USPTO Examiner HSIEH HSIN YI - Art Unit 2899

Recent Applications

Detailed information about the 100 most recent patent applications.

Application NumberTitleFiling DateDisposal DateDispositionTime (months)Office ActionsRestrictionsInterviewAppeal
19263700METHOD OF MANUFACTURING A PHOTONIC DEVICEJuly 2025October 2025Allow301YesNo
192225563D LIGHT-EMITTING DIODE AND ASSOCIATED MANUFACTURING METHODMay 2025September 2025Allow401YesNo
18766529PROCESS FOR MANUFACTURING AN ELECTROLUMINESCENT DEVICEJuly 2024December 2024Allow510YesNo
18403470VERTICAL SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAMEJanuary 2024March 2025Allow1400NoNo
18486430SEMICONDUCTOR LIGHT-EMITTING ELEMENT AND METHOD FOR MANUFACTURING SEMICONDUCTOR LIGHT-EMITTING ELEMENTOctober 2023August 2025Abandon2220NoNo
18486388SEMICONDUCTOR LIGHT-EMITTING ELEMENT AND METHOD FOR MANUFACTURING SEMICONDUCTOR LIGHT-EMITTING ELEMENTOctober 2023January 2025Allow1510NoNo
183593113DIC Interconnect Apparatus and MethodJuly 2023July 2025Allow2420YesNo
18343078METHOD FOR MANUFACTURING LIGHT-EMITTING ELEMENTJune 2023October 2024Allow1611YesNo
18267422OPTOELECTRONIC DEVICE WITH AXIAL THREE-DIMENSIONAL LIGHT-EMITTING DIODESJune 2023October 2025Allow2800YesNo
18329191METHOD OF FORMING P-TYPE NITRIDE SEMICONDUCTOR LAYERJune 2023November 2024Allow1820NoNo
18303423DISPLAY DEVICE AND METHOD OF MANUFACTURING LIGHT EMITTING DEVICEApril 2023May 2024Allow1301NoNo
18192021LIGHT EMITTING DIODE WITH OPTIMISED ELECTRIC INJECTION FROM A SIDE ELECTRODEMarch 2023October 2025Allow3001YesNo
18105407SEMICONDUCTOR DEVICE COMPRISING TRANSISTORFebruary 2023March 2025Allow2520YesNo
18096889BOTTOM TUNNEL JUNCTION LIGHT-EMITTING FIELD-EFFECT TRANSISTORSJanuary 2023April 2025Allow2700YesNo
18071053RF DEVICES WITH ENHANCED PERFORMANCE AND METHODS OF FORMING THE SAMENovember 2022March 2025Allow2811YesNo
17971528METHOD OF MANUFACTURING LIGHT EMITTING PACKAGE STRUCTUREOctober 2022May 2025Allow3121YesNo
17967177LIGHT EMITTING ELEMENT AND DISPLAY DEVICE INCLUDING THE SAMEOctober 2022January 2026Allow3911NoNo
17946837Integrated Structures and Methods of Forming Vertically-Stacked Memory CellsSeptember 2022June 2024Allow2130YesNo
17944260SILICON CARBIDE CRYSTALSeptember 2022August 2025Abandon3521NoNo
17944189DISPLAY DEVICESeptember 2022March 2025Allow3000YesNo
17818289Methods for Reducing Contact Depth Variation in Semiconductor FabricationAugust 2022June 2025Allow3420YesNo
17843618SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOFJune 2022October 2025Abandon4040NoNo
17840661NITRIDE-BASED SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAMEJune 2022March 2024Allow2120YesNo
17839220SYSTEMS AND METHODS FOR FABRICATING FINFETS WITH DIFFERENT THRESHOLD VOLTAGESJune 2022March 2024Allow2121YesNo
17656158ELECTRONIC DEVICEMarch 2022October 2024Allow3001NoNo
17686331ISOLATING ELECTRIC PATHS IN SEMICONDUCTOR DEVICE PACKAGESMarch 2022September 2025Abandon4311NoNo
17569057STRUCTURE AND FORMATION METHOD OF SEMICONDUCTOR DEVICE WITH EPITAXIAL STRUCTURESJanuary 2022February 2026Allow4931NoNo
17621058METHOD FOR LOCAL REMOVAL OF SEMICONDUCTOR WIRESDecember 2021January 2026Allow4930YesNo
17549924INTEGRATED CIRCUIT DEVICE AND ELECTRONIC SYSTEM INCLUDING SAMEDecember 2021May 2025Allow4121YesNo
17548175PHOTORESIST PATTERNING PROCESS SUPPORTING TWO STEP PHOSPHOR-DEPOSITION TO FORM AN LED MATRIX ARRAYDecember 2021February 2024Allow2621YesNo
17611041Component with Buried Doped Areas and Procedures for the Production of A ComponentNovember 2021January 2026Abandon5011YesNo
