Detailed information about the 100 most recent patent applications.
| Application Number | Title | Filing Date | Disposal Date | Disposition | Time (months) | Office Actions | Restrictions | Interview | Appeal |
|---|---|---|---|---|---|---|---|---|---|
| 18891182 | TIN COMPOUNDS CONTAINING A TIN-OXYGEN DOUBLE BOND, A PHOTORESIST COMPOSITION CONTAINING THE SAME AND A METHOD OF FORMING A PHOTORESIST PATTERN USING THE SAME | September 2024 | January 2026 | Allow | 16 | 3 | 1 | No | No |
| 18769048 | PHOTORESIST DEVELOPMENT WITH HALIDE CHEMISTRIES | July 2024 | October 2025 | Allow | 15 | 3 | 1 | No | No |
| 18769038 | PHOTORESIST DEVELOPMENT WITH HALIDE CHEMISTRIES | July 2024 | October 2025 | Allow | 15 | 3 | 1 | Yes | No |
| 18744028 | PELLICLE HAVING VENT HOLE | June 2024 | February 2026 | Allow | 20 | 2 | 0 | No | No |
| 18663843 | METHOD OF REDUCING UNDESIRED LIGHT INFLUENCE IN EXTREME ULTRAVIOLET EXPOSURE | May 2024 | September 2025 | Allow | 16 | 2 | 0 | No | No |
| 18654329 | METHOD FOR FORMING STRUCTURE OF PELLICLE-MASK STRUCTURE WITH VENT STRUCTURE | May 2024 | June 2025 | Allow | 13 | 2 | 0 | No | No |
| 18642711 | PATTERN FORMING METHOD AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | April 2024 | April 2025 | Allow | 12 | 1 | 0 | No | No |
| 18634119 | ORGANOMETALLIC SOLUTION BASED HIGH RESOLUTION PATTERNING COMPOSITIONS AND CORRESPONDING METHODS | April 2024 | October 2025 | Allow | 19 | 2 | 0 | No | No |
| 18631832 | PHOTORESIST DEVELOPER AND METHOD OF DEVELOPING PHOTORESIST | April 2024 | July 2025 | Allow | 16 | 2 | 0 | No | No |
| 18700238 | CYCLIC DEVELOPMENT OF METAL OXIDE BASED PHOTORESIST FOR ETCH STOP DETERRENCE | April 2024 | September 2025 | Allow | 17 | 2 | 2 | Yes | No |
| 18607956 | ADHESION LAYERS FOR EUV LITHOGRAPHY | March 2024 | July 2025 | Allow | 16 | 2 | 0 | Yes | No |
| 18438142 | FABRICATING A DEVICE USING A MULTILAYER STACK | February 2024 | December 2024 | Allow | 10 | 1 | 0 | Yes | No |
| 18523826 | METHOD FOR FORMING PATTERNED PHOTORESIST | November 2023 | December 2025 | Allow | 25 | 3 | 0 | No | No |
| 18501693 | PHOTORESIST SYSTEM AND METHOD | November 2023 | March 2025 | Allow | 16 | 2 | 0 | No | No |
| 18481362 | METHOD FOR PREPARING PIXEL DEFINE LAYER | October 2023 | March 2025 | Allow | 17 | 2 | 0 | Yes | No |
| 18450452 | METHOD FOR PREPARING PIXEL DEFINE LAYER | August 2023 | March 2025 | Allow | 19 | 2 | 0 | Yes | No |
| 18449075 | METHOD FOR PREPARING PIXEL DEFINE LAYER | August 2023 | March 2025 | Allow | 19 | 2 | 0 | Yes | No |
| 18447104 | APPARATUS, SYSTEM AND METHOD | August 2023 | May 2025 | Allow | 21 | 2 | 1 | No | No |
| 18446702 | EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY METHOD WITH DEVELOPER COMPOSITION | August 2023 | August 2024 | Allow | 12 | 1 | 0 | No | No |
| 18366136 | EUV Lithography Mask With A Porous Reflective Multilayer Structure | August 2023 | September 2025 | Allow | 26 | 3 | 1 | Yes | No |
| 18361878 | PATTERN FIDELITY ENHANCEMENT | July 2023 | February 2025 | Allow | 19 | 2 | 0 | Yes | No |
| 18224499 | EXTREME ULTRAVIOLET MASK AND METHOD OF MANUFACTURING THE SAME | July 2023 | September 2024 | Allow | 14 | 2 | 0 | No | No |
