USPTO Examiner BODNAR JOHN A - Art Unit 2893

Recent Applications

Detailed information about the 100 most recent patent applications.

Application NumberTitleFiling DateDisposal DateDispositionTime (months)Office ActionsRestrictionsInterviewAppeal
18632439CONTROL OF LOCOS STRUCTURE THICKNESS WITHOUT A MASKApril 2024March 2025Allow1100NoNo
18629967SCHOTTKY BARRIER DIODE WITH REDUCED LEAKAGE CURRENT AND METHOD OF FORMING THE SAMEApril 2024March 2025Allow1100NoNo
18442794SEMICONDUCTOR DEVICE ISOLATION FEATURESFebruary 2024January 2025Allow1100NoNo
18434954SEMICONDUCTOR DEVICES INCLUDING CAPACITOR AND METHODS OF MANUFACTURING THE SEMICONDUCTOR DEVICESFebruary 2024March 2025Allow1300NoNo
18434711SEMICONDUCTOR PACKAGE AND METHOD OF MANUFACTURING THE SAMEFebruary 2024June 2025Allow1610NoNo
18406155SEMICONDUCTOR DEVICE STRUCTURE AND METHODS OF FORMING THE SAMEJanuary 2024June 2025Allow1701NoNo
18398378SEMICONDUCTOR MEMORY DEVICE AND METHOD OF MANUFACTURING THE SAMEDecember 2023January 2025Allow1300NoNo
18534219TRENCH PLUG HARDMASK FOR ADVANCED INTEGRATED CIRCUIT STRUCTURE FABRICATIONDecember 2023March 2025Allow1510NoNo
18526290Semiconductor Structure Cutting Process and Structures Formed TherebyDecember 2023September 2024Allow1000NoNo
18514010ANTI-OXIDATION LAYER TO PREVENT DIELECTRIC LOSS FROM PLANARIZATION PROCESSNovember 2023March 2025Allow1510NoNo
18513619SEMICONDUCTOR DEVICE STRUCTURE INCLUDING FORKSHEET TRANSISTORS AND METHODS OF FORMING THE SAMENovember 2023February 2025Allow1510NoNo
18502244INTEGRATED CIRCUIT PACKAGE SUPPORTSNovember 2023August 2024Allow1000NoNo
18499258DEVICES INCLUDING STACKED NANOSHEET TRANSISTORSNovember 2023January 2025Allow1510YesNo
18490456PASSIVATION OF INFRARED DETECTORS USING OXIDE LAYEROctober 2023August 2024Allow1000NoNo
18365517DEVICE AND METHOD FOR HIGH PRESSURE ANNEALAugust 2023August 2024Allow1200NoNo
18362030SEMICONDUCTOR DEVICEJuly 2023March 2025Allow2020NoNo
18362083Method of Fabricating Redistribution Circuit StructureJuly 2023August 2024Allow1200NoNo
18355997Gate Structure and Method with Enhanced Gate Contact and Threshold VoltageJuly 2023June 2024Allow1100NoNo
18344580SEMICONDUCTOR DEVICES AND METHODS OF MANUFACTURING THEREOFJune 2023November 2024Allow1710NoNo
18315836SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF AND ELECTRONIC APPARATUS INCLUDING THE SAMEMay 2023June 2024Allow1400YesNo
18195269FORMING NANOSHEET TRANSISTOR USING SACRIFICIAL SPACER AND INNER SPACERSMay 2023March 2024Allow1100NoNo
18119043METHOD FOR MANUFACTURING CAPACITOR STRUCTUREMarch 2023May 2024Allow1410NoNo
18119009CAPACITOR STRUCTURE AND METHOD FOR MANUFACTURING THE SAMEMarch 2023May 2024Allow1410NoNo
18117539SEMICONDUCTOR DEVICE WITH REDISTRIBUTION LAYERS FORMED UTILIZING DUMMY SUBSTRATESMarch 2023April 2025Allow2631NoNo
18115165POWER SEMICONDUCTOR DEVICEFebruary 2023June 2025Allow2800NoNo
18173934Method For Growing Multiple Layers of Source Drain Epitaxial Silicon in FDSOI ProcessFebruary 2023June 2025Allow2800NoNo
18108755METHOD FOR PREPARING SEMICONDUCTOR DEVICE STRUCTURE WITH BOTTOM CAPACITOR ELECTRODE HAVING CROWN-SHAPED STRUCTURE AND INTERCONNECT PORTIONFebruary 2023November 2023Allow900NoNo
18101134STRUCTURES AND METHODS OF FABRICATING ELECTRONIC DEVICES USING SEPARATION AND CHARGE DEPLETION TECHNIQUESJanuary 2023November 2023Allow900NoNo
18153652SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOFJanuary 2023June 2025Allow2930NoNo
18151940MASK ASSEMBLY AND APPARATUS AND METHOD OF MANUFACTURING DISPLAY APPARATUSJanuary 2023July 2024Allow1810NoNo
