Detailed information about the 100 most recent patent applications.
| Application Number | Title | Filing Date | Disposal Date | Disposition | Time (months) | Office Actions | Restrictions | Interview | Appeal |
|---|---|---|---|---|---|---|---|---|---|
| 19219732 | Lithography Using Spin Isolated Monochromatic Electromagnetic Radiation | May 2025 | November 2025 | Allow | 5 | 1 | 0 | No | No |
| 18851601 | SUBSTRATE WARPAGE DETERMINATION SYSTEM | September 2024 | March 2026 | Allow | 17 | 0 | 0 | No | No |
| 18780548 | ELECTRON PROBE POSITIONING PATTERN, DISPLACEMENT MEASUREMENT METHOD, AND POSITIONING CONTROL METHOD | July 2024 | December 2025 | Allow | 17 | 0 | 0 | No | No |
| 18673341 | EXHAUST DISCHARGING DEVICE WITH TEMPERATURE CONTROL AND HEAT RETENTION MECHANISM FOR PREVENTING PHOTORESIST FROM CRYSTALLIZATION AND ADHERING TO PIPES, AND EXHAUST DISCHARGING METHOD USING THE SAME | May 2024 | February 2026 | Allow | 20 | 0 | 0 | No | No |
| 18656908 | OPTICAL SYSTEM, PROJECTION EXPOSURE SYSTEM AND METHOD | May 2024 | February 2026 | Allow | 21 | 0 | 0 | No | No |
| 18653345 | CHUCK WITH BUFFER PORTION | May 2024 | February 2026 | Allow | 21 | 0 | 0 | No | No |
| 18611440 | DROPLET SPLASH CONTROL FOR EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY | March 2024 | June 2025 | Allow | 14 | 1 | 0 | No | No |
| 17767420 | PHASE MEASUREMENT DEVICE FOR LASER INTERFERENCE PHOTOLITHOGRAPHY SYSTEM, AND METHOD FOR USING SAME | February 2024 | February 2026 | Allow | 46 | 0 | 0 | No | No |
| 18580176 | IMPRINTING APPARATUS | January 2024 | October 2025 | Allow | 21 | 0 | 0 | No | No |
| 18578151 | LITHOGRAPHIC APPARATUS, LOCKING DEVICE, AND METHOD | January 2024 | September 2025 | Allow | 20 | 0 | 0 | No | No |
| 18409132 | SEMICONDUCTOR PROCESSING TOOL AND METHODS OF OPERATION | January 2024 | May 2025 | Allow | 16 | 1 | 0 | No | No |
| 18403945 | SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD, AND DEVICE MANUFACTURING METHOD | January 2024 | January 2026 | Allow | 24 | 1 | 0 | No | No |
| 18401729 | SYSTEM AND METHOD FOR THERMAL MANAGEMENT OF RETICLE IN SEMICONDUCTOR MANUFACTURING | January 2024 | February 2026 | Allow | 26 | 2 | 0 | Yes | No |
| 18575358 | LIGHTING OPTICAL SYSTEM AND EXPOSURE APPARATUS | December 2023 | September 2025 | Allow | 21 | 1 | 0 | No | No |
| 18396821 | MEASUREMENT DEVICE, LITHOGRAPHY SYSTEM AND EXPOSURE APPARATUS, AND CONTROL METHOD, OVERLAY MEASUREMENT METHOD AND DEVICE MANUFACTURING METHOD | December 2023 | November 2025 | Allow | 23 | 1 | 0 | No | No |
| 18394369 | SPATIAL LIGHT MODULATION UNIT AND EXPOSURE APPARATUS | December 2023 | January 2026 | Allow | 25 | 1 | 0 | No | No |
| 18390910 | IMPRINT APPARATUS AND PRODUCT MANUFACTURING METHOD | December 2023 | April 2025 | Allow | 15 | 1 | 0 | No | No |
| 18532977 | IMAGING VIA ZEROTH ORDER SUPPRESSION | December 2023 | January 2026 | Allow | 26 | 3 | 0 | No | No |
| 18563638 | METHOD FOR PRODUCING A NANO-STRUCTURED ELEMENT MADE OF HEXAGONAL BORON NITRIDE AND DEVICE COMPRISING SUCH AN ELEMENT | November 2023 | November 2025 | Allow | 24 | 1 | 0 | No | No |
