USPTO Examiner CHEN KEATH T - Art Unit 1716

Recent Applications

Detailed information about the 100 most recent patent applications.

Application NumberTitleFiling DateDisposal DateDispositionTime (months)Office ActionsRestrictionsInterviewAppeal
19055567DEVICE AND METHOD FOR PRODUCING THIN-FILM CATALYSTFebruary 2025April 2025Allow200YesNo
18397941PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHODDecember 2023April 2025Allow1611YesNo
18567025DEVICE AND METHOD FOR PRODUCING THIN-FILM CATALYSTDecember 2023June 2025Abandon1821YesNo
18387132CRUCIBLE COVER FOR COATING WITH AN ELECTRON BEAM SOURCENovember 2023November 2024Allow1200YesNo
18499667VACUUM PROCESSING APPARATUS AND OXIDIZING GAS REMOVAL METHODNovember 2023May 2025Allow1821YesNo
18495738SUBSTRATE PROCESSING APPARATUSOctober 2023October 2025Abandon2420YesNo
18381192METHOD, DEVICE, AND SYSTEM FOR MANUFACTURING COMPOSITE METAL FOILOctober 2023October 2024Abandon1220YesNo
18202081THERMAL EVAPORATION SOURCES FOR WIDE-AREA DEPOSITIONMay 2023December 2024Allow1911NoNo
18323346DEPOSITION APPARATUSMay 2023December 2025Allow3110YesNo
18314231DEPOSITION APPARATUS AND DEPOSITION METHOD USING DEPOSITION APPARATUSMay 2023December 2025Allow3131YesNo
18192468MASK ASSEMBLY AND METHOD FOR MANUFACTURING OF THE SAMEMarch 2023June 2025Allow2741YesNo
18120675THERMAL BARRIER COATING WITH REDUCED STABILIZER CONTENTMarch 2023June 2025Abandon2821NoNo
18111842PEDESTAL FOR SUBSTRATE PROCESSING CHAMBERSFebruary 2023February 2024Allow1200NoNo
18040675VAPOR DEPOSITION SOURCE FOR VACUUM VAPOR DEPOSITION APPARATUSFebruary 2023December 2025Abandon3410NoNo
18149755Apparatus for the Temperature Control of a Substrate and Corresponding Production MethodJanuary 2023April 2024Abandon1520YesNo
18147790SUPPORT UNIT AND APPARATUS FOR TREATING SUBSTRATE WITH THE UNITDecember 2022December 2025Abandon3610NoNo
18011582REMOTE PLASMA SOURCE SHOWERHEAD ASSEMBLY WITH ALUMINUM FLUORIDE PLASMA EXPOSED SURFACEDecember 2022December 2025Abandon3601NoNo
18056062MATERIAL DEPOSITION SYSTEM EQUIPMENT MAINTENANCENovember 2022October 2024Abandon2331YesYes
17922785METAL MASK, EVAPORATION METHOD, DISPLAY PANEL AND DISPLAY DEVICENovember 2022January 2026Abandon3941NoNo
17974727PLASMA PROCESSING APPARATUSOctober 2022September 2024Abandon2230NoNo
17957610STACKING TOOL FIXTURE FOR FORCED FLOW CHEMICAL VAPOR INFILTRATIONSeptember 2022April 2025Allow3121YesNo
17939457RAW MATERIAL FEEDING DEVICE, SUBSTRATE PROCESSING SYSTEM, AND RESIDUAL ESTIMATION METHODSeptember 2022September 2025Allow3720YesNo
17802263MASK, AND MANUFACTURING METHOD FOR MASKAugust 2022July 2025Allow3511YesNo
17883778DRY ETCHING APPARATUS AND WAFER ETCHING SYSTEM USING THE SAMEAugust 2022July 2025Allow3501YesNo
17882967VAPOR DEPOSITION APPARATUSAugust 2022February 2026Abandon4260YesYes
17878912STRUCTURE OF MOUNTING TABLE AND SEMICONDUCTOR PROCESSING APPARATUSAugust 2022April 2024Abandon2120NoNo
17874124DEVICES AND METHODS FOR CONTROLLING WAFER UNIFORMITY IN PLASMA-BASED PROCESSJuly 2022July 2025Allow3601YesNo
17872678VACUUM SYSTEM CLUSTER TOOLJuly 2022September 2025Abandon3821NoNo
17871505PROCESS KITS AND RELATED METHODS FOR PROCESSING CHAMBERS TO FACILITATE DEPOSITION PROCESS ADJUSTABILITYJuly 2022March 2025Allow3101YesNo
17863463DEVICE FOR VAPOR DEPOSITING METALJuly 2022March 2025Abandon3250NoNo
17853377Substrate Processing Apparatus, Method of Manufacturing Semiconductor Device and Non-transitory Computer-readable Recording MediumJune 2022December 2025Allow4222YesNo
