Detailed information about the 100 most recent patent applications.
| Application Number | Title | Filing Date | Disposal Date | Disposition | Time (months) | Office Actions | Restrictions | Interview | Appeal |
|---|---|---|---|---|---|---|---|---|---|
| 18676513 | ETCHING DEVICE | May 2024 | October 2025 | Allow | 17 | 3 | 0 | No | No |
| 18209030 | PLASMA PROCESSING APPARATUS | June 2023 | March 2026 | Allow | 33 | 1 | 0 | Yes | No |
| 18328345 | PLASMA PROCESSING METHOD AND APPARATUS | June 2023 | January 2026 | Allow | 32 | 1 | 1 | Yes | No |
| 18301126 | COMPOSITE STAGE FOR ELECTRON ENHANCED MATERIAL PROCESSING | April 2023 | August 2025 | Abandon | 28 | 5 | 0 | Yes | No |
| 18130429 | HYBRID CHAMBER | April 2023 | March 2026 | Allow | 35 | 1 | 0 | Yes | No |
| 18026911 | SUBSTRATE PROCESSING APPARATUS | March 2023 | February 2026 | Allow | 35 | 1 | 0 | No | No |
| 18044648 | PLASMA PROCESSING APPARATUS AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD | March 2023 | October 2025 | Allow | 32 | 0 | 0 | No | No |
| 18107365 | PARYLENE COATING SYSTEM | February 2023 | November 2025 | Abandon | 33 | 2 | 1 | No | No |
| 18097728 | PLASMA PROCESSING APPARATUS AND PLASMA CONTROL METHOD USING MAGNETIC FIELD | January 2023 | September 2025 | Allow | 32 | 1 | 1 | Yes | No |
| 18092201 | CARRIER FOR END EFFECTOR, TRANSPORTATION APPARATUS INCLUDING THE SAME AND THE SUBSTRATE PROCESSING APPARATUS | December 2022 | January 2026 | Allow | 37 | 1 | 0 | No | No |
| 18147775 | SEMICONDUCTOR SUBSTRATE PROCESSING APPARATUS | December 2022 | January 2026 | Allow | 36 | 1 | 0 | Yes | No |
| 18067632 | CORROSION RESISTANT GROUND SHIELD OF PROCESSING CHAMBER | December 2022 | October 2025 | Allow | 34 | 1 | 0 | Yes | No |
| 18063888 | CHAMBER IMPEDANCE MANAGEMENT IN A PROCESSING CHAMBER | December 2022 | January 2026 | Allow | 37 | 1 | 1 | Yes | No |
| 18071192 | DYNAMIC SHEATH CONTROL WITH EDGE RING LIFT | November 2022 | August 2025 | Allow | 32 | 1 | 0 | Yes | No |
| 17983508 | METHODS AND APPARATUS FOR COATING FIBERS | November 2022 | September 2025 | Allow | 34 | 2 | 1 | Yes | No |
| 17971504 | ROTARY REACTOR FOR DEPOSITION OF FILMS ONTO PARTICLES | October 2022 | November 2025 | Allow | 37 | 2 | 1 | Yes | No |
| 17840500 | REMOTE MODULAR HIGH-FREQUENCY SOURCE | June 2022 | September 2025 | Allow | 39 | 2 | 0 | Yes | No |
| 17836792 | Equipment and Method for Improved Edge Uniformity of Plasma Processing of Wafers | June 2022 | July 2025 | Allow | 37 | 2 | 1 | No | No |
| 17782166 | DLC PREPARATION APPARATUS AND PREPARATION METHOD | June 2022 | November 2025 | Abandon | 42 | 4 | 1 | No | No |
| 17663907 | MICROWAVE PLASMA PROCESSING APPARATUS | May 2022 | June 2025 | Abandon | 37 | 2 | 0 | No | No |
| 17728794 | SYMMETRIC PLASMA PROCESS CHAMBER | April 2022 | October 2025 | Allow | 42 | 3 | 0 | Yes | No |
| 17696280 | PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD | March 2022 | February 2025 | Allow | 60 | 1 | 1 | Yes | No |
| 17666789 | PLASMA TREATMENT DEVICE AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE | February 2022 | September 2025 | Abandon | 44 | 4 | 0 | Yes | No |
