Detailed information about the 100 most recent patent applications.
| Application Number | Title | Filing Date | Disposal Date | Disposition | Time (months) | Office Actions | Restrictions | Interview | Appeal |
|---|---|---|---|---|---|---|---|---|---|
| 19180769 | GEOMETRIC LOADING EFFECT CORRECTION FOR LITHOGRAPHY | April 2025 | November 2025 | Allow | 7 | 1 | 0 | Yes | No |
| 19044116 | HEAT TREATMENT APPARATUS AND HEAT TREATMENT METHOD | February 2025 | July 2025 | Allow | 6 | 1 | 0 | Yes | No |
| 18771085 | CYLINDER SCANNER | July 2024 | March 2026 | Allow | 20 | 0 | 0 | No | No |
| 18769032 | ON CHIP SENSOR FOR WAFER OVERLAY MEASUREMENT | July 2024 | March 2026 | Allow | 20 | 0 | 0 | No | No |
| 18724144 | LITHOGRAPHIC APPARATUS, ILLUMINATION SYSTEM, AND CONNECTION SEALING DEVICE WITH PROTECTIVE SHIELD | June 2024 | January 2026 | Allow | 19 | 0 | 0 | No | No |
| 18746751 | LITHOGRAPHY SYSTEM AND METHODS | June 2024 | February 2026 | Allow | 20 | 0 | 0 | No | No |
| 18717684 | METHOD OF REDUCING CYCLIC ERROR EFFECTS IN A LITHOGRAPHIC PROCESS, PROJECTION SYSTEM AND LITHOGRAPHIC APPARATUS COMPRISING A PROJECTION SYSTEM | June 2024 | February 2026 | Allow | 20 | 0 | 0 | No | No |
| 18734904 | CONFIGURING OPTICAL LAYERS IN IMPRINT LITHOGRAPHY PROCESSES | June 2024 | February 2025 | Allow | 8 | 0 | 0 | No | No |
| 18671187 | METHODS AND APPARATUS FOR REDUCING HYDROGEN PERMEATION FROM LITHOGRAPHIC TOOL | May 2024 | June 2025 | Allow | 13 | 1 | 0 | No | No |
| 18710419 | PARTICLE TRANSFER BLOCKING DEVICE AND LITHOGRAPHY DEVICE USING ELECTRON LAYER IN VACUUM SYSTEM | May 2024 | June 2025 | Allow | 13 | 1 | 0 | Yes | No |
| 18650441 | OPTICAL SYSTEM, LITHOGRAPHY APPARATUS AND METHOD | April 2024 | February 2026 | Allow | 22 | 2 | 0 | No | No |
| 18588305 | METHOD FOR IDENTIFICATION OF A NOISE POINT USED FOR LIDAR, AND LIDAR SYSTEM | February 2024 | July 2024 | Allow | 4 | 2 | 0 | Yes | No |
| 18582045 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | February 2024 | September 2024 | Allow | 7 | 0 | 0 | No | No |
| 18440727 | CONTROLLING LIGHT SOURCE WAVELENGTHS FOR SELECTABLE PHASE SHIFTS BETWEEN PIXELS IN DIGITAL LITHOGRAPHY SYSTEMS | February 2024 | March 2025 | Allow | 14 | 1 | 0 | No | No |
| 18426879 | METHOD FOR SELECTIVE EXPOSURE OF WAFER TO CORRECTIVE IRRADIATION AT A PER-DIE LEVEL | January 2024 | October 2025 | Allow | 20 | 1 | 0 | Yes | No |
| 18415411 | ION EXPOSURE METHOD AND APPARATUS | January 2024 | January 2025 | Allow | 12 | 0 | 0 | No | No |
| 18402835 | GAS LASER DEVICE AND ELECTRONIC DEVICE MANUFACTURING METHOD | January 2024 | October 2025 | Allow | 22 | 1 | 0 | No | No |
| 18573025 | SYSTEMS, METHODS, AND DEVICES FOR THERMAL CONDITIONING OF RETICLES IN LITHOGRAPHIC APPARATUSES | December 2023 | November 2025 | Allow | 23 | 2 | 0 | No | No |
| 18524876 | EUV Lithography System With 3D Sensing and Tunning Modules | November 2023 | September 2025 | Allow | 22 | 0 | 0 | No | No |
| 18523620 | DYNAMIC GENERATION OF LAYOUT ADAPTIVE PACKAGING | November 2023 | March 2025 | Allow | 16 | 1 | 0 | No | No |
