Detailed information about the 100 most recent patent applications.
| Application Number | Title | Filing Date | Disposal Date | Disposition | Time (months) | Office Actions | Restrictions | Interview | Appeal |
|---|---|---|---|---|---|---|---|---|---|
| 18825040 | ETCHING DEVICE AND ETCHING METHOD THEREOF | September 2024 | March 2026 | Allow | 18 | 1 | 0 | Yes | No |
| 18730489 | SEMICONDUCTOR PROCESS DEVICE AND PROCESS CHAMBER THEREOF | July 2024 | November 2025 | Allow | 16 | 0 | 0 | No | No |
| 18750473 | METHOD OF PERFORMING MAINTENANCE ON SUBSTRATE PROCESSING APPARATUS | June 2024 | February 2025 | Allow | 7 | 1 | 0 | No | No |
| 18744079 | CLEANING ASSEMBLIES FOR SUBSTRATE PROCESSING CHAMBERS | June 2024 | November 2025 | Allow | 17 | 1 | 0 | Yes | No |
| 18740411 | SOLIDS VAPORIZER | June 2024 | March 2025 | Allow | 9 | 1 | 0 | No | No |
| 18667069 | SHOWER HEAD, SUBSTRATE PROCESSING APPARATUS, AND SUBSTRATE PROCESSING METHOD | May 2024 | December 2025 | Allow | 19 | 0 | 1 | Yes | No |
| 17924293 | METHOD FOR MANUFACTURING SEMICONDUCTOR STRUCTURE AND SEMICONDUCTOR GROWTH DEVICE | May 2024 | July 2025 | Abandon | 32 | 2 | 0 | No | No |
| 18630603 | SYSTEMS AND METHODS FOR METASTABLE ACTIVATED RADICAL SELECTIVE STRIP AND ETCH USING DUAL PLENUM SHOWERHEAD | April 2024 | December 2024 | Allow | 8 | 2 | 0 | Yes | No |
| 18630683 | SYSTEMS AND METHODS FOR METASTABLE ACTIVATED RADICAL SELECTIVE STRIP AND ETCH USING DUAL PLENUM SHOWERHEAD | April 2024 | November 2024 | Allow | 8 | 2 | 0 | Yes | No |
| 18630726 | SYSTEMS AND METHODS FOR METASTABLE ACTIVATED RADICAL SELECTIVE STRIP AND ETCH USING DUAL PLENUM SHOWERHEAD | April 2024 | December 2025 | Allow | 20 | 1 | 0 | Yes | No |
| 18626047 | SEMICONDUCTOR PROCESSING CHAMBERS AND METHODS FOR CLEANING THE SAME | April 2024 | January 2026 | Allow | 22 | 0 | 0 | No | No |
| 18442865 | APPARATUS AND ASSOCIATED ACCESSORIES, METHODS AND USES FOR VISUALISING A PRINT ON AN OBJECT | February 2024 | May 2025 | Allow | 15 | 1 | 0 | No | No |
| 18526472 | SUBSTRATE PROCESSING APPARATUS, PROCESSING METHOD, AND NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUM | December 2023 | March 2025 | Allow | 16 | 0 | 0 | Yes | No |
| 18475355 | ATOMIC LAYER DEPOSITION APPARATUS | September 2023 | November 2023 | Allow | 2 | 0 | 0 | No | No |
| 18373364 | SEMICONDUCTOR MANUFACTURING APPARATUS | September 2023 | December 2025 | Allow | 26 | 2 | 1 | Yes | No |
| 18368285 | DIFFERENTIAL CAPACITIVE SENSOR FOR IN-SITU FILM THICKNESS AND DIELECTRIC CONSTANT MEASUREMENT | September 2023 | September 2024 | Allow | 12 | 0 | 0 | No | No |
| 18457821 | WAFER TRANSFER CARRIER AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD | August 2023 | January 2026 | Allow | 28 | 0 | 1 | No | No |
| 18456810 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD | August 2023 | September 2025 | Allow | 24 | 0 | 1 | No | No |
| 18452918 | SUBSTRATE TREATING METHOD AND SUBSTRATE TREATING APPARATUS | August 2023 | January 2025 | Allow | 17 | 1 | 0 | Yes | No |