18094088HIGH RESISTANCE POLY RESISTORJanuary 2023February 2024Allow1401NoNo
18149226LOW RESISTIVITY DRAM BURIED WORD LINE STACKJanuary 2023February 2024Allow1300NoNo
18088631SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAMEDecember 2022February 2024Allow1310NoNo
18002513METHOD AND APPARATUS TO MITIGATE WORD LINE STAIRCASE ETCH STOP LAYER THICKNESS VARIATIONS IN 3D NAND DEVICESDecember 2022May 2025Allow2900NoNo
18067776METHOD TO REDUCE BREAKDOWN FAILURE IN A MIM CAPACITORDecember 2022May 2025Allow2900NoNo
18080976HIGH VOLTAGE ISOLATED MICROELECTRONIC DEVICEDecember 2022February 2024Allow1401YesNo
18072307NON-VOLATILE MEMORY STRUCTURE AND METHOD FOR FORMING THE SAMENovember 2022June 2025Allow3101NoNo
18057894SEMICONDUCTOR DEVICES INCLUDING CAPACITOR AND METHODS OF MANUFACTURING THE SEMICONDUCTOR DEVICESNovember 2022November 2023Allow1100NoNo
17979345STACKED TRANSISTORS WITH DIFFERENT CHANNEL WIDTHSNovember 2022October 2024Allow2320NoNo
17967354LOW WARP FAN-OUT PROCESSING METHOD AND PRODUCTION OF SUBSTRATES THEREFOROctober 2022September 2023Allow1100NoNo
17943336METHODS FOR DEPOSITING AN OXIDE FILM ON A SUBSTRATE BY A CYCLICAL DEPOSITION PROCESS AND RELATED DEVICE STRUCTURESSeptember 2022October 2023Allow1300NoNo
17890969CONTINUOUS GATE AND FIN SPACER FOR ADVANCED INTEGRATED CIRCUIT STRUCTURE FABRICATIONAugust 2022June 2023Allow1000NoNo
17891028ENHANCED DEPOSITION RATE BY THERMAL ISOLATION COVER FOR GIS MANIPULATORAugust 2022February 2025Allow3000NoNo
17886380INNOVATIVE FAN-OUT PANEL LEVEL PACKAGE (FOPLP) WARPAGE CONTROLAugust 2022March 2024Allow1910NoNo
17818279SUPPORT STRUCTURES FOR THREE DIMENSIONAL MEMORY ARRAYSAugust 2022April 2025Allow3301YesNo
17877056SEMICONDUCTOR MEMORY DEVICEJuly 2022May 2024Allow2120YesNo
17874732Semiconductor Device and MethodJuly 2022November 2023Allow1610NoNo
17872417Semiconductor Structure Cutting Process and Structures Formed TherebyJuly 2022August 2023Allow1300NoNo
17869826SEMICONDUCTOR MEMORY DEVICE AND METHOD OF MANUFACTURING THE SAMEJuly 2022June 2023Allow1100NoNo
17867369TRENCH PLUG HARDMASK FOR ADVANCED INTEGRATED CIRCUIT STRUCTURE FABRICATIONJuly 2022September 2023Allow1400NoNo
17863273NOVEL RESISTIVE RANDOM ACCESS MEMORY DEVICEJuly 2022October 2024Allow2730NoNo
17859425GALLIUM NITRIDE HIGH-ELECTRON MOBILITY TRANSISTORS WITH P-TYPE LAYERS AND PROCESS FOR MAKING THE SAMEJuly 2022July 2024Allow2420NoNo
17857699SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICEJuly 2022June 2023Allow1100NoNo
17809956Cell ManufacturingJune 2022May 2024Allow2220NoNo
17788555DISPLAY PANEL AND DISPLAY DEVICEJune 2022May 2025Allow3510NoNo
17846624DIELECTRIC STRUCTURES FOR SEMICONDUCTOR DEVICESJune 2022November 2023Allow1710NoNo
17846371SEMICONDUCTOR MODULE, ELECTRICAL COMPONENT, AND CONNECTION STRUCTURE OF THE SEMICONDUCTOR MODULE AND THE ELECTRICAL COMPONENTJune 2022December 2024Allow3000YesNo
17807759SEMICONDUCTOR STRUCTUREJune 2022May 2025Allow3410NoNo
17805696POLYCRYSTALLINE SEMICONDUCTOR RESISTORJune 2022February 2025Allow3310NoNo
17832883SEMICONDUCTOR STRUCTURE AND METHOD FOR MANUFACTURING SAME, AND SEMICONDUCTOR MEMORYJune 2022April 2025Allow3511NoNo
17833348TRANSISTOR GATE STRUCTURES AND METHODS OF FORMING THEREOFJune 2022June 2025Allow3610NoNo
17832066DISPLAY DEVICEJune 2022November 2024Allow3000NoNo
17830624Buried Field Shield in III-V Compound Semiconductor Trench MOSFETs via Etch and RegrowthJune 2022February 2025Allow3311NoNo
17830348Semiconductor devices having a resistor structure with more refined coupling effect for improved linearity of resistanceJune 2022September 2024Allow2700NoNo
