Detailed information about the 100 most recent patent applications.
| Application Number | Title | Filing Date | Disposal Date | Disposition | Time (months) | Office Actions | Restrictions | Interview | Appeal |
|---|---|---|---|---|---|---|---|---|---|
| 18820061 | REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND MANUFACTURING METHOD THEREFOR | August 2024 | October 2024 | Allow | 1 | 0 | 0 | No | No |
| 18751925 | NANOCELLULOSE X-RAY FILM AND METHOD OF MAKING | June 2024 | September 2024 | Allow | 3 | 0 | 0 | Yes | No |
| 18749170 | EUV PHOTO MASKS AND MANUFACTURING METHOD THEREOF | June 2024 | March 2025 | Allow | 8 | 0 | 0 | No | No |
| 18749541 | FILM, MANUFACTURING METHOD OF FILM, AND LAMINATE | June 2024 | June 2025 | Abandon | 12 | 0 | 0 | No | No |
| 18664420 | ANISOTROPIC THERMALLY CONDUCTIVE POLYMERS WITH DYNAMIC MOLECULAR WEIGHT, AND METHODS OF MAKING THE SAME | May 2024 | June 2025 | Allow | 13 | 0 | 0 | No | No |
| 18654329 | METHOD FOR FORMING STRUCTURE OF PELLICLE-MASK STRUCTURE WITH VENT STRUCTURE | May 2024 | June 2025 | Allow | 13 | 2 | 0 | No | No |
| 18654160 | ORGANOTIN PATTERNING MATERIALS WITH LIGANDS HAVING SILICON/GERMANIUM; PRECURSOR COMPOSITIONS; AND SYNTHESIS METHODS | May 2024 | January 2025 | Allow | 8 | 0 | 0 | No | No |
| 18706104 | LIQUID CRYSTAL COMPOUND, LIQUID CRYSTAL COMPOSITION THEREOF, AND LIQUID CRYSTAL DISPLAY DEVICE | April 2024 | June 2025 | Allow | 14 | 1 | 0 | No | No |
| 18649060 | PELLICLE FOR FLAT PANEL DISPLAY PHOTOMASK | April 2024 | February 2025 | Allow | 9 | 0 | 0 | No | No |
| 18642711 | PATTERN FORMING METHOD AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | April 2024 | April 2025 | Allow | 12 | 1 | 0 | No | No |
| 18639365 | BIO-DERIVED X-RAY-SENSITIVE FILM AND A METHOD OF PREPARATION THEREOF | April 2024 | June 2024 | Allow | 2 | 0 | 0 | No | No |
| 18701832 | ANTHRAQUINONE COMPOUND, LIQUID CRYSTAL COMPOSITION CONTAINING SAID COMPOUND, AND LIGHT-CONTROLLING ELEMENT | April 2024 | March 2025 | Allow | 11 | 1 | 0 | No | No |
| 18631063 | LIQUID CRYSTAL COMPOSITION AND LIQUID CRYSTAL ELEMENT | April 2024 | January 2025 | Allow | 9 | 1 | 0 | No | No |
| 18698038 | ANTHRAQUINONE COMPOUND, LIQUID CRYSTAL COMPOSITION CONTAINING SAID COMPOUND, AND DIMMING ELEMENT | April 2024 | March 2025 | Allow | 12 | 1 | 0 | No | No |
| 18621502 | REFLECTIVE MASK BLANK AND REFLECTIVE MASK | March 2024 | June 2024 | Allow | 3 | 0 | 0 | No | No |
| 18609833 | PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE | March 2024 | March 2025 | Allow | 11 | 1 | 0 | No | No |
| 18601853 | METHOD FOR SIZING A GRAY SCALE LITHOGRAPHY MASK | March 2024 | June 2024 | Allow | 3 | 0 | 0 | No | No |
| 18601592 | METHODS AND SYSTEMS FOR RETICLE ENHANCEMENT TECHNOLOGY OF A DESIGN PATTERN TO BE MANUFACTURED ON A SUBSTRATE | March 2024 | November 2024 | Allow | 8 | 0 | 0 | No | No |
| 18591383 | METHOD OF MANUFACTURING INTEGRATED CIRCUIT | February 2024 | November 2024 | Allow | 9 | 0 | 0 | No | No |
