Detailed information about the 100 most recent patent applications.
| Application Number | Title | Filing Date | Disposal Date | Disposition | Time (months) | Office Actions | Restrictions | Interview | Appeal |
|---|---|---|---|---|---|---|---|---|---|
| 18928253 | BOND FORCE CONCENTRATOR | October 2024 | March 2025 | Allow | 4 | 1 | 0 | Yes | No |
| 18850628 | ALL-IN-ONE DRY DEVELOPMENT FOR METAL-CONTAINING PHOTORESIST | September 2024 | December 2025 | Allow | 14 | 2 | 0 | Yes | No |
| 18811589 | WAFER WARPAGE REGULATION EPOXY FUNCTIONAL FILM, AND PREPARATION METHOD AND APPLICATION THEREOF | August 2024 | January 2025 | Allow | 5 | 0 | 0 | No | No |
| 18811327 | Manufacturing Process for Lidar System with Individualized Semiconductor Optical Amplifier Dies | August 2024 | May 2025 | Allow | 9 | 1 | 1 | Yes | No |
| 18835123 | PHOTOCURABLE RESIN COMPOSITION CONTAINING SELF-CROSSLINKABLE POLYMER | August 2024 | February 2025 | Allow | 7 | 0 | 0 | No | No |
| 18785179 | METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE | July 2024 | February 2026 | Allow | 18 | 1 | 0 | No | No |
| 18729437 | SURFACE RELIEF WAVEGUIDES WITH HIGH REFRACTIVE INDEX RESIST | July 2024 | October 2024 | Allow | 3 | 0 | 0 | No | No |
| 18771675 | METHOD OF MANUFACTURING EUV PHOTO MASKS | July 2024 | February 2026 | Allow | 19 | 1 | 0 | No | No |
| 18761785 | ANTI-FLARE SEMICONDUCTOR PACKAGES AND RELATED METHODS | July 2024 | May 2025 | Allow | 10 | 1 | 0 | No | No |
| 18756363 | MEMORY ARRAY CIRCUIT AND METHOD OF MANUFACTURING SAME | June 2024 | May 2025 | Allow | 10 | 1 | 0 | No | No |
| 18739882 | Heat Dissipation Structures | June 2024 | May 2025 | Allow | 11 | 1 | 0 | No | No |
| 18738256 | PATTERNING INTERCONNECTS AND OTHER STRUCTURES BY PHOTO-SENSITIZING METHOD | June 2024 | April 2025 | Allow | 10 | 1 | 0 | No | No |
| 18717235 | HERRINGBONE MICROSTRUCTURE SURFACE PATTERN FOR FLEXOGRAPHIC PRINTING PLATES | June 2024 | March 2025 | Allow | 9 | 1 | 0 | No | No |
| 18670390 | Fabric Die to Fabric Die Interconnect for Modularized Integrated Circuit Devices | May 2024 | April 2025 | Allow | 11 | 1 | 0 | No | No |
| 18652551 | APPARATUSES INCLUDING INTERCONNECT STRUCTURES INCLUDING DIELECTRIC MATERIAL SURROUNDED BY CONDUCTIVE MATERIAL, AND RELATED MEMORY DEVICES | May 2024 | March 2025 | Allow | 11 | 1 | 0 | No | No |
| 18649086 | PHOTORESIST LAYER OUTGASSING PREVENTION | April 2024 | April 2025 | Allow | 11 | 1 | 0 | No | No |
| 18644661 | SUBSTRATE PROCESSING MODULE | April 2024 | July 2025 | Allow | 15 | 1 | 0 | No | No |
| 18629384 | Self Aligned Contact Scheme | April 2024 | March 2025 | Allow | 11 | 1 | 0 | No | No |
| 18628111 | UNDERLAYER FOR PHOTORESIST ADHESION AND DOSE REDUCTION | April 2024 | June 2025 | Allow | 14 | 1 | 0 | No | No |
| 18626475 | HEAT TREATMENT DEVICE AND TREATMENT METHOD | April 2024 | February 2025 | Allow | 11 | 1 | 0 | No | No |
| 18605141 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICES | March 2024 | March 2025 | Allow | 12 | 1 | 0 | No | No |
