USPTO Examiner SULLIVAN CALEEN O - Art Unit 2899

Recent Applications

Detailed information about the 100 most recent patent applications.

Application NumberTitleFiling DateDisposal DateDispositionTime (months)Office ActionsRestrictionsInterviewAppeal
18928253BOND FORCE CONCENTRATOROctober 2024March 2025Allow410YesNo
18850628ALL-IN-ONE DRY DEVELOPMENT FOR METAL-CONTAINING PHOTORESISTSeptember 2024December 2025Allow1420YesNo
18811589WAFER WARPAGE REGULATION EPOXY FUNCTIONAL FILM, AND PREPARATION METHOD AND APPLICATION THEREOFAugust 2024January 2025Allow500NoNo
18811327Manufacturing Process for Lidar System with Individualized Semiconductor Optical Amplifier DiesAugust 2024May 2025Allow911YesNo
18835123PHOTOCURABLE RESIN COMPOSITION CONTAINING SELF-CROSSLINKABLE POLYMERAugust 2024February 2025Allow700NoNo
18785179METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICEJuly 2024February 2026Allow1810NoNo
18729437SURFACE RELIEF WAVEGUIDES WITH HIGH REFRACTIVE INDEX RESISTJuly 2024October 2024Allow300NoNo
18771675METHOD OF MANUFACTURING EUV PHOTO MASKSJuly 2024February 2026Allow1910NoNo
18761785ANTI-FLARE SEMICONDUCTOR PACKAGES AND RELATED METHODSJuly 2024May 2025Allow1010NoNo
18756363MEMORY ARRAY CIRCUIT AND METHOD OF MANUFACTURING SAMEJune 2024May 2025Allow1010NoNo
18739882Heat Dissipation StructuresJune 2024May 2025Allow1110NoNo
18738256PATTERNING INTERCONNECTS AND OTHER STRUCTURES BY PHOTO-SENSITIZING METHODJune 2024April 2025Allow1010NoNo
18717235HERRINGBONE MICROSTRUCTURE SURFACE PATTERN FOR FLEXOGRAPHIC PRINTING PLATESJune 2024March 2025Allow910NoNo
18670390Fabric Die to Fabric Die Interconnect for Modularized Integrated Circuit DevicesMay 2024April 2025Allow1110NoNo
18652551APPARATUSES INCLUDING INTERCONNECT STRUCTURES INCLUDING DIELECTRIC MATERIAL SURROUNDED BY CONDUCTIVE MATERIAL, AND RELATED MEMORY DEVICESMay 2024March 2025Allow1110NoNo
18649086PHOTORESIST LAYER OUTGASSING PREVENTIONApril 2024April 2025Allow1110NoNo
18644661SUBSTRATE PROCESSING MODULEApril 2024July 2025Allow1510NoNo
18629384Self Aligned Contact SchemeApril 2024March 2025Allow1110NoNo
18628111UNDERLAYER FOR PHOTORESIST ADHESION AND DOSE REDUCTIONApril 2024June 2025Allow1410NoNo
18626475HEAT TREATMENT DEVICE AND TREATMENT METHODApril 2024February 2025Allow1110NoNo
18605141METHOD OF MANUFACTURING SEMICONDUCTOR DEVICESMarch 2024March 2025Allow1210NoNo
18597065METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICEMarch 2024February 2025Allow1210NoNo
18587825SEMICONDUCTOR DEVICEFebruary 2024February 2025Allow1210NoNo
18582586SEMICONDUCTOR DEVICE PACKAGEFebruary 2024November 2024Allow810NoNo
18429080Semiconductor Device with Partial EMI Shielding Removal Using Laser AblationJanuary 2024December 2024Allow1010NoNo
18401800METHOD FOR FORMING AND USING MASKJanuary 2024February 2025Allow1410NoNo
18398152LITHOGRAPHYDecember 2023January 2025Allow1310NoNo
18394133METHODS FOR INCREASING THE DENSITY OF HIGH-INDEX NANOIMPRINT LITHOGRAPHY FILMSDecember 2023November 2024Allow1110NoNo
18543432METHOD AND STRUCTURE OF CUT END WITH SELF-ALIGNED DOUBLE PATTERNINGDecember 2023March 2025Allow1510NoNo
18520526INPUT AND OUTPUT BLOCKS FOR AN ARRAY OF MEMORY CELLSNovember 2023December 2024Allow1300NoNo
18511102ENLARGING CONTACT AREA AND PROCESS WINDOW FOR A CONTACT VIANovember 2023December 2024Allow1310NoNo
18511133MEMORY CELL WITH TOP ELECTRODE VIANovember 2023December 2024Allow1310NoNo
18505596METHOD FOR PREPARING PIXEL DEFINE LAYERNovember 2023September 2024Allow1000NoNo
18502183Sacrificial Layer for Semiconductor ProcessNovember 2023September 2024Allow1010NoNo
