Detailed information about the 100 most recent patent applications.
| Application Number | Title | Filing Date | Disposal Date | Disposition | Time (months) | Office Actions | Restrictions | Interview | Appeal |
|---|---|---|---|---|---|---|---|---|---|
| 18663423 | ALEFT-ISD-LTSEE{Advanced Low Electrostatic Field Transistor Using Implanted S/D and Low Temperature Selective Epitaxial Extension} | May 2024 | January 2025 | Allow | 9 | 3 | 0 | Yes | No |
| 18626720 | BIPOLAR TRANSISTOR | April 2024 | March 2025 | Allow | 11 | 1 | 1 | No | No |
| 18544100 | INTERCONNECT STRUCTURE WITH LOW CAPACITANCE AND HIGH THERMAL CONDUCTIVITY | December 2023 | April 2024 | Allow | 4 | 0 | 1 | No | No |
| 18460138 | Devices and methods for compact radiation-hardened integrated circuits | September 2023 | November 2023 | Allow | 2 | 1 | 0 | No | No |
| 18360804 | SEMICONDUCTOR STRUCTURE AND MANUFACTURING METHOD FOR THE SEMICONDUCTOR STRUCTURE | July 2023 | April 2025 | Allow | 20 | 1 | 0 | No | No |
| 18360544 | FinFET SRAM Cells With Dielectric Fins | July 2023 | June 2025 | Allow | 23 | 1 | 0 | No | No |
| 18357864 | POST GATE DIELECTRIC PROCESSING FOR SEMICONDUCTOR DEVICE FABRICATION | July 2023 | June 2025 | Allow | 22 | 1 | 0 | No | No |
| 18344529 | MEMORY DEVICE AND METHOD FOR FORMING THE SAME | June 2023 | June 2025 | Allow | 24 | 1 | 0 | No | No |
| 18342146 | Semiconductor Device and Method | June 2023 | December 2024 | Allow | 18 | 0 | 0 | No | No |
| 18340454 | INTEGRATED CIRCUIT STRUCTURE | June 2023 | June 2025 | Allow | 24 | 1 | 0 | No | No |
| 18311992 | METHOD OF FORMING SEMICONDUCTOR DEVICE STRUCTURE WITH GATE STRUCTURE | May 2023 | March 2025 | Allow | 23 | 1 | 0 | No | No |
| 18301534 | EPITAXIAL SOURCE/DRAIN FEATURE WITH ENLARGED LOWER SECTION INTERFACING WITH BACKSIDE VIA | April 2023 | June 2025 | Allow | 26 | 2 | 0 | Yes | No |
| 18178232 | FETS AND METHODS OF FORMING FETS | March 2023 | April 2025 | Allow | 25 | 1 | 0 | Yes | No |
| 18163692 | Devices and methods for compact radiation-hardened integrated circuits | February 2023 | August 2023 | Allow | 6 | 0 | 1 | Yes | No |
| 18154463 | MEMORY DEVICE AND METHOD FOR FORMING THE SAME | January 2023 | March 2025 | Allow | 26 | 1 | 0 | No | No |
| 18093751 | UNIT PIXEL OF IMAGE SENSOR AND LIGHT-RECEIVING ELEMENT THEREOF | January 2023 | February 2025 | Allow | 25 | 1 | 0 | No | No |
| 18079171 | Gate Electrode Deposition and Structure Formed Thereby | December 2022 | February 2025 | Allow | 26 | 1 | 0 | Yes | No |
| 18075396 | SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME | December 2022 | February 2025 | Allow | 27 | 2 | 0 | No | No |
| 18074317 | SILICIDE BACKSIDE CONTACT | December 2022 | April 2025 | Allow | 28 | 0 | 0 | No | No |
| 18070302 | GATE-ALL-AROUND INTEGRATED CIRCUIT STRUCTURES HAVING HIGH MOBILITY | November 2022 | March 2025 | Allow | 27 | 1 | 0 | No | No |