| 18597065 | METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE | March 2024 | February 2025 | Allow | 12 | 1 | 0 | No | No |
| 18587825 | SEMICONDUCTOR DEVICE | February 2024 | February 2025 | Allow | 12 | 1 | 0 | No | No |
| 18582586 | SEMICONDUCTOR DEVICE PACKAGE | February 2024 | November 2024 | Allow | 8 | 1 | 0 | No | No |
| 18429080 | Semiconductor Device with Partial EMI Shielding Removal Using Laser Ablation | January 2024 | December 2024 | Allow | 10 | 1 | 0 | No | No |
| 18401800 | METHOD FOR FORMING AND USING MASK | January 2024 | February 2025 | Allow | 14 | 1 | 0 | No | No |
| 18398152 | LITHOGRAPHY | December 2023 | January 2025 | Allow | 13 | 1 | 0 | No | No |
| 18394133 | METHODS FOR INCREASING THE DENSITY OF HIGH-INDEX NANOIMPRINT LITHOGRAPHY FILMS | December 2023 | November 2024 | Allow | 11 | 1 | 0 | No | No |
| 18543432 | METHOD AND STRUCTURE OF CUT END WITH SELF-ALIGNED DOUBLE PATTERNING | December 2023 | March 2025 | Allow | 15 | 1 | 0 | No | No |
| 18520526 | INPUT AND OUTPUT BLOCKS FOR AN ARRAY OF MEMORY CELLS | November 2023 | December 2024 | Allow | 13 | 0 | 0 | No | No |
| 18511102 | ENLARGING CONTACT AREA AND PROCESS WINDOW FOR A CONTACT VIA | November 2023 | December 2024 | Allow | 13 | 1 | 0 | No | No |
| 18511133 | MEMORY CELL WITH TOP ELECTRODE VIA | November 2023 | December 2024 | Allow | 13 | 1 | 0 | No | No |
| 18505596 | METHOD FOR PREPARING PIXEL DEFINE LAYER | November 2023 | September 2024 | Allow | 10 | 0 | 0 | No | No |
| 18502183 | Sacrificial Layer for Semiconductor Process | November 2023 | September 2024 | Allow | 10 | 1 | 0 | No | No |
| 18495247 | MEASUREMENTS OF STRUCTURES IN PRESENCE OF SIGNAL CONTAMINATIONS | October 2023 | May 2024 | Allow | 7 | 1 | 0 | No | No |
| 18461425 | VERTICAL SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME | September 2023 | July 2025 | Allow | 23 | 1 | 0 | No | No |
| 18455032 | TRICHROME PIXEL LAYOUT | August 2023 | January 2024 | Allow | 5 | 1 | 1 | Yes | No |
| 18446416 | AMBIENT CONTROLLED TWO-STEP THERMAL TREATMENT FOR SPIN-ON COATING LAYER PLANARIZATION | August 2023 | July 2024 | Allow | 11 | 1 | 0 | No | No |
| 18230062 | METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE | August 2023 | July 2024 | Allow | 11 | 1 | 0 | No | No |
| 18363296 | ANTI-FLARE SEMICONDUCTOR PACKAGES AND RELATED METHODS | August 2023 | June 2024 | Allow | 10 | 1 | 0 | No | No |
| 18363289 | ANTI-FLARE SEMICONDUCTOR PACKAGES AND RELATED METHODS | August 2023 | March 2024 | Allow | 8 | 0 | 0 | No | No |
| 18226165 | MASK BLANK, METHOD OF MANUFACTURING IMPRINT MOLD, METHOD OF MANUFACTURING TRANSFER MASK, METHOD OF MANUFACTURING REFLECTIVE MASK, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | July 2023 | March 2024 | Allow | 8 | 1 | 0 | No | No |
| 18358365 | PERIPHERAL CIRCUITRY UNDER ARRAY MEMORY DEVICE AND METHOD OF FABRICATING THEREOF | July 2023 | July 2024 | Allow | 11 | 1 | 0 | No | No |
