USPTO Examiner HATFIELD MARSHALL MU NUO - Art Unit 2897

Recent Applications

Detailed information about the 100 most recent patent applications.

Application NumberTitleFiling DateDisposal DateDispositionTime (months)Office ActionsRestrictionsInterviewAppeal
18750894MINI ENVIRONMENT INSTRUMENTED WAFERJune 2024November 2025Allow1710YesNo
18322046DEVICE, SYSTEM AND METHOD FOR VOLTAGE GENERATINGMay 2023November 2025Allow3001YesNo
17794628Display Substrate and Display DeviceMarch 2023January 2026Allow4210YesNo
18041466SENSOR MODULEFebruary 2023February 2026Allow3611YesNo
17859204SEMICONDUCTOR DEVICE STRUCTUREJuly 2022August 2025Allow3811YesNo
17840083SILICON CARBIDE SEMICONDUCTOR DEVICEJune 2022October 2025Allow4011YesNo
17824436SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOFMay 2022November 2025Allow4121YesNo
17779064SCHOTTKY DIODE AND MANUFACTURING METHOD THEREFORMay 2022April 2025Allow3501YesNo
17777811SEMICONDUCTOR DEVICE, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND ELECTRONIC APPARATUS INCLUDING THE SEMICONDUCTOR DEVICEMay 2022February 2026Allow4521YesNo
17740832ANCHOR DESIGN WITH REJECTION OF EXTERNAL SHEAR FORCEMay 2022September 2025Allow4020YesNo
17738743PJ JUNCTION DEVICE STRUCTURE IN SEMICONDUCTOR DEVICE WITH BACK SIDE POWER DELIVERY NETWORK (BSPDN) STRUCTUREMay 2022March 2026Allow4621YesNo
17772595DISPLAY PANEL, MANUFACTURE METHOD THEREFOR, AND DISPLAY DEVICEApril 2022March 2025Allow3401NoNo
17731225PIXEL AND DISPLAY APPARATUSApril 2022March 2025Allow3510NoNo
17725426SEMICONDUCTOR STRUCTURE AND FORMING METHOD THEREOFApril 2022October 2025Allow4221YesNo
17659688AMPLIFIERS FOR BIOLOGICAL SENSING APPLICATIONSApril 2022January 2025Allow3301YesNo
17766859Display Apparatus, Display Module, and Electronic DeviceApril 2022March 2025Allow3511NoNo
17709875SEMICONDUCTOR DEVICE AND METHOD OF FORMING THE SAMEMarch 2022January 2025Allow3301YesNo
17765763DISPLAY DEVICE USING MICRO-LEDS AND METHOD FOR MANUFACTURING SAMEMarch 2022June 2025Allow3911YesNo
17703329Transistor Gate Structures and Methods of Forming the SameMarch 2022September 2025Allow4221YesNo
17700785MEASUREMENT APPARATUS, MEASUREMENT SYSTEM, SUBSTRATE PROCESSING APPARATUS, AND MEASUREMENT METHODMarch 2022September 2025Allow4220YesNo
17762554SUPERCONDUCTOR COMPOSITES AND DEVICES COMPRISING SAMEMarch 2022January 2025Allow3420NoNo
17694064OPTICAL CONTROL SWITCH AND ELECTRONIC DEVICE COMPRISING SAMEMarch 2022November 2025Allow4431YesNo
17693983DIFFUSION BARRIER TO MITIGATE DIRECT-SHORTAGE LEAKAGE IN CONDUCTIVE BRIDGING RAM (CBRAM)March 2022October 2025Allow4321NoNo
17682515THREE-DIMENSIONAL MEMORY DEVICE CONTAINING ETCH-STOP STRUCTURES AND SELF-ALIGNED INSULATING SPACERS AND METHOD OF MAKING THE SAMEFebruary 2022March 2025Allow3711NoNo
17678453ORGANIC THIN FILM TRANSISTOR AND METHOD OF MANUFACTURING THE SAME AND THIN FILM TRANSISTOR ARRAY PANEL AND ELECTRONIC DEVICEFebruary 2022January 2025Allow3511YesNo
176746453D AND FLASH MEMORY DEVICE AND METHOD OF FABRICATING THE SAMEFebruary 2022October 2025Abandon4421YesNo
17650531GAN VERTICAL TRENCH MOSFETS AND METHODS OF MANUFACTURING THE SAMEFebruary 2022February 2025Allow3611NoNo
17578559SEMICONDUCTOR DEVICE STRUCTURE WITH GATE STACK AND METHOD FOR FORMING THE SAMEJanuary 2022November 2024Allow3401YesNo
17576907MULTIPLE PATTERN METAL FUSE DEVICE, LAYOUT, AND METHODJanuary 2022July 2025Allow4321YesNo
17647108ELECTROSTATIC DISCHARGE PROTECTION DEVICEJanuary 2022April 2025Abandon3920NoNo
17563378SEMICONDUCTOR PRESSURE SENSOR AND MANUFACTURING METHOD OF SEMICONDUCTOR PRESSURE SENSORDecember 2021July 2025Allow4221YesNo
17644937MICROELECTRONIC DEVICES INCLUDING STAIR STEP STRUCTURES, AND RELATED ELECTRONIC SYSTEMS AND METHODSDecember 2021January 2026Allow4931YesNo
17644563SILICON GERMANIUM FINS AND INTEGRATION METHODSDecember 2021May 2025Allow4121YesNo
