USPTO Examiner WILCZEWSKI MARY A - Art Unit 2898

Recent Applications

Detailed information about the 100 most recent patent applications.

Application NumberTitleFiling DateDisposal DateDispositionTime (months)Office ActionsRestrictionsInterviewAppeal
17126594Silicon-Germanium Fins and Methods of Processing the Same in Field-Effect TransistorsDecember 2020June 2024Allow4221NoNo
17124017Embedded Stressors in Epitaxy Source/Drain RegionsDecember 2020November 2024Allow4741NoNo
17107448SEMICONDUCTOR DEVICENovember 2020July 2025Allow5580YesNo
17047023ANNEALING DEVICES INCLUDING THERMAL HEATERSOctober 2020June 2024Abandon4440NoNo
17025917INTEGRATED CIRCUIT LAYOUT AND METHOD THEREOFSeptember 2020October 2024Allow4931YesNo
17008251High Voltage DeviceAugust 2020September 2024Allow4942YesNo
16942514High Voltage DevicesJuly 2020June 2024Allow4661YesNo
16929556Semiconductor Device and Method of Forming ThereofJuly 2020June 2025Allow5961YesNo
16621904PIXEL ARRANGEMENT STRUCTURE, DISPLAY SUBSTRATE, AND DISPLAY DEVICEDecember 2019March 2025Allow6070YesNo
165375643D SEMICONDUCTOR MEMORY DEVICE AND STRUCTUREAugust 2019March 2024Abandon5551NoNo
16141016SPACER AND CHANNEL LAYER OF THIN-FILM TRANSISTORSSeptember 2018January 2025Abandon6061NoNo
16006693Trench-Gated Heterostructure and Double-Heterostructure Active DevicesJune 2018September 2020Abandon2730YesNo
15567786Array Substrate and Manufacturing Method ThereofOctober 2017March 2019Allow1710NoNo
15553442ARRAY SUBSTRATE AND MANUFACTURING METHOD THEREOF, AND DISPLAY DEVICEAugust 2017September 2019Allow2440NoNo
15551637THIN FILM TRANSISTOR AND METHOD FOR MANUFACTURING THE SAMEAugust 2017July 2019Allow2310NoNo
15324702Thin Film Transistor And Method For Manufacturing The SameJune 2017July 2019Allow3010NoNo
15618227EXTENDED CONTACT AREA USING UNDERCUT SILICIDE EXTENSIONSJune 2017February 2019Allow2020YesNo
15491982MANUFACTURING METHOD OF PACKAGE STRUCTUREApril 2017October 2017Allow500NoNo
15470508PROCESSES FOR UNIFORM METAL SEMICONDUCTOR ALLOY FORMATION FOR FRONT SIDE CONTACT METALLIZATION AND PHOTOVOLTAIC DEVICE FORMED THEREFROMMarch 2017September 2018Allow1810NoNo
154602303D SEMICONDUCTOR MEMORY DEVICE AND STRUCTUREMarch 2017July 2019Allow2811YesNo
15353315Lateral Plasma/Radical SourceNovember 2016June 2018Allow1911NoNo
15341240FINFET SPACER FORMATION ON GATE SIDEWALLS, BETWEEN THE CHANNEL AND SOURCE/DRAIN REGIONSNovember 2016September 2017Allow1001NoNo
15219193QUANTUM WELL MOSFET CHANNELS HAVING LATTICE MISMATCH WITH METAL SOURCE/DRAINS, AND CONFORMAL REGROWTH SOURCE/DRAINSJuly 2016May 2018Allow2220NoNo
15180499CHANNEL REPLACEMENT AND BIMODAL DOPING SCHEME FOR BULK FINFET THRESHOLD VOLTAGE MODULATION WITH REDUCED PERFORMANCE PENALTYJune 2016March 2018Allow2120NoNo
14974537CHANNEL REPLACEMENT AND BIMODAL DOPING SCHEME FOR BULK FINFET THRESHOLD VOLTAGE MODULATION WITH REDUCED PERFORMANCE PENALTYDecember 2015April 2017Allow1621NoNo