| 17572563 | MONOPOLE ANTENNA ARRAY SOURCE FOR SEMICONDUCTOR PROCESS EQUIPMENT | January 2022 | March 2025 | Abandon | 38 | 3 | 0 | No | No |
| 17607301 | Method and System for Automated Frequency Tuning of Radiofrequency (RF) Signal Generator for Multi-Level RF Power Pulsing | October 2021 | January 2025 | Allow | 39 | 1 | 0 | No | No |
| 17510617 | SUPPORT UNIT, APPARATUS FOR TREATING SUBSTRATE, AND METHOD FOR TREATING SUBSTRATE | October 2021 | July 2025 | Allow | 44 | 2 | 1 | Yes | No |
| 17425945 | GASIFICATION DEVICE AND PLASMA SHUTTER WITH A MICROWAVE PLAZMA SLOWING SYSTEM OF THE GASIFICATION DEVICE | July 2021 | March 2022 | Allow | 7 | 0 | 0 | No | No |
| 17384155 | Plasma Etching Apparatus and Method | July 2021 | March 2025 | Allow | 44 | 3 | 1 | No | No |
| 17376601 | SEMICONDUCTOR EQUIPMENT AND METHOD FOR MANUFACTURING SEMICONDUCTOR STRUCTURE | July 2021 | August 2024 | Abandon | 37 | 2 | 1 | No | No |
| 17346754 | Air Leak Detection In Plasma Processing Apparatus With Separation Grid | June 2021 | September 2025 | Abandon | 51 | 4 | 0 | No | No |
| 17300384 | Method and apparatus for the fabrication of diamond by shockwaves | June 2021 | May 2023 | Allow | 23 | 4 | 1 | Yes | No |
| 17299979 | PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD | June 2021 | June 2025 | Allow | 49 | 2 | 1 | Yes | No |
| 17338826 | PLASMA PROCESSING APPARATUS | June 2021 | March 2025 | Allow | 45 | 2 | 1 | Yes | No |
| 17322241 | PLASMA PROCESSING APPARATUS | May 2021 | March 2023 | Allow | 22 | 1 | 0 | Yes | No |
| 17318727 | ELECTROSTATIC CHUCK, SUBSTRATE PROCESSING APPARATUS, AND SUBSTRATE PROCESSING METHOD | May 2021 | March 2025 | Allow | 46 | 3 | 0 | Yes | No |
| 17293052 | EVAPORATION COATING APPARATUS | May 2021 | October 2025 | Abandon | 53 | 2 | 0 | No | No |
| 17227442 | BATCH SUBSTRATE SUPPORT WITH WARPED SUBSTRATE CAPABILITY | April 2021 | May 2023 | Allow | 26 | 1 | 0 | Yes | No |
| 17220085 | EDGE RING, STAGE AND SUBSTRATE PROCESSING APPARATUS | April 2021 | January 2024 | Abandon | 34 | 2 | 0 | Yes | No |
| 17177900 | PLASMA PROCESSING APPARATUS AND METHOD OF MEASURING TEMPERATURE OF MEMBERS | February 2021 | April 2025 | Allow | 50 | 1 | 1 | Yes | No |
| 17176905 | MODULAR PRINT HEAD ASSEMBLY FOR PLASMA JET PRINTING | February 2021 | July 2023 | Abandon | 28 | 1 | 0 | No | No |
| 17175724 | PLASMA PROCESSING APPARATUS AND MATCHING METHOD | February 2021 | December 2025 | Allow | 58 | 3 | 1 | Yes | No |
| 17260233 | PLASMA TREATMENT DEVICE | January 2021 | February 2025 | Allow | 49 | 3 | 0 | Yes | No |
| 17149150 | PLASMA OBSERVATION SYSTEM AND PLASMA OBSERVATION METHOD | January 2021 | April 2023 | Allow | 27 | 1 | 1 | Yes | No |
| 17145247 | AZIMUTHAL SENSOR ARRAY FOR RADIO FREQUENCY PLASMA-BASED WAFER PROCESSING SYSTEMS | January 2021 | October 2025 | Abandon | 57 | 4 | 0 | Yes | Yes |
| 17125491 | Coating Apparatus and Coating Method | December 2020 | September 2024 | Allow | 45 | 2 | 1 | No | No |
| 17104038 | SUBSTRATE SUPPORT AND SUBSTRATE PROCESSING APPARATUS | November 2020 | November 2024 | Allow | 48 | 3 | 0 | Yes | No |