17523931LIGHT EMITTING APPARATUS AND MANUFACTURING METHOD THEREOFNovember 2021February 2025Allow3911YesNo
17516004MICRO LIGHT-EMITTING DEVICENovember 2021May 2025Abandon4321YesNo
17510494NITRIDE SEMICONDUCTOR LIGHT-EMITTING ELEMENT AND METHOD FOR MANUFACTURING NITRIDE SEMICONDUCTOR LIGHT-EMITTING ELEMENTOctober 2021March 2025Allow4121YesNo
17492719BLUE PHOTON COUPLING IMPROVEMENT IN LAYER-STRUCTURED CERAMIC CONVERTEROctober 2021May 2025Abandon4321NoNo
17449114DISPLAY DEVICE AND METHOD OF MANUFACTURING THE SAMESeptember 2021October 2025Allow4831YesNo
17479980METHOD OF MANUFACTURING LIGHT-EMITTING ELEMENT, AND LIGHT-EMITTING ELEMENT ARRAY SUBSTRATE AND DISPLAY DEVICE INCLUDING THE SAMESeptember 2021September 2025Allow4851YesNo
17464355LIGHT-EMITTING DEVICE AND METHOD FOR MANUFACTURING THE SAMESeptember 2021November 2024Allow3931YesNo
17378106SEMICONDUCTOR LIGHT-EMITTING ELEMENT AND METHOD OF MANUFACTURING SEMICONDUCTOR LIGHT-EMITTING ELEMENTJuly 2021October 2024Allow3921NoNo
17374568LED DISPLAY APPARATUSJuly 2021August 2024Allow3721YesNo
17373140LIGHT EMITTING ELEMENT AND METHOD OF MANUFACTURING LIGHT EMITTING ELEMENTJuly 2021February 2026Allow5561YesNo
17358589POSITIONING MASK, SYSTEM AND METHOD FOR MANUFACTURING AN OPTOELECTRONIC DEVICEJune 2021February 2025Allow4421YesNo
17349943Method of manufacturing a light emitting deviceJune 2021December 2024Abandon4241NoNo
17345282LED PACKAGE STRUCTURE, LED PACKAGING METHOD, AND LIGHT SOURCEJune 2021March 2025Abandon4521YesNo
17339036SEMICONDUCTOR LIGHT EMITTING DEVICE AND METHOD FOR MANUFACTURING THE SAMEJune 2021March 2026Abandon5761NoNo
17327208LIGHT-EMITTING ASSEMBLY, METHOD FOR MAKING SAME, AND ELECTRONIC DEVICE USING SAMEMay 2021July 2024Allow3831NoNo
17313700FIELD EFFECT TRANSISTOR STRUCTURESMay 2021December 2025Allow5550YesNo
17217715WAVELENGTH CONVERSION MEMBER AND METHOD OF MANUFACTURING THE SAMEMarch 2021May 2025Allow5021NoYes
17278923DISPLAY DEVICEMarch 2021April 2025Abandon4921NoNo
17195271INDIUM-GALLIUM-NITRIDE LIGHT EMITTING DIODES WITH LIGHT REFLECTING MIRRORSMarch 2021February 2025Allow4741YesNo
17195563THREE-DIMENSIONAL INTEGRATED CIRCUIT HAVING ESD PROTECTION CIRCUITMarch 2021February 2026Allow6041YesNo
17254638EMITTING DEVICE, ASSOCIATED DISPLAY SCREEN AND METHOD FOR FABRICATING AN EMITTING DEVICEDecember 2020March 2025Abandon5141YesNo
17078839METHOD OF MANUFACTURING LIGHT-EMITTING DEVICE AND LIGHT-EMITTING DEVICEOctober 2020July 2024Allow4431YesNo
17074110SEMICONDUCTOR DEVICE HAVING A UNIFORM AND THIN SILICIDE LAYER ON AN EPITAXIAL SOURCE/DRAIN STRUCTUREOctober 2020March 2025Allow5361YesNo
17044909THERMALLY CONDUCTIVE GRAPHENE-BASED MATERIAL AND METHOD FOR MANUFACTURING THE SAMEOctober 2020April 2024Abandon4201NoNo
17044829METHOD OF MANUFACTURING HIGH-RESOLUTION MICRO-OLED AND DISPLAY MODULEOctober 2020February 2025Abandon5221NoNo
17033699WAVELENGTH CONVERSION MATERIAL, METHOD OF MANUFACTURING THEREOF AND LIGHT EMITTING DEVICESeptember 2020July 2024Allow4531NoNo
17013851LIGHT CONVERSION MATERIAL, PRODUCING METHOD THEREOF, LIGHT-EMITTING DEVICE AND BACKLIGHT MODULE EMPLOYING THE SAMESeptember 2020February 2025Allow5431NoNo
16965576PHOSPHOR SHEET, METHOD FOR THE PRODUCTION OF A PHOSPHOR SHEET, OPTOELECTRONIC DEVICE, METHOD FOR THE PRODUCTION OF AN OPTOELECTRONIC DEVICEJuly 2020January 2026Abandon6041NoNo
16930819Semiconductor Heterostructure with P-type SuperlatticeJuly 2020January 2024Allow4220YesNo
16960559FLEXIBLE COLOR FILTER AND MANUFACTURING METHOD THEREOF, FULL-COLOR MICRO LIGHT-EMITTING DIODE DEVICEJuly 2020August 2024Allow4921NoNo
16908546WAFER-LEVEL CHIP-SCALE PACKAGING STRUCTURE AND METHOD OF PREPARING SAMEJune 2020February 2024Abandon4431NoNo
