Detailed information about the 100 most recent patent applications.
| Application Number | Title | Filing Date | Disposal Date | Disposition | Time (months) | Office Actions | Restrictions | Interview | Appeal |
|---|---|---|---|---|---|---|---|---|---|
| 18957152 | METAL OXIDE SEMICONDUCTOR-BASED LIGHT EMITTING DEVICE | November 2024 | July 2025 | Allow | 8 | 1 | 1 | Yes | No |
| 18542761 | 3D SEMICONDUCTOR DEVICE AND STRUCTURE WITH MEMORY | December 2023 | February 2025 | Abandon | 14 | 2 | 0 | No | No |
| 18542757 | 3D SEMICONDUCTOR MEMORY DEVICE AND STRUCTURE WITH MEMORY AND METAL LAYERS | December 2023 | February 2025 | Allow | 14 | 1 | 0 | No | No |
| 18534475 | 3D SEMICONDUCTOR DEVICE AND STRUCTURE WITH MEMORY AND METAL LAYERS | December 2023 | February 2025 | Abandon | 14 | 2 | 0 | No | No |
| 18264252 | METHOD FOR TESTING THE STRESS ROBUSTNESS OF A SEMICONDUCTOR SUBSTRATE | August 2023 | October 2025 | Allow | 27 | 0 | 0 | No | No |
| 18341694 | METHOD FOR FABRICATING FULLY DEPLETED SILICON-ON-INSULATOR PMOS DEVICES | June 2023 | January 2026 | Allow | 30 | 1 | 0 | No | No |
| 18199014 | SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING THE SAME | May 2023 | March 2026 | Allow | 34 | 0 | 1 | No | No |
| 18297787 | SUBSTRATE SUPPORT DEVICE, THERMAL PROCESSING APPARATUS, SUBSTRATE SUPPORT METHOD, AND THERMAL PROCESSING METHOD | April 2023 | November 2025 | Allow | 31 | 1 | 0 | Yes | No |
| 18122174 | ORGANIC LIGHT EMITTING DIODE DISPLAY | March 2023 | March 2026 | Allow | 36 | 1 | 0 | No | No |
| 18041162 | ELECTRODE OF SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING SAME | February 2023 | February 2026 | Allow | 36 | 2 | 0 | No | No |
| 18087860 | ORGANIC LIGHT EMITTING DISPLAY DEVICE | December 2022 | November 2025 | Allow | 35 | 1 | 0 | No | No |
| 18085210 | SEMICONDUCTOR DEVICE | December 2022 | August 2025 | Allow | 32 | 1 | 0 | No | No |
| 18047401 | SEMICONDUCTOR ON INSULATOR STRUCTURE COMPRISING A BURIED HIGH RESISTIVITY LAYER | October 2022 | October 2025 | Allow | 36 | 1 | 0 | No | No |
| 17938134 | ALUMINUM NITRIDE SINTERED BODY AND MEMBER FOR SEMICONDUCTOR MANUFACUTING APPARATUS COMPRISING SAME | October 2022 | September 2025 | Allow | 35 | 1 | 0 | No | No |
| 17874503 | HIGH VOLTAGE DEVICES | July 2022 | October 2025 | Allow | 39 | 1 | 0 | Yes | No |
| 17815007 | Semiconductor Device and Method | July 2022 | March 2026 | Allow | 43 | 1 | 0 | Yes | No |
| 17873787 | Dipole Patterning for CMOS Devices | July 2022 | March 2026 | Allow | 44 | 1 | 0 | No | No |
| 17815119 | STRUCTURE AND METHOD FOR TRANSISTORS HAVING BACKSIDE POWER RAILS | July 2022 | February 2026 | Allow | 43 | 2 | 0 | Yes | No |
| 17842381 | DOPANT DIFFUSION WITH SHORT HIGH TEMPERATURE ANNEAL PULSES | June 2022 | November 2025 | Allow | 41 | 2 | 0 | Yes | No |
| 17804169 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE | May 2022 | December 2025 | Abandon | 43 | 2 | 0 | No | No |
| 17747629 | SEMICONDUCTOR DEVICE | May 2022 | July 2025 | Allow | 38 | 1 | 0 | Yes | No |
