Detailed information about the 100 most recent patent applications.
| Application Number | Title | Filing Date | Disposal Date | Disposition | Time (months) | Office Actions | Restrictions | Interview | Appeal |
|---|---|---|---|---|---|---|---|---|---|
| 18750473 | METHOD OF PERFORMING MAINTENANCE ON SUBSTRATE PROCESSING APPARATUS | June 2024 | February 2025 | Allow | 7 | 1 | 0 | No | No |
| 18740411 | SOLIDS VAPORIZER | June 2024 | March 2025 | Allow | 9 | 1 | 0 | No | No |
| 18630603 | SYSTEMS AND METHODS FOR METASTABLE ACTIVATED RADICAL SELECTIVE STRIP AND ETCH USING DUAL PLENUM SHOWERHEAD | April 2024 | December 2024 | Allow | 8 | 2 | 0 | Yes | No |
| 18630683 | SYSTEMS AND METHODS FOR METASTABLE ACTIVATED RADICAL SELECTIVE STRIP AND ETCH USING DUAL PLENUM SHOWERHEAD | April 2024 | November 2024 | Allow | 8 | 2 | 0 | Yes | No |
| 18442865 | APPARATUS AND ASSOCIATED ACCESSORIES, METHODS AND USES FOR VISUALISING A PRINT ON AN OBJECT | February 2024 | May 2025 | Allow | 15 | 1 | 0 | No | No |
| 18526472 | SUBSTRATE PROCESSING APPARATUS, PROCESSING METHOD, AND NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUM | December 2023 | March 2025 | Allow | 16 | 0 | 0 | Yes | No |
| 18475355 | ATOMIC LAYER DEPOSITION APPARATUS | September 2023 | November 2023 | Allow | 2 | 0 | 0 | No | No |
| 18368285 | DIFFERENTIAL CAPACITIVE SENSOR FOR IN-SITU FILM THICKNESS AND DIELECTRIC CONSTANT MEASUREMENT | September 2023 | September 2024 | Allow | 12 | 0 | 0 | No | No |
| 18452918 | SUBSTRATE TREATING METHOD AND SUBSTRATE TREATING APPARATUS | August 2023 | January 2025 | Allow | 17 | 1 | 0 | Yes | No |
| 18355224 | METHOD FOR USING SHIELD PLATE IN A CVD REACTOR | July 2023 | May 2024 | Allow | 10 | 0 | 0 | Yes | No |
| 18217696 | SYSTEMS AND METHODS FOR METASTABLE ACTIVATED RADICAL SELECTIVE STRIP AND ETCH USING DUAL PLENUM SHOWERHEAD | July 2023 | September 2024 | Allow | 14 | 1 | 0 | Yes | No |
| 18323769 | PLASMA PROCESSING APPARATUS AND METHOD | May 2023 | June 2025 | Allow | 25 | 0 | 1 | No | No |
| 18115738 | SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD | February 2023 | June 2025 | Allow | 28 | 0 | 1 | No | No |
| 18106857 | SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD | February 2023 | June 2025 | Allow | 28 | 0 | 1 | No | No |
| 18097559 | SEQUENTIAL INFILTRATION SYNTHESIS APPARATUS | January 2023 | December 2023 | Allow | 11 | 1 | 0 | No | No |
| 18077607 | SUBSTRATE PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | December 2022 | December 2023 | Allow | 12 | 1 | 0 | No | No |
| 18074872 | APPARATUS AND METHODS TO REDUCE PARTICLES IN A FILM DEPOSITION CHAMBER | December 2022 | November 2024 | Abandon | 23 | 2 | 0 | No | No |
| 17921871 | SHOWERHEAD DESIGNS FOR CONTROLLING DEPOSITION ON WAFER BEVEL/EDGE | October 2022 | June 2025 | Allow | 31 | 0 | 0 | No | No |
| 17958282 | ASYMMETRIC INJECTION FOR BETTER WAFER UNIFORMITY | September 2022 | December 2023 | Allow | 14 | 1 | 0 | No | No |
| 17943843 | SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUM | September 2022 | August 2023 | Allow | 11 | 0 | 0 | Yes | No |
