR COOLING FOR AN ION IMPLANTATION SYSTEM | August 2021 | December 2023 | Abandon | 29 | 2 | 0 | No | No |
| 17386645 | PLASMA PROCESSING APPARATUS | July 2021 | May 2023 | Allow | 21 | 1 | 0 | Yes | No |
| 17443286 | SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS | July 2021 | December 2023 | Allow | 29 | 1 | 1 | Yes | No |
| 17424449 | SHOWERHEAD WITH CONFIGURABLE GAS OUTLETS | July 2021 | February 2026 | Abandon | 55 | 4 | 0 | No | No |
| 17377666 | SUPPORTING DEVICE AND APPARATUS FOR PROCESSING A SUBSTRATE INCLUDING A SUPPORTING DEVICE | July 2021 | October 2025 | Allow | 51 | 7 | 0 | Yes | No |
| 17376446 | SUBSTRATE PROCESSING APPARATUS AND FURNACE OPENING CLOSER | July 2021 | November 2024 | Allow | 40 | 2 | 0 | Yes | No |
| 17367975 | SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS | July 2021 | November 2025 | Allow | 52 | 5 | 0 | Yes | No |
| 17366761 | SEMICONDUCTOR PROCESSING CHAMBER ADAPTER | July 2021 | November 2025 | Allow | 52 | 4 | 0 | Yes | No |
| 17361572 | PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD | June 2021 | February 2025 | Allow | 44 | 3 | 1 | Yes | No |
| 17346410 | SUBSTRATE TREATING EQUIPMENT | June 2021 | March 2025 | Abandon | 45 | 4 | 0 | No | No |
| 17413939 | SEMICONDUCTOR WAFER PHOTOELECTROCHEMICAL MECHANICAL POLISHING PROCESSING DEVICE AND PROCESSING METHOD | June 2021 | September 2025 | Abandon | 51 | 4 | 1 | No | No |
| 17326821 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD | May 2021 | March 2024 | Allow | 33 | 2 | 1 | Yes | No |
| 17318019 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD | May 2021 | December 2023 | Allow | 31 | 1 | 1 | Yes | No |
| 17315478 | HYDROGEN FLUORIDE VAPOR PHASE CORROSION APPARATUS AND METHOD | May 2021 | May 2024 | Abandon | 36 | 2 | 0 | No | No |
| 17243596 | ETCHING APPARATUS AND ETCHING METHOD | April 2021 | February 2026 | Abandon | 58 | 4 | 2 | Yes | No |
| 17241504 | SUBSTRATE PROCESSING APPARATUS | April 2021 | November 2024 | Allow | 42 | 2 | 0 | Yes | No |
| 17223141 | SUBSTRATE PROCESSING APPARATUS | April 2021 | March 2023 | Allow | 23 | 1 | 0 | Yes | No |
| 17219360 | PROCESS CHAMBER FOR CYCLIC AND SELECTIVE MATERIAL REMOVAL AND ETCHING | March 2021 | March 2023 | Allow | 24 | 1 | 0 | Yes | No |
| 17213065 | SUBSTRATE PROCESSING APPARATUS | March 2021 | May 2024 | Abandon | 37 | 4 | 0 | Yes | No |
| 17204832 | SUBSTRATE POLISHING SIMULTANEOUSLY OVER MULTIPLE MINI PLATENS | March 2021 | November 2023 | Abandon | 32 | 2 | 0 | Yes | No |
| 17189858 | HOLDING METHOD OF EDGE RING, PLASMA PROCESSING APPARATUS, AND SUBSTRATE PROCESSING SYSTEM | March 2021 | January 2024 | Allow | 34 | 2 | 1 | Yes | No |
| 17182535 | SUBSTRATE TREATING APPARATUS | February 2021 | September 2025 | Allow | 54 | 4 | 0 | Yes | No |
| 17181571 | EDGE RING ARRANGEMENT WITH MOVEABLE EDGE RINGS | February 2021 | February 2024 | Allow | 36 | 2 | 0 | Yes | No |
| 17180394 | SUBSTRATE PROCESSING APPARATUS AND METHOD FOR FABRICATING CATALYST PROCESSING MEMBER | February 2021 | December 2022 | Abandon | 22 | 1 | 1 | No | No |
| 17163248 | Method and Apparatus for Anisotropic Pattern Etching and Treatment | January 2021 | September 2024 | Allow | 44 | 4 | 0 | Yes | No |