| 18220825 | PATTERN FORMING METHOD, KIT, AND RESIST COMPOSITION | July 2023 | March 2025 | Allow | 20 | 3 | 0 | Yes | No |
| 18337222 | TREATMENT CONDITION SETTING METHOD, STORAGE MEDIUM, AND SUBSTRATE TREATMENT SYSTEM | June 2023 | January 2025 | Allow | 19 | 2 | 0 | Yes | No |
| 18336399 | Metal-Compound-Removing Solvent And Method In Lithography | June 2023 | September 2024 | Allow | 15 | 2 | 0 | Yes | No |
| 18336508 | POINT-OF-USE BLENDING OF RINSE SOLUTIONS FOR EUV PROCESSING TO MITIGATE PATTERN COLLAPSE | June 2023 | May 2025 | Allow | 23 | 2 | 0 | No | Yes |
| 18321310 | Euv Photoresist With Low-Activation-Energy Ligands Or High-Developer-Solubility Ligands | May 2023 | September 2024 | Allow | 16 | 2 | 0 | Yes | No |
| 18308635 | MASK AND METHOD OF FORMING THE SAME | April 2023 | April 2024 | Allow | 11 | 1 | 0 | Yes | No |
| 18136414 | MONOALKYL TIN TRIALKOXIDES AND/OR MONOALKYL TIN TRIAMIDES WITH LOW METAL CONTAMINATION AND/OR PARTICULATE CONTAMINATION, AND CORRESPONDING METHODS | April 2023 | March 2026 | Allow | 35 | 5 | 0 | No | Yes |
| 18302608 | Photoresist and Method of Formation and Use | April 2023 | December 2024 | Allow | 20 | 3 | 0 | Yes | No |
| 18184709 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS | March 2023 | August 2024 | Allow | 17 | 2 | 0 | No | No |
| 18120978 | PROTECTIVE COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN | March 2023 | September 2025 | Allow | 30 | 3 | 1 | No | No |
| 18120248 | ORGANOMETALLIC COMPOUND COMPRISING A METAL COMBINED WITH AT LEAST ONE LIGAND CONTAINING FOUR OR MORE FLUORINE ATOMS, RESIST COMPOSITION COMPRISING THE SAME, AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE USING THE SAME | March 2023 | March 2026 | Allow | 36 | 1 | 0 | Yes | No |
| 18024918 | MULTILAYER REFLECTIVE FILM-EQUIPPED SUBSTRATE, REFLECTIVE MASK BLANK, REFLECTIVE MASK MANUFACTURING METHOD, AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD | March 2023 | March 2026 | Allow | 36 | 2 | 0 | Yes | No |
| 18015852 | Three-Dimensional Micro-Nano Morphological Structure Manufactured by Laser Direct Writing Lithography Machine, and Preparation Method Therefor | January 2023 | March 2025 | Abandon | 26 | 4 | 1 | No | No |
| 18147228 | SOLUTION, SOLUTION STORAGE BODY, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE | December 2022 | October 2024 | Allow | 21 | 1 | 1 | No | No |
| 18003560 | PELLICLE, EXPOSURE ORIGINAL PLATE, EXPOSURE DEVICE, METHOD OF MANUFACTURING PELLICLE, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | December 2022 | January 2026 | Allow | 37 | 1 | 0 | No | No |
| 17980153 | METHOD FOR PRODUCING MULTI-LAYERED TYPE MICROCHANNEL DEVICE USING PHOTOSENITIVE RESIN LAMINATE | November 2022 | June 2024 | Abandon | 20 | 1 | 0 | No | No |
| 17968779 | TUNABLE SHRINKAGE AND TRIM PROCESS FOR FABRICATING GRATINGS | October 2022 | February 2026 | Allow | 40 | 1 | 0 | Yes | No |
| 17966105 | MONOALKYL TIN TRIALKOXIDES AND/OR MONOALKYL TIN TRIAMIDES WITH PARTICULATE CONTAMINATION AND CORRESPONDING METHODS | October 2022 | April 2024 | Allow | 18 | 1 | 0 | No | No |
| 17950251 | RESIST UNDERLAYER FILM-FORMING COMPOSITION, RESIST UNDERLAYER FILM, AND METHOD OF PRODUCING SEMICONDUCTOR SUBSTRATE | September 2022 | March 2026 | Allow | 41 | 2 | 0 | No | No |
