Detailed information about the 100 most recent patent applications.
| Application Number | Title | Filing Date | Disposal Date | Disposition | Time (months) | Office Actions | Restrictions | Interview | Appeal |
|---|---|---|---|---|---|---|---|---|---|
| 18728824 | COATING CHAMBER WITH DISTANCE DETECTION FOR THE SUBSTRATES | July 2024 | February 2026 | Allow | 19 | 1 | 1 | No | No |
| 18679784 | APPARATUS FOR AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | May 2024 | March 2025 | Allow | 9 | 0 | 0 | Yes | No |
| 18679771 | INTEGRATED SHOWERHEAD WITH THERMAL CONTROL FOR DELIVERING RADICAL AND PRECURSOR GAS TO A DOWNSTREAM CHAMBER TO ENABLE REMOTE PLASMA FILM DEPOSITION | May 2024 | January 2025 | Allow | 8 | 0 | 0 | Yes | No |
| 18632060 | APPARATUS AND METHOD FOR PLASMA ETCHING | April 2024 | November 2024 | Allow | 8 | 0 | 0 | Yes | No |
| 18693298 | BALANCING GAS FLOW TO MULTIPLE STATIONS USING HEATERS UPSTREAM OF FLOW RESTRICTORS | March 2024 | March 2026 | Abandon | 24 | 1 | 1 | No | No |
| 18604257 | CAPACITIVE SENSOR FOR MONITORING GAS CONCENTRATION | March 2024 | October 2024 | Allow | 7 | 0 | 0 | Yes | No |
| 18599767 | Processing Chamber With Multiple Plasma Units | March 2024 | October 2024 | Allow | 7 | 0 | 0 | No | No |
| 18689767 | GAS INJECTION DEVICE OF SEMICONDUCTOR THERMAL PROCESSING EQUIPMENT AND SEMICONDUCTOR THERMAL PROCESSING EQUIPMENT | March 2024 | November 2025 | Allow | 21 | 1 | 1 | No | No |
| 18589252 | SHOWERHEAD DEVICE FOR SEMICONDUCTOR PROCESSING SYSTEM | February 2024 | October 2024 | Allow | 8 | 0 | 0 | Yes | No |
| 18439532 | PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION REACTORS AND ASSOCIATED METHODS | February 2024 | January 2026 | Allow | 24 | 1 | 1 | Yes | No |
| 18427348 | SPATIALLY TUNABLE DEPOSITION TO COMPENSATE WITHIN WAFER DIFFERENTIAL BOW | January 2024 | April 2025 | Allow | 14 | 1 | 0 | Yes | No |
| 18419890 | SUBSTRATE PROCESSING APPARATUS, METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND RECORDING MEDIUM | January 2024 | September 2024 | Allow | 8 | 0 | 0 | Yes | No |
| 18419389 | MONOLITHIC MODULAR MICROWAVE SOURCE WITH INTEGRATED PROCESS GAS DISTRIBUTION | January 2024 | September 2024 | Allow | 8 | 0 | 0 | Yes | No |
| 18569325 | COATING PLANT FOR COATING A PLANAR OBJECT AND A METHOD FOR COATING A PLANAR OBJECT | December 2023 | July 2025 | Allow | 20 | 1 | 1 | Yes | No |
| 18532669 | CROSS FLOW GAS DELIVERY FOR PARTICLE REDUCTION | December 2023 | March 2026 | Allow | 27 | 0 | 0 | No | No |
| 18529576 | Showerhead Faceplate Having Flow Apertures Configured for Hollow Cathode Discharge Suppression | December 2023 | November 2025 | Abandon | 23 | 3 | 0 | No | No |
| 18526411 | SYSTEMS AND METHODS FOR PULSE WIDTH MODULATED DOSE CONTROL | December 2023 | September 2024 | Allow | 10 | 0 | 0 | Yes | No |
| 18516991 | SHOWER HEAD STRUCTURE AND PLASMA PROCESSING APPARATUS USING THE SAME | November 2023 | September 2024 | Allow | 10 | 0 | 0 | Yes | No |
| 18516087 | PRECURSOR CONTAINER | November 2023 | September 2024 | Allow | 10 | 0 | 0 | Yes | No |
