Detailed information about the 100 most recent patent applications.
| Application Number | Title | Filing Date | Disposal Date | Disposition | Time (months) | Office Actions | Restrictions | Interview | Appeal |
|---|---|---|---|---|---|---|---|---|---|
| 19081518 | ORGANOTIN OXIDE HYDROXIDE PATTERNING COMPOSITIONS, PRECURSORS, AND PATTERNING | March 2025 | December 2025 | Allow | 9 | 2 | 0 | No | No |
| 18908129 | PHOTOACID GENERATORS, PHOTORESIST COMPOSITIONS, AND PATTERN FORMATION METHODS | October 2024 | October 2025 | Allow | 12 | 0 | 0 | No | No |
| 18779539 | TIN DODECAMERS AND RADIATION PATTERNABLE COATINGS WITH STRONG EUV ABSORPTION | July 2024 | October 2025 | Allow | 15 | 0 | 0 | No | No |
| 18609833 | PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE | March 2024 | March 2025 | Allow | 11 | 1 | 0 | No | No |
| 18396056 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING CURED RELIEF PATTERN, AND SEMICONDUCTOR APPARATUS | December 2023 | September 2024 | Abandon | 9 | 1 | 0 | No | No |
| 18464695 | COATING COMPOSITIONS FOR USE WITH AN OVERCOATED PHOTORESIST | September 2023 | October 2024 | Allow | 13 | 1 | 0 | No | No |
| 18447441 | PHOTORESIST WITH POLAR-ACID-LABILE-GROUP | August 2023 | March 2024 | Allow | 7 | 0 | 0 | No | No |
| 18232220 | PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE | August 2023 | December 2025 | Allow | 28 | 5 | 0 | Yes | No |
| 18231444 | RESIN, PHOTORESIST COMPOSITION, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | August 2023 | June 2024 | Allow | 11 | 1 | 0 | No | No |
| 18365302 | EUV Metallic Resist Performance Enhancement Via Additives | August 2023 | March 2025 | Allow | 19 | 3 | 0 | Yes | No |
| 18226436 | RESIST COMPOSITION AND PATTERN FORMING PROCESS | July 2023 | March 2026 | Allow | 31 | 0 | 0 | No | No |
| 18355641 | PHOTORESIST FOR SEMICONDUCTOR FABRICATION | July 2023 | March 2024 | Allow | 8 | 0 | 1 | No | No |
| 18220308 | PHOTOSENSITIVE RESIN COMPOSITION, DRY FILM USING SAME, PRINTED WIRING BOARD, AND PRINTED WIRING BOARD MANUFACTURING METHOD | July 2023 | September 2024 | Allow | 14 | 1 | 0 | No | No |
| 18215863 | RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | June 2023 | May 2025 | Allow | 23 | 3 | 1 | Yes | No |
| 18270375 | FILM-FORMING COMPOSITION HAVING A MULTIPLE BOND | June 2023 | February 2026 | Allow | 32 | 0 | 0 | No | No |
| 18269780 | NOVEL NAPHTHALIMIDE SULFONATE DERIVATIVE, AND PHOTOACID GENERATOR AND PHOTORESIST COMPOSITION EACH COMPRISING SAME | June 2023 | January 2026 | Allow | 31 | 0 | 0 | No | No |
| 18340442 | THERMOSETTING IODINE- AND SILICON-CONTAINING MATERIAL, COMPOSITION CONTAINING THE MATERIAL FOR FORMING RESIST UNDERLAYER FILM FOR EUV LITHOGRAPHY, AND PATTERNING PROCESS | June 2023 | February 2025 | Allow | 20 | 2 | 1 | No | No |
| 18200510 | PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE | May 2023 | December 2023 | Allow | 7 | 0 | 0 | No | No |
| 18143400 | SUBSTRATE PROCESSING COMPOSITION AND SUBSTRATE PROCESSING METHOD USING THE SAME | May 2023 | November 2025 | Allow | 31 | 0 | 0 | No | No |