14609029PROCESSES FOR UNIFORM METAL SEMICONDUCTOR ALLOY FORMATION FOR FRONT SIDE CONTACT METALLIZATION AND PHOTOVOLTAIC DEVICE FORMED THEREFROMJanuary 2015November 2016Allow2201NoNo
14551606INTEGRATED CIRCUITS INCLUDING FINFET DEVICES WITH LOWER CONTACT RESISTANCE AND REDUCED PARASITIC CAPACITANCE AND METHODS FOR FABRICATING THE SAMENovember 2014April 2016Allow1730NoNo
14389083ORGANIC ELECTRONIC DEVICE MANUFACTURING METHOD AND ORGANIC EL DEVICE MANUFACTURING METHODSeptember 2014February 2015Allow500NoNo
14449194EXTENDED CONTACT AREA USING UNDERCUT SILICIDE EXTENSIONSAugust 2014March 2017Allow3111NoNo
14313751METHOD OF DEPOSITING COPPER USING PHYSICAL VAPOR DEPOSITIONJune 2014September 2016Allow2750YesNo
14247653MEMORY DEVICES AND FORMATION METHODSApril 2014July 2015Allow1620NoNo
14150118METHOD OF FORMING PRINTED PATTERNSJanuary 2014August 2015Allow1900NoNo
14146138ENHANCING EFFICIENCY IN SOLAR CELLS BY ADJUSTING DEPOSITION POWERJanuary 2014March 2015Allow1521NoNo
14122028CVD APPARATUS AND METHOD FOR FORMING CVD FILMDecember 2013July 2017Allow4421NoNo
14129684METHOD FOR PRODUCING SEMICONDUCTOR LAYER, METHOD FOR PRODUCING PHOTOELECTRIC CONVERSION DEVICE, AND SEMICONDUCTOR STARTING MATERIALDecember 2013November 2015Allow2310NoNo
14142124METHOD OF ETCHING A POROUS DIELECTRIC MATERIALDecember 2013December 2017Allow4840YesNo
14140731METHOD OF MANUFACTURING INTERCONNECTION AND SEMICONDUCTOR DEVICEDecember 2013September 2014Allow900YesNo
14140807Electrode for Low-Leakage DevicesDecember 2013October 2015Allow2211NoNo
13946821METHODS FOR REOXIDIZING AN OXIDE AND FOR FABRICATING SEMICONDUCTOR DEVICESJuly 2013March 2014Allow820YesNo
13914362FinFETs and the Methods for Forming the SameJune 2013January 2015Allow1910NoNo
13863269METHOD OF MAKING A MEMS GYROSCOPE HAVING A MAGNETIC SOURCE AND A MAGNETIC SENSING MECHANISMApril 2013March 2015Abandon2310NoNo
13876199DICING DIE BOND FILM AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICEMarch 2013May 2015Allow2510NoNo
13795006METHOD OF MANUFACTURING ORGANIC-LIGHT-EMITTING-DIODE FLAT-PANEL LIGHT-SOURCE APPARATUSMarch 2013July 2014Allow1620NoNo
13797464Varied STI Liners for Isolation Structures in Image Sensing DevicesMarch 2013December 2014Allow2111NoNo
13759648TWO-STEP HYDROGEN ANNEALING PROCESS FOR CREATING UNIFORM NON-PLANAR SEMICONDUCTOR DEVICES AT AGGRESSIVE PITCHFebruary 2013July 2013Allow500NoNo
13757286METHODS FOR OPTICAL PROXIMITY CORRECTION IN THE DESIGN AND FABRICATION OF INTEGRATED CIRCUITSFebruary 2013November 2014Allow2100NoNo
13754537TILTING ACTUATOR WITH CLOSE-GAP ELECTRODESJanuary 2013June 2014Allow1710NoNo
13580491METHOD FOR PRODUCING A PLURALITY OF OPTOELECTRONIC SEMICONDUCTOR CHIPSOctober 2012November 2014Allow2611NoNo
13523767THIN FILM TRANSISTOR ARRAY PANEL AND MANUFACTURING METHOD THEREOFJune 2012April 2013Allow1011NoNo
13511117ELASTOMER ADHESIONSMay 2012November 2014Allow3010NoNo
13456058PASSIVATING GLUE LAYER TO IMPROVE AMORPHOUS CARBON TO METAL ADHESIONApril 2012July 2013Allow1521NoNo
