Detailed information about the 100 most recent patent applications.
| Application Number | Title | Filing Date | Disposal Date | Disposition | Time (months) | Office Actions | Restrictions | Interview | Appeal |
|---|---|---|---|---|---|---|---|---|---|
| 18679784 | APPARATUS FOR AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | May 2024 | March 2025 | Allow | 9 | 0 | 0 | Yes | No |
| 18679771 | INTEGRATED SHOWERHEAD WITH THERMAL CONTROL FOR DELIVERING RADICAL AND PRECURSOR GAS TO A DOWNSTREAM CHAMBER TO ENABLE REMOTE PLASMA FILM DEPOSITION | May 2024 | January 2025 | Allow | 8 | 0 | 0 | Yes | No |
| 18632060 | APPARATUS AND METHOD FOR PLASMA ETCHING | April 2024 | November 2024 | Allow | 8 | 0 | 0 | Yes | No |
| 18604257 | CAPACITIVE SENSOR FOR MONITORING GAS CONCENTRATION | March 2024 | October 2024 | Allow | 7 | 0 | 0 | Yes | No |
| 18599767 | Processing Chamber With Multiple Plasma Units | March 2024 | October 2024 | Allow | 7 | 0 | 0 | No | No |
| 18589252 | SHOWERHEAD DEVICE FOR SEMICONDUCTOR PROCESSING SYSTEM | February 2024 | October 2024 | Allow | 8 | 0 | 0 | Yes | No |
| 18427348 | SPATIALLY TUNABLE DEPOSITION TO COMPENSATE WITHIN WAFER DIFFERENTIAL BOW | January 2024 | April 2025 | Allow | 14 | 1 | 0 | Yes | No |
| 18419890 | SUBSTRATE PROCESSING APPARATUS, METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND RECORDING MEDIUM | January 2024 | September 2024 | Allow | 8 | 0 | 0 | Yes | No |
| 18419389 | MONOLITHIC MODULAR MICROWAVE SOURCE WITH INTEGRATED PROCESS GAS DISTRIBUTION | January 2024 | September 2024 | Allow | 8 | 0 | 0 | Yes | No |
| 18526411 | SYSTEMS AND METHODS FOR PULSE WIDTH MODULATED DOSE CONTROL | December 2023 | September 2024 | Allow | 10 | 0 | 0 | Yes | No |
| 18516991 | SHOWER HEAD STRUCTURE AND PLASMA PROCESSING APPARATUS USING THE SAME | November 2023 | September 2024 | Allow | 10 | 0 | 0 | Yes | No |
| 18516087 | PRECURSOR CONTAINER | November 2023 | September 2024 | Allow | 10 | 0 | 0 | Yes | No |
| 18514494 | SUBSTRATE PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | November 2023 | September 2024 | Allow | 10 | 0 | 0 | Yes | No |
| 18493618 | SUBSTRATE PROCESSING DEVICE AND SUBSTRATE PROCESSING METHOD | October 2023 | June 2024 | Allow | 7 | 0 | 0 | Yes | No |
| 18372123 | PE-CVD APPARATUS AND METHOD | September 2023 | April 2024 | Allow | 7 | 0 | 0 | Yes | No |
| 18370750 | CONTINUOUS LINER FOR USE IN A PROCESSING CHAMBER | September 2023 | July 2024 | Allow | 10 | 1 | 0 | Yes | No |
| 18464805 | DYNAMIC MULTI ZONE FLOW CONTROL FOR A PROCESSING SYSTEM | September 2023 | June 2024 | Allow | 9 | 0 | 1 | No | No |
| 18242598 | CHEMICAL SOURCE VESSEL WITH DIP TUBE | September 2023 | January 2025 | Allow | 16 | 2 | 0 | Yes | No |
| 18239856 | SUBSTRATE PROCESSING DEVICE | August 2023 | August 2024 | Allow | 11 | 1 | 0 | No | No |
| 18457061 | UNIFORM IN SITU CLEANING AND DEPOSITION | August 2023 | March 2025 | Allow | 18 | 2 | 0 | Yes | No |