| 17978038 | VERTICAL INTEGRATION SCHEME AND CIRCUIT ELEMENTS ARCHITECTURE FOR AREA SCALING OF SEMICONDUCTOR DEVICES | October 2022 | January 2025 | Allow | 27 | 1 | 0 | No | No |
| 17962327 | SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF | October 2022 | March 2025 | Allow | 29 | 1 | 0 | No | No |
| 17946043 | ORGANIC LIGHT EMITTING DIODE DISPLAY AND MANUFACTURING METHOD THEREOF | September 2022 | October 2024 | Allow | 25 | 0 | 0 | No | No |
| 17897450 | STACKED PACKAGE STRUCTURE AND STACKED PACKAGING METHOD FOR CHIP | August 2022 | May 2025 | Allow | 33 | 2 | 0 | No | No |
| 17818175 | SEMICONDUCTOR BIOSENSOR | August 2022 | September 2024 | Allow | 25 | 1 | 0 | No | No |
| 17815302 | CUT EPI PROCESS AND STRUCTURES | July 2022 | September 2024 | Allow | 26 | 1 | 0 | No | No |
| 17874031 | P-Metal Gate First Gate Replacement Process for Multigate Devices | July 2022 | October 2024 | Allow | 27 | 1 | 0 | No | No |
| 17874045 | MEMORY DEVICE AND METHOD FOR FORMING THE SAME | July 2022 | August 2024 | Allow | 25 | 1 | 0 | No | No |
| 17873203 | SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF | July 2022 | July 2024 | Allow | 24 | 1 | 0 | No | No |
| 17873353 | Semiconductor Device and Method | July 2022 | September 2024 | Allow | 26 | 1 | 0 | No | No |
| 17873832 | SEMICONDUCTOR DEVICES AND METHODS OF MANUFACTURING THEREOF | July 2022 | October 2024 | Allow | 27 | 1 | 0 | No | No |
| 17872623 | CUT METAL GATE REFILL WITH VOID | July 2022 | August 2024 | Allow | 25 | 1 | 0 | No | No |
| 17814779 | Fin-End Gate Structures and Method Forming Same | July 2022 | November 2024 | Allow | 28 | 1 | 0 | No | No |
| 17869995 | SEMICONDUCTOR DEVICES AND METHODS OF MANUFACTURING THEREOF | July 2022 | August 2024 | Allow | 25 | 1 | 0 | No | No |
| 17870695 | MAGNETIC TUNNEL JUNCTION STRUCTURES AND RELATED METHODS | July 2022 | October 2024 | Allow | 27 | 2 | 0 | Yes | No |
| 17870133 | SEMICONDUCTOR STRUCTURE | July 2022 | September 2024 | Allow | 26 | 1 | 0 | No | No |
| 17813850 | Forming Isolation Regions for Separating Fins and Gate Stacks | July 2022 | February 2024 | Allow | 19 | 1 | 0 | No | No |
| 17813793 | Non-Conformal Capping Layer and Method Forming Same | July 2022 | March 2024 | Allow | 20 | 1 | 0 | No | No |
| 17846253 | DISPLAY DEVICE | June 2022 | February 2024 | Allow | 19 | 1 | 0 | No | No |
| 17844533 | SHALLOW TRENCH ISOLATION (STI) CONTACT STRUCTURES AND METHODS OF FORMING SAME | June 2022 | April 2024 | Allow | 21 | 1 | 0 | No | No |
| 17838785 | Adjusting Work Function Through Adjusting Deposition Temperature | June 2022 | February 2024 | Allow | 20 | 1 | 0 | No | No |
| 17751618 | MINIMIZATION OF SILICON GERMANIUM FACETS IN PLANAR METAL OXIDE SEMICONDUCTOR STRUCTURES | May 2022 | April 2024 | Allow | 22 | 1 | 1 | No | No |
| 17747174 | THREE-DIMENSIONAL SEMICONDUCTOR DEVICE | May 2022 | September 2023 | Allow | 16 | 0 | 0 | No | No |