| 17141670 | SUBSTRATE PROCESSING APPARATUS | January 2021 | November 2023 | Allow | 34 | 1 | 1 | Yes | No |
| 17138427 | METHOD FOR LIFTING SUBSTRATE AND APPARATUS FOR TREATING SUBSTRATE | December 2020 | May 2024 | Abandon | 40 | 4 | 0 | Yes | No |
| 17110817 | GAS INJECTOR FOR SEMICONDUCTOR MANUFACTURING CHAMBER | December 2020 | October 2023 | Abandon | 34 | 2 | 0 | No | No |
| 17095954 | SUBSTRATE PROCESSING APPARATUS | November 2020 | December 2022 | Allow | 25 | 1 | 0 | No | No |
| 17084903 | APPARATUS AND METHOD FOR TREATING SUBSTRATE | October 2020 | August 2023 | Abandon | 34 | 2 | 0 | No | No |
| 17079439 | SUBSTRATE TREATMENT APPARATUS | October 2020 | November 2023 | Abandon | 36 | 2 | 0 | No | No |
| 17076315 | HIGH THROUGHPUT POLISHING MODULES AND MODULAR POLISHING SYSTEMS | October 2020 | May 2025 | Allow | 55 | 6 | 1 | Yes | No |
| 17027460 | EDGE RING, SUBSTRATE PROCESSING APPARATUS HAVING THE SAME AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE USING THE APPARATUS | September 2020 | July 2025 | Allow | 57 | 4 | 0 | Yes | No |
| 16980995 | SUBSTRATE HOLDING APPARATUS AND METHOD OF MANUFACTURING A DRIVE RING | September 2020 | October 2025 | Abandon | 60 | 4 | 1 | Yes | Yes |
| 17016881 | SUBSTRATE PROCESSING APPARATUS | September 2020 | September 2022 | Allow | 24 | 0 | 0 | Yes | No |
| 17013325 | PLASMA PROCESSING APPARATUS | September 2020 | September 2022 | Allow | 24 | 2 | 0 | No | No |
| 16999836 | APPARATUS AND METHOD FOR TREATING SUBSTRATE | August 2020 | August 2023 | Allow | 35 | 3 | 0 | No | No |
| 16991168 | GAS FLOW CONTROL DURING SEMICONDUCTOR FABRICATION | August 2020 | September 2025 | Abandon | 60 | 8 | 1 | Yes | No |
| 16930867 | SEMICONDUCTOR VAPOR ETCHING DEVICE WITH INTERMEDIATE CHAMBER | July 2020 | November 2025 | Abandon | 60 | 7 | 1 | Yes | No |
| 16924513 | SUBSTRATE SUPPORTING DEVICE AND SUBSTRATE TREATING APPARATUS INCLUDING THE SAME | July 2020 | May 2024 | Abandon | 46 | 4 | 0 | No | No |
| 16909228 | STAGE, SUBSTRATE PROCESSING APPARATUS AND STAGE ASSEMBLING METHOD | June 2020 | March 2023 | Abandon | 33 | 2 | 0 | Yes | No |
| 16871588 | HIGH THROUGHPUT POLISHING MODULES AND MODULAR POLISHING SYSTEMS | May 2020 | April 2025 | Allow | 59 | 6 | 1 | Yes | No |
| 16761642 | OPTICAL ELEMENTS HOLDER DEVICE FOR A COATING STATION | May 2020 | March 2023 | Allow | 34 | 5 | 1 | Yes | No |
| 16851012 | HIGH THROUGHPUT POLISHING MODULES AND MODULAR POLISHING SYSTEMS | April 2020 | January 2026 | Allow | 60 | 7 | 1 | Yes | No |
| 16842087 | SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE TRANSFER APPARATUS AND METHOD | April 2020 | March 2023 | Allow | 35 | 2 | 1 | Yes | No |
| 16835104 | PLASMA FOCUS RING OF SEMICONDUCTOR ETCHING APPARATUS AND MANUFACTURING METHOD THEREOF | March 2020 | April 2022 | Abandon | 25 | 3 | 1 | No | No |
| 16641456 | Inner Wall and substrate Processing Apparatus | February 2020 | March 2024 | Allow | 49 | 4 | 0 | Yes | No |
| 16638688 | LINER, REACTION CHAMBER AND SEMICONDUCTOR PROCESSING EQUIPMENT | February 2020 | August 2024 | Allow | 54 | 5 | 0 | Yes | No |
| 16722438 | WETTING PROCESSING APPARATUS AND OPERATION METHOD THEREOF | December 2019 | August 2023 | Allow | 44 | 2 | 1 | Yes | No |