| 17901521 | SUBSTRATE PROCESSING APPARATUS | September 2022 | June 2025 | Allow | 34 | 1 | 0 | No | No |
| 17871826 | SCREWLESS SEMICONDUCTOR PROCESSING CHAMBERS | July 2022 | August 2024 | Allow | 24 | 2 | 0 | No | No |
| 17871607 | PROCESS KITS AND RELATED METHODS FOR PROCESSING CHAMBERS TO FACILITATE DEPOSITION PROCESS ADJUSTABILITY | July 2022 | December 2024 | Allow | 29 | 3 | 2 | Yes | No |
| 17814007 | MECHANISMS FOR SUPPLYING PROCESS GAS INTO WAFER PROCESS APPARATUS | July 2022 | March 2025 | Allow | 32 | 0 | 0 | Yes | No |
| 17867589 | APPARATUS AND METHOD FOR CONTROLLING A FLOW PROCESS MATERIAL TO A DEPOSITION CHAMBER | July 2022 | June 2025 | Allow | 35 | 1 | 0 | No | No |
| 17863173 | PAD RAISING MECHANISM IN WAFER POSITIONING PEDESTAL FOR SEMICONDUCTOR PROCESSING | July 2022 | December 2023 | Allow | 17 | 1 | 0 | No | No |
| 17857984 | METAL COMPONENT AND MANUFACTURING METHOD THEREOF AND PROCESS CHAMBER HAVING THE METAL COMPONENT | July 2022 | January 2024 | Abandon | 18 | 1 | 0 | No | No |
| 17856613 | METHOD FOR CONTROLLING A PROCESSING SYSTEM | July 2022 | July 2024 | Allow | 24 | 2 | 0 | Yes | No |
| 17832775 | FILM THICKNESS UNIFORMITY IMPROVEMENT USING EDGE RING AND BIAS ELECTRODE GEOMETRY | June 2022 | November 2024 | Allow | 30 | 3 | 0 | Yes | No |
| 17756681 | PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD | May 2022 | March 2025 | Allow | 34 | 1 | 1 | No | No |
| 17804128 | APPARATUS FOR PERFORMING FILM FORMING PROCESS ON SUBSTRATE AND METHOD OF USING VACUUM CHUCK MECHANISM PROVIDED IN THE APPARATUS | May 2022 | November 2024 | Allow | 30 | 0 | 0 | No | No |
| 17744852 | RING CARRIER AND SUBSTRATE TREATING SYSTEM | May 2022 | February 2025 | Allow | 33 | 1 | 0 | No | No |
| 17742637 | TUNABLE PLASMA EXCLUSION ZONE IN SEMICONDUCTOR FABRICATION | May 2022 | February 2025 | Allow | 33 | 1 | 1 | No | No |
| 17722874 | SHADOW MASK APPARATUS AND METHODS FOR VARIABLE ETCH DEPTHS | April 2022 | May 2025 | Allow | 37 | 1 | 0 | No | No |
| 17656009 | GAS SUPPLY APPARATUS, GAS SUPPLY METHOD, AND SUBSTRATE PROCESSING APPARATUS | March 2022 | January 2024 | Allow | 21 | 1 | 1 | Yes | No |
| 17689565 | VAPORIZER, SUBSTRATE PROCESSING APPARATUS AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE | March 2022 | January 2024 | Allow | 22 | 1 | 0 | No | No |
| 17682457 | MULTI-CHAMBER SEMICONDUCTOR MANUFACTURING SYSTEM | February 2022 | February 2025 | Allow | 35 | 1 | 0 | No | No |
| 17681186 | SOLIDS VAPORIZER | February 2022 | March 2024 | Allow | 25 | 2 | 1 | Yes | No |
| 17590681 | GAS HUB FOR PLASMA REACTOR | February 2022 | March 2023 | Allow | 14 | 0 | 0 | Yes | No |
| 17582188 | Graphite Plate | January 2022 | October 2024 | Abandon | 33 | 2 | 0 | Yes | No |
| 17648436 | PLASMA PROCESSING APPARATUS | January 2022 | March 2024 | Allow | 26 | 0 | 0 | No | No |
| 17576216 | SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND RECORDING MEDIUM | January 2022 | October 2024 | Allow | 33 | 1 | 1 | Yes | No |
