USPTO Examiner ONUTA TIBERIU DAN - Art Unit 2814

Recent Applications

Detailed information about the 100 most recent patent applications.

Application NumberTitleFiling DateDisposal DateDispositionTime (months)Office ActionsRestrictionsInterviewAppeal
18760244Memory Arrays Comprising Strings Of Memory Cells With Conductive IslandsJuly 2024May 2025Allow1010NoNo
18758386DISPLAY DEVICE WITH SLITS AND ISLAND-SHAPED PROTRUDING PORTIONS IN THE BENDING REGIONSJune 2024February 2025Allow700NoNo
18744359PIXEL WITH AN IMPROVED QUANTUM EFFICIENCY HAVING A MICRO-LENS AND A DIFFRACTIVE STRUCTUREJune 2024February 2025Allow800NoNo
17908298Manufacturing Method of Semiconductor Structure and Semiconductor Structure with Different Functional RegionsAugust 2022April 2025Allow3200NoNo
17846125SEMICONDUCTOR STRUCTURE AND METHOD FOR PREPARING SAMEJune 2022June 2024Allow2300NoNo
17783207DISPLAY PANEL AND METHOD FOR MANUFACTURING A DISPLAY PANEL HAVING A TILED SCREEN WITH A FAN-OUT LEAD REGIONJune 2022April 2025Allow3410NoNo
17779828EDGE REMOVAL FOR THROUGH-RESIST PLATING IN AN ELECTRO-PLATING CUP ASSEMBLYMay 2022February 2025Allow3311NoNo
17725413SEMICONDUCTOR STRUCTURE AND METHOD OF MANUFACTURING SAMEApril 2022April 2024Allow2421NoNo
17722198UNIT PIXEL FOR RED-GREEN-CYAN-BLUE (RGCB) MICRO-DISPLAY HAVING VERTICALLY STACKED SUB-PIXELSApril 2022January 2025Allow3301NoNo
17658098DISPLAY DEVICE INCLUDING A DAM AND HAVING AN OUTER VIA FACING THE DISPLAY AREAApril 2022April 2025Allow3611NoNo
17710647PACKAGE STRUCTURE, OPTICAL STRUCTURE AND METHOD FOR MANUFACTURING THE SAMEMarch 2022March 2024Allow2301NoNo
17709821REWORKING PROCESS OF A FAILED HARD MASK FOR FABRICATING A SEMICONDUCTOR DEVICEMarch 2022March 2025Allow3511NoNo
17710201FLIP CHIP PACKAGE ASSEMBLY HAVING POST CONNECTS WITH SOLDER-BASED JOINTSMarch 2022December 2024Allow3311NoNo
17700940DISPLAY APPARATUS HAVING GROOVES AND BRIDGES AT THE BOUNDARIES BETWEEN ADJACENT PIXELSMarch 2022March 2025Allow3601NoNo
17762147DISPLAY SUBSTRATE WITH MULTIPLE VIA HOLES, ELECTRONIC DEVICE, AND METHOD OF MANUFACTURING THE DISPLAY SUBSTRATEMarch 2022March 2025Allow3610NoNo
17642511METHOD FOR MANUFACTURING A BACKSIDE ILLUMINATION OPTICAL SENSOR WITH IMPROVED DETECTION PARAMETERSMarch 2022June 2025Allow4020NoNo
17639531ELEMENT AND ELECTRONIC DEVICE HAVING A MIXED LAYER OF QUANTUM DOTS AND NANOPARTICLESMarch 2022November 2024Allow3310NoNo
17674459Semiconductor Device with Integrated Metal-Insulator-Metal CapacitorsFebruary 2022January 2025Allow3520NoNo
17674685SEMICONDUCTOR DIE ASSEMBLIES WITH FLEXIBLE INTERCONNECTS AND ASSOCIATED METHODS AND SYSTEMSFebruary 2022February 2025Abandon3611NoNo
17584481DISPLAY DEVICE AND MANUFACTURING METHOD THEREFORJanuary 2022August 2024Allow3101NoNo
17597698ARRAYS OF LED STRUCTURES EXTENDING THROUGH HOLES IN A DIELECTRIC LAYER AND INDEPENDENTLY ACTIVATEDJanuary 2022January 2025Allow3611YesNo
17560495INTEGRATED CIRCUIT DEVICE WITH THROUGH-ELECTRODE AND ELECTRODE LANDING PAD, AND SEMICONDUCTOR PACKAGE INCLUDING THE SAMEDecember 2021February 2025Allow3721YesNo
17645424ELECTRONIC PACKAGE WITH VARYING INTERCONNECTSDecember 2021October 2024Allow3430YesNo