| 18299687 | RESIN, POSITIVE PHOTOSENSITIVE RESIN COMPOSITION AND USE | April 2023 | September 2023 | Allow | 5 | 1 | 0 | No | No |
| 18174316 | PHOTOACID-GENERATING MONOMER, POLYMER DERIVED THEREFROM, PHOTORESIST COMPOSITION INCLUDING THE POLYMER, AND METHOD OF FORMING A PHOTORESIST RELIEF IMAGE USING THE PHOTORESIST COMPOSITION | February 2023 | January 2024 | Allow | 11 | 2 | 0 | No | No |
| 18098233 | PHOTOSENSITIVE POLYMER CAPABLE OF MULTI-STEP DEPROTECTION REACTION, PHOTORESIST COMPOSITION INCLUDING THE PHOTOSENSITIVE POLYMER, AND METHOD OF MANUFACTURING THE INTEGRATED CIRCUIT DEVICE | January 2023 | January 2026 | Allow | 36 | 1 | 0 | Yes | No |
| 18003623 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMATION METHOD, AND LAMINATED FILM | December 2022 | March 2025 | Allow | 27 | 2 | 0 | No | No |
| 18011025 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING PATTERNED CURED FILM, PATTERNED CURED FILM AND SEMICONDUCTOR ELEMENT | December 2022 | October 2025 | Allow | 34 | 2 | 0 | Yes | No |
| 18080128 | RADIATION SENSITIVE COMPOSITION | December 2022 | July 2024 | Abandon | 19 | 1 | 0 | No | No |
| 18075594 | PHOTORESIST COMPOSITION, COATED SUBSTRATE INCLUDING THE PHOTORESIST COMPOSITION, AND METHOD OF FORMING ELECTRONIC DEVICE | December 2022 | February 2024 | Allow | 14 | 2 | 0 | No | No |
| 18056332 | PHOTORESIST COMPOSITIONS AND METHODS OF FABRICATING A SEMICONDUCTOR DEVICE | November 2022 | July 2025 | Allow | 32 | 1 | 0 | Yes | No |
| 17986271 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | November 2022 | June 2025 | Allow | 31 | 0 | 0 | No | No |
| 17923873 | PHOTOSENSITIVE RESIN COMPOSITION FOR FLEXOGRAPHIC PRINTING | November 2022 | April 2025 | Allow | 30 | 1 | 0 | No | No |
| 17965388 | PHOTOACID GENERATOR, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS | October 2022 | June 2025 | Allow | 32 | 0 | 0 | No | No |
| 17962056 | PHOTOGRAPHIC COLOR IMAGE USING BLACK AND WHITE EMULSION | October 2022 | July 2025 | Allow | 33 | 3 | 0 | Yes | No |
| 17945742 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN STRUCTURE AND METHOD FOR PRODUCING PATTERNED CURED FILM | September 2022 | December 2025 | Abandon | 39 | 1 | 0 | No | No |
| 17944817 | COMPOSITION, COMPOSITION PRECURSOR SOLUTION, PRODUCTION METHOD FOR COMPOSITION, SUBSTRATE WITH MULTILAYER FILM, AND PRODUCTION METHOD FOR PATTERNED SUBSTRATE | September 2022 | December 2025 | Abandon | 39 | 0 | 1 | No | No |
| 17939328 | ORGANOTIN OXIDE HYDROXIDE PATTERNING COMPOSITIONS, PRECURSORS, AND PATTERNING | September 2022 | July 2025 | Allow | 34 | 6 | 0 | No | No |
| 17902894 | PHOTOSENSITIVE COMPOSITION, CURED FILM, COLOR FILTER, LIGHT SHIELDING FILM, OPTICAL ELEMENT, SOLID-STATE IMAGING ELEMENT, INFRARED SENSOR, AND HEADLIGHT UNIT | September 2022 | July 2025 | Allow | 34 | 1 | 0 | Yes | No |
| 17887893 | LIGNIN BASED LASER LITHOGRAPHY PROCESS FOR FABRICATING 3D GRAPHENE ELECTRODE AND METHOD | August 2022 | March 2024 | Abandon | 19 | 2 | 0 | No | No |
