USPTO Examiner LEE WOO KYUNG - Art Unit 2815

Recent Applications

Detailed information about the 100 most recent patent applications.

Application NumberTitleFiling DateDisposal DateDispositionTime (months)Office ActionsRestrictionsInterviewAppeal
18680253SOFT ASHING PROCESS FOR FORMING PROTECTIVE LAYER ON CONDUCTIVE CAP LAYER OF SEMICONDUCTOR DEVICEMay 2024May 2025Allow1100NoNo
18675401VERTICAL SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAMEMay 2024December 2025Allow1920YesNo
18675467SEMICONDUCTOR MEMORY DEVICE AND MANUFACTURING METHOD OF SEMICONDUCTOR MEMORY DEVICEMay 2024November 2025Abandon1811NoNo
18632214DISPLAY DEVICEApril 2024April 2025Allow1210YesNo
18413057MEMORY DEVICEJanuary 2024August 2024Allow700NoNo
18513853SEMICONDUCTOR DEVICE INCLUDING AN ACTIVE PATTERNNovember 2023February 2026Allow2700NoNo
18388333IMAGE SENSORNovember 2023March 2025Allow1611YesNo
18381791Integrated Assemblies and Methods of Forming Integrated AssembliesOctober 2023July 2024Allow900NoNo
18377772METHOD OF MANUFACTURING SEMICONDUCTOR STRUCTUREOctober 2023January 2026Allow2800NoNo
18475076SEMICONDUCTOR DEVICES AND METHOD FOR FORMING THE SAMESeptember 2023October 2025Allow2421NoNo
18447529VERTICALLY ARRANGED SEMICONDUCTOR PIXEL SENSORAugust 2023November 2025Allow2721YesNo
18366806PHOTODIODE STRUCTURE FOR IMAGE SENSORAugust 2023March 2025Allow1921YesNo
18446398MAGNETIC TUNNEL JUNCTION STRUCTURES WITH PROTECTION OUTER LAYERSAugust 2023February 2025Allow1810NoNo
18230980STACKED DEVICE STRUCTURES AND METHODS FOR FORMING THE SAMEAugust 2023December 2024Allow1611NoNo
18364716MULTI-PORT SRAM STRUCTURE WITH GATE-ALL-AROUND TRANSISTORSAugust 2023January 2026Allow3001NoNo
18364195PIXEL ARRAY INCLUDING TIME-OF-FLIGHT SENSORSAugust 2023April 2025Allow2030YesNo
18363968TRANSISTOR GATE STRUCTURES AND METHODS OF FORMING THE SAMEAugust 2023January 2025Allow1811NoNo
18359552INTERCONNECT STRUCTURE FOR SEMICONDUCTOR DEVICESJuly 2023January 2025Allow1720YesNo
18221409HEMT AND METHOD OF FABRICATING THE SAMEJuly 2023July 2025Allow2440NoNo
18348081SEMICONDUCTOR DEVICES WITH BONDING LAYERSJuly 2023February 2026Allow3201NoNo
18206218RUTHENIUM CARBIDE FOR DRAM CAPACITOR MOLD PATTERNINGJune 2023February 2026Allow3210NoNo
18137664DISPLAY DEVICEApril 2023February 2026Allow3411NoNo
18298678SEMICONDUCTOR DEVICEApril 2023January 2026Allow3301NoNo
18124876SEMICONDUCTOR OPTOELECTRONIC INTEGRATED CIRCUIT AND METHODOLOGY FOR MAKING SAME EMPLOYING GATE-ALL-AROUND EPITAXIAL STRUCTURESMarch 2023February 2026Allow3501NoNo
18027622Display Substrate and Display ApparatusMarch 2023November 2025Allow3110NoNo
18175240SYSTEMS AND METHODS FOR POWER MODULE FOR INVERTER FOR ELECTRIC VEHICLEFebruary 2023October 2025Allow3120NoNo
18022620METHOD FOR MANUFACTURING THIN FILM TRANSISTOR, AND THIN FILM TRANSISTORFebruary 2023February 2026Allow3611NoNo
18166492SEMICONDUCTOR STRUCTURE AND METHOD FOR MANUFACTURING THE SAMEFebruary 2023March 2026Abandon3720NoNo
18154030SEMICONDUCTOR DEVICE INCLUDING THIN FILM TRANSISTOR AND METHOD FOR FORMING THE SAMEJanuary 2023February 2026Allow3711NoNo
18095336THREE-DIMENSIONAL MEMORY DEVICES AND FABRICATING METHODS THEREOFJanuary 2023December 2025Allow3511NoNo
18095243METHOD OF FORMING GERMANIUM ANTIMONY TELLURIUM FILMJanuary 2023August 2025Allow3210YesNo
18060317METHOD FOR POROSIFYING A MATERIAL AND SEMICONDUCTOR STRUCTURENovember 2022February 2026Allow3931YesNo
17993835SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOFNovember 2022July 2025Allow3211YesNo