| 18686535 | Liquid Crystalline Polymer Composition and Molded Article Produced Therefrom | February 2024 | June 2025 | Allow | 16 | 1 | 0 | No | No |
| 18444020 | REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING REFLECTIVE MASK BLANK, AND METHOD OF MANUFACTURING REFLECTIVE MASK | February 2024 | May 2024 | Allow | 3 | 0 | 0 | No | No |
| 18439057 | REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY AND SUBSTRATE WITH CONDUCTIVE FILM | February 2024 | October 2024 | Allow | 8 | 0 | 0 | No | No |
| 18438142 | FABRICATING A DEVICE USING A MULTILAYER STACK | February 2024 | December 2024 | Allow | 10 | 1 | 0 | Yes | No |
| 18437967 | Nonlinear Optical Chromophores Having Tetrahydrocarbazole Donor Groups, Lyotropic Compositions Containing the Same, and Methods of Poling Such Compositions | February 2024 | September 2024 | Allow | 7 | 1 | 0 | No | No |
| 18436895 | TONER AND METHOD OF FORMATION USING FLY ASH-RICH CARBON | February 2024 | December 2024 | Allow | 10 | 1 | 0 | No | No |
| 18433486 | COMPUTER-READABLE STORAGE MEDIUM RECORDING DATA STRUCTURE FOR STORING DATA CONTROLLING OPERATION OF OVERLAY MEASUREMENT DEVICE AND OVERLAY MEASUREMENT DEVICE THEREFOR | February 2024 | August 2024 | Allow | 6 | 0 | 0 | No | No |
| 18433479 | COMPUTER-READABLE STORAGE MEDIUM RECORDING DATA STRUCTURE FOR STORING DATA CONTROLLING OPERATION OF OVERLAY MEASUREMENT DEVICE AND OVERLAY MEASUREMENT DEVICE THEREFOR | February 2024 | August 2024 | Allow | 6 | 0 | 0 | No | No |
| 18433482 | COMPUTER-READABLE STORAGE MEDIUM RECORDING DATA STRUCTURE FOR STORING DATA CONTROLLING OPERATION OF OVERLAY MEASUREMENT DEVICE AND OVERLAY MEASUREMENT DEVICE THEREFOR | February 2024 | August 2024 | Allow | 6 | 0 | 0 | No | No |
| 18420846 | REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING REFLECTIVE MASK BLANK, AND METHOD OF MANUFACTURING REFLECTIVE MASK | January 2024 | October 2024 | Allow | 9 | 2 | 0 | No | No |
| 18417352 | REFLECTIVE MASK BLANK AND REFLECTIVE MASK | January 2024 | September 2024 | Allow | 8 | 0 | 0 | No | No |
| 18411091 | METHOD OF MANUFACTURING PHASE SHIFT PHOTO MASKS | January 2024 | May 2025 | Allow | 16 | 2 | 0 | No | No |
| 18404934 | METHOD AND APPARATUS FOR DIRECT WRITING PHOTOETCHING BY PARALLEL INTERPENETRATING SUPER-RESOLUTION HIGH-SPEED LASER | January 2024 | July 2024 | Allow | 6 | 0 | 0 | No | No |
| 18402511 | EUV PHOTO MASKS AND MANUFACTURING METHOD THEREOF | January 2024 | September 2024 | Allow | 8 | 0 | 0 | No | No |
| 18575719 | PHOTOLITHOGRAPHY METHOD | December 2023 | October 2024 | Allow | 9 | 1 | 0 | No | No |
| 18575532 | MASK TOPOLOGY OPTIMIZATION METHOD AND SYSTEM FOR SURFACE PLASMON NEAR-FIELD PHOTOLITHOGRAPHY | December 2023 | July 2024 | Allow | 7 | 0 | 0 | No | No |
| 18575736 | METHOD FOR INVERSE OPTICAL PROXIMITY CORRECTION OF SUPER-RESOLUTION LITHOGRAPHY BASED ON LEVEL SET ALGORITHM | December 2023 | June 2024 | Allow | 5 | 0 | 0 | No | No |
| 18396056 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING CURED RELIEF PATTERN, AND SEMICONDUCTOR APPARATUS | December 2023 | September 2024 | Abandon | 9 | 1 | 0 | No | No |
