Detailed information about the 100 most recent patent applications.
| Application Number | Title | Filing Date | Disposal Date | Disposition | Time (months) | Office Actions | Restrictions | Interview | Appeal |
|---|---|---|---|---|---|---|---|---|---|
| 18404934 | METHOD AND APPARATUS FOR DIRECT WRITING PHOTOETCHING BY PARALLEL INTERPENETRATING SUPER-RESOLUTION HIGH-SPEED LASER | January 2024 | July 2024 | Allow | 6 | 0 | 0 | No | No |
| 18249011 | POLYVINYL ACETATE BASED PHOTOPOLYMER | April 2023 | August 2023 | Allow | 4 | 0 | 0 | No | No |
| 17992837 | LITHOGRAPHICALLY PATTERNED ELECTRICALLY CONDUCTIVE HYDROGELS, PHOTO-CURABLE COMPOSITIONS, AND ELASTOMERS FORMED FROM SUCH COMPOSITIONS | November 2022 | January 2025 | Allow | 26 | 1 | 0 | No | No |
| 17873130 | PHOTORESIST COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN | July 2022 | September 2024 | Allow | 26 | 0 | 0 | No | No |
| 17732807 | METHOD OF FORMING PATTERNS USING RESIST UNDERLAYER COMPOSITION | April 2022 | January 2024 | Allow | 20 | 0 | 0 | No | No |
| 17675770 | METHOD FOR MANUFACTURING INDIUM-CONTAINING ORGANIC POLYMER FILM, PATTERNING METHOD, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE | February 2022 | March 2025 | Allow | 37 | 0 | 0 | No | No |
| 17669711 | PHOTOSENSITIVE COLORING COMPOSITION, CURED FILM, COLOR FILTER, SOLID-STATE IMAGING ELEMENT, AND IMAGE DISPLAY DEVICE | February 2022 | April 2025 | Abandon | 38 | 3 | 0 | No | No |
| 17650676 | PHOTOCURABLE COMPOSITION INCLUDING A NON-REACTIVE POLYMER | February 2022 | July 2025 | Allow | 41 | 1 | 0 | Yes | No |
| 17628594 | QUANTUM DOT LIGHT-EMITTING STRUCTURE AND MANUFACTURING METHOD THEREOF, AND DISPLAY APPARATUS | January 2022 | March 2025 | Allow | 38 | 1 | 1 | No | No |
| 17564476 | PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS | December 2021 | May 2025 | Abandon | 41 | 4 | 0 | Yes | No |
| 17455294 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | November 2021 | April 2025 | Abandon | 41 | 3 | 0 | No | No |
| 17452360 | ENERGY-SENSITIVE COMPOSITION, CURED PRODUCT, FORMING METHOD OF CURED PRODUCT, THERMAL BASE GENERATOR AND COMPOUND | October 2021 | October 2024 | Abandon | 35 | 1 | 1 | No | No |
| 17450528 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | October 2021 | June 2025 | Allow | 44 | 4 | 0 | Yes | No |
| 17449033 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | September 2021 | April 2025 | Abandon | 43 | 4 | 0 | No | No |
| 17438962 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR PRODUCING PLATED FORMED PRODUCT | September 2021 | December 2024 | Abandon | 39 | 2 | 0 | No | No |
| 17368231 | COATED UNDERLAYER FOR OVERCOATED PHOTORESIST | July 2021 | March 2025 | Allow | 45 | 3 | 0 | No | No |
| 17345516 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND RESIN | June 2021 | April 2025 | Abandon | 47 | 4 | 0 | No | No |
| 17246855 | CARBOXYLATE, QUENCHER, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | May 2021 | March 2024 | Allow | 35 | 2 | 0 | No | No |
| 17245326 | AROMATIC UNDERLAYER | April 2021 | July 2025 | Allow | 50 | 2 | 0 | No | No |
| 17215363 | PHOTOACID GENERATOR FOR CHEMICALLY AMPLIFIED PHOTORESISTS | March 2021 | June 2024 | Allow | 39 | 2 | 0 | Yes | No |
| 17051394 | ELECTROSTATIC INK COMPOSITION | October 2020 | May 2023 | Abandon | 31 | 2 | 1 | No | No |