| 18514911 | MASK AND DEPOSITION APPARATUS INCLUDING THE SAME | November 2023 | March 2026 | Allow | 28 | 0 | 0 | No | No |
| 18514494 | SUBSTRATE PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | November 2023 | September 2024 | Allow | 10 | 0 | 0 | Yes | No |
| 18493618 | SUBSTRATE PROCESSING DEVICE AND SUBSTRATE PROCESSING METHOD | October 2023 | June 2024 | Allow | 7 | 0 | 0 | Yes | No |
| 18372123 | PE-CVD APPARATUS AND METHOD | September 2023 | April 2024 | Allow | 7 | 0 | 0 | Yes | No |
| 18370750 | CONTINUOUS LINER FOR USE IN A PROCESSING CHAMBER | September 2023 | July 2024 | Allow | 10 | 1 | 0 | Yes | No |
| 18550940 | NOZZLE FOR REMOTE PLASMA CLEANING OF PROCESS CHAMBERS | September 2023 | February 2026 | Allow | 29 | 0 | 0 | Yes | No |
| 18464805 | DYNAMIC MULTI ZONE FLOW CONTROL FOR A PROCESSING SYSTEM | September 2023 | June 2024 | Allow | 9 | 0 | 1 | No | No |
| 18242598 | CHEMICAL SOURCE VESSEL WITH DIP TUBE | September 2023 | January 2025 | Allow | 16 | 2 | 0 | Yes | No |
| 18239856 | SUBSTRATE PROCESSING DEVICE | August 2023 | August 2024 | Allow | 11 | 1 | 0 | No | No |
| 18457061 | UNIFORM IN SITU CLEANING AND DEPOSITION | August 2023 | March 2025 | Allow | 18 | 2 | 0 | Yes | No |
| 18446634 | HEAT TREATMENT APPARATUS | August 2023 | December 2025 | Allow | 28 | 0 | 0 | No | No |
| 18228201 | SHOWERHEAD ASSEMBLY AND METHOD OF SERVICING ASSEMBLY FOR SEMICONDUCTOR MANUFACTURING | July 2023 | April 2024 | Allow | 9 | 0 | 0 | Yes | No |
| 18227524 | GAS MIXING SYSTEM FOR SEMICONDUCTOR FABRICATION | July 2023 | August 2024 | Allow | 13 | 1 | 0 | Yes | No |
| 18361267 | Actively Controlled gas inject FOR PROCESS Temperature CONTROL | July 2023 | December 2025 | Allow | 28 | 0 | 0 | No | No |
| 18262261 | GAS INLET ASSEMBLY OF PROCESS CHAMBER, GAS INLET DEVICE, AND SEMICONDUCTOR PROCESSING APPARATUS | July 2023 | July 2025 | Allow | 24 | 2 | 1 | Yes | No |
| 18223919 | ETCH MONITORING AND PERFORMING | July 2023 | November 2025 | Allow | 28 | 0 | 0 | Yes | No |
| 18272841 | CRUCIBLE, EVAPORATION SOURCE, EVAPORATION METHOD, EVAPORATION SYSTEM, AND METHOD OF MANUFACTURING A DEVICE | July 2023 | February 2026 | Abandon | 31 | 3 | 1 | Yes | No |
| 18222024 | TEMPERATURE CONTROL ASSEMBLY FOR SUBSTRATE PROCESSING APPARATUS AND METHOD OF USING SAME | July 2023 | April 2024 | Allow | 9 | 0 | 0 | Yes | No |
| 18350179 | FILM DEPOSITION APPARATUS AND FILM DEPOSITION METHOD | July 2023 | March 2025 | Allow | 21 | 1 | 2 | No | No |
| 18346433 | GASBOX FOR SEMICONDUCTOR PROCESSING CHAMBER | July 2023 | March 2024 | Allow | 9 | 0 | 0 | Yes | No |
| 18333361 | SYMMETRIC PUMP DOWN MINI-VOLUME WITH LAMINAR FLOW CAVITY GAS INJECTION FOR HIGH AND LOW PRESSURE | June 2023 | March 2024 | Allow | 9 | 0 | 0 | Yes | No |
| 18329791 | VACUUM PUMP PROTECTION AGAINST DEPOSITION BYPRODUCT BUILDUP | June 2023 | May 2024 | Allow | 11 | 0 | 0 | Yes | No |
| 18198682 | INDUCTIVELY COUPLED PLASMA APPARATUS WITH NOVEL FARADAY SHIELD | May 2023 | January 2026 | Allow | 32 | 1 | 0 | Yes | No |