| 16682338 | FOCUS RING HEIGHT ADJUSTING DEVICE AND WAFER ETCHING APPARATUS INCLUDING THE SAME | November 2019 | April 2022 | Abandon | 29 | 1 | 0 | No | No |
| 16666717 | SUBSTRATE PROCESSING APPARATUS | October 2019 | December 2022 | Allow | 38 | 2 | 0 | Yes | No |
| 16660736 | CONTAINER FOR STORING SLURRY HAVING FUMED SILICA PARTICLES AND CMP APPARATUS HAVING THE SAME | October 2019 | July 2023 | Abandon | 45 | 4 | 0 | No | No |
| 16528757 | Substrate Processing Apparatus and Substrate Processing Method | August 2019 | March 2023 | Allow | 43 | 2 | 1 | No | No |
| 16515938 | CMP System and Method of Use | July 2019 | March 2021 | Allow | 20 | 1 | 1 | No | No |
| 16457416 | WET BENCH AND CHEMICAL TREATMENT METHOD USING THE SAME | June 2019 | August 2022 | Allow | 38 | 4 | 1 | Yes | No |
| 16454289 | WAFER CUTTING DEVICE AND METHOD | June 2019 | February 2022 | Abandon | 32 | 3 | 1 | No | No |
| 16452364 | CONTINUOUS ANALYTE SENSORS AND METHODS OF MAKING SAME | June 2019 | July 2022 | Abandon | 37 | 4 | 0 | Yes | No |
| 16469171 | ETCHING DEVICE | June 2019 | September 2020 | Abandon | 16 | 1 | 0 | No | No |
| 16423745 | APPARATUS AND METHOD FOR PROCESSING SUBSTRATE | May 2019 | March 2024 | Abandon | 57 | 4 | 1 | No | No |
| 16418142 | CHEMICAL VAPOR DEPOSITION APPARATUS AND METHOD OF FORMING FILM | May 2019 | April 2024 | Abandon | 59 | 5 | 1 | No | No |
| 16406921 | ELECTROSTATIC CHUCK FOR HIGH BIAS RADIO FREQUENCY (RF) POWER APPLICATION IN A PLASMA PROCESSING CHAMBER | May 2019 | January 2025 | Allow | 60 | 6 | 1 | Yes | No |
| 16401871 | PROTECTION OF ALUMINUM PROCESS CHAMBER COMPONENTS | May 2019 | August 2023 | Allow | 51 | 5 | 1 | Yes | No |
| 16400090 | PRECISION DYNAMIC LEVELING MECHANISM WITH LONG MOTION CAPABILITY | May 2019 | October 2022 | Allow | 41 | 3 | 0 | Yes | No |
| 16400323 | WAFFER PEDESTAL WITH HEATING MECHANISM AND REACTION CHAMBER INCLUDING THE SAME | May 2019 | December 2022 | Abandon | 44 | 3 | 1 | No | No |
| 16396438 | System and Method for Performing Spin Dry Etching | April 2019 | August 2023 | Allow | 52 | 6 | 0 | Yes | No |
| 16394655 | SUBSTRATE PROCESSING APPARATUS AND PROGRAM FOR SUBSTRATE PROCESSING APPARATUS | April 2019 | January 2022 | Abandon | 33 | 1 | 1 | No | No |
| 16394320 | SUBSTRATE PROCESSING APPARATUS | April 2019 | October 2021 | Allow | 30 | 1 | 1 | No | No |
| 16391262 | SENSORS AND SYSTEM FOR IN-SITU EDGE RING EROSION MONITOR | April 2019 | March 2024 | Allow | 59 | 6 | 1 | Yes | No |
This analysis examines appeal outcomes and the strategic value of filing appeals for examiner KLUNK, MARGARET D.
With a 21.4% reversal rate, the PTAB affirms the examiner's rejections in the vast majority of cases. This reversal rate is below the USPTO average, indicating that appeals face more challenges here than typical.
Filing a Notice of Appeal can sometimes lead to allowance even before the appeal is fully briefed or decided by the PTAB. This occurs when the examiner or their supervisor reconsiders the rejection during the mandatory appeal conference (MPEP § 1207.01) after the appeal is filed.
In this dataset, 22.5% of applications that filed an appeal were subsequently allowed. This appeal filing benefit rate is below the USPTO average, suggesting that filing an appeal has limited effectiveness in prompting favorable reconsideration.