| 17004484 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND POLYESTER | August 2020 | June 2024 | Abandon | 46 | 2 | 0 | Yes | No |
| 17003373 | PHOTORESIST COMPOSITION, PHOTOLITHOGRAPHY METHOD USING THE SAME, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME | August 2020 | March 2025 | Abandon | 54 | 4 | 0 | Yes | No |
| 17003414 | RESIST COMPOSITION | August 2020 | November 2023 | Abandon | 39 | 2 | 0 | Yes | No |
| 16975609 | PATTERN-FORMING MATERIAL, PATTERN-FORMING METHOD, AND MONOMER FOR PATTERN-FORMING MATERIAL | August 2020 | December 2023 | Abandon | 40 | 1 | 0 | No | No |
| 16999755 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | August 2020 | November 2024 | Abandon | 51 | 4 | 0 | No | Yes |
| 16942981 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | July 2020 | October 2022 | Allow | 26 | 0 | 0 | No | No |
| 16934259 | RESIST COMPOSITION AND PATTERNING PROCESS | July 2020 | June 2022 | Allow | 23 | 0 | 0 | No | No |
| 16930539 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | July 2020 | February 2023 | Allow | 31 | 0 | 0 | No | No |
| 16928666 | PHOTORESIST COMPOSITION FOR THICK FILM AND METHOD OF FORMING THICK FILM PHOTORESIST PATTERN | July 2020 | September 2024 | Abandon | 50 | 2 | 0 | No | Yes |
| 16924752 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | July 2020 | April 2025 | Abandon | 58 | 5 | 0 | No | No |
| 16923228 | RESIST UNDERLAYER SURFACE MODIFICATION | July 2020 | September 2024 | Abandon | 50 | 4 | 0 | Yes | No |
| 16919574 | RESIST COMPOSITION AND PATTERNING PROCESS | July 2020 | June 2022 | Allow | 24 | 0 | 0 | No | No |
| 16918082 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | July 2020 | September 2022 | Allow | 27 | 0 | 0 | No | No |
| 16916453 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | June 2020 | December 2022 | Allow | 30 | 1 | 0 | No | No |
| 16958046 | CROSSLINKING AGENT COMPOUND, PHOTOSENSITIVE COMPOSITION COMPRISING THE SAME, AND PHOTOSENSITIVE MATERIAL USING THE SAME | June 2020 | May 2023 | Allow | 34 | 1 | 0 | No | No |
| 16889959 | SALT, QUENCHER, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | June 2020 | January 2025 | Abandon | 55 | 6 | 0 | Yes | No |
| 16890501 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | June 2020 | June 2025 | Abandon | 60 | 5 | 0 | No | No |
| 16765354 | COMPOSITION FOR FILM FORMATION FOR LITHOGRAPHY, FILM FOR LITHOGRAPHY, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR FORMING CIRCUIT PATTERN | May 2020 | September 2022 | Abandon | 28 | 1 | 0 | No | No |
| 16874079 | SALT, QUENCHER, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | May 2020 | July 2024 | Allow | 50 | 5 | 0 | Yes | No |
| 16858160 | ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | April 2020 | November 2024 | Allow | 55 | 5 | 0 | No | No |
| 16858092 | MOLECULAR RESIST COMPOSITION AND PATTERNING PROCESS | April 2020 | December 2023 | Allow | 43 | 3 | 0 | Yes | No |
| 16758347 | LITHOGRAPHICALLY PATTERNED ELECTRICALLY CONDUCTIVE HYDROGELS, PHOTO-CURABLE COMPOSITIONS, AND ELASTOMERS FORMED FROM SUCH COMPOSITIONS | April 2020 | December 2022 | Abandon | 32 | 1 | 1 | No | No |
| 16830216 | LITHOGRAPHIC PRINTING PLATE PRECURSOR AND METHOD OF PRODUCING LITHOGRAPHIC PRINTING PLATE | March 2020 | January 2024 | Abandon | 46 | 4 | 0 | Yes | No |