| 17575049 | SYSTEMS AND METHODS FOR STORAGE AND SUPPLY OF F3NO-FREE FNO GASES AND F3NO-FREE FNO GAS MIXTURES FOR SEMICONDUCTOR PROCESSES | January 2022 | May 2024 | Allow | 28 | 3 | 0 | No | No |
| 17565808 | SUBSTRATE PROCESSING APPARATUS, METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND RECORDING MEDIUM | December 2021 | September 2024 | Allow | 33 | 0 | 1 | No | No |
| 17646426 | LOAD ASSEMBLIES FOR LOADING PARTS IN A FURNACE | December 2021 | February 2024 | Allow | 25 | 2 | 1 | Yes | No |
| 17644028 | ASYMMETRICAL SEALING AND GAS FLOW CONTROL DEVICE | December 2021 | May 2024 | Allow | 30 | 2 | 0 | Yes | No |
| 17643718 | SHOWERHEAD SHROUD | December 2021 | March 2022 | Allow | 3 | 0 | 0 | No | No |
| 17519596 | PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD | November 2021 | June 2024 | Allow | 32 | 0 | 1 | Yes | No |
| 17517253 | RECIPE UPDATING METHOD | November 2021 | September 2024 | Allow | 35 | 0 | 1 | No | No |
| 17605587 | GAS DISTRIBUTION UNIT IN CONNECTION WITH ALD REACTOR | October 2021 | March 2022 | Allow | 5 | 0 | 0 | Yes | No |
| 17604579 | WORKPIECE CARRIER DEVICE, METHOD FOR COATING A WORKPIECE, AND WORKPIECE | October 2021 | April 2025 | Allow | 42 | 3 | 0 | Yes | No |
| 17450886 | PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD | October 2021 | July 2023 | Allow | 21 | 0 | 1 | No | No |
| 17603429 | APPARATUSES AND METHOD FOR ORIENTED DEPOSITION | October 2021 | September 2024 | Allow | 36 | 1 | 2 | No | No |
| 17477750 | IN-SITU SEMICONDUCTOR PROCESSING CHAMBER TEMPERATURE APPARATUS | September 2021 | August 2024 | Allow | 35 | 2 | 1 | Yes | No |
| 17468536 | METHOD AND APPARATUS FOR POST EXPOSURE PROCESSING OF PHOTORESIST WAFERS | September 2021 | October 2023 | Allow | 25 | 0 | 0 | Yes | No |
| 17445562 | SUPPRESSION OF PARASITIC DEPOSITION IN A SUBSTRATE PROCESSING SYSTEM BY SUPPRESSING PRECURSOR FLOW AND PLASMA OUTSIDE OF SUBSTRATE REGION | August 2021 | March 2023 | Allow | 19 | 0 | 0 | Yes | No |
| 17407641 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD | August 2021 | June 2023 | Abandon | 22 | 1 | 1 | No | No |
| 17430872 | MULTI-SHOWERHEAD CHEMICAL VAPOR DEPOSITION REACTOR, PROCESS AND PRODUCTS | August 2021 | May 2025 | Abandon | 45 | 2 | 0 | No | No |
| 17395240 | SUSCEPTOR WITH RING TO LIMIT BACKSIDE DEPOSITION | August 2021 | September 2023 | Allow | 26 | 1 | 0 | Yes | No |
| 17424968 | SOLID VAPORIZATION/SUPPLY SYSTEM OF METAL HALIDE FOR THIN FILM DEPOSITION | July 2021 | December 2022 | Allow | 16 | 3 | 0 | Yes | No |
| 17424974 | VAPORIZABLE SOURCE MATERIAL CONTAINER AND SOLID VAPORIZATION/SUPPLY SYSTEM USING THE SAME | July 2021 | October 2022 | Allow | 14 | 2 | 0 | No | No |
| 17299958 | SHOWER PLATE, PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD | June 2021 | April 2024 | Allow | 34 | 1 | 0 | No | No |
| 17334797 | SHOWER PLATE, SUBSTRATE TREATMENT DEVICE, AND SUBSTRATE TREATMENT METHOD | May 2021 | February 2025 | Abandon | 45 | 6 | 1 | Yes | No |
| 17294469 | ETCHING UNIFORMITY REGULATING DEVICE AND METHOD | May 2021 | March 2024 | Allow | 34 | 1 | 0 | No | No |