17923934DISPLAY PANEL AND METHOD FOR MANUFACTURING THE SAME, AND DISPLAY DEVICENovember 2022August 2025Allow3310NoNo
18051600IMPROVED SEALS FOR SEMICONDUCTOR DEVICES WITH SINGLE-PHOTON AVALANCHE DIODE PIXELSNovember 2022January 2026Abandon3811NoNo
17978229THREE-DIMENSIONAL MEMORY DEVICE AND METHOD FOR FABRICATING THE SAMENovember 2022September 2025Allow3511NoNo
17969072LIGHT EMITTING ELEMENT AND DISPLAY DEVICE INCLUDING THE SAMEOctober 2022September 2025Allow3510NoNo
17937461PHOTOELECTRIC CONVERSION FILM, DISPERSION LIQUID, PHOTODETECTOR ELEMENT, AND IMAGE SENSOROctober 2022October 2025Abandon3710NoNo
17910180A SEED LAYER, A HETEROSTRUCTURE COMPRISING THE SEED LAYER AND A METHOD OF FORMING A LAYER OF MATERIAL USING THE SEED LAYERSeptember 2022July 2025Allow3431YesNo
17901890SEMICONDUCTOR DEVICESeptember 2022July 2025Allow3520YesNo
17909055TUNNELING DEVICE HAVING INTERMEDIATE LAYER USING NATURAL OXIDE FILM AND METHOD OF MANUFACTURING TUNNELING DEVICESeptember 2022April 2025Allow3141YesNo
17897127SEMICONDUCTOR MANUFACTURING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICEAugust 2022July 2025Allow3511YesNo
17821717METHOD FOR MANUFACTURING A CAPACITIVE PRESSURE SENSOR AND CAPACITIVE PRESSURE SENSORAugust 2022August 2025Allow3611YesNo
17886617ELECTRONIC APPARATUS AND DISPLAY DEVICEAugust 2022September 2025Allow3720NoNo
17875016THREE-DIMENSIONAL MEMORY AND FABRICATION METHOD THEREOFJuly 2022June 2025Allow3511NoNo
17790829LED Epitaxial Structure and Preparation Method and Application ThereofJuly 2022April 2025Allow3310NoNo
17856602FIELD EFFECT TRANSISTORS WITH 2-DIMENSIONAL ELECTRON GAS CHANNELSJuly 2022February 2026Abandon4301NoNo
17853068LIGHT EMITTING DIODEJune 2022May 2025Allow3410NoNo
17851960INTEGRATED CIRCUIT STRUCTURES HAVING AOI GATES WITH ROUTING ACROSS NANOWIRESJune 2022January 2026Allow4310NoNo
17789070DISPLAY APPARATUSES, DISPLAY SUBSTRATES, AND METHODS OF PREPARING DISPLAY SUBSTRATESJune 2022January 2026Allow4230NoNo
17789010DISPLAY PANEL AND DISPLAY DEVICEJune 2022December 2025Allow4221NoNo
17808566COMMON SELF ALIGNED GATE CONTACT FOR STACKED TRANSISTOR STRUCTURESJune 2022January 2026Allow4310YesNo
17847130SEMICONDUCTOR PACKAGEJune 2022June 2025Allow3621YesNo
17844044SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THEREOFJune 2022October 2025Allow4021YesNo
17756812METHOD OF FABRICATING A HOLLOW WALL FOR CONTROLLING DIRECTIONAL DEPOSITION OF MATERIALJune 2022May 2025Allow3631YesNo
17804648LIGHT-EMITTING DIODE PACKAGES WITH LEAD FRAME STRUCTURES FOR FLIP-CHIP MOUNTING OF LIGHT-EMITTING DIODE CHIPSMay 2022September 2025Allow4021NoNo
17751573FIELD EFFECT TRANSISTOR WITH ASYMMETRICAL SOURCE/DRAIN REGION AND METHODMay 2022April 2025Allow3411NoNo
17778233SOLID-STATE IMAGING ELEMENTMay 2022August 2025Abandon3921NoNo
17746452SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SAMEMay 2022December 2024Abandon3120NoNo
17740371OPTICAL SENSOR AND PHOTODIODEMay 2022March 2026Allow4611NoNo
17738393INTEGRATED CIRCUIT DEVICES INCLUDING STACKED ELEMENTS AND METHODS OF FORMING THE SAMEMay 2022November 2025Allow4322YesNo
17772851DISPLAY PANEL AND METHOD FOR MANUFACTURING THE SAME, AND DISPLAY APPARATUSApril 2022November 2025Allow4331YesNo
17755246TOPOLOGICAL PHOTONIC CRYSTAL CAVITY AND ITS APPLICATION IN LASERSApril 2022September 2025Allow4130NoNo
17660057PHOTOELECTRIC CONVERSION DEVICE AND PHOTODETECTION SYSTEMApril 2022April 2025Allow3621NoNo
17724685SEMICONDUCTOR DEVICE INCLUDING PERIPHERAL CONTACTApril 2022February 2025Allow3411YesNo