17831054SEMICONDUCTOR DEVICES AND METHODS OF FABRICATION THEREOFJune 2022November 2024Allow3001NoNo
17828490LIGHT EMITTING DEVICEMay 2022September 2024Allow2800NoNo
17826255SCHOTTKY BARRIER DIODE WITH REDUCED LEAKAGE CURRENT AND METHOD OF FORMING THE SAMEMay 2022January 2024Allow1920YesNo
17750185SEMICONDUCTOR DEVICE HAVING A RESISTORMay 2022September 2024Allow2800NoNo
17742452SEMICONDUCTOR DEVICE STRUCTURE AND METHODS OF FORMING THE SAMEMay 2022June 2024Allow2501NoNo
17743424DISPLAY APPARATUSMay 2022August 2024Allow2700NoNo
17662079METHOD FOR FORMING SEMICONDUCTOR INTERCONNECTION STRUCTURE AGAINST STRESS MIGRATIONMay 2022February 2025Allow3420NoNo
17737226IMAGE SENSORMay 2022June 2025Allow3720YesNo
17725993MEMORY DEVICEApril 2022January 2025Allow3310YesNo
17724152HIGH ASPECT RATIO NON-PLANAR CAPACITORS FORMED VIA CAVITY FILLApril 2022March 2023Allow1100NoNo
17722010FIELD EFFECT TRANSISTOR, DEVICE INCLUDING THE TRANSISTOR, AND METHODS OF FORMING AND USING SAMEApril 2022February 2024Allow2210NoNo
17716419DUAL PRESSURE OXIDATION METHOD FOR FORMING AN OXIDE LAYER IN A FEATUREApril 2022December 2024Allow3211YesNo
17712498SEMICONDUCTOR STRUCTURE AND FORMING METHOD THEREOFApril 2022April 2025Allow3711NoNo
17696945THIN-FILM TRANSISTOR EMBEDDED DYNAMIC RANDOM-ACCESS MEMORY WITH SHALLOW BITLINEMarch 2022April 2023Allow1300NoNo
17654028SEMICONDUCTOR DEVICES COMPRISING CARBON-DOPED SILICON NITRIDE AND RELATED METHODSMarch 2022December 2024Allow3350NoNo
17682721SEMICONDUCTOR STRUCTURE AND METHOD OF MANUFACTUREFebruary 2022December 2024Allow3411NoNo
17678971Three Dimensional MemoryFebruary 2022December 2023Allow2120NoYes
17677105INTEGRATED CIRCUIT PACKAGE SUPPORTSFebruary 2022August 2023Allow1810YesNo
17666249HIGH PERFORMANCE NEW CHANNEL MATERIALS PRECISION ALIGNED 3D CFET DEVICE ARCHITECTUREFebruary 2022March 2025Allow3721NoNo
17581972MEMS DEVICES AND METHODS OF FORMING THEREOFJanuary 2022August 2023Allow1810NoNo
17579543SEMICONDUCTOR DEVICEJanuary 2022May 2024Allow2820NoNo
17579585LOW TURN-ON VOLTAGE GaN DIODES HAVING ANODE METAL WITH CONSISTENT CRYSTAL ORIENTATION AND PREPARATION METHOD THEREOFJanuary 2022October 2022Allow911NoNo
17573784SEMICONDUCTOR STRUCTURE AND METHOD FOR MANUFACTURING SEMICONDUCTOR STRUCTUREJanuary 2022October 2024Allow3411NoNo
17574030AMORPHOUS BOTTOM ELECTRODE STRUCTURE FOR MIM CAPACITORSJanuary 2022February 2024Allow2511NoNo
17570442OXYGEN VACANCY PASSIVATION IN HIGH-K DIELECTRICS FOR VERTICAL TRANSPORT FIELD EFFECT TRANSISTORJanuary 2022December 2022Allow1100NoNo
17567226DISPLAY DEVICEJanuary 2022April 2024Allow2800NoNo
17622824DISPLAY PANELDecember 2021March 2024Allow2700NoNo
17559490SELF-ASSEMBLED GUIDED HOLE AND VIA PATTERNING OVER GRATINGDecember 2021February 2024Allow2621YesNo
17551214FABRICATION METHOD OF MEMORY DEVICEDecember 2021May 2023Allow1710NoNo
17548997FILM DEPOSITION METHOD AND ELEMENT INCLUDING FILM DEPOSITED BY THE FILM DEPOSITION METHODDecember 2021August 2024Allow3231YesNo
17527355MULTI-VT NANOSHEET DEVICESNovember 2021January 2025Allow3800NoNo
17452644METHOD FOR MANUFACTURING SEMICONDUCTOR STRUCTURE, SEMICONDUCTOR STRUCTURE, AND MEMORYOctober 2021October 2024Allow3511NoNo
17511382PHOTOELECTRIC CONVERSION APPARATUS, PHOTOELECTRIC CONVERSION SYSTEM, AND MOVING BODYOctober 2021October 2024Allow3510NoNo
17504720DEVICES INCLUDING STACKED NANOSHEET TRANSISTORSOctober 2021August 2024Allow3301NoNo
17502122METHOD FOR MEASURING RESISTANCE VALUE OF CONTACT PLUG AND TESTING STRUCTUREOctober 2021March 2025Abandon4110NoNo
17490950Carbon and/or Oxygen Doped Polysilicon ResistorSeptember 2021March 2024Allow2911NoNo