| 18228201 | SHOWERHEAD ASSEMBLY AND METHOD OF SERVICING ASSEMBLY FOR SEMICONDUCTOR MANUFACTURING | July 2023 | April 2024 | Allow | 9 | 0 | 0 | Yes | No |
| 18227524 | GAS MIXING SYSTEM FOR SEMICONDUCTOR FABRICATION | July 2023 | August 2024 | Allow | 13 | 1 | 0 | Yes | No |
| 18222024 | TEMPERATURE CONTROL ASSEMBLY FOR SUBSTRATE PROCESSING APPARATUS AND METHOD OF USING SAME | July 2023 | April 2024 | Allow | 9 | 0 | 0 | Yes | No |
| 18350179 | FILM DEPOSITION APPARATUS AND FILM DEPOSITION METHOD | July 2023 | March 2025 | Allow | 21 | 1 | 2 | No | No |
| 18346433 | GASBOX FOR SEMICONDUCTOR PROCESSING CHAMBER | July 2023 | March 2024 | Allow | 9 | 0 | 0 | Yes | No |
| 18333361 | SYMMETRIC PUMP DOWN MINI-VOLUME WITH LAMINAR FLOW CAVITY GAS INJECTION FOR HIGH AND LOW PRESSURE | June 2023 | March 2024 | Allow | 9 | 0 | 0 | Yes | No |
| 18329791 | VACUUM PUMP PROTECTION AGAINST DEPOSITION BYPRODUCT BUILDUP | June 2023 | May 2024 | Allow | 11 | 0 | 0 | Yes | No |
| 18196605 | SUBSTRATE PROCESSING SYSTEMS INCLUDING GAS DELIVERY SYSTEM WITH REDUCED DEAD LEGS | May 2023 | December 2023 | Allow | 7 | 0 | 0 | Yes | No |
| 18313736 | HARDWARE TO PREVENT BOTTOM PURGE INCURSION IN APPLICATION VOLUME AND PROCESS GAS DIFFUSION BELOW HEATER | May 2023 | December 2023 | Allow | 7 | 0 | 0 | Yes | No |
| 18305750 | PROCESS CHAMBER | April 2023 | May 2025 | Allow | 24 | 2 | 1 | Yes | No |
| 18181077 | SEMICONDUCTOR CHAMBER COMPONENTS WITH ADVANCED COATING TECHNIQUES | March 2023 | March 2025 | Allow | 24 | 1 | 1 | Yes | No |
| 18173704 | CERAMIC SHOWERHEADS WITH CONDUCTIVE ELECTRODES | February 2023 | August 2023 | Allow | 5 | 0 | 0 | Yes | No |
| 18105404 | Substrate Processing Apparatus, Substrate Processing Method, Method of Manufacturing Semiconductor Device and Non-transitory Computer-readable Recording Medium | February 2023 | February 2025 | Allow | 25 | 1 | 1 | No | No |
| 18163949 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD | February 2023 | April 2025 | Allow | 26 | 3 | 1 | No | No |
| 18164085 | SUBSTRATE PROCESSING APPARATUS, SUBSTRATE HOLDER, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | February 2023 | April 2025 | Allow | 27 | 1 | 1 | No | No |
| 18163828 | INTEGRATED SHOWERHEAD WITH THERMAL CONTROL FOR DELIVERING RADICAL AND PRECURSOR GAS TO A DOWNSTREAM CHAMBER TO ENABLE REMOTE PLASMA FILM DEPOSITION | February 2023 | January 2024 | Allow | 12 | 1 | 0 | Yes | No |
| 18103667 | ORGANIC VAPOR JET PRINTING SYSTEM | January 2023 | May 2024 | Allow | 15 | 3 | 0 | Yes | No |
| 18095053 | BOTTOM FED SUBLIMATION BED FOR HIGH SATURATION EFFICIENCY IN SEMICONDUCTOR APPLICATIONS | January 2023 | July 2023 | Allow | 6 | 0 | 0 | Yes | No |
| 18092413 | SYSTEMS AND METHODS FOR PULSE WIDTH MODULATED DOSE CONTROL | January 2023 | July 2023 | Allow | 7 | 0 | 0 | Yes | No |
| 18002334 | TRAP DEVICE AND SEMICONDUCTOR MANUFACTURING DEVICE | December 2022 | May 2025 | Allow | 29 | 0 | 0 | No | No |
| 18079903 | GROUNDING CAP MODULE AND GAS INJECTION DEVICE | December 2022 | February 2024 | Allow | 14 | 2 | 0 | Yes | No |