17852086MODULAR MICROWAVE PLASMA SOURCEJune 2022February 2026Allow4440NoNo
17807506FILM FORMING APPARATUSJune 2022November 2024Allow2950YesNo
17835718REMOTE PLASMA APPARATUS FOR GENERATING HIGH-POWER DENSITY MICROWAVE PLASMAJune 2022March 2026Allow4531NoNo
17834278PLASMA CHAMBER WITH GAS CROSS-FLOW, MICROWAVE RESONATORS AND A ROTATABLE PEDESTAL FOR MULTIPHASE CYCLIC DEPOSITIONJune 2022August 2025Allow3830YesNo
17783264LIQUID PRECURSOR VAPORIZERJune 2022August 2025Allow3831YesNo
17805062SHOWERHEAD AND SUBSTRATE PROCESSING APPARATUSJune 2022September 2024Allow2701YesNo
17825136CLOSE COUPLE DIFFUSER FOR PHYSICAL VAPOR DEPOSITION WEB COATINGMay 2022February 2026Abandon4530YesNo
17745395METHOD OF FABRICATING ANISOTROPIC OPTICAL INTERFERENCE FILTERMay 2022April 2024Allow2330YesNo
17720482ARC ION COATING DEVICE AND COATING METHODApril 2022October 2025Abandon4251YesNo
17709931METHODS OF PREVENTING METAL CONTAMINATION BY CERAMIC HEATERMarch 2022March 2026Abandon4740NoNo
17704218SUPPORT UNIT AND SUBSTRATE TREATING APPARATUSMarch 2022March 2025Allow3520YesNo
17703537PIXELATED SHOWERHEAD FOR RF SENSITIVE PROCESSESMarch 2022January 2026Abandon4630YesNo
17695476Electron-Beam Deposition of Striated Composite Layers for High-Fluence Laser CoatingsMarch 2022October 2023Abandon1911NoNo
17640782PLASMA TREATMENT SYSTEM AND PLASMA TREATMENT METHODMarch 2022January 2025Abandon3520NoNo
17653161SUBSTRATE PROCESSING APPARATUSMarch 2022July 2024Abandon2801NoNo
17677656SEMICONDUCTOR PROCESSING APPARATUS FOR HIGH RF POWER PROCESSFebruary 2022January 2024Abandon2320YesNo
17677855HARDWARE AND PROCESSES FOR IN OPERANDO DEPOSITION SHIELD REPLACEMENT/SURFACE CLEANINGFebruary 2022June 2025Abandon4021NoNo
17670819Systems And Methods For Workpiece Processing Using Neutral Atom BeamsFebruary 2022August 2025Abandon4231NoNo
17633727MOVEABLE EDGE RINGS FOR SUBSTRATE PROCESSING SYSTEMSFebruary 2022June 2025Abandon4131YesNo
17666871PLASMA PROCESSING APPARATUSFebruary 2022July 2024Allow2901YesNo
17632056PLASMA PROCESSING DEVICEFebruary 2022July 2025Abandon4140YesNo
17585476LOWER ELECTRODE ASSEMBLY AND PLASMA PROCESSING DEVICEJanuary 2022September 2025Allow4450YesNo
17629649PROCESS CHAMBER OF EPITAXIAL GROWTH APPARATUSJanuary 2022April 2025Abandon3940YesNo
17569161MASK PLATE AND EVAPORATION SYSTEMJanuary 2022July 2024Allow3020YesNo
17554645METHODS AND APPARATUS FOR CONTROLLING RADIO FREQUENCY ELECTRODE IMPEDANCES IN PROCESS CHAMBERSDecember 2021November 2024Allow3521YesNo
17596571VAPOR DEPOSITION DEVICEDecember 2021February 2024Allow2600YesNo
17546384MASK AND EVAPORATION SYSTEMDecember 2021March 2025Abandon3940YesNo
17546371MASK AND EVAPORATION SYSTEMDecember 2021June 2025Abandon4340YesNo
17617244MULTIPLE VACUUM CHAMBER EXHAUST SYSTEM AND METHOD OF EVACUATING MULTIPLE CHAMBERSDecember 2021May 2025Abandon4121NoNo
17457725SEMICONDUCTOR-MANUFACTURING APPARATUS MEMBER AND PLUGDecember 2021March 2024Allow2711YesNo
17605106VAPOR DEPOSITION UNIT AND VACUUM VAPOR DEPOSITION APPARATUS PROVIDED WITH VAPOR DEPOSITION UNITOctober 2021August 2023Abandon2230YesNo
17503734MASKOctober 2021November 2024Abandon3731YesNo
17497851DEPOSITION SOURCE EVAPORATING APPARATUS AND MANUFACTURING METHOD THEREOFOctober 2021April 2025Abandon4260NoNo
17601693THIN FILM MANUFACTURING APPARATUSOctober 2021November 2024Abandon3730NoNo
17437681EVAPORATOR AND DEPOSITION APPARATUSSeptember 2021January 2024Abandon2910NoNo
17466184PLASMA PROCESSING APPARATUS AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD USING THE SAMESeptember 2021November 2023Allow2722YesNo