| 18446984 | ALD APPARATUS, METHOD AND VALVE | August 2023 | September 2025 | Allow | 25 | 1 | 0 | No | No |
| 18355224 | METHOD FOR USING SHIELD PLATE IN A CVD REACTOR | July 2023 | May 2024 | Allow | 10 | 0 | 0 | Yes | No |
| 18353293 | SUBSTRATE PROCESSING DEVICE AND METHOD FOR OPERATING THE SAME | July 2023 | October 2025 | Allow | 27 | 0 | 1 | Yes | No |
| 18218579 | WAFER EDGE PROFILE CONTROL USING CONNECTED EDGE RING HARDWARE | July 2023 | January 2026 | Allow | 31 | 0 | 0 | No | No |
| 18217696 | SYSTEMS AND METHODS FOR METASTABLE ACTIVATED RADICAL SELECTIVE STRIP AND ETCH USING DUAL PLENUM SHOWERHEAD | July 2023 | September 2024 | Allow | 14 | 1 | 0 | Yes | No |
| 18205415 | METHOD AND APPARATUS FOR SUPPLYING IMPROVED GAS FLOW TO A PROCESSING VOLUME OF A PROCESSING CHAMBER | June 2023 | December 2025 | Allow | 30 | 2 | 0 | Yes | No |
| 18323769 | PLASMA PROCESSING APPARATUS AND METHOD | May 2023 | June 2025 | Allow | 25 | 0 | 1 | No | No |
| 18199223 | Showerhead Assembly with Heated Showerhead | May 2023 | March 2026 | Allow | 34 | 1 | 0 | No | No |
| 18035456 | SUBLIMATION CONTROL USING DOWNSTREAM PRESSURE SENSING | May 2023 | August 2025 | Allow | 27 | 2 | 1 | Yes | No |
| 18140444 | SEMICONDUCTOR DEVICE FABRICATION METHODS AND DEVICES FOR FORMING THE SAME | April 2023 | September 2025 | Allow | 28 | 0 | 1 | No | No |
| 18298416 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD | April 2023 | December 2025 | Allow | 32 | 1 | 1 | No | No |
| 18132593 | METHODS AND SYSTEMS FOR DEPOSITING A LAYER | April 2023 | January 2026 | Allow | 33 | 1 | 0 | No | No |
| 18029898 | APPARATUS AND METHOD FOR FORMING THIN FILM | March 2023 | August 2025 | Allow | 28 | 2 | 1 | Yes | No |
| 18121479 | GAS INJECTION APPARATUS FOR LAYER DEPOSITION | March 2023 | March 2026 | Allow | 36 | 0 | 0 | No | No |
| 18115738 | SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD | February 2023 | June 2025 | Allow | 28 | 0 | 1 | No | No |
| 18173763 | DEPOSITION APPARATUS | February 2023 | January 2026 | Allow | 35 | 0 | 0 | No | No |
| 18106857 | SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD | February 2023 | June 2025 | Allow | 28 | 0 | 1 | No | No |
| 18101749 | COATING APPARATUS | January 2023 | February 2026 | Allow | 37 | 4 | 0 | Yes | No |
| 18097559 | SEQUENTIAL INFILTRATION SYNTHESIS APPARATUS | January 2023 | December 2023 | Allow | 11 | 1 | 0 | No | No |
| 18093010 | SEMICONDUCTOR WAFER PROCESSING TOOL WITH IMPROVED LEAK CHECK | January 2023 | March 2026 | Allow | 39 | 0 | 1 | No | No |
| 18080935 | DEPOSITION APPARATUS AND METHOD OF CLEANSING THE SAME | December 2022 | October 2025 | Abandon | 34 | 4 | 1 | Yes | No |
| 18080206 | FILTER STRUCTURE AND SUBSTRATE TREATING SYSTEM INCLUDING FILTER STRUCTURE | December 2022 | February 2026 | Allow | 38 | 1 | 0 | Yes | No |
| 18077607 | SUBSTRATE PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | December 2022 | December 2023 | Allow | 12 | 1 | 0 | No | No |
| 18076062 | SINTERED MATERIAL, SEMICONDUCTOR MANUFACTURING APPARATUS INCLUDING THE SAME, AND METHOD OF MANUFACTURING THE SINTERED MATERIAL | December 2022 | January 2026 | Allow | 38 | 2 | 0 | Yes | No |