| 17887670 | SILICON-CONTAINING COMPOSITION AND METHOD OF PRODUCING SEMICONDUCTOR SUBSTRATE | August 2022 | March 2025 | Allow | 31 | 1 | 1 | No | No |
| 17873826 | COMPOSITION, DRIED PRODUCT, CURED SUBSTANCE, TRANSFER FILM, MANUFACTURING METHOD OF TRANSFER FILM, AND PATTERN FORMING METHOD | July 2022 | May 2025 | Abandon | 34 | 3 | 0 | No | No |
| 17870324 | ORGANOMETALLIC CLUSTER PHOTORESISTS FOR EUV LITHOGRAPHY | July 2022 | May 2023 | Allow | 10 | 0 | 0 | No | No |
| 17869591 | Semiconductor Devices and Methods of Manufacturing | July 2022 | August 2023 | Allow | 12 | 1 | 0 | No | No |
| 17793751 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION AND METHOD FOR MANUFACTURING CURED RELIEF PATTERN | July 2022 | June 2025 | Allow | 35 | 2 | 0 | No | No |
| 17867443 | PHOTOSENSITIVE RESIN COMPOSITION AND MANUFACTURING METHOD OF DISPLAY DEVICE USING THE SAME | July 2022 | March 2026 | Allow | 44 | 6 | 1 | Yes | No |
| 17864748 | NEGATIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | July 2022 | February 2024 | Allow | 19 | 1 | 1 | No | No |
| 17862932 | SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION INCLUDING ORGANIC GROUP HAVING AMMONIUM GROUP | July 2022 | December 2024 | Allow | 29 | 5 | 0 | Yes | No |
| 17858129 | ORGANOTIN OXIDE HYDROXIDE PATTERNING COMPOSITIONS, PRECURSORS, AND PATTERNING | July 2022 | July 2023 | Allow | 12 | 1 | 0 | No | No |
| 17858172 | ORGANOTIN OXIDE HYDROXIDE PATTERNING COMPOSITIONS, PRECURSORS, AND PATTERNING | July 2022 | December 2024 | Allow | 30 | 3 | 0 | No | No |
| 17857827 | Polybenzoxazole Precursor and Application Thereof | July 2022 | February 2024 | Allow | 20 | 1 | 0 | No | No |
| 17854012 | RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | June 2022 | February 2024 | Allow | 19 | 2 | 1 | No | No |
| 17854048 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND COMPOUND | June 2022 | February 2024 | Allow | 19 | 1 | 1 | No | No |
| 17847253 | RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN | June 2022 | February 2024 | Allow | 20 | 1 | 1 | No | No |
| 17840844 | TIN DODECAMERS AND RADIATION PATTERNABLE COATINGS WITH STRONG EUV ABSORPTION | June 2022 | April 2024 | Allow | 22 | 1 | 0 | No | No |
| 17832920 | ORGANOTIN OXIDE HYDROXIDE PATTERNING COMPOSITIONS, PRECURSORS, AND PATTERNING | June 2022 | July 2023 | Allow | 13 | 1 | 0 | No | No |
| 17778203 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN FILM, PHOTOSENSITIVE DRY FILM, PATTERNING PROCESS, AND LIGHT EMITTING DEVICE | May 2022 | October 2024 | Allow | 29 | 1 | 0 | No | No |
| 17744873 | PHOTOSENSITIVE RESIN COMPOSITION, POLYIMIDE PRODUCTION METHOD, AND SEMICONDUCTOR DEVICE | May 2022 | July 2023 | Allow | 14 | 2 | 0 | Yes | No |
| 17724956 | COMPOSITION FOR FORMING UNDERLAYER FILM, RESIST PATTERN FORMING METHOD, AND MANUFACTURING METHOD OF ELECTRONIC DEVICE | April 2022 | March 2025 | Allow | 35 | 1 | 0 | No | No |