| 17661854 | METAL OXIDE SEMICONDUCTOR-BASED LIGHT EMITTING DEVICE | May 2022 | December 2025 | Allow | 43 | 1 | 1 | Yes | No |
| 17770617 | LIGHT-EMITTING SUBSTRATE AND MANUFACTURING METHOD THEREOF | April 2022 | December 2025 | Allow | 43 | 2 | 0 | No | No |
| 17712399 | SEMICONDUCTOR PACKAGE STRUCTURE AND METHOD FOR PREPARING SAME | April 2022 | December 2025 | Allow | 44 | 1 | 1 | No | No |
| 17656104 | PACKAGE STRUCTURE AND METHOD FOR FORMING SAME | March 2022 | November 2025 | Allow | 43 | 1 | 1 | Yes | No |
| 17693282 | 3D SEMICONDUCTOR DEVICE AND STRUCTURE WITH REPLACEMENT GATES | March 2022 | November 2024 | Abandon | 33 | 3 | 0 | No | No |
| 17654221 | METAL OXIDE SEMICONDUCTOR-BASED LIGHT EMITTING DEVICE | March 2022 | January 2026 | Allow | 46 | 3 | 0 | Yes | No |
| 17654223 | METAL OXIDE SEMICONDUCTOR-BASED LIGHT EMITTING DEVICE | March 2022 | January 2026 | Allow | 46 | 3 | 0 | No | No |
| 17675387 | THIN FILM TRANSISTOR AND METHOD OF MANUFACTURING THE SAME AND THIN FILM TRANSISTOR PANEL AND ELECTRONIC DEVICE | February 2022 | November 2024 | Allow | 33 | 1 | 0 | Yes | No |
| 17673572 | LIGHT-EMITTING DEVICE AND METHOD OF MANUFACTURING THE LIGHT-EMITTING DEVICE | February 2022 | February 2026 | Allow | 48 | 2 | 1 | No | No |
| 17585557 | METHOD FOR IMPROVING THE SURFACE ROUGHNESS OF A SILICON-ON-INSULATOR WAFER | January 2022 | September 2025 | Abandon | 44 | 3 | 0 | No | No |
| 17570183 | LIGHT EMITTING DISPLAY DEVICE AND MANUFACTURING METHOD THEREOF | January 2022 | March 2026 | Allow | 50 | 4 | 1 | No | No |
| 17564018 | Organic Light Emitting Display Apparatus | December 2021 | November 2025 | Allow | 46 | 4 | 0 | No | No |
| 17545047 | METHOD FOR FORMING AN ULTRAVIOLET RADIATION RESPONSIVE METAL OXIDE-CONTAINING FILM | December 2021 | June 2025 | Allow | 42 | 3 | 0 | Yes | No |
| 17491090 | METHOD FOR FORMING FINFET SUPER WELL | September 2021 | September 2024 | Allow | 36 | 1 | 0 | No | No |
| 17478492 | HEATING DEVICE AND HEATING METHOD | September 2021 | December 2024 | Allow | 39 | 1 | 1 | No | No |
| 17461836 | ANNEALING APPARATUS AND METHOD OF OPERATING THE SAME | August 2021 | August 2025 | Allow | 47 | 3 | 1 | No | No |
| 17459821 | SYSTEMS AND METHODS FOR PROCESSING A SUBSTRATE | August 2021 | June 2025 | Allow | 46 | 2 | 1 | No | No |
| 17459043 | Systems, Methods, and Semiconductor Devices | August 2021 | July 2025 | Allow | 47 | 3 | 0 | No | No |
| 17405142 | Rapid Thermal Processing System With Cooling System | August 2021 | March 2025 | Allow | 43 | 2 | 1 | Yes | No |
| 17400526 | Memory Arrays And Methods Of Forming An Array Of Memory Cells | August 2021 | August 2024 | Allow | 36 | 1 | 0 | No | No |
| 17388773 | SELECTIVE PASSIVATION AND SELECTIVE DEPOSITION | July 2021 | August 2024 | Allow | 37 | 2 | 0 | No | No |
| 17385204 | SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF | July 2021 | July 2025 | Allow | 48 | 2 | 0 | No | No |
| 17377408 | MANUFACTURING METHOD OF TRENCH MOSFET | July 2021 | January 2025 | Abandon | 42 | 4 | 0 | No | No |
| 17376397 | Tuning Tensile Strain on FinFET | July 2021 | September 2025 | Allow | 50 | 4 | 0 | Yes | No |
