Detailed information about the 100 most recent patent applications.
| Application Number | Title | Filing Date | Disposal Date | Disposition | Time (months) | Office Actions | Restrictions | Interview | Appeal |
|---|---|---|---|---|---|---|---|---|---|
| 18765359 | PHOTOMASK INSPECTION METHOD AND APPARATUS THEREOF | July 2024 | June 2025 | Allow | 11 | 1 | 0 | No | No |
| 18766165 | LITHOGRAPHY CONTAMINATION CONTROL | July 2024 | November 2025 | Allow | 16 | 1 | 0 | Yes | No |
| 18742869 | IMAGING OVERLAY WITH MUTUALLY COHERENT OBLIQUE ILLUMINATION | June 2024 | November 2025 | Allow | 17 | 2 | 0 | No | No |
| 18664027 | HIGH THROUGHPUT AND HIGH POSITION ACCURATE METHOD FOR PARTICLE INSPECTION OF MASK PODS | May 2024 | April 2025 | Allow | 11 | 2 | 0 | No | No |
| 18646813 | METHOD AND APPARATUS FOR IMPROVING CRITICAL DIMENSION VARIATION | April 2024 | April 2025 | Allow | 11 | 1 | 0 | No | No |
| 18704532 | METHODS AND SYSTEMS TO CALIBRATE RETICLE THERMAL EFFECTS | April 2024 | February 2026 | Allow | 22 | 2 | 0 | No | No |
| 18630770 | EUV MULTI-MIRROR ARRANGEMENT | April 2024 | March 2026 | Allow | 23 | 1 | 0 | No | No |
| 18618345 | RETICLE MASKING DEVICE, SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME, AND SUBSTRATE PROCESSING METHOD USING THE SAME | March 2024 | March 2026 | Allow | 23 | 1 | 0 | Yes | No |
| 18602629 | OPTICAL ELEMENT WITH COOLING CHANNELS, AND OPTICAL ARRANGEMENT | March 2024 | March 2026 | Allow | 24 | 1 | 0 | No | No |
| 18599673 | EXTREME ULTRAVIOLET SOURCE CLEANING APPARATUS, EUV SOURCE CLEANING METHOD USING THE SAME, AND SUBSTRATE PROCESSING METHOD INCLUDING THE SAME | March 2024 | January 2026 | Allow | 22 | 1 | 0 | Yes | No |
| 18591713 | EXPOSURE APPARATUS | February 2024 | February 2026 | Allow | 24 | 1 | 0 | Yes | No |
| 18684894 | SYSTEMS AND METHODS FOR FORMING TOPOLOGICAL LATTICES OF PLASMONIC MERONS | February 2024 | February 2026 | Allow | 24 | 1 | 0 | No | No |
| 18582340 | Imaging Lens Check and Active Alignment Method to Maintain Consistent Rear Focusing Distance for an Autofocus Lens | February 2024 | February 2026 | Abandon | 24 | 2 | 0 | No | No |
| 18429281 | ADVANCED LOAD PORT FOR PHOTOLITHOGRAPHY MASK INSPECTION TOOL | January 2024 | January 2025 | Allow | 11 | 1 | 0 | No | No |
| 18418734 | SUPPORT FOR AN OPTICAL ELEMENT | January 2024 | November 2025 | Allow | 22 | 1 | 0 | No | No |
| 18415430 | DATA INSPECTION FOR DIGITAL LITHOGRAPHY FOR HVM USING OFFLINE AND INLINE APPROACH | January 2024 | January 2025 | Allow | 12 | 1 | 0 | Yes | No |
| 18398860 | STAGE SYSTEM, LITHOGRAPHIC APPARATUS, METHOD FOR POSITIONING AND DEVICE MANUFACTURING METHOD | December 2023 | February 2025 | Allow | 14 | 2 | 0 | No | No |
