USPTO Examiner FORD NATHAN K - Art Unit 1716

Recent Applications

Detailed information about the 100 most recent patent applications.

Application NumberTitleFiling DateDisposal DateDispositionTime (months)Office ActionsRestrictionsInterviewAppeal
18664004WAFER TREATMENT DEVICEMay 2024June 2025Allow1310NoNo
18417567REMOTE LASER-BASED SAMPLE HEATER WITH SAMPLE EXCHANGE TURRETJanuary 2024June 2025Allow1731YesNo
18400396SYSTEM AND METHOD FOR MANUFACTURING PLURALITY OF INTEGRATED CIRCUITSDecember 2023September 2025Abandon2120NoNo
18389827PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUSDecember 2023October 2025Abandon2221NoNo
18454350Device for the Thermal Processing of Metallurgy PartsAugust 2023February 2025Abandon1831NoNo
18163315METHOD OF OPERATING A DEPOSITION OR CLEANING APPARATUSFebruary 2023January 2024Allow1110YesNo
18095680ADAPTIVE FOCUSING AND TRANSPORT SYSTEM FOR ELECTROPLATINGJanuary 2023November 2023Allow1020YesNo
17970990FLOATING TOOLING ASSEMBLY FOR CHEMICAL VAPOR INFILTRATIONOctober 2022June 2025Allow3221YesNo
17886712VACUUM PROCESSING APPARATUSAugust 2022July 2025Abandon3520NoNo
17861750BATCH CURING CHAMBER WITH GAS DISTRIBUTION AND INDIVIDUAL PUMPINGJuly 2022September 2024Allow2620YesNo
17757234GAS RING FOR A PVD SOURCEJune 2022May 2025Abandon3610NoNo
17726445WAFER TREATMENT DEVICEApril 2022February 2024Allow2210NoNo
17764106SUBSTRATE FIXING DEVICE FOR SCINTILLATOR DEPOSITION, SUBSTRATE DEPOSITION APPARATUS INCLUDING THE SAME, AND METHOD OF DEPOSITING A SCINTILLATOR USING THE SAMEMarch 2022September 2025Abandon4221NoNo
17584852ADAPTIVE FOCUSING AND TRANSPORT SYSTEM FOR ELECTROPLATINGJanuary 2022October 2023Allow2140YesNo
17622340ATOMIC LAYER DEPOSITION APPARATUSDecember 2021April 2024Abandon2740NoNo
17519594SUBSTRATE TREATMENT APPARATUS AND SUBSTRATE TREATMENT METHODNovember 2021November 2025Abandon4822NoNo
17498194SUBSTRATE TREATING APPARATUS AND SUBSTRATE TRANSFERRING METHODOctober 2021September 2024Abandon3620NoNo
17305203CONTINUOUS-FEED CHEMICAL VAPOR DEPOSITION SYSTEMJuly 2021January 2026Abandon5552YesNo
17340766Heat Shield for Chamber Door and Devices Manufactured Using SameJune 2021April 2024Allow3521YesNo
17212946CHAMBER DESIGN FOR SEMICONDUCTOR PROCESSINGMarch 2021October 2023Abandon3110NoNo
17154851PROCESS CHAMBER WITH SIDE SUPPORTJanuary 2021August 2025Allow5441YesYes
17128494TUBULAR PECVD DEVICE FOR BIFACIAL PERC SOLAR CELLDecember 2020April 2023Abandon2821NoNo
17120721Process Kit Conditioning ChamberDecember 2020July 2024Abandon4322NoNo
17251442PLASMA BOAT FOR RECEIVING WAFERS WITH REGULATED PLASMA DEPOSITIONDecember 2020September 2023Allow3420YesNo
17107008APPARATUS AND METHOD FOR TREATING SUBSTRATENovember 2020April 2025Abandon5340YesNo
17105753JIG, PROCESSING SYSTEM AND PROCESSING METHODNovember 2020December 2025Abandon6041YesNo
17103847FEEDFORWARD CONTROL OF MULTI-LAYER STACKS DURING DEVICE FABRICATIONNovember 2020February 2026Abandon6051YesNo
17101127SUBSTRATE TREATING APPARATUS AND SUBSTRATE TRANSPORTING METHODNovember 2020March 2024Allow3921YesNo
17069411SUBSTRATE PROCESSING SYSTEM AND METHOD FOR REPLACING EDGE RINGOctober 2020July 2025Abandon5741YesNo
17028550MOVABLE ELECTRODE FOR PROCESS CHAMBERSeptember 2020May 2025Abandon5631YesNo
17015776SUBSTRATE PROCESSING APPARATUSSeptember 2020February 2026Allow6071YesYes
17013339SELF ALIGNING WAFER CARRIER PEDESTAL ELEMENT WITH POWER CONTACTSSeptember 2020August 2023Abandon3601NoNo
16992894TRANSFER CHAMBER WITH INTEGRATED SUBSTRATE PRE-PROCESS CHAMBERAugust 2020August 2022Abandon2410NoNo
16965238SYSTEM AND METHOD FOR MANUFACTURING PLURALITY OF INTEGRATED CIRCUITSJuly 2020February 2024Abandon4231YesNo
