USPTO Examiner HUNTER III CARNELL - Art Unit 2893

Recent Applications

Detailed information about the 100 most recent patent applications.

Application NumberTitleFiling DateDisposal DateDispositionTime (months)Office ActionsRestrictionsInterviewAppeal
18412152DISPLAY DEVICE AND METHOD OF FABRICATING THE SAMEJanuary 2024August 2025Allow1920NoNo
18447549LOCAL INTERCONNECTAugust 2023March 2026Allow3120NoNo
18361175SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICEJuly 2023October 2025Allow2700YesNo
18083943SEMICONDUCTOR STRUCTURE INCLUDING MULTIPLE GATE ELECTRODESDecember 2022September 2025Allow3320NoNo
18082252IMAGE SENSORDecember 2022January 2026Allow3720YesNo
18074288METHOD OF MANUFACTURING PHOTODETECTION DEVICEDecember 2022April 2025Allow2900NoNo
17998298DISPLAY PANEL AND MANUFACTURING METHOD THEREOF, AND DISPLAY DEVICENovember 2022October 2025Allow3501NoNo
18052316PROCESSING METHODNovember 2022February 2025Allow2700NoNo
17935913SEMICONDUCTOR-ON-INSULATOR FIELD-EFFECT TRANSISTORS INCLUDING STRESS-INDUCING COMPONENTSSeptember 2022August 2025Allow3520NoNo
17914242OLED DISPLAY SUBSTRATE AND DISPLAY DEVICESeptember 2022October 2025Allow3610NoNo
17816562NITRIDE SEMICONDUCTOR, SEMICONDUCTOR DEVICE, AND METHOD FOR MANUFACTURING THE NITRIDE SEMICONDUCTORAugust 2022January 2026Allow4110NoNo
17867962SEMICONDUCTOR DEVICE AND ELECTRONIC SYSTEM INCLUDING THE SAMEJuly 2022March 2026Allow4411YesNo
17811149SPAD-BASED DEVICES WITH TRANSISTOR STACKINGJuly 2022January 2026Abandon4211NoNo
17832787DISPLAY DEVICEJune 2022October 2025Allow4111NoNo
17682768METHOD FOR MANUFACTURING METAL FLUORIDE-CONTAINING ORGANIC POLYMER FILM, PATTERNING METHOD, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICEFebruary 2022May 2025Allow3910NoNo
17665648Method for Multi-Level Etch, Semiconductor Sensing Device, and Method for Manufacturing Semiconductor Sensing DeviceFebruary 2022May 2025Allow3910NoNo
17632021METHOD FOR MANUFACTURING A COMPOSITE STRUCTURE COMPRISING A THIN LAYER OF MONOCRYSTALLINE SIC ON A CARRIER SUBSTRATE OF POLYCRYSTALLINE SICFebruary 2022October 2023Allow2010YesNo
17561687INTEGRATED CIRCUIT STRUCTURE HAVING ANTI-FUSE STRUCTUREDecember 2021September 2025Allow4510NoNo
17530836THRESHOLD VOLTAGE TUNING FOR NANORIBBON-BASED TRANSISTORSNovember 2021November 2025Allow4821YesNo
17509635APPARATUS FOR INTEGRATED MICROWAVE PHOTONICS ON A SAPPHIRE PLATFORM, METHOD OF FORMING SAME, AND APPLICATIONS OF SAMEOctober 2021October 2024Allow3611NoNo
17505815TUNNELING TRANSISTOROctober 2021March 2025Allow4130YesNo
17603320Method for Manufacturing Semiconductor Structure, and Semiconductor StructureOctober 2021March 2025Allow4110NoNo
17601931SEMICONDUCTOR DEVICE INCLUDING DIAMOND SUBSTRATE AND SEMICONDUCTOR DEVICE MANUFACTURING METHODOctober 2021October 2025Allow4820YesNo
17598175FILM FORMATION METHOD AND FILM FORMATION DEVICESeptember 2021September 2024Allow3501NoNo
17485238SELECTIVE GROWTH OF HIGH-K OXIDE ON CHANNEL OF GATE-ALL-AROUND TRANSISTORSSeptember 2021January 2026Allow5221YesNo
17477791SILICON CARBIDE SEMICONDUCTOR DEVICE, POWER CONVERTER, AND METHOD FOR MANUFACTURING SILICON CARBIDE SEMICONDUCTOR DEVICESeptember 2021March 2025Allow4230YesNo
17473277SEMICONDUCTOR MEMORY DEVICESeptember 2021April 2025Abandon4310NoNo