| 17741123 | INTEGRATED CIRCUIT STRUCTURE WITH SEMICONDUCTOR DEVICES AND METHOD OF FABRICATING THE SAME | May 2022 | December 2023 | Allow | 19 | 1 | 0 | No | No |
| 17739708 | Semiconductor Device and Method of Manufacture | May 2022 | January 2024 | Allow | 20 | 1 | 0 | No | No |
| 17734379 | SEMICONDUCTOR DEVICE WITH IMPROVED DEVICE PERFORMANCE | May 2022 | January 2024 | Allow | 20 | 1 | 0 | No | No |
| 17753719 | SEMICONDUCTOR DEVICE | March 2022 | October 2024 | Allow | 31 | 1 | 0 | No | No |
| 17692041 | Integrated Assemblies Comprising Conductive Levels Having Two Different Metal-Containing Structures Laterally Adjacent One Another, and Methods of Forming Integrated Assemblies | March 2022 | October 2023 | Allow | 19 | 2 | 0 | No | No |
| 17651916 | MICROLENSES FOR SEMICONDUCTOR DEVICE WITH SINGLE-PHOTON AVALANCHE DIODE PIXELS | February 2022 | November 2023 | Allow | 21 | 1 | 0 | No | No |
| 17676695 | SEMICONDUCTOR STRUCTURE AND MANUFACTURING METHOD FOR THE SEMICONDUCTOR STRUCTURE | February 2022 | May 2023 | Allow | 15 | 0 | 0 | No | No |
| 17650950 | Semiconductor Structure and Manufacturing Method Thereof | February 2022 | April 2025 | Allow | 38 | 3 | 0 | Yes | No |
| 17650553 | SEMICONDUCTOR DEVICE AND METHODS OF FORMATION | February 2022 | June 2025 | Allow | 40 | 1 | 0 | No | No |
| 17649425 | Semiconductor Device and Method | January 2022 | November 2023 | Allow | 22 | 2 | 0 | Yes | No |
| 17584883 | SEMICONDUCTOR STRUCTURE AND FABRICATION METHOD THEREOF | January 2022 | April 2025 | Allow | 39 | 0 | 1 | No | No |
| 17559821 | INTEGRATED CIRCUIT INCLUDING TRANSISTORS HAVING A COMMON BASE | December 2021 | September 2023 | Allow | 21 | 1 | 0 | No | No |
| 17550383 | FET DEVICE AND A METHOD FOR FORMING A FET DEVICE | December 2021 | February 2025 | Allow | 38 | 2 | 1 | No | No |
| 17547072 | SEMICONDUCTOR DEVICE AND METHOD OF FORMING THE SAME | December 2021 | September 2024 | Allow | 33 | 1 | 1 | No | No |
| 17537341 | LIGHT EMITTING DIODE HAVING SIDE REFLECTION LAYER | November 2021 | November 2023 | Allow | 23 | 1 | 0 | No | No |
| 17531837 | BURIED POWER RAIL AFTER REPLACEMENT METAL GATE | November 2021 | June 2025 | Allow | 43 | 1 | 1 | Yes | No |
| 17531726 | METHODS OF FORMING BOTTOM DIELECTRIC ISOLATION LAYERS | November 2021 | October 2024 | Allow | 35 | 1 | 0 | No | No |
| 17524830 | HYBRID FILM SCHEME FOR SELF-ALIGNED CONTACT | November 2021 | May 2025 | Allow | 42 | 1 | 0 | No | No |
| 17520967 | METHOD FOR FORMING SEMICONDUCTOR STRUCTURE | November 2021 | March 2025 | Allow | 40 | 1 | 0 | Yes | No |
| 17521011 | METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE | November 2021 | September 2023 | Allow | 22 | 1 | 0 | Yes | No |
| 17511647 | STACKED FIELD EFFECT TRANSISTOR WITH WRAP-AROUND CONTACTS | October 2021 | October 2023 | Allow | 24 | 2 | 0 | No | No |
| 17502554 | SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME | October 2021 | October 2024 | Allow | 36 | 1 | 1 | Yes | No |