| 18080555 | ION EXTRACTION OPTICS HAVING NOVEL BLOCKER CONFIGURATION | December 2022 | May 2025 | Allow | 29 | 0 | 0 | Yes | No |
| 18000635 | REMOVABLE SHOWERHEAD FACEPLATE FOR SEMICONDUCTOR PROCESSING TOOLS | December 2022 | May 2025 | Allow | 29 | 0 | 0 | No | No |
| 18071260 | Showerhead Faceplate Having Flow Apertures Configured for Hollow Cathode Discharge Suppression | November 2022 | July 2023 | Allow | 8 | 0 | 0 | Yes | No |
| 17986693 | METHODS FOR ETCHING STRUCTURES WITH OXYGEN PULSING | November 2022 | April 2025 | Allow | 29 | 0 | 0 | Yes | No |
| 18051321 | CONTINUOUS LINER FOR USE IN A PROCESSING CHAMBER | October 2022 | July 2023 | Allow | 8 | 0 | 0 | Yes | No |
| 17974408 | ISOLATOR APPARATUS AND METHODS FOR SUBSTRATE PROCESSING CHAMBERS | October 2022 | July 2023 | Allow | 9 | 0 | 0 | Yes | No |
| 17961040 | CHAMBER INJECTOR | October 2022 | July 2023 | Allow | 9 | 0 | 0 | Yes | No |
| 17948323 | CLEAN ISOLATION VALVE FOR REDUCED DEAD VOLUME | September 2022 | June 2023 | Allow | 9 | 0 | 0 | Yes | No |
| 17948571 | HIGH TEMPERATURE VACUUM SEAL | September 2022 | June 2023 | Allow | 9 | 0 | 0 | Yes | No |
| 17941446 | SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUM THEREFOR | September 2022 | November 2023 | Allow | 14 | 0 | 1 | Yes | No |
| 17903173 | PRECURSOR CONTAINER | September 2022 | August 2023 | Allow | 12 | 2 | 1 | Yes | No |
| 17929585 | SHOWERHEAD DEVICE FOR SEMICONDUCTOR PROCESSING SYSTEM | September 2022 | December 2023 | Allow | 15 | 1 | 0 | Yes | No |
| 17802843 | REACTION CHAMBER | August 2022 | May 2023 | Allow | 9 | 0 | 0 | No | No |
| 17896025 | SYSTEM AND METHOD FOR CONTROLLING FORELINE PRESSURE | August 2022 | February 2025 | Allow | 30 | 0 | 1 | Yes | No |
| 17821844 | FILM FORMING SYSTEM AND FILM FORMING METHOD | August 2022 | January 2025 | Allow | 29 | 4 | 1 | Yes | No |
| 17893783 | PLASMA ETCHING APPARATUS, PLASMA ETCHING METHOD USING THE SAME, AND SEMICONDUCTOR FABRICATION METHOD USING THE SAME | August 2022 | March 2025 | Allow | 31 | 1 | 2 | Yes | No |
| 17892423 | Substrate Processing Apparatus and Method of Manufacturing Semiconductor Device | August 2022 | August 2023 | Allow | 12 | 0 | 1 | Yes | No |
| 17889930 | High Temperature Chemical Vapor Deposition Lid | August 2022 | May 2023 | Allow | 9 | 0 | 0 | Yes | No |
| 17889952 | WAFER CARRIER WITH ADJUSTABLE ALIGNMENT DEVICES AND DEPOSITION EQUIPMENT USING THE SAME | August 2022 | June 2025 | Allow | 34 | 0 | 1 | No | No |
| 17885810 | SEQUENTIAL INFILTRATION SYNTHESIS APPARATUS AND A METHOD OF FORMING A PATTERNED STRUCTURE | August 2022 | February 2024 | Allow | 18 | 1 | 0 | No | No |
| 17885636 | SUBSTRATE PROCESSING APPARATUS, PROCESS VESSEL, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND NON-TRANSITORY TANGIBLE MEDIUM | August 2022 | March 2025 | Allow | 31 | 0 | 1 | No | No |
| 17883997 | PROCESSING APPARATUS AND PROCESSING METHOD, AND GAS CLUSTER GENERATING APPARATUS AND GAS CLUSTER GENERATING METHOD | August 2022 | May 2023 | Allow | 9 | 0 | 0 | No | No |
