USPTO Examiner DIAZ JOSE R - Art Unit 2815

Recent Applications

Detailed information about the 100 most recent patent applications.

Application NumberTitleFiling DateDisposal DateDispositionTime (months)Office ActionsRestrictionsInterviewAppeal
18779095SEMICONDUCTOR TRENCH CAPACITOR STRUCTURE AND MANUFACTURING METHOD THEREOFJuly 2024January 2026Allow1810NoNo
18763075SEMICONDUCTOR STRUCTURES HAVING DEEP TRENCH CAPACITOR AND METHODS FOR MANUFACTURING THE SAMEJuly 2024March 2025Allow810NoNo
18755379Ferroelectric Tunnel Junction Devices with a Sparse Seed Layer and Methods for Forming the SameJune 2024July 2025Allow1310NoNo
18747379SEMICONDUCTOR DEVICE, FERROELECTRIC CAPACITOR AND LAMINATED STRUCTUREJune 2024May 2025Allow1110NoNo
18743431SEMICONDUCTOR STRUCTURES HAVING DEEP TRENCH CAPACITOR AND METHODS FOR MANUFACTURING THE SAMEJune 2024January 2025Allow700NoNo
18731945REDUCING PATTERN LOADING IN THE ETCH-BACK OF METAL GATEJune 2024November 2025Allow1730NoNo
18678270LEAD FRAME AND MANUFACTURING METHOD THEREOFMay 2024April 2025Allow1010YesNo
18674923METHOD FOR FABRICATING A SEMICONDUCTOR DEVICE INCLUDING A MOS TRANSISTOR HAVING A SILICIDE LAYERMay 2024July 2025Allow1410NoNo
18666035SEMICONDUCTOR MEMORY DEVICEMay 2024December 2024Allow700NoNo
18659523SEMICONDUCTOR DEVICE, SEMICONDUCTOR WAFER, MEMORY DEVICE, AND ELECTRONIC DEVICEMay 2024December 2024Allow700NoNo
18641815MEMS RESONATOR INTEGRATED CICRUIT FABRICATIONApril 2024May 2025Allow1310NoNo
18614757SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAMEMarch 2024November 2024Allow700NoNo
18594215TRENCH CAPACITOR STRUCTURE WITH HYBRID FILLING LAYERMarch 2024January 2025Allow1110NoNo
18586255THIN FILM TRANSISTOR AND VERTICAL NON-VOLATILE MEMORY DEVICE INCLUDING TRANSITION METAL-INDUCED POLYCRYSTALLINE METAL OXIDE CHANNEL LAYERFebruary 2024September 2024Allow700NoNo
18439785INTEGRATED CIRCUIT DEVICES AND METHODS OF MANUFACTURING THE SAMEFebruary 2024January 2025Allow1110YesNo
18406403Semiconductor Package Using A Coreless Signal Distribution StructureJanuary 2024February 2025Allow1310NoNo
18405134MULTI-LAYER TRENCH CAPACITOR STRUCTUREJanuary 2024November 2024Allow1010NoNo
18398162PLASMA PROCESSING SYSTEM AND EDGE RING REPLACEMENT METHODDecember 2023April 2025Allow1620NoNo
18395617SEMICONDUCTOR PACKAGES AND MANUFACTURING METHODS THEREOFDecember 2023December 2024Allow1210NoNo
18395110MULTILAYER CAPACITOR ELECTRODEDecember 2023October 2024Allow1010NoNo
18515619HALL EFFECT SENSOR WITH LOW OFFSET AND HIGH LEVEL OF STABILITYNovember 2023November 2024Allow1110NoNo
18514060SEMICONDUCTOR DEVICE WITH ELECTRODE HAVING STEP-SHAPED SIDEWALL AND METHOD FOR PREPARING THE SAMENovember 2023February 2026Allow2700NoNo
18513042ELECTRONIC DEVICES AND METHODS OF MANUFACTURING THE SAMENovember 2023September 2024Allow1010NoNo
18513431MOLDED DIRECT BONDED AND INTERCONNECTED STACKNovember 2023October 2024Allow1110NoNo
18512096TRENCH PATTERN FOR TRENCH CAPACITOR YIELD IMPROVEMENTNovember 2023September 2024Allow1010NoNo
18504140DISPLAY DEVICENovember 2023September 2024Allow1110NoNo
18382837ORGANIC LIGHT EMITTING DIODE AND ORGANIC LIGHT EMITTING DEVICE INCLUDING THE SAMEOctober 2023January 2026Allow2700NoNo
18482710THIN FILM TRANSISTOR ARRAY SUBSTRATE AND ORGANIC LIGHT-EMITTING DISPLAY DEVICE INCLUDING THE SAMEOctober 2023August 2024Allow1110NoNo
18285836ACCUMULATION GATE FOR QUANTUM DEVICEOctober 2023January 2026Allow2700NoNo