| 17767873 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION AND DISPLAY DEVICE USING THE SAME | April 2022 | October 2024 | Allow | 30 | 1 | 0 | No | No |
| 17713823 | COMPOSITIONS FOR REDUCING RESIST CONSUMPTION OF EXTREME ULTRAVIOLET METALLIC TYPE RESIST | April 2022 | December 2025 | Allow | 44 | 1 | 0 | No | No |
| 17712933 | Chain Extenders And Formulations Thereof For Improving Elongation In Photosensitive Polyimide | April 2022 | April 2025 | Allow | 37 | 1 | 0 | No | No |
| 17766101 | PHOTOSENSITIVE RESIN COMPOSITION, DRY FILM, CURED MATERIAL AND ELECTRONIC COMPONENT | April 2022 | December 2024 | Abandon | 32 | 2 | 0 | No | No |
| 17762589 | DNQ-TYPE PHOTORESIST COMPOSITION INCLUDING ALKALI-SOLUBLE ACRYLIC RESINS | March 2022 | September 2023 | Allow | 18 | 1 | 0 | No | No |
| 17640934 | BINDER RESIN, NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, AND DISPLAY DEVICE COMPRISING BLACK BANK FORMED USING SAME | March 2022 | October 2023 | Allow | 19 | 0 | 0 | No | No |
| 17435408 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING RESIST PATTERN FILM, METHOD FOR PRODUCING PLATED FORMED PRODUCT, AND METHOD FOR PRODUCING TIN-SILVER PLATED-FORMED PRODUCT | March 2022 | September 2024 | Allow | 37 | 0 | 0 | No | No |
| 17640256 | PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, AND DISPLAY DEVICE | March 2022 | August 2024 | Abandon | 30 | 3 | 0 | No | No |
| 17680301 | CURABLE COMPOSITION, CURED PRODUCT, COLOR FILTER, SOLID-STATE IMAGING ELEMENT, AND IMAGE DISPLAY DEVICE | February 2022 | December 2024 | Allow | 34 | 0 | 0 | No | No |
| 17673952 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND POLYMER | February 2022 | January 2026 | Abandon | 47 | 3 | 1 | No | No |
| 17672701 | METHOD OF MANUFACTURING CURED FILM, PHOTOCURABLE RESIN COMPOSITION, METHOD OF MANUFACTURING LAMINATE, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | February 2022 | May 2025 | Allow | 39 | 2 | 1 | No | No |
| 17592711 | NEGATIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | February 2022 | December 2024 | Allow | 34 | 1 | 1 | No | No |
| 17632815 | INSULATING LAYER FOR MULTILAYER PRINTED CIRCUIT BOARD, MULTILAYER PRINTED CIRCUIT BOARD COMPRISING SAME, AND METHOD FOR PRODUCING SAME | February 2022 | March 2025 | Allow | 37 | 1 | 0 | No | No |
| 17631238 | MONOMER, RESIN FOR PHOTORESIST, RESIN COMPOSITION FOR PHOTORESIST, AND PATTERN FORMING METHOD | January 2022 | July 2025 | Allow | 42 | 3 | 0 | Yes | No |
| 17630556 | NEGATIVE TYPE PHOTOSENSITIVE COMPOSITION | January 2022 | October 2022 | Allow | 9 | 1 | 0 | No | No |
| 17630712 | NEGATIVE TYPE PHOTOSENSITIVE COMPOSITION COMPRISING BLACK COLORANT | January 2022 | October 2022 | Allow | 9 | 1 | 0 | No | No |
| 17583270 | PATTERN-FORMING METHOD AND COMPOSITION | January 2022 | March 2025 | Allow | 38 | 3 | 0 | No | No |
| 17567956 | PHOTORESIST COMPOSITIONS AND METHODS OF MANUFACTURING INTEGRATED CIRCUIT DEVICE USING THE SAME | January 2022 | August 2025 | Abandon | 44 | 4 | 0 | Yes | No |
