USPTO Examiner OH JAEHWAN - Art Unit 2899

Recent Applications

Detailed information about the 100 most recent patent applications.

Application NumberTitleFiling DateDisposal DateDispositionTime (months)Office ActionsRestrictionsInterviewAppeal
18948080SEMICONDUCTOR DEVICE INCLUDING INTERCONNECT STRUCTURE WITH METAL BRIDGE PATTERN CONNECTING ADJACENT METAL LINESNovember 2024April 2025Allow501NoNo
18886289SEMICONDUCTOR DEVICE INCLUDING INTERCONNECT STRUCTURE WITH PLANARIZATION STOP LAYERSeptember 2024December 2024Allow300NoNo
18762896LARGE DIAMETER SILICON CARBIDE WAFERSJuly 2024July 2025Allow1310NoNo
18746717APPARATUS AND METHOD FOR MANUFACTURING METAL GATE STRUCTURESJune 2024May 2025Allow1110NoNo
18738526Deposition Equipment with Adjustable Temperature SourceJune 2024December 2025Allow1810NoNo
18670872LASER PROCESSING SYSTEM INTEGRATED WITH MBE DEVICEMay 2024November 2024Allow610NoNo
18622500VERTICALLY SPACED INTRA-LEVEL INTERCONNECT LINE METALLIZATION FOR INTEGRATED CIRCUIT DEVICESMarch 2024August 2025Allow1710NoNo
18395081IN-LINE MONITORING OF OLED LAYER THICKNESS AND DOPANT CONCENTRATIONDecember 2023October 2024Allow900NoNo
18529193APPARATUS, SYSTEM, AND METHOD OF PROVIDING A RAMPED INTERCONNECT FOR SEMICONDUCTOR FABRICATIONDecember 2023October 2024Allow1010NoNo
18514930DISPLAY PANEL AND METHOD FOR MANUFACTURING THE SAMENovember 2023July 2024Allow700NoNo
18507621SILICON CARBIDE WAFER AND SILICON CARBIDE SEMICONDUCTOR DEVICE INCLUDING THE SAMENovember 2023February 2026Allow2700NoNo
18559366IMAGING SENSOR AND IMAGING DEVICENovember 2023February 2026Allow2700NoNo
18501708APPARATUS FOR MANUFACTURING DISPLAY DEVICE, METHOD OF MANUFACTURING MASK ASSEMBLY, AND METHOD OF MANUFACTURING DISPLAY DEVICENovember 2023November 2024Allow1310NoNo
18497137ULTRAWIDE BANDGAP SEMICONDUCTOR DEVICES INCLUDING MAGNESIUM GERMANIUM OXIDESOctober 2023November 2024Allow1310NoNo
18496764ULTRAWIDE BANDGAP SEMICONDUCTOR DEVICES INCLUDING MAGNESIUM GERMANIUM OXIDESOctober 2023October 2024Allow1110NoNo
18381288SEMICONDUCTOR DEVICE MANUFACTURING METHOD, CURABLE RESIN COMPOSITION FOR TEMPORARY FIXATION MATERIAL, FILM FOR TEMPORARY FIXATION MATERIAL, AND LAMINATED FILM FOR TEMPORARY FIXATION MATERIALOctober 2023May 2024Allow700NoNo
18488602SINGLE CRYSTAL SYNTHETIC DIAMOND MATERIALOctober 2023June 2024Allow800NoNo
18555834MULTIGATE IN-PIXEL SOURCE FOLLOWEROctober 2023February 2026Allow2800NoNo
18476637IMAGE SENSOR AND METHOD OF MANUFACTURING THE SAMESeptember 2023January 2026Allow2800NoNo
18474615MEMORY DEVICESeptember 2023January 2026Allow2800NoNo
18239126SEMICONDUCTOR PACKAGE HAVING HEAT EMITTING POST BONDED THERETO AND METHOD OF MANUFACTURING THE SAMEAugust 2023February 2026Allow3010NoNo
18276887PREPARATION METHOD FOR GROWING GERMANIUM SULFIDE (GeS2) SINGLE-CRYSTAL THIN FILM ON SiO2 SUBSTRATEAugust 2023October 2025Allow2600NoNo
18361008DEPOSITION SYSTEM FOR HIGH ACCURACY PATTERNINGJuly 2023January 2025Allow1710NoNo
18361729DEPOSITION SYSTEM AND METHODJuly 2023September 2024Allow1410NoNo
18360667PVD TARGET DESIGN AND SEMICONDUCTOR DEVICES FORMED USING THE SAMEJuly 2023August 2024Allow1310NoNo
18355888THREE-DIMENSIONAL MEMORY DEVICE AND METHOD OF MAKING THEREOF BY NON-CONFORMAL SELECTIVE DEPOSITION OF INSULATING SPACERS IN A MEMORY OPENINGJuly 2023October 2025Allow2700NoNo
18343092THERMISTOR INTEGRATED WITH A BIAS RESISTORJune 2023October 2025Allow2800NoNo
18341506DEPOSITION SYSTEM AND METHODJune 2023August 2024Allow1410NoNo
18259151METHOD OF DEPOSITING SILICON NITRIDE FILM, APPARATUS FOR DEPOSITING FILM, AND SILICON NITRIDE FILMJune 2023October 2025Allow2800NoNo