16907597Stress Reduction Apparatus and MethodJune 2020June 2024Allow4730NoNo
16845457LED DEVICE, METHOD OF MANUFACTURING THE LED DEVICE, AND DISPLAY APPARATUS INCLUDING THE LED DEVICEApril 2020June 2025Abandon6061YesNo
16753366METHOD FOR PRODUCING AN OPTOELECTRONIC COMPONENT, AND OPTOELECTRONIC COMPONENTApril 2020November 2024Allow5561YesNo
16720636LED PACKAGE WITH INCREASED CONTRAST RATIODecember 2019October 2025Abandon60101YesNo
16717722METHOD OF PRODUCING SEMICONDUCTOR EPITAXIAL WAFER, SEMICONDUCTOR EPITAXIAL WAFER, AND METHOD OF PRODUCING SOLID-STATE IMAGE SENSING DEVICEDecember 2019August 2024Abandon5630NoNo
16717706METHOD OF PRODUCING SEMICONDUCTOR EPITAXIAL WAFER, SEMICONDUCTOR EPITAXIAL WATER, AND METHOD OF PRODUCING SOLID-STATE IMAGE SENSING DEVICEDecember 2019August 2024Abandon5630YesNo
16717763METHOD FOR PRODUCING SEMICONDUCTOR EPITAXIAL WAFER, SEMICONDUCTOR EPITAXIAL WAFER, AND METHOD OF PRODUCING SOLID-STATE IMAGE SENSING DEVICEDecember 2019September 2025Abandon6050YesNo
16716752METHOD OF MANUFACTURING LIGHT EMITTING DEVICE PACKAGE AND METHOD OF MANUFACTURING DISPLAY PANEL USING THE SAMEDecember 2019February 2025Allow6081YesNo
16713463DISPLAY DEVICEDecember 2019March 2025Allow6071NoNo
15969250THIN FILM TRANSISTOR AND METHOD FOR MANUFACTURING THE SAME, ARRAY SUBSTRATE, AND ELECTRONIC APPARATUSMay 2018June 2019Allow1320NoNo
15901979CONTACT USING MULTILAYER LINERFebruary 2018August 2019Allow1720NoNo
15902116SILICON CARBIDE SEMICONDUCTOR DEVICE, MANUFACTURING METHOD THEREFOR AND POWER CONVERSION APPARATUSFebruary 2018June 2019Allow1511NoNo
15287611DUAL SILICIDE LINER FLOW FOR ENABLING LOW CONTACT RESISTANCEOctober 2016September 2019Allow3540YesNo
15115914MANUFACTURING METHOD OF TFT SUBSTRATE AND TFT SUBSTRATEAugust 2016January 2019Allow2911NoNo
14753808PIXEL STRUCTURE OF DISPLAY PANELJune 2015April 2016Allow1010NoNo
14668017GLASS INTERPOSER WITH EMBEDDED THERMOELECTRIC DEVICESMarch 2015November 2017Allow3221YesNo
14656671COMMON FABRICATION OF MULTIPLE FINFETs WITH DIFFERENT CHANNEL HEIGHTSMarch 2015January 2018Allow3430YesNo
14633734NON-MAGNIFIED LED FOR HIGH CENTER-BEAM CANDLE POWERFebruary 2015March 2025Abandon60101YesNo
14360329THIN FILM TRANSISTOR AND METHOD FOR MANUFACTURING THE SAME, ARRAY SUBSTRATE, AND ELECTRONIC APPARATUSMay 2014January 2018Allow4451YesNo
14269856Insulation Layer to Improve Capacitor Breakdown VoltageMay 2014July 2015Allow1410NoNo
13677954DUAL PHASE GALLIUM NITRIDE MATERIAL FORMATION ON (100) SILICONNovember 2012January 2015Allow2611NoNo
13660655SEMICONDUCTOR PACKAGE AND METHOD OF MANUFACTURING THE SEMICONDUCTOR PACKAGEOctober 2012January 2015Allow2720NoNo
13611226Stress Reduction ApparatusSeptember 2012September 2015Allow3641YesNo
13612432PIXEL STRUCTURE OF DISPLAY PANEL AND METHOD FOR MANUFACTURING THE SAMESeptember 2012May 2015Allow3231NoNo
13116672METHOD OF FORMING CONTACTS FOR DEVICES WITH MULTIPLE STRESS LINERSMay 2011January 2015Allow4441NoNo
13037740LIGHT EMITTING DEVICEMarch 2011April 2014Allow3721YesNo
12979569ELECTROSTATIC DISCHARGE PROTECTION DEVICEDecember 2010August 2015Allow5640YesNo
12892032SEMICONDUCTOR PACKAGE WITH A CONDUCTIVE SHIELDING MEMBERSeptember 2010August 2015Allow5851NoNo
12553119THIN FILM TRANSISTOR WITH AN OXIDE SEMICONDUCTOR LAYERSeptember 2009June 2015Allow6061NoNo
12553067METHOD FOR FORMING MEMORY CELL TRANSISTORSeptember 2009October 2014Allow6061NoNo
11458873DISPLAY DEVICEJuly 2006November 2014Allow6091YesNo
11316895TFT array substrate and fabrication method thereofDecember 2005January 2015Allow60101YesNo