⚠ Appeals to PTAB face challenges. Ensure your case has strong merit before committing to full Board review.
⚠ Filing a Notice of Appeal shows limited benefit. Consider other strategies like interviews or amendments before appealing.
Examiner KLUNK, MARGARET D works in Art Unit 1716 and has examined 434 patent applications in our dataset. With an allowance rate of 43.1%, this examiner allows applications at a lower rate than most examiners at the USPTO. Applications typically reach final disposition in approximately 43 months.
Examiner KLUNK, MARGARET D's allowance rate of 43.1% places them in the 8% percentile among all USPTO examiners. This examiner is less likely to allow applications than most examiners at the USPTO.
On average, applications examined by KLUNK, MARGARET D receive 3.15 office actions before reaching final disposition. This places the examiner in the 89% percentile for office actions issued. This examiner issues more office actions than most examiners, which may indicate thorough examination or difficulty in reaching agreement with applicants.
The median time to disposition (half-life) for applications examined by KLUNK, MARGARET D is 43 months. This places the examiner in the 16% percentile for prosecution speed. Applications take longer to reach final disposition with this examiner compared to most others.
Conducting an examiner interview provides a +32.4% benefit to allowance rate for applications examined by KLUNK, MARGARET D. This interview benefit is in the 80% percentile among all examiners. Recommendation: Interviews are highly effective with this examiner and should be strongly considered as a prosecution strategy. Per MPEP § 713.10, interviews are available at any time before the Notice of Allowance is mailed or jurisdiction transfers to the PTAB.
When applicants file an RCE with this examiner, 12.3% of applications are subsequently allowed. This success rate is in the 7% percentile among all examiners. Strategic Insight: RCEs show lower effectiveness with this examiner compared to others. Consider whether a continuation application might be more strategic, especially if you need to add new matter or significantly broaden claims.
This examiner enters after-final amendments leading to allowance in 19.3% of cases where such amendments are filed. This entry rate is in the 23% percentile among all examiners. Strategic Recommendation: This examiner rarely enters after-final amendments compared to other examiners. You should generally plan to file an RCE or appeal rather than relying on after-final amendment entry. Per MPEP § 714.12, primary examiners have discretion in entering after-final amendments, and this examiner exercises that discretion conservatively.
When applicants request a pre-appeal conference (PAC) with this examiner, 40.0% result in withdrawal of the rejection or reopening of prosecution. This success rate is in the 36% percentile among all examiners. Note: Pre-appeal conferences show below-average success with this examiner. Consider whether your arguments are strong enough to warrant a PAC request.
This examiner withdraws rejections or reopens prosecution in 57.6% of appeals filed. This is in the 31% percentile among all examiners. Of these withdrawals, 26.3% occur early in the appeal process (after Notice of Appeal but before Appeal Brief). Strategic Insight: This examiner shows below-average willingness to reconsider rejections during appeals. Be prepared to fully prosecute appeals if filed.
When applicants file petitions regarding this examiner's actions, 50.0% are granted (fully or in part). This grant rate is in the 46% percentile among all examiners. Strategic Note: Petitions show below-average success regarding this examiner's actions. Ensure you have a strong procedural basis before filing.
Examiner's Amendments: This examiner makes examiner's amendments in 0.0% of allowed cases (in the 4% percentile). This examiner rarely makes examiner's amendments compared to other examiners. You should expect to make all necessary claim amendments yourself through formal amendment practice.
Quayle Actions: This examiner issues Ex Parte Quayle actions in 0.0% of allowed cases (in the 4% percentile). This examiner rarely issues Quayle actions compared to other examiners. Allowances typically come directly without a separate action for formal matters.
Based on the statistical analysis of this examiner's prosecution patterns, here are tailored strategic recommendations:
Not Legal Advice: The information provided in this report is for informational purposes only and does not constitute legal advice. You should consult with a qualified patent attorney or agent for advice specific to your situation.
No Guarantees: We do not provide any guarantees as to the accuracy, completeness, or timeliness of the statistics presented above. Patent prosecution statistics are derived from publicly available USPTO data and are subject to data quality limitations, processing errors, and changes in USPTO practices over time.
Limitation of Liability: Under no circumstances will IronCrow AI be liable for any outcome, decision, or action resulting from your reliance on the statistics, analysis, or recommendations presented in this report. Past prosecution patterns do not guarantee future results.
Use at Your Own Risk: While we strive to provide accurate and useful prosecution statistics, you should independently verify any information that is material to your prosecution strategy and use your professional judgment in all patent prosecution matters.