| 17360925 | WAFER LEVEL PROXIMITY SENSOR | June 2021 | January 2024 | Allow | 31 | 2 | 0 | Yes | No |
| 17347316 | HEATING DEVICE, SUBSTRATE PROCESSING SYSTEM, AND HEATING METHOD | June 2021 | May 2025 | Allow | 47 | 2 | 1 | Yes | No |
| 17340477 | 3D SEMICONDUCTOR DEVICE AND STRUCTURE | June 2021 | November 2022 | Abandon | 17 | 5 | 0 | No | No |
| 17316102 | High Density Three-dimensional Integrated Capacitors | May 2021 | June 2025 | Allow | 49 | 5 | 0 | Yes | No |
| 17196137 | FORMATION OF LOW-TEMPERATURE AND HIGH-TEMPERATURE IN-SITU DOPED SOURCE AND DRAIN EPITAXY USING SELECTIVE HEATING FOR WRAP-AROUND CONTACT AND VERTICALLY STACKED DEVICE ARCHITECTURES | March 2021 | March 2026 | Allow | 60 | 5 | 1 | No | No |
| 17195628 | 3D SEMICONDUCTOR DEVICE AND STRUCTURE | March 2021 | May 2022 | Abandon | 14 | 6 | 1 | No | No |
| 17174617 | Integrated Fan-Out Package with 3D Magnetic Core Inductor | February 2021 | December 2024 | Allow | 46 | 3 | 0 | No | No |
| 17160798 | Memory Devices Comprising Magnetic Tracks Individually Comprising A Plurality Of Magnetic Domains Having Domain Walls And Methods Of Forming A Memory Device Comprising Magnetic Tracks Individually Comprising A Plurality Of Magnetic Domains Having Domain Walls | January 2021 | July 2024 | Allow | 42 | 4 | 0 | No | No |
| 17142140 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | January 2021 | February 2024 | Allow | 38 | 3 | 0 | Yes | No |
| 17140972 | 3D SEMICONDUCTOR DEVICE AND STRUCTURE | January 2021 | July 2022 | Abandon | 19 | 3 | 1 | No | No |
| 17257637 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD | January 2021 | April 2025 | Allow | 52 | 4 | 0 | No | No |
| 17128656 | SEMICONDUCTOR DEVICE AND METHOD | December 2020 | February 2026 | Allow | 60 | 5 | 1 | No | No |
| 17126594 | Silicon-Germanium Fins and Methods of Processing the Same in Field-Effect Transistors | December 2020 | June 2024 | Allow | 42 | 2 | 1 | No | No |
| 17124017 | Embedded Stressors in Epitaxy Source/Drain Regions | December 2020 | November 2024 | Allow | 47 | 4 | 1 | No | No |
| 17107091 | SOURCE/DRAIN EPITAXIAL STRUCTURES FOR HIGH VOLTAGE TRANSISTORS | November 2020 | September 2025 | Allow | 57 | 5 | 1 | Yes | No |
| 17107448 | SEMICONDUCTOR DEVICE | November 2020 | July 2025 | Allow | 55 | 8 | 0 | Yes | No |
| 17047023 | ANNEALING DEVICES INCLUDING THERMAL HEATERS | October 2020 | June 2024 | Abandon | 44 | 4 | 0 | No | No |
| 17025917 | INTEGRATED CIRCUIT LAYOUT AND METHOD THEREOF | September 2020 | October 2024 | Allow | 49 | 3 | 1 | Yes | No |
| 17008251 | High Voltage Device | August 2020 | September 2024 | Allow | 49 | 4 | 2 | Yes | No |
| 16966028 | OLED DISPLAY PANEL, METHOD OF MANUFACTURING SAME, AND MICRO LENS | July 2020 | December 2025 | Allow | 60 | 3 | 0 | No | No |
| 16942514 | High Voltage Devices | July 2020 | June 2024 | Allow | 46 | 6 | 1 | Yes | No |
| 16929556 | Semiconductor Device and Method of Forming Thereof | July 2020 | June 2025 | Allow | 59 | 6 | 1 | Yes | No |