17550597Compact Ceramic Package with Rear CavitiesDecember 2021January 2025Allow3710YesNo
17549248MAGNETORESISTANCE MEMORY DEVICEDecember 2021February 2025Allow3811NoNo
17548576METHOD FOR FABRICATING SEMICONDUCTOR DEVICEDecember 2021March 2025Allow3930NoNo
17548583Semiconductor structure and manufacturing method thereofDecember 2021June 2025Allow4331YesNo
17618468ARRAY SUBSTRATE AND DISPLAY PANELDecember 2021September 2025Allow4521YesNo
17548133Tuning Gate Lengths In Multi-Gate Field Effect TransistorsDecember 2021November 2024Allow3511NoNo
17548426HIGH-VOLTAGE DEPLETION-MODE CURRENT SOURCE, TRANSISTOR, AND FABRICATION METHODSDecember 2021January 2026Allow4921YesNo
17539768FIELD EFFECT TRANSISTOR STRUCTUREDecember 2021March 2026Abandon5140NoNo
17456474SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAMENovember 2021November 2024Allow3520YesNo
17455681SEMICONDUCTOR DEVICENovember 2021September 2024Allow3311NoNo
17522197SWITCHING DEVICE AND MEMORY DEVICE INCLUDING THE SAMENovember 2021May 2025Allow4231YesNo
17521206CAPACITORNovember 2021July 2025Allow4430YesNo
17520786SEMICONDUCTOR DEVICE AND METHOD FOR FORMING SEMICONDUCTOR DEVICENovember 2021November 2024Allow3611NoNo
17520882SILICON CARBIDE SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAMENovember 2021October 2024Allow3511YesNo
17519898CHARGE BALANCED POWER SCHOTTKY BARRIER DIODESNovember 2021August 2024Allow3310NoNo
17517355Integrated Circuitry, Memory Circuitry Comprising Strings Of Memory Cells, And Method Of Forming Integrated CircuitryNovember 2021December 2024Abandon3711NoNo
17515652LIGHT EMITTING DEVICE, PRODUCTION METHOD THEREOF, AND DISPLAY DEVICE INCLUDING THE SAMENovember 2021September 2024Allow3511YesNo
17452807MRAM BOTTOM ELECTRODE SHROUDOctober 2021March 2026Allow5221YesNo
17452091SEMICONDUCTOR DEVICE WITH LOW LOSS WAVEGUIDE INTERFACE AND METHOD THEREFOROctober 2021March 2025Allow4021NoNo
17452235TRANSMISSION CIRCUIT, INTERFACE CIRCUIT, AND MEMORYOctober 2021July 2024Allow3311NoNo
17486034NONVOLATILE MEMORY DEVICES HAVING MAGNETIC TUNNEL JUNCTION MEMORY CELLS THEREINSeptember 2021September 2025Allow4731YesNo
17485768EMBEDDED MRAM INTEGRATED WITH SUPER VIA AND DUMMY FILLSeptember 2021November 2024Allow3811NoNo
17485733ELECTRIC FIELD VARIABLE GAS SENSOR INCLUDING GAS MOLECULE ADSORPTION INDUCING MATERIAL AND MANUFACTURING METHOD THEREOFSeptember 2021June 2024Allow3310NoNo
17482571RC IGBT, Method of Producing an RC IGBT and Method of Controlling a Half Bridge CircuitSeptember 2021November 2025Allow4931YesNo
17471474CARBON NANOTUBE MONOLAYER FILM, METHOD OF PREPARING THE SAME, AND ELECTRONIC DEVICE INCLUDING THE SAMESeptember 2021June 2024Allow3311YesNo
17468716DISPLAY DEVICESeptember 2021August 2024Allow3520NoNo
17467774ANTI-FUSE ONE-TIME PROGRAMMABLE NONVOLATILE MEMORY CELL AND MEMORY THEREOFSeptember 2021April 2025Allow4330NoNo
17467660SEMICONDUCTOR DEVICESeptember 2021July 2024Allow3510NoNo
17461863NOVEL METAL FUSE STRUCTURE BY VIA LANDINGAugust 2021February 2025Allow4130YesNo
17409823SEMICONDUCTOR DEVICE AND SYSTEMAugust 2021April 2024Allow3210NoNo
17400078MAGNETIC FILM, MAGNETORESISTANCE EFFECT ELEMENT AND MAGNETIC MEMORYAugust 2021April 2025Allow4521YesNo
17429456KINETIC INDUCTANCE FOR COUPLERS AND COMPACT QUBITSAugust 2021May 2024Allow3310NoNo
17391592WAFER LEVEL DICING METHOD AND SEMICONDUCTOR DEVICEAugust 2021August 2024Allow3620NoNo
17388200Method for Forming a Semiconductor Device and a Semiconductor DeviceJuly 2021February 2024Allow3110NoNo
17382562FinFET Device and MethodJuly 2021June 2024Allow3511YesNo
17380202SEMICONDUCTOR DEVICES FOR IMAGE SENSINGJuly 2021July 2024Allow3611YesNo
17276419DISPLAY DEVICEMarch 2021February 2024Allow3510NoNo

Appeals Overview

No appeal data available for this record. This may indicate that no appeals have been filed or decided for applications in this dataset.