| 17903369 | ORGANOMETALLIC SOLUTION BASED HIGH RESOLUTION PATTERNING COMPOSITIONS | September 2022 | April 2024 | Allow | 19 | 4 | 0 | No | No |
| 17903605 | ORGANOMETALLIC SOLUTION BASED HIGH RESOLUTION PATTERNING COMPOSITIONS | September 2022 | November 2023 | Allow | 14 | 3 | 0 | No | No |
| 17903672 | ORGANOMETALLIC SOLUTION BASED HIGH RESOLUTION PATTERNING COMPOSITIONS | September 2022 | September 2024 | Allow | 24 | 5 | 0 | No | No |
| 17890409 | RESIST COMPOUND, METHOD FOR FORMING PATTERN USING SAME, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING SAME | August 2022 | October 2025 | Allow | 38 | 2 | 0 | Yes | No |
| 17884392 | LITHOGRAPHY EXPOSURE SYSTEM WITH DEBRIS REMOVING MECHANISM | August 2022 | February 2024 | Allow | 18 | 1 | 0 | No | No |
| 17882840 | PHOTORESIST HAVING STRENGTHENING MATERIAL | August 2022 | March 2026 | Allow | 43 | 2 | 0 | No | No |
| 17875282 | METHOD OF REDUCING UNDESIRED LIGHT INFLUENCE IN EXTREME ULTRAVIOLET EXPOSURE | July 2022 | February 2024 | Allow | 19 | 1 | 0 | No | No |
| 17814241 | METHOD OF PROCESSING PHOTORESIST LAYER, AND PHOTORESIST LAYER | July 2022 | February 2026 | Allow | 43 | 2 | 0 | No | No |
| 17855630 | PHOTOMASK AND METHOD OF FABRICATING A PHOTOMASK | June 2022 | January 2024 | Allow | 18 | 1 | 0 | No | No |
| 17851580 | MASK PROTECTIVE MODULE, PELLICLE HAVING THE SAME, AND LITHOGRAPHY APPARATUS HAVING THE SAME | June 2022 | December 2023 | Allow | 18 | 1 | 0 | No | No |
| 17839432 | METHOD OF MANUFACTURING CHEMICAL FLUID FOR MANUFACTURING ELECTRONIC MATERIAL, PATTERN FORMING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, CHEMICAL FLUID FOR MANUFACTURING ELECTRONIC MATERIAL, CONTAINER, AND QUALITY INSPECTION METHOD | June 2022 | October 2025 | Allow | 40 | 4 | 1 | Yes | No |
| 17830535 | ORGANOMETALLIC SOLUTION BASED HIGH RESOLUTION PATTERNING COMPOSITIONS | June 2022 | December 2024 | Allow | 31 | 4 | 0 | No | No |
| 17778550 | METHODS OF PREPARING REGIOREGULAR CONJUGATED POLYMERS | May 2022 | September 2025 | Abandon | 40 | 0 | 1 | No | No |
| 17734447 | PELLICLE FILM, PELLICLE, CARBON NANOTUBE WEB AND PRODUCTION METHOD THEREFOR, CARBON NANOTUBE FILM, AND CARBON NANOTUBE THREAD AND PRODUCTION METHOD THEREFOR | May 2022 | October 2025 | Allow | 41 | 2 | 0 | Yes | No |
| 17717984 | PHOTORESIST DEVELOPER AND METHOD OF DEVELOPING PHOTORESIST | April 2022 | December 2023 | Allow | 21 | 1 | 0 | No | No |
| 17714366 | METHOD FOR PRODUCING RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | April 2022 | January 2026 | Abandon | 45 | 2 | 0 | No | No |
| 17712953 | LIGAND-CAPPED MAIN GROUP NANOPARTICLES AS HIGH ABSORPTION EXTREME ULTRAVIOLET LITHOGRAPHY RESISTS | April 2022 | September 2023 | Allow | 18 | 1 | 0 | No | No |
| 17707979 | STORAGE CONTAINER STORING TREATMENT LIQUID FOR MANUFACTURING SEMICONDUCTOR | March 2022 | January 2025 | Allow | 34 | 3 | 0 | Yes | No |
| 17705795 | ORGANOMETALLIC SOLUTION BASED HIGH RESOLUTION PATTERNING COMPOSITIONS AND CORRESPONDING METHODS | March 2022 | February 2024 | Allow | 23 | 5 | 0 | No | No |
| 17701367 | TWO-STAGE BAKE PHOTORESIST WITH RELEASABLE QUENCHER | March 2022 | December 2023 | Allow | 21 | 2 | 0 | No | No |