Appeals Overview

This analysis examines appeal outcomes and the strategic value of filing appeals for examiner BODNAR, JOHN A.

Patent Trial and Appeal Board (PTAB) Decisions

Total PTAB Decisions
6
Examiner Affirmed
5
(83.3%)
Examiner Reversed
1
(16.7%)
Reversal Percentile
27.5%
Lower than average

What This Means

With a 16.7% reversal rate, the PTAB affirms the examiner's rejections in the vast majority of cases. This reversal rate is below the USPTO average, indicating that appeals face more challenges here than typical.

Strategic Value of Filing an Appeal

Total Appeal Filings
19
Allowed After Appeal Filing
8
(42.1%)
Not Allowed After Appeal Filing
11
(57.9%)
Filing Benefit Percentile
67.6%
Higher than average

Understanding Appeal Filing Strategy

Filing a Notice of Appeal can sometimes lead to allowance even before the appeal is fully briefed or decided by the PTAB. This occurs when the examiner or their supervisor reconsiders the rejection during the mandatory appeal conference (MPEP § 1207.01) after the appeal is filed.

In this dataset, 42.1% of applications that filed an appeal were subsequently allowed. This appeal filing benefit rate is above the USPTO average, suggesting that filing an appeal can be an effective strategy for prompting reconsideration.

Strategic Recommendations

Appeals to PTAB face challenges. Ensure your case has strong merit before committing to full Board review.

Filing a Notice of Appeal is strategically valuable. The act of filing often prompts favorable reconsideration during the mandatory appeal conference.

Examiner BODNAR, JOHN A - Prosecution Strategy Guide

Executive Summary

Examiner BODNAR, JOHN A works in Art Unit 2893 and has examined 657 patent applications in our dataset. With an allowance rate of 84.8%, this examiner has an above-average tendency to allow applications. Applications typically reach final disposition in approximately 25 months.

Allowance Patterns

Examiner BODNAR, JOHN A's allowance rate of 84.8% places them in the 55% percentile among all USPTO examiners. This examiner has an above-average tendency to allow applications.