13454141METHOD FOR MAKING SEMICONDUCTOR APPARATUS AND SEMICONDUCTOR APPARATUS OBTAINED BY THE METHOD, METHOD FOR MAKING THIN FILM TRANSISTOR SUBSTRATE AND THIN FILM TRANSISTOR SUBSTRATE OBTAINED BY THE METHOD, AND METHOD FOR MAKING DISPLAY APPARATUS AND DISPLAY APPARATUS OApril 2012February 2013Allow1010NoNo
13437036N-TYPE CARRIER ENHANCEMENT IN SEMICONDUCTORSApril 2012September 2013Allow1810NoNo
13436850N-TYPE CARRIER ENHANCEMENT IN SEMICONDUCTORSMarch 2012February 2013Allow1110NoNo
13389833METHOD AND APPARATUS FOR MAKING A SOLAR PANEL THAT IS PARTIALLY TRANSPARENTMarch 2012March 2015Allow3720YesNo
13421272IMPRINT METHOD, IMPRINT APPARATUS, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICEMarch 2012September 2014Allow3001NoNo
13417787METHODS OF MANUFACTURING SEMICONDUCTOR DEVICESMarch 2012June 2014Allow2720NoNo
13416344SEMICONDUCTOR DEVICE PRODUCTION PROCESSMarch 2012November 2013Allow2010NoNo
13416844III-NITRIDE SEMICONDUCTOR LASER DEVICE, AND METHOD OF FABRICATING THE III- NITRIDE SEMICONDUCTOR LASER DEVICEMarch 2012June 2013Allow1620NoNo
13414744TWO-STEP HYDROGEN ANNEALING PROCESS FOR CREATING UNIFORM NON-PLANAR SEMICONDUCTOR DEVICES AT AGGRESSIVE PITCHMarch 2012June 2013Allow1600NoNo
13386597COMPLETE RECRYSTALLIZATION OF SEMICONDUCTOR WAFERSMarch 2012November 2014Allow3440NoNo
13414015SIDEWALL AND CHAMFER PROTECTION DURING HARD MASK REMOVAL FOR INTERCONNECT PATTERNINGMarch 2012June 2013Allow1600NoNo
13412099THIN CAPPED CHANNEL LAYERS OF SEMICONDUCTOR DEVICES AND METHODS OF FORMING THE SAMEMarch 2012July 2014Allow2830YesNo
13393218POLYMERIC SEMICONDUCTORS, DEVICES, AND RELATED METHODSFebruary 2012November 2013Allow2011NoNo
13357656N-TYPE CARRIER ENHANCEMENT IN SEMICONDUCTORSJanuary 2012August 2012Allow720YesNo
13353013GATE ETCH OPTIMIZATION THROUGH SILICON DOPANT PROFILE CHANGEJanuary 2012November 2012Allow1010NoNo
13347081SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAMEJanuary 2012January 2013Allow1201NoNo
13341512CMOS IMAGER WITH INTEGRATED CIRCUITRYDecember 2011October 2012Allow1000NoNo
13335560GROUP-III NITRIDE SEMICONDUCTOR LASER DEVICE, AND METHOD FOR FABRICATING GROUP-III NITRIDE SEMICONDUCTOR LASER DEVICEDecember 2011April 2013Allow1600NoNo
13333493CONFORMAL METALLIZATION PROCESS FOR THE FABRICATION OF SEMICONDUCTOR LASER DEVICESDecember 2011November 2013Allow2311NoNo
13306754SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD FOR THE SAMENovember 2011November 2012Allow1210NoNo
13289507GROUP-III NITRIDE SEMICONDUCTOR LASER DEVICE, AND METHOD OF FABRICATING GROUP-III NITRIDE SEMICONDUCTOR LASER DEVICENovember 2011March 2014Allow2820NoNo
13317075SUBSTRATE STRUCTURES FOR INTEGRATED SERIES CONNECTED PHOTOVOLTAIC ARRAYS AND PROCESS OF MANUFACTURE OF SUCH ARRAYSOctober 2011March 2012Allow520NoNo
13200398METHOD OF MANUFACTURING FLEXIBLE DISPLAY DEVICESeptember 2011February 2013Allow1600YesNo
13242787SOLAR CELL AND METHOD OF FABRICATING THE SAMESeptember 2011September 2013Allow2401NoNo