| 17691074 | PHOTOLITHOGRAPHY APPARATUS AND METHOD FOR FORMING PHOTORESIST PATTERN | March 2022 | January 2026 | Allow | 47 | 3 | 0 | No | No |
| 17689193 | COMPOSITION, RESIST UNDERLAYER FILM, METHOD OF FORMING FILM, METHOD OF PRODUCING PATTERNED SUBSTRATE, AND COMPOUND | March 2022 | June 2025 | Allow | 39 | 2 | 0 | Yes | No |
| 17686599 | METHOD FOR MANUFACTURING MULTILAYER COIL COMPONENT | March 2022 | September 2025 | Allow | 42 | 2 | 0 | No | No |
| 17638951 | FABRICATION OF BLAZED DIFFRACTIVE OPTICS BY THROUGH-MASK OXIDATION | February 2022 | December 2024 | Allow | 34 | 1 | 0 | Yes | No |
| 17682713 | RESIST PATTERN FORMING METHOD AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD | February 2022 | January 2026 | Allow | 46 | 1 | 0 | No | No |
| 17638730 | QUANTUM DOT LIGHT-EMITTING DEVICE AND MANUFACTURING METHOD THEREOF | February 2022 | February 2026 | Allow | 48 | 2 | 1 | No | No |
| 17638688 | METHOD FOR MANUFACTURING RESIN ASYMMETRICAL STRUCTURES | February 2022 | March 2025 | Abandon | 37 | 0 | 1 | No | No |
| 17675208 | METHOD FOR PRODUCING LAMINATES AND METHOD FOR PRODUCING LIQUID DISCHARGE HEADS | February 2022 | January 2026 | Allow | 47 | 2 | 1 | Yes | No |
| 17669987 | PHOTORESIST, METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND METHOD OF EXTREME ULTRAVIOLET LITHOGRAPHY | February 2022 | August 2025 | Allow | 43 | 2 | 0 | Yes | No |
| 17666733 | Extreme Ultraviolet Mask Blank Structure | February 2022 | April 2025 | Abandon | 38 | 1 | 0 | No | No |
| 17666290 | REFLECTIVE MASK BLANK FOR EUV EXPOSURE, AND REFLECTIVE MASK | February 2022 | August 2023 | Allow | 18 | 1 | 0 | Yes | No |
| 17629849 | PELLICLE MEMBRANE | January 2022 | June 2025 | Allow | 41 | 2 | 0 | No | No |
| 17584173 | PHOTORESIST DEVELOPER AND METHODS OF USE | January 2022 | February 2026 | Allow | 49 | 4 | 0 | Yes | No |
| 17628655 | MASK BLANK, PHASE SHIFT MASK AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE | January 2022 | March 2025 | Abandon | 38 | 1 | 0 | No | No |
| 17626570 | A Method of Manufacturing a Transparent Conductive Film | January 2022 | April 2025 | Abandon | 39 | 1 | 0 | No | No |
| 17567560 | Photoresist System and Method | January 2022 | August 2023 | Allow | 19 | 1 | 0 | No | No |
| 17623979 | PATTERN FORMING METHOD, RESIST MATERIAL, AND PATTERN FORMING APPARATUS | December 2021 | June 2025 | Allow | 42 | 2 | 1 | No | No |
| 17561999 | METHOD FOR MANUFACTURING ELECTRONIC DEVICE | December 2021 | January 2024 | Allow | 25 | 2 | 0 | No | No |
| 17562665 | METHODS OF FABRICATING PHASE SHIFT PHOTOMASKS | December 2021 | September 2023 | Abandon | 21 | 1 | 0 | No | No |
| 17562045 | WAFER PROCESSING METHOD | December 2021 | June 2025 | Allow | 42 | 2 | 0 | Yes | No |
| 17560974 | METHOD FOR CLEANING SUBSTRATE, METHOD FOR MANUFACTURING PHOTOMASK AND METHOD FOR CLEANING PHOTOMASK | December 2021 | December 2024 | Allow | 36 | 1 | 0 | No | No |
| 17596858 | BAKE STRATEGIES TO ENHANCE LITHOGRAPHIC PERFORMANCE OF METAL-CONTAINING RESIST | December 2021 | December 2025 | Allow | 48 | 3 | 1 | Yes | No |
| 17596648 | PHOTORESIST DEVELOPMENT WITH HALIDE CHEMISTRIES | December 2021 | August 2024 | Allow | 32 | 3 | 0 | Yes | No |
| 17544058 | DEVELOPING METHOD AND SUBSTRATE TREATMENT SYSTEM | December 2021 | February 2025 | Allow | 39 | 2 | 1 | Yes | No |