| 17490266 | NANOSHEET TRANSISTORS WITH SELF-ALIGNED GATE CUT | September 2021 | July 2024 | Allow | 33 | 1 | 1 | No | No |
| 17489425 | INTEGRATED CIRCUIT INCLUDING BIPOLAR TRANSISTORS | September 2021 | July 2023 | Allow | 21 | 1 | 0 | No | No |
| 17486219 | GERMANIUM PHOTODIODE | September 2021 | August 2023 | Allow | 23 | 1 | 0 | No | No |
| 17482928 | Stacked FET with Independent Gate Control | September 2021 | October 2024 | Allow | 36 | 1 | 1 | Yes | No |
| 17481537 | STACKED FIELD EFFECT TRANSISTOR DEVICES WITH REPLACEMENT GATE | September 2021 | July 2024 | Allow | 34 | 1 | 0 | No | No |
| 17481204 | FIN-BASED FIELD EFFECT TRANSISTOR (FINFET) DEVICE WITH ENHANCED ON-RESISTANCE AND BREAKDOWN VOLTAGE | September 2021 | July 2024 | Allow | 34 | 1 | 0 | No | No |
| 17479542 | CAPACITOR COMPRISING A BISMUTH METAL OXIDE-BASED LEAD TITANATE THIN FILM | September 2021 | July 2023 | Allow | 22 | 1 | 0 | No | No |
| 17475068 | SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF | September 2021 | May 2024 | Allow | 32 | 1 | 1 | No | No |
| 17460757 | Semiconductor Strutures With Dielectric Fins | August 2021 | May 2025 | Allow | 45 | 1 | 1 | No | No |
| 17460203 | SEMICONDUCTOR DEVICES AND METHODS OF MANUFACTURING THEREOF | August 2021 | February 2025 | Allow | 42 | 1 | 1 | No | No |
| 17460200 | SEMICONDUCTOR DEVICES AND METHODS OF MANUFACTURING THEREOF | August 2021 | May 2024 | Allow | 33 | 1 | 0 | No | No |
| 17458726 | SEMICONDUCTOR DEVICES HAVING A DIELECTRIC EMBEDDED IN SOURCE AND/OR DRAIN | August 2021 | April 2025 | Allow | 43 | 1 | 1 | No | No |
| 17446240 | SEMICONDUCTOR DEVICE AND FABRICATION METHOD THEREOF | August 2021 | March 2024 | Allow | 31 | 1 | 1 | No | No |
| 17458122 | FIN FIELD-EFFECT TRANSISTOR (FINFET) WITH A HIGH-K MATERIAL FIELD-PLATING | August 2021 | February 2025 | Allow | 42 | 1 | 1 | No | No |
| 17411597 | FIELD EFFECT TRANSISTORS WITH BOTTOM DIELECTRIC ISOLATION | August 2021 | December 2024 | Allow | 39 | 3 | 1 | Yes | No |
| 17406395 | SEMICONDUCTOR DEVICE STRUCTURE HAVING DISLOCATION STRESS MEMORIZATION AND METHODS OF FORMING THE SAME | August 2021 | June 2024 | Allow | 34 | 0 | 0 | No | No |
| 17403867 | METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE | August 2021 | July 2024 | Allow | 35 | 2 | 0 | No | No |
| 17395071 | SEMICONDUCTOR DEVICE WITH TRIMMED CHANNEL REGION AND METHOD OF MAKING THE SAME | August 2021 | May 2025 | Allow | 45 | 2 | 1 | No | No |
| 17394982 | SELF-ALIGNED AIR SPACERS AND METHODS FOR FORMING | August 2021 | May 2024 | Allow | 33 | 2 | 1 | No | No |
| 17393584 | DIELECTRIC LAYER ON SEMICONDUCTOR DEVICE AND METHOD OF FORMING THE SAME | August 2021 | February 2025 | Allow | 43 | 2 | 1 | No | No |
| 17393387 | SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME | August 2021 | March 2024 | Allow | 31 | 3 | 1 | No | No |
| 17379104 | FinFET SRAM Cells With Dielectric Fins | July 2021 | May 2023 | Allow | 22 | 1 | 0 | No | No |
