USPTO Art Unit 1713 Prosecution Statistics

Art Unit Information

Art Unit: 1713
Group: 1710
Tech Center: 1700
Total Cases: 16,179
Last Active: January 2025

Recent Applications

Detailed information about the 100 most recent patent applications.

Application NumberTitleFiling DateDisposal DateDispositionTime (months)Office ActionsRestrictionsInterviewAppeal
19015383PHOTOELECTRIC FLUID FIELD CLUSTER CATALYTIC METHOD FOR ATOMIC-SCALE DETERMINISTIC PROCESSINGJanuary 2025May 2025Allow410NoNo
18986067METHOD FOR CHEMICAL MECHANICAL POLISHING OF A SIC WAFER BASED ON A MAGNETORHEOLOGICAL ELASTIC METAL CONTACT CORROSION POLISHING PADDecember 2024April 2025Allow400NoNo
18765990METHOD FOR COATING PRODUCTSJuly 2024October 2024Allow400NoNo
18744751COMPOSITIONS FOR REMOVING PHOTORESISTS AND METHODS OF MANUFACTURING SEMICONDUCTOR DEVICES AND SEMICONDUCTOR PACKAGES USING THE COMPOSITIONSJune 2024April 2025Allow1010YesNo
18733763CHEMICAL MECHANICAL POLISHING SLURRY COMPOSITION AND METHOD OF POLISHING METAL LAYERJune 2024June 2025Allow1310NoNo
18665377ETCHING METHODMay 2024June 2025Allow1310NoNo
18706425SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHODMay 2024August 2024Allow400NoNo
18641911METHOD OF REDUCING LEAKAGE OF HEAT TRANSFER GAS AND PLASMA PROCESSING APPARATUSApril 2024June 2024Allow100YesNo
18626295MAGNETORHEOLOGICAL-ELASTOMER POLISHING PAD FOR CHEMICAL MECHANICAL POLISHING OF SEMICONDUCTOR WAFER, PREPARATION METHOD AND APPLICATION THEREOFApril 2024June 2024Allow300NoNo
18623586Waterproofing of a Modular Head Cleaning SystemApril 2024March 2025Allow1111YesNo
18601642SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUSMarch 2024January 2025Allow1010YesNo
18597615CONTAINER WITH TEXTURED SURFACEMarch 2024October 2024Allow712NoNo
18595554SEMICONDUCTOR DEVICE AND METHODMarch 2024January 2025Allow1110NoNo
18594949POROUS SILICON MATERIAL AND METHOD OF MANUFACTUREMarch 2024March 2025Allow1211NoNo
18593811NITRIDE INHIBITORS FOR HIGH SELECTIVITY OF TiN-SiN CMP APPLICATIONSMarch 2024February 2025Allow1210NoNo
18591060METHODS OF MAKING METAL PATTERNS ON FLEXIBLE SUBSTRATEFebruary 2024April 2025Allow1311YesNo
18588476METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND A SEMICONDUCTOR DEVICEFebruary 2024June 2025Allow1610NoNo
18584164METHOD FOR PREPARING SEMICONDUCTOR DEVICE STRUCTURE WITH ISOLATION PATTERNS HAVING DIFFERENT HEIGHTSFebruary 2024November 2024Allow810NoNo
18435244ATOMIC LAYER ETCHING FOR SUBTRACTIVE METAL ETCHFebruary 2024December 2024Allow1010NoNo
18435576ATOMIC LAYER ETCHING BY ELECTRON WAVEFRONTFebruary 2024August 2024Allow610NoNo
18682061DISTORTION OF PULSES FOR WAFER BIASINGFebruary 2024January 2025Allow1220YesNo
18434121Semiconductor Patterning and Resulting StructuresFebruary 2024May 2025Allow1620NoNo
18429554ENHANCED ETCH SELECTIVITY USING HALIDESFebruary 2024February 2025Allow1210YesNo