13227750CMOS STRUCTURE HAVING MULTIPLE THRESHOLD VOLTAGE DEVICESSeptember 2011January 2013Allow1611NoNo
13067723MANUFACTURING METHOD FOR ELECTRONIC DEVICESJune 2011June 2012Allow1110NoNo
13154503FILM FORMATION APPARATUS, METHOD FOR FORMING FILM, AND METHOD FOR MANUFACTURING PHOTOELECTRIC CONVERSION DEVICEJune 2011January 2012Allow810NoNo
13118066CMOS IMAGER WITH INTEGRATED CIRCUITRYMay 2011August 2011Allow300NoNo
13067141NONVOLATILE SEMICONDUCTOR MEMORY AND METHOD OF MANUFACTURING THE SAMEMay 2011October 2011Allow500YesNo
13099406ASYMMETRIC SOURCE AND DRAIN STRESSOR REGIONSMay 2011January 2012Allow901NoNo
13094381METHOD FOR MAKING SEMICONDUCTOR APPARATUS AND SEMICONDUCTOR APPARATUS OBTAINED BY THE METHOD, METHOD FOR MAKING THIN FILM TRANSISTOR SUBSTRATE AND THIN FILM TRANSISTOR SUBSTRATE OBTAINED BY THE METHOD, AND METHOD FOR MAKING DISPLAY APPARATUS AND DISPLAY APPARATUS OApril 2011March 2012Allow1110NoNo
13064344NONVOLATILE MEMORY DEVICE AND METHOD OF MANUFACTURING THE SAMEMarch 2011September 2012Allow1810NoNo
12943052MANUFACTURING METHOD OF AIRTIGHT CONTAINER, MANUFACTURING METHOD OF IMAGE DISPLAY DEVICE, AND BONDING METHODNovember 2010July 2011Allow810NoNo
12909066SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING THE SAMEOctober 2010July 2011Allow801NoNo
12860917METHOD OF MANUFACTURING LED MODULEAugust 2010June 2012Allow2210NoNo
12855877REDUCED PATTERN LOADING USING BIS(DIETHYLAMINO)SILANE (C8H22N2SI) AS SILICON PRECURSORAugust 2010May 2012Allow2100NoNo
12855637PLASMA DEPOSITION OF AMORPHOUS SEMICONDUCTORS AT MICROWAVE FREQUENCIESAugust 2010March 2012Allow1910NoNo
12849018METHOD OF MAKING A SEMICONDUCTOR CHIP ASSEMBLY WITH A CERAMIC/METAL SUBSTRATEAugust 2010September 2012Allow2600NoNo
12805048MANUFACTURING METHOD FOR ELECTRONIC DEVICESJuly 2010March 2011Allow810NoNo
12820633PROCESS FOR PRODUCING ZIRCONIUM OXIDE THIN FILMSJune 2010April 2011Allow1010NoNo
12778456PACKAGING STRUCTURE OF SIP AND A MANUFACTURING METHOD THEREOFMay 2010February 2011Allow910NoNo
12799863SUBSTRATE STRUCTURES FOR INTEGRATED SERIES CONNECTED PHOTOVOLTAIC ARRAYS AND PROCESS OF MANUFACTURE OF SUCH ARRAYSMay 2010January 2011Allow820YesNo
12799885SUBSTRATE STRUCTURES FOR INTEGRATED SERIES CONNECTED PHOTOVOLTAIC ARRAYS AND PROCESS OF MANUFACTURE OF SUCH ARRAYSMay 2010January 2011Allow820YesNo
12763146HIGH-THROUGHPUT PRINTING OF SEMICONDUCTOR PRECURSOR LAYER FROM NANOFLAKE PARTICLESApril 2010September 2013Allow4120NoNo
12725483SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOFMarch 2010July 2011Allow1600NoNo
12717087LED LIGHT MODULE FOR STREET LAMP AND METHOD OF MANUFACTURING SAMEMarch 2010August 2012Allow2901NoNo
12706237MANUFACTURING METHOD OF SEMICONDUCTOR DEVICEFebruary 2010October 2011Allow2010NoNo
12700217METHOD OF MANUFACTURING LAYERED CHIP PACKAGEFebruary 2010June 2011Allow1700NoNo
12700297METHOD OF MANUFACTURING LAYERED CHIP PACKAGEFebruary 2010August 2012Allow3010YesNo