16934227DISTRIBUTION COMPONENTS FOR SEMICONDUCTOR PROCESSING SYSTEMSJuly 2020December 2025Abandon6041YesNo
16926104PROCESS KIT WITH PROTECTIVE CERAMIC COATINGS FOR HYDROGEN AND NH3 PLASMA APPLICATIONJuly 2020June 2025Abandon5960YesNo
16946407BATCH WAFER DEGAS CHAMBER AND INTEGRATION INTO FACTORY INTERFACE AND VACUUM-BASED MAINFRAMEJune 2020November 2024Abandon5340YesNo
16901566FILM-FORMING DEVICEJune 2020November 2023Allow4120YesNo
16889599HIGH TEMPERATURE AND VACUUM ISOLATION PROCESSING MINI-ENVIRONMENTSJune 2020June 2025Allow6051YesNo
16874776MAGNETIC DRIVE APPARATUS AND MAGNETIZING METHODMay 2020March 2023Allow3431YesNo
15930943Systems And Methods For Transportation Of Replaceable Parts In a Vacuum Processing ApparatusMay 2020January 2024Abandon4440YesYes
16652647CLOSURE ELEMENT FOR CLOSING A LOADING OPENING OF AN INNER HOUSING OF A CVD REACTORApril 2020March 2023Allow3620YesNo
16854295PROCESSING CHAMBER FOR THERMAL PROCESSESApril 2020May 2025Abandon6040YesYes
16756548METHOD AND APPARATUS FOR TREATING A SUBSTRATEApril 2020July 2024Abandon5131YesNo
16827007METHOD AND APPARATUS FOR INLINE COATING OF SUBSTRATESMarch 2020September 2022Abandon3020YesYes
16812505SUBSTRATE PROCESSING APPARATUSMarch 2020August 2022Abandon3040YesNo
16812432SUBSTRATE PROCESSING APPARATUSMarch 2020March 2024Allow4831YesNo
16786553METHOD AND APPARATUS FOR MULTILEVEL FABRICATORSFebruary 2020October 2023Abandon4521NoNo
16630388EFEM AND EFEM SYSTEMJanuary 2020December 2023Abandon4721NoNo
16711658ALIGNMENT APPARATUS, DEPOSITION APPARATUS, ELECTRONIC DEVICE MANUFACTURING APPARATUS, AND ALIGNMENT METHODDecember 2019April 2025Allow6060YesNo
16711942MULTI-STATION PROCESSING CHAMBER FOR SEMICONDUCTORDecember 2019January 2024Abandon5041NoNo
16700376FREE-SPAN COATING SYSTEMS AND METHODSDecember 2019February 2026Abandon6061YesYes
16612322VACUUM PROCESSING DEVICENovember 2019June 2023Allow4350YesNo
16677446TEMPERATURE-INDEXED THIN FILM DEPOSITION REACTORSNovember 2019February 2025Abandon6090YesNo
16667986SYSTEMS FOR WORKPIECE PROCESSINGOctober 2019December 2024Allow6030YesYes
16595496VACUUM PROCESS APPARATUS AND VACUUM PROCESS METHODOctober 2019January 2023Abandon3931NoNo
16591800COOLING STRUCTURE AND PARALLEL PLATE ETCHING APPARATUSOctober 2019May 2022Abandon3230YesNo
16496378SUBSTRATE PROCESSING DEVICESeptember 2019August 2022Allow3440NoNo
16567818SUPPORT ASSEMBLYSeptember 2019July 2022Abandon3540YesNo
16564504VACUUM TRANSFER MODULE AND VACUUM TRANSFER METHODSeptember 2019July 2023Abandon4730YesNo
16481221DEPOSITION OR CLEANING APPARATUS WITH MOVABLE STRUCTUREJuly 2019April 2023Allow4580YesNo
16457967SUBSTRATE PROCESSING SYSTEMJune 2019December 2021Abandon2910NoNo
16430709TREATMENT APPARATUS FOR TREATING WORKPIECEJune 2019March 2023Abandon4640YesNo
16417348PROCESS KIT ENCLOSURE SYSTEMMay 2019August 2024Allow6061YesNo
16412818PLASMA PROCESS MONITORING DEVICE AND PLASMA PROCESSING APPARATUS INCLUDING THE SAMEMay 2019August 2023Allow5141YesNo
16396683In-Situ Wafer Rotation for Carousel Processing ChambersApril 2019June 2023Allow4941YesNo
16395488SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING SYSTEM, AND SUBSTRATE PROCESSING METHODApril 2019March 2024Abandon5891YesNo
16345105TREATMENT UNIT FOR A FACILITY FOR TREATING THE SURFACE OF A SUBSTRATE IN MOTION, CORRESPONDING FACILITY AND METHOD OF IMPLEMENTATIONApril 2019July 2024Allow6050YesNo
16344303FACILITY FOR TREATING THE SURFACE OF A MOVING SUBSTRATE IN A CONTROLLED ATMOSPHERE, AND METHOD FOR DEFINING THE SIZE THEREOFApril 2019June 2024Allow6061YesNo
16389444SEMICONDUCTOR MANUFACTURING APPARATUSApril 2019July 2021Allow2720YesNo
