Detailed information about the 100 most recent patent applications.
| Application Number | Title | Filing Date | Disposal Date | Disposition | Time (months) | Office Actions | Restrictions | Interview | Appeal |
|---|---|---|---|---|---|---|---|---|---|
| 18412152 | DISPLAY DEVICE AND METHOD OF FABRICATING THE SAME | January 2024 | August 2025 | Allow | 19 | 2 | 0 | No | No |
| 18447549 | LOCAL INTERCONNECT | August 2023 | March 2026 | Allow | 31 | 2 | 0 | No | No |
| 18361175 | SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE | July 2023 | October 2025 | Allow | 27 | 0 | 0 | Yes | No |
| 18083943 | SEMICONDUCTOR STRUCTURE INCLUDING MULTIPLE GATE ELECTRODES | December 2022 | September 2025 | Allow | 33 | 2 | 0 | No | No |
| 18082252 | IMAGE SENSOR | December 2022 | January 2026 | Allow | 37 | 2 | 0 | Yes | No |
| 18074288 | METHOD OF MANUFACTURING PHOTODETECTION DEVICE | December 2022 | April 2025 | Allow | 29 | 0 | 0 | No | No |
| 17998298 | DISPLAY PANEL AND MANUFACTURING METHOD THEREOF, AND DISPLAY DEVICE | November 2022 | October 2025 | Allow | 35 | 0 | 1 | No | No |
| 18052316 | PROCESSING METHOD | November 2022 | February 2025 | Allow | 27 | 0 | 0 | No | No |
| 17935913 | SEMICONDUCTOR-ON-INSULATOR FIELD-EFFECT TRANSISTORS INCLUDING STRESS-INDUCING COMPONENTS | September 2022 | August 2025 | Allow | 35 | 2 | 0 | No | No |
| 17914242 | OLED DISPLAY SUBSTRATE AND DISPLAY DEVICE | September 2022 | October 2025 | Allow | 36 | 1 | 0 | No | No |
| 17816562 | NITRIDE SEMICONDUCTOR, SEMICONDUCTOR DEVICE, AND METHOD FOR MANUFACTURING THE NITRIDE SEMICONDUCTOR | August 2022 | January 2026 | Allow | 41 | 1 | 0 | No | No |
| 17867962 | SEMICONDUCTOR DEVICE AND ELECTRONIC SYSTEM INCLUDING THE SAME | July 2022 | March 2026 | Allow | 44 | 1 | 1 | Yes | No |
| 17811149 | SPAD-BASED DEVICES WITH TRANSISTOR STACKING | July 2022 | January 2026 | Abandon | 42 | 1 | 1 | No | No |
| 17832787 | DISPLAY DEVICE | June 2022 | October 2025 | Allow | 41 | 1 | 1 | No | No |
| 17682768 | METHOD FOR MANUFACTURING METAL FLUORIDE-CONTAINING ORGANIC POLYMER FILM, PATTERNING METHOD, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE | February 2022 | May 2025 | Allow | 39 | 1 | 0 | No | No |
| 17665648 | Method for Multi-Level Etch, Semiconductor Sensing Device, and Method for Manufacturing Semiconductor Sensing Device | February 2022 | May 2025 | Allow | 39 | 1 | 0 | No | No |
| 17632021 | METHOD FOR MANUFACTURING A COMPOSITE STRUCTURE COMPRISING A THIN LAYER OF MONOCRYSTALLINE SIC ON A CARRIER SUBSTRATE OF POLYCRYSTALLINE SIC | February 2022 | October 2023 | Allow | 20 | 1 | 0 | Yes | No |
| 17561687 | INTEGRATED CIRCUIT STRUCTURE HAVING ANTI-FUSE STRUCTURE | December 2021 | September 2025 | Allow | 45 | 1 | 0 | No | No |
| 17530836 | THRESHOLD VOLTAGE TUNING FOR NANORIBBON-BASED TRANSISTORS | November 2021 | November 2025 | Allow | 48 | 2 | 1 | Yes | No |
| 17509635 | APPARATUS FOR INTEGRATED MICROWAVE PHOTONICS ON A SAPPHIRE PLATFORM, METHOD OF FORMING SAME, AND APPLICATIONS OF SAME | October 2021 | October 2024 | Allow | 36 | 1 | 1 | No | No |
| 17505815 | TUNNELING TRANSISTOR | October 2021 | March 2025 | Allow | 41 | 3 | 0 | Yes | No |
| 17603320 | Method for Manufacturing Semiconductor Structure, and Semiconductor Structure | October 2021 | March 2025 | Allow | 41 | 1 | 0 | No | No |
| 17601931 | SEMICONDUCTOR DEVICE INCLUDING DIAMOND SUBSTRATE AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD | October 2021 | October 2025 | Allow | 48 | 2 | 0 | Yes | No |
| 17598175 | FILM FORMATION METHOD AND FILM FORMATION DEVICE | September 2021 | September 2024 | Allow | 35 | 0 | 1 | No | No |
| 17485238 | SELECTIVE GROWTH OF HIGH-K OXIDE ON CHANNEL OF GATE-ALL-AROUND TRANSISTORS | September 2021 | January 2026 | Allow | 52 | 2 | 1 | Yes | No |
| 17477791 | SILICON CARBIDE SEMICONDUCTOR DEVICE, POWER CONVERTER, AND METHOD FOR MANUFACTURING SILICON CARBIDE SEMICONDUCTOR DEVICE | September 2021 | March 2025 | Allow | 42 | 3 | 0 | Yes | No |
| 17473277 | SEMICONDUCTOR MEMORY DEVICE | September 2021 | April 2025 | Abandon | 43 | 1 | 0 | No | No |
