USPTO Examiner KACKAR RAM N - Art Unit 1716

Recent Applications

Detailed information about the 100 most recent patent applications.

Application NumberTitleFiling DateDisposal DateDispositionTime (months)Office ActionsRestrictionsInterviewAppeal
18676513ETCHING DEVICEMay 2024October 2025Allow1730NoNo
18209030PLASMA PROCESSING APPARATUSJune 2023March 2026Allow3310YesNo
18328345PLASMA PROCESSING METHOD AND APPARATUSJune 2023January 2026Allow3211YesNo
18301126COMPOSITE STAGE FOR ELECTRON ENHANCED MATERIAL PROCESSINGApril 2023August 2025Abandon2850YesNo
18130429HYBRID CHAMBERApril 2023March 2026Allow3510YesNo
18026911SUBSTRATE PROCESSING APPARATUSMarch 2023February 2026Allow3510NoNo
18044648PLASMA PROCESSING APPARATUS AND SEMICONDUCTOR DEVICE MANUFACTURING METHODMarch 2023October 2025Allow3200NoNo
18107365PARYLENE COATING SYSTEMFebruary 2023November 2025Abandon3321NoNo
18097728PLASMA PROCESSING APPARATUS AND PLASMA CONTROL METHOD USING MAGNETIC FIELDJanuary 2023September 2025Allow3211YesNo
18092201CARRIER FOR END EFFECTOR, TRANSPORTATION APPARATUS INCLUDING THE SAME AND THE SUBSTRATE PROCESSING APPARATUSDecember 2022January 2026Allow3710NoNo
18147775SEMICONDUCTOR SUBSTRATE PROCESSING APPARATUSDecember 2022January 2026Allow3610YesNo
18067632CORROSION RESISTANT GROUND SHIELD OF PROCESSING CHAMBERDecember 2022October 2025Allow3410YesNo
18063888CHAMBER IMPEDANCE MANAGEMENT IN A PROCESSING CHAMBERDecember 2022January 2026Allow3711YesNo
18071192DYNAMIC SHEATH CONTROL WITH EDGE RING LIFTNovember 2022August 2025Allow3210YesNo
17983508METHODS AND APPARATUS FOR COATING FIBERSNovember 2022September 2025Allow3421YesNo
17971504ROTARY REACTOR FOR DEPOSITION OF FILMS ONTO PARTICLESOctober 2022November 2025Allow3721YesNo
17840500REMOTE MODULAR HIGH-FREQUENCY SOURCEJune 2022September 2025Allow3920YesNo
17836792Equipment and Method for Improved Edge Uniformity of Plasma Processing of WafersJune 2022July 2025Allow3721NoNo
17782166DLC PREPARATION APPARATUS AND PREPARATION METHODJune 2022November 2025Abandon4241NoNo
17663907MICROWAVE PLASMA PROCESSING APPARATUSMay 2022June 2025Abandon3720NoNo
17728794SYMMETRIC PLASMA PROCESS CHAMBERApril 2022October 2025Allow4230YesNo
17696280PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHODMarch 2022February 2025Allow6011YesNo
17666789PLASMA TREATMENT DEVICE AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICEFebruary 2022September 2025Abandon4440YesNo
17572563MONOPOLE ANTENNA ARRAY SOURCE FOR SEMICONDUCTOR PROCESS EQUIPMENTJanuary 2022March 2025Abandon3830NoNo
17607301Method and System for Automated Frequency Tuning of Radiofrequency (RF) Signal Generator for Multi-Level RF Power PulsingOctober 2021January 2025Allow3910NoNo
17510617SUPPORT UNIT, APPARATUS FOR TREATING SUBSTRATE, AND METHOD FOR TREATING SUBSTRATEOctober 2021July 2025Allow4421YesNo
17425945GASIFICATION DEVICE AND PLASMA SHUTTER WITH A MICROWAVE PLAZMA SLOWING SYSTEM OF THE GASIFICATION DEVICEJuly 2021March 2022Allow700NoNo
17384155Plasma Etching Apparatus and MethodJuly 2021March 2025Allow4431NoNo
17376601SEMICONDUCTOR EQUIPMENT AND METHOD FOR MANUFACTURING SEMICONDUCTOR STRUCTUREJuly 2021August 2024Abandon3721NoNo
17346754Air Leak Detection In Plasma Processing Apparatus With Separation GridJune 2021September 2025Abandon5140NoNo
17300384Method and apparatus for the fabrication of diamond by shockwavesJune 2021May 2023Allow2341YesNo
17299979PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHODJune 2021June 2025Allow4921YesNo