| 18523198 | IMAGING OPTICAL UNIT | November 2023 | February 2026 | Allow | 27 | 2 | 0 | No | No |
| 18516825 | DETERMINATION METHOD, EXPOSURE METHOD, METHOD OF MANUFACTURING ARTICLE, INFORMATION PROCESSING APPARATUS, AND EXPOSURE APPARATUS | November 2023 | August 2025 | Allow | 21 | 0 | 0 | No | No |
| 18513844 | RETICLE STORAGE CABINET SYSTEM AND METHOD USING THE SAME | November 2023 | January 2026 | Allow | 26 | 1 | 0 | No | No |
| 18513827 | RETICLE LOADING SYSTEM AND METHOD USING THE SAME | November 2023 | December 2025 | Allow | 25 | 1 | 0 | No | No |
| 18562770 | MODULAR WAFER TABLE AND METHODS OF MANUFACTURING THEREOF | November 2023 | December 2025 | Allow | 25 | 1 | 0 | No | No |
| 18388298 | LITHOGRAPHY APPARATUS | November 2023 | May 2025 | Allow | 18 | 0 | 0 | No | No |
| 18504532 | LASER DEVICE, LASER OSCILLATION METHOD, AND ELECTRONIC DEVICE MANUFACTURING METHOD | November 2023 | June 2025 | Allow | 20 | 0 | 0 | No | No |
| 18496629 | EXPOSURE METHOD, EXPOSURE APPARATUS, AND METHOD FOR MANUFACTURING ARTICLE | October 2023 | September 2025 | Allow | 23 | 1 | 0 | Yes | No |
| 18485147 | USE OF ALTERNATING LAYER PATTERNS APPROACH FOR EFFECTIVE OVERLAY METROLOGY IN MULTI-STACK DIE APPLICATIONS | October 2023 | September 2025 | Allow | 24 | 1 | 0 | No | No |
| 18481524 | METHOD OF COMPENSATING WAVELENGTH ERROR INDUCED BY REPETITION RATE DEVIATION | October 2023 | October 2025 | Allow | 24 | 1 | 0 | No | No |
| 18375290 | EXTREME ULTRAVIOLET INNER POD DISTRIBUTED SUPPORT | September 2023 | May 2025 | Allow | 19 | 0 | 0 | No | No |
| 18284580 | A POSITIONING SYSTEM, A LITHOGRAPHIC APPARATUS, A DRIVING FORCE ATTENUATION METHOD, AND A DEVICE MANUFACTURING METHOD | September 2023 | October 2025 | Allow | 25 | 1 | 0 | No | No |
| 18477089 | EXTREME ULTRAVIOLET LIGHT GENERATION CHAMBER DEVICE AND ELECTRONIC DEVICE MANUFACTURING METHOD | September 2023 | October 2025 | Allow | 25 | 1 | 0 | No | No |
| 18552623 | ASYMMETRY EXTENDED GRID MODEL FOR WAFER ALIGNMENT | September 2023 | September 2025 | Allow | 24 | 1 | 0 | No | No |
| 18468438 | MOUNTING FOR A LITHOGRAPHY SYSTEM, AND LITHOGRAPHY SYSTEM | September 2023 | September 2025 | Allow | 24 | 1 | 0 | No | No |
| 18281676 | MAINTENANCE OF MODULES FOR LIGHT SOURCES USED IN SEMICONDUCTOR PHOTOLITHOGRAPHY | September 2023 | April 2025 | Allow | 19 | 0 | 0 | No | No |
| 18279694 | OPERATING A METROLOGY SYSTEM, LITHOGRAPHIC APPARATUS, AND METHODS THEREOF | August 2023 | February 2026 | Allow | 29 | 2 | 0 | No | No |
| 18456639 | IMPRINT APPARATUS, PATTERN FORMING METHOD, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | August 2023 | September 2025 | Allow | 24 | 1 | 0 | No | No |
| 18233920 | EXPOSURE APPARATUS AND METHOD OF MANUFACTURING ARTICLE | August 2023 | October 2024 | Allow | 14 | 1 | 0 | No | No |
| 18231909 | Acoustic Particle Deflection In Lithography Tool | August 2023 | March 2025 | Allow | 20 | 1 | 0 | No | No |
| 18365479 | SYSTEM AND PROJECTION EXPOSURE APPARATUS | August 2023 | October 2025 | Allow | 27 | 2 | 0 | No | No |
| 18358735 | HIGH-SPEED NANOPATTERNING METHOD AND APPARATUS OF TWO-COLOR SUPER-RESOLUTION PHOTOLITHOGRAPHY | July 2023 | May 2025 | Allow | 21 | 1 | 0 | No | No |