| 17623995 | RESIST MATERIAL AND PATTERN FORMING METHOD | December 2021 | November 2024 | Allow | 34 | 1 | 0 | No | No |
| 17619542 | COMPOSITION CONTAINING A HETEROCYCLIC COMPOUND HAVING A DICYANOSTYRYL GROUP, FOR FORMING A RESIST UNDERLAYER FILM CAPABLE OF BEING WET ETCHED | December 2021 | April 2025 | Allow | 40 | 1 | 1 | No | No |
| 17541422 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND COMPOUND | December 2021 | December 2024 | Allow | 36 | 1 | 0 | No | No |
| 17524085 | RESIST COMPOSITION AND PATTERN FORMING PROCESS | November 2021 | August 2024 | Allow | 33 | 1 | 1 | No | No |
| 17454447 | SEMICONDUCTOR PHOTORESIST COMPOSITION, METHOD FOR PREPARING THEREOF AND METHOD OF FORMING PATTERNS USING THE COMPOSITION | November 2021 | October 2024 | Allow | 35 | 2 | 1 | No | No |
| 17454331 | PHOTOACID GENERATORS, PHOTORESIST COMPOSITIONS, AND PATTERN FORMATION METHODS | November 2021 | August 2024 | Allow | 33 | 2 | 0 | No | No |
| 17517257 | SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | November 2021 | February 2024 | Allow | 27 | 1 | 1 | No | No |
| 17493888 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING RESIST PATTERN FILM, AND METHOD FOR PRODUCING PLATED FORMED PRODUCT | October 2021 | January 2025 | Abandon | 40 | 2 | 0 | No | No |
| 17487201 | SULFONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS | September 2021 | September 2024 | Allow | 36 | 2 | 1 | No | No |
| 17485727 | PHOTORESIST COMPOSITIONS AND METHODS OF MANUFACTURING INTEGRATED CIRCUIT DEVICE USING THE SAME | September 2021 | June 2025 | Abandon | 45 | 6 | 1 | Yes | No |
| 17448838 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | September 2021 | June 2024 | Allow | 33 | 3 | 1 | No | No |
| 17475436 | PHOTORESIST COMPOSITION COMPRISING AMIDE COMPOUND AND PATTERN FORMATION METHODS USING THE SAME | September 2021 | August 2023 | Allow | 23 | 1 | 1 | No | No |
| 17475356 | PHOTOSENSITIVE TRANSFER FILM, MANUFACTURING METHOD OF ANTISTATIC PATTERN, MANUFACTURING METHOD OF PHOTOSENSITIVE TRANSFER FILM, LAMINATE, TOUCH PANEL, MANUFACTURING METHOD OF TOUCH PANEL, AND DISPLAY DEVICE WITH TOUCH PANEL | September 2021 | January 2025 | Abandon | 40 | 0 | 1 | No | No |
| 17471926 | Laminate, composition, and laminate forming kit | September 2021 | November 2024 | Abandon | 39 | 1 | 1 | No | No |
| 17310865 | CROSS-LINKED POLYMER FOR RESIST | August 2021 | December 2023 | Allow | 28 | 0 | 0 | No | No |
| 17458783 | RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING METHOD | August 2021 | January 2026 | Abandon | 52 | 4 | 1 | No | No |
| 17433946 | DUAL-CURE PHASE-SEPARATION TYPE PHOTOSENSITIVE RESIN COMPOSITION FOR CONTINUOUS 3D PRINTING WITH HIGH PRECISION | August 2021 | February 2024 | Allow | 30 | 1 | 0 | No | No |
| 17433630 | Functional hydrogen silsesquioxane resins and the use thereof | August 2021 | October 2025 | Allow | 50 | 2 | 1 | No | No |
| 17408307 | PHOTOSENSITIVE DRY FILM, AND PRINTED WIRING BOARD WITH PHOTOSENSITIVE DRY FILM | August 2021 | November 2024 | Allow | 39 | 2 | 0 | Yes | No |