Examiner HATFIELD, MARSHALL MU-NUO - Prosecution Strategy Guide

Executive Summary

Examiner HATFIELD, MARSHALL MU-NUO works in Art Unit 2897 and has examined 40 patent applications in our dataset. With an allowance rate of 95.0%, this examiner allows applications at a higher rate than most examiners at the USPTO. Applications typically reach final disposition in approximately 37 months.

Allowance Patterns

Examiner HATFIELD, MARSHALL MU-NUO's allowance rate of 95.0% places them in the 84% percentile among all USPTO examiners. This examiner is more likely to allow applications than most examiners at the USPTO.

Office Action Patterns

On average, applications examined by HATFIELD, MARSHALL MU-NUO receive 1.77 office actions before reaching final disposition. This places the examiner in the 39% percentile for office actions issued. This examiner issues fewer office actions than average, which may indicate efficient prosecution or a more lenient examination style.

Prosecution Timeline

The median time to disposition (half-life) for applications examined by HATFIELD, MARSHALL MU-NUO is 37 months. This places the examiner in the 33% percentile for prosecution speed. Prosecution timelines are slightly slower than average with this examiner.

Interview Effectiveness

Conducting an examiner interview provides a +10.0% benefit to allowance rate for applications examined by HATFIELD, MARSHALL MU-NUO. This interview benefit is in the 43% percentile among all examiners. Recommendation: Interviews provide a below-average benefit with this examiner.

Request for Continued Examination (RCE) Effectiveness

When applicants file an RCE with this examiner, 42.5% of applications are subsequently allowed. This success rate is in the 94% percentile among all examiners. Strategic Insight: RCEs are highly effective with this examiner compared to others. If you receive a final rejection, filing an RCE with substantive amendments or arguments has a strong likelihood of success.

After-Final Amendment Practice

This examiner enters after-final amendments leading to allowance in 25.0% of cases where such amendments are filed. This entry rate is in the 34% percentile among all examiners. Strategic Recommendation: This examiner shows below-average receptiveness to after-final amendments. You may need to file an RCE or appeal rather than relying on after-final amendment entry.

Petition Practice

When applicants file petitions regarding this examiner's actions, 0.0% are granted (fully or in part). This grant rate is in the 5% percentile among all examiners. Strategic Note: Petitions are rarely granted regarding this examiner's actions compared to other examiners. Ensure you have a strong procedural basis before filing a petition, as the Technology Center Director typically upholds this examiner's decisions.

Examiner Cooperation and Flexibility

Examiner's Amendments: This examiner makes examiner's amendments in 0.0% of allowed cases (in the 28% percentile). This examiner makes examiner's amendments less often than average. You may need to make most claim amendments yourself.

Quayle Actions: This examiner issues Ex Parte Quayle actions in 0.0% of allowed cases (in the 34% percentile). This examiner issues Quayle actions less often than average. Allowances may come directly without a separate action for formal matters.

Prosecution Strategy Recommendations

Based on the statistical analysis of this examiner's prosecution patterns, here are tailored strategic recommendations:

  • RCEs are effective: This examiner has a high allowance rate after RCE compared to others. If you receive a final rejection and have substantive amendments or arguments, an RCE is likely to be successful.

Relevant MPEP Sections for Prosecution Strategy

  • MPEP § 713.10: Examiner interviews - available before Notice of Allowance or transfer to PTAB
  • MPEP § 714.12: After-final amendments - may be entered "under justifiable circumstances"
  • MPEP § 1002.02(c): Petitionable matters to Technology Center Director
  • MPEP § 1004: Actions requiring primary examiner signature (allowances, final rejections, examiner's answers)
  • MPEP § 1207.01: Appeal conferences - mandatory for all appeals
  • MPEP § 1214.07: Reopening prosecution after appeal

Important Disclaimer

Not Legal Advice: The information provided in this report is for informational purposes only and does not constitute legal advice. You should consult with a qualified patent attorney or agent for advice specific to your situation.

No Guarantees: We do not provide any guarantees as to the accuracy, completeness, or timeliness of the statistics presented above. Patent prosecution statistics are derived from publicly available USPTO data and are subject to data quality limitations, processing errors, and changes in USPTO practices over time.

Limitation of Liability: Under no circumstances will IronCrow AI be liable for any outcome, decision, or action resulting from your reliance on the statistics, analysis, or recommendations presented in this report. Past prosecution patterns do not guarantee future results.

Use at Your Own Risk: While we strive to provide accurate and useful prosecution statistics, you should independently verify any information that is material to your prosecution strategy and use your professional judgment in all patent prosecution matters.