17767807LIGHT EMITTING ELEMENT, LIGHT EMITTING DEVICE, AND DISPLAY DEVICEApril 2022March 2025Allow3511NoNo
17766833IMAGING DEVICEApril 2022October 2025Allow4231NoNo
17710276DISPLAY PANELMarch 2022April 2025Allow3621YesNo
17657185DIE ATTACH SYSTEMMarch 2022March 2026Allow4750YesNo
17656601FLEXIBLE DISPLAY SUITABLE FOR UNDER-DISPLAY SENSORMarch 2022August 2025Abandon4121NoNo
17655610ELECTRONIC DEVICE AND MULTI-LEVEL INTERPOSER WITH RF SLOPED VIA AND RELATED METHODMarch 2022September 2024Allow3010NoNo
17761130QUANTUM DOT-POLYMER COMPOSITE PARTICLES AND METHOD FOR PREPARING SAMEMarch 2022November 2025Allow4431NoNo
17642434SEMICONDUCTOR DEVICEMarch 2022March 2025Allow3610NoNo
17683597MULTIPORT HIGH-PRESSURE FLUID CELL FOR PHOTON AND ELECTRON BEAMSMarch 2022October 2025Allow4441YesNo
17680681ETCHING METHODS FOR INTEGRATED CIRCUITSFebruary 2022June 2025Allow4020YesNo
17680464SEMICONDUCTOR CHIP, PROCESSED WAFER, AND METHOD FOR MANUFACTURING SEMICONDUCTOR CHIPFebruary 2022January 2025Allow3520YesNo
17681147DISPLAY PANEL AND DISPLAY DEVICEFebruary 2022October 2025Allow4331NoNo
17637352SEMICONDUCTOR DEVICEFebruary 2022August 2025Allow4231YesNo
17636480LIGHT EMITTING ELEMENT AND DISPLAY DEVICE COMPRISING SAMEFebruary 2022August 2025Allow4231NoNo
17673232METHOD FOR MANUFACTURING SEMICONDUCTOR STRUCTURE WITH ISOLATION FEATUREFebruary 2022January 2025Allow3511YesNo
17648799SEMICONDUCTOR TEST STRUCTURE AND METHOD FOR MANUFACTURING SAMEJanuary 2022November 2024Abandon3421YesNo
17561867SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE AND MANUFACTURING METHOD THEREOFDecember 2021May 2025Allow4011YesNo
17616170SEMICONDUCTOR STRUCTURE MANUFACTURING METHODS AND SEMICONDUCTOR STRUCTURESDecember 2021June 2024Allow3130YesNo
17519072DISPLAY DEVICENovember 2021March 2025Allow4031NoNo
17451597SEMICONDUCTOR STRUCTURE AND FORMATION METHOD THEREOFOctober 2021April 2024Abandon3020NoNo
17593769POINT SOURCE TYPE LIGHT-EMITTING DIODE AND MANUFACTURING METHOD THEREOFSeptember 2021August 2025Allow4741YesNo
17483215SEMICONDUCTOR MEMORY DEVICE AND MANUFACTURING METHOD OF SEMICONDUCTOR MEMORY DEVICESeptember 2021August 2024Abandon3511NoNo
17436302SiC EPITAXIAL SUBSTRATE MANUFACTURING METHOD AND MANUFACTURING DEVICE THEREFORSeptember 2021December 2025Allow5161YesNo
17459476ISOLATION STRUCTURES OF SEMICONDUCTOR DEVICESAugust 2021March 2025Allow4241YesNo
17310772SEMICONDUCTOR MASK RESHAPING USING A SACRIFICIAL LAYERAugust 2021July 2024Allow3520YesNo
17431517Light-Emitting Device, Light-Emitting Apparatus, Electronic Device, and Lighting DeviceAugust 2021August 2024Allow3620NoNo
17431444OLED DISPLAY PANELAugust 2021September 2025Allow4941NoNo
17430844SOLID-STATE IMAGING DEVICE AND ELECTRONIC DEVICEAugust 2021January 2025Abandon4221NoNo
17398504SEMICONDUCTOR DEVICESAugust 2021September 2024Allow3721YesNo
17392926METHOD FOR MANUFACTURING SEMICONDUCTOR CRYSTALLINE THIN FILM AND LASER ANNEALING SYSTEMAugust 2021August 2024Abandon3621NoNo
17391518DEVICE HAVING RESIN SUBSTRATE AND MANUFACTURING METHOD THEREOFAugust 2021January 2025Abandon4121NoNo
17426656NITRIDE-BASED SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAMEJuly 2021August 2025Allow4821NoNo
17382060SELECTIVE DOUBLE DIFFUSION BREAK STRUCTURES FOR MULTI-STACK SEMICONDUCTOR DEVICEJuly 2021June 2024Allow3521YesNo
17377864SOFT ASHING PROCESS FOR FORMING PROTECTIVE LAYER ON CONDUCTIVE CAP LAYER OF SEMICONDUCTOR DEVICEJuly 2021April 2024Allow3330YesNo
17423826LIGHT-EMITTING ELEMENT AND DISPLAY DEVICEJuly 2021July 2024Allow3611NoNo