| 18226151 | METHOD OF MANUFACTURING EUV PHOTO MASKS | July 2023 | May 2024 | Allow | 9 | 1 | 0 | No | No |
| 18224063 | MASK INSPECTION APPARATUS WITH A PLATFORM MODULE | July 2023 | March 2026 | Allow | 32 | 0 | 0 | No | No |
| 18271383 | RESIST UNDERLAYER FILM-FORMING COMPOSITION INCLUDING REACTION PRODUCT OF ACID DIANHYDRIDE | July 2023 | May 2024 | Allow | 10 | 0 | 0 | No | No |
| 18338013 | Isolation Bonding Film for Semiconductor Packages and Methods of Forming the Same | June 2023 | May 2024 | Allow | 11 | 1 | 0 | No | No |
| 18265700 | POWER MODULE | June 2023 | April 2024 | Allow | 10 | 1 | 0 | Yes | No |
| 18331066 | MANUFACTURING METHOD OF ORIGINAL PLATE AND SEMICONDUCTOR DEVICE | June 2023 | December 2023 | Allow | 7 | 0 | 0 | No | No |
| 18037444 | MANUFACTURING METHOD OF FLEXOGRAPHIC PRINTING PLATE AND PRINTING METHOD | May 2023 | January 2025 | Allow | 20 | 0 | 0 | No | No |
| 18197640 | PHOTORESIST DEVELOPER AND METHOD OF DEVELOPING PHOTORESIST | May 2023 | April 2024 | Allow | 11 | 1 | 0 | Yes | No |
| 18196905 | METHOD FOR INTERCONNECTING STACKED SEMICONDUCTOR DEVICES | May 2023 | March 2024 | Allow | 10 | 1 | 0 | No | No |
| 18196219 | METROLOGY OF NANOSHEET SURFACE ROUGHNESS AND PROFILE | May 2023 | March 2025 | Allow | 22 | 0 | 0 | No | No |
| 18195982 | RADIATION HARDENED THIN-FILM TRANSISTORS | May 2023 | February 2024 | Allow | 10 | 1 | 0 | Yes | No |
| 18308901 | MONITOR STRUCTURE FOR PHOTORESIST THICKNESS IN TRENCH | April 2023 | January 2026 | Allow | 33 | 0 | 0 | No | No |
| 18309131 | Patterning Interconnects and Other Structures by Photo-Sensitizing Method | April 2023 | March 2024 | Allow | 10 | 1 | 0 | No | No |
| 18137405 | Fabric Die to Fabric Die Interconnect for Modularized Integrated Circuit Devices | April 2023 | February 2024 | Allow | 10 | 1 | 0 | No | No |
| 18304301 | MEMORY ARRAY CIRCUIT AND METHOD OF MANUFACTURING SAME | April 2023 | February 2024 | Allow | 10 | 1 | 0 | No | No |
| 18136500 | Heat Dissipation Structures | April 2023 | March 2024 | Allow | 11 | 1 | 0 | No | No |
| 18133937 | PELLICLE AND METHOD OF MANUFACTURING THEREOF | April 2023 | February 2026 | Allow | 34 | 1 | 0 | No | No |
| 18248526 | Anti-reflective hard mask composition | April 2023 | October 2025 | Allow | 31 | 0 | 0 | No | No |
| 17784064 | METHOD AND APPARATUS FOR CORRECTING PROXIMITY EFFECT OF ELECTRON BEAM | March 2023 | October 2025 | Allow | 40 | 0 | 0 | No | No |
| 18028984 | RESIST UNDERLAYER FILM-FORMING COMPOSITION COMPRISING FLUOROALKYL GROUP-CONTAINING ORGANIC ACID OR SALT THEREOF | March 2023 | February 2026 | Allow | 35 | 1 | 0 | No | No |
| 18189189 | GUIDING STRUCTURES FOR FABRICATION OF ANGLED FEATURES IN A SEMICONDUCTOR DEVICE | March 2023 | January 2026 | Allow | 34 | 1 | 1 | Yes | No |
| 18027274 | METHOD AND SYSTEM TO DETERMINE AN EXPOSURE TIME AND/OR INTENSITY TO BE USED FOR OBTAINING A DESIRED FEATURE OF A RELIEF STRUCTURE | March 2023 | February 2026 | Allow | 35 | 1 | 0 | No | No |