| 17467568 | SEMICONDUCTOR DEVICE AND DATA STORAGE SYSTEM INCLUDING THE SAME | September 2021 | April 2025 | Allow | 43 | 1 | 1 | Yes | No |
| 17447025 | TEMPLATE, METHOD OF MANUFACTURING TEMPLATE, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | September 2021 | October 2024 | Allow | 37 | 1 | 1 | No | No |
| 17465259 | Spacer Features For Nanosheet-Based Devices | September 2021 | April 2025 | Allow | 43 | 3 | 0 | No | No |
| 17464245 | Semiconductor Devices With Threshold Voltage Modulation Layer | September 2021 | September 2024 | Allow | 36 | 2 | 1 | Yes | No |
| 17461155 | SEMICONDUCTOR STRUCTURE HAVING SELF-ALIGNED CONDUCTIVE STRUCTURE AND METHOD FOR FORMING THE SEMICONDUCTOR STRUCTURE | August 2021 | September 2025 | Allow | 49 | 3 | 1 | No | No |
| 17446419 | SEMICONDUCTOR DEVICE HAVING AIR GAP AND METHOD OF FABRICATING THEREOF | August 2021 | January 2025 | Allow | 40 | 3 | 1 | No | No |
| 17446420 | MULTIGATE DEVICE WITH STRESSOR LAYERS AND METHOD OF FABRICATING THEREOF | August 2021 | January 2025 | Allow | 41 | 2 | 1 | No | No |
| 17459856 | METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE | August 2021 | February 2024 | Allow | 29 | 3 | 0 | Yes | No |
| 17431522 | METHOD FOR MANUFACTURING OXIDE SEMICONDUCTOR THIN FILM TRANSISTOR | August 2021 | July 2025 | Allow | 47 | 2 | 0 | No | No |
| 17404485 | ELECTRONIC DEVICE | August 2021 | February 2026 | Allow | 54 | 4 | 0 | Yes | No |
| 17402079 | Isolation Structures | August 2021 | June 2025 | Allow | 46 | 4 | 0 | Yes | No |
| 17397068 | NANOSHEET TRANSISTOR WITH FERROELECTRIC REGION | August 2021 | March 2024 | Allow | 31 | 2 | 0 | Yes | No |
| 17389541 | Device Structure With Reduced Leakage Current | July 2021 | September 2025 | Allow | 50 | 4 | 1 | Yes | No |
| 17361269 | SEMICONDUCTOR STRUCTURES AND METHOD OF FORMING THE SAME | June 2021 | May 2025 | Allow | 46 | 2 | 1 | Yes | No |
| 17340937 | Thin Film Transistor Array Substrate and Display Device | June 2021 | July 2024 | Allow | 38 | 1 | 0 | Yes | No |
| 17328289 | INTER-LEVEL HANDSHAKE FOR DENSE 3D LOGIC INTEGRATION | May 2021 | February 2024 | Allow | 33 | 1 | 0 | Yes | No |
| 17323252 | WAFER PROCESSING METHOD AND MACHINE | May 2021 | July 2024 | Allow | 38 | 2 | 1 | Yes | No |
| 17232500 | NONVOLATILE MEMORY DEVICE | April 2021 | August 2024 | Allow | 40 | 2 | 1 | Yes | No |
| 17231600 | SEMICONDUCTOR DEVICES AND DATA STORAGE SYSTEMS INCLUDING THE SAME | April 2021 | January 2025 | Allow | 45 | 3 | 0 | Yes | No |
| 17225137 | LIGHT-EMITTING DIODE CHIP AND MANUFACTURING METHOD THEREOF | April 2021 | August 2024 | Allow | 40 | 2 | 0 | No | No |
| 17225875 | CIRCUIT ASSEMBLIES INCLUDING METALLIC BARS | April 2021 | August 2024 | Allow | 40 | 1 | 1 | Yes | No |
| 17214997 | ORGANIC ELECTROLUMINESCENCE DISPLAY DEVICE | March 2021 | May 2024 | Abandon | 38 | 2 | 0 | No | No |
| 17215639 | SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | March 2021 | October 2024 | Allow | 42 | 3 | 1 | Yes | No |
| 17214322 | STACKS OF ELECTRICALLY RESISTIVE MATERIALS AND RELATED SYSTEMS AND APPARATUSES | March 2021 | July 2024 | Allow | 40 | 1 | 1 | No | No |
| 17204493 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING APPARATUS, AND RECORDING MEDIUM | March 2021 | March 2024 | Allow | 36 | 1 | 1 | No | No |
| 17204015 | SEMICONDUCTOR STORAGE DEVICE AND METHOD OF MANUFACTURING SEMICONDUCTOR STORAGE DEVICE | March 2021 | December 2024 | Allow | 45 | 3 | 1 | Yes | No |
| 17264503 | SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE | January 2021 | August 2024 | Allow | 43 | 5 | 0 | No | No |
| 16914145 | NANOWIRE TRANSISTORS AND METHODS OF FABRICATION | June 2020 | November 2025 | Allow | 60 | 4 | 1 | Yes | No |
| 16727370 | GATE-ALL-AROUND INTEGRATED CIRCUIT STRUCTURES HAVING INSULATOR SUBSTRATE | December 2019 | January 2025 | Allow | 60 | 4 | 1 | No | No |
| 16713600 | HIGH VOLTAGE ULTRA-LOW POWER THICK GATE NANORIBBON TRANSISTORS FOR SOC APPLICATIONS | December 2019 | March 2026 | Abandon | 60 | 6 | 1 | No | No |
No appeal data available for this record. This may indicate that no appeals have been filed or decided for applications in this dataset.