18339526SEMICONDUCTOR MEMORYJune 2023May 2024Allow1110NoNo
18338280LARGE AREA GROUP III NITRIDE CRYSTALS AND SUBSTRATES, METHODS OF MAKING, AND METHODS OF USEJune 2023September 2025Allow2700NoNo
18210653DEPOSITION MASK, METHOD OF FABRICATING THE SAME, AND METHOD OF MANUFACTURING DISPLAY DEVICE USING THE SAMEJune 2023January 2024Allow700NoNo
18332047DC AND AC MAGNETIC FIELD PROTECTION FOR MRAM DEVICE USING MAGNETIC-FIELD-SHIELDING STRUCTUREJune 2023October 2024Allow1600NoNo
18208176SEMICONDUCTOR CHIPS AND METHOD OF MANUFACTURING THEREOFJune 2023October 2025Allow2800NoNo
18328263SiC SINGLE CRYSTAL SUBSTRATEJune 2023September 2025Allow2730YesYes
18202445METHOD FOR PREPARING JOSEPHSON JUNCTION AND PRODUCTION LINE DEVICEMay 2023October 2025Allow2900NoNo
18317946MANUFACTURING METHOD OF DISPLAY DEVICE AND EVAPORATION DEVICEMay 2023February 2026Allow3301NoNo
18036521RHYTHMIC DEPOSITION PRODUCTION METHOD AND EQUIPMENT FOR PEROVSKITE THIN FILMMay 2023January 2026Allow3210NoNo
18033560Display Substrate, Manufacturing Method Therefor, and Display DeviceApril 2023December 2025Allow3200NoNo
18301502GRAPHITE DISCApril 2023September 2025Allow2900NoNo
18299268METHODS FOR MANUFACTURING A SEMICONDUCTOR WAFER USING A PREHEAT RING IN A WAFER REACTORApril 2023August 2025Allow2900YesNo
18299085MANUFACTURING METHOD OF DISPLAY DEVICE AND EVAPORATION DEVICEApril 2023October 2025Allow3001NoNo
18193058NANOCRYSTALLINE BORON NITRIDE FILM, IMAGE SENSOR INCLUDING THE SAME, FIELD EFFECT TRANSISTOR INCLUDING THE SAME, AND METHOD OF FABRICATING THE NANOCRYSTALLINE BORON NITRIDE FILMMarch 2023July 2025Allow2800NoNo
18186033OPTICAL DEVICE AND MANUFACTURING METHOD THEREFORMarch 2023September 2025Allow3040YesNo
18025029SILICON CARBIDE EPITAXIAL SUBSTRATEMarch 2023June 2025Allow2800NoNo
18024147DISPLAY SUBSTRATE, DISPLAY APPARATUS AND MASK PLATEMarch 2023December 2025Allow3310YesNo
18042725LAMINATE, SINGLE CRYSTAL DIAMOND SUBSTRATE AND METHOD OF PRODUCING SAMEFebruary 2023June 2025Allow2801NoNo
18022541DISPLAY SUBSTRATE, MANUFACTURING METHOD THEREOF, AND DISPLAY DEVICEFebruary 2023November 2025Allow3310NoNo
18021811Light Emitting Panel and Preparation Method thereof, and Light Emitting ApparatusFebruary 2023October 2025Allow3200NoNo
18041930EPITAXIAL SILICON WAFER, METHOD FOR PRODUCING SAME, AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICEFebruary 2023June 2025Allow2800NoNo
18168265CONTROL OF ENVIRONMENT WITHIN PROCESSING MODULESFebruary 2023February 2026Allow3610NoNo
18100820ORGANIC VAPOR JET PRINTING SYSTEMJanuary 2023February 2026Allow3710NoNo
18099583SEMICONDUCTOR DEVICE AND SEMICONDUCTOR COMPONENT INCLUDING THE SAMEJanuary 2023March 2024Allow1420NoNo
18016333SILICON CARBIDE EPITAXIAL SUBSTRATEJanuary 2023May 2025Allow2800NoNo
18089895THREE-DIMENSIONAL MEMORY DEVICE AND FABRICATION METHODDecember 2022December 2025Allow3610NoNo
18068830FREE-STANDING SUBSTRATE FOR EPITAXIAL CRYSTAL GROWTH, AND FUNCTIONAL ELEMENTDecember 2022August 2025Allow3200NoNo
18070296COATING METHOD FOR MAKING CHIP, CHIP SUBSTRATE, AND CHIPNovember 2022December 2025Allow3710NoNo
17988379METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR WAFERNovember 2022July 2025Allow3200NoNo
17922381CUTTING TOOLOctober 2022April 2025Allow2900NoNo
17922482ORGANIC LIGHT-EMITTING DISPLAY PANEL AND MANUFACTURING METHOD THEREFOR, AND DISPLAY DEVICEOctober 2022May 2025Allow3000NoNo
17996369METHOD OF FORMING SHADOW WALLS FOR FABRICATING PATTERNED STRUCTURESOctober 2022June 2025Allow3200NoNo
17907509METHOD FOR MANUFACTURING A COMPOSITE STRUCTURE COMPRISING A THIN LAYER MADE OF MONOCRYSTALLINE SIC ON A CARRIER SUBSTRATE MADE OF SICSeptember 2022March 2025Allow3000NoNo