16356352SELF-AWARE AND CORRECTING HETEROGENOUS PLATFORM INCORPORATING INTEGRATED SEMICONDUCTOR PROCESSING MODULES AND METHOD FOR USING SAMEMarch 2019May 2025Abandon6061YesNo
16356681REACTOR FOR APPLYING A COATING ON INTERNAL SURFACES OF COMPONENTSMarch 2019March 2024Abandon6041YesYes
16356356SELF-AWARE AND CORRECTING HETEROGENOUS PLATFORM INCORPORATING INTEGRATED SEMICONDUCTOR PROCESSING MODULES AND METHOD FOR USING SAMEMarch 2019September 2024Abandon6060YesNo
16356334SELF-AWARE AND CORRECTING HETEROGENOUS PLATFORM INCORPORATING INTEGRATED SEMICONDUCTOR PROCESSING MODULES AND METHOD FOR USING SAMEMarch 2019November 2024Abandon6071YesNo
16299507Systems and Methods for Substrate CoolingMarch 2019August 2022Abandon4241YesNo
16263953Interchangeable Edge Rings For Stabilizing Wafer Placement And System Using SameJanuary 2019April 2025Abandon6071NoYes
16251534MULTI-ZONE REACTOR, SYSTEM INCLUDING THE REACTOR, AND METHOD OF USING THE SAMEJanuary 2019April 2023Allow5190YesNo
16318204APPARATUS FOR COATING PARTICLES, AND PROCESSJanuary 2019April 2022Abandon3921NoNo
16242107HEAT TREATING APPARATUS, COOLING METHOD FOR HEAT PLATE AND RECORDING MEDIUMJanuary 2019May 2024Abandon6040YesNo
16236024SUBSTRATE ATTACHING/DETACHING UNIT FOR SUBSTRATE HOLDER, WET-TYPE SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME, SUBSTRATE HOLDER CONVEYING METHOD, SUBSTRATE PROCESSING APPARATUS, AND SUBSTRATE CONVEYING METHODDecember 2018May 2021Abandon2931NoNo
16231662WAFER SUSCEPTORDecember 2018June 2023Abandon5350YesNo
16206594Semiconductor Device, Tool, and Method of ManufacturingNovember 2018December 2022Abandon4950YesNo
16202941SUBSTRATE PROCESSING APPARATUS FOR PROCESSING SUBSTRATESNovember 2018March 2024Allow6080YesNo
16095935UNIFORM PUMPING DUAL-STATION VACUUM PROCESSOROctober 2018February 2022Allow4030YesNo
16164214LOAD LOCK BODY PORTIONS, LOAD LOCK APPARATUS, AND METHODS FOR MANUFACTURING THE SAMEOctober 2018October 2024Abandon6040YesYes
16164392BATCH CURING CHAMBER WITH GAS DISTRIBUTION AND INDIVIDUAL PUMPINGOctober 2018April 2022Allow4230YesNo
16144723METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICESeptember 2018August 2020Abandon2320NoNo
16144552SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND COMPUTER STORAGE MEDIUMSeptember 2018May 2022Abandon4331YesNo
16138142PROCESS CHAMBER FOR FIELD GUIDED EXPOSURE AND METHOD FOR IMPLEMENTING THE PROCESS CHAMBERSeptember 2018October 2020Allow2501YesNo
16128182SEMICONDUCTOR DEVICE MANUFACTURING PLATFORM WITH SINGLE AND TWINNED PROCESSING CHAMBERSSeptember 2018April 2022Abandon4331YesNo
16122177INTEGRATED CHAMBER FOR VACUUM COATINGSeptember 2018January 2021Abandon2810NoNo
16112281MANUFACTURING PROCESSES TO SYNTHESIZE, FUNCTIONALIZE, SURFACE TREAT AND/OR ENCAPSULATE POWDERS, AND APPLICATIONS THEREOFAugust 2018June 2020Abandon2130YesNo
16039938SUBSTRATE-PROCESSING DEVICEJuly 2018July 2021Abandon3611NoNo
16023820SUBSTRATE PROCESSING APPARATUSJune 2018November 2024Abandon6080NoNo
16010223COATING APPARATUS AND METHOD OF USINGJune 2018November 2020Abandon2910NoNo
16007582VACUUM DEPOSITION PROCESSING OF MULTIPLE SUBSTRATESJune 2018March 2022Abandon4541YesNo
15779678APPARATUS AND METHOD FOR TREATING SURFACE OF FLUORINE-BASED RESIN FILMMay 2018March 2020Abandon2111NoNo
15777492A DEVICE FOR COATING ONE OR MORE YARNS BY A VAPOR DEPOSITION METHODMay 2018November 2019Allow1821YesNo
15953922DAMAGE FREE ENHANCEMENT OF DOPANT DIFFUSION INTO A SUBSTRATEApril 2018March 2020Abandon2321NoNo
15954511Semiconductor Processing System Having Multiple Decoupled Plasma SourcesApril 2018May 2022Abandon4922NoNo