Examiner HUNTER III, CARNELL works in Art Unit 2893 and has examined 40 patent applications in our dataset. With an allowance rate of 92.5%, this examiner allows applications at a higher rate than most examiners at the USPTO. Applications typically reach final disposition in approximately 42 months.
Examiner HUNTER III, CARNELL's allowance rate of 92.5% places them in the 78% percentile among all USPTO examiners. This examiner is more likely to allow applications than most examiners at the USPTO.
On average, applications examined by HUNTER III, CARNELL receive 2.33 office actions before reaching final disposition. This places the examiner in the 66% percentile for office actions issued. This examiner issues a slightly above-average number of office actions.
The median time to disposition (half-life) for applications examined by HUNTER III, CARNELL is 42 months. This places the examiner in the 19% percentile for prosecution speed. Applications take longer to reach final disposition with this examiner compared to most others.
Conducting an examiner interview provides a +16.7% benefit to allowance rate for applications examined by HUNTER III, CARNELL. This interview benefit is in the 57% percentile among all examiners. Recommendation: Interviews provide an above-average benefit with this examiner and are worth considering.
When applicants file an RCE with this examiner, 31.2% of applications are subsequently allowed. This success rate is in the 63% percentile among all examiners. Strategic Insight: RCEs show above-average effectiveness with this examiner. Consider whether your amendments or new arguments are strong enough to warrant an RCE versus filing a continuation.
This examiner enters after-final amendments leading to allowance in 34.4% of cases where such amendments are filed. This entry rate is in the 51% percentile among all examiners. Strategic Recommendation: This examiner shows above-average receptiveness to after-final amendments. If your amendments clearly overcome the rejections and do not raise new issues, consider filing after-final amendments before resorting to an RCE.
When applicants file petitions regarding this examiner's actions, 0.0% are granted (fully or in part). This grant rate is in the 5% percentile among all examiners. Strategic Note: Petitions are rarely granted regarding this examiner's actions compared to other examiners. Ensure you have a strong procedural basis before filing a petition, as the Technology Center Director typically upholds this examiner's decisions.
Examiner's Amendments: This examiner makes examiner's amendments in 0.0% of allowed cases (in the 28% percentile). This examiner makes examiner's amendments less often than average. You may need to make most claim amendments yourself.
Quayle Actions: This examiner issues Ex Parte Quayle actions in 0.0% of allowed cases (in the 33% percentile). This examiner issues Quayle actions less often than average. Allowances may come directly without a separate action for formal matters.
Based on the statistical analysis of this examiner's prosecution patterns, here are tailored strategic recommendations:
Not Legal Advice: The information provided in this report is for informational purposes only and does not constitute legal advice. You should consult with a qualified patent attorney or agent for advice specific to your situation.
No Guarantees: We do not provide any guarantees as to the accuracy, completeness, or timeliness of the statistics presented above. Patent prosecution statistics are derived from publicly available USPTO data and are subject to data quality limitations, processing errors, and changes in USPTO practices over time.
Limitation of Liability: Under no circumstances will IronCrow AI be liable for any outcome, decision, or action resulting from your reliance on the statistics, analysis, or recommendations presented in this report. Past prosecution patterns do not guarantee future results.
Use at Your Own Risk: While we strive to provide accurate and useful prosecution statistics, you should independently verify any information that is material to your prosecution strategy and use your professional judgment in all patent prosecution matters.