17467568SEMICONDUCTOR DEVICE AND DATA STORAGE SYSTEM INCLUDING THE SAMESeptember 2021April 2025Allow4311YesNo
17447025TEMPLATE, METHOD OF MANUFACTURING TEMPLATE, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICESeptember 2021October 2024Allow3711NoNo
17465259Spacer Features For Nanosheet-Based DevicesSeptember 2021April 2025Allow4330NoNo
17464245Semiconductor Devices With Threshold Voltage Modulation LayerSeptember 2021September 2024Allow3621YesNo
17461155SEMICONDUCTOR STRUCTURE HAVING SELF-ALIGNED CONDUCTIVE STRUCTURE AND METHOD FOR FORMING THE SEMICONDUCTOR STRUCTUREAugust 2021September 2025Allow4931NoNo
17446419SEMICONDUCTOR DEVICE HAVING AIR GAP AND METHOD OF FABRICATING THEREOFAugust 2021January 2025Allow4031NoNo
17446420MULTIGATE DEVICE WITH STRESSOR LAYERS AND METHOD OF FABRICATING THEREOFAugust 2021January 2025Allow4121NoNo
17459856METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICEAugust 2021February 2024Allow2930YesNo
17431522METHOD FOR MANUFACTURING OXIDE SEMICONDUCTOR THIN FILM TRANSISTORAugust 2021July 2025Allow4720NoNo
17404485ELECTRONIC DEVICEAugust 2021February 2026Allow5440YesNo
17402079Isolation StructuresAugust 2021June 2025Allow4640YesNo
17397068NANOSHEET TRANSISTOR WITH FERROELECTRIC REGIONAugust 2021March 2024Allow3120YesNo
17389541Device Structure With Reduced Leakage CurrentJuly 2021September 2025Allow5041YesNo
17361269SEMICONDUCTOR STRUCTURES AND METHOD OF FORMING THE SAMEJune 2021May 2025Allow4621YesNo
17340937Thin Film Transistor Array Substrate and Display DeviceJune 2021July 2024Allow3810YesNo
17328289INTER-LEVEL HANDSHAKE FOR DENSE 3D LOGIC INTEGRATIONMay 2021February 2024Allow3310YesNo
17323252WAFER PROCESSING METHOD AND MACHINEMay 2021July 2024Allow3821YesNo
17232500NONVOLATILE MEMORY DEVICEApril 2021August 2024Allow4021YesNo
17231600SEMICONDUCTOR DEVICES AND DATA STORAGE SYSTEMS INCLUDING THE SAMEApril 2021January 2025Allow4530YesNo
17225137LIGHT-EMITTING DIODE CHIP AND MANUFACTURING METHOD THEREOFApril 2021August 2024Allow4020NoNo
17225875CIRCUIT ASSEMBLIES INCLUDING METALLIC BARSApril 2021August 2024Allow4011YesNo
17214997ORGANIC ELECTROLUMINESCENCE DISPLAY DEVICEMarch 2021May 2024Abandon3820NoNo
17215639SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICEMarch 2021October 2024Allow4231YesNo
17214322STACKS OF ELECTRICALLY RESISTIVE MATERIALS AND RELATED SYSTEMS AND APPARATUSESMarch 2021July 2024Allow4011NoNo
17204493METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING APPARATUS, AND RECORDING MEDIUMMarch 2021March 2024Allow3611NoNo
17204015SEMICONDUCTOR STORAGE DEVICE AND METHOD OF MANUFACTURING SEMICONDUCTOR STORAGE DEVICEMarch 2021December 2024Allow4531YesNo
17264503SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICEJanuary 2021August 2024Allow4350NoNo
16914145NANOWIRE TRANSISTORS AND METHODS OF FABRICATIONJune 2020November 2025Allow6041YesNo
16727370GATE-ALL-AROUND INTEGRATED CIRCUIT STRUCTURES HAVING INSULATOR SUBSTRATEDecember 2019January 2025Allow6041NoNo
16713600HIGH VOLTAGE ULTRA-LOW POWER THICK GATE NANORIBBON TRANSISTORS FOR SOC APPLICATIONSDecember 2019March 2026Abandon6061NoNo

Appeals Overview

No appeal data available for this record. This may indicate that no appeals have been filed or decided for applications in this dataset.