Appeals Overview

This analysis examines appeal outcomes and the strategic value of filing appeals for examiner FORD, NATHAN K.

Patent Trial and Appeal Board (PTAB) Decisions

Total PTAB Decisions
37
Examiner Affirmed
26
(70.3%)
Examiner Reversed
11
(29.7%)
Reversal Percentile
46.2%
Lower than average

What This Means

With a 29.7% reversal rate, the PTAB affirms the examiner's rejections in the vast majority of cases. This reversal rate is below the USPTO average, indicating that appeals face more challenges here than typical.

Strategic Value of Filing an Appeal

Total Appeal Filings
94
Allowed After Appeal Filing
23
(24.5%)
Not Allowed After Appeal Filing
71
(75.5%)
Filing Benefit Percentile
33.3%
Lower than average

Understanding Appeal Filing Strategy

Filing a Notice of Appeal can sometimes lead to allowance even before the appeal is fully briefed or decided by the PTAB. This occurs when the examiner or their supervisor reconsiders the rejection during the mandatory appeal conference (MPEP § 1207.01) after the appeal is filed.

In this dataset, 24.5% of applications that filed an appeal were subsequently allowed. This appeal filing benefit rate is below the USPTO average, suggesting that filing an appeal has limited effectiveness in prompting favorable reconsideration.

Strategic Recommendations

Appeals to PTAB face challenges. Ensure your case has strong merit before committing to full Board review.

Filing a Notice of Appeal shows limited benefit. Consider other strategies like interviews or amendments before appealing.

Examiner FORD, NATHAN K - Prosecution Strategy Guide

Executive Summary

Examiner FORD, NATHAN K works in Art Unit 1716 and has examined 559 patent applications in our dataset. With an allowance rate of 32.6%, this examiner allows applications at a lower rate than most examiners at the USPTO. Applications typically reach final disposition in approximately 50 months.

Allowance Patterns

Examiner FORD, NATHAN K's allowance rate of 32.6% places them in the 5% percentile among all USPTO examiners. This examiner is less likely to allow applications than most examiners at the USPTO.

Office Action Patterns

On average, applications examined by FORD, NATHAN K receive 3.38 office actions before reaching final disposition. This places the examiner in the 93% percentile for office actions issued. This examiner issues more office actions than most examiners, which may indicate thorough examination or difficulty in reaching agreement with applicants.

Prosecution Timeline

The median time to disposition (half-life) for applications examined by FORD, NATHAN K is 50 months. This places the examiner in the 5% percentile for prosecution speed. Applications take longer to reach final disposition with this examiner compared to most others.

Interview Effectiveness

Conducting an examiner interview provides a +33.6% benefit to allowance rate for applications examined by FORD, NATHAN K. This interview benefit is in the 82% percentile among all examiners. Recommendation: Interviews are highly effective with this examiner and should be strongly considered as a prosecution strategy. Per MPEP § 713.10, interviews are available at any time before the Notice of Allowance is mailed or jurisdiction transfers to the PTAB.