17948521Memory Circuitry And Method Used In Forming Memory CircuitrySeptember 2022May 2025Allow3200NoNo
17933508Method for Producing a Three-Dimensionally Integrated Semiconductor MemorySeptember 2022October 2025Allow3710NoNo
17911737DISPLAY PANEL, DISPLAY DEVICE AND MASKSeptember 2022August 2025Allow3510NoNo
17945338OPTIMIZED SADDLE NOZZLE DESIGN FOR GAS INJECTION SYSTEMSeptember 2022May 2025Allow3200NoNo
17931923SEMICONDUCTOR MEMORY DEVICESeptember 2022June 2025Allow3300NoNo
17940758ETCHING METHODSeptember 2022March 2025Allow3000NoNo
17901802SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOFSeptember 2022March 2025Allow3100NoNo
17901812SEMICONDUCTOR STORAGE DEVICESeptember 2022May 2025Allow3300NoNo
17899863Methods Of Forming Optical ModulesAugust 2022March 2025Allow3100NoNo
17898944SEMICONDUCTOR STORAGE DEVICE AND MANUFACTURING METHOD THEREOFAugust 2022August 2025Allow3510NoNo
17821881SEALING STRUCTURES FOR LIGHT-EMITTING DIODE PACKAGESAugust 2022July 2025Allow3510NoNo
17818432CHIP PACKAGE STRUCTURE WITH RING STRUCTUREAugust 2022March 2025Allow3100NoNo
17880167LATERAL III/V HETEROSTRUCTURE FIELD EFFECT TRANSISTORAugust 2022March 2025Allow3100NoNo
17870045SEMICONDUCTOR DEVICEJuly 2022March 2025Allow3200NoNo
17862906SEMICONDUCTOR DEVICEJuly 2022July 2025Allow3610NoNo
17850488SEMICONDUCTOR PACKAGE INCLUDING SUB-PACKAGEJune 2022September 2025Allow3910YesNo
17789173MASK PLATE ASSEMBLYJune 2022March 2025Allow3200NoNo
17789191The Preparation Method and Application of An Er Doped Ga2O3 FilmJune 2022October 2024Allow2800NoNo
17847245SEMICONDUCTOR STRUCTURE AND FABRICATION METHOD THEREOF, AND MEMORYJune 2022March 2025Allow3300NoNo
17844171PHOSPHOR COMPOSITIONS AND SHORT WAVELENGTH INFRARED EMITTING PCLEDS EMITTING IN THE 1600-2200 NM WAVELENGTH RANGEJune 2022February 2025Allow3200NoNo
17787197INDIUM PHOSPHIDE SUBSTRATEJune 2022April 2024Allow2200NoNo
17806579THROUGH-STACK CONTACT VIA STRUCTURES FOR A THREE-DIMENSIONAL MEMORY DEVICE AND METHODS OF FORMING THE SAMEJune 2022January 2025Allow3100NoNo
17836470SILICON CARBIDE WAFER AND SEMICONDUCTOR DEVICEJune 2022December 2024Allow3100NoNo
17831884Semiconductor Devices and MethodsJune 2022February 2025Allow3200NoNo
17781125ELECTROLUMINESCENT DIODE AND DISPLAY DEVICEMay 2022May 2025Allow3610NoNo
17804496Systems and Methods for Plasma ProcessMay 2022January 2026Allow4420NoNo
17780689DEVICES COMPRISING DISTRIBUTED BRAGG REFLECTORS AND METHODS OF MAKING THE DEVICESMay 2022December 2024Allow3100NoNo
17780304DISPLAY PANEL AND DISPLAY APPARATUSMay 2022March 2025Allow3410NoNo
17664385ELECTRONIC DEVICES COMPRISING A COMPRESSIVE DIELECTRIC MATERIAL, AND RELATED SYSTEMS AND METHODSMay 2022September 2024Allow2800NoNo
17739147DISPLAY PANEL AND MANUFACTURING METHOD THEREOFMay 2022July 2025Allow3820NoNo
17775195Optoelectronic Semiconductor Chip and Method for Producing Optoelectronic Semiconductor ChipsMay 2022April 2025Allow3520NoNo
17774958SEMICONDUCTOR DEVICEMay 2022July 2025Allow3810NoNo
17774235OPTOELECTRONIC DEVICE FORMED ON A FLEXIBLE SUBSTRATEMay 2022July 2024Allow2600NoNo
17773030Display Substrate, Manufacturing Method Thereof, and Display DeviceApril 2022August 2025Allow4020NoNo
17772972MULTILAYER FILM STRUCTURE AND METHOD FOR PRODUCING SAMEApril 2022August 2024Allow2810YesNo
17722083DISPLAY PANEL, DISPLAY DEVICE, AND EVAPORATION DEVICEApril 2022February 2025Allow3410NoNo
17720990DISLOCATION ENHANCED TRANSISTOR DEVICE AND METHODApril 2022June 2025Allow3811NoNo
17717223SENSOR PACKAGE STRUCTUREApril 2022August 2024Allow2800NoNo