| 18357540 | OPTICAL SYSTEM, LITHOGRAPHY APPARATUS AND METHOD | July 2023 | March 2026 | Allow | 31 | 2 | 0 | No | Yes |
| 18273618 | MULTI-CHANNEL LIGHT SOURCE FOR PROJECTION OPTICS HEATING | July 2023 | August 2025 | Allow | 25 | 1 | 0 | No | No |
| 18355918 | SUBSTRATE TREATMENT SYSTEM AND SUBSTRATE TREATMENT METHOD | July 2023 | October 2025 | Allow | 27 | 1 | 0 | No | No |
| 18223496 | NEW DESIGN OF EUV VESSEL PERIMETER FLOW AUTO ADJUSTMENT | July 2023 | August 2024 | Allow | 13 | 1 | 0 | No | No |
| 18351630 | EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS AND ELECTRONIC DEVICE MANUFACTURING METHOD | July 2023 | September 2025 | Allow | 26 | 1 | 0 | No | No |
| 18342635 | MATERIAL MANAGEMENT METHOD AND SYSTEM | June 2023 | April 2025 | Allow | 22 | 1 | 0 | No | No |
| 18339592 | PROJECTION EXPOSURE APPARATUS FOR SEMICONDUCTOR LITHOGRAPHY | June 2023 | April 2025 | Allow | 22 | 1 | 0 | No | No |
| 18337982 | IMMERSION LITHOGRAPHIC SYSTEM | June 2023 | January 2026 | Allow | 31 | 2 | 0 | Yes | No |
| 18332192 | METHOD AND SWAPPING TOOL | June 2023 | December 2025 | Allow | 30 | 2 | 0 | Yes | No |
| 18266361 | CHARGE DISSIPATIVE RETICLE TABLE CLEANING RETICLE | June 2023 | August 2025 | Allow | 26 | 1 | 0 | No | No |
| 18327814 | EUV LIGHT GENERATION SYSTEM AND ELECTRONIC DEVICE MANUFACTURING METHOD | June 2023 | September 2025 | Allow | 27 | 1 | 0 | No | No |
| 18325200 | SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD USING THE SAME | May 2023 | September 2025 | Allow | 27 | 1 | 0 | Yes | No |
| 18322131 | EUV LIGHT GENERATION APPARATUS AND ELECTRONIC DEVICE MANUFACTURING METHOD | May 2023 | September 2025 | Allow | 28 | 1 | 0 | No | No |
| 18321244 | OPTICAL COMPONENT AND OPTICAL SYSTEM, IN PARTICULAR FOR MICROLITHOGRAPHY | May 2023 | September 2025 | Allow | 28 | 1 | 0 | No | No |
| 18253747 | MULTIPLE OBJECTIVES METROLOGY SYSTEM, LITHOGRAPHIC APPARATUS, AND METHODS THEREOF | May 2023 | July 2025 | Allow | 26 | 2 | 0 | No | No |
| 18319362 | PELLICLE, PELLICLE REMOVAL TOOL, AND METHOD OF UTILIZING PELLICLE AND PELLICLE REMOVAL TOOL | May 2023 | June 2025 | Allow | 25 | 1 | 0 | Yes | No |
| 18252902 | EUV RETICLE STOCKER AND METHOD OF OPERATING THE SAME | May 2023 | July 2025 | Allow | 26 | 1 | 0 | No | No |
| 18139459 | STRUCTURES AND METHODS FOR USE IN PHOTOLITHOGRAPHY | April 2023 | March 2024 | Allow | 11 | 0 | 0 | No | No |
| 18299255 | FOREIGN PARTICLE REMOVING METHOD, FORMATION METHOD, ARTICLE MANUFACTURING METHOD, FOREIGN PARTICLE REMOVING APPARATUS, AND SYSTEM | April 2023 | August 2025 | Allow | 29 | 1 | 0 | No | No |
| 18296186 | SUPPORT FOR AN OPTICAL ELEMENT | April 2023 | December 2024 | Allow | 20 | 0 | 0 | No | No |
| 18247872 | METHOD FOR MANUFACTURING A SET OF ELECTRONIC COMPONENTS ON THE FRONT OF A SEMICONDUCTOR SUBSTRATE | April 2023 | October 2025 | Allow | 31 | 2 | 0 | Yes | No |
| 18021401 | EXPOSURE APPARATUS, MEASURING DEVICE, MEASURING METHOD, AND DEVICE MANUFACTURING METHOD | March 2023 | September 2025 | Allow | 31 | 2 | 0 | Yes | No |