Request for Continued Examination (RCE) Effectiveness

When applicants file an RCE with this examiner, 6.5% of applications are subsequently allowed. This success rate is in the 3% percentile among all examiners. Strategic Insight: RCEs show lower effectiveness with this examiner compared to others. Consider whether a continuation application might be more strategic, especially if you need to add new matter or significantly broaden claims.

After-Final Amendment Practice

This examiner enters after-final amendments leading to allowance in 21.2% of cases where such amendments are filed. This entry rate is in the 27% percentile among all examiners. Strategic Recommendation: This examiner shows below-average receptiveness to after-final amendments. You may need to file an RCE or appeal rather than relying on after-final amendment entry.

Pre-Appeal Conference Effectiveness

When applicants request a pre-appeal conference (PAC) with this examiner, 43.2% result in withdrawal of the rejection or reopening of prosecution. This success rate is in the 39% percentile among all examiners. Note: Pre-appeal conferences show below-average success with this examiner. Consider whether your arguments are strong enough to warrant a PAC request.

Appeal Withdrawal and Reconsideration

This examiner withdraws rejections or reopens prosecution in 50.0% of appeals filed. This is in the 14% percentile among all examiners. Of these withdrawals, 40.5% occur early in the appeal process (after Notice of Appeal but before Appeal Brief). Strategic Insight: This examiner rarely withdraws rejections during the appeal process compared to other examiners. If you file an appeal, be prepared to fully prosecute it to a PTAB decision. Per MPEP § 1207, the examiner will prepare an Examiner's Answer maintaining the rejections.

Petition Practice

When applicants file petitions regarding this examiner's actions, 51.9% are granted (fully or in part). This grant rate is in the 51% percentile among all examiners. Strategic Note: Petitions show above-average success regarding this examiner's actions. Petitionable matters include restriction requirements (MPEP § 1002.02(c)(2)) and various procedural issues.

Examiner Cooperation and Flexibility

Examiner's Amendments: This examiner makes examiner's amendments in 1.1% of allowed cases (in the 68% percentile). This examiner makes examiner's amendments more often than average to place applications in condition for allowance (MPEP § 1302.04).

Quayle Actions: This examiner issues Ex Parte Quayle actions in 0.0% of allowed cases (in the 4% percentile). This examiner rarely issues Quayle actions compared to other examiners. Allowances typically come directly without a separate action for formal matters.

Prosecution Strategy Recommendations

Based on the statistical analysis of this examiner's prosecution patterns, here are tailored strategic recommendations:

  • Prepare for rigorous examination: With a below-average allowance rate, ensure your application has strong written description and enablement support. Consider filing a continuation if you need to add new matter.
  • Expect multiple rounds of prosecution: This examiner issues more office actions than average. Address potential issues proactively in your initial response and consider requesting an interview early in prosecution.
  • Prioritize examiner interviews: Interviews are highly effective with this examiner. Request an interview after the first office action to clarify issues and potentially expedite allowance.
  • Plan for extended prosecution: Applications take longer than average with this examiner. Factor this into your continuation strategy and client communications.

Relevant MPEP Sections for Prosecution Strategy

  • MPEP § 713.10: Examiner interviews - available before Notice of Allowance or transfer to PTAB
  • MPEP § 714.12: After-final amendments - may be entered "under justifiable circumstances"
  • MPEP § 1002.02(c): Petitionable matters to Technology Center Director
  • MPEP § 1004: Actions requiring primary examiner signature (allowances, final rejections, examiner's answers)
  • MPEP § 1207.01: Appeal conferences - mandatory for all appeals
  • MPEP § 1214.07: Reopening prosecution after appeal

Important Disclaimer

Not Legal Advice: The information provided in this report is for informational purposes only and does not constitute legal advice. You should consult with a qualified patent attorney or agent for advice specific to your situation.

No Guarantees: We do not provide any guarantees as to the accuracy, completeness, or timeliness of the statistics presented above. Patent prosecution statistics are derived from publicly available USPTO data and are subject to data quality limitations, processing errors, and changes in USPTO practices over time.

Limitation of Liability: Under no circumstances will IronCrow AI be liable for any outcome, decision, or action resulting from your reliance on the statistics, analysis, or recommendations presented in this report. Past prosecution patterns do not guarantee future results.

Use at Your Own Risk: While we strive to provide accurate and useful prosecution statistics, you should independently verify any information that is material to your prosecution strategy and use your professional judgment in all patent prosecution matters.