Appeals Overview

This analysis examines appeal outcomes and the strategic value of filing appeals for examiner HSIEH, HSIN YI.

Patent Trial and Appeal Board (PTAB) Decisions

Total PTAB Decisions
1
Examiner Affirmed
0
(0.0%)
Examiner Reversed
1
(100.0%)
Reversal Percentile
96.2%
Higher than average

What This Means

With a 100.0% reversal rate, the PTAB has reversed the examiner's rejections more often than affirming them. This reversal rate is in the top 25% across the USPTO, indicating that appeals are more successful here than in most other areas.

Strategic Value of Filing an Appeal

Total Appeal Filings
1
Allowed After Appeal Filing
1
(100.0%)
Not Allowed After Appeal Filing
0
(0.0%)
Filing Benefit Percentile
98.2%
Higher than average

Understanding Appeal Filing Strategy

Filing a Notice of Appeal can sometimes lead to allowance even before the appeal is fully briefed or decided by the PTAB. This occurs when the examiner or their supervisor reconsiders the rejection during the mandatory appeal conference (MPEP § 1207.01) after the appeal is filed.

In this dataset, 100.0% of applications that filed an appeal were subsequently allowed. This appeal filing benefit rate is in the top 25% across the USPTO, indicating that filing appeals is particularly effective here. The act of filing often prompts favorable reconsideration during the mandatory appeal conference.

Strategic Recommendations

Appeals to PTAB show good success rates. If you have a strong case on the merits, consider fully prosecuting the appeal to a Board decision.

Filing a Notice of Appeal is strategically valuable. The act of filing often prompts favorable reconsideration during the mandatory appeal conference.

Examiner HSIEH, HSIN YI - Prosecution Strategy Guide

Executive Summary

Examiner HSIEH, HSIN YI works in Art Unit 2899 and has examined 67 patent applications in our dataset. With an allowance rate of 73.1%, this examiner has a below-average tendency to allow applications. Applications typically reach final disposition in approximately 45 months.

Allowance Patterns

Examiner HSIEH, HSIN YI's allowance rate of 73.1% places them in the 37% percentile among all USPTO examiners. This examiner has a below-average tendency to allow applications.

Office Action Patterns

On average, applications examined by HSIEH, HSIN YI receive 3.60 office actions before reaching final disposition. This places the examiner in the 95% percentile for office actions issued. This examiner issues more office actions than most examiners, which may indicate thorough examination or difficulty in reaching agreement with applicants.