| 17873706 | PUMPING LINER FOR IMPROVED FLOW UNIFORMITY | July 2022 | May 2023 | Allow | 9 | 0 | 0 | Yes | No |
| 17874188 | MANIFOLD VALVE FOR CONTROLLING MULTIPLE GASES | July 2022 | August 2023 | Allow | 13 | 1 | 0 | Yes | No |
| 17790762 | ACTIVE GAS GENERATION APPARATUS | July 2022 | February 2025 | Allow | 32 | 0 | 0 | No | No |
| 17790386 | SUBSTRATE PROCESSING APPARATUS AND METHOD | June 2022 | March 2025 | Allow | 32 | 2 | 0 | No | No |
| 17845191 | Apparatus and Methods for Improving Chemical Utilization Rate in Deposition Process | June 2022 | May 2023 | Allow | 10 | 0 | 0 | Yes | No |
| 17844245 | Processing Chamber With Multiple Plasma Units | June 2022 | February 2024 | Allow | 20 | 2 | 0 | Yes | No |
| 17835082 | TEMPERATURE CONTROL ASSEMBLY FOR SUBSTRATE PROCESSING APPARATUS AND METHOD OF USING SAME | June 2022 | May 2023 | Allow | 11 | 0 | 0 | Yes | No |
| 17828103 | PLASMA PROCESSING APPARATUS | May 2022 | January 2025 | Allow | 32 | 1 | 1 | Yes | No |
| 17829007 | CHEMICAL DELIVERY SYSTEM AND METHOD OF OPERATING THE CHEMICAL DELIVERY SYSTEM | May 2022 | April 2023 | Allow | 11 | 0 | 0 | Yes | No |
| 17752079 | APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR TREATING SUBSTRATE | May 2022 | February 2025 | Allow | 33 | 0 | 1 | No | No |
| 17664048 | WIDE AREA ATMOSPHERIC PRESSURE PLASMA DEVICE | May 2022 | November 2024 | Abandon | 30 | 1 | 0 | No | No |
| 17745156 | GAS DISTRIBUTION PLATE WITH HIGH ASPECT RATIO HOLES AND A HIGH HOLE DENSITY | May 2022 | April 2024 | Abandon | 23 | 2 | 0 | Yes | No |
| 17756081 | DETECTION AND LOCATION OF ANOMALOUS PLASMA EVENTS IN FABRICATION CHAMBERS | May 2022 | February 2025 | Allow | 33 | 1 | 1 | Yes | No |
| 17663602 | LINER AND EPITAXIAL REACTOR COMPRISING SAME | May 2022 | March 2025 | Allow | 34 | 2 | 1 | No | No |
| 17770147 | SINGLE CRYSTAL METAL OXIDE PLASMA CHAMBER COMPONENT | April 2022 | November 2024 | Allow | 31 | 1 | 1 | Yes | No |
| 17723842 | HEATER FOR THERMAL EVAPORATOR | April 2022 | January 2025 | Allow | 33 | 0 | 0 | No | No |
| 17709396 | SUBSTRATE PROCESSING APPARATUS HAVING EXHAUST GAS DECOMPOSER, AND EXHAUST GAS PROCESSING METHOD THEREFOR | March 2022 | March 2024 | Allow | 23 | 3 | 0 | No | No |
| 17761743 | OXIDE FILM FORMING DEVICE | March 2022 | September 2024 | Abandon | 30 | 4 | 1 | Yes | No |
| 17753524 | PROCESSING SYSTEM AND METHOD OF DELIVERING A REACTANT GAS | March 2022 | July 2024 | Allow | 28 | 1 | 1 | Yes | No |
| 17685298 | VACUUM PROCESSING APPARATUS AND VACUUM PROCESSING METHOD USING THE SAME | March 2022 | December 2024 | Allow | 34 | 1 | 1 | No | No |
| 17680225 | PLASMA TREATMENT APPARATUS, LOWER ELECTRODE ASSEMBLY AND FORMING METHOD THEREOF | February 2022 | November 2024 | Allow | 32 | 2 | 1 | No | No |
| 17679662 | APPARATUS AND METHOD FOR SEMICONDUCTOR FABRICATION | February 2022 | February 2023 | Allow | 12 | 0 | 0 | No | No |
| 17677067 | SUBSTRATE PROCESSING APPARATUS | February 2022 | June 2025 | Abandon | 40 | 4 | 1 | No | No |