| 18027093 | OPTIMIZATION OF SCANNER THROUGHPUT AND IMAGING QUALITY FOR A PATTERNING PROCESS | March 2023 | February 2026 | Allow | 35 | 1 | 0 | No | No |
| 18120606 | OPTICAL ELEMENTS INCLUDING PSUEDORANDOM-SHAPED META-ATOMS | March 2023 | January 2026 | Allow | 34 | 0 | 1 | No | No |
| 18245133 | PROJECTION EXPOSURE DEVICE AND PROJECTION EXPOSURE METHOD | March 2023 | September 2025 | Allow | 30 | 0 | 0 | No | No |
| 18025336 | CHEMICAL-RESISTANT PROTECTIVE FILM | March 2023 | February 2026 | Allow | 36 | 1 | 0 | No | No |
| 18179556 | VERTICAL FIELD EFFECT TRANSISTOR WITH CROSSLINK FIN ARRANGEMENT | March 2023 | March 2024 | Allow | 13 | 0 | 0 | No | No |
| 18174619 | PACKAGE SUBSTRATE AND MANUFACTURING METHOD THEREOF | February 2023 | March 2026 | Allow | 37 | 1 | 1 | No | No |
| 18112953 | LOW FORCE LIQUID METAL INTERCONNECT SOLUTIONS | February 2023 | March 2025 | Allow | 25 | 4 | 0 | No | No |
| 18171748 | Optical Construction | February 2023 | September 2025 | Allow | 31 | 0 | 0 | No | No |
| 18171598 | SYSTEM, SOFTWARE APPLICATION, AND METHOD FOR DOSE UNIFORMITY IMPROVEMENT | February 2023 | March 2026 | Allow | 37 | 1 | 1 | No | No |
| 18021905 | RADIATION SOURCE ARRANGEMENT AND METROLOGY DEVICE | February 2023 | September 2025 | Allow | 31 | 1 | 0 | No | No |
| 18020874 | PHOTOSENSITIVE ELEMENT AND METHOD FOR PRODUCING PHOTOSENSITIVE ELEMENT | February 2023 | December 2025 | Allow | 34 | 1 | 0 | No | No |
| 18107043 | METHOD AND APPARATUS FOR MASK REPAIR | February 2023 | December 2025 | Allow | 34 | 1 | 0 | No | No |
| 18166324 | TRICHROME PIXEL LAYOUT | February 2023 | March 2025 | Allow | 25 | 0 | 1 | No | No |
| 18164053 | TARGET PROCESSING DEVICE AND TARGET PROCESSING METHOD | February 2023 | March 2026 | Allow | 37 | 1 | 1 | No | No |
| 18019024 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN FILM, MULTILAYERED PRINTED WIRING BOARD, SEMICONDUCTOR PACKAGE, AND METHOD FOR PRODUCING MULTILAYERED PRINTED WIRING BOARD | January 2023 | January 2026 | Allow | 36 | 1 | 0 | No | No |
| 18103813 | RESIST COMPOSITION AND PATTERN FORMING PROCESS | January 2023 | December 2025 | Allow | 34 | 1 | 0 | No | No |
| 18158781 | ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | January 2023 | December 2025 | Allow | 35 | 1 | 0 | No | No |
| 18005328 | PHOTORESISTS CONTAINING TANTALUM | January 2023 | January 2026 | Abandon | 36 | 1 | 0 | No | No |
| 18151510 | METHOD, APPARATUS AND SYSTEM FOR PROCESSING SEMICONDUCTOR STRUCTURE | January 2023 | December 2025 | Allow | 35 | 1 | 1 | No | No |
| 18150517 | Multi-Layered Metal Frame Power Package | January 2023 | September 2025 | Allow | 33 | 1 | 0 | No | No |
| 18148449 | PHOTORESIST COMPOSITIONS FOR EUV AND METHODS FOR MANUFACTURING SEMICONDUCTOR DEVICES USING THE SAME | December 2022 | March 2026 | Allow | 38 | 1 | 0 | Yes | No |
| 18089796 | METHOD FOR ASCERTAINING AN IMAGE OF AN OBJECT | December 2022 | October 2025 | Allow | 34 | 2 | 0 | No | No |
| 18081499 | DOSE REDUCTION OF PATTERNED METAL OXIDE PHOTORESISTS | December 2022 | January 2024 | Allow | 13 | 1 | 0 | No | No |