18421845SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUSJanuary 2024July 2025Allow1720YesNo
18414436Resonant Frequency Shift as Etch Stop of Gate Oxide of MOSFET TransistorJanuary 2024May 2024Allow411YesNo
18411210SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUSJanuary 2024February 2025Allow1310NoNo
18406980FUEL CELL SEPARATOR MANUFACTURING METHODJanuary 2024April 2025Allow1610NoNo
18577590METHODS FOR THINNING SUBSTRATES FOR SEMICONDUCTOR DEVICESJanuary 2024January 2025Allow1321NoNo
18402529ELECTRICAL DEVICES WITH ELECTRODES ON SOFTENING POLYMERS AND METHODS OF MANUFACTURING THEREOFJanuary 2024November 2024Allow1100NoNo
18400891METHOD OF FABRICATING DIFFRACTION GRATINGSDecember 2023April 2025Allow1510NoNo
18575308SUPERHYDROPHILIC THICK-FILM pH SENSOR BASED ON CHEMICAL ETCHING, AND PREPARATION METHOD THEREOFDecember 2023July 2024Allow600NoNo
18543677METHOD FOR PROCESSING GLASS BY ALKALINE ETCHINGDecember 2023February 2025Allow1420NoNo
18542612CLEANING ANTI-REFLECTIVE COATING PROCESS CHAMBER PARTSDecember 2023April 2024Allow410YesNo
18542238RETRACTABLE WINDSHIELD DEICERDecember 2023January 2025Abandon1310NoNo
18569324METHOD FOR MANUFACTURING ELECTRODE, AND ELECTRODEDecember 2023December 2024Allow1220NoNo
18534027REMOVING METAL CONTAMINATION FROM SURFACES OF A PROCESSING CHAMBERDecember 2023September 2024Allow910NoNo
18525212Self-Aligned Semiconductor Device Contacts Having Widths Less Than Minimum Lithography LimitsNovember 2023October 2024Allow1110YesNo
18522052TREATMENT LIQUID FOR MANUFACTURING SEMICONDUCTOR, PATTERN FORMING METHOD USING THE SAME, AND METHOD OF MANUFACTURING ELECTRONIC DEVICE USING THE SAMENovember 2023March 2025Allow1611NoNo
18519571COMPOSITION AND PROCESS FOR SELECTIVELY ETCHING A LAYER COMPRISING AN ALUMINIUM COMPOUND IN THE PRESENCE OF LAYERS OF LOW-K MATERIALS, COPPER AND/OR COBALTNovember 2023February 2025Allow1511NoNo
18516292PULSED LASER DEPOSITION METHODNovember 2023March 2025Allow1600NoNo
18510137FABRICATION OF WAVEGUIDE STRUCTURESNovember 2023May 2025Allow1810YesNo
18496222SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHODOctober 2023August 2024Allow1010NoNo
18383378METAL PACKAGING POWDER COATING COMPOSITIONS, COATED METAL SUBSTRATES, AND METHODSOctober 2023September 2024Allow1110NoNo
18493386AUTOMOTIVE PART IDENTIFICATION MARKING SYSTEMOctober 2023September 2024Allow1111NoNo
18381516Ruthenium CMP Chemistry Based On HalogenationOctober 2023May 2024Allow700NoNo
18381261APPARATUS AND METHOD OF SUBSTRATE EDGE CLEANING AND SUBSTRATE CARRIER HEAD GAP CLEANINGOctober 2023April 2025Allow1820YesNo
18488057METHOD OF MANUFACTURING VIAS WITH PULSING PLASMAOctober 2023December 2024Allow1410NoNo
18486746CLEANING ANTI-REFLECTIVE COATING PROCESS CHAMBER PARTSOctober 2023April 2024Allow611YesNo
18379228METHOD OF FORMING VANADIUM NITRIDE LAYER AND STRUCTURE INCLUDING THE VANADIUM NITRIDE LAYEROctober 2023November 2024Allow1410NoNo