| 17456526 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | November 2021 | October 2025 | Abandon | 46 | 4 | 0 | No | No |
| 17612041 | METAL FOIL WITH CARRIER AND USE METHOD AND MANUFACTURING METHOD THEREFOR | November 2021 | November 2025 | Allow | 48 | 2 | 1 | No | No |
| 17454377 | MULTILAYER GRAPHENE DIRECT GROWTH METHOD AND METHOD FOR MANUFACTURING PELLICLE FOR EXTREME ULTRAVIOLET LITHOGRAPHY USING THE SAME | November 2021 | December 2024 | Allow | 37 | 1 | 0 | No | No |
| 17522563 | EUV Active Films for EUV Lithography | November 2021 | March 2025 | Allow | 41 | 2 | 0 | Yes | No |
| 17497337 | PELLICLE HAVING VENT HOLE | October 2021 | February 2024 | Allow | 28 | 2 | 0 | No | No |
| 17599900 | COMPOSITION FOR RESIST PATTERN METALLIZATION PROCESS | September 2021 | March 2025 | Allow | 42 | 2 | 0 | No | No |
| 17488456 | SUBSTRATE PROCESSING METHOD USING LOW TEMPERATURE DEVELOPER AND SEMICONDUCTOR DEVICE MANUFACTURING APPARATUS USING THE SAME | September 2021 | September 2025 | Allow | 48 | 2 | 1 | Yes | No |
| 17465828 | CHEMICAL LIQUID, RINSING SOLUTION, AND RESIST PATTERN FORMING METHOD | September 2021 | March 2025 | Allow | 42 | 2 | 0 | No | No |
| 17461323 | METHOD FOR FORMING STRUCTURE OF PELLICLE-MASK STRUCTURE WITH VENT STRUCTURE | August 2021 | February 2024 | Allow | 29 | 2 | 0 | No | No |
| 17461199 | Lithography Process and Material for Negative Tone Development | August 2021 | September 2024 | Allow | 36 | 2 | 0 | No | No |
| 17404870 | PATTERN DECOMPOSITION LITHOGRAPHY TECHNIQUES | August 2021 | December 2024 | Allow | 40 | 2 | 1 | No | No |
| 17394005 | EUV Lithography Mask With A Porous Reflective Multilayer Structure | August 2021 | June 2023 | Allow | 23 | 2 | 0 | No | No |
| 17393255 | METHOD AND APPARATUS FOR FABRICATION OF LARGE AREA 3D PHOTONIC CRYSTALS WITH EMBEDDED WAVEGUIDES | August 2021 | December 2024 | Allow | 41 | 1 | 1 | No | No |
| 17378507 | LITHOGRAPHY METHOD FOR POSITIVE TONE DEVELOPMENT | July 2021 | October 2024 | Allow | 39 | 2 | 0 | No | No |
| 17360532 | METHOD AND APPARATUS FOR REPAIRING DEFECTS OF A PHOTOLITHOGRAPHIC MASK FOR THE EUV RANGE | June 2021 | August 2023 | Allow | 25 | 1 | 0 | No | No |
This analysis examines appeal outcomes and the strategic value of filing appeals for examiner CHACKO DAVIS, DABORAH.
With a 42.9% reversal rate, the PTAB reverses the examiner's rejections in a meaningful percentage of cases. This reversal rate is above the USPTO average, indicating that appeals have better success here than typical.
Filing a Notice of Appeal can sometimes lead to allowance even before the appeal is fully briefed or decided by the PTAB. This occurs when the examiner or their supervisor reconsiders the rejection during the mandatory appeal conference (MPEP § 1207.01) after the appeal is filed.
In this dataset, 26.5% of applications that filed an appeal were subsequently allowed. This appeal filing benefit rate is below the USPTO average, suggesting that filing an appeal has limited effectiveness in prompting favorable reconsideration.
✓ Appeals to PTAB show good success rates. If you have a strong case on the merits, consider fully prosecuting the appeal to a Board decision.