| 16826454 | CURABLE COMPOSITION, CURED FILM, SOLID-STATE IMAGING DEVICE, AND MANUFACTURING METHOD OF CURED FILM | March 2020 | August 2023 | Abandon | 41 | 2 | 0 | Yes | No |
| 16824037 | COMPOSITION AND METHOD FOR FORMING INSULATING PART | March 2020 | September 2024 | Abandon | 54 | 4 | 0 | Yes | No |
| 16813062 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM, METHOD OF MANUFACTURING PHOTOSENSITIVE DRY FILM, METHOD OF MANUFACTURING PATTERNED RESIST FILM, METHOD OF MANUFACTURING SUBSTRATE WITH TEMPLATE AND METHOD OF MANUFACTURING PLATED ARTICLE | March 2020 | March 2025 | Abandon | 60 | 5 | 1 | Yes | No |
| 16805922 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | March 2020 | May 2022 | Allow | 26 | 1 | 0 | No | No |
| 16642848 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | February 2020 | May 2025 | Abandon | 60 | 6 | 0 | Yes | No |
| 16794925 | LIQUID DEVELOPER AND METHOD OF PRODUCING LIQUID DEVELOPER | February 2020 | September 2021 | Allow | 19 | 2 | 0 | Yes | No |
| 16789233 | RESIST UNDERLAYER COMPOSITION, AND METHOD OF FORMING PATTERNS USING THE COMPOSITION | February 2020 | September 2021 | Allow | 20 | 0 | 0 | No | No |
| 16788467 | RESIST COMPOUND, METHOD OF FORMING PATTERN USING THE SAME, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME | February 2020 | March 2023 | Allow | 37 | 2 | 0 | No | No |
| 16787743 | RESIST COMPOSITION AND PATTERNING PROCESS | February 2020 | March 2022 | Allow | 25 | 0 | 0 | No | No |
| 16750616 | METAL-CONTAINING FILM-FORMING COMPOSITION, METAL-CONTAINING FILM AND PATTERN-FORMING METHOD | January 2020 | December 2023 | Abandon | 47 | 3 | 0 | No | No |
| 16631765 | PHOTORESIST COMPOSITION | January 2020 | September 2022 | Allow | 32 | 1 | 0 | Yes | No |
| 16731373 | Photosensitive dry film sheets | December 2019 | April 2024 | Abandon | 51 | 3 | 1 | Yes | No |
| 16728153 | PHOTOSENSITIVE RESIN COMPOSITION, LAMINATE, AND PATTERN FORMING PROCESS | December 2019 | April 2024 | Allow | 52 | 4 | 0 | Yes | No |
| 16722026 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | December 2019 | October 2022 | Allow | 34 | 2 | 0 | Yes | No |
| 16720729 | CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM, METHOD OF MANUFACTURING PHOTOSENSITIVE DRY FILM, METHOD OF MANUFACTURING PATTERNED RESIST FILM, METHOD OF MANUFACTURING SUBSTRATE WITH TEMPLATE, AND METHOD OF MANUFACTURING PLATED ARTICLE | December 2019 | May 2025 | Abandon | 60 | 7 | 0 | No | No |
| 16718377 | Resist Composition and Resist Pattern Forming Method | December 2019 | July 2024 | Abandon | 55 | 4 | 1 | No | No |
| 16716821 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM, AND PATTERN FORMING PROCESS | December 2019 | July 2022 | Allow | 31 | 1 | 0 | No | No |
| 16713471 | RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING METHOD | December 2019 | June 2023 | Abandon | 43 | 3 | 0 | No | No |
| 16621978 | SILSESQUIOXANE COMPOSITION WITH BOTH POSITIVE AND NEGATIVE PHOTO RESIST CHARACTERISTICS | December 2019 | December 2021 | Abandon | 24 | 1 | 0 | No | No |
| 16711916 | PATTERN-FORMING METHOD, AND SILICON-CONTAINING FILM-FORMING COMPOSITION | December 2019 | June 2023 | Abandon | 43 | 3 | 0 | No | No |
| 16710007 | POSITIVE-TYPE PHOTOSENSITIVE COMPOSITION AND CURED FILM USING THE SAME | December 2019 | December 2021 | Abandon | 25 | 1 | 0 | No | No |