| 17242898 | LIDS AND LID ASSEMBLY KITS FOR ATOMIC LAYER DEPOSITION CHAMBERS | April 2021 | November 2023 | Allow | 30 | 1 | 0 | No | No |
| 17309108 | SHIELD PLATE FOR A CVD REACTOR | April 2021 | May 2023 | Allow | 25 | 2 | 1 | Yes | No |
| 17224779 | GAS SUPPLY UNIT AND SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME | April 2021 | October 2024 | Abandon | 43 | 2 | 1 | No | No |
| 17210018 | CLEANING ASSEMBLIES FOR SUBSTRATE PROCESSING CHAMBERS | March 2021 | February 2024 | Allow | 35 | 2 | 0 | Yes | No |
| 17200529 | CVD REACTOR CHAMBER WITH RESISTIVE HEATING FOR SILICON CARBIDE DEPOSITION | March 2021 | April 2023 | Abandon | 25 | 1 | 0 | No | No |
| 17193961 | ATOMIC LAYER DEPOSITION DEVICE | March 2021 | April 2023 | Allow | 26 | 0 | 0 | Yes | No |
| 17250818 | APPARATUS AND ASSOCIATED ACCESSORIES, METHODS AND USES FOR VISUALISING A PRINT ON AN OBJECT | March 2021 | October 2023 | Allow | 32 | 0 | 1 | No | No |
| 17250809 | DEVICE AND METHOD FOR CONTROLLING THE CEILING TEMPERATURE OF A CVD REACTOR | March 2021 | April 2023 | Allow | 25 | 0 | 1 | No | No |
| 17186149 | SUBSTRATE PROCESSING APPARATUS AND CLEANING METHOD | February 2021 | February 2024 | Allow | 36 | 2 | 1 | No | No |
| 17175315 | ELECTROSTATICALLY CLAMPED EDGE RING | February 2021 | October 2023 | Allow | 32 | 0 | 0 | No | No |
| 17166066 | PLASMA PROCESSING DEVICE | February 2021 | March 2023 | Allow | 25 | 2 | 0 | Yes | No |
| 17162929 | SYSTEMS AND METHODS FOR ATOMIC LAYER DEPOSITION | January 2021 | June 2023 | Allow | 29 | 0 | 0 | No | No |
| 16958415 | DEVICE FOR FORMING DIAMOND FILM ETC. AND METHOD THEREFOR | January 2021 | April 2025 | Allow | 57 | 3 | 1 | Yes | No |
| 17117111 | DEPOSITION APPARATUS | December 2020 | March 2023 | Allow | 28 | 0 | 1 | No | No |
| 17108583 | ACTIVELY COOLED FORELINE TRAP TO REDUCE THROTTLE VALVE DRIFT | December 2020 | April 2024 | Allow | 40 | 2 | 1 | No | No |
| 17103697 | NOVEL AND EFFECTIVE HOMOGENIZE FLOW MIXING DESIGN | November 2020 | March 2024 | Abandon | 39 | 4 | 1 | No | No |
| 16951823 | THIN SUBSTRATE HANDLING VIA EDGE CLAMPING | November 2020 | January 2024 | Allow | 38 | 2 | 1 | Yes | No |
| 17080560 | SEMICONDUCTOR CHAMBER COMPONENTS WITH HIGH-PERFORMANCE COATING | October 2020 | July 2022 | Allow | 21 | 2 | 1 | Yes | No |
| 17075684 | ATOMIC LAYER DEPOSITION EQUIPMENT AND PROCESS METHOD | October 2020 | June 2022 | Allow | 20 | 0 | 1 | No | No |
| 17047550 | NOZZLE HEAD AND APPARATUS | October 2020 | April 2025 | Allow | 54 | 4 | 1 | Yes | No |
| 17034369 | CONTROL SYSTEM FOR PLASMA CHAMBER HAVING CONTROLLABLE VALVE | September 2020 | July 2023 | Allow | 34 | 2 | 1 | No | No |
| 17028327 | INLINE THIN FILM PROCESSING DEVICE | September 2020 | December 2021 | Allow | 15 | 0 | 0 | Yes | No |
| 17016872 | ETCHING APPARATUS AND ETCHING METHOD | September 2020 | February 2024 | Abandon | 41 | 4 | 1 | Yes | No |
| 17011828 | HEATING ZONE SEPARATION FOR REACTANT EVAPORATION SYSTEM | September 2020 | December 2022 | Allow | 27 | 1 | 1 | No | No |
| 17009218 | Substrate Processing Apparatus, Gas Nozzle and Method of Manufacturing Semiconductor Device | September 2020 | September 2024 | Allow | 48 | 2 | 0 | Yes | No |
