USPTO Examiner SNOW COLLEEN ERIN - Art Unit 2899

Recent Applications

Detailed information about the 100 most recent patent applications.

Application NumberTitleFiling DateDisposal DateDispositionTime (months)Office ActionsRestrictionsInterviewAppeal
18869882SOLAR CELL AND PREPARATION METHOD THEREFORNovember 2024January 2026Allow1401NoNo
18263240WAFER ASSEMBLY AND METHOD FOR PRODUCING A PLURALITY OF SEMICONDUCTOR CHIPSJuly 2023February 2026Allow3110NoNo
18225748SEMICONDUCTOR DEVICE WITH PROFILED WORK-FUNCTION METAL GATE ELECTRODE AND METHOD OF MAKINGJuly 2023August 2024Allow1310NoNo
18347956METAL MASK, METHOD OF MANUFACTURING THE SAME, AND METHOD OF MANUFACTURING DISPLAY PANEL USING THE METAL MASKJuly 2023January 2025Allow1820NoNo
18327624ORGANIC LIGHT EMITTING DISPLAY DEVICEJune 2023August 2024Allow1510NoNo
18202336METHODS AND SYSTEMS FOR FORMING A LAYER COMPRISING A GROUP 13 ELEMENT ON A SUBSTRATEMay 2023February 2026Allow3210NoNo
18314926SEMICONDUCTOR DEVICE WITH CAP ELEMENTMay 2023March 2026Allow3410NoNo
18305786SEMICONDUCTOR DEVICEApril 2023February 2026Allow3410NoNo
18305772METHOD FOR MANUFACTURING ORGANIC EL DEVICEApril 2023February 2026Allow3410NoNo
18027432III-NITRIDE DEVICES WITH THROUGH-VIA STRUCTURESMarch 2023October 2025Allow3110NoNo
18185079METHOD OF MANUFACTURING SEMICONDUCTOR DEVICEMarch 2023December 2025Allow3410NoNo
18104272METHODS FOR FABRICATING SEMICONDUCTOR DEVICES WITH BACKSIDE POWER DELIVERY NETWORK USING LASER LIFTOFF LAYERJanuary 2023November 2025Allow3410NoNo
18009770NITROGEN-CONTAINING COMPOUND, ELECTRONIC COMPONENT COMPRISING SAME, AND ELECTRONIC APPARATUSDecember 2022October 2023Allow1010NoNo
18073880SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAMEDecember 2022March 2026Abandon3910NoNo
17925913SEMICONDUCTOR APPARATUS HAVING STAGGERED STRUCTURE AND METHOD OF MANUFACTURING THE SAME, AND ELECTRONIC DEVICENovember 2022December 2025Allow3720NoNo
17985957CIRCUIT SUBSTRATENovember 2022December 2025Allow3710NoNo
179753323D ISOLATION OF A SEGMENTATED 3D NANOSHEET CHANNEL REGIONOctober 2022September 2025Allow3410NoNo
17921213DISPLAY PANEL AND DISPLAY DEVICE THEREOFOctober 2022October 2025Allow3610NoNo
17970455DISPLAY DEVICEOctober 2022September 2025Allow3510NoNo
17916050METHOD FOR FORMING NANOSTRUCTURE AND FIELD EFFECT TRANSISTOR DEVICE ON A SUBSTRATESeptember 2022August 2025Allow3510NoNo
17914349METHOD FOR MANUFACTURING SEMICONDUCTOR LIGHT EMITTING DEVICESeptember 2022December 2025Allow3920NoNo
17949907METHODS OF TRANSFERRING A DIE FROM A CARRIER TO A RECEIVE SUBSTRATE, AND RELATED SYSTEMS AND MATERIALSSeptember 2022October 2025Allow3720YesNo
17899636SEMICONDUCTOR STRUCTURE AND FABRICATION METHOD THEREOFAugust 2022September 2025Abandon3710NoNo
17895952IN-CHAMBER METROLOGY OF SUBSTRATES FOR PROCESS CHARACTERIZATION AND IMPROVEMENTAugust 2022December 2025Allow4020YesNo
17802517METHOD FOR PRODUCING INK COMPOSITIONAugust 2022March 2024Allow1920YesNo
17817661SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHODAugust 2022February 2025Allow3021NoNo
17854884FIELD PLATE AND ISOLATION STRUCTURE FOR HIGH VOLTAGE DEVICEJune 2022June 2025Allow3610NoNo
17853150Impurity Removal in Doped ALD Tantalum NitrideJune 2022January 2025Allow3000NoNo
17851785ELECTRON BARRIER FILM, QUANTUM DOT LIGHT-EMITTING DIODE AND PREPARATION METHOD THEREOFJune 2022June 2025Allow3510NoNo
17789682NITRIDE SEMICONDUCTOR DEVICEJune 2022March 2025Allow3210NoNo
17787097METHOD FOR PRODUCING EPITAXIAL SILICON WAFERJune 2022February 2025Allow3210NoNo
17826298METHODS FOR DOPING SEMICONDUCTORS IN TRANSISTORSMay 2022April 2025Allow3410NoNo