Appeals Overview

This analysis examines appeal outcomes and the strategic value of filing appeals for examiner LEE, WOO KYUNG.

Patent Trial and Appeal Board (PTAB) Decisions

Total PTAB Decisions
1
Examiner Affirmed
0
(0.0%)
Examiner Reversed
1
(100.0%)
Reversal Percentile
94.8%
Higher than average

What This Means

With a 100.0% reversal rate, the PTAB has reversed the examiner's rejections more often than affirming them. This reversal rate is in the top 25% across the USPTO, indicating that appeals are more successful here than in most other areas.

Strategic Value of Filing an Appeal

Total Appeal Filings
3
Allowed After Appeal Filing
2
(66.7%)
Not Allowed After Appeal Filing
1
(33.3%)
Filing Benefit Percentile
91.9%
Higher than average

Understanding Appeal Filing Strategy

Filing a Notice of Appeal can sometimes lead to allowance even before the appeal is fully briefed or decided by the PTAB. This occurs when the examiner or their supervisor reconsiders the rejection during the mandatory appeal conference (MPEP § 1207.01) after the appeal is filed.

In this dataset, 66.7% of applications that filed an appeal were subsequently allowed. This appeal filing benefit rate is in the top 25% across the USPTO, indicating that filing appeals is particularly effective here. The act of filing often prompts favorable reconsideration during the mandatory appeal conference.

Strategic Recommendations

Appeals to PTAB show good success rates. If you have a strong case on the merits, consider fully prosecuting the appeal to a Board decision.

Filing a Notice of Appeal is strategically valuable. The act of filing often prompts favorable reconsideration during the mandatory appeal conference.

Examiner LEE, WOO KYUNG - Prosecution Strategy Guide

Executive Summary

Examiner LEE, WOO KYUNG works in Art Unit 2815 and has examined 91 patent applications in our dataset. With an allowance rate of 72.5%, this examiner has a below-average tendency to allow applications. Applications typically reach final disposition in approximately 41 months.

Allowance Patterns

Examiner LEE, WOO KYUNG's allowance rate of 72.5% places them in the 36% percentile among all USPTO examiners. This examiner has a below-average tendency to allow applications.

Office Action Patterns

On average, applications examined by LEE, WOO KYUNG receive 2.96 office actions before reaching final disposition. This places the examiner in the 85% percentile for office actions issued. This examiner issues more office actions than most examiners, which may indicate thorough examination or difficulty in reaching agreement with applicants.

Prosecution Timeline

The median time to disposition (half-life) for applications examined by LEE, WOO KYUNG is 41 months. This places the examiner in the 21% percentile for prosecution speed. Applications take longer to reach final disposition with this examiner compared to most others.

Interview Effectiveness

Conducting an examiner interview provides a +35.6% benefit to allowance rate for applications examined by LEE, WOO KYUNG. This interview benefit is in the 83% percentile among all examiners. Recommendation: Interviews are highly effective with this examiner and should be strongly considered as a prosecution strategy. Per MPEP § 713.10, interviews are available at any time before the Notice of Allowance is mailed or jurisdiction transfers to the PTAB.