17338826PLASMA PROCESSING APPARATUSJune 2021March 2025Allow4521YesNo
17322241PLASMA PROCESSING APPARATUSMay 2021March 2023Allow2210YesNo
17318727ELECTROSTATIC CHUCK, SUBSTRATE PROCESSING APPARATUS, AND SUBSTRATE PROCESSING METHODMay 2021March 2025Allow4630YesNo
17293052EVAPORATION COATING APPARATUSMay 2021October 2025Abandon5320NoNo
17227442BATCH SUBSTRATE SUPPORT WITH WARPED SUBSTRATE CAPABILITYApril 2021May 2023Allow2610YesNo
17220085EDGE RING, STAGE AND SUBSTRATE PROCESSING APPARATUSApril 2021January 2024Abandon3420YesNo
17177900PLASMA PROCESSING APPARATUS AND METHOD OF MEASURING TEMPERATURE OF MEMBERSFebruary 2021April 2025Allow5011YesNo
17176905MODULAR PRINT HEAD ASSEMBLY FOR PLASMA JET PRINTINGFebruary 2021July 2023Abandon2810NoNo
17175724PLASMA PROCESSING APPARATUS AND MATCHING METHODFebruary 2021December 2025Allow5831YesNo
17260233PLASMA TREATMENT DEVICEJanuary 2021February 2025Allow4930YesNo
17149150PLASMA OBSERVATION SYSTEM AND PLASMA OBSERVATION METHODJanuary 2021April 2023Allow2711YesNo
17145247AZIMUTHAL SENSOR ARRAY FOR RADIO FREQUENCY PLASMA-BASED WAFER PROCESSING SYSTEMSJanuary 2021October 2025Abandon5740YesYes
17125491Coating Apparatus and Coating MethodDecember 2020September 2024Allow4521NoNo
17104038SUBSTRATE SUPPORT AND SUBSTRATE PROCESSING APPARATUSNovember 2020November 2024Allow4830YesNo
17058975METHOD OR APPARATUS FOR FORMING THIN FILM ON SUBSTRATE EMPLOYING ATOMIC LAYER EPITAXY METHODNovember 2020September 2024Abandon4621NoNo
17105361LIQUID SOURCE VAPORIZATION APPARATUS, CONTROL METHOD FOR A LIQUID SOURCE VAPORIZATION APPARATUS AND PROGRAM RECORDING MEDIUM ON WHICH IS RECORDED A PROGRAM FOR A LIQUID SOURCE VAPORIZATION APPARATUSNovember 2020December 2025Allow6051YesNo
17104467EDGE RING AND SUBSTRATE PROCESSING APPARATUSNovember 2020March 2023Allow2810YesNo
16952875PLASMA PROCESSING APPARATUS, ELECTROSTATIC ATTRACTION METHOD, AND ELECTROSTATIC ATTRACTION PROGRAMNovember 2020April 2023Allow2910YesNo
16951005THERMAL CONDUCTIVE MEMBER, PLASMA PROCESSING APPARATUS, AND VOLTAGE CONTROL METHODNovember 2020January 2023Abandon2621NoNo
17078728METHODS AND APPARATUS FOR PROCESSING A SUBSTRATEOctober 2020October 2025Allow6042YesNo
17067912PLASMA PROCESSING APPARATUSOctober 2020January 2024Abandon3910NoNo
17038072PLASMA PROCESSING APPARATUS AND METHOD FOR RELEASING SAMPLESeptember 2020July 2024Allow4620YesNo
17037406PLASMA PROCESSING APPARATUSSeptember 2020December 2023Abandon3810NoNo
17030522PLASMA PROCESSING APPARATUSSeptember 2020May 2022Allow2010YesNo
16980501PLASMA PROCESSING APPARATUSSeptember 2020January 2025Abandon5230NoNo
16979812FLOW RATE CONTROLLER, GAS SUPPLY SYSTEM, AND FLOW RATE CONTROL METHODSeptember 2020March 2024Allow4220YesNo
17011668HEAT MEDIUM CIRCULATION SYSTEM AND SUBSTRATE PROCESSING APPARATUSSeptember 2020October 2023Abandon3720YesNo
17011145SUBSTRATE TREATING APPARATUSSeptember 2020July 2025Allow5850YesNo
17009388PROCESSING APPARATUS AND PROCESSING METHODSeptember 2020January 2024Abandon4031NoNo
17008188TEMPERATURE-CONTROLLED CHEMICAL PROCESSING REACTORAugust 2020November 2023Allow3921YesNo
17003479PLASMA PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAMEAugust 2020June 2022Allow2200YesNo
17000090APPARATUS FOR PROCESSING SUBSTRATEAugust 2020February 2025Allow5430NoNo
16987489SHUTTER FOR OPENING AND CLOSING ENTRANCE OF PROCESS CHAMBER, AND SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAMEAugust 2020May 2025Abandon5841NoNo
16924516FOCUS RING AND SUBSTRATE TREATING APPARATUS COMPRISING THE SAMEJuly 2020November 2024Abandon5350YesNo