18479630SEMICONDUCTOR DEVICES WITH DISSIMLAR MATERIALS AND METHODSOctober 2023August 2024Allow1110NoNo
18375193LEAD FRAME AND MANUFACTURING METHOD THEREOFSeptember 2023March 2024Allow620NoNo
18372716SEMICONDUCTOR DEVICESeptember 2023September 2024Allow1220NoNo
18463290METHOD FOR MANUFACTURING LIGHT EMITTING DEVICESSeptember 2023May 2024Allow800NoNo
18242076SEMICONDUCTOR DEVICE WITH ELECTRODE HAVING STEP-SHAPED SIDEWALL AND METHOD FOR PREPARING THE SAMESeptember 2023December 2025Allow2800NoNo
18452517DISPLAY APPARATUS AND METHOD OF MANUFACTURING THE SAMEAugust 2023April 2024Allow800NoNo
18234609SEMICONDUCTOR PACKAGEAugust 2023March 2026Allow3101NoNo
18449769METHOD OF MANUFACTURING SEMICONDUCTOR DEVICEAugust 2023March 2026Allow3110NoNo
18233899MIM CAPACITOR AND FABRICATING METHOD OF THE SAMEAugust 2023December 2025Allow2810NoNo
18231754HIGH DENSITY METAL INSULATOR METAL CAPACITORAugust 2023September 2024Allow1320NoNo
18363456SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICEAugust 2023August 2024Allow1210NoNo
18360941HIGH CAPACITANCE MIM DEVICE WITH SELF ALIGNED SPACERJuly 2023July 2024Allow1210NoNo
18361331FERROELECTRIC CHANNEL FIELD EFFECT TRANSISTORJuly 2023August 2024Allow1320NoNo
18226861Metal-Insulator-Metal Capacitor Within Metallization StructureJuly 2023January 2025Allow1810NoNo
18358511METHODS AND SYSTEMS OF FORMING METAL INTERCONNECT LAYERS USING ENGINEERED TEMPLATESJuly 2023August 2024Allow1310NoNo
18358529FINFET DEVICE AND METHOD OF FORMING SAMEJuly 2023September 2024Allow1420NoNo
18356239SEMICONDUCTOR DEVICEJuly 2023October 2025Allow2710NoNo
18224462DISPLAY DEVICEJuly 2023January 2026Allow3000NoNo
18354573Ferroelectric Tunnel Junction Devices with a Sparse Seed Layer and Methods for Forming the SameJuly 2023May 2024Allow1010NoNo
18350397CAPACITOR AND ELECTRONIC DEVICE INCLUDING THE SAMEJuly 2023September 2025Allow2600NoNo
18219247SEMICONDUCTOR STRUCTURES HAVING DEEP TRENCH CAPACITOR AND METHODS FOR MANUFACTURING THE SAMEJuly 2023September 2024Allow1511NoNo
18346403OFFSET PADS OVER TSVJuly 2023October 2024Allow1610NoNo
18342752SEMICONDUCTOR PACKAGE AND MANUFACTURING METHOD THEREOFJune 2023June 2024Allow1110NoNo
18342861MULTI-LATERAL RECESSED MIM STRUCTUREJune 2023January 2026Allow3110NoNo
18335167CAPPING LAYER OVER FET FERAM TO INCREASE CHARGE MOBILITYJune 2023June 2024Allow1210NoNo
18209499DISPLAY PANELJune 2023April 2024Allow1010NoNo
18206655SEMICONDUCTOR DEVICE, SEMICONDUCTOR WAFER, MEMORY DEVICE, AND ELECTRONIC DEVICEJune 2023January 2024Allow700NoNo
18206520MEMS RESONATOR SYSTEMJune 2023January 2024Allow800NoNo
18206097SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAMEJune 2023May 2024Allow1210NoNo
18329729SEMICONDUCTOR DEVICE STRUCTURE WITH ELECTRODE LAYER AND METHOD FOR FORMING THE SAMEJune 2023February 2026Allow3201NoNo
18327869SEMICONDUCTOR TRENCH CAPACITOR STRUCTURE AND MANUFACTURING METHOD THEREOFJune 2023June 2024Allow1210NoNo
18203816SEMICONDUCTOR STRUCTURE AND METHOD FOR FORMING SAMEMay 2023January 2026Allow3210NoNo
18326115Gate Spacer Structure and Method of Forming SameMay 2023April 2024Allow1010NoNo
18326218FERROELECTRIC STRUCTURE LINING CONDUCTIVE INTERCONNECT STRUCTUREMay 2023January 2026Allow3210NoNo
18314572SEMICONDUCTOR DEVICEMay 2023December 2023Allow700NoNo
18310022ELECTRONIC DEVICE INCLUDING FERROELECTRIC LAYERMay 2023May 2024Allow1210NoNo
18300388SEMICONDUCTOR DEVICE INCLUDING CAPACITOR AND METHOD FOR FABRICATING THE SAMEApril 2023November 2025Allow3110NoNo
