USPTO Art Unit 2882 Prosecution Statistics

Art Unit Information

Art Unit: 2882
Group: 2880
Tech Center: 2800
Total Cases: 21,011
Last Active: October 2025

Recent Applications

Detailed information about the 100 most recent patent applications.

Application NumberTitleFiling DateDisposal DateDispositionTime (months)Office ActionsRestrictionsInterviewAppeal
19358841AMBIENT IMAGE PROJECTION DEVICEOctober 2025February 2026Allow410NoNo
19318761MOVABLE PROJECTORSeptember 2025November 2025Allow200NoNo
19252790STORY PROJECTORJune 2025November 2025Allow510NoNo
19252028ILLUMINATION COMPENSATION METHODJune 2025January 2026Allow610NoNo
19219732Lithography Using Spin Isolated Monochromatic Electromagnetic RadiationMay 2025November 2025Allow510NoNo
19180769GEOMETRIC LOADING EFFECT CORRECTION FOR LITHOGRAPHYApril 2025November 2025Allow710YesNo
19091755SHAPE VARIABLE DISPLAY ARRAYMarch 2025December 2025Allow810NoNo
19088481Rear Projection Display (RPD) device for an Electronic DisplayMarch 2025September 2025Allow610NoNo
19044116HEAT TREATMENT APPARATUS AND HEAT TREATMENT METHODFebruary 2025July 2025Allow610YesNo
18911799OPERATING METHOD FOR MULTI-SCREEN PROJECTION SYSTEMOctober 2024December 2024Allow200NoNo
18911792MULTI-SCREEN PROJECTION SYSTEMOctober 2024December 2024Allow200YesNo
18851601SUBSTRATE WARPAGE DETERMINATION SYSTEMSeptember 2024March 2026Allow1700NoNo
18820171IMAGE PROJECTION AND DISPLAY APPARATUS AND METHODAugust 2024October 2024Allow100NoNo
18802309DARK-FIELD CONFOCAL MICROSCOPY MEASUREMENT APPARATUS AND METHOD BASED ON DIFFERENTIAL FRACTIONAL VORTEX BEAMAugust 2024October 2024Allow200NoNo
18802272DARK-FIELD CONFOCAL MICROSCOPY MEASUREMENT APPARATUS AND METHOD BASED ON MULTI-FRACTIONAL ANGULAR MOMENTUM DEMODULATIONAugust 2024February 2025Allow610NoNo
18787162DEEP LEARNING SYSTEM APPLICABLE FOR QUALITY INSPECTION BY LEARNING ONLY NON-DEFECTIVE MANUFACTURED PRODUCT DATA AND CONTROL METHOD THEREOFJuly 2024October 2024Allow200NoNo
18780548ELECTRON PROBE POSITIONING PATTERN, DISPLACEMENT MEASUREMENT METHOD, AND POSITIONING CONTROL METHODJuly 2024December 2025Allow1700NoNo
18778275COLOR CORRECTION FOR VIRTUAL IMAGES OF NEAR-EYE DISPLAYSJuly 2024August 2025Allow1310NoNo
18774154IMAGE DISPLAY APPARATUS AND METHODJuly 2024October 2025Allow1500NoNo
18772720METHOD AND APPARATUS FOR EXPOSURE OF FLEXOGRAPHIC PRINTING PLATES USING LIGHT EMITTING DIODE (LED) RADIATION SOURCESJuly 2024October 2025Allow1520NoNo
18771085CYLINDER SCANNERJuly 2024March 2026Allow2000NoNo
18771278DEVICE FOR AUGMENTED REALITY OR VIRTUAL REALITY DISPLAYJuly 2024August 2025Allow1310YesNo
18769032ON CHIP SENSOR FOR WAFER OVERLAY MEASUREMENTJuly 2024March 2026Allow2000NoNo
18765359PHOTOMASK INSPECTION METHOD AND APPARATUS THEREOFJuly 2024June 2025Allow1110NoNo