| 18074872 | APPARATUS AND METHODS TO REDUCE PARTICLES IN A FILM DEPOSITION CHAMBER | December 2022 | November 2024 | Abandon | 23 | 2 | 0 | No | No |
| 18008325 | SPLIT SHOWERHEAD COOLING PLATE | December 2022 | August 2025 | Allow | 33 | 0 | 0 | No | No |
| 18070034 | SEMICONDUCTOR CHAMBER COMPONENTS WITH HIGH-PERFORMANCE COATING | November 2022 | September 2025 | Allow | 33 | 1 | 0 | Yes | No |
| 17991826 | DEFECT-REDUCING COATING METHOD | November 2022 | December 2025 | Abandon | 36 | 1 | 0 | No | No |
| 17985594 | Apparatus and Methods for Self-Assembled Monolayer (SAM) Deposition in Semiconductor Equipment | November 2022 | October 2025 | Allow | 35 | 1 | 0 | Yes | No |
| 17979074 | DUAL DEPOSITION CHAMBER APPARATUS FOR PRODUCING SILICON MATERIAL | November 2022 | November 2025 | Abandon | 36 | 1 | 0 | No | No |
| 17922279 | HEATER DESIGN SOLUTIONS FOR CHEMICAL DELIVERY SYSTEMS | October 2022 | July 2025 | Allow | 32 | 0 | 0 | No | No |
| 17921871 | SHOWERHEAD DESIGNS FOR CONTROLLING DEPOSITION ON WAFER BEVEL/EDGE | October 2022 | June 2025 | Allow | 31 | 0 | 0 | No | No |
| 18045419 | REACTOR MANIFOLDS | October 2022 | September 2025 | Allow | 35 | 1 | 0 | Yes | No |
| 17958282 | ASYMMETRIC INJECTION FOR BETTER WAFER UNIFORMITY | September 2022 | December 2023 | Allow | 14 | 1 | 0 | No | No |
| 17946842 | ATOMIC LAYER DEPOSITION PART COATING CHAMBER | September 2022 | October 2025 | Allow | 37 | 1 | 0 | Yes | No |
| 17943843 | SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUM | September 2022 | August 2023 | Allow | 11 | 0 | 0 | Yes | No |
| 17901521 | SUBSTRATE PROCESSING APPARATUS | September 2022 | June 2025 | Allow | 34 | 1 | 0 | No | No |
| 17892780 | SUBSTRATE PROCESSING APPARATUS | August 2022 | September 2025 | Allow | 37 | 1 | 0 | Yes | No |
| 17871826 | SCREWLESS SEMICONDUCTOR PROCESSING CHAMBERS | July 2022 | August 2024 | Allow | 24 | 2 | 0 | No | No |
| 17871607 | PROCESS KITS AND RELATED METHODS FOR PROCESSING CHAMBERS TO FACILITATE DEPOSITION PROCESS ADJUSTABILITY | July 2022 | December 2024 | Allow | 29 | 3 | 2 | Yes | No |
| 17814007 | MECHANISMS FOR SUPPLYING PROCESS GAS INTO WAFER PROCESS APPARATUS | July 2022 | March 2025 | Allow | 32 | 0 | 0 | Yes | No |
| 17867589 | APPARATUS AND METHOD FOR CONTROLLING A FLOW PROCESS MATERIAL TO A DEPOSITION CHAMBER | July 2022 | June 2025 | Allow | 35 | 1 | 0 | No | No |
| 17863422 | PLASMA PROCESSING APPARATUS, METHOD FOR MANUFACTURING UPPER ELECTRODE ASSEMBLY, AND METHOD FOR REPRODUCING UPPER ELECTRODE ASSEMBLY | July 2022 | August 2025 | Allow | 37 | 1 | 1 | Yes | No |
| 17863173 | PAD RAISING MECHANISM IN WAFER POSITIONING PEDESTAL FOR SEMICONDUCTOR PROCESSING | July 2022 | December 2023 | Allow | 17 | 1 | 0 | No | No |
| 17860573 | SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND RECORDING MEDIUM | July 2022 | December 2025 | Allow | 41 | 1 | 0 | Yes | No |
| 17857984 | METAL COMPONENT AND MANUFACTURING METHOD THEREOF AND PROCESS CHAMBER HAVING THE METAL COMPONENT | July 2022 | January 2024 | Abandon | 18 | 1 | 0 | No | No |