| 18398980 | EUV LIGHT GENERATION APPARATUS AND ELECTRONIC DEVICE MANUFACTURING METHOD | December 2023 | December 2025 | Allow | 23 | 1 | 0 | No | No |
| 18572449 | LITHOGRAPHIC APPARATUS, SUBSTRATE TABLE, AND MANUFACTURING METHOD | December 2023 | October 2025 | Allow | 22 | 1 | 0 | No | No |
| 18538343 | IMPRINT DEVICE, IMPRINT METHOD, AND ARTICLE MANUFACTURING METHOD | December 2023 | November 2025 | Allow | 23 | 1 | 0 | Yes | No |
| 18529068 | APPARATUS AND METHOD FOR REMOVING A SINGLE PARTICULATE FROM A SUBSTRATE | December 2023 | October 2025 | Allow | 22 | 2 | 0 | No | No |
| 18523614 | OPEN-LOOP DISTANCE ADJUSTMENT FOR A COORDINATE MEASURING MACHINE | November 2023 | November 2025 | Allow | 23 | 1 | 0 | No | No |
| 18512298 | OPTICAL APPARATUS, METHOD FOR SETTING A TARGET DEFORMATION, AND LITHOGRAPHY SYSTEM | November 2023 | December 2025 | Allow | 25 | 1 | 0 | No | No |
| 18481030 | DETERMINATION METHOD, DETERMINATION APPARATUS, INFORMATION PROCESSING METHOD, STORAGE MEDIUM, INFORMATION PROCESSING APPARATUS, LITHOGRAPHIC APPARATUS, AND METHOD FOR MANUFACTURING ARTICLE | October 2023 | September 2025 | Allow | 24 | 1 | 0 | No | No |
| 18450457 | DETERMINING APPARATUS, PATTERN FORMING APPARATUS, AND METHOD FOR MANUFACTURING ARTICLE | August 2023 | December 2025 | Allow | 28 | 2 | 0 | Yes | No |
| 18447510 | CHAMBER DEVICE, GAS LASER DEVICE, AND ELECTRONIC DEVICE MANUFACTURING METHOD | August 2023 | April 2025 | Allow | 20 | 0 | 0 | No | No |
| 18362135 | SEMICONDUCTOR PROCESSING TOOL AND METHODS OF OPERATION | July 2023 | July 2024 | Allow | 12 | 1 | 0 | No | No |
| 18227865 | MULTI-COMPONENT KERNELS FOR VECTOR OPTICAL IMAGE SIMULATION | July 2023 | July 2024 | Allow | 12 | 1 | 0 | No | No |
| 18361254 | SYSTEM AND METHOD FOR PERFORMING EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY PROCESSES | July 2023 | August 2024 | Allow | 12 | 1 | 0 | No | No |
| 18269387 | VACUUM SHEET BOND FIXTURING AND FLEXIBLE BURL APPLICATIONS FOR SUBSTRATE TABLES | June 2023 | October 2025 | Allow | 28 | 2 | 0 | Yes | No |
| 18210548 | MITIGATING LONG-TERM ENERGY DECAY OF LASER DEVICES | June 2023 | July 2024 | Allow | 13 | 1 | 0 | No | No |
| 18207642 | ETCH BIAS CHARACTERIZATION AND METHOD OF USING THE SAME | June 2023 | July 2025 | Allow | 25 | 2 | 0 | No | No |
| 18328637 | LITHOGRAPHY SYSTEM AND METHODS | June 2023 | July 2025 | Allow | 26 | 1 | 0 | No | No |
| 18324244 | CONTROL APPARATUS, SYSTEM, LITHOGRAPHY APPARATUS, ARTICLE MANUFACTURING METHOD, CONTROL METHOD, AND NON-TRANSITORY STORAGE MEDIUM | May 2023 | August 2025 | Allow | 27 | 1 | 0 | Yes | No |
| 18324889 | SYSTEM AND METHOD FOR DETECTING DEBRIS IN A PHOTOLITHOGRAPHY SYSTEM | May 2023 | June 2024 | Allow | 13 | 1 | 0 | No | No |