| 18395234 | EXTREME ULTRAVIOLET MASK WITH TANTALUM BASE ALLOY ABSORBER | December 2023 | July 2024 | Allow | 7 | 0 | 0 | No | No |
| 18394787 | REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING REFLECTIVE MASK BLANK, AND METHOD OF MANUFACTURING REFLECTIVE MASK | December 2023 | September 2024 | Allow | 9 | 0 | 0 | No | No |
| 18545948 | EXTREME ULTRAVIOLET MASK AND METHOD FOR FORMING THE SAME | December 2023 | November 2024 | Allow | 11 | 1 | 0 | No | No |
| 18544970 | REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND METHOD FOR MANUFACTURING REFLECTIVE MASK | December 2023 | March 2024 | Allow | 2 | 0 | 0 | No | No |
| 18528914 | ELECTRONIC DEVICE AND METHOD FOR MANUFACTURING TARGET SUBSTRATE | December 2023 | January 2025 | Allow | 14 | 0 | 0 | No | No |
| 18528544 | REFLECTIVE MASK BLANK, REFLECTIVE MASK AND METHOD FOR MANUFACTURING A SEMICONDUCTOR DEVICE | December 2023 | December 2024 | Allow | 12 | 0 | 0 | No | No |
| 18526463 | REFLECTIVE MASK BLANK AND REFLECTIVE MASK | December 2023 | July 2024 | Allow | 7 | 0 | 0 | No | No |
| 18522942 | PHOTOMASK INCLUDING FIDUCIAL MARK AND METHOD OF MAKING A PHOTOMASK | November 2023 | February 2025 | Allow | 15 | 1 | 0 | No | No |
| 18517796 | REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING REFLECTIVE MASK BLANK, AND METHOD OF MANUFACTURING REFLECTIVE MASK | November 2023 | January 2024 | Allow | 2 | 0 | 0 | No | No |
| 18517828 | CLEANING METHOD FOR PHOTO MASKS AND APPARATUS THEREFOR | November 2023 | November 2024 | Allow | 12 | 0 | 0 | No | No |
| 18516630 | PELLICLE FOR AN EUV LITHOGRAPHY MASK AND A METHOD OF MANUFACTURING THEREOF | November 2023 | November 2024 | Allow | 12 | 0 | 0 | No | No |
| 18515161 | LIQUID CRYSTAL COMPOSITION, ELEMENT AND LIQUID CRYSTAL LENS OR A BIREFRINGENT LENS FOR STEREOSCOPIC IMAGE DISPLAY | November 2023 | January 2025 | Allow | 14 | 1 | 0 | No | No |
| 18503908 | METHOD FOR BUILDING AN ETCHING-FREE HYBRID NONLINEAR WAVEGUIDE COMPOSED OF POLYMER AND ION-IMPLANTED NONLINEAR CRYSTAL | November 2023 | June 2024 | Allow | 7 | 0 | 0 | No | No |
| 18501693 | PHOTORESIST SYSTEM AND METHOD | November 2023 | March 2025 | Allow | 16 | 2 | 0 | No | No |
| 18498437 | ELECTRON BEAM LITHOGRAPHY WITH DYNAMIC FIN OVERLAY CORRECTION | October 2023 | July 2024 | Allow | 9 | 0 | 0 | No | No |
| 18495987 | LIQUID CRYSTAL COMPOSITION AND DISPLAY PANEL | October 2023 | June 2025 | Abandon | 20 | 2 | 0 | No | No |
| 18557696 | LIQUID CRYSTAL MEDIUM | October 2023 | March 2025 | Abandon | 16 | 1 | 0 | No | No |
| 18557106 | PELLICLE FILM, PELLICLE, EXPOSURE ORIGINAL PLATE, EXPOSURE DEVICE, AND METHOD FOR MANUFACTURING PELLICLE FILM | October 2023 | April 2025 | Allow | 18 | 4 | 0 | Yes | No |
| 18493738 | ORGANIC SOLID CRYSTALS HAVING HELICAL STRUCTURES FORMED USING CHOLESTERIC LIQUID CRYSTALS | October 2023 | December 2024 | Allow | 14 | 1 | 0 | No | No |
| 18493734 | ORGANIC SOLID CRYSTALS HAVING HELICAL STRUCTURES FORMED USING NEGATIVE TEMPLATES | October 2023 | December 2024 | Allow | 14 | 1 | 0 | No | No |