16923386PLASMA PROCESSING APPARATUSJuly 2020November 2022Abandon2820NoNo
16922587MODULAR PRINT HEAD ASSEMBLY FOR PLASMA JET PRINTINGJuly 2020December 2020Allow510YesNo
16921716SYMMETRIC AND IRREGULAR SHAPED PLASMAS USING MODULAR MICROWAVE SOURCESJuly 2020March 2025Allow5650NoNo
16918219APPARATUS AND METHOD FOR TREATING SUBSTRATEJuly 2020November 2023Allow4030YesNo
16918212APPARATUS AND METHOD FOR PROCESSING SUBSTRATEJuly 2020February 2025Allow5551YesNo
16958313PLASMA PROCESSING APPARATUSJune 2020February 2024Allow4411YesNo
16913784FILM FORMING METHOD AND FILM FORMING APPARATUSJune 2020January 2023Abandon3121NoNo
16913128APPARATUS AND METHOD FOR TREATING SUBSTRATEJune 2020October 2023Abandon4041YesNo
16911531SUBSTRATE PROCESSING APPARATUSJune 2020January 2023Abandon3120NoNo
16891425ELECTROSTATIC CHUCK, SUPPORT PLATFORM, AND PLASMA PROCESSING APPARATUSJune 2020September 2023Allow4020YesNo
16855048APPARATUS FOR ETCHING SUBSTRATE BEVEL AND SEMICONDUCTOR FABRICATION METHOD USING THE SAMEApril 2020June 2023Allow3811YesNo
16814967Coating Apparatus and Coating MethodMarch 2020October 2023Allow4322YesNo
16812593APPARATUS AND METHODS FOR ASYMMETRIC DEPOSITION OF METAL ON HIGH ASPECT RATIO NANOSTRUCTURESMarch 2020March 2022Abandon2510NoNo
16791947SYMMETRIC PLASMA PROCESS CHAMBERFebruary 2020March 2022Allow2510YesNo
16790644CONTROLLING EXHAUST GAS PRESSURE OF A PLASMA REACTOR FOR PLASMA STABILITYFebruary 2020July 2024Allow5351YesNo
16752153PLASMA PROCESSING APPARATUSJanuary 2020May 2022Allow2811YesNo
16749180PLASMA PROCESSING APPARATUSJanuary 2020January 2023Allow3621YesNo
16714247ADHESIVE MATERIAL REMOVAL FROM PHOTOMASK IN ULTRAVIOLET LITHOGRAPHY APPLICATIONDecember 2019March 2025Abandon6031YesYes
16706773SEMICONDUCTOR PROCESSING APPARATUSDecember 2019April 2024Abandon5250YesNo
16706154COOLING SYSTEM FOR RF POWER ELECTRONICSDecember 2019September 2022Abandon3340YesNo
16698279SUBSTRATE PROCESSING APPARATUSNovember 2019February 2022Allow2711NoNo
16601935Plasma Device with an External RF Hollow Cathode for Plasma Cleaning of High Vacuum SystemsOctober 2019November 2022Abandon3740YesNo
16581859PLASMA PROCESSING APPARATUSSeptember 2019April 2022Allow3010YesNo
16581886PLASMA PROCESSING APPARATUSSeptember 2019April 2022Allow3110YesNo
16495650OBJECT PROCESSING APPARATUSSeptember 2019October 2022Abandon3720NoNo
16564234IMPEDANCE MATCHING DEVICE PROVIDED IN HIGH-FREQUENCY POWER SYSTEMSeptember 2019March 2023Allow4230YesNo
16488966ELECTRODE UNIT HAVING AN INTERNAL ELECTRICAL NETWORK FOR SUPPLYING HIGH-FREQUENCY VOLTAGE, AND CARRIER ARRANGEMENT FOR A PLASMA TREATMENT SYSTEMAugust 2019June 2022Abandon3341YesNo
16551972Apparatus For Directional ProcessingAugust 2019July 2023Allow4731YesNo
16520464MAGNETICALLY ENHANCED AND SYMMETRICAL RADIO FREQUENCY DISCHARGE APPARATUS FOR MATERIAL PROCESSINGJuly 2019October 2023Abandon5040NoNo
16518940EDGE RING OR PROCESS KIT FOR SEMICONDUCTOR PROCESS MODULEJuly 2019October 2023Abandon5041YesYes
16506202PROCESS CONTROL ENABLED VDC SENSOR FOR PLASMA PROCESSJuly 2019December 2024Allow6050YesNo
16459833PLASMA PROCESS MONITORING APPARATUS AND PLASMA PROCESSING APPARATUS COMPRISING THE SAMEJuly 2019September 2025Abandon6060YesNo
16448536METHODS AND APPARATUS FOR PLASMA LINERS WITH HIGH FLUID CONDUCTANCEJune 2019August 2022Abandon3820NoNo
16448450SUBSTRATE PROCESSING APPARATUS, SIGNAL SOURCE DEVICE, METHOD OF PROCESSING MATERIAL LAYER, AND METHOD OF FABRICATING SEMICONDUCTOR DEVICEJune 2019September 2022Allow3920YesNo