| 17008314 | Gas Cluster Assisted Plasma Processing | August 2020 | July 2024 | Allow | 46 | 3 | 2 | Yes | No |
| 16976544 | STAGE AND ELECTRODE MEMBER | August 2020 | April 2022 | Allow | 19 | 0 | 0 | No | No |
| 16983142 | SEMICONDUCTOR MANUFACTURING APPARATUS | August 2020 | September 2023 | Allow | 38 | 2 | 1 | Yes | No |
| 16939898 | FILM THICKNESS UNIFORMITY IMPROVEMENT USING EDGE RING AND BIAS ELECTRODE GEOMETRY | July 2020 | April 2022 | Allow | 20 | 0 | 0 | No | No |
| 16938468 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD | July 2020 | August 2022 | Allow | 25 | 1 | 1 | No | No |
| 16936110 | SEMICONDUCTOR PROCESSING CHAMBERS AND METHODS FOR CLEANING THE SAME | July 2020 | December 2023 | Allow | 41 | 2 | 1 | Yes | No |
| 16936343 | SUBSTRATE PROCESSING APPARATUS | July 2020 | May 2022 | Allow | 22 | 0 | 0 | No | No |
| 16912979 | SUBSTRATE TREATING METHOD AND SUBSTRATE TREATING APPARATUS | June 2020 | January 2024 | Abandon | 42 | 5 | 0 | No | No |
| 16910825 | APPARATUS AND METHODS TO REDUCE PARTICLES IN A FILM DEPOSITION CHAMBER | June 2020 | February 2023 | Abandon | 32 | 2 | 1 | No | No |
| 16901600 | FILM-FORMING DEVICE | June 2020 | April 2022 | Allow | 22 | 2 | 0 | Yes | No |
| 16894256 | DEPOSITION PLATFORM FOR FLEXIBLE SUBSTRATES AND METHOD OF OPERATION THEREOF | June 2020 | December 2021 | Abandon | 19 | 1 | 1 | No | No |
This analysis examines appeal outcomes and the strategic value of filing appeals for examiner LUND, JEFFRIE ROBERT.
With a 37.9% reversal rate, the PTAB reverses the examiner's rejections in a meaningful percentage of cases. This reversal rate is above the USPTO average, indicating that appeals have better success here than typical.
Filing a Notice of Appeal can sometimes lead to allowance even before the appeal is fully briefed or decided by the PTAB. This occurs when the examiner or their supervisor reconsiders the rejection during the mandatory appeal conference (MPEP § 1207.01) after the appeal is filed.
In this dataset, 25.4% of applications that filed an appeal were subsequently allowed. This appeal filing benefit rate is below the USPTO average, suggesting that filing an appeal has limited effectiveness in prompting favorable reconsideration.
✓ Appeals to PTAB show good success rates. If you have a strong case on the merits, consider fully prosecuting the appeal to a Board decision.
⚠ Filing a Notice of Appeal shows limited benefit. Consider other strategies like interviews or amendments before appealing.
Examiner LUND, JEFFRIE ROBERT works in Art Unit 1716 and has examined 728 patent applications in our dataset. With an allowance rate of 69.4%, this examiner allows applications at a lower rate than most examiners at the USPTO. Applications typically reach final disposition in approximately 39 months.
Examiner LUND, JEFFRIE ROBERT's allowance rate of 69.4% places them in the 24% percentile among all USPTO examiners. This examiner is less likely to allow applications than most examiners at the USPTO.