Request for Continued Examination (RCE) Effectiveness

When applicants file an RCE with this examiner, 27.8% of applications are subsequently allowed. This success rate is in the 49% percentile among all examiners. Strategic Insight: RCEs show below-average effectiveness with this examiner. Carefully evaluate whether an RCE or continuation is the better strategy.

After-Final Amendment Practice

This examiner enters after-final amendments leading to allowance in 10.1% of cases where such amendments are filed. This entry rate is in the 10% percentile among all examiners. Strategic Recommendation: This examiner rarely enters after-final amendments compared to other examiners. You should generally plan to file an RCE or appeal rather than relying on after-final amendment entry. Per MPEP § 714.12, primary examiners have discretion in entering after-final amendments, and this examiner exercises that discretion conservatively.

Pre-Appeal Conference Effectiveness

When applicants request a pre-appeal conference (PAC) with this examiner, 0.0% result in withdrawal of the rejection or reopening of prosecution. This success rate is in the 13% percentile among all examiners. Note: Pre-appeal conferences show limited success with this examiner compared to others. While still worth considering, be prepared to proceed with a full appeal brief if the PAC does not result in favorable action.

Appeal Withdrawal and Reconsideration

This examiner withdraws rejections or reopens prosecution in 75.0% of appeals filed. This is in the 65% percentile among all examiners. Strategic Insight: This examiner shows above-average willingness to reconsider rejections during appeals. The mandatory appeal conference (MPEP § 1207.01) provides an opportunity for reconsideration.

Petition Practice

When applicants file petitions regarding this examiner's actions, 0.0% are granted (fully or in part). This grant rate is in the 4% percentile among all examiners. Strategic Note: Petitions are rarely granted regarding this examiner's actions compared to other examiners. Ensure you have a strong procedural basis before filing a petition, as the Technology Center Director typically upholds this examiner's decisions.

Examiner Cooperation and Flexibility

Examiner's Amendments: This examiner makes examiner's amendments in 0.0% of allowed cases (in the 24% percentile). This examiner rarely makes examiner's amendments compared to other examiners. You should expect to make all necessary claim amendments yourself through formal amendment practice.

Quayle Actions: This examiner issues Ex Parte Quayle actions in 3.0% of allowed cases (in the 74% percentile). This examiner issues Quayle actions more often than average when claims are allowable but formal matters remain (MPEP § 714.14).

Prosecution Strategy Recommendations

Based on the statistical analysis of this examiner's prosecution patterns, here are tailored strategic recommendations:

  • Expect multiple rounds of prosecution: This examiner issues more office actions than average. Address potential issues proactively in your initial response and consider requesting an interview early in prosecution.
  • Prioritize examiner interviews: Interviews are highly effective with this examiner. Request an interview after the first office action to clarify issues and potentially expedite allowance.
  • Plan for RCE after final rejection: This examiner rarely enters after-final amendments. Budget for an RCE in your prosecution strategy if you receive a final rejection.
  • Plan for extended prosecution: Applications take longer than average with this examiner. Factor this into your continuation strategy and client communications.

Relevant MPEP Sections for Prosecution Strategy

  • MPEP § 713.10: Examiner interviews - available before Notice of Allowance or transfer to PTAB
  • MPEP § 714.12: After-final amendments - may be entered "under justifiable circumstances"
  • MPEP § 1002.02(c): Petitionable matters to Technology Center Director
  • MPEP § 1004: Actions requiring primary examiner signature (allowances, final rejections, examiner's answers)
  • MPEP § 1207.01: Appeal conferences - mandatory for all appeals
  • MPEP § 1214.07: Reopening prosecution after appeal

Important Disclaimer

Not Legal Advice: The information provided in this report is for informational purposes only and does not constitute legal advice. You should consult with a qualified patent attorney or agent for advice specific to your situation.

No Guarantees: We do not provide any guarantees as to the accuracy, completeness, or timeliness of the statistics presented above. Patent prosecution statistics are derived from publicly available USPTO data and are subject to data quality limitations, processing errors, and changes in USPTO practices over time.

Limitation of Liability: Under no circumstances will IronCrow AI be liable for any outcome, decision, or action resulting from your reliance on the statistics, analysis, or recommendations presented in this report. Past prosecution patterns do not guarantee future results.

Use at Your Own Risk: While we strive to provide accurate and useful prosecution statistics, you should independently verify any information that is material to your prosecution strategy and use your professional judgment in all patent prosecution matters.