Appeals Overview

This analysis examines appeal outcomes and the strategic value of filing appeals for examiner KACKAR, RAM N.

Patent Trial and Appeal Board (PTAB) Decisions

Total PTAB Decisions
37
Examiner Affirmed
22
(59.5%)
Examiner Reversed
15
(40.5%)
Reversal Percentile
63.5%
Higher than average

What This Means

With a 40.5% reversal rate, the PTAB reverses the examiner's rejections in a meaningful percentage of cases. This reversal rate is above the USPTO average, indicating that appeals have better success here than typical.

Strategic Value of Filing an Appeal

Total Appeal Filings
57
Allowed After Appeal Filing
20
(35.1%)
Not Allowed After Appeal Filing
37
(64.9%)
Filing Benefit Percentile
57.9%
Higher than average

Understanding Appeal Filing Strategy

Filing a Notice of Appeal can sometimes lead to allowance even before the appeal is fully briefed or decided by the PTAB. This occurs when the examiner or their supervisor reconsiders the rejection during the mandatory appeal conference (MPEP § 1207.01) after the appeal is filed.

In this dataset, 35.1% of applications that filed an appeal were subsequently allowed. This appeal filing benefit rate is above the USPTO average, suggesting that filing an appeal can be an effective strategy for prompting reconsideration.

Strategic Recommendations

Appeals to PTAB show good success rates. If you have a strong case on the merits, consider fully prosecuting the appeal to a Board decision.

Filing a Notice of Appeal is strategically valuable. The act of filing often prompts favorable reconsideration during the mandatory appeal conference.

Examiner KACKAR, RAM N - Prosecution Strategy Guide

Executive Summary

Examiner KACKAR, RAM N works in Art Unit 1716 and has examined 353 patent applications in our dataset. With an allowance rate of 41.4%, this examiner allows applications at a lower rate than most examiners at the USPTO. Applications typically reach final disposition in approximately 45 months.

Allowance Patterns

Examiner KACKAR, RAM N's allowance rate of 41.4% places them in the 8% percentile among all USPTO examiners. This examiner is less likely to allow applications than most examiners at the USPTO.

Office Action Patterns

On average, applications examined by KACKAR, RAM N receive 2.78 office actions before reaching final disposition. This places the examiner in the 81% percentile for office actions issued. This examiner issues more office actions than most examiners, which may indicate thorough examination or difficulty in reaching agreement with applicants.

Prosecution Timeline

The median time to disposition (half-life) for applications examined by KACKAR, RAM N is 45 months. This places the examiner in the 12% percentile for prosecution speed. Applications take longer to reach final disposition with this examiner compared to most others.

Interview Effectiveness

Conducting an examiner interview provides a +52.8% benefit to allowance rate for applications examined by KACKAR, RAM N. This interview benefit is in the 94% percentile among all examiners. Recommendation: Interviews are highly effective with this examiner and should be strongly considered as a prosecution strategy. Per MPEP § 713.10, interviews are available at any time before the Notice of Allowance is mailed or jurisdiction transfers to the PTAB.

Request for Continued Examination (RCE) Effectiveness

When applicants file an RCE with this examiner, 15.4% of applications are subsequently allowed. This success rate is in the 11% percentile among all examiners. Strategic Insight: RCEs show lower effectiveness with this examiner compared to others. Consider whether a continuation application might be more strategic, especially if you need to add new matter or significantly broaden claims.

After-Final Amendment Practice

This examiner enters after-final amendments leading to allowance in 8.1% of cases where such amendments are filed. This entry rate is in the 8% percentile among all examiners. Strategic Recommendation: This examiner rarely enters after-final amendments compared to other examiners. You should generally plan to file an RCE or appeal rather than relying on after-final amendment entry. Per MPEP § 714.12, primary examiners have discretion in entering after-final amendments, and this examiner exercises that discretion conservatively.