Appeals Overview

This analysis examines appeal outcomes and the strategic value of filing appeals for examiner WILCZEWSKI, MARY A.

Strategic Value of Filing an Appeal

Total Appeal Filings
15
Allowed After Appeal Filing
10
(66.7%)
Not Allowed After Appeal Filing
5
(33.3%)
Filing Benefit Percentile
91.7%
Higher than average

Understanding Appeal Filing Strategy

Filing a Notice of Appeal can sometimes lead to allowance even before the appeal is fully briefed or decided by the PTAB. This occurs when the examiner or their supervisor reconsiders the rejection during the mandatory appeal conference (MPEP § 1207.01) after the appeal is filed.

In this dataset, 66.7% of applications that filed an appeal were subsequently allowed. This appeal filing benefit rate is in the top 25% across the USPTO, indicating that filing appeals is particularly effective here. The act of filing often prompts favorable reconsideration during the mandatory appeal conference.

Strategic Recommendations

Filing a Notice of Appeal is strategically valuable. The act of filing often prompts favorable reconsideration during the mandatory appeal conference.

Examiner WILCZEWSKI, MARY A - Prosecution Strategy Guide

Executive Summary

Examiner WILCZEWSKI, MARY A works in Art Unit 2898 and has examined 300 patent applications in our dataset. With an allowance rate of 97.7%, this examiner allows applications at a higher rate than most examiners at the USPTO. Applications typically reach final disposition in approximately 26 months.

Allowance Patterns

Examiner WILCZEWSKI, MARY A's allowance rate of 97.7% places them in the 88% percentile among all USPTO examiners. This examiner is more likely to allow applications than most examiners at the USPTO.

Office Action Patterns

On average, applications examined by WILCZEWSKI, MARY A receive 1.62 office actions before reaching final disposition. This places the examiner in the 29% percentile for office actions issued. This examiner issues fewer office actions than average, which may indicate efficient prosecution or a more lenient examination style.

Prosecution Timeline

The median time to disposition (half-life) for applications examined by WILCZEWSKI, MARY A is 26 months. This places the examiner in the 76% percentile for prosecution speed. Applications move through prosecution relatively quickly with this examiner.

Interview Effectiveness

Conducting an examiner interview provides a +0.5% benefit to allowance rate for applications examined by WILCZEWSKI, MARY A. This interview benefit is in the 19% percentile among all examiners. Note: Interviews show limited statistical benefit with this examiner compared to others, though they may still be valuable for clarifying issues.

Request for Continued Examination (RCE) Effectiveness

When applicants file an RCE with this examiner, 28.9% of applications are subsequently allowed. This success rate is in the 56% percentile among all examiners. Strategic Insight: RCEs show above-average effectiveness with this examiner. Consider whether your amendments or new arguments are strong enough to warrant an RCE versus filing a continuation.

After-Final Amendment Practice

This examiner enters after-final amendments leading to allowance in 50.5% of cases where such amendments are filed. This entry rate is in the 77% percentile among all examiners. Strategic Recommendation: This examiner is highly receptive to after-final amendments compared to other examiners. Per MPEP § 714.12, after-final amendments may be entered "under justifiable circumstances." Consider filing after-final amendments with a clear showing of allowability rather than immediately filing an RCE, as this examiner frequently enters such amendments.