17824835LIGHT-EMTTING DIODE DISPLAY DEVICES WITH UV-CURED LAYERMay 2022May 2025Abandon3610NoNo
17734687Semiconductor Structure and Methods of Forming SameMay 2022July 2024Allow2610NoNo
17734683Interconnect Structure without Barrier Layer on Bottom Surface of ViaMay 2022January 2025Allow3321YesNo
17729695OLED DISPLAY PANEL AND OLED DISPLAY DEVICEApril 2022November 2024Allow3000NoNo
17726673METHOD OF FABRICATING SEMICONDUCTOR DEVICEApril 2022January 2025Allow3210NoNo
17725430METHOD FOR ETCHING GAPS OF UNEQUAL WIDTHApril 2022September 2024Allow2900NoNo
17769407Method for Producing a Lighting DeviceApril 2022November 2024Allow3110NoNo
17710939LIGHT-EMTTING DIODE LIGHT EXTRACTION LAYER HAVING GRADED INDEX OF REFRACTIONMarch 2022December 2023Allow2100NoNo
17763869NITROGEN-CONTAINING COMPOUND, ELECTRONIC COMPONENT AND ELECTRONIC DEVICE INCLUDING SAMEMarch 2022January 2023Allow900NoNo
17762844THERMALLY CONDUCTIVE SILICONE COMPOSITION, PRODUCTION METHOD THEREOF, AND SEMICONDUCTOR DEVICEMarch 2022July 2024Allow2800NoNo
17687166METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE AND METHOD FOR PROCESSING FILMMarch 2022April 2025Allow3720YesNo
17651883RESIST PATTERNED REDISTRIBUTION WIRING ON COPPER POLYIMIDE VIA LAYERFebruary 2022September 2025Allow4320YesNo
17667488METHOD OF BACK END OF LINE VIA TO METAL LINE MARGIN IMPROVEMENTFebruary 2022October 2024Allow3330NoNo
17665166WAFER AND METHOD OF MANUFACTURING WAFERFebruary 2022October 2023Allow2100NoNo
17582551METHOD OF MANUFACTURING MEMORY DEVICE HAVING MEMORY CELL WITH REDUCED PROTRUSIONJanuary 2022October 2024Allow3210NoNo
17555790SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOFDecember 2021November 2024Allow3530NoNo
17456402APPLYING INERT ION BEAM ETCHING FOR IMPROVING A PROFILE AND REPAIRING SIDEWALL DAMAGE FOR PHASE CHANGE MEMORY DEVICESNovember 2021April 2025Allow4110YesNo
17456052METHOD FOR OPTIMIZING THE ELECTRIC CONDUCTION THROUGH A METAL/OXIDE/METAL INTERFACENovember 2021August 2024Allow3210NoNo
17595589ACTIVE REGION ARRAY FORMATION METHODNovember 2021August 2024Allow3310NoNo
17455717SEMICONDUCTOR STRUCTURE AND FABRICATION METHOD THEREOFNovember 2021June 2024Allow3010NoNo
17521021SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOFNovember 2021August 2024Allow3310NoNo
17453851SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOFNovember 2021February 2024Allow2710NoNo
17517247INTERCONNECT STRUCTURES AND METHODS FOR FORMING SAMENovember 2021January 2026Allow5040YesNo
17451645METHOD FOR MANUFACTURING MEMORY AND MEMORYOctober 2021May 2024Allow3110NoNo
17503599Methods Of Forming Metal Nitride FilmsOctober 2021March 2024Allow2900NoNo
17604320SIC EDGE RINGOctober 2021June 2024Allow3210NoNo
17599851CdSeTe PHOTOVOLTAIC DEVICES WITH INTERDIGITATED BACK CONTACT ARCHITECTURESeptember 2021July 2024Allow3310NoNo
17599413SEMICONDUCTOR STRUCTURE AND FORMING METHOD THEREOFSeptember 2021November 2022Allow1320NoNo
17476993INK CONTAINING LIGHT-EMITTING ELEMENTS AND METHOD OF FABRICATING DISPLAY DEVICE USING THE SAMESeptember 2021July 2024Allow3420NoNo
17438786RESIST UNDERLAYER FILM-FORMING COMPOSITIONSeptember 2021April 2024Allow3100NoNo
17446235GUARD RING AND MANUFACTURING METHOD THEREOFAugust 2021June 2024Allow3420YesNo
17371375METHOD OF MANUFACTURING EXTREME ULTRAVIOLET (EUV) PHOTOMASK AND METHOD AND APPARATUS FOR CORRECTING EUV PHOTOMASKJuly 2021November 2024Allow4111YesNo
17360135Hybrid Source Drain Regions Formed Based on Same Fin and Methods Forming SameJune 2021June 2024Allow3620NoNo
17355663WAFER AND METHOD OF MANUFACTRURING WAFERJune 2021November 2021Allow501YesNo