17411829VAPOR PHASE GROWTH APPARATUSAugust 2021March 2025Abandon4340NoNo
17424306MULTI-CHANNEL LIQUID DELIVERY SYSTEM FOR ADVANCED SEMICONDUCTOR APPLICATIONSJuly 2021December 2024Abandon4030NoNo
17379273GAS SUPPLY STRUCTURE AND SUBSTRATE PROCESSING APPARATUSJuly 2021August 2025Allow4950YesNo
17420086VACUUM PROCESSING APPARATUS AND METHOD OF CLEANING VACUUM PROCESSING APPARATUSJune 2021September 2023Allow2700NoNo
17420087VACUUM PROCESSING APPARATUSJune 2021February 2024Abandon3110NoNo
17309828MASK ASSEMBLY AND MANUFACTURING METHOD THEREOFJune 2021April 2024Allow3421YesNo
17415838VAPOR DEPOSITION DEVICEJune 2021July 2025Abandon4951YesNo
17350125VACUUM PROCESSING APPARATUS AND OXIDIZING GAS REMOVAL METHODJune 2021March 2024Abandon3331NoNo
17414753APPARATUS AND METHOD FOR CONTROLLING COATING LAYER IN PVD PLATING PROCESSJune 2021September 2025Abandon5151NoNo
17345571APPARATUS FOR MANUFACTURING POLYSILICON RODJune 2021January 2023Allow2000YesNo
17339318APPARATUS FOR VAPOR JET DEPOSITION AND METHOD FOR MANUFACTURING VAPOR JET NOZZLE UNITJune 2021April 2024Abandon3541NoNo
17334636APPARATUS FOR GENERATING MAGNETIC FIELDS DURING SEMICONDUCTOR PROCESSINGMay 2021December 2023Allow3011YesNo
17332871VAPOR DEPOSITION APPARATUS AND METHOD FOR COATING A SUBSTRATE IN A VACUUM CHAMBERMay 2021November 2025Abandon5481YesNo
17330841MASK AND METHOD OF MANUFACTURING THE SAMEMay 2021November 2025Abandon5461NoNo
17295083Crucible cover for coating with an electron beam sourceMay 2021September 2023Allow2810YesNo
17316338System and Method for Thermally Cracking AmmoniaMay 2021July 2023Abandon2622NoNo
17315998TEMPERATURE-TUNED SUBSTRATE SUPPORT FOR SUBSTRATE PROCESSING SYSTEMSMay 2021July 2025Allow5030YesYes
17307386MASK, METHOD OF PROVIDING MASK, AND METHOD OF PROVIDING DISPLAY PANEL USING THE SAMEMay 2021May 2023Allow2521YesNo
17290413COATING APPARATUS, PROCESS CHAMBER, AND METHOD OF COATING A SUBSTRATE AND SUBSTRATE COATED WITH AT LEAST ONE MATERIAL LAYERApril 2021January 2025Abandon4441NoNo
17232231PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHODApril 2021September 2023Allow2912YesNo
17228745SEGMENTED OVJP PRINT BARApril 2021June 2024Allow3821YesNo
17226578MASK ASSEMBLY AND DEPOSITION APPARATUS INCLUDING THE SAMEApril 2021October 2025Abandon5480YesNo
17211634SUSCEPTOR AND CHEMICAL VAPOR DEPOSITION APPARATUSMarch 2021January 2026Abandon5781NoYes
17208216APPARATUSES FOR MANUFACTURING SEMICONDUCTOR DEVICESMarch 2021April 2025Abandon4941YesNo
17207363EVAPORATION SOURCE FOR ORGANIC MATERIAL, DEPOSITION APPARATUS FOR DEPOSITING ORGANIC MATERIALS IN A VACUUM CHAMBER HAVING AN EVAPORATION SOURCE FOR ORGANIC MATERIAL, AND METHOD FOR EVAPORATING ORGANIC MATERIALMarch 2021October 2022Abandon1901NoNo
17200526INTEGRATED ATOMIC LAYER PASSIVATION IN TCP ETCH CHAMBER AND IN-SITU ETCH-ALP METHODMarch 2021December 2024Abandon4530NoNo
17195771MASK ASSEMBLY AND METHOD OF PROVIDING MASK ASSEMBLYMarch 2021March 2024Abandon3751YesNo
17196639DEPOSITION APPARATUS AND METHOD FOR SEATING MASK OF DEPOSITION APPARATUSMarch 2021June 2025Allow5171YesNo
17182473FLUID-ASSISTED THERMAL MANAGEMENT OF EVAPORATION SOURCESFebruary 2021August 2023Abandon3020NoNo
17168206SUBSTRATE PROCESSING APPARATUSFebruary 2021November 2023Abandon3320NoNo
17265251SEMICONDUCTOR PROCESSING DEVICEFebruary 2021November 2025Allow5861YesYes
17162486Evaporation BoatJanuary 2021October 2025Abandon5660YesYes
17153281SEMICONDUCTOR MANUFACTURING APPARATUSJanuary 2021March 2024Abandon3840YesNo