| 17058975 | METHOD OR APPARATUS FOR FORMING THIN FILM ON SUBSTRATE EMPLOYING ATOMIC LAYER EPITAXY METHOD | November 2020 | September 2024 | Abandon | 46 | 2 | 1 | No | No |
| 17105361 | LIQUID SOURCE VAPORIZATION APPARATUS, CONTROL METHOD FOR A LIQUID SOURCE VAPORIZATION APPARATUS AND PROGRAM RECORDING MEDIUM ON WHICH IS RECORDED A PROGRAM FOR A LIQUID SOURCE VAPORIZATION APPARATUS | November 2020 | December 2025 | Allow | 60 | 5 | 1 | Yes | No |
| 17104467 | EDGE RING AND SUBSTRATE PROCESSING APPARATUS | November 2020 | March 2023 | Allow | 28 | 1 | 0 | Yes | No |
| 16952875 | PLASMA PROCESSING APPARATUS, ELECTROSTATIC ATTRACTION METHOD, AND ELECTROSTATIC ATTRACTION PROGRAM | November 2020 | April 2023 | Allow | 29 | 1 | 0 | Yes | No |
| 16951005 | THERMAL CONDUCTIVE MEMBER, PLASMA PROCESSING APPARATUS, AND VOLTAGE CONTROL METHOD | November 2020 | January 2023 | Abandon | 26 | 2 | 1 | No | No |
| 17078728 | METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE | October 2020 | October 2025 | Allow | 60 | 4 | 2 | Yes | No |
| 17067912 | PLASMA PROCESSING APPARATUS | October 2020 | January 2024 | Abandon | 39 | 1 | 0 | No | No |
| 17038072 | PLASMA PROCESSING APPARATUS AND METHOD FOR RELEASING SAMPLE | September 2020 | July 2024 | Allow | 46 | 2 | 0 | Yes | No |
| 17037406 | PLASMA PROCESSING APPARATUS | September 2020 | December 2023 | Abandon | 38 | 1 | 0 | No | No |
| 17030522 | PLASMA PROCESSING APPARATUS | September 2020 | May 2022 | Allow | 20 | 1 | 0 | Yes | No |
| 16980501 | PLASMA PROCESSING APPARATUS | September 2020 | January 2025 | Abandon | 52 | 3 | 0 | No | No |
| 16979812 | FLOW RATE CONTROLLER, GAS SUPPLY SYSTEM, AND FLOW RATE CONTROL METHOD | September 2020 | March 2024 | Allow | 42 | 2 | 0 | Yes | No |
| 17011668 | HEAT MEDIUM CIRCULATION SYSTEM AND SUBSTRATE PROCESSING APPARATUS | September 2020 | October 2023 | Abandon | 37 | 2 | 0 | Yes | No |
| 17011145 | SUBSTRATE TREATING APPARATUS | September 2020 | July 2025 | Allow | 58 | 5 | 0 | Yes | No |
| 17009388 | PROCESSING APPARATUS AND PROCESSING METHOD | September 2020 | January 2024 | Abandon | 40 | 3 | 1 | No | No |
| 17008188 | TEMPERATURE-CONTROLLED CHEMICAL PROCESSING REACTOR | August 2020 | November 2023 | Allow | 39 | 2 | 1 | Yes | No |
| 17003479 | PLASMA PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME | August 2020 | June 2022 | Allow | 22 | 0 | 0 | Yes | No |
| 17000090 | APPARATUS FOR PROCESSING SUBSTRATE | August 2020 | February 2025 | Allow | 54 | 3 | 0 | No | No |
| 16987489 | SHUTTER FOR OPENING AND CLOSING ENTRANCE OF PROCESS CHAMBER, AND SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME | August 2020 | May 2025 | Abandon | 58 | 4 | 1 | No | No |
| 16924516 | FOCUS RING AND SUBSTRATE TREATING APPARATUS COMPRISING THE SAME | July 2020 | November 2024 | Abandon | 53 | 5 | 0 | Yes | No |
| 16923386 | PLASMA PROCESSING APPARATUS | July 2020 | November 2022 | Abandon | 28 | 2 | 0 | No | No |
| 16922587 | MODULAR PRINT HEAD ASSEMBLY FOR PLASMA JET PRINTING | July 2020 | December 2020 | Allow | 5 | 1 | 0 | Yes | No |