18766165LITHOGRAPHY CONTAMINATION CONTROLJuly 2024November 2025Allow1610YesNo
18762252ALIGNMENT DEVICEJuly 2024January 2026Allow1800YesNo
18725508DIFFRACTIVE OPTICAL ELEMENT FOR BEAM SPLITTING AND DESIGN METHOD THEREFOR, AND STRUCTURED LIGHT PROJECTORJune 2024January 2025Allow700NoNo
18756604METHODS OF SERVICING PHOTOLITHOGRAPHIC APPARATUSJune 2024May 2025Allow1010YesNo
18724144LITHOGRAPHIC APPARATUS, ILLUMINATION SYSTEM, AND CONNECTION SEALING DEVICE WITH PROTECTIVE SHIELDJune 2024January 2026Allow1900NoNo
18749722PROJECTION TYPE VIDEO DISPLAY DEVICEJune 2024June 2025Allow1210NoNo
18746751LITHOGRAPHY SYSTEM AND METHODSJune 2024February 2026Allow2000NoNo
18742869IMAGING OVERLAY WITH MUTUALLY COHERENT OBLIQUE ILLUMINATIONJune 2024November 2025Allow1720NoNo
18717684METHOD OF REDUCING CYCLIC ERROR EFFECTS IN A LITHOGRAPHIC PROCESS, PROJECTION SYSTEM AND LITHOGRAPHIC APPARATUS COMPRISING A PROJECTION SYSTEMJune 2024February 2026Allow2000NoNo
18717286PROJECTION UNIT FOR A LEVEL SENSOR, METHOD OF MONITORING HEIGHT OF A SUBSTRATE, AND LITHOGRAPHIC SYSTEM COMPRISING THE PROJECTION UNITJune 2024January 2026Allow1910NoNo
18734904CONFIGURING OPTICAL LAYERS IN IMPRINT LITHOGRAPHY PROCESSESJune 2024February 2025Allow800NoNo
18733146Optical Lithography System and Method of Using the SameJune 2024December 2025Allow1911NoNo
18731762METHOD FOR CALIBRATING A MANIPULABLE OPTICAL MODULEJune 2024November 2025Allow1800NoNo
18680209CAMERA MODULE AND OPTICAL DEVICE COMPRISING SAMEMay 2024April 2025Allow1010NoNo
18676051PROJECTION DEVICEMay 2024June 2025Allow1210YesNo
18673341EXHAUST DISCHARGING DEVICE WITH TEMPERATURE CONTROL AND HEAT RETENTION MECHANISM FOR PREVENTING PHOTORESIST FROM CRYSTALLIZATION AND ADHERING TO PIPES, AND EXHAUST DISCHARGING METHOD USING THE SAMEMay 2024February 2026Allow2000NoNo
18671187METHODS AND APPARATUS FOR REDUCING HYDROGEN PERMEATION FROM LITHOGRAPHIC TOOLMay 2024June 2025Allow1310NoNo
18670550OBJECT TABLE COMPRISING AN ELECTROSTATIC CLAMPMay 2024September 2025Allow1620NoNo
18669054PROJECTOR WITH AUDIO AND ANIMATIONMay 2024August 2025Allow1510YesNo
18711842APPARATUS FOR SUPPLYING LIQUID TARGET MATERIAL TO A RADIATION SOURCEMay 2024February 2026Allow2110NoNo
18667744TWO-PIECE LCD PROJECTION DEVICE WITH LIGHT FILTER FUNCTION AND PROJECTION METHOD THEREOFMay 2024October 2024Allow500NoNo
18667310APPARATUS FOR TREATING SUBSTRATEMay 2024November 2025Allow1800NoNo
18710419PARTICLE TRANSFER BLOCKING DEVICE AND LITHOGRAPHY DEVICE USING ELECTRON LAYER IN VACUUM SYSTEMMay 2024June 2025Allow1310YesNo
18664308EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICEMay 2024November 2025Allow1800NoNo
18665461METHODS OF CLEANING A LITHOGRAPHY SYSTEMMay 2024May 2025Allow1210NoNo
18665285RETICLE POD INCLUDING MOTION LIMITING FEATURES AND METHOD OF ASSEMBLING SAMEMay 2024December 2024Allow700YesNo