18483673METHODS FOR PRODUCING AN ETCH RESIST PATTERN ON A METALLIC SURFACEOctober 2023December 2024Allow1410NoNo
18377466POLISHING COMPOSITION, POLISHING METHOD, AND METHOD FOR MANUFACTURING SUBSTRATEOctober 2023November 2024Allow1410NoNo
18377422METHOD OF PREPARING ACTIVE AREASOctober 2023July 2024Allow910NoNo
18480495SYSTEMS AND METHODS FOR REVERSE PULSINGOctober 2023June 2025Allow2011NoNo
18373455METHOD FOR FABRICATING SEMICONDUCTOR DEVICESeptember 2023July 2025Allow2100NoNo
18373514POLISHING COMPOSITIONSeptember 2023May 2025Abandon2030NoNo
18474114ATOMIC LAYER ETCHING BY ELECTRON WAVEFRONTSeptember 2023January 2024Allow410NoNo
18472551HYDROGEN PEROXIDE PLASMA ETCH OF ASHABLE HARD MASKSeptember 2023March 2024Allow600NoNo
18370921LAYOUT DESIGN METHOD AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE USING THE SAMESeptember 2023June 2025Allow2100NoNo
18469263VERTICAL PROBE ARRAYS AND IMPROVED METHODS FOR MAKING USING TEMPORARY OR PERMANENT ALIGNMENT STRUCTURES FOR SETTING OR MAINTAINING PROBE-TO-PROBE RELATIONSHIPSSeptember 2023June 2025Allow2100YesNo
18469253METHOD OF FORMULATING PEROVSKITE SOLAR CELL MATERIALSSeptember 2023January 2025Allow1620NoNo
18368581CHEMICAL MECHANICAL POLISHING OF SUBSTRATES CONTAINING COPPER AND RUTHENIUMSeptember 2023April 2025Abandon1920NoNo
18368032CHEMICAL MECHANICAL POLISHING OF SUBSTRATES CONTAINING COPPER AND RUTHENIUMSeptember 2023February 2025Allow1720NoNo
18281447METHOD FOR MANUFACTURING MEMBRANE-ELECTRODE ASSEMBLY USING NANO-DISPERSED IONOMER BINDER, AND MEMBRANE-ELECTRODE ASSEMBLY MANUFACTURED THEREBYSeptember 2023March 2025Allow1810NoNo
18242082DEFECT FREE GERMANIUM OXIDE GAP FILLSeptember 2023October 2024Allow1410NoNo
18241705LITHOGRAPHY METHOD TO FORM STRUCTURES WITH SLANTED ANGLESeptember 2023October 2024Allow1310NoNo
18279443PLASMA PROCESSING METHOD AND PLASMA PROCESSING DEVICEAugust 2023June 2025Allow2200NoNo
18458146ONE CHAMBER MULTI-STATION SELECTIVE METAL REMOVALAugust 2023June 2025Allow2100NoNo
18452511DEEP CLEANING METHOD FOR HIGHLY CONTAMINATED SOILAugust 2023September 2024Allow1300YesNo
18451826ETCHING METHOD AND ETCHING APPARATUSAugust 2023April 2025Allow2010YesNo
18277177ETCHING SOLUTION, METHOD FOR TREATING SUBSTRATE WITH THE ETCHING SOLUTION, AND METHOD FOR MANUFACTURING SEMICONDUTOR DEVICEAugust 2023February 2025Allow1840YesNo
18233301Method and apparatus for dry-cleaning plastics contaminated with organicsAugust 2023March 2024Allow711YesNo
18232737METHOD OF MANUFACTURING SEMICONDUCTOR DEVICES AND PATTERN FORMATION METHODAugust 2023March 2025Allow1910NoNo
18230866METHOD AND APPARATUS FOR ENHANCED BLAST STREAMAugust 2023October 2024Abandon1410NoNo
18229285DIRECTIONAL SELECTIVE DEPOSITIONAugust 2023March 2025Allow1911YesNo
18226855MICROFLUIDIC DEVICES AND METHODS FOR MANUFACTURING MICROFLUIDIC DEVICESJuly 2023May 2025Allow2200NoNo