| 18037146 | PRECURSOR DISPENSING SYSTEMS WITH LINE CHARGE VOLUME CONTAINERS FOR ATOMIC LAYER DEPOSITION | May 2023 | November 2025 | Allow | 30 | 2 | 1 | Yes | No |
| 18196605 | SUBSTRATE PROCESSING SYSTEMS INCLUDING GAS DELIVERY SYSTEM WITH REDUCED DEAD LEGS | May 2023 | December 2023 | Allow | 7 | 0 | 0 | Yes | No |
| 18313736 | HARDWARE TO PREVENT BOTTOM PURGE INCURSION IN APPLICATION VOLUME AND PROCESS GAS DIFFUSION BELOW HEATER | May 2023 | December 2023 | Allow | 7 | 0 | 0 | Yes | No |
| 18139470 | SYSTEM AND METHOD FOR DETECTING ENDPOINT IN PLASMA PROCESSING | April 2023 | December 2025 | Allow | 31 | 1 | 0 | No | No |
| 18305750 | PROCESS CHAMBER | April 2023 | May 2025 | Allow | 24 | 2 | 1 | Yes | No |
| 18028684 | METHOD FOR GROWING SINGLE CRYSTALS | March 2023 | December 2025 | Allow | 33 | 1 | 0 | No | No |
| 18181077 | SEMICONDUCTOR CHAMBER COMPONENTS WITH ADVANCED COATING TECHNIQUES | March 2023 | March 2025 | Allow | 24 | 1 | 1 | Yes | No |
| 18173704 | CERAMIC SHOWERHEADS WITH CONDUCTIVE ELECTRODES | February 2023 | August 2023 | Allow | 5 | 0 | 0 | Yes | No |
| 18163949 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD | February 2023 | April 2025 | Allow | 26 | 3 | 1 | No | No |
| 18164085 | SUBSTRATE PROCESSING APPARATUS, SUBSTRATE HOLDER, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | February 2023 | April 2025 | Allow | 27 | 1 | 1 | No | No |
| 18105404 | Substrate Processing Apparatus, Substrate Processing Method, Method of Manufacturing Semiconductor Device and Non-transitory Computer-readable Recording Medium | February 2023 | February 2025 | Allow | 25 | 1 | 1 | No | No |
| 18163828 | INTEGRATED SHOWERHEAD WITH THERMAL CONTROL FOR DELIVERING RADICAL AND PRECURSOR GAS TO A DOWNSTREAM CHAMBER TO ENABLE REMOTE PLASMA FILM DEPOSITION | February 2023 | January 2024 | Allow | 12 | 1 | 0 | Yes | No |
| 18040341 | SUPPORT UNIT AND SUBSTRATE PROCESSING APPARATUS INCLUDING SAME | February 2023 | October 2025 | Allow | 32 | 1 | 0 | No | No |
| 18103667 | ORGANIC VAPOR JET PRINTING SYSTEM | January 2023 | May 2024 | Allow | 15 | 3 | 0 | Yes | No |
| 18095053 | BOTTOM FED SUBLIMATION BED FOR HIGH SATURATION EFFICIENCY IN SEMICONDUCTOR APPLICATIONS | January 2023 | July 2023 | Allow | 6 | 0 | 0 | Yes | No |
| 18092413 | SYSTEMS AND METHODS FOR PULSE WIDTH MODULATED DOSE CONTROL | January 2023 | July 2023 | Allow | 7 | 0 | 0 | Yes | No |
| 18068778 | SUBSTRATE PROCESSING APPARATUS | December 2022 | March 2026 | Allow | 39 | 2 | 1 | Yes | No |
| 18084671 | PROTECTIVE GAS FLOW DURING WAFER DECHUCKING IN PVD CHAMBER | December 2022 | October 2025 | Allow | 34 | 2 | 0 | Yes | No |
| 18002334 | TRAP DEVICE AND SEMICONDUCTOR MANUFACTURING DEVICE | December 2022 | May 2025 | Allow | 29 | 0 | 0 | No | No |
| 18079903 | GROUNDING CAP MODULE AND GAS INJECTION DEVICE | December 2022 | February 2024 | Allow | 14 | 2 | 0 | Yes | No |
| 18080555 | ION EXTRACTION OPTICS HAVING NOVEL BLOCKER CONFIGURATION | December 2022 | May 2025 | Allow | 29 | 0 | 0 | Yes | No |