| 18516648 | IMAGING OPTICAL UNIT | November 2023 | October 2025 | Allow | 23 | 1 | 0 | No | No |
| 18494016 | EXTREME ULTRAVIOLET LIGHT GENERATION CHAMBER DEVICE AND ELECTRONIC DEVICE MANUFACTURING METHOD | October 2023 | June 2025 | Allow | 20 | 0 | 0 | No | No |
| 18286486 | A CLEANING METHOD AND ASSOCIATED ILLUMINATION SOURCE METROLOGY APPARATUS | October 2023 | September 2025 | Allow | 23 | 1 | 0 | No | No |
| 18281921 | CLAMP ELECTRODE MODIFICATION FOR IMPROVED OVERLAY | September 2023 | November 2025 | Allow | 26 | 1 | 0 | No | No |
| 18465357 | OPTICAL SYSTEM FOR A LITHOGRAPHIC PROJECTION EXPOSURE APPARATUS | September 2023 | May 2025 | Allow | 20 | 0 | 0 | Yes | No |
| 18463667 | LITHOGRAPHY APPARATUS AND A METHOD OF MANUFACTURING A DEVICE | September 2023 | November 2024 | Allow | 14 | 2 | 0 | No | No |
| 18463169 | EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS AND ELECTRONIC DEVICE MANUFACTURING METHOD | September 2023 | October 2025 | Allow | 25 | 1 | 0 | No | No |
| 18459523 | WAFER CHUCK INCLUDING SELF-SEALING VACUUM SEAL ASSEMBLIES AND METHODS FOR OPERATING THE SAME | September 2023 | January 2026 | Allow | 29 | 1 | 0 | Yes | No |
| 18455655 | EXTREME ULTRAVIOLET (EUV) RADIATION SOURCE APPARATUS, EUV LITHOGRAPHY SYSTEM, AND METHOD FOR GENERATING EXTREME ULTRAVIOLET RADIATION | August 2023 | February 2026 | Allow | 29 | 1 | 0 | No | No |
| 18449779 | DETECTION DEVICE, DETECTION METHOD, LITHOGRAPHY APPARATUS, AND ARTICLE MANUFACTURING METHOD | August 2023 | May 2025 | Allow | 21 | 1 | 0 | No | No |
| 18276420 | ALIGNMENT METHOD AND ASSOCIATED ALIGNMENT AND LITHOGRAPHIC APPARATUSES | August 2023 | March 2025 | Allow | 19 | 2 | 0 | No | No |
| 18363602 | ULTRAVIOLET LASER APPARATUS AND ELECTRONIC DEVICE MANUFACTURING METHOD | August 2023 | September 2025 | Allow | 26 | 1 | 0 | No | No |
| 18226160 | WIDTH ADJUSTMENT OF EUV RADIATION BEAM | July 2023 | December 2024 | Allow | 17 | 2 | 0 | No | No |
| 18357347 | SEMICONDUCTOR DEVELOPER TOOL AND METHODS OF OPERATION | July 2023 | October 2024 | Allow | 15 | 1 | 0 | No | No |
| 18347129 | OVERLAY CORRECTION METHOD, AND EXPOSURE METHOD AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD INCLUDING OVERLAY CORRECTION METHOD | July 2023 | November 2025 | Allow | 28 | 1 | 0 | Yes | No |
| 18342377 | METHOD FOR HEATING AN OPTICAL ELEMENT IN A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS AND OPTICAL SYSTEM | June 2023 | June 2025 | Allow | 23 | 1 | 0 | No | No |
| 18339761 | SUBSTRATE TREATING APPARATUS | June 2023 | June 2025 | Allow | 24 | 1 | 0 | Yes | No |
| 18211950 | Rotary Substrate Support for Aligning a Substrate | June 2023 | June 2025 | Allow | 24 | 1 | 0 | No | No |
| 18333290 | METHODS OF GREYTONE IMPRINT LITHOGRAPHY TO FABRICATE OPTICAL DEVICES | June 2023 | June 2024 | Allow | 12 | 1 | 0 | No | No |
| 18255543 | INTENSITY ORDER DIFFERENCE BASED METROLOGY SYSTEM, LITHOGRAPHIC APPARATUS, AND METHODS THEREOF | June 2023 | November 2025 | Allow | 29 | 2 | 0 | No | No |
| 18326354 | METHOD FOR PERFORMING LITHOGRAPHY PROCESS, LIGHT SOURCE, AND EUV LITHOGRAPHY SYSTEM | May 2023 | October 2024 | Allow | 17 | 2 | 0 | No | No |