Pre-Appeal Conference Effectiveness

When applicants request a pre-appeal conference (PAC) with this examiner, 200.0% result in withdrawal of the rejection or reopening of prosecution. This success rate is in the 97% percentile among all examiners. Strategic Recommendation: Pre-appeal conferences are highly effective with this examiner compared to others. Before filing a full appeal brief, strongly consider requesting a PAC. The PAC provides an opportunity for the examiner and supervisory personnel to reconsider the rejection before the case proceeds to the PTAB.

Appeal Withdrawal and Reconsideration

This examiner withdraws rejections or reopens prosecution in 100.0% of appeals filed. This is in the 95% percentile among all examiners. Of these withdrawals, 53.8% occur early in the appeal process (after Notice of Appeal but before Appeal Brief). Strategic Insight: This examiner frequently reconsiders rejections during the appeal process compared to other examiners. Per MPEP § 1207.01, all appeals must go through a mandatory appeal conference. Filing a Notice of Appeal may prompt favorable reconsideration even before you file an Appeal Brief.

Petition Practice

When applicants file petitions regarding this examiner's actions, 48.5% are granted (fully or in part). This grant rate is in the 42% percentile among all examiners. Strategic Note: Petitions show below-average success regarding this examiner's actions. Ensure you have a strong procedural basis before filing.

Examiner Cooperation and Flexibility

Examiner's Amendments: This examiner makes examiner's amendments in 16.7% of allowed cases (in the 97% percentile). Per MPEP § 1302.04, examiner's amendments are used to place applications in condition for allowance when only minor changes are needed. This examiner frequently uses this tool compared to other examiners, indicating a cooperative approach to getting applications allowed. Strategic Insight: If you are close to allowance but minor claim amendments are needed, this examiner may be willing to make an examiner's amendment rather than requiring another round of prosecution.

Quayle Actions: This examiner issues Ex Parte Quayle actions in 0.7% of allowed cases (in the 59% percentile). This examiner issues Quayle actions more often than average when claims are allowable but formal matters remain (MPEP § 714.14).

Prosecution Strategy Recommendations

Based on the statistical analysis of this examiner's prosecution patterns, here are tailored strategic recommendations:

  • Consider after-final amendments: This examiner frequently enters after-final amendments. If you can clearly overcome rejections with claim amendments, file an after-final amendment before resorting to an RCE.
  • Request pre-appeal conferences: PACs are highly effective with this examiner. Before filing a full appeal brief, request a PAC to potentially resolve issues without full PTAB review.
  • Appeal filing as negotiation tool: This examiner frequently reconsiders rejections during the appeal process. Filing a Notice of Appeal may prompt favorable reconsideration during the mandatory appeal conference.
  • Examiner cooperation: This examiner frequently makes examiner's amendments to place applications in condition for allowance. If you are close to allowance, the examiner may help finalize the claims.

Relevant MPEP Sections for Prosecution Strategy

  • MPEP § 713.10: Examiner interviews - available before Notice of Allowance or transfer to PTAB
  • MPEP § 714.12: After-final amendments - may be entered "under justifiable circumstances"
  • MPEP § 1002.02(c): Petitionable matters to Technology Center Director
  • MPEP § 1004: Actions requiring primary examiner signature (allowances, final rejections, examiner's answers)
  • MPEP § 1207.01: Appeal conferences - mandatory for all appeals
  • MPEP § 1214.07: Reopening prosecution after appeal

Important Disclaimer

Not Legal Advice: The information provided in this report is for informational purposes only and does not constitute legal advice. You should consult with a qualified patent attorney or agent for advice specific to your situation.

No Guarantees: We do not provide any guarantees as to the accuracy, completeness, or timeliness of the statistics presented above. Patent prosecution statistics are derived from publicly available USPTO data and are subject to data quality limitations, processing errors, and changes in USPTO practices over time.

Limitation of Liability: Under no circumstances will IronCrow AI be liable for any outcome, decision, or action resulting from your reliance on the statistics, analysis, or recommendations presented in this report. Past prosecution patterns do not guarantee future results.

Use at Your Own Risk: While we strive to provide accurate and useful prosecution statistics, you should independently verify any information that is material to your prosecution strategy and use your professional judgment in all patent prosecution matters.