| 17606933 | SEMICONDUCTOR ETCHING APPARATUS | December 2022 | July 2025 | Allow | 45 | 0 | 1 | No | No |
| 18009326 | BLOCK VALVE FOR SUBSTRATE PROCESSING DEVICE, AND SUBSTRATE PROCESSING DEVICE | December 2022 | January 2026 | Allow | 38 | 1 | 0 | Yes | No |
| 18009238 | SEALING SURFACES OF COMPONENTS USED IN PLASMA ETCHING TOOLS USING ATOMIC LAYER DEPOSITION | December 2022 | November 2025 | Abandon | 36 | 2 | 1 | No | No |
| 18000635 | REMOVABLE SHOWERHEAD FACEPLATE FOR SEMICONDUCTOR PROCESSING TOOLS | December 2022 | May 2025 | Allow | 29 | 0 | 0 | No | No |
| 17928762 | PLASMA PROCESSING DEVICE AND PLASMA PROCESSING METHOD | November 2022 | January 2026 | Allow | 38 | 2 | 1 | Yes | No |
| 18071260 | Showerhead Faceplate Having Flow Apertures Configured for Hollow Cathode Discharge Suppression | November 2022 | July 2023 | Allow | 8 | 0 | 0 | Yes | No |
| 18059594 | SUBSTRATE PROCESSING APPARATUS AND A METHOD OF PROCESSING A SUBSTRATE USING THE SAME | November 2022 | November 2025 | Allow | 35 | 1 | 1 | Yes | No |
| 17987490 | SHOWER HEAD ELECTRODE ASSEMBLY AND PLASMA PROCESSING APPARATUS | November 2022 | December 2025 | Allow | 37 | 2 | 0 | Yes | No |
| 17986693 | METHODS FOR ETCHING STRUCTURES WITH OXYGEN PULSING | November 2022 | April 2025 | Allow | 29 | 0 | 0 | Yes | No |
| 17983907 | GAS DIFFUSER HOUSINGS, DEVICES, AND RELATED METHODS | November 2022 | July 2025 | Allow | 32 | 0 | 1 | Yes | No |
| 18051321 | CONTINUOUS LINER FOR USE IN A PROCESSING CHAMBER | October 2022 | July 2023 | Allow | 8 | 0 | 0 | Yes | No |
| 17974408 | ISOLATOR APPARATUS AND METHODS FOR SUBSTRATE PROCESSING CHAMBERS | October 2022 | July 2023 | Allow | 9 | 0 | 0 | Yes | No |
| 17964260 | BIMETALLIC FACEPLATE FOR SUBSTRATE PROCESSING | October 2022 | November 2025 | Allow | 37 | 2 | 1 | Yes | No |
| 17961040 | CHAMBER INJECTOR | October 2022 | July 2023 | Allow | 9 | 0 | 0 | Yes | No |
| 17955112 | SEMICONDUCTOR FABRICATION FACILITY | September 2022 | August 2025 | Allow | 35 | 1 | 1 | Yes | No |
| 17948571 | HIGH TEMPERATURE VACUUM SEAL | September 2022 | June 2023 | Allow | 9 | 0 | 0 | Yes | No |
| 17948323 | CLEAN ISOLATION VALVE FOR REDUCED DEAD VOLUME | September 2022 | June 2023 | Allow | 9 | 0 | 0 | Yes | No |
| 17941446 | SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUM THEREFOR | September 2022 | November 2023 | Allow | 14 | 0 | 1 | Yes | No |
| 17903173 | PRECURSOR CONTAINER | September 2022 | August 2023 | Allow | 12 | 2 | 1 | Yes | No |
| 17903847 | GAS FLOW GUIDE DESIGN FOR PLASMA SUPPRESSION | September 2022 | September 2025 | Allow | 36 | 1 | 0 | Yes | No |
| 17903882 | SUBSTRATE PROCESSING APPARATUS AND MAINTENANCE METHOD FOR SUBSTRATE PROCESSING APPARATUS | September 2022 | July 2025 | Allow | 34 | 0 | 1 | No | No |
| 17929585 | SHOWERHEAD DEVICE FOR SEMICONDUCTOR PROCESSING SYSTEM | September 2022 | December 2023 | Allow | 15 | 1 | 0 | Yes | No |
| 17901487 | SUBSTRATE PROCESSING APPARATUS | September 2022 | January 2026 | Allow | 41 | 2 | 0 | No | No |