| 18322161 | SUBSTRATE PROCESSING APPARATUS | May 2023 | January 2025 | Allow | 20 | 0 | 0 | No | No |
| 18253734 | METROLOGY APPARATUS BASED ON HIGH HARMONIC GENERATION AND ASSOCIATED METHOD | May 2023 | June 2025 | Allow | 25 | 1 | 0 | No | No |
| 18037957 | HIGH ACCURACY TEMPERATURE-COMPENSATED PIEZORESISTIVE POSITION SENSING SYSTEM | May 2023 | February 2026 | Allow | 33 | 0 | 0 | No | No |
| 18317260 | DETECTION APPARATUS, LITHOGRAPHY APPARATUS, AND ARTICLE MANUFACTURING METHOD | May 2023 | July 2025 | Allow | 26 | 1 | 0 | No | No |
| 18035008 | METROLOGY METHOD AND ASSOCIATED METROLOGY AND LITHOGRAPHIC APPARATUSES | May 2023 | September 2024 | Allow | 17 | 0 | 0 | No | No |
| 18308700 | RETICLE CLEANING DEVICE AND METHOD OF USE | April 2023 | September 2024 | Allow | 16 | 2 | 0 | Yes | No |
| 18306995 | LITHOGRAPHY SYSTEM AND METHOD OF DETECTING FLUID LEAKAGE IN LIQUID STORAGE TANK OF THE SAME | April 2023 | January 2025 | Allow | 20 | 0 | 0 | No | No |
| 18138383 | METHOD FOR DETERMINING STOCHASTIC VARIATION ASSOCIATED WITH DESIRED PATTERN | April 2023 | May 2024 | Allow | 13 | 1 | 0 | No | No |
| 18304778 | PLASMA POSITION CONTROL FOR EXTREME ULTRAVIOLET LITHOGRAPHY LIGHT SOURCES | April 2023 | June 2024 | Allow | 14 | 1 | 0 | No | No |
| 18136789 | EUV PELLICLE WITH STRUCTURED VENTILATION FRAME | April 2023 | January 2026 | Allow | 33 | 4 | 1 | Yes | No |
| 18300094 | LITHOGRAPHIC APPARATUS AND METHOD | April 2023 | September 2024 | Allow | 17 | 2 | 0 | No | No |
| 18129169 | METHOD FOR ADJUSTING A TARGET FEATURE IN A MODEL OF A PATTERNING PROCESS BASED ON LOCAL ELECTRIC FIELDS | March 2023 | September 2024 | Allow | 17 | 2 | 0 | No | No |
| 18189564 | Device and Method for Positioning a Shadow Mask | March 2023 | October 2024 | Allow | 19 | 1 | 0 | No | No |
| 18026803 | EXTREME ULTRAVIOLET LIGHT SOURCE DEVICE AND PROTECTION METHOD FOR RECEIVING PLATE MEMBER | March 2023 | March 2025 | Allow | 24 | 1 | 0 | No | No |
| 18122655 | COMPUTATIONAL METROLOGY BASED SAMPLING SCHEME | March 2023 | March 2024 | Allow | 12 | 1 | 0 | No | No |
| 18026115 | METROLOGY TOOL WITH POSITION CONTROL OF PROJECTION SYSTEM | March 2023 | April 2025 | Allow | 25 | 1 | 0 | No | No |
| 18120520 | MASK ORIENTATION | March 2023 | January 2024 | Allow | 10 | 2 | 0 | No | No |
| 18180504 | LASER APPARATUS AND METHOD FOR MANUFACTURING ELECTRONIC DEVICES | March 2023 | September 2025 | Allow | 31 | 0 | 0 | No | No |
| 18118695 | DETERMINING PATTERN RANKING BASED ON MEASUREMENT FEEDBACK FROM PRINTED SUBSTRATE | March 2023 | March 2024 | Allow | 13 | 1 | 0 | No | No |
| 18177088 | LASER DEVICE AND ELECTRONIC DEVICE MANUFACTURING METHOD | March 2023 | January 2025 | Allow | 22 | 0 | 0 | No | No |
| 18172212 | SYSTEMS, DEVICES, AND METHODS FOR GENERATING DROP PATTERNS | February 2023 | December 2024 | Allow | 22 | 0 | 0 | No | No |
| 18170928 | FIELD FACET FOR A FIELD FACET MIRROR OF A PROJECTION EXPOSURE SYSTEM | February 2023 | April 2025 | Allow | 26 | 1 | 0 | No | No |
| 18110746 | SCANNING OVERLAY METROLOGY WITH HIGH SIGNAL TO NOISE RATIO | February 2023 | October 2024 | Allow | 20 | 0 | 0 | No | No |