Office Action Patterns

On average, applications examined by BODNAR, JOHN A receive 1.87 office actions before reaching final disposition. This places the examiner in the 58% percentile for office actions issued. This examiner issues a slightly above-average number of office actions.

Prosecution Timeline

The median time to disposition (half-life) for applications examined by BODNAR, JOHN A is 25 months. This places the examiner in the 68% percentile for prosecution speed. Prosecution timelines are slightly faster than average with this examiner.

Interview Effectiveness

Conducting an examiner interview provides a +8.1% benefit to allowance rate for applications examined by BODNAR, JOHN A. This interview benefit is in the 40% percentile among all examiners. Recommendation: Interviews provide a below-average benefit with this examiner.

Request for Continued Examination (RCE) Effectiveness

When applicants file an RCE with this examiner, 25.8% of applications are subsequently allowed. This success rate is in the 32% percentile among all examiners. Strategic Insight: RCEs show below-average effectiveness with this examiner. Carefully evaluate whether an RCE or continuation is the better strategy.

After-Final Amendment Practice

This examiner enters after-final amendments leading to allowance in 35.0% of cases where such amendments are filed. This entry rate is in the 44% percentile among all examiners. Strategic Recommendation: This examiner shows below-average receptiveness to after-final amendments. You may need to file an RCE or appeal rather than relying on after-final amendment entry.

Pre-Appeal Conference Effectiveness

When applicants request a pre-appeal conference (PAC) with this examiner, 92.3% result in withdrawal of the rejection or reopening of prosecution. This success rate is in the 66% percentile among all examiners. Strategic Recommendation: Pre-appeal conferences show above-average effectiveness with this examiner. If you have strong arguments, a PAC request may result in favorable reconsideration.

Appeal Withdrawal and Reconsideration

This examiner withdraws rejections or reopens prosecution in 70.0% of appeals filed. This is in the 51% percentile among all examiners. Of these withdrawals, 57.1% occur early in the appeal process (after Notice of Appeal but before Appeal Brief). Strategic Insight: This examiner shows above-average willingness to reconsider rejections during appeals. The mandatory appeal conference (MPEP § 1207.01) provides an opportunity for reconsideration.

Petition Practice

When applicants file petitions regarding this examiner's actions, 45.6% are granted (fully or in part). This grant rate is in the 51% percentile among all examiners. Strategic Note: Petitions show above-average success regarding this examiner's actions. Petitionable matters include restriction requirements (MPEP § 1002.02(c)(2)) and various procedural issues.

Examiner Cooperation and Flexibility

Examiner's Amendments: This examiner makes examiner's amendments in 0.3% of allowed cases (in the 54% percentile). This examiner makes examiner's amendments more often than average to place applications in condition for allowance (MPEP § 1302.04).

Quayle Actions: This examiner issues Ex Parte Quayle actions in 0.7% of allowed cases (in the 53% percentile). This examiner issues Quayle actions more often than average when claims are allowable but formal matters remain (MPEP § 714.14).

Prosecution Strategy Recommendations

Based on the statistical analysis of this examiner's prosecution patterns, here are tailored strategic recommendations:

    Relevant MPEP Sections for Prosecution Strategy

    • MPEP § 713.10: Examiner interviews - available before Notice of Allowance or transfer to PTAB
    • MPEP § 714.12: After-final amendments - may be entered "under justifiable circumstances"
    • MPEP § 1002.02(c): Petitionable matters to Technology Center Director
    • MPEP § 1004: Actions requiring primary examiner signature (allowances, final rejections, examiner's answers)
    • MPEP § 1207.01: Appeal conferences - mandatory for all appeals
    • MPEP § 1214.07: Reopening prosecution after appeal

    Important Disclaimer

    Not Legal Advice: The information provided in this report is for informational purposes only and does not constitute legal advice. You should consult with a qualified patent attorney or agent for advice specific to your situation.

    No Guarantees: We do not provide any guarantees as to the accuracy, completeness, or timeliness of the statistics presented above. Patent prosecution statistics are derived from publicly available USPTO data and are subject to data quality limitations, processing errors, and changes in USPTO practices over time.

    Limitation of Liability: Under no circumstances will IronCrow AI be liable for any outcome, decision, or action resulting from your reliance on the statistics, analysis, or recommendations presented in this report. Past prosecution patterns do not guarantee future results.

    Use at Your Own Risk: While we strive to provide accurate and useful prosecution statistics, you should independently verify any information that is material to your prosecution strategy and use your professional judgment in all patent prosecution matters.