| 18076818 | BRUSH POLYMER, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE | December 2022 | February 2026 | Allow | 39 | 1 | 0 | Yes | No |
| 18000917 | COMPOSITION FOR SEMICONDUCTOR PHOTORESIST, AND PATTERN FORMATION METHOD USING SAME | December 2022 | September 2025 | Allow | 34 | 0 | 0 | No | No |
| 18062021 | RINSING LIQUID AND PATTERN FORMING METHOD | December 2022 | September 2025 | Allow | 34 | 1 | 0 | No | No |
| 18074050 | OPTICAL METROLOGY WITH INCOHERENT HOLOGRAPHY | December 2022 | November 2025 | Allow | 36 | 1 | 0 | No | No |
| 18007910 | UPPER FILM-FORMING COMPOSITION AND METHOD FOR PRODUCING PHASE-SEPARATED PATTERN | December 2022 | November 2025 | Allow | 36 | 1 | 0 | No | No |
| 18070467 | SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING APPARATUS, AND RECIPE SELECTION METHOD | November 2022 | October 2023 | Allow | 11 | 0 | 0 | No | No |
| 17994652 | PHOTORESIST UNDERLAYER COMPOSITION | November 2022 | January 2026 | Allow | 38 | 1 | 0 | No | No |
| 17927229 | EXPOSURE PATTERN, EXPOSURE MASK USED FOR FORMING SAME, AND METHOD FOR FORMING EXPOSURE PATTERN USING SAME | November 2022 | December 2025 | Abandon | 37 | 1 | 0 | No | No |
| 17991579 | METHOD OF MANUFACTURING PRINTED CIRCUIT BOARD AND RESIST LAMINATE FOR THE SAME | November 2022 | February 2026 | Abandon | 39 | 2 | 0 | No | No |
| 17990680 | METHODS OF PATTERNING A PHOTORESIST, AND RELATED PATTERNING SYSTEMS | November 2022 | December 2025 | Allow | 37 | 1 | 1 | Yes | No |
| 17926108 | SYSTEM AND METHOD TO CONTROL DEFECTS IN PROJECTION-BASED SUB-MICROMETER ADDITIVE MANUFACTURING | November 2022 | February 2026 | Allow | 39 | 1 | 0 | Yes | No |
| 17989425 | PHASE SHIFT BLANKMASK AND PHOTOMASK FOR EUV LITHOGRAPHY | November 2022 | September 2025 | Allow | 34 | 1 | 0 | No | No |
This analysis examines appeal outcomes and the strategic value of filing appeals for examiner SULLIVAN, CALEEN O.
Filing a Notice of Appeal can sometimes lead to allowance even before the appeal is fully briefed or decided by the PTAB. This occurs when the examiner or their supervisor reconsiders the rejection during the mandatory appeal conference (MPEP § 1207.01) after the appeal is filed.
In this dataset, 50.0% of applications that filed an appeal were subsequently allowed. This appeal filing benefit rate is in the top 25% across the USPTO, indicating that filing appeals is particularly effective here. The act of filing often prompts favorable reconsideration during the mandatory appeal conference.
✓ Filing a Notice of Appeal is strategically valuable. The act of filing often prompts favorable reconsideration during the mandatory appeal conference.
Examiner SULLIVAN, CALEEN O works in Art Unit 2899 and has examined 407 patent applications in our dataset. With an allowance rate of 97.3%, this examiner allows applications at a higher rate than most examiners at the USPTO. Applications typically reach final disposition in approximately 20 months.