| 17674856 | FILM FORMING DEVICE | February 2022 | July 2024 | Allow | 29 | 1 | 0 | No | No |
| 17669944 | PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS | February 2022 | March 2024 | Allow | 25 | 0 | 0 | No | No |
| 17633942 | SPATIALLY TUNABLE DEPOSITION TO COMPENSATE WITHIN WAFER DIFFERENTIAL BOW | February 2022 | October 2023 | Allow | 21 | 0 | 0 | Yes | No |
| 17650090 | PROCESSING APPARATUS | February 2022 | January 2024 | Allow | 23 | 0 | 1 | No | No |
| 17633577 | APPARATUS FOR SUPPLYING GAS AND APPARATUS FOR PROCESSING SUBSTRATE USING THE SAME | February 2022 | February 2024 | Allow | 25 | 1 | 0 | No | No |
| 17582844 | Substrate Processing Apparatus and Method of Manufacturing Semiconductor Device | January 2022 | January 2024 | Allow | 24 | 2 | 1 | Yes | No |
| 17648454 | GAS INJECTOR AND DIFFUSION FURNACE DEVICE | January 2022 | January 2025 | Abandon | 36 | 4 | 0 | Yes | No |
| 17628224 | DEVICE FOR BLOCKING PLASMA BACKFLOW IN PROCESS CHAMBER TO PROTECT AIR INLET STRUCTURE | January 2022 | February 2024 | Allow | 25 | 1 | 0 | No | No |
| 17627651 | APPARATUS FOR PROCESSING SUBSTRATE WITH PLASMA | January 2022 | May 2024 | Abandon | 27 | 2 | 0 | Yes | No |
| 17299721 | PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD | January 2022 | May 2024 | Allow | 35 | 1 | 1 | No | No |
| 17564472 | LOAD ASSEMBLIES FOR LOADING PARTS IN A FURNACE | December 2021 | November 2023 | Allow | 23 | 2 | 1 | Yes | No |
| 17646176 | HIGH TEMPERATURE FACE PLATE FOR DEPOSITION APPLICATION | December 2021 | February 2023 | Allow | 14 | 0 | 0 | Yes | No |
| 17622291 | AN ATOMIC LAYER DEPOSITION APPARATUS | December 2021 | December 2022 | Allow | 11 | 1 | 1 | No | No |
| 17560242 | GAS SUPPLY SYSTEM, PLASMA PROCESSING APPARATUS, AND CONTROL METHOD FOR GAS SUPPLY SYSTEM | December 2021 | February 2023 | Allow | 14 | 0 | 0 | Yes | No |
This analysis examines appeal outcomes and the strategic value of filing appeals for examiner ZERVIGON, RUDY.
With a 43.8% reversal rate, the PTAB reverses the examiner's rejections in a meaningful percentage of cases. This reversal rate is above the USPTO average, indicating that appeals have better success here than typical.
Filing a Notice of Appeal can sometimes lead to allowance even before the appeal is fully briefed or decided by the PTAB. This occurs when the examiner or their supervisor reconsiders the rejection during the mandatory appeal conference (MPEP § 1207.01) after the appeal is filed.
In this dataset, 27.0% of applications that filed an appeal were subsequently allowed. This appeal filing benefit rate is below the USPTO average, suggesting that filing an appeal has limited effectiveness in prompting favorable reconsideration.
✓ Appeals to PTAB show good success rates. If you have a strong case on the merits, consider fully prosecuting the appeal to a Board decision.
⚠ Filing a Notice of Appeal shows limited benefit. Consider other strategies like interviews or amendments before appealing.