17617306BALL PLACEMENT STRUCTURE AND PREPARATION PROCESS THEREOFDecember 2021July 2024Abandon3101NoNo
17615823PACKAGE STRUCTURE AND FORMING METHOD THEREOFDecember 2021October 2024Abandon3411NoNo
17538100DISPLAY DEVICENovember 2021June 2024Allow3100NoNo
17598871SEMICONDUCTOR DEVICE, POWER CONVERTER, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICESeptember 2021April 2024Allow3101NoNo
17598166DISPLAY DEVICE AND METHOD FOR MANUFACTURING SAMESeptember 2021April 2024Allow3101NoNo
17479190Method for Producing a Structured Wavelength Conversion Layer and Optoelectronic Device with a Structured Wavelength Conversion LayerSeptember 2021January 2025Allow4040NoNo
17477332IMAGE SENSOR FOR THE VISIBLE AND INFRARED RANGE HAVING AN ABSORBING LAYER STACKSeptember 2021October 2024Allow3720NoNo
17593341DISPLAY PANEL AND DISPLAY DEVICESeptember 2021November 2024Allow3820NoNo
17470379SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOFSeptember 2021August 2024Abandon3510NoNo
17471049PIXEL WITH AN IMPROVED QUANTUM EFFICIENCYSeptember 2021March 2024Allow3010NoNo
17464874Ball grid array for a semiconductor integrated circuit deviceSeptember 2021November 2024Allow3801NoNo
17461803HETEROJUNCTION BIPOLAR TRANSISTOR AND METHOD OF MAKING THE SAMEAugust 2021April 2025Abandon4321NoNo
17445723METHOD FOR CONVEYING HIGH FREQUENCY MODULE AND A HIGH-FREQUENCY MODULEAugust 2021January 2025Abandon4110NoNo
17409695SOLID-STATE IMAGING APPARATUSAugust 2021September 2024Abandon3620NoNo
17409434Memory Arrays Comprising Strings Of Memory Cells And Methods Used In Forming A Memory Array Comprising Strings Of Memory CellsAugust 2021February 2024Allow3001NoNo
17409681NONVOLATILE MEMORY DEVICE WITH OPENINGS IN THE SUBSTRATE AND NONVOLATILE MEMORY SYSTEM INCLUDING THE SAMEAugust 2021January 2025Allow4111YesNo
17430760IMAGING ELEMENT AND IMAGING DEVICEAugust 2021May 2024Allow3301NoNo
17430673DISPLAY PANEL, METHOD FOR MANUFACTURING THE SAME AND DISPLAY DEVICEAugust 2021April 2024Allow3201YesNo
17428990SILICON CARBIDE SEMICONDUCTOR DEVICE, POWER CONVERSION DEVICE, AND MANUFACTURING METHOD OF SILICON CARBIDE SEMICONDUCTOR DEVICEAugust 2021February 2024Allow3101NoNo
17420505IMAGING DEVICE AND ELECTRONIC APPARATUSJuly 2021August 2024Allow3811NoNo
17296358THIN FILM TRANSISTOR ARRAY HAVING A STACKED MULTI-LAYER METAL OXIDE CHANNEL FORMATION REGIONMay 2021December 2024Allow4321NoNo
16956374PROCESS FOR MAKING A NITRIDE LAYER BY FILM COALESCENCE FROM ETCHED PADSFebruary 2021August 2024Allow4911NoNo
17265160OPTOELECTRONIC SEMICONDUCTOR COMPONENT AND METHOD FOR PRODUCING AN OPTOELECTRONIC SEMICONDUCTOR COMPONENTFebruary 2021July 2024Abandon4101NoNo
17265057DISPLAY PANEL, METHOD OF MANUFACTURING THE SAME AND DISPLAY DEVICEFebruary 2021September 2024Allow4311NoNo
17263983DISPLAY PANEL, MANUFACTURING METHOD THEREOF AND DISPLAY DEVICEJanuary 2021December 2024Abandon4611NoNo
17041811DISPLAY PANEL AND MANUFACTURING METHOD THEREOF, DISPLAY APPARATUSSeptember 2020October 2024Allow4821NoNo
17031819STACKED DIE AND VR CHIPLET WITH DUAL-SIDED AND UNIDIRECTIONAL CURRENT FLOWSeptember 2020April 2025Abandon5521NoNo