| 18321799 | INNER POD HOLDING DEVICE CONDUCIVE TO REDUCING DUST CONTAMINATION AND OPTICAL INSPECTION APPARATUS FOR INNER POD | May 2023 | March 2025 | Allow | 22 | 1 | 0 | No | No |
| 18320223 | METHOD FOR OPTIMIZING LIGHT SOURCE IN INTEGRATED CIRCUIT MANUFACTURING AND ELECTRONIC DEVICE | May 2023 | May 2025 | Allow | 24 | 1 | 0 | No | No |
| 18253581 | A SYSTEM AND METHOD FOR PERFORMING ALIGNMENT AND OVERLAY MEASUREMENT THROUGH AN OPAQUE LAYER | May 2023 | September 2025 | Allow | 28 | 1 | 0 | No | No |
| 18318508 | FIELD FACET SYSTEM AND LITHOGRAPHY APPARATUS | May 2023 | July 2025 | Allow | 26 | 2 | 0 | Yes | No |
| 18197393 | SYSTEM AND METHOD FOR DYNAMICALLY CONTROLLING TEMPERATURE OF THERMOSTATIC RETICLES | May 2023 | October 2024 | Allow | 17 | 2 | 0 | No | No |
| 18315271 | Support Structure for Vehicle ADAS Calibration and Wheel Alignment Measurement System | May 2023 | July 2024 | Allow | 14 | 1 | 0 | No | No |
| 18314728 | SYSTEM AND METHOD FOR CLEANING AN EUV MASK | May 2023 | June 2024 | Allow | 13 | 1 | 0 | No | No |
| 18311795 | LITHOGRAPHY CONTAMINATION CONTROL | May 2023 | April 2024 | Allow | 11 | 1 | 0 | No | No |
| 18296418 | CALIBRATION METHOD, DETECTION SYSTEM, EXPOSURE APPARATUS, ARTICLE MANUFACTURING METHOD, AND NON-TRANSITORY COMPUTER-READABLE STORAGE MEDIUM | April 2023 | June 2025 | Allow | 27 | 1 | 0 | No | No |
| 18126880 | HIGH THROUGHPUT AND HIGH POSITION ACCURATE METHOD FOR PARTICLE INSPECTION OF MASK PODS | March 2023 | February 2024 | Allow | 11 | 1 | 0 | No | No |
| 18124350 | IMPRINT LITHOGRAPHY | March 2023 | July 2024 | Allow | 16 | 2 | 0 | No | No |
| 18185407 | PHOTOMASK INSPECTION METHOD AND APPARATUS THEREOF | March 2023 | April 2024 | Allow | 13 | 1 | 0 | No | No |
| 18173905 | METHOD FOR DETERMINING THE POSITION OF A PART IN AN ORTHONORMAL FRAME OF REFERENCE BASED ON A STRUCTURE OF A NUMERICALLY CONTROLLED MACHINE TOOL | February 2023 | February 2025 | Allow | 24 | 1 | 0 | Yes | No |
| 18109183 | METHOD AND APPARATUS FOR IMPROVING CRITICAL DIMENSION VARIATION | February 2023 | January 2024 | Allow | 11 | 1 | 0 | No | No |
| 18166990 | DETECTION METHOD, DETECTION APPARATUS, LITHOGRAPHY APPARATUS, AND ARTICLE MANUFACTURING METHOD | February 2023 | April 2024 | Allow | 14 | 2 | 0 | No | No |
| 18164835 | TARGET DEBRIS COLLECTION DEVICE AND EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS INCLUDING THE SAME | February 2023 | August 2023 | Allow | 6 | 1 | 0 | No | No |
| 18161433 | ADVANCED LOAD PORT FOR PHOTOLITHOGRAPHY MASK INSPECTION TOOL | January 2023 | November 2023 | Allow | 9 | 1 | 0 | No | No |
| 18017999 | POSITION MEASURING METHOD AND POSITION MEASURING DEVICE | January 2023 | December 2024 | Allow | 23 | 1 | 0 | No | No |