Prosecution Timeline

The median time to disposition (half-life) for applications examined by HSIEH, HSIN YI is 45 months. This places the examiner in the 13% percentile for prosecution speed. Applications take longer to reach final disposition with this examiner compared to most others.

Interview Effectiveness

Conducting an examiner interview provides a +5.7% benefit to allowance rate for applications examined by HSIEH, HSIN YI. This interview benefit is in the 32% percentile among all examiners. Recommendation: Interviews provide a below-average benefit with this examiner.

Request for Continued Examination (RCE) Effectiveness

When applicants file an RCE with this examiner, 18.5% of applications are subsequently allowed. This success rate is in the 18% percentile among all examiners. Strategic Insight: RCEs show lower effectiveness with this examiner compared to others. Consider whether a continuation application might be more strategic, especially if you need to add new matter or significantly broaden claims.

After-Final Amendment Practice

This examiner enters after-final amendments leading to allowance in 20.0% of cases where such amendments are filed. This entry rate is in the 24% percentile among all examiners. Strategic Recommendation: This examiner rarely enters after-final amendments compared to other examiners. You should generally plan to file an RCE or appeal rather than relying on after-final amendment entry. Per MPEP § 714.12, primary examiners have discretion in entering after-final amendments, and this examiner exercises that discretion conservatively.

Appeal Withdrawal and Reconsideration

This examiner withdraws rejections or reopens prosecution in 50.0% of appeals filed. This is in the 19% percentile among all examiners. Strategic Insight: This examiner rarely withdraws rejections during the appeal process compared to other examiners. If you file an appeal, be prepared to fully prosecute it to a PTAB decision. Per MPEP § 1207, the examiner will prepare an Examiner's Answer maintaining the rejections.

Petition Practice

When applicants file petitions regarding this examiner's actions, 66.7% are granted (fully or in part). This grant rate is in the 73% percentile among all examiners. Strategic Note: Petitions show above-average success regarding this examiner's actions. Petitionable matters include restriction requirements (MPEP § 1002.02(c)(2)) and various procedural issues.

Examiner Cooperation and Flexibility

Examiner's Amendments: This examiner makes examiner's amendments in 0.0% of allowed cases (in the 28% percentile). This examiner makes examiner's amendments less often than average. You may need to make most claim amendments yourself.

Quayle Actions: This examiner issues Ex Parte Quayle actions in 0.0% of allowed cases (in the 34% percentile). This examiner issues Quayle actions less often than average. Allowances may come directly without a separate action for formal matters.

Prosecution Strategy Recommendations

Based on the statistical analysis of this examiner's prosecution patterns, here are tailored strategic recommendations:

  • Expect multiple rounds of prosecution: This examiner issues more office actions than average. Address potential issues proactively in your initial response and consider requesting an interview early in prosecution.
  • Plan for RCE after final rejection: This examiner rarely enters after-final amendments. Budget for an RCE in your prosecution strategy if you receive a final rejection.
  • Plan for extended prosecution: Applications take longer than average with this examiner. Factor this into your continuation strategy and client communications.

Relevant MPEP Sections for Prosecution Strategy

  • MPEP § 713.10: Examiner interviews - available before Notice of Allowance or transfer to PTAB
  • MPEP § 714.12: After-final amendments - may be entered "under justifiable circumstances"
  • MPEP § 1002.02(c): Petitionable matters to Technology Center Director
  • MPEP § 1004: Actions requiring primary examiner signature (allowances, final rejections, examiner's answers)
  • MPEP § 1207.01: Appeal conferences - mandatory for all appeals
  • MPEP § 1214.07: Reopening prosecution after appeal

Important Disclaimer

Not Legal Advice: The information provided in this report is for informational purposes only and does not constitute legal advice. You should consult with a qualified patent attorney or agent for advice specific to your situation.

No Guarantees: We do not provide any guarantees as to the accuracy, completeness, or timeliness of the statistics presented above. Patent prosecution statistics are derived from publicly available USPTO data and are subject to data quality limitations, processing errors, and changes in USPTO practices over time.

Limitation of Liability: Under no circumstances will IronCrow AI be liable for any outcome, decision, or action resulting from your reliance on the statistics, analysis, or recommendations presented in this report. Past prosecution patterns do not guarantee future results.

Use at Your Own Risk: While we strive to provide accurate and useful prosecution statistics, you should independently verify any information that is material to your prosecution strategy and use your professional judgment in all patent prosecution matters.