⚠ Filing a Notice of Appeal shows limited benefit. Consider other strategies like interviews or amendments before appealing.
Examiner CHACKO DAVIS, DABORAH works in Art Unit 1737 and has examined 387 patent applications in our dataset. With an allowance rate of 81.4%, this examiner has an above-average tendency to allow applications. Applications typically reach final disposition in approximately 37 months.
Examiner CHACKO DAVIS, DABORAH's allowance rate of 81.4% places them in the 52% percentile among all USPTO examiners. This examiner has an above-average tendency to allow applications.
On average, applications examined by CHACKO DAVIS, DABORAH receive 2.68 office actions before reaching final disposition. This places the examiner in the 79% percentile for office actions issued. This examiner issues more office actions than most examiners, which may indicate thorough examination or difficulty in reaching agreement with applicants.
The median time to disposition (half-life) for applications examined by CHACKO DAVIS, DABORAH is 37 months. This places the examiner in the 32% percentile for prosecution speed. Prosecution timelines are slightly slower than average with this examiner.
Conducting an examiner interview provides a +14.9% benefit to allowance rate for applications examined by CHACKO DAVIS, DABORAH. This interview benefit is in the 54% percentile among all examiners. Recommendation: Interviews provide an above-average benefit with this examiner and are worth considering.
When applicants file an RCE with this examiner, 28.0% of applications are subsequently allowed. This success rate is in the 50% percentile among all examiners. Strategic Insight: RCEs show below-average effectiveness with this examiner. Carefully evaluate whether an RCE or continuation is the better strategy.
This examiner enters after-final amendments leading to allowance in 38.7% of cases where such amendments are filed. This entry rate is in the 59% percentile among all examiners. Strategic Recommendation: This examiner shows above-average receptiveness to after-final amendments. If your amendments clearly overcome the rejections and do not raise new issues, consider filing after-final amendments before resorting to an RCE.
When applicants request a pre-appeal conference (PAC) with this examiner, 100.0% result in withdrawal of the rejection or reopening of prosecution. This success rate is in the 70% percentile among all examiners. Strategic Recommendation: Pre-appeal conferences show above-average effectiveness with this examiner. If you have strong arguments, a PAC request may result in favorable reconsideration.
This examiner withdraws rejections or reopens prosecution in 75.9% of appeals filed. This is in the 67% percentile among all examiners. Of these withdrawals, 68.2% occur early in the appeal process (after Notice of Appeal but before Appeal Brief). Strategic Insight: This examiner shows above-average willingness to reconsider rejections during appeals. The mandatory appeal conference (MPEP § 1207.01) provides an opportunity for reconsideration.
When applicants file petitions regarding this examiner's actions, 20.7% are granted (fully or in part). This grant rate is in the 11% percentile among all examiners. Strategic Note: Petitions are rarely granted regarding this examiner's actions compared to other examiners. Ensure you have a strong procedural basis before filing a petition, as the Technology Center Director typically upholds this examiner's decisions.
Examiner's Amendments: This examiner makes examiner's amendments in 0.5% of allowed cases (in the 61% percentile). This examiner makes examiner's amendments more often than average to place applications in condition for allowance (MPEP § 1302.04).
Quayle Actions: This examiner issues Ex Parte Quayle actions in 5.1% of allowed cases (in the 81% percentile). Per MPEP § 714.14, a Quayle action indicates that all claims are allowable but formal matters remain. This examiner frequently uses Quayle actions compared to other examiners, which is a positive indicator that once substantive issues are resolved, allowance follows quickly.
Based on the statistical analysis of this examiner's prosecution patterns, here are tailored strategic recommendations:
Not Legal Advice: The information provided in this report is for informational purposes only and does not constitute legal advice. You should consult with a qualified patent attorney or agent for advice specific to your situation.
No Guarantees: We do not provide any guarantees as to the accuracy, completeness, or timeliness of the statistics presented above. Patent prosecution statistics are derived from publicly available USPTO data and are subject to data quality limitations, processing errors, and changes in USPTO practices over time.
Limitation of Liability: Under no circumstances will IronCrow AI be liable for any outcome, decision, or action resulting from your reliance on the statistics, analysis, or recommendations presented in this report. Past prosecution patterns do not guarantee future results.
Use at Your Own Risk: While we strive to provide accurate and useful prosecution statistics, you should independently verify any information that is material to your prosecution strategy and use your professional judgment in all patent prosecution matters.