| 18159347 | METHOD OF DETERMINING POSITION OF MARK, LITHOGRAPHY METHOD, EXPOSURE APPARATUS, AND ARTICLE MANUFACTURING METHOD | January 2023 | May 2024 | Allow | 16 | 1 | 0 | No | No |
| 18017365 | LITHOGRAPHIC APPARATUS AND METHODS FOR MULTI-EXPOSURE OF A SUBSTRATE | January 2023 | August 2025 | Abandon | 31 | 2 | 0 | No | No |
| 18088364 | EXTREME ULTRAVIOLET LITHOGRAPHY DEVICE AND METHOD OF OPERATING EXTREME ULTRAVIOLET LITHOGRAPHY DEVICE | December 2022 | December 2023 | Allow | 12 | 1 | 0 | Yes | No |
| 18011337 | DYNAMIC ILLUMINATION INSPECTION TUNNEL | December 2022 | October 2025 | Abandon | 34 | 2 | 0 | No | No |
| 18067994 | CONTROL APPARATUS, LITHOGRAPHY APPARATUS, AND ARTICLE MANUFACTURING METHOD | December 2022 | March 2025 | Allow | 27 | 1 | 0 | No | No |
| 18002258 | LITHOGRAPHIC APPARATUS, METROLOGY SYSTEMS, AND METHODS THEREOF | December 2022 | August 2025 | Abandon | 32 | 2 | 0 | No | No |
| 18080109 | METHOD FOR PRODUCING A MIRROR OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS | December 2022 | June 2024 | Allow | 18 | 2 | 0 | No | No |
| 17994472 | MIRROR, IN PARTICULAR FOR MICROLITHOGRAPHY | November 2022 | December 2024 | Allow | 25 | 1 | 0 | No | No |
| 18000087 | LITHOGRAPHIC APPARATUS, MULTI-WAVELENGTH PHASE-MODULATED SCANNING METROLOGY SYSTEM AND METHOD | November 2022 | January 2026 | Allow | 37 | 2 | 0 | Yes | No |
| 17991418 | TEMPERATURE COMPENSATION FOR LIQUID LENS | November 2022 | December 2025 | Allow | 37 | 3 | 0 | No | No |
| 17989477 | METHOD OF ASSEMBLING A FACET MIRROR OF AN OPTICAL SYSTEM | November 2022 | July 2023 | Allow | 8 | 1 | 0 | No | No |
| 17924191 | Method for Manufacturing Separator for Electrical Storage Device | November 2022 | December 2025 | Allow | 37 | 2 | 0 | No | No |
| 17980468 | SIMULTANEOUS BACK AND/OR FRONT AND/OR BULK DEFECT DETECTION | November 2022 | March 2025 | Allow | 28 | 2 | 0 | Yes | No |
| 18052129 | EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS AND ELECTRONIC DEVICE MANUFACTURING METHOD | November 2022 | November 2023 | Allow | 12 | 1 | 0 | No | No |
| 17973645 | METHOD FOR MEASURING A SUBSTRATE FOR SEMICONDUCTOR LITHOGRAPHY | October 2022 | September 2023 | Allow | 11 | 1 | 0 | No | No |
| 17974058 | OPTO-ELECTRONIC ENCODER WITH A BALL LENS | October 2022 | January 2026 | Allow | 39 | 3 | 0 | No | No |
| 17971103 | SPECTRAL FEATURE SELECTION AND PULSE TIMING CONTROL OF A PULSED LIGHT BEAM | October 2022 | June 2023 | Allow | 8 | 1 | 0 | No | No |
| 17916730 | DIFFERENTIAL MEASUREMENT SYSTEM | October 2022 | January 2025 | Allow | 27 | 2 | 0 | Yes | No |
| 17935720 | ILLUMINATION APPARATUS, MEASUREMENT APPARATUS, SUBSTRATE PROCESSING APPARATUS, AND METHOD FOR MANUFACTURING ARTICLE | September 2022 | October 2023 | Allow | 12 | 2 | 0 | Yes | No |