18227231METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICEJuly 2023December 2024Allow1610NoNo
18226495METHOD AND APPARATUS FOR SEMICONDUCTOR WAFERJuly 2023July 2024Allow1210YesNo
18358056SEMICONDUCTOR STRUCTURE ETCHING SOLUTION AND METHOD FOR FABRICATING A SEMICONDUCTOR STRUCTURE USING THE SAME ETCHING SOLUTIONJuly 2023January 2025Allow1810NoNo
18225623METHOD OF MANUFACTURING SEMICONDUCTOR DEVICESJuly 2023December 2024Allow1610NoNo
18357370ION BEAM ETCHING CHAMBER WITH ETCHING BY-PRODUCT REDISTRIBUTORJuly 2023May 2025Allow2200YesNo
18225576METHOD FOR REDUCING CHARGING OF SEMICONDUCTOR WAFERSJuly 2023August 2024Allow1210NoNo
18357038PATTERNING MATERIAL INCLUDING SILICON-CONTAINING LAYER AND METHOD FOR SEMICONDUCTOR DEVICE FABRICATIONJuly 2023September 2024Allow1410NoNo
18353624STENTS HAVING A HYBRID PATTERN AND METHODS OF MANUFACTUREJuly 2023March 2025Allow2010YesNo
18352529METHODS AND SYSTEMS FOR DETECTING AND CONTROLLING THE DOSAGE AND RESIDUAL CONCENTRATION OF HARD SURFACE CLEANERS AND RINSE AIDS IN AN AUTOMOTIVE PARTS WASHERJuly 2023May 2025Allow2211YesNo
18222328INTEGRATED SEMICONDUCTOR DIE VESSEL PROCESSING WORKSTATIONSJuly 2023June 2024Allow1110NoNo
18351245Bath Systems and Methods ThereofJuly 2023October 2024Allow1611NoNo
18349476Post-CMP Cleaning and ApparatusJuly 2023August 2024Allow1320NoNo
18347198METHOD FOR FORMING PATTERNED MASK LAYERJuly 2023December 2024Allow1720NoNo
18216800METHOD OF MANUFACTURING SEMICONDUCTOR STRUCTURE WITH IMPROVED ETCHING PROCESSJune 2023November 2024Allow1610NoNo
18215658METHOD OF CONTROLLING AN AIR BLOWING APPARATUSJune 2023March 2024Allow800NoNo
18342251METHOD FOR CLEANING ELECTROSTATIC CHUCKJune 2023March 2025Allow2020YesNo
18341929CHEMICAL SOLUTION, METHOD FOR MANUFACTURING CHEMICAL SOLUTION, AND METHOD FOR TREATING SUBSTRATEJune 2023October 2024Allow1610YesNo
18214891METHOD OF POST-DEPOSITION TREATMENT FOR SILICON OXIDE FILMJune 2023August 2024Allow1310YesNo
18213785LIQUID AMOUNT MEASURING METHOD AND COMPUTER-READABLE RECORDING MEDIUMJune 2023August 2024Allow1411NoNo
18340261DEPOSITION OF ORGANIC FILMSJune 2023January 2025Allow1920NoNo
18339675DEVICES, SYSTEMS, AND METHODS FOR SURGICAL INSTRUMENT REPROCESSINGJune 2023September 2024Allow1510NoNo
18268794SILICON ETCHING LIQUID, AND METHOD FOR PRODUCING SILICON DEVICES AND METHOD FOR PROCESSING SUBSTRATES, EACH USING SAID ETCHING LIQUIDJune 2023June 2025Abandon2410NoNo
18210762SYSTEMS AND METHODS FOR DETERMINING A LOCALIZED FLUID VELOCITY ON A SPINNING SUBSTRATE BY TRACKING MOVEMENT OF A TRACER ACROSS THE SPINNING SUBSTRATEJune 2023June 2025Allow2411YesNo
18210651METAL OXIDE PRECLEAN FOR BOTTOM-UP GAPFILL IN MEOL AND BEOLJune 2023June 2025Allow2420YesNo
18336070ETCHING GAS COMPOSITION, SUBSTRATE PROCESSING APPARATUS, AND PATTERN FORMING METHOD USING THE ETCHING GAS COMPOSITIONJune 2023May 2025Allow2311NoNo