18297868SEMICONDUCTOR DEVICE STRUCTUREApril 2023March 2024Allow1110NoNo
18298095Reducing Pattern Loading in the Etch-Back of Metal GateApril 2023February 2024Allow1110NoNo
18297677SEMICONDUCTOR DEVICE AND IMAGING DEVICEApril 2023September 2025Allow2900NoNo
18297260COMPOSITION FOR SEMICONDUCTOR PROCESSING AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE USING THE SAMEApril 2023October 2025Allow3100NoNo
18297282TRENCH CAPACITOR STRUCTURE AND METHODS OF MANUFACTURINGApril 2023February 2026Allow3511YesNo
18131439REVERSE BLOCKING INSULATED-GATE BIPOLAR TRANSISTORApril 2023February 2026Allow3410NoNo
18192681SEMICONDUCTOR DEVICE, FERROELECTRIC CAPACITOR AND LAMINATED STRUCTUREMarch 2023March 2024Allow1110NoNo
18189053METAMATERIAL OXIDE CAPACITORMarch 2023July 2023Allow400NoNo
18119896SEMICONDUCTOR DEVICEMarch 2023September 2025Allow3000NoNo
18176656SEMICONDUCTOR MEMORY DEVICEMarch 2023February 2024Allow1120NoNo
18173874HALL EFFECT SENSOR WITH LOW OFFSET AND HIGH LEVEL OF STABILITYFebruary 2023August 2023Allow610NoNo
18170514METHOD FOR MANUFACTURING CAPACITOR ARRAY, CAPACITOR ARRAY, AND SEMICONDUCTOR DEVICEFebruary 2023September 2025Allow3111NoNo
18041081MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE, SEMICONDUCTOR DEVICE, AND ELECTRONIC APPARATUSFebruary 2023February 2026Allow3610NoNo
18165384SEMICONDUCTOR STRUCTURE AND MANUFACTURING METHOD THEREFORFebruary 2023October 2025Allow3210NoNo
18165316CAPACITOR ARRAY AND METHOD FOR FORMING THE SAMEFebruary 2023July 2023Allow500NoNo
18163252SEMICONDUCTOR PACKAGESFebruary 2023May 2024Allow1610NoNo
18102661Integrated Assemblies and Methods Forming Integrated AssembliesJanuary 2023November 2025Allow3421NoNo
18098960SEMICONDUCTOR DEVICEJanuary 2023January 2026Allow3610NoNo
18154218DIELECTRIC THIN-FILM STRUCTURE AND ELECTRONIC DEVICE INCLUDING THE SAMEJanuary 2023November 2023Allow1010NoNo
18151825THIN FILM TRANSISTOR ARRAY SUBSTRATE AND ORGANIC LIGHT-EMITTING DISPLAY DEVICE INCLUDING THE SAMEJanuary 2023July 2023Allow600NoNo
18093948INTEGRATED CIRCUIT DEVICES AND METHODS OF MANUFACTURING THE SAMEJanuary 2023October 2023Allow1000NoNo
18092162MULTISTACK METAL-INSULATOR-METAL (MIM) STRUCTURE USING SPACER FORMATION PROCESS FOR HETEROGENEOUS INTEGRATION WITH DISCRETE CAPACITORSDecember 2022December 2025Allow3610YesNo
18148327MOLDED DIRECT BONDED AND INTERCONNECTED STACKDecember 2022October 2023Allow910NoNo
18147289SEMICONDUCTOR DEVICE INCLUDING DIELECTRIC LAYER AND METHOD OF FORMING THE SAMEDecember 2022October 2025Allow3310YesNo
18012553THIN FILM CAPACITOR, ITS MANUFACTURING METHOD, AND ELECTRONIC CIRCUIT SUBSTRATE HAVING THE THIN FILM CAPACITORDecember 2022May 2025Allow2800NoNo
18085530MICRO ELEMENT STRUCTURE AND DISPLAY DEVICEDecember 2022July 2025Allow3110NoNo
18083731DISPLAY DEVICEDecember 2022August 2025Allow3210NoNo
18084431ELECTROMAGNETIC SHIELDING STRUCTUREDecember 2022January 2026Allow3710YesNo
18067352METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICEDecember 2022July 2025Allow3111NoNo
18079901SEMICONDUCTOR DEVICEDecember 2022August 2023Allow810NoNo
18078100SEMICONDUCTOR MEMORY DEVICEDecember 2022November 2023Allow1110NoNo
18076780TRENCH PATTERN FOR TRENCH CAPACITOR YIELD IMPROVEMENTDecember 2022August 2023Allow910NoNo
18062152SEMICONDUCTOR DEVICES WITH DISSIMLAR MATERIALS AND METHODSDecember 2022July 2023Allow810NoNo
17993943SEMICONDUCTOR DEVICENovember 2022September 2025Allow3301NoNo