| 17950635 | DEVICE FOR DETECTING A TEMPERATURE, INSTALLATION FOR PRODUCING AN OPTICAL ELEMENT AND METHOD FOR PRODUCING AN OPTICAL ELEMENT | September 2022 | February 2025 | Allow | 29 | 2 | 0 | Yes | No |
| 17933968 | ALIGNMENT-OVERLAY MARK AND METHOD USING THE SAME | September 2022 | January 2025 | Allow | 28 | 4 | 0 | Yes | No |
| 17939293 | APPARATUS FOR REMOVING RESIDUE OF EUV LIGHT SOURCE VESSEL | September 2022 | July 2023 | Allow | 10 | 1 | 0 | Yes | No |
| 17909348 | END-OF-LIFE MONITORING OF DYNAMIC GAS LOCK MEMBRANES AND PUPIL FACET MIRRORS AND DETECTION OF MEMBRANE RUPTURE IN LITHOGRAPHIC APPARATUSES | September 2022 | July 2024 | Allow | 22 | 1 | 0 | No | No |
| 17899496 | OPTICAL INSPECTION APPARATUS, PROCESSING DEVICE, OPTICAL INSPECTION METHOD, AND NON-TRANSITORY STORAGE MEDIUM STORING OPTICAL INSPECTION PROGRAM | August 2022 | December 2024 | Allow | 27 | 1 | 0 | No | No |
| 17890605 | Position Detection Device | August 2022 | June 2025 | Abandon | 34 | 2 | 0 | No | No |
| 17819904 | ILLUMINATION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND ARTICLE MANUFACTURING METHOD | August 2022 | October 2024 | Abandon | 26 | 3 | 0 | Yes | No |
| 17885607 | DRIVING APPARATUS, EXPOSURE APPARATUS, AND ARTICLE MANUFACTURING METHOD | August 2022 | August 2024 | Allow | 24 | 2 | 0 | Yes | No |
| 17880700 | OPTICAL PROXIMITY CORRECTION DEVICE AND METHOD | August 2022 | January 2024 | Allow | 18 | 2 | 0 | No | No |
| 17815801 | PROJECTION EXPOSURE APPARATUS WITH A THERMAL MANIPULATOR | July 2022 | July 2024 | Abandon | 23 | 2 | 0 | Yes | No |
| 17874317 | GAMMA RAY GENERATOR AND METHOD OF GENERATING GAMMA RAY | July 2022 | February 2023 | Allow | 7 | 1 | 0 | No | No |
| 17873139 | MULTI-COMPONENT KERNELS FOR VECTOR OPTICAL IMAGE SIMULATION | July 2022 | May 2023 | Allow | 10 | 1 | 0 | No | No |
| 17795139 | DEVICE FOR DETECTING SURFACE DEFECTS IN AN OBJECT | July 2022 | January 2025 | Abandon | 29 | 1 | 0 | No | No |
| 17867318 | SYSTEM AND METHOD FOR PERFORMING EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY PROCESSES | July 2022 | May 2023 | Allow | 10 | 1 | 0 | No | No |
| 17864874 | DETECTION DEVICE AND DETECTION METHOD | July 2022 | May 2025 | Allow | 34 | 2 | 0 | No | No |
| 17792667 | DATA INSPECTION FOR DIGITAL LITHOGRAPHY FOR HVM USING OFFLINE AND INLINE APPROACH | July 2022 | October 2023 | Allow | 15 | 1 | 0 | Yes | No |
| 17863216 | IMAGING OVERLAY WITH MUTUALLY COHERENT OBLIQUE ILLUMINATION | July 2022 | March 2024 | Allow | 20 | 2 | 0 | No | No |
| 17861510 | PROCESSING APPARATUS AND ARTICLE MANUFACTURING METHOD | July 2022 | July 2024 | Allow | 25 | 3 | 0 | No | No |
| 17809154 | TEMPERATURE CONTROL APPARATUS AND TEMPERATURE CONTROL METHOD | June 2022 | June 2024 | Abandon | 24 | 2 | 0 | No | No |