Appeals Overview

This analysis examines appeal outcomes and the strategic value of filing appeals for art-unit 1713.

Patent Trial and Appeal Board (PTAB) Decisions

Total PTAB Decisions
206
Examiner Affirmed
149
(72.3%)
Examiner Reversed
57
(27.7%)
Reversal Percentile
25.8%
Lower than average

What This Means

With a 27.7% reversal rate, the PTAB affirms the examiner's rejections in the vast majority of cases. This reversal rate is below the USPTO average, indicating that appeals face more challenges here than typical.

Strategic Value of Filing an Appeal

Total Appeal Filings
744
Allowed After Appeal Filing
252
(33.9%)
Not Allowed After Appeal Filing
492
(66.1%)
Filing Benefit Percentile
54.8%
Higher than average

Understanding Appeal Filing Strategy

Filing a Notice of Appeal can sometimes lead to allowance even before the appeal is fully briefed or decided by the PTAB. This occurs when the examiner or their supervisor reconsiders the rejection during the mandatory appeal conference (MPEP § 1207.01) after the appeal is filed.

In this dataset, 33.9% of applications that filed an appeal were subsequently allowed. This appeal filing benefit rate is above the USPTO average, suggesting that filing an appeal can be an effective strategy for prompting reconsideration.

Strategic Recommendations

⚠ Appeals to PTAB face challenges. Ensure your case has strong merit before committing to full Board review.

✓ Filing a Notice of Appeal is strategically valuable. The act of filing often prompts favorable reconsideration during the mandatory appeal conference.

Art Unit 1713 - Prosecution Statistics Summary

Executive Summary

Art Unit 1713 is part of Group 1710 in Technology Center 1700. This art unit has examined 16,179 patent applications in our dataset, with an overall allowance rate of 77.7%. Applications typically reach final disposition in approximately 26 months.

Comparative Analysis

Art Unit 1713's allowance rate of 77.7% places it in the 50% percentile among all USPTO art units. This art unit has an above-average allowance rate compared to other art units.

Prosecution Patterns

Applications in Art Unit 1713 receive an average of 1.67 office actions before reaching final disposition (in the 36% percentile). The median prosecution time is 26 months (in the 66% percentile).

Strategic Considerations

When prosecuting applications in this art unit, consider the following:

  • The art unit's allowance rate suggests a more favorable examination environment compared to the USPTO average.
  • With fewer office actions than average, plan for relatively streamlined prosecution.
  • The median prosecution time is shorter than average and should be factored into your continuation and client communication strategies.
  • Review individual examiner statistics within this art unit to identify examiners with particularly favorable or challenging prosecution patterns.

Important Disclaimer

Not Legal Advice: The information provided in this report is for informational purposes only and does not constitute legal advice. You should consult with a qualified patent attorney or agent for advice specific to your situation.

No Guarantees: We do not provide any guarantees as to the accuracy, completeness, or timeliness of the statistics presented above. Patent prosecution statistics are derived from publicly available USPTO data and are subject to data quality limitations, processing errors, and changes in USPTO practices over time.

Limitation of Liability: Under no circumstances will IronCrow AI be liable for any outcome, decision, or action resulting from your reliance on the statistics, analysis, or recommendations presented in this report. Past prosecution patterns do not guarantee future results.

Use at Your Own Risk: While we strive to provide accurate and useful prosecution statistics, you should independently verify any information that is material to your prosecution strategy and use your professional judgment in all patent prosecution matters.