18495247MEASUREMENTS OF STRUCTURES IN PRESENCE OF SIGNAL CONTAMINATIONSOctober 2023May 2024Allow710NoNo
18461425VERTICAL SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAMESeptember 2023July 2025Allow2310NoNo
18455032TRICHROME PIXEL LAYOUTAugust 2023January 2024Allow511YesNo
18446416AMBIENT CONTROLLED TWO-STEP THERMAL TREATMENT FOR SPIN-ON COATING LAYER PLANARIZATIONAugust 2023July 2024Allow1110NoNo
18230062METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICEAugust 2023July 2024Allow1110NoNo
18363296ANTI-FLARE SEMICONDUCTOR PACKAGES AND RELATED METHODSAugust 2023June 2024Allow1010NoNo
18363289ANTI-FLARE SEMICONDUCTOR PACKAGES AND RELATED METHODSAugust 2023March 2024Allow800NoNo
18226165MASK BLANK, METHOD OF MANUFACTURING IMPRINT MOLD, METHOD OF MANUFACTURING TRANSFER MASK, METHOD OF MANUFACTURING REFLECTIVE MASK, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICEJuly 2023March 2024Allow810NoNo
18358365PERIPHERAL CIRCUITRY UNDER ARRAY MEMORY DEVICE AND METHOD OF FABRICATING THEREOFJuly 2023July 2024Allow1110NoNo
18226151METHOD OF MANUFACTURING EUV PHOTO MASKSJuly 2023May 2024Allow910NoNo
18224063MASK INSPECTION APPARATUS WITH A PLATFORM MODULEJuly 2023March 2026Allow3200NoNo
18271383RESIST UNDERLAYER FILM-FORMING COMPOSITION INCLUDING REACTION PRODUCT OF ACID DIANHYDRIDEJuly 2023May 2024Allow1000NoNo
18338013Isolation Bonding Film for Semiconductor Packages and Methods of Forming the SameJune 2023May 2024Allow1110NoNo
18265700POWER MODULEJune 2023April 2024Allow1010YesNo
18331066MANUFACTURING METHOD OF ORIGINAL PLATE AND SEMICONDUCTOR DEVICEJune 2023December 2023Allow700NoNo
18037444MANUFACTURING METHOD OF FLEXOGRAPHIC PRINTING PLATE AND PRINTING METHODMay 2023January 2025Allow2000NoNo
18197640PHOTORESIST DEVELOPER AND METHOD OF DEVELOPING PHOTORESISTMay 2023April 2024Allow1110YesNo
18196905METHOD FOR INTERCONNECTING STACKED SEMICONDUCTOR DEVICESMay 2023March 2024Allow1010NoNo
18196219METROLOGY OF NANOSHEET SURFACE ROUGHNESS AND PROFILEMay 2023March 2025Allow2200NoNo
18195982RADIATION HARDENED THIN-FILM TRANSISTORSMay 2023February 2024Allow1010YesNo
18308901MONITOR STRUCTURE FOR PHOTORESIST THICKNESS IN TRENCHApril 2023January 2026Allow3300NoNo
18309131Patterning Interconnects and Other Structures by Photo-Sensitizing MethodApril 2023March 2024Allow1010NoNo
18137405Fabric Die to Fabric Die Interconnect for Modularized Integrated Circuit DevicesApril 2023February 2024Allow1010NoNo
18304301MEMORY ARRAY CIRCUIT AND METHOD OF MANUFACTURING SAMEApril 2023February 2024Allow1010NoNo
18136500Heat Dissipation StructuresApril 2023March 2024Allow1110NoNo
18133937PELLICLE AND METHOD OF MANUFACTURING THEREOFApril 2023February 2026Allow3410NoNo
18248526Anti-reflective hard mask compositionApril 2023October 2025Allow3100NoNo
17784064METHOD AND APPARATUS FOR CORRECTING PROXIMITY EFFECT OF ELECTRON BEAMMarch 2023October 2025Allow4000NoNo
18028984RESIST UNDERLAYER FILM-FORMING COMPOSITION COMPRISING FLUOROALKYL GROUP-CONTAINING ORGANIC ACID OR SALT THEREOFMarch 2023February 2026Allow3510NoNo
18189189GUIDING STRUCTURES FOR FABRICATION OF ANGLED FEATURES IN A SEMICONDUCTOR DEVICEMarch 2023January 2026Allow3411YesNo
18027274METHOD AND SYSTEM TO DETERMINE AN EXPOSURE TIME AND/OR INTENSITY TO BE USED FOR OBTAINING A DESIRED FEATURE OF A RELIEF STRUCTUREMarch 2023February 2026Allow3510NoNo
18027093OPTIMIZATION OF SCANNER THROUGHPUT AND IMAGING QUALITY FOR A PATTERNING PROCESSMarch 2023February 2026Allow3510NoNo
18120606OPTICAL ELEMENTS INCLUDING PSUEDORANDOM-SHAPED META-ATOMSMarch 2023January 2026Allow3401NoNo