| 17856613 | METHOD FOR CONTROLLING A PROCESSING SYSTEM | July 2022 | July 2024 | Allow | 24 | 2 | 0 | Yes | No |
| 17847585 | CONTROL VALVE, SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND RECORDING MEDIUM | June 2022 | August 2025 | Abandon | 37 | 0 | 1 | No | No |
| 17832775 | FILM THICKNESS UNIFORMITY IMPROVEMENT USING EDGE RING AND BIAS ELECTRODE GEOMETRY | June 2022 | November 2024 | Allow | 30 | 3 | 0 | Yes | No |
| 17613684 | FLOW PATH MEMBER | May 2022 | September 2025 | Allow | 46 | 1 | 1 | Yes | No |
| 17756681 | PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD | May 2022 | March 2025 | Allow | 34 | 1 | 1 | No | No |
| 17804128 | APPARATUS FOR PERFORMING FILM FORMING PROCESS ON SUBSTRATE AND METHOD OF USING VACUUM CHUCK MECHANISM PROVIDED IN THE APPARATUS | May 2022 | November 2024 | Allow | 30 | 0 | 0 | No | No |
| 17744852 | RING CARRIER AND SUBSTRATE TREATING SYSTEM | May 2022 | February 2025 | Allow | 33 | 1 | 0 | No | No |
| 17742637 | TUNABLE PLASMA EXCLUSION ZONE IN SEMICONDUCTOR FABRICATION | May 2022 | February 2025 | Allow | 33 | 1 | 1 | No | No |
| 17722874 | SHADOW MASK APPARATUS AND METHODS FOR VARIABLE ETCH DEPTHS | April 2022 | May 2025 | Allow | 37 | 1 | 0 | No | No |
| 17656009 | GAS SUPPLY APPARATUS, GAS SUPPLY METHOD, AND SUBSTRATE PROCESSING APPARATUS | March 2022 | January 2024 | Allow | 21 | 1 | 1 | Yes | No |
| 17689565 | VAPORIZER, SUBSTRATE PROCESSING APPARATUS AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE | March 2022 | January 2024 | Allow | 22 | 1 | 0 | No | No |
| 17682457 | MULTI-CHAMBER SEMICONDUCTOR MANUFACTURING SYSTEM | February 2022 | February 2025 | Allow | 35 | 1 | 0 | No | No |
| 17681186 | SOLIDS VAPORIZER | February 2022 | March 2024 | Allow | 25 | 2 | 1 | Yes | No |
| 17432343 | ETCHING DEVICE AND ETCHING METHOD THEREOF | February 2022 | September 2025 | Allow | 49 | 2 | 1 | No | No |
| 17590681 | GAS HUB FOR PLASMA REACTOR | February 2022 | March 2023 | Allow | 14 | 0 | 0 | Yes | No |
| 17582188 | Graphite Plate | January 2022 | October 2024 | Abandon | 33 | 2 | 0 | Yes | No |
| 17648436 | PLASMA PROCESSING APPARATUS | January 2022 | March 2024 | Allow | 26 | 0 | 0 | No | No |
| 17576216 | SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND RECORDING MEDIUM | January 2022 | October 2024 | Allow | 33 | 1 | 1 | Yes | No |
| 17575049 | SYSTEMS AND METHODS FOR STORAGE AND SUPPLY OF F3NO-FREE FNO GASES AND F3NO-FREE FNO GAS MIXTURES FOR SEMICONDUCTOR PROCESSES | January 2022 | May 2024 | Allow | 28 | 3 | 0 | No | No |
| 17565808 | SUBSTRATE PROCESSING APPARATUS, METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND RECORDING MEDIUM | December 2021 | September 2024 | Allow | 33 | 0 | 1 | No | No |
| 17646426 | LOAD ASSEMBLIES FOR LOADING PARTS IN A FURNACE | December 2021 | February 2024 | Allow | 25 | 2 | 1 | Yes | No |
| 17644028 | ASYMMETRICAL SEALING AND GAS FLOW CONTROL DEVICE | December 2021 | May 2024 | Allow | 30 | 2 | 0 | Yes | No |