Examiner ZERVIGON, RUDY works in Art Unit 1716 and has examined 1,130 patent applications in our dataset. With an allowance rate of 75.0%, this examiner has a below-average tendency to allow applications. Applications typically reach final disposition in approximately 33 months.
Examiner ZERVIGON, RUDY's allowance rate of 75.0% places them in the 32% percentile among all USPTO examiners. This examiner has a below-average tendency to allow applications.
On average, applications examined by ZERVIGON, RUDY receive 2.11 office actions before reaching final disposition. This places the examiner in the 70% percentile for office actions issued. This examiner issues a slightly above-average number of office actions.
The median time to disposition (half-life) for applications examined by ZERVIGON, RUDY is 33 months. This places the examiner in the 26% percentile for prosecution speed. Prosecution timelines are slightly slower than average with this examiner.
Conducting an examiner interview provides a -9.3% benefit to allowance rate for applications examined by ZERVIGON, RUDY. This interview benefit is in the 2% percentile among all examiners. Note: Interviews show limited statistical benefit with this examiner compared to others, though they may still be valuable for clarifying issues.
When applicants file an RCE with this examiner, 21.3% of applications are subsequently allowed. This success rate is in the 16% percentile among all examiners. Strategic Insight: RCEs show lower effectiveness with this examiner compared to others. Consider whether a continuation application might be more strategic, especially if you need to add new matter or significantly broaden claims.
This examiner enters after-final amendments leading to allowance in 28.3% of cases where such amendments are filed. This entry rate is in the 32% percentile among all examiners. Strategic Recommendation: This examiner shows below-average receptiveness to after-final amendments. You may need to file an RCE or appeal rather than relying on after-final amendment entry.
When applicants request a pre-appeal conference (PAC) with this examiner, 74.1% result in withdrawal of the rejection or reopening of prosecution. This success rate is in the 58% percentile among all examiners. Strategic Recommendation: Pre-appeal conferences show above-average effectiveness with this examiner. If you have strong arguments, a PAC request may result in favorable reconsideration.
This examiner withdraws rejections or reopens prosecution in 68.9% of appeals filed. This is in the 49% percentile among all examiners. Of these withdrawals, 49.3% occur early in the appeal process (after Notice of Appeal but before Appeal Brief). Strategic Insight: This examiner shows below-average willingness to reconsider rejections during appeals. Be prepared to fully prosecute appeals if filed.
When applicants file petitions regarding this examiner's actions, 42.1% are granted (fully or in part). This grant rate is in the 43% percentile among all examiners. Strategic Note: Petitions show below-average success regarding this examiner's actions. Ensure you have a strong procedural basis before filing.
Examiner's Amendments: This examiner makes examiner's amendments in 2.0% of allowed cases (in the 77% percentile). Per MPEP § 1302.04, examiner's amendments are used to place applications in condition for allowance when only minor changes are needed. This examiner frequently uses this tool compared to other examiners, indicating a cooperative approach to getting applications allowed. Strategic Insight: If you are close to allowance but minor claim amendments are needed, this examiner may be willing to make an examiner's amendment rather than requiring another round of prosecution.
Quayle Actions: This examiner issues Ex Parte Quayle actions in 0.2% of allowed cases (in the 45% percentile). This examiner issues Quayle actions less often than average. Allowances may come directly without a separate action for formal matters.
Based on the statistical analysis of this examiner's prosecution patterns, here are tailored strategic recommendations:
Not Legal Advice: The information provided in this report is for informational purposes only and does not constitute legal advice. You should consult with a qualified patent attorney or agent for advice specific to your situation.
No Guarantees: We do not provide any guarantees as to the accuracy, completeness, or timeliness of the statistics presented above. Patent prosecution statistics are derived from publicly available USPTO data and are subject to data quality limitations, processing errors, and changes in USPTO practices over time.
Limitation of Liability: Under no circumstances will IronCrow AI be liable for any outcome, decision, or action resulting from your reliance on the statistics, analysis, or recommendations presented in this report. Past prosecution patterns do not guarantee future results.
Use at Your Own Risk: While we strive to provide accurate and useful prosecution statistics, you should independently verify any information that is material to your prosecution strategy and use your professional judgment in all patent prosecution matters.