| 18492067 | LIGHTING DEVICE AND OPTICAL ELEMENT | October 2023 | June 2025 | Allow | 20 | 1 | 0 | No | No |
| 18382356 | REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING REFLECTIVE MASK BLANK, AND METHOD OF MANUFACTURING REFLECTIVE MASK | October 2023 | January 2024 | Allow | 3 | 0 | 0 | No | No |
| 18382269 | REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING REFLECTIVE MASK BLANK, AND METHOD OF MANUFACTURING REFLECTIVE MASK | October 2023 | October 2024 | Allow | 12 | 1 | 0 | No | No |
| 18286845 | COMPOUND, LIQUID CRYSTAL COMPOSITION, AS WELL AS LIQUID CRYSTAL DISPLAY ELEMENT, SENSOR, LIQUID CRYSTAL LENS, OPTICAL COMMUNICATION EQUIPMENT, AND ANTENNA EACH USING THE SAME | October 2023 | April 2025 | Allow | 18 | 1 | 0 | No | No |
| 18286600 | LIQUID-CRYSTAL POLYMER COMPOSITION, MOLDED LIQUID-CRYSTAL POLYMER, AND ELECTRICAL/ELECTRONIC APPLIANCE | October 2023 | May 2025 | Allow | 19 | 2 | 0 | Yes | No |
| 18484432 | METHOD FOR REMOVING PARTICLES FROM PELLICLE AND PHOTOMASK | October 2023 | November 2024 | Allow | 13 | 1 | 0 | No | No |
| 18483484 | REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING REFLECTIVE MASK, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | October 2023 | May 2024 | Allow | 7 | 0 | 0 | No | No |
| 18483453 | REFLECTIVE MASK BLANK, REFLECTIVE MASK AND MANUFACTURING METHOD THEREOF, AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD | October 2023 | May 2024 | Allow | 7 | 0 | 0 | No | No |
| 18481362 | METHOD FOR PREPARING PIXEL DEFINE LAYER | October 2023 | March 2025 | Allow | 17 | 2 | 0 | Yes | No |
| 18476440 | LIGHT CONTROL SHEET, LIGHT CONTROL DEVICE, PHOTOSENSITIVE COMPOSITION, AND METHOD FOR PRODUCING LIGHT CONTROL SHEET | September 2023 | May 2025 | Allow | 20 | 2 | 1 | No | No |
| 18284204 | AROMATIC ISOTHIOCYANATES | September 2023 | September 2024 | Allow | 12 | 1 | 0 | No | No |
| 18371650 | Liquid crystal polymer, composition, liquid crystal polymer film, laminated material and method of forming liquid crystal polymer film | September 2023 | March 2025 | Allow | 18 | 2 | 1 | No | No |
| 18283329 | ANTHRAQUINONE COMPOUND, LIQUID CRYSTAL COMPOSITION CONTAINING SAID COMPOUND, AND DIMMING ELEMENT | September 2023 | September 2024 | Allow | 11 | 1 | 0 | No | No |
| 18370204 | PELLICLE FRAME, PELLICLE, AND METHOD FOR PEELING PELLICLE | September 2023 | July 2024 | Allow | 10 | 1 | 0 | No | No |
| 18370197 | PELLICLE FRAME, PELLICLE, AND METHOD FOR PEELING PELLICLE | September 2023 | May 2024 | Allow | 8 | 0 | 0 | No | No |
| 18369486 | PELLICLE FRAME, PELLICLE, AND METHOD FOR PEELING PELLICLE | September 2023 | July 2024 | Allow | 10 | 1 | 0 | No | No |
| 18369481 | PELLICLE FRAME, PELLICLE, AND METHOD FOR PEELING PELLICLE | September 2023 | April 2024 | Allow | 7 | 0 | 0 | No | No |
| 18466668 | COMPOUND, POLYMER, PATTERN FORMING MATERIAL, PATTERN FORMING METHOD, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | September 2023 | November 2024 | Allow | 14 | 0 | 0 | No | No |