18245133PROJECTION EXPOSURE DEVICE AND PROJECTION EXPOSURE METHODMarch 2023September 2025Allow3000NoNo
18025336CHEMICAL-RESISTANT PROTECTIVE FILMMarch 2023February 2026Allow3610NoNo
18179556VERTICAL FIELD EFFECT TRANSISTOR WITH CROSSLINK FIN ARRANGEMENTMarch 2023March 2024Allow1300NoNo
18174619PACKAGE SUBSTRATE AND MANUFACTURING METHOD THEREOFFebruary 2023March 2026Allow3711NoNo
18112953LOW FORCE LIQUID METAL INTERCONNECT SOLUTIONSFebruary 2023March 2025Allow2540NoNo
18171748Optical ConstructionFebruary 2023September 2025Allow3100NoNo
18171598SYSTEM, SOFTWARE APPLICATION, AND METHOD FOR DOSE UNIFORMITY IMPROVEMENTFebruary 2023March 2026Allow3711NoNo
18021905RADIATION SOURCE ARRANGEMENT AND METROLOGY DEVICEFebruary 2023September 2025Allow3110NoNo
18020874PHOTOSENSITIVE ELEMENT AND METHOD FOR PRODUCING PHOTOSENSITIVE ELEMENTFebruary 2023December 2025Allow3410NoNo
18107043METHOD AND APPARATUS FOR MASK REPAIRFebruary 2023December 2025Allow3410NoNo
18166324TRICHROME PIXEL LAYOUTFebruary 2023March 2025Allow2501NoNo
18164053TARGET PROCESSING DEVICE AND TARGET PROCESSING METHODFebruary 2023March 2026Allow3711NoNo
18019024PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN FILM, MULTILAYERED PRINTED WIRING BOARD, SEMICONDUCTOR PACKAGE, AND METHOD FOR PRODUCING MULTILAYERED PRINTED WIRING BOARDJanuary 2023January 2026Allow3610NoNo
18103813RESIST COMPOSITION AND PATTERN FORMING PROCESSJanuary 2023December 2025Allow3410NoNo
18158781ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICEJanuary 2023December 2025Allow3510NoNo
18005328PHOTORESISTS CONTAINING TANTALUMJanuary 2023January 2026Abandon3610NoNo
18151510METHOD, APPARATUS AND SYSTEM FOR PROCESSING SEMICONDUCTOR STRUCTUREJanuary 2023December 2025Allow3511NoNo
18150517Multi-Layered Metal Frame Power PackageJanuary 2023September 2025Allow3310NoNo
18148449PHOTORESIST COMPOSITIONS FOR EUV AND METHODS FOR MANUFACTURING SEMICONDUCTOR DEVICES USING THE SAMEDecember 2022March 2026Allow3810YesNo
18089796METHOD FOR ASCERTAINING AN IMAGE OF AN OBJECTDecember 2022October 2025Allow3420NoNo
18081499DOSE REDUCTION OF PATTERNED METAL OXIDE PHOTORESISTSDecember 2022January 2024Allow1310NoNo
18076818BRUSH POLYMER, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICEDecember 2022February 2026Allow3910YesNo
18000917COMPOSITION FOR SEMICONDUCTOR PHOTORESIST, AND PATTERN FORMATION METHOD USING SAMEDecember 2022September 2025Allow3400NoNo
18062021RINSING LIQUID AND PATTERN FORMING METHODDecember 2022September 2025Allow3410NoNo
18074050OPTICAL METROLOGY WITH INCOHERENT HOLOGRAPHYDecember 2022November 2025Allow3610NoNo
18007910UPPER FILM-FORMING COMPOSITION AND METHOD FOR PRODUCING PHASE-SEPARATED PATTERNDecember 2022November 2025Allow3610NoNo
18070467SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING APPARATUS, AND RECIPE SELECTION METHODNovember 2022October 2023Allow1100NoNo
17994652PHOTORESIST UNDERLAYER COMPOSITIONNovember 2022January 2026Allow3810NoNo
17927229EXPOSURE PATTERN, EXPOSURE MASK USED FOR FORMING SAME, AND METHOD FOR FORMING EXPOSURE PATTERN USING SAMENovember 2022December 2025Abandon3710NoNo
17991579METHOD OF MANUFACTURING PRINTED CIRCUIT BOARD AND RESIST LAMINATE FOR THE SAMENovember 2022February 2026Abandon3920NoNo
17990680METHODS OF PATTERNING A PHOTORESIST, AND RELATED PATTERNING SYSTEMSNovember 2022December 2025Allow3711YesNo
17926108SYSTEM AND METHOD TO CONTROL DEFECTS IN PROJECTION-BASED SUB-MICROMETER ADDITIVE MANUFACTURINGNovember 2022February 2026Allow3910YesNo
17989425PHASE SHIFT BLANKMASK AND PHOTOMASK FOR EUV LITHOGRAPHYNovember 2022September 2025Allow3410NoNo