| 18127074 | Method and System for Determining Initial Contact Control Values for Shaping Partial Fields and Method and System for Shaping Partial Fields | March 2023 | October 2024 | Allow | 19 | 1 | 0 | No | No |
| 18126898 | RETICLE ENCLOSURE FOR LITHOGRAPHY SYSTEMS | March 2023 | November 2023 | Allow | 8 | 0 | 0 | No | No |
| 18186396 | OPTICAL SYSTEM, IN PARTICULAR FOR MICROLITHOGRAPHY, AND METHOD FOR OPERATING AN OPTICAL SYSTEM | March 2023 | April 2025 | Allow | 24 | 1 | 0 | No | No |
| 18186359 | SUBSTRATE PROCESSING APPARATUS, SEMICONDUCTOR MANUFACTURING EQUIPMENT, AND SUBSTRATE PROCESSING METHOD | March 2023 | May 2025 | Allow | 26 | 1 | 0 | Yes | No |
| 18026585 | EXPOSURE CONTROL IN PHOTOLITHOGRAPHIC DIRECT EXPOSURE METHODS FOR MANUFACTURING CIRCUIT BOARDS OR CIRCUITS | March 2023 | August 2024 | Allow | 17 | 1 | 0 | No | No |
| 18183774 | OPTICAL SYSTEM AND LITHOGRAPHY APPARATUS | March 2023 | May 2025 | Allow | 26 | 1 | 0 | No | No |
| 18175195 | DIGITAL MICROMIRROR DEVICE FOR AN ILLUMINATION OPTICAL COMPONENT OF A PROJECTION EXPOSURE SYSTEM | February 2023 | March 2025 | Allow | 24 | 1 | 0 | Yes | No |
| 18164167 | OPTICAL ASSEMBLY, METHOD FOR CONTROLLING AN OPTICAL ASSEMBLY, AND PROJECTION EXPOSURE APPARATUS | February 2023 | June 2025 | Allow | 29 | 2 | 0 | No | No |
| 18163023 | TARGET SUPPLY SYSTEM, EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS, AND ELECTRONIC DEVICE MANUFACTURING METHOD | February 2023 | September 2024 | Allow | 20 | 0 | 0 | No | No |
| 18161804 | WORK STAGE AND EXPOSURE APPARATUS | January 2023 | January 2025 | Allow | 24 | 1 | 0 | No | No |
| 18102274 | MASKLESS PHOTOLITHOGRAPHY DEVICES, METHODS, AND SYSTEMS | January 2023 | April 2025 | Abandon | 27 | 1 | 0 | No | No |
| 18100662 | METHODS OF DETERMINING CORRECTIONS FOR A PATTERNING PROCESS, DEVICE MANUFACTURING METHOD, CONTROL SYSTEM FOR A LITHOGRAPHIC APPARATUS AND LITHOGRAPHIC APPARATUS | January 2023 | August 2023 | Allow | 7 | 0 | 0 | No | No |
| 18100695 | High Refractive Index Nano-Imprint Lithography Resin | January 2023 | November 2024 | Allow | 22 | 0 | 0 | No | No |
| 18158293 | DYNAMIC GENERATION OF LAYOUT ADAPTIVE PACKAGING | January 2023 | October 2023 | Allow | 9 | 2 | 0 | Yes | No |
| 18100409 | METHODS AND APPARATUS FOR REDUCING HYDROGEN PERMEATION FROM LITHOGRAPHIC TOOL | January 2023 | February 2024 | Allow | 13 | 1 | 0 | No | No |
| 18097242 | HIGH-PERFORMANCE EUV MICROSCOPE DEVICE WITH FREE-FORM ILLUMINATION SYSTEM STRUCTURE | January 2023 | March 2025 | Allow | 26 | 1 | 0 | No | No |
| 18153640 | A PROJECTION OBJECTIVE INCLUDING AN OPTICAL DEVICE | January 2023 | January 2025 | Allow | 24 | 1 | 0 | No | No |
| 18151334 | ILLUMINATION APPARATUS AND ASSOCIATED METROLOGY AND LITHOGRAPHIC APPARATUSES | January 2023 | February 2025 | Allow | 25 | 1 | 0 | No | No |
| 18090750 | APPARATUS AND METHOD FOR PROCESS-WINDOW CHARACTERIZATION | December 2022 | August 2024 | Allow | 20 | 1 | 0 | No | No |
| 18003691 | System and method for controlling measurements of sample's parameters | December 2022 | September 2023 | Allow | 8 | 1 | 0 | No | No |