| 16708684 | COLORING COMPOSITION, CURED FILM, PATTERN FORMING METHOD, COLOR FILTER, SOLID-STATE IMAGING ELEMENT, AND IMAGE DISPLAY DEVICE | December 2019 | December 2021 | Allow | 24 | 2 | 1 | No | No |
| 16701720 | NEGATIVE-TONE PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIST FILM, AND METHOD OF FORMING PATTERN | December 2019 | April 2025 | Abandon | 60 | 7 | 0 | No | No |
| 16700846 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND COMPOUND | December 2019 | January 2023 | Allow | 37 | 2 | 0 | No | No |
| 16682431 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | November 2019 | December 2022 | Allow | 38 | 4 | 0 | Yes | No |
| 16678175 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | November 2019 | April 2023 | Abandon | 41 | 2 | 1 | No | No |
| 16677269 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | November 2019 | June 2024 | Abandon | 56 | 5 | 0 | No | No |
| 16676591 | SILOXANE POLYMER CONTAINING ISOCYANURIC ACID AND POLYETHER SKELETONS, PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING PROCESS, AND FABRICATION OF OPTO-SEMICONDUCTOR DEVICE | November 2019 | September 2022 | Allow | 35 | 2 | 1 | No | No |
| 16670481 | CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM, METHOD OF MANUFACTURING PHOTOSENSITIVE DRY FILM, METHOD OF MANUFACTURING PATTERNED RESIST FILM, METHOD OF MANUFACTURING SUBSTRATE WITH TEMPLATE AND METHOD OF MANUFACTURING PLATED ARTICLE | October 2019 | July 2024 | Abandon | 56 | 4 | 0 | No | No |
| 16598264 | AROMATIC UNDERLAYER | October 2019 | July 2024 | Allow | 57 | 4 | 1 | No | Yes |
| 16584234 | PHOTORESIST COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN | September 2019 | December 2023 | Allow | 51 | 3 | 1 | Yes | No |
| 16498306 | COMPOUND, RESIST COMPOSITION CONTAINING COMPOUND AND PATTERN FORMATION METHOD USING SAME | September 2019 | February 2022 | Abandon | 29 | 1 | 0 | No | No |
| 16496986 | NEGATIVE RESIST FORMULATION FOR PRODUCING UNDERCUT PATTERN PROFILES | September 2019 | July 2024 | Allow | 58 | 3 | 2 | No | No |
| 16579014 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | September 2019 | June 2025 | Abandon | 60 | 6 | 0 | Yes | No |
| 16494670 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN COMPOSITION FILM, INSULATING FILM, AND ELECTRONIC COMPONENT | September 2019 | November 2023 | Abandon | 50 | 4 | 0 | No | No |
| 16570176 | PHASE SHIFT-TYPE PHOTOMASK BLANK AND PHASE SHIFT-TYPE PHOTOMASK | September 2019 | June 2024 | Abandon | 57 | 6 | 0 | Yes | No |
| 16567121 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAYER AND ELECTRONIC DEVICE USING THE SAME | September 2019 | June 2024 | Abandon | 58 | 7 | 0 | Yes | No |
| 16559062 | PHOTORESIST COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN | September 2019 | January 2025 | Allow | 60 | 5 | 0 | Yes | No |
| 16558486 | RESIST UNDERLAYER COMPOSITION, AND METHOD OF FORMING PATTERNS USING THE COMPOSITION | September 2019 | March 2022 | Allow | 30 | 2 | 1 | No | No |
| 16489145 | POLYMER AND POSITIVE RESIST COMPOSITION | August 2019 | May 2021 | Abandon | 21 | 1 | 0 | No | No |
| 16541895 | PELLICLE MEMBER AND RETICLE ASSEMBLY INCLUDING THE SAME | August 2019 | January 2022 | Abandon | 29 | 2 | 0 | No | No |
| 16534968 | PROTECTION LAYER ON LOW THERMAL EXPANSION MATERIAL (LTEM) SUBSTRATE OF EXTREME ULTRAVIOLET (EUV) MASK | August 2019 | January 2024 | Allow | 54 | 5 | 1 | Yes | No |