Pre-Appeal Conference Effectiveness

When applicants request a pre-appeal conference (PAC) with this examiner, 11.1% result in withdrawal of the rejection or reopening of prosecution. This success rate is in the 24% percentile among all examiners. Note: Pre-appeal conferences show limited success with this examiner compared to others. While still worth considering, be prepared to proceed with a full appeal brief if the PAC does not result in favorable action.

Appeal Withdrawal and Reconsideration

This examiner withdraws rejections or reopens prosecution in 39.3% of appeals filed. This is in the 7% percentile among all examiners. Of these withdrawals, 16.7% occur early in the appeal process (after Notice of Appeal but before Appeal Brief). Strategic Insight: This examiner rarely withdraws rejections during the appeal process compared to other examiners. If you file an appeal, be prepared to fully prosecute it to a PTAB decision. Per MPEP § 1207, the examiner will prepare an Examiner's Answer maintaining the rejections.

Petition Practice

When applicants file petitions regarding this examiner's actions, 82.4% are granted (fully or in part). This grant rate is in the 85% percentile among all examiners. Strategic Note: Petitions are frequently granted regarding this examiner's actions compared to other examiners. Per MPEP § 1002.02(c), various examiner actions are petitionable to the Technology Center Director, including prematureness of final rejection, refusal to enter amendments, and requirement for information. If you believe an examiner action is improper, consider filing a petition.

Examiner Cooperation and Flexibility

Examiner's Amendments: This examiner makes examiner's amendments in 4.0% of allowed cases (in the 83% percentile). Per MPEP § 1302.04, examiner's amendments are used to place applications in condition for allowance when only minor changes are needed. This examiner frequently uses this tool compared to other examiners, indicating a cooperative approach to getting applications allowed. Strategic Insight: If you are close to allowance but minor claim amendments are needed, this examiner may be willing to make an examiner's amendment rather than requiring another round of prosecution.

Quayle Actions: This examiner issues Ex Parte Quayle actions in 0.0% of allowed cases (in the 4% percentile). This examiner rarely issues Quayle actions compared to other examiners. Allowances typically come directly without a separate action for formal matters.

Prosecution Strategy Recommendations

Based on the statistical analysis of this examiner's prosecution patterns, here are tailored strategic recommendations:

  • Prepare for rigorous examination: With a below-average allowance rate, ensure your application has strong written description and enablement support. Consider filing a continuation if you need to add new matter.
  • Expect multiple rounds of prosecution: This examiner issues more office actions than average. Address potential issues proactively in your initial response and consider requesting an interview early in prosecution.
  • Prioritize examiner interviews: Interviews are highly effective with this examiner. Request an interview after the first office action to clarify issues and potentially expedite allowance.
  • Plan for RCE after final rejection: This examiner rarely enters after-final amendments. Budget for an RCE in your prosecution strategy if you receive a final rejection.
  • Plan for extended prosecution: Applications take longer than average with this examiner. Factor this into your continuation strategy and client communications.
  • Examiner cooperation: This examiner frequently makes examiner's amendments to place applications in condition for allowance. If you are close to allowance, the examiner may help finalize the claims.

Relevant MPEP Sections for Prosecution Strategy

  • MPEP § 713.10: Examiner interviews - available before Notice of Allowance or transfer to PTAB
  • MPEP § 714.12: After-final amendments - may be entered "under justifiable circumstances"
  • MPEP § 1002.02(c): Petitionable matters to Technology Center Director
  • MPEP § 1004: Actions requiring primary examiner signature (allowances, final rejections, examiner's answers)
  • MPEP § 1207.01: Appeal conferences - mandatory for all appeals
  • MPEP § 1214.07: Reopening prosecution after appeal

Important Disclaimer

Not Legal Advice: The information provided in this report is for informational purposes only and does not constitute legal advice. You should consult with a qualified patent attorney or agent for advice specific to your situation.

No Guarantees: We do not provide any guarantees as to the accuracy, completeness, or timeliness of the statistics presented above. Patent prosecution statistics are derived from publicly available USPTO data and are subject to data quality limitations, processing errors, and changes in USPTO practices over time.

Limitation of Liability: Under no circumstances will IronCrow AI be liable for any outcome, decision, or action resulting from your reliance on the statistics, analysis, or recommendations presented in this report. Past prosecution patterns do not guarantee future results.

Use at Your Own Risk: While we strive to provide accurate and useful prosecution statistics, you should independently verify any information that is material to your prosecution strategy and use your professional judgment in all patent prosecution matters.