17355050PHASE CHANGE MEMORY STRUCTURE AND MANUFACTURING METHOD FOR THE SAMEJune 2021September 2023Allow2700NoNo
17352195Contacts for Semiconductor Devices and Methods of Forming the SameJune 2021November 2023Allow2920NoNo
17345258HIGH DENSITY PICK AND SEQUENTIAL PLACE TRANSFER PROCESS AND TOOLJune 2021March 2024Allow3320YesNo
17338379METHOD FOR SILICIDATION OF SEMICONDUCTOR DEVICE, AND CORRESPONDING SEMICONDUCTOR DEVICEJune 2021August 2023Allow2710NoNo
17324492INTEGRATED CIRCUIT DEVICEMay 2021October 2023Allow2920YesNo
17321536THROUGH SUBSTRATE VIA STRUCTURE AND MANUFACTURING METHOD THEREOF, REDISTRIBUTION LAYER STRUCTURE AND MANUFACTURING METHOD THEREOFMay 2021May 2024Allow3620NoNo
17237821METHOD OF MANUFACTURING SEMICONDUCTOR DEVICEApril 2021August 2023Allow2710NoNo
17236700ACCESS LINE GRAIN MODULATION IN A MEMORY DEVICEApril 2021May 2024Allow3730YesNo
17231284GATE CONTACT ISOLATION IN A SEMICONDUCTORApril 2021September 2023Allow3020NoNo
17249965SEMICONDUCTOR STRUCTURE INSPECTION USING A HIGH ATOMIC NUMBER MATERIALMarch 2021January 2024Allow3420YesNo
17201488METHOD FOR MANUFACTURING SEMICONDUCTOR MEMBER AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICEMarch 2021January 2023Allow2200NoNo
17200227METHOD OF MANUFACTURING LIGHT EMITTING DEVICEMarch 2021March 2023Allow2410YesNo
17182948TRANSISTOR PRODUCTION METHODFebruary 2021March 2024Allow3730NoNo
17178495SEMICONDUCTOR DEVICEFebruary 2021November 2022Allow2100NoNo
17175640Power DistributionFebruary 2021September 2024Allow4321YesNo
17130247Flow Sensor, Method for Manufacturing Flow Sensor and Flow Sensor ModuleDecember 2020February 2023Allow2610NoNo
17131706THIN FILM TRANSISTORS HAVING BORON NITRIDE INTEGRATED WITH 2D CHANNEL MATERIALSDecember 2020April 2025Abandon5221NoNo
17124850DISPLAY APPARATUSDecember 2020March 2023Allow2610NoNo
17122209Devices with Strained Isolation FeaturesDecember 2020July 2023Allow3111NoNo
17120276PACKAGE STRUCTURE AND METHOD OF FABRICATING THE SAMEDecember 2020September 2022Allow2100NoNo
16973914ORGANIC LIGHT-EMITTING DEVICE AND DISPLAY DEVICEDecember 2020August 2022Allow2010NoNo
16952455CIRCUIT SUBSTRATENovember 2020August 2022Allow2110NoNo
17095742PACKAGE SUBSTRATE AND METHOD OF FABRICATING THE SAMENovember 2020July 2023Allow3220NoNo
17095744PACKAGE SUBSTRATE AND METHOD OF FABRICATING THE SAME AND CHIP PACKAGE STRUCTURENovember 2020September 2023Allow3420NoNo
17085124ORGANIC ELECTROLUMINESCENCE DEVICE AND POLYCYCLIC COMPOUND FOR ORGANIC ELECTROLUMINESCENCE DEVICEOctober 2020September 2022Allow2200NoNo
17082535METHOD FOR FORMING PLANARIZATION LAYER AND PATTERN FORMING METHOD USING THE SAMEOctober 2020January 2023Allow2610NoNo
17081498Area-Selective Atomic Layer Deposition Of Passivation LayersOctober 2020December 2022Allow2510NoNo
17079835SEMICONDUCTOR DEVICE WITH CAP ELEMENTOctober 2020February 2023Allow2820NoNo
17071310SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAMEOctober 2020January 2023Allow2720NoNo
17066604SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAMEOctober 2020August 2022Allow2310NoNo
17030350FABRICATION OF GATE-ALL-AROUND INTEGRATED CIRCUIT STRUCTURES HAVING MOLYBDENUM NITRIDE METAL GATES AND GATE DIELECTRICS WITH A DIPOLE LAYERSeptember 2020March 2024Allow4210NoNo
17029023METHOD OF MANUFACTURING SEMICONDUCTOR DEVICESeptember 2020August 2022Allow2210NoNo
16980197METHOD OF FORMING A THROUGH-SUBSTRATE VIA AND A SEMICONDUCTOR DEVICE COMPRISING A THROUGH-SUBSTRATE VIASeptember 2020July 2023Allow3430NoNo
17002990ORGANIC SEMICONDUCTING POLYMERSAugust 2020July 2022Allow2200NoNo