| 17375384 | SEMICONDUCTOR DEVICE AND FORMATION METHOD THEREOF | July 2021 | February 2025 | Allow | 43 | 2 | 1 | Yes | No |
| 17370898 | Gate Spacers and Methods of Forming the Same in Semiconductor Devices | July 2021 | December 2023 | Allow | 30 | 1 | 0 | No | No |
| 17369693 | DENSIFIED GATE SPACERS AND FORMATION THEREOF | July 2021 | May 2024 | Allow | 35 | 1 | 1 | No | No |
| 17366530 | SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF | July 2021 | November 2023 | Allow | 28 | 1 | 1 | No | No |
| 17364500 | Semiconductor Device with Gate Isolation Structure and Method for Forming the Same | June 2021 | May 2024 | Allow | 35 | 1 | 1 | No | No |
| 17360349 | THREE-DIMENSIONAL SEMICONDUCTOR MEMORY DEVICES | June 2021 | May 2023 | Allow | 23 | 1 | 0 | Yes | No |
| 17355444 | SEMICONDUCTOR DEVICES AND METHODS OF MANUFACTURING THEREOF | June 2021 | December 2023 | Allow | 30 | 2 | 1 | No | No |
| 17352069 | METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE | June 2021 | August 2024 | Allow | 38 | 1 | 0 | No | No |
| 17350171 | SEMICONDUCTOR DEVICE STRUCTURE WITH CONDUCTIVE VIA STRUCTURE AND METHOD FOR FORMING THE SAME | June 2021 | July 2023 | Allow | 25 | 2 | 0 | No | No |
| 17349183 | LIGHT EMITTING DEVICE | June 2021 | August 2023 | Allow | 26 | 2 | 0 | No | No |
| 17345659 | Integrated Circuit Devices with Well Regions and Methods for Forming the Same | June 2021 | April 2023 | Allow | 22 | 1 | 0 | No | No |
| 17344231 | INTEGRATED HIGH EFFICIENCY TRANSISTOR COOLING | June 2021 | May 2024 | Allow | 35 | 2 | 1 | No | No |
| 17303879 | SEMICONDUCTOR DEVICE LAYOUT STRUCTURE MANUFACTURING METHOD | June 2021 | January 2023 | Allow | 20 | 1 | 0 | No | No |
This analysis examines appeal outcomes and the strategic value of filing appeals for examiner KOO, LAMONT B.
With a 100.0% reversal rate, the PTAB has reversed the examiner's rejections more often than affirming them. This reversal rate is in the top 25% across the USPTO, indicating that appeals are more successful here than in most other areas.
Filing a Notice of Appeal can sometimes lead to allowance even before the appeal is fully briefed or decided by the PTAB. This occurs when the examiner or their supervisor reconsiders the rejection during the mandatory appeal conference (MPEP § 1207.01) after the appeal is filed.
In this dataset, 50.0% of applications that filed an appeal were subsequently allowed. This appeal filing benefit rate is in the top 25% across the USPTO, indicating that filing appeals is particularly effective here. The act of filing often prompts favorable reconsideration during the mandatory appeal conference.
✓ Appeals to PTAB show good success rates. If you have a strong case on the merits, consider fully prosecuting the appeal to a Board decision.
✓ Filing a Notice of Appeal is strategically valuable. The act of filing often prompts favorable reconsideration during the mandatory appeal conference.