| 18167611 | LINE NARROWING MODULE, GAS LASER APPARATUS, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICES | February 2023 | November 2024 | Allow | 22 | 0 | 0 | No | No |
| 18107518 | LITHOGRAPHY FILM STACK AND LITHOGRAPHY METHOD | February 2023 | November 2024 | Allow | 21 | 0 | 0 | No | No |
| 18165288 | ELECTRONIC DEVICE MANUFACTURING METHOD | February 2023 | June 2025 | Allow | 28 | 0 | 0 | No | No |
| 18165063 | EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM AND ELECTRONIC DEVICE MANUFACTURING METHOD | February 2023 | December 2025 | Abandon | 34 | 2 | 0 | Yes | No |
| 18163689 | LINE NARROWING GAS LASER DEVICE AND ELECTRONIC DEVICE MANUFACTURING METHOD | February 2023 | September 2024 | Allow | 20 | 0 | 0 | No | No |
| 18016226 | A METHOD AND APPARATUS FOR CALCULATING A SPATIAL MAP ASSOCIATED WITH A COMPONENT | January 2023 | March 2025 | Allow | 26 | 1 | 0 | No | No |
| 18016225 | SPECTROMETRIC METROLOGY SYSTEMS BASED ON MULTIMODE INTERFERENCE AND LITHOGRAPHIC APPARATUS | January 2023 | July 2024 | Allow | 18 | 0 | 0 | No | No |
| 18090873 | SUBSTRATE SUPPORT, LITHOGRAPHIC APPARATUS AND LOADING METHOD | December 2022 | March 2024 | Allow | 14 | 2 | 0 | No | No |
| 18089940 | WAVEFRONT OPTIMIZATION FOR TUNING SCANNER BASED ON PERFORMANCE MATCHING | December 2022 | January 2024 | Allow | 12 | 1 | 0 | No | No |
| 18068674 | OPTICAL SYSTEM WITH AN APERTURE STOP | December 2022 | June 2024 | Allow | 18 | 1 | 0 | Yes | No |
| 18066411 | Mask Cleaning | December 2022 | October 2023 | Allow | 10 | 1 | 0 | No | No |
| 18066771 | CLEANING METHOD AND APPARATUS | December 2022 | October 2023 | Allow | 10 | 1 | 0 | No | No |
| 18010637 | METHOD FOR THERMO-MECHANICAL CONTROL OF A HEAT SENSITIVE ELEMENT AND DEVICE FOR USE IN A LITHOGRAPHIC PRODUCTION PROCESS | December 2022 | April 2025 | Allow | 28 | 2 | 0 | No | No |
| 18082178 | IMPRINT METHOD, IMPRINT APPARATUS, AND ARTICLE MANUFACTURING METHOD | December 2022 | August 2024 | Allow | 20 | 1 | 0 | Yes | No |
| 18062080 | MEASUREMENT APPARATUS, LITHOGRAPHY APPARATUS, AND ARTICLE MANUFACTURING METHOD | December 2022 | April 2025 | Allow | 28 | 1 | 0 | No | No |
| 18062117 | MOTION CONTROL APPARATUS, LITHOGRAPHY APPARATUS, PLANARIZATION APPARATUS, PROCESSING APPARATUS, AND ARTICLE MANUFACTURING METHOD | December 2022 | September 2024 | Allow | 21 | 2 | 0 | Yes | No |
| 17927866 | ABERRATION IMPACT SYSTEMS, MODELS, AND MANUFACTURING PROCESSES | November 2022 | September 2024 | Allow | 22 | 1 | 0 | No | No |
| 17992034 | METROLOGY SYSTEM FOR EXAMINING OBJECTS WITH EUV MEASUREMENT LIGHT | November 2022 | June 2023 | Allow | 7 | 0 | 0 | No | No |
| 17923913 | A SUBSTRATE COMPRISING A TARGET ARRANGEMENT, AND ASSOCIATED AT LEAST ONE PATTERNING DEVICE, LITHOGRAPHIC METHOD AND METROLOGY METHOD | November 2022 | November 2024 | Allow | 24 | 2 | 0 | Yes | No |
| 17983070 | DAMPING ARRANGEMENT FOR VIBRATION DAMPING OF AN ELEMENT IN AN OPTICAL SYSTEM | November 2022 | March 2025 | Allow | 28 | 1 | 0 | No | No |
| 18048748 | GRAY TONE UNIFORMITY CONTROL OVER SUBSTRATE TOPOGRAPHY | October 2022 | June 2024 | Allow | 20 | 0 | 0 | No | No |