| 18146714 | PHOTO MASK STAGE UNIT AND PHOTO MASK STOCKER INCLUDING THE SAME | December 2022 | January 2025 | Allow | 25 | 1 | 0 | No | No |
| 18087320 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD | December 2022 | June 2024 | Allow | 18 | 1 | 0 | No | No |
| 18080490 | CONFIGURING OPTICAL LAYERS IN IMPRINT LITHOGRAPHY PROCESSES | December 2022 | April 2024 | Allow | 16 | 0 | 0 | No | No |
| 18063965 | GAS LASER APPARATUS AND ELECTRONIC DEVICE MANUFACTURING METHOD | December 2022 | January 2025 | Allow | 25 | 1 | 0 | No | No |
| 18062100 | DETECTION APPARATUS, LITHOGRAPHY APPARATUS, AND ARTICLE MANUFACTURING METHOD | December 2022 | December 2023 | Allow | 12 | 1 | 0 | No | No |
| 18061857 | EXPOSURE SYSTEM, EXPOSURE METHOD, AND ELECTRONIC DEVICE MANUFACTURING METHOD | December 2022 | December 2025 | Allow | 36 | 1 | 0 | No | No |
| 18008409 | A FLUID PURGING SYSTEM, PROJECTION SYSTEM, ILLUMINATION SYSTEM, LITHOGRAPHIC APPARATUS, AND METHOD | December 2022 | October 2024 | Allow | 23 | 1 | 0 | No | No |
| 17993731 | LIGHT SOURCE CALIBRATION METHOD AND SYSTEM EMPLOYED IN SOURCE MASK OPTIMIZATION | November 2022 | March 2024 | Allow | 16 | 1 | 0 | No | No |
| 17923184 | METHODS AND APPARATUS FOR DIAGNOSING UNOBSERVED OPERATIONAL PARAMETERS | November 2022 | August 2024 | Allow | 22 | 0 | 0 | No | No |
| 17922593 | ALIGNMENT METHOD AND ASSOCIATED ALIGNMENT AND LITHOGRAPHIC APPARATUSES | October 2022 | March 2024 | Allow | 16 | 0 | 0 | No | No |
| 17977677 | Extreme Ultraviolet Photolithography Method with Infiltration for Enhanced Sensitivity and Etch Resistance | October 2022 | June 2024 | Allow | 19 | 1 | 0 | No | No |
| 17997102 | METHOD OF FABRICATING MICRO-NANO STRUCTURE | October 2022 | February 2023 | Allow | 4 | 0 | 0 | No | No |
| 17967481 | ASSEMBLY, IN PARTICULAR IN A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS | October 2022 | August 2024 | Allow | 22 | 0 | 0 | No | No |
| 17967163 | DRIVE DEVICE, OPTICAL SYSTEM AND LITHOGRAPHY APPARATUS | October 2022 | May 2024 | Allow | 19 | 1 | 0 | No | No |
| 17915056 | IMAGE STABILIZATION FOR DIGITAL LITHOGRAPHY | September 2022 | June 2024 | Allow | 30 | 1 | 0 | Yes | No |
| 17914903 | SYSTEM, LITHOGRAPHIC APPARATUS AND METHOD | September 2022 | March 2025 | Allow | 29 | 2 | 0 | No | Yes |
This analysis examines appeal outcomes and the strategic value of filing appeals for examiner ASFAW, MESFIN T.
With a 33.3% reversal rate, the PTAB reverses the examiner's rejections in a meaningful percentage of cases. This reversal rate is above the USPTO average, indicating that appeals have better success here than typical.
Filing a Notice of Appeal can sometimes lead to allowance even before the appeal is fully briefed or decided by the PTAB. This occurs when the examiner or their supervisor reconsiders the rejection during the mandatory appeal conference (MPEP § 1207.01) after the appeal is filed.
In this dataset, 44.7% of applications that filed an appeal were subsequently allowed. This appeal filing benefit rate is above the USPTO average, suggesting that filing an appeal can be an effective strategy for prompting reconsideration.