Appeals Overview

This analysis examines appeal outcomes and the strategic value of filing appeals for examiner OH, JAEHWAN.

Strategic Value of Filing an Appeal

Total Appeal Filings
1
Allowed After Appeal Filing
1
(100.0%)
Not Allowed After Appeal Filing
0
(0.0%)
Filing Benefit Percentile
98.2%
Higher than average

Understanding Appeal Filing Strategy

Filing a Notice of Appeal can sometimes lead to allowance even before the appeal is fully briefed or decided by the PTAB. This occurs when the examiner or their supervisor reconsiders the rejection during the mandatory appeal conference (MPEP § 1207.01) after the appeal is filed.

In this dataset, 100.0% of applications that filed an appeal were subsequently allowed. This appeal filing benefit rate is in the top 25% across the USPTO, indicating that filing appeals is particularly effective here. The act of filing often prompts favorable reconsideration during the mandatory appeal conference.

Strategic Recommendations

Filing a Notice of Appeal is strategically valuable. The act of filing often prompts favorable reconsideration during the mandatory appeal conference.

Examiner OH, JAEHWAN - Prosecution Strategy Guide

Executive Summary

Examiner OH, JAEHWAN works in Art Unit 2899 and has examined 92 patent applications in our dataset. With an allowance rate of 95.7%, this examiner allows applications at a higher rate than most examiners at the USPTO. Applications typically reach final disposition in approximately 30 months.

Allowance Patterns

Examiner OH, JAEHWAN's allowance rate of 95.7% places them in the 85% percentile among all USPTO examiners. This examiner is more likely to allow applications than most examiners at the USPTO.

Office Action Patterns

On average, applications examined by OH, JAEHWAN receive 1.12 office actions before reaching final disposition. This places the examiner in the 12% percentile for office actions issued. This examiner issues significantly fewer office actions than most examiners.