Appeals Overview

This analysis examines appeal outcomes and the strategic value of filing appeals for examiner CHEN, KEATH T.

Patent Trial and Appeal Board (PTAB) Decisions

Total PTAB Decisions
70
Examiner Affirmed
46
(65.7%)
Examiner Reversed
24
(34.3%)
Reversal Percentile
56.1%
Higher than average

What This Means

With a 34.3% reversal rate, the PTAB reverses the examiner's rejections in a meaningful percentage of cases. This reversal rate is above the USPTO average, indicating that appeals have better success here than typical.

Strategic Value of Filing an Appeal

Total Appeal Filings
136
Allowed After Appeal Filing
45
(33.1%)
Not Allowed After Appeal Filing
91
(66.9%)
Filing Benefit Percentile
50.4%
Higher than average

Understanding Appeal Filing Strategy

Filing a Notice of Appeal can sometimes lead to allowance even before the appeal is fully briefed or decided by the PTAB. This occurs when the examiner or their supervisor reconsiders the rejection during the mandatory appeal conference (MPEP § 1207.01) after the appeal is filed.

In this dataset, 33.1% of applications that filed an appeal were subsequently allowed. This appeal filing benefit rate is above the USPTO average, suggesting that filing an appeal can be an effective strategy for prompting reconsideration.

Strategic Recommendations

Appeals to PTAB show good success rates. If you have a strong case on the merits, consider fully prosecuting the appeal to a Board decision.

Filing a Notice of Appeal is strategically valuable. The act of filing often prompts favorable reconsideration during the mandatory appeal conference.

Examiner CHEN, KEATH T - Prosecution Strategy Guide

Executive Summary

Examiner CHEN, KEATH T works in Art Unit 1716 and has examined 998 patent applications in our dataset. With an allowance rate of 33.5%, this examiner allows applications at a lower rate than most examiners at the USPTO. Applications typically reach final disposition in approximately 40 months.

Allowance Patterns

Examiner CHEN, KEATH T's allowance rate of 33.5% places them in the 5% percentile among all USPTO examiners. This examiner is less likely to allow applications than most examiners at the USPTO.

Office Action Patterns

On average, applications examined by CHEN, KEATH T receive 3.03 office actions before reaching final disposition. This places the examiner in the 87% percentile for office actions issued. This examiner issues more office actions than most examiners, which may indicate thorough examination or difficulty in reaching agreement with applicants.

Prosecution Timeline

The median time to disposition (half-life) for applications examined by CHEN, KEATH T is 40 months. This places the examiner in the 23% percentile for prosecution speed. Applications take longer to reach final disposition with this examiner compared to most others.

Interview Effectiveness

Conducting an examiner interview provides a +25.3% benefit to allowance rate for applications examined by CHEN, KEATH T. This interview benefit is in the 72% percentile among all examiners. Recommendation: Interviews provide an above-average benefit with this examiner and are worth considering.