On average, applications examined by LUND, JEFFRIE ROBERT receive 2.25 office actions before reaching final disposition. This places the examiner in the 77% percentile for office actions issued. This examiner issues more office actions than most examiners, which may indicate thorough examination or difficulty in reaching agreement with applicants.
The median time to disposition (half-life) for applications examined by LUND, JEFFRIE ROBERT is 39 months. This places the examiner in the 9% percentile for prosecution speed. Applications take longer to reach final disposition with this examiner compared to most others.
Conducting an examiner interview provides a +22.9% benefit to allowance rate for applications examined by LUND, JEFFRIE ROBERT. This interview benefit is in the 72% percentile among all examiners. Recommendation: Interviews provide an above-average benefit with this examiner and are worth considering.
When applicants file an RCE with this examiner, 16.7% of applications are subsequently allowed. This success rate is in the 8% percentile among all examiners. Strategic Insight: RCEs show lower effectiveness with this examiner compared to others. Consider whether a continuation application might be more strategic, especially if you need to add new matter or significantly broaden claims.
This examiner enters after-final amendments leading to allowance in 28.7% of cases where such amendments are filed. This entry rate is in the 33% percentile among all examiners. Strategic Recommendation: This examiner shows below-average receptiveness to after-final amendments. You may need to file an RCE or appeal rather than relying on after-final amendment entry.
When applicants request a pre-appeal conference (PAC) with this examiner, 94.7% result in withdrawal of the rejection or reopening of prosecution. This success rate is in the 67% percentile among all examiners. Strategic Recommendation: Pre-appeal conferences show above-average effectiveness with this examiner. If you have strong arguments, a PAC request may result in favorable reconsideration.
This examiner withdraws rejections or reopens prosecution in 56.1% of appeals filed. This is in the 23% percentile among all examiners. Of these withdrawals, 35.1% occur early in the appeal process (after Notice of Appeal but before Appeal Brief). Strategic Insight: This examiner rarely withdraws rejections during the appeal process compared to other examiners. If you file an appeal, be prepared to fully prosecute it to a PTAB decision. Per MPEP § 1207, the examiner will prepare an Examiner's Answer maintaining the rejections.
When applicants file petitions regarding this examiner's actions, 54.4% are granted (fully or in part). This grant rate is in the 68% percentile among all examiners. Strategic Note: Petitions show above-average success regarding this examiner's actions. Petitionable matters include restriction requirements (MPEP § 1002.02(c)(2)) and various procedural issues.
Examiner's Amendments: This examiner makes examiner's amendments in 3.8% of allowed cases (in the 86% percentile). Per MPEP § 1302.04, examiner's amendments are used to place applications in condition for allowance when only minor changes are needed. This examiner frequently uses this tool compared to other examiners, indicating a cooperative approach to getting applications allowed. Strategic Insight: If you are close to allowance but minor claim amendments are needed, this examiner may be willing to make an examiner's amendment rather than requiring another round of prosecution.
Quayle Actions: This examiner issues Ex Parte Quayle actions in 0.0% of allowed cases (in the 4% percentile). This examiner rarely issues Quayle actions compared to other examiners. Allowances typically come directly without a separate action for formal matters.
Based on the statistical analysis of this examiner's prosecution patterns, here are tailored strategic recommendations:
Not Legal Advice: The information provided in this report is for informational purposes only and does not constitute legal advice. You should consult with a qualified patent attorney or agent for advice specific to your situation.
No Guarantees: We do not provide any guarantees as to the accuracy, completeness, or timeliness of the statistics presented above. Patent prosecution statistics are derived from publicly available USPTO data and are subject to data quality limitations, processing errors, and changes in USPTO practices over time.
Limitation of Liability: Under no circumstances will IronCrow AI be liable for any outcome, decision, or action resulting from your reliance on the statistics, analysis, or recommendations presented in this report. Past prosecution patterns do not guarantee future results.
Use at Your Own Risk: While we strive to provide accurate and useful prosecution statistics, you should independently verify any information that is material to your prosecution strategy and use your professional judgment in all patent prosecution matters.