| 17908050 | MEMBER FOR PLASMA PROCESSING APPARATUS, METHOD FOR MANUFACTURING SAME, AND PLASMA PROCESSING APPARATUS | August 2022 | October 2025 | Allow | 37 | 1 | 1 | No | No |
| 17897827 | GAS DISTRIBUTION ASSEMBLY INCLUDING POSITIONING DEVICE | August 2022 | July 2025 | Allow | 34 | 0 | 1 | No | No |
| 17897452 | GAS DISTRIBUTION APPARATUSES FOR IMPROVING MIXING UNIFORMITY | August 2022 | January 2026 | Allow | 41 | 2 | 0 | No | No |
| 17896557 | BAFFLE FOR A REACTOR SYSTEM | August 2022 | September 2025 | Allow | 37 | 1 | 1 | Yes | No |
| 17802843 | REACTION CHAMBER | August 2022 | May 2023 | Allow | 9 | 0 | 0 | No | No |
| 17896025 | SYSTEM AND METHOD FOR CONTROLLING FORELINE PRESSURE | August 2022 | February 2025 | Allow | 30 | 0 | 1 | Yes | No |
| 17821844 | FILM FORMING SYSTEM AND FILM FORMING METHOD | August 2022 | January 2025 | Allow | 29 | 4 | 1 | Yes | No |
| 17893223 | NORMAL PULSE PROFILE MODIFICATION IN A FILM DEPOSITION PROCESS | August 2022 | January 2026 | Allow | 41 | 2 | 0 | Yes | No |
| 17893783 | PLASMA ETCHING APPARATUS, PLASMA ETCHING METHOD USING THE SAME, AND SEMICONDUCTOR FABRICATION METHOD USING THE SAME | August 2022 | March 2025 | Allow | 31 | 1 | 2 | Yes | No |
| 17892423 | Substrate Processing Apparatus and Method of Manufacturing Semiconductor Device | August 2022 | August 2023 | Allow | 12 | 0 | 1 | Yes | No |
| 17820670 | APPARATUS FOR SUBSTRATE PROCESSING | August 2022 | September 2025 | Allow | 37 | 2 | 0 | Yes | No |
| 17889930 | High Temperature Chemical Vapor Deposition Lid | August 2022 | May 2023 | Allow | 9 | 0 | 0 | Yes | No |
| 17889952 | WAFER CARRIER WITH ADJUSTABLE ALIGNMENT DEVICES AND DEPOSITION EQUIPMENT USING THE SAME | August 2022 | June 2025 | Allow | 34 | 0 | 1 | No | No |
| 17885636 | SUBSTRATE PROCESSING APPARATUS, PROCESS VESSEL, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND NON-TRANSITORY TANGIBLE MEDIUM | August 2022 | March 2025 | Allow | 31 | 0 | 1 | No | No |
This analysis examines appeal outcomes and the strategic value of filing appeals for examiner ZERVIGON, RUDY.
With a 42.6% reversal rate, the PTAB reverses the examiner's rejections in a meaningful percentage of cases. This reversal rate is above the USPTO average, indicating that appeals have better success here than typical.
Filing a Notice of Appeal can sometimes lead to allowance even before the appeal is fully briefed or decided by the PTAB. This occurs when the examiner or their supervisor reconsiders the rejection during the mandatory appeal conference (MPEP § 1207.01) after the appeal is filed.
In this dataset, 27.2% of applications that filed an appeal were subsequently allowed. This appeal filing benefit rate is below the USPTO average, suggesting that filing an appeal has limited effectiveness in prompting favorable reconsideration.
✓ Appeals to PTAB show good success rates. If you have a strong case on the merits, consider fully prosecuting the appeal to a Board decision.
⚠ Filing a Notice of Appeal shows limited benefit. Consider other strategies like interviews or amendments before appealing.