| 16901749 | Interconnect Structure Having a Multi-Deck Conductive Feature and Method of Forming the Same | June 2020 | February 2026 | Allow | 60 | 7 | 1 | Yes | No |
| 16621904 | PIXEL ARRANGEMENT STRUCTURE, DISPLAY SUBSTRATE, AND DISPLAY DEVICE | December 2019 | March 2025 | Allow | 60 | 7 | 0 | Yes | No |
| 16537564 | 3D SEMICONDUCTOR MEMORY DEVICE AND STRUCTURE | August 2019 | March 2024 | Abandon | 55 | 5 | 1 | No | No |
| 16141016 | SPACER AND CHANNEL LAYER OF THIN-FILM TRANSISTORS | September 2018 | January 2025 | Abandon | 60 | 6 | 1 | No | No |
| 16006693 | Trench-Gated Heterostructure and Double-Heterostructure Active Devices | June 2018 | September 2020 | Abandon | 27 | 3 | 0 | Yes | No |
| 15567786 | Array Substrate and Manufacturing Method Thereof | October 2017 | March 2019 | Allow | 17 | 1 | 0 | No | No |
| 15553442 | ARRAY SUBSTRATE AND MANUFACTURING METHOD THEREOF, AND DISPLAY DEVICE | August 2017 | September 2019 | Allow | 24 | 4 | 0 | No | No |
| 15551637 | THIN FILM TRANSISTOR AND METHOD FOR MANUFACTURING THE SAME | August 2017 | July 2019 | Allow | 23 | 1 | 0 | No | No |
| 15324702 | Thin Film Transistor And Method For Manufacturing The Same | June 2017 | July 2019 | Allow | 30 | 1 | 0 | No | No |
| 15618227 | EXTENDED CONTACT AREA USING UNDERCUT SILICIDE EXTENSIONS | June 2017 | February 2019 | Allow | 20 | 2 | 0 | Yes | No |
| 15491982 | MANUFACTURING METHOD OF PACKAGE STRUCTURE | April 2017 | October 2017 | Allow | 5 | 0 | 0 | No | No |
| 15470508 | PROCESSES FOR UNIFORM METAL SEMICONDUCTOR ALLOY FORMATION FOR FRONT SIDE CONTACT METALLIZATION AND PHOTOVOLTAIC DEVICE FORMED THEREFROM | March 2017 | September 2018 | Allow | 18 | 1 | 0 | No | No |
| 15460230 | 3D SEMICONDUCTOR MEMORY DEVICE AND STRUCTURE | March 2017 | July 2019 | Allow | 28 | 1 | 1 | Yes | No |
| 15353315 | Lateral Plasma/Radical Source | November 2016 | June 2018 | Allow | 19 | 1 | 1 | No | No |
| 15341240 | FINFET SPACER FORMATION ON GATE SIDEWALLS, BETWEEN THE CHANNEL AND SOURCE/DRAIN REGIONS | November 2016 | September 2017 | Allow | 10 | 0 | 1 | No | No |
| 15219193 | QUANTUM WELL MOSFET CHANNELS HAVING LATTICE MISMATCH WITH METAL SOURCE/DRAINS, AND CONFORMAL REGROWTH SOURCE/DRAINS | July 2016 | May 2018 | Allow | 22 | 2 | 0 | No | No |
| 15180499 | CHANNEL REPLACEMENT AND BIMODAL DOPING SCHEME FOR BULK FINFET THRESHOLD VOLTAGE MODULATION WITH REDUCED PERFORMANCE PENALTY | June 2016 | March 2018 | Allow | 21 | 2 | 0 | No | No |
| 14974537 | CHANNEL REPLACEMENT AND BIMODAL DOPING SCHEME FOR BULK FINFET THRESHOLD VOLTAGE MODULATION WITH REDUCED PERFORMANCE PENALTY | December 2015 | April 2017 | Allow | 16 | 2 | 1 | No | No |
| 14609029 | PROCESSES FOR UNIFORM METAL SEMICONDUCTOR ALLOY FORMATION FOR FRONT SIDE CONTACT METALLIZATION AND PHOTOVOLTAIC DEVICE FORMED THEREFROM | January 2015 | November 2016 | Allow | 22 | 0 | 1 | No | No |
| 14551606 | INTEGRATED CIRCUITS INCLUDING FINFET DEVICES WITH LOWER CONTACT RESISTANCE AND REDUCED PARASITIC CAPACITANCE AND METHODS FOR FABRICATING THE SAME | November 2014 | April 2016 | Allow | 17 | 3 | 0 | No | No |