Appeals Overview

This analysis examines appeal outcomes and the strategic value of filing appeals for examiner SULLIVAN, CALEEN O.

Strategic Value of Filing an Appeal

Total Appeal Filings
2
Allowed After Appeal Filing
1
(50.0%)
Not Allowed After Appeal Filing
1
(50.0%)
Filing Benefit Percentile
81.5%
Higher than average

Understanding Appeal Filing Strategy

Filing a Notice of Appeal can sometimes lead to allowance even before the appeal is fully briefed or decided by the PTAB. This occurs when the examiner or their supervisor reconsiders the rejection during the mandatory appeal conference (MPEP § 1207.01) after the appeal is filed.

In this dataset, 50.0% of applications that filed an appeal were subsequently allowed. This appeal filing benefit rate is in the top 25% across the USPTO, indicating that filing appeals is particularly effective here. The act of filing often prompts favorable reconsideration during the mandatory appeal conference.

Strategic Recommendations

Filing a Notice of Appeal is strategically valuable. The act of filing often prompts favorable reconsideration during the mandatory appeal conference.

Examiner SULLIVAN, CALEEN O - Prosecution Strategy Guide

Executive Summary

Examiner SULLIVAN, CALEEN O works in Art Unit 2899 and has examined 407 patent applications in our dataset. With an allowance rate of 97.3%, this examiner allows applications at a higher rate than most examiners at the USPTO. Applications typically reach final disposition in approximately 20 months.

Allowance Patterns

Examiner SULLIVAN, CALEEN O's allowance rate of 97.3% places them in the 88% percentile among all USPTO examiners. This examiner is more likely to allow applications than most examiners at the USPTO.

Office Action Patterns

On average, applications examined by SULLIVAN, CALEEN O receive 0.92 office actions before reaching final disposition. This places the examiner in the 7% percentile for office actions issued. This examiner issues significantly fewer office actions than most examiners.

Prosecution Timeline

The median time to disposition (half-life) for applications examined by SULLIVAN, CALEEN O is 20 months. This places the examiner in the 93% percentile for prosecution speed. Applications move through prosecution relatively quickly with this examiner.

Interview Effectiveness

Conducting an examiner interview provides a +3.2% benefit to allowance rate for applications examined by SULLIVAN, CALEEN O. This interview benefit is in the 25% percentile among all examiners. Recommendation: Interviews provide a below-average benefit with this examiner.