Appeals Overview

This analysis examines appeal outcomes and the strategic value of filing appeals for examiner DIAZ, JOSE R.

Patent Trial and Appeal Board (PTAB) Decisions

Total PTAB Decisions
10
Examiner Affirmed
9
(90.0%)
Examiner Reversed
1
(10.0%)
Reversal Percentile
23.4%
Lower than average

What This Means

With a 10.0% reversal rate, the PTAB affirms the examiner's rejections in the vast majority of cases. This reversal rate is in the bottom 25% across the USPTO, indicating that appeals face significant challenges here.

Strategic Value of Filing an Appeal

Total Appeal Filings
40
Allowed After Appeal Filing
7
(17.5%)
Not Allowed After Appeal Filing
33
(82.5%)
Filing Benefit Percentile
21.2%
Lower than average

Understanding Appeal Filing Strategy

Filing a Notice of Appeal can sometimes lead to allowance even before the appeal is fully briefed or decided by the PTAB. This occurs when the examiner or their supervisor reconsiders the rejection during the mandatory appeal conference (MPEP § 1207.01) after the appeal is filed.

In this dataset, 17.5% of applications that filed an appeal were subsequently allowed. This appeal filing benefit rate is in the bottom 25% across the USPTO, indicating that filing appeals is less effective here than in most other areas.

Strategic Recommendations

Appeals to PTAB face challenges. Ensure your case has strong merit before committing to full Board review.

Filing a Notice of Appeal shows limited benefit. Consider other strategies like interviews or amendments before appealing.

Examiner DIAZ, JOSE R - Prosecution Strategy Guide

Executive Summary

Examiner DIAZ, JOSE R works in Art Unit 2815 and has examined 1,198 patent applications in our dataset. With an allowance rate of 83.1%, this examiner has an above-average tendency to allow applications. Applications typically reach final disposition in approximately 25 months.

Allowance Patterns

Examiner DIAZ, JOSE R's allowance rate of 83.1% places them in the 57% percentile among all USPTO examiners. This examiner has an above-average tendency to allow applications.

Office Action Patterns

On average, applications examined by DIAZ, JOSE R receive 1.79 office actions before reaching final disposition. This places the examiner in the 40% percentile for office actions issued. This examiner issues fewer office actions than average, which may indicate efficient prosecution or a more lenient examination style.

Prosecution Timeline

The median time to disposition (half-life) for applications examined by DIAZ, JOSE R is 25 months. This places the examiner in the 80% percentile for prosecution speed. Applications move through prosecution relatively quickly with this examiner.

Interview Effectiveness

Conducting an examiner interview provides a +7.3% benefit to allowance rate for applications examined by DIAZ, JOSE R. This interview benefit is in the 36% percentile among all examiners. Recommendation: Interviews provide a below-average benefit with this examiner.

Request for Continued Examination (RCE) Effectiveness

When applicants file an RCE with this examiner, 29.8% of applications are subsequently allowed. This success rate is in the 57% percentile among all examiners. Strategic Insight: RCEs show above-average effectiveness with this examiner. Consider whether your amendments or new arguments are strong enough to warrant an RCE versus filing a continuation.