| 18464695 | COATING COMPOSITIONS FOR USE WITH AN OVERCOATED PHOTORESIST | September 2023 | October 2024 | Allow | 13 | 1 | 0 | No | No |
| 18281306 | DYE COMPOUND-CONTAINING LIQUID CRYSTAL COMPOSITION AND DEVICE INCLUDING THE SAME | September 2023 | November 2024 | Allow | 15 | 1 | 0 | No | No |
| 18463009 | COMPOSITION, OPTICALLY ANISOTROPIC FILM, CIRCULARLY POLARIZING PLATE, DISPLAY DEVICE, COMPOUND, AND METHOD FOR PRODUCING COMPOUND | September 2023 | March 2025 | Allow | 18 | 1 | 0 | No | No |
| 18242643 | METHOD OF FORMING PATTERNS | September 2023 | March 2025 | Abandon | 19 | 2 | 1 | Yes | No |
| 18241442 | PELLICLE | September 2023 | June 2024 | Allow | 10 | 1 | 0 | No | No |
| 18459703 | PELLICLE | September 2023 | July 2024 | Allow | 11 | 1 | 0 | No | No |
| 18239906 | Liquid Crystal Element and Emulsion Composition | August 2023 | June 2025 | Allow | 21 | 1 | 1 | No | No |
| 18238331 | HETEROCYCLIC COMPOUNDS FOR LIQUID CRYSTALS | August 2023 | October 2024 | Allow | 14 | 1 | 0 | No | No |
| 18456426 | PELLICLE FRAME AND PELLICLE | August 2023 | August 2024 | Allow | 11 | 1 | 0 | No | No |
| 18456434 | PELLICLE FRAME AND PELLICLE | August 2023 | August 2024 | Allow | 11 | 1 | 0 | No | No |
| 18456436 | PELLICLE FRAME AND PELLICLE | August 2023 | August 2024 | Allow | 11 | 1 | 0 | No | No |
| 18236515 | ADHESIVE FOR PELLICLE, PELLICLE FOR PHOTO MASK AND METHOD FOR MANUFACTURING THE SAME | August 2023 | November 2024 | Allow | 15 | 1 | 0 | Yes | No |
| 18450452 | METHOD FOR PREPARING PIXEL DEFINE LAYER | August 2023 | March 2025 | Allow | 19 | 2 | 0 | Yes | No |
| 18234415 | Mesogen Compounds | August 2023 | October 2024 | Allow | 14 | 1 | 1 | No | No |
| 18449075 | METHOD FOR PREPARING PIXEL DEFINE LAYER | August 2023 | March 2025 | Allow | 19 | 2 | 0 | Yes | No |
| 18447441 | PHOTORESIST WITH POLAR-ACID-LABILE-GROUP | August 2023 | March 2024 | Allow | 7 | 0 | 0 | No | No |
| 18447920 | METALLIC PHOTORESIST PATTERNING AND DEFECT IMPROVEMENT | August 2023 | May 2025 | Allow | 22 | 1 | 0 | Yes | No |
| 18446702 | EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY METHOD WITH DEVELOPER COMPOSITION | August 2023 | August 2024 | Allow | 12 | 1 | 0 | No | No |
| 18447104 | APPARATUS, SYSTEM AND METHOD | August 2023 | May 2025 | Allow | 21 | 2 | 1 | No | No |
| 18231444 | RESIN, PHOTORESIST COMPOSITION, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | August 2023 | June 2024 | Allow | 11 | 1 | 0 | No | No |
| 18276357 | ANTHRAQUINONE COMPOUND, LIQUID CRYSTAL COMPOSITION CONTAINING SAID COMPOUND, AND DIMMING ELEMENT | August 2023 | August 2024 | Allow | 12 | 1 | 0 | No | No |
| 18231000 | ULTRA-THIN, ULTRA-LOW DENSITY FILMS FOR EUV LITHOGRAPHY | August 2023 | May 2024 | Allow | 9 | 0 | 0 | No | No |
| 18366097 | Multi-Function Overlay Marks for Reducing Noise and Extracting Focus and Critical Dimension Information | August 2023 | April 2024 | Allow | 8 | 0 | 0 | No | No |
| 18365302 | EUV Metallic Resist Performance Enhancement Via Additives | August 2023 | March 2025 | Allow | 19 | 3 | 0 | Yes | No |