Appeals Overview

This analysis examines appeal outcomes and the strategic value of filing appeals for examiner SNOW, COLLEEN ERIN.

Patent Trial and Appeal Board (PTAB) Decisions

Total PTAB Decisions
13
Examiner Affirmed
8
(61.5%)
Examiner Reversed
5
(38.5%)
Reversal Percentile
60.1%
Higher than average

What This Means

With a 38.5% reversal rate, the PTAB reverses the examiner's rejections in a meaningful percentage of cases. This reversal rate is above the USPTO average, indicating that appeals have better success here than typical.

Strategic Value of Filing an Appeal

Total Appeal Filings
19
Allowed After Appeal Filing
5
(26.3%)
Not Allowed After Appeal Filing
14
(73.7%)
Filing Benefit Percentile
38.2%
Lower than average

Understanding Appeal Filing Strategy

Filing a Notice of Appeal can sometimes lead to allowance even before the appeal is fully briefed or decided by the PTAB. This occurs when the examiner or their supervisor reconsiders the rejection during the mandatory appeal conference (MPEP § 1207.01) after the appeal is filed.

In this dataset, 26.3% of applications that filed an appeal were subsequently allowed. This appeal filing benefit rate is below the USPTO average, suggesting that filing an appeal has limited effectiveness in prompting favorable reconsideration.

Strategic Recommendations

Appeals to PTAB show good success rates. If you have a strong case on the merits, consider fully prosecuting the appeal to a Board decision.

Filing a Notice of Appeal shows limited benefit. Consider other strategies like interviews or amendments before appealing.

Examiner SNOW, COLLEEN ERIN - Prosecution Strategy Guide

Executive Summary

Examiner SNOW, COLLEEN ERIN works in Art Unit 2899 and has examined 408 patent applications in our dataset. With an allowance rate of 88.0%, this examiner has an above-average tendency to allow applications. Applications typically reach final disposition in approximately 24 months.

Allowance Patterns

Examiner SNOW, COLLEEN ERIN's allowance rate of 88.0% places them in the 68% percentile among all USPTO examiners. This examiner has an above-average tendency to allow applications.

Office Action Patterns

On average, applications examined by SNOW, COLLEEN ERIN receive 1.79 office actions before reaching final disposition. This places the examiner in the 40% percentile for office actions issued. This examiner issues fewer office actions than average, which may indicate efficient prosecution or a more lenient examination style.

Prosecution Timeline

The median time to disposition (half-life) for applications examined by SNOW, COLLEEN ERIN is 24 months. This places the examiner in the 84% percentile for prosecution speed. Applications move through prosecution relatively quickly with this examiner.