Request for Continued Examination (RCE) Effectiveness

When applicants file an RCE with this examiner, 32.2% of applications are subsequently allowed. This success rate is in the 68% percentile among all examiners. Strategic Insight: RCEs show above-average effectiveness with this examiner. Consider whether your amendments or new arguments are strong enough to warrant an RCE versus filing a continuation.

After-Final Amendment Practice

This examiner enters after-final amendments leading to allowance in 76.2% of cases where such amendments are filed. This entry rate is in the 95% percentile among all examiners. Strategic Recommendation: This examiner is highly receptive to after-final amendments compared to other examiners. Per MPEP § 714.12, after-final amendments may be entered "under justifiable circumstances." Consider filing after-final amendments with a clear showing of allowability rather than immediately filing an RCE, as this examiner frequently enters such amendments.

Pre-Appeal Conference Effectiveness

When applicants request a pre-appeal conference (PAC) with this examiner, 100.0% result in withdrawal of the rejection or reopening of prosecution. This success rate is in the 75% percentile among all examiners. Strategic Recommendation: Pre-appeal conferences show above-average effectiveness with this examiner. If you have strong arguments, a PAC request may result in favorable reconsideration.

Appeal Withdrawal and Reconsideration

This examiner withdraws rejections or reopens prosecution in 100.0% of appeals filed. This is in the 96% percentile among all examiners. Of these withdrawals, 50.0% occur early in the appeal process (after Notice of Appeal but before Appeal Brief). Strategic Insight: This examiner frequently reconsiders rejections during the appeal process compared to other examiners. Per MPEP § 1207.01, all appeals must go through a mandatory appeal conference. Filing a Notice of Appeal may prompt favorable reconsideration even before you file an Appeal Brief.

Petition Practice

When applicants file petitions regarding this examiner's actions, 18.8% are granted (fully or in part). This grant rate is in the 10% percentile among all examiners. Strategic Note: Petitions are rarely granted regarding this examiner's actions compared to other examiners. Ensure you have a strong procedural basis before filing a petition, as the Technology Center Director typically upholds this examiner's decisions.

Examiner Cooperation and Flexibility

Examiner's Amendments: This examiner makes examiner's amendments in 0.0% of allowed cases (in the 28% percentile). This examiner makes examiner's amendments less often than average. You may need to make most claim amendments yourself.

Quayle Actions: This examiner issues Ex Parte Quayle actions in 0.0% of allowed cases (in the 34% percentile). This examiner issues Quayle actions less often than average. Allowances may come directly without a separate action for formal matters.

Prosecution Strategy Recommendations

Based on the statistical analysis of this examiner's prosecution patterns, here are tailored strategic recommendations:

  • Consider after-final amendments: This examiner frequently enters after-final amendments. If you can clearly overcome rejections with claim amendments, file an after-final amendment before resorting to an RCE.
  • Appeal filing as negotiation tool: This examiner frequently reconsiders rejections during the appeal process. Filing a Notice of Appeal may prompt favorable reconsideration during the mandatory appeal conference.

Relevant MPEP Sections for Prosecution Strategy

  • MPEP § 713.10: Examiner interviews - available before Notice of Allowance or transfer to PTAB
  • MPEP § 714.12: After-final amendments - may be entered "under justifiable circumstances"
  • MPEP § 1002.02(c): Petitionable matters to Technology Center Director
  • MPEP § 1004: Actions requiring primary examiner signature (allowances, final rejections, examiner's answers)
  • MPEP § 1207.01: Appeal conferences - mandatory for all appeals
  • MPEP § 1214.07: Reopening prosecution after appeal

Important Disclaimer

Not Legal Advice: The information provided in this report is for informational purposes only and does not constitute legal advice. You should consult with a qualified patent attorney or agent for advice specific to your situation.

No Guarantees: We do not provide any guarantees as to the accuracy, completeness, or timeliness of the statistics presented above. Patent prosecution statistics are derived from publicly available USPTO data and are subject to data quality limitations, processing errors, and changes in USPTO practices over time.

Limitation of Liability: Under no circumstances will IronCrow AI be liable for any outcome, decision, or action resulting from your reliance on the statistics, analysis, or recommendations presented in this report. Past prosecution patterns do not guarantee future results.

Use at Your Own Risk: While we strive to provide accurate and useful prosecution statistics, you should independently verify any information that is material to your prosecution strategy and use your professional judgment in all patent prosecution matters.