| 16480572 | CHEMICALLY AMPLIFIED PHOTORESIST COMPOSITION AND PHOTORESIST FILM USING THE SAME | July 2019 | June 2022 | Allow | 34 | 1 | 0 | No | No |
| 16519420 | RADIATION-SENSITIVE COMPOSITION AND PATTERN-FORMING METHOD | July 2019 | November 2021 | Abandon | 27 | 0 | 1 | No | No |
| 16512693 | Extreme Ultraviolet Mask Absorber Materials | July 2019 | August 2021 | Abandon | 25 | 1 | 1 | No | No |
| 16507373 | COLORING COMPOSITION, CURED FILM, STRUCTURE, COLOR FILTER, SOLID-STATE IMAGING ELEMENT, AND IMAGE DISPLAY DEVICE | July 2019 | February 2023 | Abandon | 43 | 4 | 0 | No | No |
| 16506751 | Acid-Labile, Crosslinked Polymers, Compositions and Methods of Their Use | July 2019 | February 2023 | Abandon | 43 | 2 | 0 | Yes | No |
| 16504745 | PHOTOSENSITIVE COLORING COMPOSITION, CURED FILM, COLOR FILTER, SOLID-STATE IMAGING ELEMENT, AND IMAGE DISPLAY DEVICE | July 2019 | November 2021 | Allow | 28 | 2 | 0 | Yes | No |
| 16502918 | PHOTORESIST COMPOSITION FOR LINE DOUBLING | July 2019 | December 2022 | Abandon | 41 | 3 | 0 | No | No |
| 16459905 | PHOTOSENSITIVE RESIN COMPOSITION AND PATTERN FORMING PROCESS | July 2019 | January 2022 | Allow | 30 | 2 | 0 | No | No |
| 16454650 | PHOTOSENSITIVE COMPOSITION, CURED FILM, COLOR FILTER, SOLID-STATE IMAGING ELEMENT AND IMAGE DISPLAY DEVICE | June 2019 | March 2023 | Abandon | 45 | 4 | 0 | No | No |
| 16449720 | RADIATION-SENSITIVE COMPOSITION, PATTERN-FORMING METHOD AND METAL OXIDE | June 2019 | November 2021 | Abandon | 28 | 1 | 1 | No | No |
| 16447092 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | June 2019 | August 2023 | Abandon | 50 | 5 | 1 | No | No |
| 16431752 | PHOTOSENSITIVE COMPOSITION, COLOR FILTER AND METHOD FOR FORMING THE COLOR FILTER | June 2019 | December 2024 | Allow | 60 | 6 | 1 | Yes | No |
| 16432499 | REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND METHOD OF MANUFACTURING REFLECTIVE MASK BLANK | June 2019 | April 2024 | Abandon | 58 | 6 | 1 | Yes | No |
| 16432043 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | June 2019 | June 2022 | Abandon | 37 | 2 | 0 | No | No |
This analysis examines appeal outcomes and the strategic value of filing appeals for examiner CHAMPION, RICHARD DAVID.
Filing a Notice of Appeal can sometimes lead to allowance even before the appeal is fully briefed or decided by the PTAB. This occurs when the examiner or their supervisor reconsiders the rejection during the mandatory appeal conference (MPEP § 1207.01) after the appeal is filed.
In this dataset, 0.0% of applications that filed an appeal were subsequently allowed. This appeal filing benefit rate is in the bottom 25% across the USPTO, indicating that filing appeals is less effective here than in most other areas.
⚠ Filing a Notice of Appeal shows limited benefit. Consider other strategies like interviews or amendments before appealing.
Examiner CHAMPION, RICHARD DAVID works in Art Unit 1737 and has examined 108 patent applications in our dataset. With an allowance rate of 46.3%, this examiner allows applications at a lower rate than most examiners at the USPTO. Applications typically reach final disposition in approximately 41 months.
Examiner CHAMPION, RICHARD DAVID's allowance rate of 46.3% places them in the 6% percentile among all USPTO examiners. This examiner is less likely to allow applications than most examiners at the USPTO.