| 17961575 | OVERLAY TARGET AND OVERLAY METHOD | October 2022 | July 2025 | Allow | 34 | 2 | 0 | No | No |
| 17960414 | FACET ASSEMBLY FOR A FACET MIRROR | October 2022 | March 2025 | Allow | 29 | 2 | 0 | No | No |
| 17995355 | PRE-EXPOSURE PHOTORESIST CURING TO ENHANCE EUV LITHOGRAPHIC PERFORMANCE | October 2022 | April 2025 | Allow | 30 | 1 | 0 | No | No |
| 17916746 | METHOD OF DETERMINING A SAMPLING SCHEME, ASSOCIATED APPARATUS AND COMPUTER PROGRAM | October 2022 | January 2026 | Allow | 40 | 1 | 0 | No | No |
| 17953751 | METHOD FOR CONTROLLING A LITHOGRAPHIC APPARATUS AND ASSOCIATED APPARATUSES | September 2022 | May 2024 | Allow | 20 | 2 | 0 | No | No |
| 17952380 | METHOD OF OBTAINING ARRAY OF PLURALITY OF SHOT REGIONS ON SUBSTRATE, EXPOSURE METHOD, EXPOSURE APPARATUS, METHOD OF MANUFACTURING ARTICLE, NON-TRANSITORY COMPUTER-READABLE STORAGE MEDIUM, AND INFORMATION PROCESSING APPARATUS | September 2022 | January 2024 | Allow | 15 | 1 | 0 | Yes | No |
| 17952119 | FLUID HANDLING STRUCTURE FOR LITHOGRAPHIC APPARATUS | September 2022 | September 2023 | Allow | 12 | 2 | 0 | No | No |
| 17912996 | CONDUIT SYSTEM, RADIATION SOURCE, LITHOGRAPHIC APPARATUS, AND METHODS THEREOF | September 2022 | February 2025 | Allow | 29 | 1 | 0 | No | No |
| 17910454 | METHOD FOR DETERMINING AN INSPECTION STRATEGY FOR A GROUP OF SUBSTRATES IN A SEMICONDUCTOR MANUFACTURING PROCESS | September 2022 | July 2023 | Allow | 10 | 1 | 0 | No | No |
| 17802841 | OBJECT HOLDER, TOOL AND METHOD OF MANUFACTURING AN OBJECT HOLDER | August 2022 | August 2024 | Allow | 24 | 2 | 0 | No | No |
| 17895069 | HIGH-PERFORMANCE EUV MICROSCOPE DEVICE WITH FREE-FORM ILLUMINATION SYSTEM STRUCTURE HAVING ELLIPTICAL MIRROR | August 2022 | March 2025 | Allow | 31 | 1 | 0 | No | No |
| 17801381 | METHOD FOR CONTROLLING A MANUFACTURING PROCESS AND ASSOCIATED APPARATUSES | August 2022 | May 2023 | Allow | 9 | 0 | 0 | No | No |
| 17800649 | METHOD AND APPARATUS FOR FORMING A PATTERNED LAYER OF MATERIAL | August 2022 | May 2025 | Allow | 33 | 3 | 0 | No | No |
| 17800346 | METHOD FOR INFERRING A LOCAL UNIFORMITY METRIC | August 2022 | September 2023 | Allow | 13 | 1 | 0 | No | No |
| 17819060 | LINE NARROWED GAS LASER APPARATUS, CONTROL METHOD THEREFOR, ELECTRONIC DEVICE MANUFACTURING METHOD | August 2022 | June 2024 | Allow | 22 | 0 | 0 | No | No |
| 17818916 | LINE NARROWING DEVICE, ELECTRONIC DEVICE MANUFACTURING METHOD | August 2022 | June 2024 | Allow | 22 | 0 | 0 | No | No |
This analysis examines appeal outcomes and the strategic value of filing appeals for examiner PERSAUD, DEORAM.
With a 21.4% reversal rate, the PTAB affirms the examiner's rejections in the vast majority of cases. This reversal rate is below the USPTO average, indicating that appeals face more challenges here than typical.
Filing a Notice of Appeal can sometimes lead to allowance even before the appeal is fully briefed or decided by the PTAB. This occurs when the examiner or their supervisor reconsiders the rejection during the mandatory appeal conference (MPEP § 1207.01) after the appeal is filed.