Examiner KOO, LAMONT B works in Art Unit 2813 and has examined 369 patent applications in our dataset. With an allowance rate of 94.9%, this examiner allows applications at a higher rate than most examiners at the USPTO. Applications typically reach final disposition in approximately 27 months.
Examiner KOO, LAMONT B's allowance rate of 94.9% places them in the 85% percentile among all USPTO examiners. This examiner is more likely to allow applications than most examiners at the USPTO.
On average, applications examined by KOO, LAMONT B receive 2.08 office actions before reaching final disposition. This places the examiner in the 69% percentile for office actions issued. This examiner issues a slightly above-average number of office actions.
The median time to disposition (half-life) for applications examined by KOO, LAMONT B is 27 months. This places the examiner in the 57% percentile for prosecution speed. Prosecution timelines are slightly faster than average with this examiner.
Conducting an examiner interview provides a -4.9% benefit to allowance rate for applications examined by KOO, LAMONT B. This interview benefit is in the 3% percentile among all examiners. Note: Interviews show limited statistical benefit with this examiner compared to others, though they may still be valuable for clarifying issues.
When applicants file an RCE with this examiner, 27.9% of applications are subsequently allowed. This success rate is in the 40% percentile among all examiners. Strategic Insight: RCEs show below-average effectiveness with this examiner. Carefully evaluate whether an RCE or continuation is the better strategy.
This examiner enters after-final amendments leading to allowance in 25.1% of cases where such amendments are filed. This entry rate is in the 26% percentile among all examiners. Strategic Recommendation: This examiner shows below-average receptiveness to after-final amendments. You may need to file an RCE or appeal rather than relying on after-final amendment entry.
When applicants request a pre-appeal conference (PAC) with this examiner, 0.0% result in withdrawal of the rejection or reopening of prosecution. This success rate is in the 12% percentile among all examiners. Note: Pre-appeal conferences show limited success with this examiner compared to others. While still worth considering, be prepared to proceed with a full appeal brief if the PAC does not result in favorable action.
This examiner withdraws rejections or reopens prosecution in 75.0% of appeals filed. This is in the 61% percentile among all examiners. Of these withdrawals, 33.3% occur early in the appeal process (after Notice of Appeal but before Appeal Brief). Strategic Insight: This examiner shows above-average willingness to reconsider rejections during appeals. The mandatory appeal conference (MPEP § 1207.01) provides an opportunity for reconsideration.
When applicants file petitions regarding this examiner's actions, 36.4% are granted (fully or in part). This grant rate is in the 32% percentile among all examiners. Strategic Note: Petitions show below-average success regarding this examiner's actions. Ensure you have a strong procedural basis before filing.
Examiner's Amendments: This examiner makes examiner's amendments in 0.0% of allowed cases (in the 22% percentile). This examiner rarely makes examiner's amendments compared to other examiners. You should expect to make all necessary claim amendments yourself through formal amendment practice.
Quayle Actions: This examiner issues Ex Parte Quayle actions in 0.0% of allowed cases (in the 28% percentile). This examiner issues Quayle actions less often than average. Allowances may come directly without a separate action for formal matters.
Based on the statistical analysis of this examiner's prosecution patterns, here are tailored strategic recommendations:
Not Legal Advice: The information provided in this report is for informational purposes only and does not constitute legal advice. You should consult with a qualified patent attorney or agent for advice specific to your situation.
No Guarantees: We do not provide any guarantees as to the accuracy, completeness, or timeliness of the statistics presented above. Patent prosecution statistics are derived from publicly available USPTO data and are subject to data quality limitations, processing errors, and changes in USPTO practices over time.
Limitation of Liability: Under no circumstances will IronCrow AI be liable for any outcome, decision, or action resulting from your reliance on the statistics, analysis, or recommendations presented in this report. Past prosecution patterns do not guarantee future results.
Use at Your Own Risk: While we strive to provide accurate and useful prosecution statistics, you should independently verify any information that is material to your prosecution strategy and use your professional judgment in all patent prosecution matters.