| 14389083 | ORGANIC ELECTRONIC DEVICE MANUFACTURING METHOD AND ORGANIC EL DEVICE MANUFACTURING METHOD | September 2014 | February 2015 | Allow | 5 | 0 | 0 | No | No |
| 14449194 | EXTENDED CONTACT AREA USING UNDERCUT SILICIDE EXTENSIONS | August 2014 | March 2017 | Allow | 31 | 1 | 1 | No | No |
| 14313751 | METHOD OF DEPOSITING COPPER USING PHYSICAL VAPOR DEPOSITION | June 2014 | September 2016 | Allow | 27 | 5 | 0 | Yes | No |
| 14247653 | MEMORY DEVICES AND FORMATION METHODS | April 2014 | July 2015 | Allow | 16 | 2 | 0 | No | No |
| 14150118 | METHOD OF FORMING PRINTED PATTERNS | January 2014 | August 2015 | Allow | 19 | 0 | 0 | No | No |
| 14146138 | ENHANCING EFFICIENCY IN SOLAR CELLS BY ADJUSTING DEPOSITION POWER | January 2014 | March 2015 | Allow | 15 | 2 | 1 | No | No |
| 14122028 | CVD APPARATUS AND METHOD FOR FORMING CVD FILM | December 2013 | July 2017 | Allow | 44 | 2 | 1 | No | No |
| 14129684 | METHOD FOR PRODUCING SEMICONDUCTOR LAYER, METHOD FOR PRODUCING PHOTOELECTRIC CONVERSION DEVICE, AND SEMICONDUCTOR STARTING MATERIAL | December 2013 | November 2015 | Allow | 23 | 1 | 0 | No | No |
| 14142124 | METHOD OF ETCHING A POROUS DIELECTRIC MATERIAL | December 2013 | December 2017 | Allow | 48 | 4 | 0 | Yes | No |
| 14140807 | Electrode for Low-Leakage Devices | December 2013 | October 2015 | Allow | 22 | 1 | 1 | No | No |
| 14140731 | METHOD OF MANUFACTURING INTERCONNECTION AND SEMICONDUCTOR DEVICE | December 2013 | September 2014 | Allow | 9 | 0 | 0 | Yes | No |
| 13946821 | METHODS FOR REOXIDIZING AN OXIDE AND FOR FABRICATING SEMICONDUCTOR DEVICES | July 2013 | March 2014 | Allow | 8 | 2 | 0 | Yes | No |
| 13914362 | FinFETs and the Methods for Forming the Same | June 2013 | January 2015 | Allow | 19 | 1 | 0 | No | No |
This analysis examines appeal outcomes and the strategic value of filing appeals for examiner WILCZEWSKI, MARY A.
Filing a Notice of Appeal can sometimes lead to allowance even before the appeal is fully briefed or decided by the PTAB. This occurs when the examiner or their supervisor reconsiders the rejection during the mandatory appeal conference (MPEP § 1207.01) after the appeal is filed.
In this dataset, 70.6% of applications that filed an appeal were subsequently allowed. This appeal filing benefit rate is in the top 25% across the USPTO, indicating that filing appeals is particularly effective here. The act of filing often prompts favorable reconsideration during the mandatory appeal conference.
✓ Filing a Notice of Appeal is strategically valuable. The act of filing often prompts favorable reconsideration during the mandatory appeal conference.
Examiner WILCZEWSKI, MARY A works in Art Unit 2898 and has examined 364 patent applications in our dataset. With an allowance rate of 97.0%, this examiner allows applications at a higher rate than most examiners at the USPTO. Applications typically reach final disposition in approximately 28 months.
Examiner WILCZEWSKI, MARY A's allowance rate of 97.0% places them in the 88% percentile among all USPTO examiners. This examiner is more likely to allow applications than most examiners at the USPTO.