In this dataset, 31.9% of applications that filed an appeal were subsequently allowed. This appeal filing benefit rate is below the USPTO average, suggesting that filing an appeal has limited effectiveness in prompting favorable reconsideration.
⚠ Appeals to PTAB face challenges. Ensure your case has strong merit before committing to full Board review.
⚠ Filing a Notice of Appeal shows limited benefit. Consider other strategies like interviews or amendments before appealing.
Examiner PERSAUD, DEORAM works in Art Unit 2882 and has examined 672 patent applications in our dataset. With an allowance rate of 76.2%, this examiner has a below-average tendency to allow applications. Applications typically reach final disposition in approximately 32 months.
Examiner PERSAUD, DEORAM's allowance rate of 76.2% places them in the 42% percentile among all USPTO examiners. This examiner has a below-average tendency to allow applications.
On average, applications examined by PERSAUD, DEORAM receive 2.20 office actions before reaching final disposition. This places the examiner in the 60% percentile for office actions issued. This examiner issues a slightly above-average number of office actions.
The median time to disposition (half-life) for applications examined by PERSAUD, DEORAM is 32 months. This places the examiner in the 52% percentile for prosecution speed. Prosecution timelines are slightly faster than average with this examiner.
Conducting an examiner interview provides a +13.6% benefit to allowance rate for applications examined by PERSAUD, DEORAM. This interview benefit is in the 51% percentile among all examiners. Recommendation: Interviews provide an above-average benefit with this examiner and are worth considering.
When applicants file an RCE with this examiner, 29.9% of applications are subsequently allowed. This success rate is in the 58% percentile among all examiners. Strategic Insight: RCEs show above-average effectiveness with this examiner. Consider whether your amendments or new arguments are strong enough to warrant an RCE versus filing a continuation.
This examiner enters after-final amendments leading to allowance in 22.3% of cases where such amendments are filed. This entry rate is in the 29% percentile among all examiners. Strategic Recommendation: This examiner shows below-average receptiveness to after-final amendments. You may need to file an RCE or appeal rather than relying on after-final amendment entry.
When applicants request a pre-appeal conference (PAC) with this examiner, 41.9% result in withdrawal of the rejection or reopening of prosecution. This success rate is in the 39% percentile among all examiners. Note: Pre-appeal conferences show below-average success with this examiner. Consider whether your arguments are strong enough to warrant a PAC request.
This examiner withdraws rejections or reopens prosecution in 78.8% of appeals filed. This is in the 71% percentile among all examiners. Of these withdrawals, 59.6% occur early in the appeal process (after Notice of Appeal but before Appeal Brief). Strategic Insight: This examiner shows above-average willingness to reconsider rejections during appeals. The mandatory appeal conference (MPEP § 1207.01) provides an opportunity for reconsideration.
When applicants file petitions regarding this examiner's actions, 56.8% are granted (fully or in part). This grant rate is in the 59% percentile among all examiners. Strategic Note: Petitions show above-average success regarding this examiner's actions. Petitionable matters include restriction requirements (MPEP § 1002.02(c)(2)) and various procedural issues.
Examiner's Amendments: This examiner makes examiner's amendments in 1.0% of allowed cases (in the 68% percentile). This examiner makes examiner's amendments more often than average to place applications in condition for allowance (MPEP § 1302.04).
Quayle Actions: This examiner issues Ex Parte Quayle actions in 0.0% of allowed cases (in the 33% percentile). This examiner issues Quayle actions less often than average. Allowances may come directly without a separate action for formal matters.
Based on the statistical analysis of this examiner's prosecution patterns, here are tailored strategic recommendations:
Not Legal Advice: The information provided in this report is for informational purposes only and does not constitute legal advice. You should consult with a qualified patent attorney or agent for advice specific to your situation.
No Guarantees: We do not provide any guarantees as to the accuracy, completeness, or timeliness of the statistics presented above. Patent prosecution statistics are derived from publicly available USPTO data and are subject to data quality limitations, processing errors, and changes in USPTO practices over time.
Limitation of Liability: Under no circumstances will IronCrow AI be liable for any outcome, decision, or action resulting from your reliance on the statistics, analysis, or recommendations presented in this report. Past prosecution patterns do not guarantee future results.
Use at Your Own Risk: While we strive to provide accurate and useful prosecution statistics, you should independently verify any information that is material to your prosecution strategy and use your professional judgment in all patent prosecution matters.