Prosecution Timeline

The median time to disposition (half-life) for applications examined by OH, JAEHWAN is 30 months. This places the examiner in the 61% percentile for prosecution speed. Prosecution timelines are slightly faster than average with this examiner.

Interview Effectiveness

Conducting an examiner interview provides a +5.3% benefit to allowance rate for applications examined by OH, JAEHWAN. This interview benefit is in the 31% percentile among all examiners. Recommendation: Interviews provide a below-average benefit with this examiner.

Request for Continued Examination (RCE) Effectiveness

When applicants file an RCE with this examiner, 38.5% of applications are subsequently allowed. This success rate is in the 88% percentile among all examiners. Strategic Insight: RCEs are highly effective with this examiner compared to others. If you receive a final rejection, filing an RCE with substantive amendments or arguments has a strong likelihood of success.

After-Final Amendment Practice

This examiner enters after-final amendments leading to allowance in 40.0% of cases where such amendments are filed. This entry rate is in the 61% percentile among all examiners. Strategic Recommendation: This examiner shows above-average receptiveness to after-final amendments. If your amendments clearly overcome the rejections and do not raise new issues, consider filing after-final amendments before resorting to an RCE.

Appeal Withdrawal and Reconsideration

This examiner withdraws rejections or reopens prosecution in 100.0% of appeals filed. This is in the 96% percentile among all examiners. Strategic Insight: This examiner frequently reconsiders rejections during the appeal process compared to other examiners. Per MPEP § 1207.01, all appeals must go through a mandatory appeal conference. Filing a Notice of Appeal may prompt favorable reconsideration even before you file an Appeal Brief.

Petition Practice

When applicants file petitions regarding this examiner's actions, 85.7% are granted (fully or in part). This grant rate is in the 87% percentile among all examiners. Strategic Note: Petitions are frequently granted regarding this examiner's actions compared to other examiners. Per MPEP § 1002.02(c), various examiner actions are petitionable to the Technology Center Director, including prematureness of final rejection, refusal to enter amendments, and requirement for information. If you believe an examiner action is improper, consider filing a petition.

Examiner Cooperation and Flexibility

Examiner's Amendments: This examiner makes examiner's amendments in 0.0% of allowed cases (in the 28% percentile). This examiner makes examiner's amendments less often than average. You may need to make most claim amendments yourself.

Quayle Actions: This examiner issues Ex Parte Quayle actions in 0.0% of allowed cases (in the 34% percentile). This examiner issues Quayle actions less often than average. Allowances may come directly without a separate action for formal matters.

Prosecution Strategy Recommendations

Based on the statistical analysis of this examiner's prosecution patterns, here are tailored strategic recommendations:

  • RCEs are effective: This examiner has a high allowance rate after RCE compared to others. If you receive a final rejection and have substantive amendments or arguments, an RCE is likely to be successful.
  • Appeal filing as negotiation tool: This examiner frequently reconsiders rejections during the appeal process. Filing a Notice of Appeal may prompt favorable reconsideration during the mandatory appeal conference.

Relevant MPEP Sections for Prosecution Strategy

  • MPEP § 713.10: Examiner interviews - available before Notice of Allowance or transfer to PTAB
  • MPEP § 714.12: After-final amendments - may be entered "under justifiable circumstances"
  • MPEP § 1002.02(c): Petitionable matters to Technology Center Director
  • MPEP § 1004: Actions requiring primary examiner signature (allowances, final rejections, examiner's answers)
  • MPEP § 1207.01: Appeal conferences - mandatory for all appeals
  • MPEP § 1214.07: Reopening prosecution after appeal

Important Disclaimer

Not Legal Advice: The information provided in this report is for informational purposes only and does not constitute legal advice. You should consult with a qualified patent attorney or agent for advice specific to your situation.

No Guarantees: We do not provide any guarantees as to the accuracy, completeness, or timeliness of the statistics presented above. Patent prosecution statistics are derived from publicly available USPTO data and are subject to data quality limitations, processing errors, and changes in USPTO practices over time.

Limitation of Liability: Under no circumstances will IronCrow AI be liable for any outcome, decision, or action resulting from your reliance on the statistics, analysis, or recommendations presented in this report. Past prosecution patterns do not guarantee future results.

Use at Your Own Risk: While we strive to provide accurate and useful prosecution statistics, you should independently verify any information that is material to your prosecution strategy and use your professional judgment in all patent prosecution matters.