On average, applications examined by WILCZEWSKI, MARY A receive 1.75 office actions before reaching final disposition. This places the examiner in the 38% percentile for office actions issued. This examiner issues fewer office actions than average, which may indicate efficient prosecution or a more lenient examination style.
The median time to disposition (half-life) for applications examined by WILCZEWSKI, MARY A is 28 months. This places the examiner in the 70% percentile for prosecution speed. Prosecution timelines are slightly faster than average with this examiner.
Conducting an examiner interview provides a +1.9% benefit to allowance rate for applications examined by WILCZEWSKI, MARY A. This interview benefit is in the 21% percentile among all examiners. Note: Interviews show limited statistical benefit with this examiner compared to others, though they may still be valuable for clarifying issues.
When applicants file an RCE with this examiner, 28.9% of applications are subsequently allowed. This success rate is in the 54% percentile among all examiners. Strategic Insight: RCEs show above-average effectiveness with this examiner. Consider whether your amendments or new arguments are strong enough to warrant an RCE versus filing a continuation.
This examiner enters after-final amendments leading to allowance in 45.4% of cases where such amendments are filed. This entry rate is in the 69% percentile among all examiners. Strategic Recommendation: This examiner shows above-average receptiveness to after-final amendments. If your amendments clearly overcome the rejections and do not raise new issues, consider filing after-final amendments before resorting to an RCE.
When applicants request a pre-appeal conference (PAC) with this examiner, 200.0% result in withdrawal of the rejection or reopening of prosecution. This success rate is in the 97% percentile among all examiners. Strategic Recommendation: Pre-appeal conferences are highly effective with this examiner compared to others. Before filing a full appeal brief, strongly consider requesting a PAC. The PAC provides an opportunity for the examiner and supervisory personnel to reconsider the rejection before the case proceeds to the PTAB.
This examiner withdraws rejections or reopens prosecution in 100.0% of appeals filed. This is in the 96% percentile among all examiners. Of these withdrawals, 53.3% occur early in the appeal process (after Notice of Appeal but before Appeal Brief). Strategic Insight: This examiner frequently reconsiders rejections during the appeal process compared to other examiners. Per MPEP § 1207.01, all appeals must go through a mandatory appeal conference. Filing a Notice of Appeal may prompt favorable reconsideration even before you file an Appeal Brief.
When applicants file petitions regarding this examiner's actions, 67.3% are granted (fully or in part). This grant rate is in the 75% percentile among all examiners. Strategic Note: Petitions are frequently granted regarding this examiner's actions compared to other examiners. Per MPEP § 1002.02(c), various examiner actions are petitionable to the Technology Center Director, including prematureness of final rejection, refusal to enter amendments, and requirement for information. If you believe an examiner action is improper, consider filing a petition.
Examiner's Amendments: This examiner makes examiner's amendments in 18.4% of allowed cases (in the 97% percentile). Per MPEP § 1302.04, examiner's amendments are used to place applications in condition for allowance when only minor changes are needed. This examiner frequently uses this tool compared to other examiners, indicating a cooperative approach to getting applications allowed. Strategic Insight: If you are close to allowance but minor claim amendments are needed, this examiner may be willing to make an examiner's amendment rather than requiring another round of prosecution.
Quayle Actions: This examiner issues Ex Parte Quayle actions in 1.1% of allowed cases (in the 62% percentile). This examiner issues Quayle actions more often than average when claims are allowable but formal matters remain (MPEP § 714.14).
Based on the statistical analysis of this examiner's prosecution patterns, here are tailored strategic recommendations:
Not Legal Advice: The information provided in this report is for informational purposes only and does not constitute legal advice. You should consult with a qualified patent attorney or agent for advice specific to your situation.
No Guarantees: We do not provide any guarantees as to the accuracy, completeness, or timeliness of the statistics presented above. Patent prosecution statistics are derived from publicly available USPTO data and are subject to data quality limitations, processing errors, and changes in USPTO practices over time.
Limitation of Liability: Under no circumstances will IronCrow AI be liable for any outcome, decision, or action resulting from your reliance on the statistics, analysis, or recommendations presented in this report. Past prosecution patterns do not guarantee future results.
Use at Your Own Risk: While we strive to provide accurate and useful prosecution statistics, you should independently verify any information that is material to your prosecution strategy and use your professional judgment in all patent prosecution matters.