| 16921716 | SYMMETRIC AND IRREGULAR SHAPED PLASMAS USING MODULAR MICROWAVE SOURCES | July 2020 | March 2025 | Allow | 56 | 5 | 0 | No | No |
| 16918219 | APPARATUS AND METHOD FOR TREATING SUBSTRATE | July 2020 | November 2023 | Allow | 40 | 3 | 0 | Yes | No |
| 16918212 | APPARATUS AND METHOD FOR PROCESSING SUBSTRATE | July 2020 | February 2025 | Allow | 55 | 5 | 1 | Yes | No |
| 16958313 | PLASMA PROCESSING APPARATUS | June 2020 | February 2024 | Allow | 44 | 1 | 1 | Yes | No |
| 16913784 | FILM FORMING METHOD AND FILM FORMING APPARATUS | June 2020 | January 2023 | Abandon | 31 | 2 | 1 | No | No |
| 16913128 | APPARATUS AND METHOD FOR TREATING SUBSTRATE | June 2020 | October 2023 | Abandon | 40 | 4 | 1 | Yes | No |
| 16911531 | SUBSTRATE PROCESSING APPARATUS | June 2020 | January 2023 | Abandon | 31 | 2 | 0 | No | No |
| 16891425 | ELECTROSTATIC CHUCK, SUPPORT PLATFORM, AND PLASMA PROCESSING APPARATUS | June 2020 | September 2023 | Allow | 40 | 2 | 0 | Yes | No |
| 16855048 | APPARATUS FOR ETCHING SUBSTRATE BEVEL AND SEMICONDUCTOR FABRICATION METHOD USING THE SAME | April 2020 | June 2023 | Allow | 38 | 1 | 1 | Yes | No |
| 16814967 | Coating Apparatus and Coating Method | March 2020 | October 2023 | Allow | 43 | 2 | 2 | Yes | No |
| 16812593 | APPARATUS AND METHODS FOR ASYMMETRIC DEPOSITION OF METAL ON HIGH ASPECT RATIO NANOSTRUCTURES | March 2020 | March 2022 | Abandon | 25 | 1 | 0 | No | No |
| 16791947 | SYMMETRIC PLASMA PROCESS CHAMBER | February 2020 | March 2022 | Allow | 25 | 1 | 0 | Yes | No |
| 16790644 | CONTROLLING EXHAUST GAS PRESSURE OF A PLASMA REACTOR FOR PLASMA STABILITY | February 2020 | July 2024 | Allow | 53 | 5 | 1 | Yes | No |
| 16752153 | PLASMA PROCESSING APPARATUS | January 2020 | May 2022 | Allow | 28 | 1 | 1 | Yes | No |
| 16749180 | PLASMA PROCESSING APPARATUS | January 2020 | January 2023 | Allow | 36 | 2 | 1 | Yes | No |
| 16714247 | ADHESIVE MATERIAL REMOVAL FROM PHOTOMASK IN ULTRAVIOLET LITHOGRAPHY APPLICATION | December 2019 | March 2025 | Abandon | 60 | 3 | 1 | Yes | Yes |
| 16706773 | SEMICONDUCTOR PROCESSING APPARATUS | December 2019 | April 2024 | Abandon | 52 | 5 | 0 | Yes | No |
| 16706154 | COOLING SYSTEM FOR RF POWER ELECTRONICS | December 2019 | September 2022 | Abandon | 33 | 4 | 0 | Yes | No |
| 16698279 | SUBSTRATE PROCESSING APPARATUS | November 2019 | February 2022 | Allow | 27 | 1 | 1 | No | No |
| 16601935 | Plasma Device with an External RF Hollow Cathode for Plasma Cleaning of High Vacuum Systems | October 2019 | November 2022 | Abandon | 37 | 4 | 0 | Yes | No |
| 16581859 | PLASMA PROCESSING APPARATUS | September 2019 | April 2022 | Allow | 30 | 1 | 0 | Yes | No |
| 16581886 | PLASMA PROCESSING APPARATUS | September 2019 | April 2022 | Allow | 31 | 1 | 0 | Yes | No |
| 16495650 | OBJECT PROCESSING APPARATUS | September 2019 | October 2022 | Abandon | 37 | 2 | 0 | No | No |
| 16564234 | IMPEDANCE MATCHING DEVICE PROVIDED IN HIGH-FREQUENCY POWER SYSTEM | September 2019 | March 2023 | Allow | 42 | 3 | 0 | Yes | No |
| 16488966 | ELECTRODE UNIT HAVING AN INTERNAL ELECTRICAL NETWORK FOR SUPPLYING HIGH-FREQUENCY VOLTAGE, AND CARRIER ARRANGEMENT FOR A PLASMA TREATMENT SYSTEM | August 2019 | June 2022 | Abandon | 33 | 4 | 1 | Yes | No |