| 17432809 | INFRARED RADIATION SENSITIVE POSITIVE-WORKING IMAGEABLE ELEMENT AND METHOD FOR FORMING IMAGE USING SAME | August 2021 | November 2025 | Abandon | 51 | 2 | 1 | Yes | No |
| 17405138 | PHOTORESIST COMPOSITIONS, METHODS FOR FORMING PATTERN USING THE SAME, AND METHODS FOR FABRICATING SEMICONDUCTOR DEVICE USING THE SAME | August 2021 | June 2025 | Allow | 46 | 9 | 1 | Yes | No |
| 17428449 | WATER-DEVELOPABLE PHOTOSENSITIVE RESIN PRINTING ORIGINAL PLATE | August 2021 | May 2024 | Allow | 33 | 0 | 0 | No | No |
| 17386440 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | July 2021 | March 2025 | Abandon | 44 | 2 | 1 | No | No |
| 17384200 | UV- AND HEAT-CURABLE LADDER-LIKE POLYSILSESQUIOXANE COPOLYMER, INSULATION COMPOSITION CONTAINING SAME AND METHOD FOR FORMING MICROCIRCUIT PATTERN USING SAME | July 2021 | December 2024 | Allow | 41 | 2 | 0 | No | No |
| 17425308 | COMPOUND, ACID GENERATOR, COMPOSITION, CURED PRODUCT, CURED PRODUCT MANUFACTURING METHOD, AND PATTERN COATING MANUFACTURING METHOD | July 2021 | June 2024 | Abandon | 35 | 1 | 0 | No | No |
| 17424585 | OXIME ESTER PHOTOINITIATORS HAVING A SPECIAL AROYL CHROMOPHORE | July 2021 | September 2024 | Abandon | 38 | 1 | 0 | No | No |
| 17378188 | PHOTORESIST, METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND METHOD OF EXTREME ULTRAVIOLET LITHOGRAPHY | July 2021 | October 2023 | Allow | 27 | 1 | 1 | No | No |
This analysis examines appeal outcomes and the strategic value of filing appeals for examiner CHU, JOHN S Y.
With a 37.5% reversal rate, the PTAB reverses the examiner's rejections in a meaningful percentage of cases. This reversal rate is above the USPTO average, indicating that appeals have better success here than typical.
Filing a Notice of Appeal can sometimes lead to allowance even before the appeal is fully briefed or decided by the PTAB. This occurs when the examiner or their supervisor reconsiders the rejection during the mandatory appeal conference (MPEP § 1207.01) after the appeal is filed.
In this dataset, 15.6% of applications that filed an appeal were subsequently allowed. This appeal filing benefit rate is in the bottom 25% across the USPTO, indicating that filing appeals is less effective here than in most other areas.
✓ Appeals to PTAB show good success rates. If you have a strong case on the merits, consider fully prosecuting the appeal to a Board decision.
⚠ Filing a Notice of Appeal shows limited benefit. Consider other strategies like interviews or amendments before appealing.
Examiner CHU, JOHN S Y works in Art Unit 1737 and has examined 436 patent applications in our dataset. With an allowance rate of 75.0%, this examiner has a below-average tendency to allow applications. Applications typically reach final disposition in approximately 34 months.
Examiner CHU, JOHN S Y's allowance rate of 75.0% places them in the 40% percentile among all USPTO examiners. This examiner has a below-average tendency to allow applications.