| 17643718 | SHOWERHEAD SHROUD | December 2021 | March 2022 | Allow | 3 | 0 | 0 | No | No |
| 17519596 | PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD | November 2021 | June 2024 | Allow | 32 | 0 | 1 | Yes | No |
| 17517253 | RECIPE UPDATING METHOD | November 2021 | September 2024 | Allow | 35 | 0 | 1 | No | No |
| 17605587 | GAS DISTRIBUTION UNIT IN CONNECTION WITH ALD REACTOR | October 2021 | March 2022 | Allow | 5 | 0 | 0 | Yes | No |
| 17507956 | PROCESSING SYSTEM AND PROCESSING METHOD | October 2021 | July 2025 | Abandon | 45 | 3 | 1 | No | No |
| 17605633 | PRECURSOR SUPPLY CHAMBER | October 2021 | December 2025 | Allow | 50 | 4 | 0 | Yes | No |
| 17604579 | WORKPIECE CARRIER DEVICE, METHOD FOR COATING A WORKPIECE, AND WORKPIECE | October 2021 | April 2025 | Allow | 42 | 3 | 0 | Yes | No |
| 17450886 | PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD | October 2021 | July 2023 | Allow | 21 | 0 | 1 | No | No |
| 17603429 | APPARATUSES AND METHOD FOR ORIENTED DEPOSITION | October 2021 | September 2024 | Allow | 36 | 1 | 2 | No | No |
| 17477750 | IN-SITU SEMICONDUCTOR PROCESSING CHAMBER TEMPERATURE APPARATUS | September 2021 | August 2024 | Allow | 35 | 2 | 1 | Yes | No |
| 17468536 | METHOD AND APPARATUS FOR POST EXPOSURE PROCESSING OF PHOTORESIST WAFERS | September 2021 | October 2023 | Allow | 25 | 0 | 0 | Yes | No |
| 17445562 | SUPPRESSION OF PARASITIC DEPOSITION IN A SUBSTRATE PROCESSING SYSTEM BY SUPPRESSING PRECURSOR FLOW AND PLASMA OUTSIDE OF SUBSTRATE REGION | August 2021 | March 2023 | Allow | 19 | 0 | 0 | Yes | No |
| 17407641 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD | August 2021 | June 2023 | Abandon | 22 | 1 | 1 | No | No |
This analysis examines appeal outcomes and the strategic value of filing appeals for examiner LUND, JEFFRIE ROBERT.
With a 40.9% reversal rate, the PTAB reverses the examiner's rejections in a meaningful percentage of cases. This reversal rate is above the USPTO average, indicating that appeals have better success here than typical.
Filing a Notice of Appeal can sometimes lead to allowance even before the appeal is fully briefed or decided by the PTAB. This occurs when the examiner or their supervisor reconsiders the rejection during the mandatory appeal conference (MPEP § 1207.01) after the appeal is filed.
In this dataset, 29.0% of applications that filed an appeal were subsequently allowed. This appeal filing benefit rate is below the USPTO average, suggesting that filing an appeal has limited effectiveness in prompting favorable reconsideration.
✓ Appeals to PTAB show good success rates. If you have a strong case on the merits, consider fully prosecuting the appeal to a Board decision.
⚠ Filing a Notice of Appeal shows limited benefit. Consider other strategies like interviews or amendments before appealing.
Examiner LUND, JEFFRIE ROBERT works in Art Unit 1716 and has examined 729 patent applications in our dataset. With an allowance rate of 67.2%, this examiner has a below-average tendency to allow applications. Applications typically reach final disposition in approximately 41 months.