| 17847477 | EUV COLLECTOR INSPECTION APPARATUS AND INSPECTION METHOD | June 2022 | August 2025 | Allow | 37 | 1 | 0 | Yes | No |
| 17846294 | METHOD FOR MANUFACTURING SEMICONDUCTOR STRUCTURE | June 2022 | May 2023 | Allow | 11 | 1 | 0 | No | No |
| 17784951 | COLLECTOR FLOW RING | June 2022 | April 2023 | Allow | 10 | 0 | 0 | No | No |
| 17831479 | METHOD AND APPARATUS FOR TREATING SUBSTRATE, AND TEMPERATURE CONTROL METHOD | June 2022 | August 2025 | Allow | 39 | 1 | 0 | No | No |
| 17782622 | OVERLAY MEASUREMENT SYSTEM USING LOCK-IN AMPLIFIER TECHNIQUE | June 2022 | September 2024 | Allow | 27 | 2 | 0 | Yes | No |
| 17780735 | SHAPE RECONSTRUCTION METHOD AND IMAGE MEASUREMENT DEVICE | May 2022 | April 2025 | Allow | 35 | 2 | 0 | Yes | No |
| 17778447 | VISUAL INSPECTION APPARATUS AND SYSTEM ASSOCIATED THEREWITH | May 2022 | November 2025 | Allow | 41 | 3 | 0 | No | No |
| 17662908 | SEMICONDUCTOR PROCESSING TOOL AND METHODS OF OPERATION | May 2022 | June 2023 | Allow | 14 | 2 | 0 | No | No |
| 17737610 | LIGHT SOURCE APPARATUS, OPTICAL APPARATUS, EXPOSURE APPARATUS, DEVICE MANUFACTURING METHOD, ILLUMINATING METHOD, EXPOSURE METHOD, AND METHOD FOR MANUFACTURING OPTICAL APPARATUS | May 2022 | November 2023 | Allow | 18 | 2 | 0 | No | No |
This analysis examines appeal outcomes and the strategic value of filing appeals for examiner RIDDLE, CHRISTINA A.
With a 50.0% reversal rate, the PTAB reverses the examiner's rejections in a meaningful percentage of cases. This reversal rate is in the top 25% across the USPTO, indicating that appeals are more successful here than in most other areas.
Filing a Notice of Appeal can sometimes lead to allowance even before the appeal is fully briefed or decided by the PTAB. This occurs when the examiner or their supervisor reconsiders the rejection during the mandatory appeal conference (MPEP § 1207.01) after the appeal is filed.
In this dataset, 28.6% of applications that filed an appeal were subsequently allowed. This appeal filing benefit rate is below the USPTO average, suggesting that filing an appeal has limited effectiveness in prompting favorable reconsideration.
✓ Appeals to PTAB show good success rates. If you have a strong case on the merits, consider fully prosecuting the appeal to a Board decision.
⚠ Filing a Notice of Appeal shows limited benefit. Consider other strategies like interviews or amendments before appealing.
Examiner RIDDLE, CHRISTINA A works in Art Unit 2882 and has examined 841 patent applications in our dataset. With an allowance rate of 82.5%, this examiner has an above-average tendency to allow applications. Applications typically reach final disposition in approximately 33 months.