✓ Appeals to PTAB show good success rates. If you have a strong case on the merits, consider fully prosecuting the appeal to a Board decision.
✓ Filing a Notice of Appeal is strategically valuable. The act of filing often prompts favorable reconsideration during the mandatory appeal conference.
Examiner ASFAW, MESFIN T works in Art Unit 2882 and has examined 884 patent applications in our dataset. With an allowance rate of 84.8%, this examiner has an above-average tendency to allow applications. Applications typically reach final disposition in approximately 29 months.
Examiner ASFAW, MESFIN T's allowance rate of 84.8% places them in the 61% percentile among all USPTO examiners. This examiner has an above-average tendency to allow applications.
On average, applications examined by ASFAW, MESFIN T receive 1.77 office actions before reaching final disposition. This places the examiner in the 39% percentile for office actions issued. This examiner issues fewer office actions than average, which may indicate efficient prosecution or a more lenient examination style.
The median time to disposition (half-life) for applications examined by ASFAW, MESFIN T is 29 months. This places the examiner in the 66% percentile for prosecution speed. Prosecution timelines are slightly faster than average with this examiner.
Conducting an examiner interview provides a +12.1% benefit to allowance rate for applications examined by ASFAW, MESFIN T. This interview benefit is in the 48% percentile among all examiners. Recommendation: Interviews provide a below-average benefit with this examiner.
When applicants file an RCE with this examiner, 34.2% of applications are subsequently allowed. This success rate is in the 75% percentile among all examiners. Strategic Insight: RCEs are highly effective with this examiner compared to others. If you receive a final rejection, filing an RCE with substantive amendments or arguments has a strong likelihood of success.
This examiner enters after-final amendments leading to allowance in 42.8% of cases where such amendments are filed. This entry rate is in the 65% percentile among all examiners. Strategic Recommendation: This examiner shows above-average receptiveness to after-final amendments. If your amendments clearly overcome the rejections and do not raise new issues, consider filing after-final amendments before resorting to an RCE.
When applicants request a pre-appeal conference (PAC) with this examiner, 77.8% result in withdrawal of the rejection or reopening of prosecution. This success rate is in the 62% percentile among all examiners. Strategic Recommendation: Pre-appeal conferences show above-average effectiveness with this examiner. If you have strong arguments, a PAC request may result in favorable reconsideration.
This examiner withdraws rejections or reopens prosecution in 76.5% of appeals filed. This is in the 68% percentile among all examiners. Of these withdrawals, 59.0% occur early in the appeal process (after Notice of Appeal but before Appeal Brief). Strategic Insight: This examiner shows above-average willingness to reconsider rejections during appeals. The mandatory appeal conference (MPEP § 1207.01) provides an opportunity for reconsideration.
When applicants file petitions regarding this examiner's actions, 26.7% are granted (fully or in part). This grant rate is in the 14% percentile among all examiners. Strategic Note: Petitions are rarely granted regarding this examiner's actions compared to other examiners. Ensure you have a strong procedural basis before filing a petition, as the Technology Center Director typically upholds this examiner's decisions.
Examiner's Amendments: This examiner makes examiner's amendments in 1.7% of allowed cases (in the 73% percentile). This examiner makes examiner's amendments more often than average to place applications in condition for allowance (MPEP § 1302.04).
Quayle Actions: This examiner issues Ex Parte Quayle actions in 1.3% of allowed cases (in the 64% percentile). This examiner issues Quayle actions more often than average when claims are allowable but formal matters remain (MPEP § 714.14).
Based on the statistical analysis of this examiner's prosecution patterns, here are tailored strategic recommendations:
Not Legal Advice: The information provided in this report is for informational purposes only and does not constitute legal advice. You should consult with a qualified patent attorney or agent for advice specific to your situation.
No Guarantees: We do not provide any guarantees as to the accuracy, completeness, or timeliness of the statistics presented above. Patent prosecution statistics are derived from publicly available USPTO data and are subject to data quality limitations, processing errors, and changes in USPTO practices over time.
Limitation of Liability: Under no circumstances will IronCrow AI be liable for any outcome, decision, or action resulting from your reliance on the statistics, analysis, or recommendations presented in this report. Past prosecution patterns do not guarantee future results.
Use at Your Own Risk: While we strive to provide accurate and useful prosecution statistics, you should independently verify any information that is material to your prosecution strategy and use your professional judgment in all patent prosecution matters.