18664848INSPECTION APPARATUS AND INSPECTION METHODMay 2024May 2025Allow1210NoNo
18664027HIGH THROUGHPUT AND HIGH POSITION ACCURATE METHOD FOR PARTICLE INSPECTION OF MASK PODSMay 2024April 2025Allow1120NoNo
18662804LASER PROJECTION APPARATUS AND LASER PROJECTION DISPLAY METHODMay 2024November 2025Allow1800NoNo
18659842IMAGE CAPTURING APPARATUS AND IMAGE CAPTURING METHODMay 2024November 2025Allow1800NoNo
18656908OPTICAL SYSTEM, PROJECTION EXPOSURE SYSTEM AND METHODMay 2024February 2026Allow2100NoNo
18656365INFORMATION PROCESSING APPARATUS AND INFORMATION PROCESSING METHODMay 2024March 2025Allow1010NoNo
18656296IMAGING LENS SYSTEM, IMAGE CAPTURING MODULE AND ELECTRONIC DEVICEMay 2024July 2025Allow1400NoNo
18707280SUBSTRATE TREATMENT SYSTEM AND SUBSTRATE TREATMENT METHODMay 2024September 2025Allow1700NoNo
18653971COMPACT APPARATUS FOR BATCH VIAL INSPECTIONMay 2024October 2025Allow1830NoNo
18652891MULTIPURPOSE VIRTUAL DISPLAY SYSTEMS FOR INTEGRATED HUDs, INSTRUMENT CLUSTERS, AND INTERACTIVE DISPLAYS USING INTERNAL AND AMBIENT LIGHTINGMay 2024June 2025Allow1410NoNo
18653345CHUCK WITH BUFFER PORTIONMay 2024February 2026Allow2100NoNo
18650441OPTICAL SYSTEM, LITHOGRAPHY APPARATUS AND METHODApril 2024February 2026Allow2220NoNo
18646813METHOD AND APPARATUS FOR IMPROVING CRITICAL DIMENSION VARIATIONApril 2024April 2025Allow1110NoNo
18704532METHODS AND SYSTEMS TO CALIBRATE RETICLE THERMAL EFFECTSApril 2024February 2026Allow2220NoNo
18643147VEHICLE LIGHT WITH PROJECTION FILM THROUGH OPAQUE AND TRANSPARENT MODESApril 2024July 2025Allow1510YesNo
18640245PROJECTION VIDEO DISPLAY APPARATUS WITH VARIABLE LIGHT ADJUSTMENT FOR MULTI-SCREEN PROJECTION MODEApril 2024February 2025Allow910NoNo
18637683EXPOSURE APPARATUS, EXPOSURE METHOD, AND ARTICLE MANUFACTURING METHODApril 2024March 2026Allow2310NoNo
18635608FILM, LIQUID COMPOSITION, OPTICAL ELEMENT, AND IMAGING APPARATUSApril 2024January 2025Allow1010NoNo
18635574FILM, LIQUID COMPOSITION, OPTICAL ELEMENT, AND IMAGING APPARATUSApril 2024November 2024Allow700NoNo
18635589SUBSTRATE HOLDER, LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD, AND METHOD OF MANUFACTURING A SUBSTRATE HOLDERApril 2024March 2025Allow1110NoNo
18699654LITHOGRAPHIC APPARATUS STAGE COUPLINGApril 2024September 2025Allow1700NoNo
18630770EUV MULTI-MIRROR ARRANGEMENTApril 2024March 2026Allow2310NoNo
18696657CLAMP FOR HOLDING AN OBJECT AND METHODMarch 2024January 2026Allow2210NoNo
18618345RETICLE MASKING DEVICE, SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME, AND SUBSTRATE PROCESSING METHOD USING THE SAMEMarch 2024March 2026Allow2310YesNo
18615569VEHICLE DISPLAY SYSTEM, VEHICLE SYSTEM, AND VEHICLEMarch 2024March 2025Allow1220YesNo
18611440DROPLET SPLASH CONTROL FOR EXTREME ULTRAVIOLET PHOTOLITHOGRAPHYMarch 2024June 2025Allow1410NoNo