| 18365760 | OPTICAL ASSEMBLY WITH COATING AND METHODS OF USE | August 2023 | March 2025 | Allow | 19 | 2 | 0 | Yes | No |
This analysis examines appeal outcomes and the strategic value of filing appeals for art-unit 1737.
With a 45.8% reversal rate, the PTAB reverses the examiner's rejections in a meaningful percentage of cases. This reversal rate is in the top 25% across the USPTO, indicating that appeals are more successful here than in most other areas.
Filing a Notice of Appeal can sometimes lead to allowance even before the appeal is fully briefed or decided by the PTAB. This occurs when the examiner or their supervisor reconsiders the rejection during the mandatory appeal conference (MPEP § 1207.01) after the appeal is filed.
In this dataset, 27.5% of applications that filed an appeal were subsequently allowed. This appeal filing benefit rate is in the bottom 25% across the USPTO, indicating that filing appeals is less effective here than in most other areas.
✓ Appeals to PTAB show good success rates. If you have a strong case on the merits, consider fully prosecuting the appeal to a Board decision.
⚠ Filing a Notice of Appeal shows limited benefit. Consider other strategies like interviews or amendments before appealing.
Art Unit 1737 is part of Group 1730 in Technology Center 1700. This art unit has examined 5,769 patent applications in our dataset, with an overall allowance rate of 81.2%. Applications typically reach final disposition in approximately 26 months.
Art Unit 1737's allowance rate of 81.2% places it in the 64% percentile among all USPTO art units. This art unit has an above-average allowance rate compared to other art units.
Applications in Art Unit 1737 receive an average of 1.80 office actions before reaching final disposition (in the 48% percentile). The median prosecution time is 26 months (in the 67% percentile).
When prosecuting applications in this art unit, consider the following:
Not Legal Advice: The information provided in this report is for informational purposes only and does not constitute legal advice. You should consult with a qualified patent attorney or agent for advice specific to your situation.
No Guarantees: We do not provide any guarantees as to the accuracy, completeness, or timeliness of the statistics presented above. Patent prosecution statistics are derived from publicly available USPTO data and are subject to data quality limitations, processing errors, and changes in USPTO practices over time.
Limitation of Liability: Under no circumstances will IronCrow AI be liable for any outcome, decision, or action resulting from your reliance on the statistics, analysis, or recommendations presented in this report. Past prosecution patterns do not guarantee future results.
Use at Your Own Risk: While we strive to provide accurate and useful prosecution statistics, you should independently verify any information that is material to your prosecution strategy and use your professional judgment in all patent prosecution matters.