| 16551972 | Apparatus For Directional Processing | August 2019 | July 2023 | Allow | 47 | 3 | 1 | Yes | No |
| 16520464 | MAGNETICALLY ENHANCED AND SYMMETRICAL RADIO FREQUENCY DISCHARGE APPARATUS FOR MATERIAL PROCESSING | July 2019 | October 2023 | Abandon | 50 | 4 | 0 | No | No |
| 16518940 | EDGE RING OR PROCESS KIT FOR SEMICONDUCTOR PROCESS MODULE | July 2019 | October 2023 | Abandon | 50 | 4 | 1 | Yes | Yes |
| 16506202 | PROCESS CONTROL ENABLED VDC SENSOR FOR PLASMA PROCESS | July 2019 | December 2024 | Allow | 60 | 5 | 0 | Yes | No |
| 16459833 | PLASMA PROCESS MONITORING APPARATUS AND PLASMA PROCESSING APPARATUS COMPRISING THE SAME | July 2019 | September 2025 | Abandon | 60 | 6 | 0 | Yes | No |
| 16448536 | METHODS AND APPARATUS FOR PLASMA LINERS WITH HIGH FLUID CONDUCTANCE | June 2019 | August 2022 | Abandon | 38 | 2 | 0 | No | No |
| 16448450 | SUBSTRATE PROCESSING APPARATUS, SIGNAL SOURCE DEVICE, METHOD OF PROCESSING MATERIAL LAYER, AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE | June 2019 | September 2022 | Allow | 39 | 2 | 0 | Yes | No |
This analysis examines appeal outcomes and the strategic value of filing appeals for examiner KACKAR, RAM N.
With a 40.5% reversal rate, the PTAB reverses the examiner's rejections in a meaningful percentage of cases. This reversal rate is above the USPTO average, indicating that appeals have better success here than typical.
Filing a Notice of Appeal can sometimes lead to allowance even before the appeal is fully briefed or decided by the PTAB. This occurs when the examiner or their supervisor reconsiders the rejection during the mandatory appeal conference (MPEP § 1207.01) after the appeal is filed.
In this dataset, 35.1% of applications that filed an appeal were subsequently allowed. This appeal filing benefit rate is above the USPTO average, suggesting that filing an appeal can be an effective strategy for prompting reconsideration.
✓ Appeals to PTAB show good success rates. If you have a strong case on the merits, consider fully prosecuting the appeal to a Board decision.
✓ Filing a Notice of Appeal is strategically valuable. The act of filing often prompts favorable reconsideration during the mandatory appeal conference.
Examiner KACKAR, RAM N works in Art Unit 1716 and has examined 353 patent applications in our dataset. With an allowance rate of 41.4%, this examiner allows applications at a lower rate than most examiners at the USPTO. Applications typically reach final disposition in approximately 45 months.
Examiner KACKAR, RAM N's allowance rate of 41.4% places them in the 8% percentile among all USPTO examiners. This examiner is less likely to allow applications than most examiners at the USPTO.
On average, applications examined by KACKAR, RAM N receive 2.78 office actions before reaching final disposition. This places the examiner in the 81% percentile for office actions issued. This examiner issues more office actions than most examiners, which may indicate thorough examination or difficulty in reaching agreement with applicants.