18609453METHOD FOR DETERMINING A POSITION OF A MIRRORMarch 2024September 2025Allow1800NoNo
18609433IMMERSION EXPOSURE TOOLMarch 2024January 2025Allow1010YesNo
18608713FixtureMarch 2024July 2025Allow1610NoNo
18606657HIGHLY EFFICIENT COMPACT HEAD-MOUNTED DISPLAY SYSTEM HAVING SMALL INPUT APERTUREMarch 2024October 2025Allow1930NoNo
18605591EUV ILLUMINATION DEVICE AND METHOD FOR OPERATING A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS DESIGNED FOR OPERATION IN THE EUVMarch 2024February 2026Allow2310YesNo
18602629OPTICAL ELEMENT WITH COOLING CHANNELS, AND OPTICAL ARRANGEMENTMarch 2024March 2026Allow2410NoNo
18599673EXTREME ULTRAVIOLET SOURCE CLEANING APPARATUS, EUV SOURCE CLEANING METHOD USING THE SAME, AND SUBSTRATE PROCESSING METHOD INCLUDING THE SAMEMarch 2024January 2026Allow2210YesNo
18598415METHOD OF CLEANING WAFER TABLE OF PHOTOLITHOGRAPHY SYSTEM AND METHOD OF MANUFACTURING INTEGRATED CIRCUITMarch 2024September 2024Allow600NoNo
18596587ELECTRONIC DEVICEMarch 2024January 2025Allow1110NoNo
18596499METROLOGY METHOD AND ASSOCIATED METROLOGY AND LITHOGRAPHIC APPARATUSESMarch 2024December 2025Allow2210NoNo
18595241LASER PROJECTION APPARATUSMarch 2024February 2026Allow2300NoNo
18593469SEMICONDUCTOR LITHOGRAPHY SYSTEM AND/OR METHODMarch 2024February 2025Allow1110NoNo
18593330IN-SITU LITHOGRAPHY PATTERN ENHANCEMENT WITH LOCALIZED STRESS TREATMENT TUNING USING HEAT ZONESMarch 2024September 2024Allow700NoNo
18591713EXPOSURE APPARATUSFebruary 2024February 2026Allow2410YesNo
18588305METHOD FOR IDENTIFICATION OF A NOISE POINT USED FOR LIDAR, AND LIDAR SYSTEMFebruary 2024July 2024Allow420YesNo
18586831PROJECTOR HAVING A MODULATED LIGHT REDUCTION RELAY LENS SYSTEM AND A CONTROL UNIT CORRECTING WHITE BALANCE BASED ON F - NUMBERFebruary 2024February 2026Allow2400NoNo
18586762RELAY SYSTEM AND PROJECTORFebruary 2024February 2026Allow2400NoNo
18582045METHOD OF MANUFACTURING SEMICONDUCTOR DEVICEFebruary 2024September 2024Allow700NoNo
18684894SYSTEMS AND METHODS FOR FORMING TOPOLOGICAL LATTICES OF PLASMONIC MERONSFebruary 2024February 2026Allow2410NoNo
18582340Imaging Lens Check and Active Alignment Method to Maintain Consistent Rear Focusing Distance for an Autofocus LensFebruary 2024February 2026Abandon2420NoNo
18581305LENS MODULE, PROJECTION DEVICE AND METHOD FOR ADJUSTING LENS MODULEFebruary 2024March 2026Allow2500NoNo
17767420PHASE MEASUREMENT DEVICE FOR LASER INTERFERENCE PHOTOLITHOGRAPHY SYSTEM, AND METHOD FOR USING SAMEFebruary 2024February 2026Allow4600NoNo
18441275MEMS Based Spatial Light Modulators and ApplicationsFebruary 2024August 2025Allow1820NoNo
18440727CONTROLLING LIGHT SOURCE WAVELENGTHS FOR SELECTABLE PHASE SHIFTS BETWEEN PIXELS IN DIGITAL LITHOGRAPHY SYSTEMSFebruary 2024March 2025Allow1410NoNo