Request for Continued Examination (RCE) Effectiveness

When applicants file an RCE with this examiner, 8.5% of applications are subsequently allowed. This success rate is in the 4% percentile among all examiners. Strategic Insight: RCEs show lower effectiveness with this examiner compared to others. Consider whether a continuation application might be more strategic, especially if you need to add new matter or significantly broaden claims.

After-Final Amendment Practice

This examiner enters after-final amendments leading to allowance in 10.6% of cases where such amendments are filed. This entry rate is in the 11% percentile among all examiners. Strategic Recommendation: This examiner rarely enters after-final amendments compared to other examiners. You should generally plan to file an RCE or appeal rather than relying on after-final amendment entry. Per MPEP § 714.12, primary examiners have discretion in entering after-final amendments, and this examiner exercises that discretion conservatively.

Pre-Appeal Conference Effectiveness

When applicants request a pre-appeal conference (PAC) with this examiner, 56.0% result in withdrawal of the rejection or reopening of prosecution. This success rate is in the 48% percentile among all examiners. Note: Pre-appeal conferences show below-average success with this examiner. Consider whether your arguments are strong enough to warrant a PAC request.

Appeal Withdrawal and Reconsideration

This examiner withdraws rejections or reopens prosecution in 48.5% of appeals filed. This is in the 14% percentile among all examiners. Of these withdrawals, 27.3% occur early in the appeal process (after Notice of Appeal but before Appeal Brief). Strategic Insight: This examiner rarely withdraws rejections during the appeal process compared to other examiners. If you file an appeal, be prepared to fully prosecute it to a PTAB decision. Per MPEP § 1207, the examiner will prepare an Examiner's Answer maintaining the rejections.

Petition Practice

When applicants file petitions regarding this examiner's actions, 58.1% are granted (fully or in part). This grant rate is in the 61% percentile among all examiners. Strategic Note: Petitions show above-average success regarding this examiner's actions. Petitionable matters include restriction requirements (MPEP § 1002.02(c)(2)) and various procedural issues.

Examiner Cooperation and Flexibility

Examiner's Amendments: This examiner makes examiner's amendments in 0.8% of allowed cases (in the 65% percentile). This examiner makes examiner's amendments more often than average to place applications in condition for allowance (MPEP § 1302.04).

Quayle Actions: This examiner issues Ex Parte Quayle actions in 1.2% of allowed cases (in the 63% percentile). This examiner issues Quayle actions more often than average when claims are allowable but formal matters remain (MPEP § 714.14).

Prosecution Strategy Recommendations

Based on the statistical analysis of this examiner's prosecution patterns, here are tailored strategic recommendations:

  • Prepare for rigorous examination: With a below-average allowance rate, ensure your application has strong written description and enablement support. Consider filing a continuation if you need to add new matter.
  • Expect multiple rounds of prosecution: This examiner issues more office actions than average. Address potential issues proactively in your initial response and consider requesting an interview early in prosecution.
  • Plan for RCE after final rejection: This examiner rarely enters after-final amendments. Budget for an RCE in your prosecution strategy if you receive a final rejection.
  • Plan for extended prosecution: Applications take longer than average with this examiner. Factor this into your continuation strategy and client communications.

Relevant MPEP Sections for Prosecution Strategy

  • MPEP § 713.10: Examiner interviews - available before Notice of Allowance or transfer to PTAB
  • MPEP § 714.12: After-final amendments - may be entered "under justifiable circumstances"
  • MPEP § 1002.02(c): Petitionable matters to Technology Center Director
  • MPEP § 1004: Actions requiring primary examiner signature (allowances, final rejections, examiner's answers)
  • MPEP § 1207.01: Appeal conferences - mandatory for all appeals
  • MPEP § 1214.07: Reopening prosecution after appeal

Important Disclaimer

Not Legal Advice: The information provided in this report is for informational purposes only and does not constitute legal advice. You should consult with a qualified patent attorney or agent for advice specific to your situation.

No Guarantees: We do not provide any guarantees as to the accuracy, completeness, or timeliness of the statistics presented above. Patent prosecution statistics are derived from publicly available USPTO data and are subject to data quality limitations, processing errors, and changes in USPTO practices over time.

Limitation of Liability: Under no circumstances will IronCrow AI be liable for any outcome, decision, or action resulting from your reliance on the statistics, analysis, or recommendations presented in this report. Past prosecution patterns do not guarantee future results.

Use at Your Own Risk: While we strive to provide accurate and useful prosecution statistics, you should independently verify any information that is material to your prosecution strategy and use your professional judgment in all patent prosecution matters.