After-Final Amendment Practice

This examiner enters after-final amendments leading to allowance in 33.7% of cases where such amendments are filed. This entry rate is in the 50% percentile among all examiners. Strategic Recommendation: This examiner shows above-average receptiveness to after-final amendments. If your amendments clearly overcome the rejections and do not raise new issues, consider filing after-final amendments before resorting to an RCE.

Pre-Appeal Conference Effectiveness

When applicants request a pre-appeal conference (PAC) with this examiner, 114.3% result in withdrawal of the rejection or reopening of prosecution. This success rate is in the 80% percentile among all examiners. Strategic Recommendation: Pre-appeal conferences are highly effective with this examiner compared to others. Before filing a full appeal brief, strongly consider requesting a PAC. The PAC provides an opportunity for the examiner and supervisory personnel to reconsider the rejection before the case proceeds to the PTAB.

Appeal Withdrawal and Reconsideration

This examiner withdraws rejections or reopens prosecution in 73.7% of appeals filed. This is in the 62% percentile among all examiners. Of these withdrawals, 71.4% occur early in the appeal process (after Notice of Appeal but before Appeal Brief). Strategic Insight: This examiner shows above-average willingness to reconsider rejections during appeals. The mandatory appeal conference (MPEP § 1207.01) provides an opportunity for reconsideration.

Petition Practice

When applicants file petitions regarding this examiner's actions, 49.4% are granted (fully or in part). This grant rate is in the 45% percentile among all examiners. Strategic Note: Petitions show below-average success regarding this examiner's actions. Ensure you have a strong procedural basis before filing.

Examiner Cooperation and Flexibility

Examiner's Amendments: This examiner makes examiner's amendments in 6.5% of allowed cases (in the 89% percentile). Per MPEP § 1302.04, examiner's amendments are used to place applications in condition for allowance when only minor changes are needed. This examiner frequently uses this tool compared to other examiners, indicating a cooperative approach to getting applications allowed. Strategic Insight: If you are close to allowance but minor claim amendments are needed, this examiner may be willing to make an examiner's amendment rather than requiring another round of prosecution.

Quayle Actions: This examiner issues Ex Parte Quayle actions in 4.2% of allowed cases (in the 78% percentile). Per MPEP § 714.14, a Quayle action indicates that all claims are allowable but formal matters remain. This examiner frequently uses Quayle actions compared to other examiners, which is a positive indicator that once substantive issues are resolved, allowance follows quickly.

Prosecution Strategy Recommendations

Based on the statistical analysis of this examiner's prosecution patterns, here are tailored strategic recommendations:

  • Request pre-appeal conferences: PACs are highly effective with this examiner. Before filing a full appeal brief, request a PAC to potentially resolve issues without full PTAB review.
  • Examiner cooperation: This examiner frequently makes examiner's amendments to place applications in condition for allowance. If you are close to allowance, the examiner may help finalize the claims.

Relevant MPEP Sections for Prosecution Strategy

  • MPEP § 713.10: Examiner interviews - available before Notice of Allowance or transfer to PTAB
  • MPEP § 714.12: After-final amendments - may be entered "under justifiable circumstances"
  • MPEP § 1002.02(c): Petitionable matters to Technology Center Director
  • MPEP § 1004: Actions requiring primary examiner signature (allowances, final rejections, examiner's answers)
  • MPEP § 1207.01: Appeal conferences - mandatory for all appeals
  • MPEP § 1214.07: Reopening prosecution after appeal

Important Disclaimer

Not Legal Advice: The information provided in this report is for informational purposes only and does not constitute legal advice. You should consult with a qualified patent attorney or agent for advice specific to your situation.

No Guarantees: We do not provide any guarantees as to the accuracy, completeness, or timeliness of the statistics presented above. Patent prosecution statistics are derived from publicly available USPTO data and are subject to data quality limitations, processing errors, and changes in USPTO practices over time.

Limitation of Liability: Under no circumstances will IronCrow AI be liable for any outcome, decision, or action resulting from your reliance on the statistics, analysis, or recommendations presented in this report. Past prosecution patterns do not guarantee future results.

Use at Your Own Risk: While we strive to provide accurate and useful prosecution statistics, you should independently verify any information that is material to your prosecution strategy and use your professional judgment in all patent prosecution matters.