Examiner RIDDLE, CHRISTINA A's allowance rate of 82.5% places them in the 55% percentile among all USPTO examiners. This examiner has an above-average tendency to allow applications.
On average, applications examined by RIDDLE, CHRISTINA A receive 2.01 office actions before reaching final disposition. This places the examiner in the 52% percentile for office actions issued. This examiner issues a slightly above-average number of office actions.
The median time to disposition (half-life) for applications examined by RIDDLE, CHRISTINA A is 33 months. This places the examiner in the 48% percentile for prosecution speed. Prosecution timelines are slightly slower than average with this examiner.
Conducting an examiner interview provides a +14.8% benefit to allowance rate for applications examined by RIDDLE, CHRISTINA A. This interview benefit is in the 54% percentile among all examiners. Recommendation: Interviews provide an above-average benefit with this examiner and are worth considering.
When applicants file an RCE with this examiner, 27.2% of applications are subsequently allowed. This success rate is in the 47% percentile among all examiners. Strategic Insight: RCEs show below-average effectiveness with this examiner. Carefully evaluate whether an RCE or continuation is the better strategy.
This examiner enters after-final amendments leading to allowance in 36.6% of cases where such amendments are filed. This entry rate is in the 55% percentile among all examiners. Strategic Recommendation: This examiner shows above-average receptiveness to after-final amendments. If your amendments clearly overcome the rejections and do not raise new issues, consider filing after-final amendments before resorting to an RCE.
When applicants request a pre-appeal conference (PAC) with this examiner, 40.0% result in withdrawal of the rejection or reopening of prosecution. This success rate is in the 37% percentile among all examiners. Note: Pre-appeal conferences show below-average success with this examiner. Consider whether your arguments are strong enough to warrant a PAC request.
This examiner withdraws rejections or reopens prosecution in 81.8% of appeals filed. This is in the 75% percentile among all examiners. Of these withdrawals, 77.8% occur early in the appeal process (after Notice of Appeal but before Appeal Brief). Strategic Insight: This examiner shows above-average willingness to reconsider rejections during appeals. The mandatory appeal conference (MPEP § 1207.01) provides an opportunity for reconsideration.
When applicants file petitions regarding this examiner's actions, 19.2% are granted (fully or in part). This grant rate is in the 10% percentile among all examiners. Strategic Note: Petitions are rarely granted regarding this examiner's actions compared to other examiners. Ensure you have a strong procedural basis before filing a petition, as the Technology Center Director typically upholds this examiner's decisions.
Examiner's Amendments: This examiner makes examiner's amendments in 2.0% of allowed cases (in the 75% percentile). This examiner makes examiner's amendments more often than average to place applications in condition for allowance (MPEP § 1302.04).
Quayle Actions: This examiner issues Ex Parte Quayle actions in 6.6% of allowed cases (in the 84% percentile). Per MPEP § 714.14, a Quayle action indicates that all claims are allowable but formal matters remain. This examiner frequently uses Quayle actions compared to other examiners, which is a positive indicator that once substantive issues are resolved, allowance follows quickly.
Based on the statistical analysis of this examiner's prosecution patterns, here are tailored strategic recommendations:
Not Legal Advice: The information provided in this report is for informational purposes only and does not constitute legal advice. You should consult with a qualified patent attorney or agent for advice specific to your situation.
No Guarantees: We do not provide any guarantees as to the accuracy, completeness, or timeliness of the statistics presented above. Patent prosecution statistics are derived from publicly available USPTO data and are subject to data quality limitations, processing errors, and changes in USPTO practices over time.
Limitation of Liability: Under no circumstances will IronCrow AI be liable for any outcome, decision, or action resulting from your reliance on the statistics, analysis, or recommendations presented in this report. Past prosecution patterns do not guarantee future results.
Use at Your Own Risk: While we strive to provide accurate and useful prosecution statistics, you should independently verify any information that is material to your prosecution strategy and use your professional judgment in all patent prosecution matters.