Appeals Overview

This analysis examines appeal outcomes and the strategic value of filing appeals for art-unit 2882.

Patent Trial and Appeal Board (PTAB) Decisions

Total PTAB Decisions
139
Examiner Affirmed
104
(74.8%)
Examiner Reversed
35
(25.2%)
Reversal Percentile
15.8%
Lower than average

What This Means

With a 25.2% reversal rate, the PTAB affirms the examiner's rejections in the vast majority of cases. This reversal rate is in the bottom 25% across the USPTO, indicating that appeals face significant challenges here.

Strategic Value of Filing an Appeal

Total Appeal Filings
670
Allowed After Appeal Filing
227
(33.9%)
Not Allowed After Appeal Filing
443
(66.1%)
Filing Benefit Percentile
58.1%
Higher than average

Understanding Appeal Filing Strategy

Filing a Notice of Appeal can sometimes lead to allowance even before the appeal is fully briefed or decided by the PTAB. This occurs when the examiner or their supervisor reconsiders the rejection during the mandatory appeal conference (MPEP § 1207.01) after the appeal is filed.

In this dataset, 33.9% of applications that filed an appeal were subsequently allowed. This appeal filing benefit rate is above the USPTO average, suggesting that filing an appeal can be an effective strategy for prompting reconsideration.

Strategic Recommendations

⚠ Appeals to PTAB face challenges. Ensure your case has strong merit before committing to full Board review.

✓ Filing a Notice of Appeal is strategically valuable. The act of filing often prompts favorable reconsideration during the mandatory appeal conference.

Art Unit 2882 - Prosecution Statistics Summary

Executive Summary

Art Unit 2882 is part of Group 2880 in Technology Center 2800. This art unit has examined 21,011 patent applications in our dataset, with an overall allowance rate of 84.2%. Applications typically reach final disposition in approximately 25 months.

Comparative Analysis

Art Unit 2882's allowance rate of 84.2% places it in the 78% percentile among all USPTO art units. This art unit has a significantly higher allowance rate than most art units at the USPTO.

Prosecution Patterns

Applications in Art Unit 2882 receive an average of 1.50 office actions before reaching final disposition (in the 22% percentile). The median prosecution time is 25 months (in the 79% percentile).

Strategic Considerations

When prosecuting applications in this art unit, consider the following:

  • The art unit's allowance rate suggests a more favorable examination environment compared to the USPTO average.
  • With fewer office actions than average, plan for relatively streamlined prosecution.
  • The median prosecution time is shorter than average and should be factored into your continuation and client communication strategies.
  • Review individual examiner statistics within this art unit to identify examiners with particularly favorable or challenging prosecution patterns.

Important Disclaimer

Not Legal Advice: The information provided in this report is for informational purposes only and does not constitute legal advice. You should consult with a qualified patent attorney or agent for advice specific to your situation.

No Guarantees: We do not provide any guarantees as to the accuracy, completeness, or timeliness of the statistics presented above. Patent prosecution statistics are derived from publicly available USPTO data and are subject to data quality limitations, processing errors, and changes in USPTO practices over time.

Limitation of Liability: Under no circumstances will IronCrow AI be liable for any outcome, decision, or action resulting from your reliance on the statistics, analysis, or recommendations presented in this report. Past prosecution patterns do not guarantee future results.

Use at Your Own Risk: While we strive to provide accurate and useful prosecution statistics, you should independently verify any information that is material to your prosecution strategy and use your professional judgment in all patent prosecution matters.