Examiner ZERVIGON, RUDY works in Art Unit 1716 and has examined 1,077 patent applications in our dataset. With an allowance rate of 73.2%, this examiner has a below-average tendency to allow applications. Applications typically reach final disposition in approximately 35 months.
Examiner ZERVIGON, RUDY's allowance rate of 73.2% places them in the 37% percentile among all USPTO examiners. This examiner has a below-average tendency to allow applications.
On average, applications examined by ZERVIGON, RUDY receive 2.30 office actions before reaching final disposition. This places the examiner in the 65% percentile for office actions issued. This examiner issues a slightly above-average number of office actions.
The median time to disposition (half-life) for applications examined by ZERVIGON, RUDY is 35 months. This places the examiner in the 38% percentile for prosecution speed. Prosecution timelines are slightly slower than average with this examiner.
Conducting an examiner interview provides a -10.7% benefit to allowance rate for applications examined by ZERVIGON, RUDY. This interview benefit is in the 3% percentile among all examiners. Note: Interviews show limited statistical benefit with this examiner compared to others, though they may still be valuable for clarifying issues.
When applicants file an RCE with this examiner, 20.0% of applications are subsequently allowed. This success rate is in the 21% percentile among all examiners. Strategic Insight: RCEs show lower effectiveness with this examiner compared to others. Consider whether a continuation application might be more strategic, especially if you need to add new matter or significantly broaden claims.
This examiner enters after-final amendments leading to allowance in 27.4% of cases where such amendments are filed. This entry rate is in the 38% percentile among all examiners. Strategic Recommendation: This examiner shows below-average receptiveness to after-final amendments. You may need to file an RCE or appeal rather than relying on after-final amendment entry.
When applicants request a pre-appeal conference (PAC) with this examiner, 79.4% result in withdrawal of the rejection or reopening of prosecution. This success rate is in the 62% percentile among all examiners. Strategic Recommendation: Pre-appeal conferences show above-average effectiveness with this examiner. If you have strong arguments, a PAC request may result in favorable reconsideration.
This examiner withdraws rejections or reopens prosecution in 65.7% of appeals filed. This is in the 46% percentile among all examiners. Of these withdrawals, 46.7% occur early in the appeal process (after Notice of Appeal but before Appeal Brief). Strategic Insight: This examiner shows below-average willingness to reconsider rejections during appeals. Be prepared to fully prosecute appeals if filed.
When applicants file petitions regarding this examiner's actions, 49.4% are granted (fully or in part). This grant rate is in the 45% percentile among all examiners. Strategic Note: Petitions show below-average success regarding this examiner's actions. Ensure you have a strong procedural basis before filing.
Examiner's Amendments: This examiner makes examiner's amendments in 2.5% of allowed cases (in the 77% percentile). Per MPEP § 1302.04, examiner's amendments are used to place applications in condition for allowance when only minor changes are needed. This examiner frequently uses this tool compared to other examiners, indicating a cooperative approach to getting applications allowed. Strategic Insight: If you are close to allowance but minor claim amendments are needed, this examiner may be willing to make an examiner's amendment rather than requiring another round of prosecution.
Quayle Actions: This examiner issues Ex Parte Quayle actions in 0.3% of allowed cases (in the 52% percentile). This examiner issues Quayle actions more often than average when claims are allowable but formal matters remain (MPEP § 714.14).
Based on the statistical analysis of this examiner's prosecution patterns, here are tailored strategic recommendations:
Not Legal Advice: The information provided in this report is for informational purposes only and does not constitute legal advice. You should consult with a qualified patent attorney or agent for advice specific to your situation.
No Guarantees: We do not provide any guarantees as to the accuracy, completeness, or timeliness of the statistics presented above. Patent prosecution statistics are derived from publicly available USPTO data and are subject to data quality limitations, processing errors, and changes in USPTO practices over time.
Limitation of Liability: Under no circumstances will IronCrow AI be liable for any outcome, decision, or action resulting from your reliance on the statistics, analysis, or recommendations presented in this report. Past prosecution patterns do not guarantee future results.
Use at Your Own Risk: While we strive to provide accurate and useful prosecution statistics, you should independently verify any information that is material to your prosecution strategy and use your professional judgment in all patent prosecution matters.