On average, applications examined by CHAMPION, RICHARD DAVID receive 2.70 office actions before reaching final disposition. This places the examiner in the 90% percentile for office actions issued. This examiner issues more office actions than most examiners, which may indicate thorough examination or difficulty in reaching agreement with applicants.
The median time to disposition (half-life) for applications examined by CHAMPION, RICHARD DAVID is 41 months. This places the examiner in the 6% percentile for prosecution speed. Applications take longer to reach final disposition with this examiner compared to most others.
Conducting an examiner interview provides a -1.2% benefit to allowance rate for applications examined by CHAMPION, RICHARD DAVID. This interview benefit is in the 7% percentile among all examiners. Note: Interviews show limited statistical benefit with this examiner compared to others, though they may still be valuable for clarifying issues.
When applicants file an RCE with this examiner, 9.4% of applications are subsequently allowed. This success rate is in the 2% percentile among all examiners. Strategic Insight: RCEs show lower effectiveness with this examiner compared to others. Consider whether a continuation application might be more strategic, especially if you need to add new matter or significantly broaden claims.
This examiner enters after-final amendments leading to allowance in 20.6% of cases where such amendments are filed. This entry rate is in the 18% percentile among all examiners. Strategic Recommendation: This examiner rarely enters after-final amendments compared to other examiners. You should generally plan to file an RCE or appeal rather than relying on after-final amendment entry. Per MPEP § 714.12, primary examiners have discretion in entering after-final amendments, and this examiner exercises that discretion conservatively.
When applicants request a pre-appeal conference (PAC) with this examiner, 0.0% result in withdrawal of the rejection or reopening of prosecution. This success rate is in the 2% percentile among all examiners. Note: Pre-appeal conferences show limited success with this examiner compared to others. While still worth considering, be prepared to proceed with a full appeal brief if the PAC does not result in favorable action.
This examiner withdraws rejections or reopens prosecution in 100.0% of appeals filed. This is in the 86% percentile among all examiners. Of these withdrawals, 100.0% occur early in the appeal process (after Notice of Appeal but before Appeal Brief). Strategic Insight: This examiner frequently reconsiders rejections during the appeal process compared to other examiners. Per MPEP § 1207.01, all appeals must go through a mandatory appeal conference. Filing a Notice of Appeal may prompt favorable reconsideration even before you file an Appeal Brief.
When applicants file petitions regarding this examiner's actions, 120.0% are granted (fully or in part). This grant rate is in the 98% percentile among all examiners. Strategic Note: Petitions are frequently granted regarding this examiner's actions compared to other examiners. Per MPEP § 1002.02(c), various examiner actions are petitionable to the Technology Center Director, including prematureness of final rejection, refusal to enter amendments, and requirement for information. If you believe an examiner action is improper, consider filing a petition.
Examiner's Amendments: This examiner makes examiner's amendments in 0.0% of allowed cases (in the 4% percentile). This examiner rarely makes examiner's amendments compared to other examiners. You should expect to make all necessary claim amendments yourself through formal amendment practice.
Quayle Actions: This examiner issues Ex Parte Quayle actions in 0.0% of allowed cases (in the 5% percentile). This examiner rarely issues Quayle actions compared to other examiners. Allowances typically come directly without a separate action for formal matters.
Based on the statistical analysis of this examiner's prosecution patterns, here are tailored strategic recommendations:
Not Legal Advice: The information provided in this report is for informational purposes only and does not constitute legal advice. You should consult with a qualified patent attorney or agent for advice specific to your situation.
No Guarantees: We do not provide any guarantees as to the accuracy, completeness, or timeliness of the statistics presented above. Patent prosecution statistics are derived from publicly available USPTO data and are subject to data quality limitations, processing errors, and changes in USPTO practices over time.
Limitation of Liability: Under no circumstances will IronCrow AI be liable for any outcome, decision, or action resulting from your reliance on the statistics, analysis, or recommendations presented in this report. Past prosecution patterns do not guarantee future results.
Use at Your Own Risk: While we strive to provide accurate and useful prosecution statistics, you should independently verify any information that is material to your prosecution strategy and use your professional judgment in all patent prosecution matters.