The median time to disposition (half-life) for applications examined by KACKAR, RAM N is 45 months. This places the examiner in the 12% percentile for prosecution speed. Applications take longer to reach final disposition with this examiner compared to most others.
Conducting an examiner interview provides a +52.8% benefit to allowance rate for applications examined by KACKAR, RAM N. This interview benefit is in the 94% percentile among all examiners. Recommendation: Interviews are highly effective with this examiner and should be strongly considered as a prosecution strategy. Per MPEP § 713.10, interviews are available at any time before the Notice of Allowance is mailed or jurisdiction transfers to the PTAB.
When applicants file an RCE with this examiner, 15.4% of applications are subsequently allowed. This success rate is in the 11% percentile among all examiners. Strategic Insight: RCEs show lower effectiveness with this examiner compared to others. Consider whether a continuation application might be more strategic, especially if you need to add new matter or significantly broaden claims.
This examiner enters after-final amendments leading to allowance in 8.1% of cases where such amendments are filed. This entry rate is in the 8% percentile among all examiners. Strategic Recommendation: This examiner rarely enters after-final amendments compared to other examiners. You should generally plan to file an RCE or appeal rather than relying on after-final amendment entry. Per MPEP § 714.12, primary examiners have discretion in entering after-final amendments, and this examiner exercises that discretion conservatively.
When applicants request a pre-appeal conference (PAC) with this examiner, 11.1% result in withdrawal of the rejection or reopening of prosecution. This success rate is in the 24% percentile among all examiners. Note: Pre-appeal conferences show limited success with this examiner compared to others. While still worth considering, be prepared to proceed with a full appeal brief if the PAC does not result in favorable action.
This examiner withdraws rejections or reopens prosecution in 39.3% of appeals filed. This is in the 7% percentile among all examiners. Of these withdrawals, 16.7% occur early in the appeal process (after Notice of Appeal but before Appeal Brief). Strategic Insight: This examiner rarely withdraws rejections during the appeal process compared to other examiners. If you file an appeal, be prepared to fully prosecute it to a PTAB decision. Per MPEP § 1207, the examiner will prepare an Examiner's Answer maintaining the rejections.
When applicants file petitions regarding this examiner's actions, 82.4% are granted (fully or in part). This grant rate is in the 85% percentile among all examiners. Strategic Note: Petitions are frequently granted regarding this examiner's actions compared to other examiners. Per MPEP § 1002.02(c), various examiner actions are petitionable to the Technology Center Director, including prematureness of final rejection, refusal to enter amendments, and requirement for information. If you believe an examiner action is improper, consider filing a petition.
Examiner's Amendments: This examiner makes examiner's amendments in 4.0% of allowed cases (in the 83% percentile). Per MPEP § 1302.04, examiner's amendments are used to place applications in condition for allowance when only minor changes are needed. This examiner frequently uses this tool compared to other examiners, indicating a cooperative approach to getting applications allowed. Strategic Insight: If you are close to allowance but minor claim amendments are needed, this examiner may be willing to make an examiner's amendment rather than requiring another round of prosecution.
Quayle Actions: This examiner issues Ex Parte Quayle actions in 0.0% of allowed cases (in the 4% percentile). This examiner rarely issues Quayle actions compared to other examiners. Allowances typically come directly without a separate action for formal matters.
Based on the statistical analysis of this examiner's prosecution patterns, here are tailored strategic recommendations:
Not Legal Advice: The information provided in this report is for informational purposes only and does not constitute legal advice. You should consult with a qualified patent attorney or agent for advice specific to your situation.
No Guarantees: We do not provide any guarantees as to the accuracy, completeness, or timeliness of the statistics presented above. Patent prosecution statistics are derived from publicly available USPTO data and are subject to data quality limitations, processing errors, and changes in USPTO practices over time.
Limitation of Liability: Under no circumstances will IronCrow AI be liable for any outcome, decision, or action resulting from your reliance on the statistics, analysis, or recommendations presented in this report. Past prosecution patterns do not guarantee future results.
Use at Your Own Risk: While we strive to provide accurate and useful prosecution statistics, you should independently verify any information that is material to your prosecution strategy and use your professional judgment in all patent prosecution matters.