Appeals Overview

No appeal data available for this record. This may indicate that no appeals have been filed or decided for applications in this dataset.

Examiner ONUTA, TIBERIU DAN - Prosecution Strategy Guide

Executive Summary

Examiner ONUTA, TIBERIU DAN works in Art Unit 2814 and has examined 47 patent applications in our dataset. With an allowance rate of 78.7%, this examiner has a below-average tendency to allow applications. Applications typically reach final disposition in approximately 35 months.

Allowance Patterns

Examiner ONUTA, TIBERIU DAN's allowance rate of 78.7% places them in the 40% percentile among all USPTO examiners. This examiner has a below-average tendency to allow applications.

Office Action Patterns

On average, applications examined by ONUTA, TIBERIU DAN receive 1.00 office actions before reaching final disposition. This places the examiner in the 13% percentile for office actions issued. This examiner issues significantly fewer office actions than most examiners.

Prosecution Timeline

The median time to disposition (half-life) for applications examined by ONUTA, TIBERIU DAN is 35 months. This places the examiner in the 20% percentile for prosecution speed. Applications take longer to reach final disposition with this examiner compared to most others.

Interview Effectiveness

Conducting an examiner interview provides a +23.8% benefit to allowance rate for applications examined by ONUTA, TIBERIU DAN. This interview benefit is in the 73% percentile among all examiners. Recommendation: Interviews provide an above-average benefit with this examiner and are worth considering.

Request for Continued Examination (RCE) Effectiveness

When applicants file an RCE with this examiner, 37.5% of applications are subsequently allowed. This success rate is in the 82% percentile among all examiners. Strategic Insight: RCEs are highly effective with this examiner compared to others. If you receive a final rejection, filing an RCE with substantive amendments or arguments has a strong likelihood of success.

After-Final Amendment Practice

This examiner enters after-final amendments leading to allowance in 58.3% of cases where such amendments are filed. This entry rate is in the 81% percentile among all examiners. Strategic Recommendation: This examiner is highly receptive to after-final amendments compared to other examiners. Per MPEP § 714.12, after-final amendments may be entered "under justifiable circumstances." Consider filing after-final amendments with a clear showing of allowability rather than immediately filing an RCE, as this examiner frequently enters such amendments.

Petition Practice

When applicants file petitions regarding this examiner's actions, 0.0% are granted (fully or in part). This grant rate is in the 3% percentile among all examiners. Strategic Note: Petitions are rarely granted regarding this examiner's actions compared to other examiners. Ensure you have a strong procedural basis before filing a petition, as the Technology Center Director typically upholds this examiner's decisions.

Examiner Cooperation and Flexibility

Examiner's Amendments: This examiner makes examiner's amendments in 0.0% of allowed cases (in the 22% percentile). This examiner rarely makes examiner's amendments compared to other examiners. You should expect to make all necessary claim amendments yourself through formal amendment practice.

Quayle Actions: This examiner issues Ex Parte Quayle actions in 5.4% of allowed cases (in the 80% percentile). Per MPEP § 714.14, a Quayle action indicates that all claims are allowable but formal matters remain. This examiner frequently uses Quayle actions compared to other examiners, which is a positive indicator that once substantive issues are resolved, allowance follows quickly.

Prosecution Strategy Recommendations

Based on the statistical analysis of this examiner's prosecution patterns, here are tailored strategic recommendations:

  • Consider after-final amendments: This examiner frequently enters after-final amendments. If you can clearly overcome rejections with claim amendments, file an after-final amendment before resorting to an RCE.
  • RCEs are effective: This examiner has a high allowance rate after RCE compared to others. If you receive a final rejection and have substantive amendments or arguments, an RCE is likely to be successful.
  • Plan for extended prosecution: Applications take longer than average with this examiner. Factor this into your continuation strategy and client communications.

Relevant MPEP Sections for Prosecution Strategy

  • MPEP § 713.10: Examiner interviews - available before Notice of Allowance or transfer to PTAB
  • MPEP § 714.12: After-final amendments - may be entered "under justifiable circumstances"
  • MPEP § 1002.02(c): Petitionable matters to Technology Center Director
  • MPEP § 1004: Actions requiring primary examiner signature (allowances, final rejections, examiner's answers)
  • MPEP § 1207.01: Appeal conferences - mandatory for all appeals
  • MPEP § 1214.07: Reopening prosecution after appeal

Important Disclaimer

Not Legal Advice: The information provided in this report is for informational purposes only and does not constitute legal advice. You should consult with a qualified patent attorney or agent for advice specific to your situation.

No Guarantees: We do not provide any guarantees as to the accuracy, completeness, or timeliness of the statistics presented above. Patent prosecution statistics are derived from publicly available USPTO data and are subject to data quality limitations, processing errors, and changes in USPTO practices over time.

Limitation of Liability: Under no circumstances will IronCrow AI be liable for any outcome, decision, or action resulting from your reliance on the statistics, analysis, or recommendations presented in this report. Past prosecution patterns do not guarantee future results.

Use at Your Own Risk: While we strive to provide accurate and useful prosecution statistics, you should independently verify any information that is material to your prosecution strategy and use your professional judgment in all patent prosecution matters.