Interview Effectiveness

Conducting an examiner interview provides a +8.8% benefit to allowance rate for applications examined by SNOW, COLLEEN ERIN. This interview benefit is in the 40% percentile among all examiners. Recommendation: Interviews provide a below-average benefit with this examiner.

Request for Continued Examination (RCE) Effectiveness

When applicants file an RCE with this examiner, 25.8% of applications are subsequently allowed. This success rate is in the 41% percentile among all examiners. Strategic Insight: RCEs show below-average effectiveness with this examiner. Carefully evaluate whether an RCE or continuation is the better strategy.

After-Final Amendment Practice

This examiner enters after-final amendments leading to allowance in 58.4% of cases where such amendments are filed. This entry rate is in the 84% percentile among all examiners. Strategic Recommendation: This examiner is highly receptive to after-final amendments compared to other examiners. Per MPEP § 714.12, after-final amendments may be entered "under justifiable circumstances." Consider filing after-final amendments with a clear showing of allowability rather than immediately filing an RCE, as this examiner frequently enters such amendments.

Pre-Appeal Conference Effectiveness

When applicants request a pre-appeal conference (PAC) with this examiner, 40.0% result in withdrawal of the rejection or reopening of prosecution. This success rate is in the 37% percentile among all examiners. Note: Pre-appeal conferences show below-average success with this examiner. Consider whether your arguments are strong enough to warrant a PAC request.

Appeal Withdrawal and Reconsideration

This examiner withdraws rejections or reopens prosecution in 40.9% of appeals filed. This is in the 8% percentile among all examiners. Of these withdrawals, 22.2% occur early in the appeal process (after Notice of Appeal but before Appeal Brief). Strategic Insight: This examiner rarely withdraws rejections during the appeal process compared to other examiners. If you file an appeal, be prepared to fully prosecute it to a PTAB decision. Per MPEP § 1207, the examiner will prepare an Examiner's Answer maintaining the rejections.

Petition Practice

When applicants file petitions regarding this examiner's actions, 37.0% are granted (fully or in part). This grant rate is in the 25% percentile among all examiners. Strategic Note: Petitions show below-average success regarding this examiner's actions. Ensure you have a strong procedural basis before filing.

Examiner Cooperation and Flexibility

Examiner's Amendments: This examiner makes examiner's amendments in 0.2% of allowed cases (in the 54% percentile). This examiner makes examiner's amendments more often than average to place applications in condition for allowance (MPEP § 1302.04).

Quayle Actions: This examiner issues Ex Parte Quayle actions in 3.9% of allowed cases (in the 77% percentile). Per MPEP § 714.14, a Quayle action indicates that all claims are allowable but formal matters remain. This examiner frequently uses Quayle actions compared to other examiners, which is a positive indicator that once substantive issues are resolved, allowance follows quickly.

Prosecution Strategy Recommendations

Based on the statistical analysis of this examiner's prosecution patterns, here are tailored strategic recommendations:

  • Consider after-final amendments: This examiner frequently enters after-final amendments. If you can clearly overcome rejections with claim amendments, file an after-final amendment before resorting to an RCE.

Relevant MPEP Sections for Prosecution Strategy

  • MPEP § 713.10: Examiner interviews - available before Notice of Allowance or transfer to PTAB
  • MPEP § 714.12: After-final amendments - may be entered "under justifiable circumstances"
  • MPEP § 1002.02(c): Petitionable matters to Technology Center Director
  • MPEP § 1004: Actions requiring primary examiner signature (allowances, final rejections, examiner's answers)
  • MPEP § 1207.01: Appeal conferences - mandatory for all appeals
  • MPEP § 1214.07: Reopening prosecution after appeal

Important Disclaimer

Not Legal Advice: The information provided in this report is for informational purposes only and does not constitute legal advice. You should consult with a qualified patent attorney or agent for advice specific to your situation.

No Guarantees: We do not provide any guarantees as to the accuracy, completeness, or timeliness of the statistics presented above. Patent prosecution statistics are derived from publicly available USPTO data and are subject to data quality limitations, processing errors, and changes in USPTO practices over time.

Limitation of Liability: Under no circumstances will IronCrow AI be liable for any outcome, decision, or action resulting from your reliance on the statistics, analysis, or recommendations presented in this report. Past prosecution patterns do not guarantee future results.

Use at Your Own Risk: While we strive to provide accurate and useful prosecution statistics, you should independently verify any information that is material to your prosecution strategy and use your professional judgment in all patent prosecution matters.