On average, applications examined by CHU, JOHN S Y receive 2.65 office actions before reaching final disposition. This places the examiner in the 77% percentile for office actions issued. This examiner issues more office actions than most examiners, which may indicate thorough examination or difficulty in reaching agreement with applicants.
The median time to disposition (half-life) for applications examined by CHU, JOHN S Y is 34 months. This places the examiner in the 42% percentile for prosecution speed. Prosecution timelines are slightly slower than average with this examiner.
Conducting an examiner interview provides a +8.2% benefit to allowance rate for applications examined by CHU, JOHN S Y. This interview benefit is in the 38% percentile among all examiners. Recommendation: Interviews provide a below-average benefit with this examiner.
When applicants file an RCE with this examiner, 19.9% of applications are subsequently allowed. This success rate is in the 21% percentile among all examiners. Strategic Insight: RCEs show lower effectiveness with this examiner compared to others. Consider whether a continuation application might be more strategic, especially if you need to add new matter or significantly broaden claims.
This examiner enters after-final amendments leading to allowance in 32.0% of cases where such amendments are filed. This entry rate is in the 47% percentile among all examiners. Strategic Recommendation: This examiner shows below-average receptiveness to after-final amendments. You may need to file an RCE or appeal rather than relying on after-final amendment entry.
When applicants request a pre-appeal conference (PAC) with this examiner, 133.3% result in withdrawal of the rejection or reopening of prosecution. This success rate is in the 85% percentile among all examiners. Strategic Recommendation: Pre-appeal conferences are highly effective with this examiner compared to others. Before filing a full appeal brief, strongly consider requesting a PAC. The PAC provides an opportunity for the examiner and supervisory personnel to reconsider the rejection before the case proceeds to the PTAB.
This examiner withdraws rejections or reopens prosecution in 72.4% of appeals filed. This is in the 60% percentile among all examiners. Of these withdrawals, 71.4% occur early in the appeal process (after Notice of Appeal but before Appeal Brief). Strategic Insight: This examiner shows above-average willingness to reconsider rejections during appeals. The mandatory appeal conference (MPEP § 1207.01) provides an opportunity for reconsideration.
When applicants file petitions regarding this examiner's actions, 80.0% are granted (fully or in part). This grant rate is in the 84% percentile among all examiners. Strategic Note: Petitions are frequently granted regarding this examiner's actions compared to other examiners. Per MPEP § 1002.02(c), various examiner actions are petitionable to the Technology Center Director, including prematureness of final rejection, refusal to enter amendments, and requirement for information. If you believe an examiner action is improper, consider filing a petition.
Examiner's Amendments: This examiner makes examiner's amendments in 0.2% of allowed cases (in the 53% percentile). This examiner makes examiner's amendments more often than average to place applications in condition for allowance (MPEP § 1302.04).
Quayle Actions: This examiner issues Ex Parte Quayle actions in 0.6% of allowed cases (in the 56% percentile). This examiner issues Quayle actions more often than average when claims are allowable but formal matters remain (MPEP § 714.14).
Based on the statistical analysis of this examiner's prosecution patterns, here are tailored strategic recommendations:
Not Legal Advice: The information provided in this report is for informational purposes only and does not constitute legal advice. You should consult with a qualified patent attorney or agent for advice specific to your situation.
No Guarantees: We do not provide any guarantees as to the accuracy, completeness, or timeliness of the statistics presented above. Patent prosecution statistics are derived from publicly available USPTO data and are subject to data quality limitations, processing errors, and changes in USPTO practices over time.
Limitation of Liability: Under no circumstances will IronCrow AI be liable for any outcome, decision, or action resulting from your reliance on the statistics, analysis, or recommendations presented in this report. Past prosecution patterns do not guarantee future results.
Use at Your Own Risk: While we strive to provide accurate and useful prosecution statistics, you should independently verify any information that is material to your prosecution strategy and use your professional judgment in all patent prosecution matters.