Examiner HUNTER III, CARNELL - Prosecution Strategy Guide

Executive Summary

Examiner HUNTER III, CARNELL works in Art Unit 2893 and has examined 40 patent applications in our dataset. With an allowance rate of 92.5%, this examiner allows applications at a higher rate than most examiners at the USPTO. Applications typically reach final disposition in approximately 42 months.

Allowance Patterns

Examiner HUNTER III, CARNELL's allowance rate of 92.5% places them in the 78% percentile among all USPTO examiners. This examiner is more likely to allow applications than most examiners at the USPTO.

Office Action Patterns

On average, applications examined by HUNTER III, CARNELL receive 2.33 office actions before reaching final disposition. This places the examiner in the 66% percentile for office actions issued. This examiner issues a slightly above-average number of office actions.

Prosecution Timeline

The median time to disposition (half-life) for applications examined by HUNTER III, CARNELL is 42 months. This places the examiner in the 19% percentile for prosecution speed. Applications take longer to reach final disposition with this examiner compared to most others.

Interview Effectiveness

Conducting an examiner interview provides a +16.7% benefit to allowance rate for applications examined by HUNTER III, CARNELL. This interview benefit is in the 57% percentile among all examiners. Recommendation: Interviews provide an above-average benefit with this examiner and are worth considering.

Request for Continued Examination (RCE) Effectiveness

When applicants file an RCE with this examiner, 31.2% of applications are subsequently allowed. This success rate is in the 63% percentile among all examiners. Strategic Insight: RCEs show above-average effectiveness with this examiner. Consider whether your amendments or new arguments are strong enough to warrant an RCE versus filing a continuation.

After-Final Amendment Practice

This examiner enters after-final amendments leading to allowance in 34.4% of cases where such amendments are filed. This entry rate is in the 51% percentile among all examiners. Strategic Recommendation: This examiner shows above-average receptiveness to after-final amendments. If your amendments clearly overcome the rejections and do not raise new issues, consider filing after-final amendments before resorting to an RCE.

Petition Practice

When applicants file petitions regarding this examiner's actions, 0.0% are granted (fully or in part). This grant rate is in the 5% percentile among all examiners. Strategic Note: Petitions are rarely granted regarding this examiner's actions compared to other examiners. Ensure you have a strong procedural basis before filing a petition, as the Technology Center Director typically upholds this examiner's decisions.

Examiner Cooperation and Flexibility

Examiner's Amendments: This examiner makes examiner's amendments in 0.0% of allowed cases (in the 28% percentile). This examiner makes examiner's amendments less often than average. You may need to make most claim amendments yourself.

Quayle Actions: This examiner issues Ex Parte Quayle actions in 0.0% of allowed cases (in the 33% percentile). This examiner issues Quayle actions less often than average. Allowances may come directly without a separate action for formal matters.

Prosecution Strategy Recommendations

Based on the statistical analysis of this examiner's prosecution patterns, here are tailored strategic recommendations:

  • Plan for extended prosecution: Applications take longer than average with this examiner. Factor this into your continuation strategy and client communications.

Relevant MPEP Sections for Prosecution Strategy

  • MPEP § 713.10: Examiner interviews - available before Notice of Allowance or transfer to PTAB
  • MPEP § 714.12: After-final amendments - may be entered "under justifiable circumstances"
  • MPEP § 1002.02(c): Petitionable matters to Technology Center Director
  • MPEP § 1004: Actions requiring primary examiner signature (allowances, final rejections, examiner's answers)
  • MPEP § 1207.01: Appeal conferences - mandatory for all appeals
  • MPEP § 1214.07: Reopening prosecution after appeal

Important Disclaimer

Not Legal Advice: The information provided in this report is for informational purposes only and does not constitute legal advice. You should consult with a qualified patent attorney or agent for advice specific to your situation.

No Guarantees: We do not provide any guarantees as to the accuracy, completeness, or timeliness of the statistics presented above. Patent prosecution statistics are derived from publicly available USPTO data and are subject to data quality limitations, processing errors, and changes in USPTO practices over time.

Limitation of Liability: Under no circumstances will IronCrow AI be liable for any outcome, decision, or action resulting from your reliance on the statistics, analysis, or recommendations presented in this report. Past prosecution patterns do not guarantee future results.

Use at Your Own Risk: While we strive to provide accurate and useful prosecution statistics, you should independently verify any information that is material to your prosecution strategy and use your professional judgment in all patent prosecution matters.