Examiner SULLIVAN, CALEEN O's allowance rate of 97.3% places them in the 88% percentile among all USPTO examiners. This examiner is more likely to allow applications than most examiners at the USPTO.
On average, applications examined by SULLIVAN, CALEEN O receive 0.92 office actions before reaching final disposition. This places the examiner in the 7% percentile for office actions issued. This examiner issues significantly fewer office actions than most examiners.
The median time to disposition (half-life) for applications examined by SULLIVAN, CALEEN O is 20 months. This places the examiner in the 93% percentile for prosecution speed. Applications move through prosecution relatively quickly with this examiner.
Conducting an examiner interview provides a +3.2% benefit to allowance rate for applications examined by SULLIVAN, CALEEN O. This interview benefit is in the 25% percentile among all examiners. Recommendation: Interviews provide a below-average benefit with this examiner.
When applicants file an RCE with this examiner, 32.2% of applications are subsequently allowed. This success rate is in the 68% percentile among all examiners. Strategic Insight: RCEs show above-average effectiveness with this examiner. Consider whether your amendments or new arguments are strong enough to warrant an RCE versus filing a continuation.
This examiner enters after-final amendments leading to allowance in 76.2% of cases where such amendments are filed. This entry rate is in the 95% percentile among all examiners. Strategic Recommendation: This examiner is highly receptive to after-final amendments compared to other examiners. Per MPEP § 714.12, after-final amendments may be entered "under justifiable circumstances." Consider filing after-final amendments with a clear showing of allowability rather than immediately filing an RCE, as this examiner frequently enters such amendments.
When applicants request a pre-appeal conference (PAC) with this examiner, 100.0% result in withdrawal of the rejection or reopening of prosecution. This success rate is in the 75% percentile among all examiners. Strategic Recommendation: Pre-appeal conferences show above-average effectiveness with this examiner. If you have strong arguments, a PAC request may result in favorable reconsideration.
This examiner withdraws rejections or reopens prosecution in 100.0% of appeals filed. This is in the 96% percentile among all examiners. Of these withdrawals, 50.0% occur early in the appeal process (after Notice of Appeal but before Appeal Brief). Strategic Insight: This examiner frequently reconsiders rejections during the appeal process compared to other examiners. Per MPEP § 1207.01, all appeals must go through a mandatory appeal conference. Filing a Notice of Appeal may prompt favorable reconsideration even before you file an Appeal Brief.
When applicants file petitions regarding this examiner's actions, 18.8% are granted (fully or in part). This grant rate is in the 10% percentile among all examiners. Strategic Note: Petitions are rarely granted regarding this examiner's actions compared to other examiners. Ensure you have a strong procedural basis before filing a petition, as the Technology Center Director typically upholds this examiner's decisions.
Examiner's Amendments: This examiner makes examiner's amendments in 0.0% of allowed cases (in the 28% percentile). This examiner makes examiner's amendments less often than average. You may need to make most claim amendments yourself.
Quayle Actions: This examiner issues Ex Parte Quayle actions in 0.0% of allowed cases (in the 34% percentile). This examiner issues Quayle actions less often than average. Allowances may come directly without a separate action for formal matters.
Based on the statistical analysis of this examiner's prosecution patterns, here are tailored strategic recommendations:
Not Legal Advice: The information provided in this report is for informational purposes only and does not constitute legal advice. You should consult with a qualified patent attorney or agent for advice specific to your situation.
No Guarantees: We do not provide any guarantees as to the accuracy, completeness, or timeliness of the statistics presented above. Patent prosecution statistics are derived from publicly available USPTO data and are subject to data quality limitations, processing errors, and changes in USPTO practices over time.
Limitation of Liability: Under no circumstances will IronCrow AI be liable for any outcome, decision, or action resulting from your reliance on the statistics, analysis, or recommendations presented in this report. Past prosecution patterns do not guarantee future results.
Use at Your Own Risk: While we strive to provide accurate and useful prosecution statistics, you should independently verify any information that is material to your prosecution strategy and use your professional judgment in all patent prosecution matters.