Examiner LUND, JEFFRIE ROBERT's allowance rate of 67.2% places them in the 29% percentile among all USPTO examiners. This examiner has a below-average tendency to allow applications.
On average, applications examined by LUND, JEFFRIE ROBERT receive 2.47 office actions before reaching final disposition. This places the examiner in the 72% percentile for office actions issued. This examiner issues a slightly above-average number of office actions.
The median time to disposition (half-life) for applications examined by LUND, JEFFRIE ROBERT is 41 months. This places the examiner in the 20% percentile for prosecution speed. Applications take longer to reach final disposition with this examiner compared to most others.
Conducting an examiner interview provides a +23.0% benefit to allowance rate for applications examined by LUND, JEFFRIE ROBERT. This interview benefit is in the 69% percentile among all examiners. Recommendation: Interviews provide an above-average benefit with this examiner and are worth considering.
When applicants file an RCE with this examiner, 15.6% of applications are subsequently allowed. This success rate is in the 12% percentile among all examiners. Strategic Insight: RCEs show lower effectiveness with this examiner compared to others. Consider whether a continuation application might be more strategic, especially if you need to add new matter or significantly broaden claims.
This examiner enters after-final amendments leading to allowance in 26.3% of cases where such amendments are filed. This entry rate is in the 36% percentile among all examiners. Strategic Recommendation: This examiner shows below-average receptiveness to after-final amendments. You may need to file an RCE or appeal rather than relying on after-final amendment entry.
When applicants request a pre-appeal conference (PAC) with this examiner, 80.0% result in withdrawal of the rejection or reopening of prosecution. This success rate is in the 62% percentile among all examiners. Strategic Recommendation: Pre-appeal conferences show above-average effectiveness with this examiner. If you have strong arguments, a PAC request may result in favorable reconsideration.
This examiner withdraws rejections or reopens prosecution in 52.7% of appeals filed. This is in the 23% percentile among all examiners. Of these withdrawals, 28.6% occur early in the appeal process (after Notice of Appeal but before Appeal Brief). Strategic Insight: This examiner rarely withdraws rejections during the appeal process compared to other examiners. If you file an appeal, be prepared to fully prosecute it to a PTAB decision. Per MPEP § 1207, the examiner will prepare an Examiner's Answer maintaining the rejections.
When applicants file petitions regarding this examiner's actions, 64.9% are granted (fully or in part). This grant rate is in the 70% percentile among all examiners. Strategic Note: Petitions show above-average success regarding this examiner's actions. Petitionable matters include restriction requirements (MPEP § 1002.02(c)(2)) and various procedural issues.
Examiner's Amendments: This examiner makes examiner's amendments in 4.1% of allowed cases (in the 83% percentile). Per MPEP § 1302.04, examiner's amendments are used to place applications in condition for allowance when only minor changes are needed. This examiner frequently uses this tool compared to other examiners, indicating a cooperative approach to getting applications allowed. Strategic Insight: If you are close to allowance but minor claim amendments are needed, this examiner may be willing to make an examiner's amendment rather than requiring another round of prosecution.
Quayle Actions: This examiner issues Ex Parte Quayle actions in 0.0% of allowed cases (in the 4% percentile). This examiner rarely issues Quayle actions compared to other examiners. Allowances typically come directly without a separate action for formal matters.
Based on the statistical analysis of this examiner's prosecution patterns, here are tailored strategic recommendations:
Not Legal Advice: The information provided in this report is for informational purposes only and does not constitute legal advice. You should consult with a qualified patent attorney or agent for advice specific to your situation.
No Guarantees: We do not provide any guarantees as to the accuracy, completeness, or timeliness of the statistics presented above. Patent prosecution statistics are derived from publicly available USPTO data and are subject to data quality limitations, processing errors, and changes in USPTO practices over time.
Limitation of Liability: Under no circumstances will IronCrow AI be liable for any outcome, decision, or action resulting from your reliance on the statistics, analysis, or recommendations presented in this report. Past prosecution patterns do not guarantee future results.
Use at Your Own Risk: While we strive to provide accurate and useful prosecution statistics, you should independently verify any information that is material to your prosecution strategy and use your professional judgment in all patent prosecution matters.