USPTO Examiner KENDALL BENJAMIN R - Art Unit 2896

Recent Applications

Detailed information about the 100 most recent patent applications.

Application NumberTitleFiling DateDisposal DateDispositionTime (months)Office ActionsRestrictionsInterviewAppeal
18806917MULTIPLE-CHAMBER REACTOR FOR SELECTIVE DEPOSITION OF SILICON NITRIDE AND METHOD OF USING SAMEAugust 2024March 2026Allow1901NoNo
18634508APPARATUS FOR PREVENTING CONTAMINATION OF SELF-PLASMA CHAMBERApril 2024February 2025Allow1001YesNo
18413533EXHAUST COMPONENT CLEANING METHOD AND SUBSTRATE PROCESSING APPARATUS INCLUDING EXHAUST COMPONENTJanuary 2024June 2025Abandon1711NoNo
18413728SUBSTRATE PROCESSING APPARATUSJanuary 2024October 2025Abandon2110NoNo
18378251DELAYED PULSING FOR PLASMA PROCESSING OF WAFERSOctober 2023February 2026Allow2800NoNo
18476701WAFER PLACEMENT TABLESeptember 2023February 2026Allow2900YesNo
18469208METHODS OF PROCESSING SUBSTRATES AND APPARATUSES THEREOFSeptember 2023May 2025Abandon2021YesNo
18239371SUBSTRATE CLEANING APPARATUSAugust 2023January 2026Allow2900NoNo
18456765SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHODAugust 2023February 2026Allow3001YesNo
18238522CLEANING METHOD AND PLASMA PROCESSING APPARATUSAugust 2023August 2024Allow1110YesNo
18224070PLASMA PROCESSING APPARATUS AND TEMPERATURE CONTROLLING METHODJuly 2023October 2025Allow2700NoNo
18272994MOLECULAR BEAM EPITAXY THIN FILM GROWTH APPARATUSJuly 2023December 2025Allow2900YesNo
18350251SEMICONDUCTOR WAFER MANUFACTURING APPARATUSJuly 2023February 2026Allow3110YesNo
18349557FOCUS RING AND PLASMA ETCHING DEVICE INCLUDING SAMEJuly 2023October 2025Allow2800NoNo
18210318SUBSTRATE PROCESSING APPARATUS AND TEMPERATURE REGULATION METHODJune 2023February 2025Allow2011NoNo
18206659MICRO-CAPILLARY HIGH VOLTAGE ISOLATOR FOR GAS DELIVERY TO VACUUMJune 2023October 2025Allow2900NoNo
18142066ANTENNA UNIT FOR INDUCTIVELY COUPLED PLASMA, INDUCTIVELY COUPLED PLASMA PROCESSING APPARATUS AND METHOD THEREFORMay 2023March 2025Abandon2231NoNo
18029641FACELESS SHOWERHEADMarch 2023September 2025Allow2921YesNo
18245543COLLECTION ASSEMBLY AND SEMICONDUCTOR PRE-CLEANING CHAMBERMarch 2023June 2025Allow2741YesNo
18022550APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR ALIGNING DIELECTRIC PLATE USING THE SAMEFebruary 2023June 2025Allow2800YesNo
18005216SUBSTRATE PROCESSING APPARATUS, AND WATERPROOFING DEVICE FOR ACOUSTIC SENSORJanuary 2023November 2025Abandon3410NoNo
18013493PROFILE TWISTING CONTROL IN DIELECTRIC ETCHDecember 2022August 2025Allow3201YesNo
18088828TECHNIQUES AND APPARATUS FOR SELECTIVE SHAPING OF MASK FEATURES USING ANGLED BEAMSDecember 2022May 2025Allow2900YesNo
18087187Hermetic Tubular Linear Motor Based Wafer Lift ActuatorDecember 2022May 2025Allow2900YesNo
17987259MULTI-ANTENNA UNIT FOR LARGE AREA INDUCTIVELY COUPLED PLASMA PROCESSING APPARATUSNovember 2022May 2025Allow4000NoNo
17981575CERAMIC COATED QUARTZ LID FOR PROCESSING CHAMBERNovember 2022February 2024Allow1610YesNo
17980527TO AN INDUCTIVELY COUPLED PLASMA SOURCENovember 2022September 2024Allow2310YesNo
17979291PLASMA SOURCE AND PLASMA PROCESSING APPARATUSNovember 2022October 2025Allow3520YesNo
17977440APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR TREATING SUBSTRATEOctober 2022October 2025Allow3500YesNo
17975012PLASMA PROCESSING APPARATUSOctober 2022July 2024Allow2120YesNo
17913935PLASMA-EXCLUSION-ZONE RINGS FOR PROCESSING NOTCHED WAFERSSeptember 2022September 2025Allow3610YesNo
17911992SHOWERHEAD PURGE COLLARSeptember 2022January 2026Abandon4021NoNo
17931230SEMICONDUCTOR MANUFACTURING APPARATUS AND SEMICONDUCTOR DEVICE MANUFACTURING METHODSeptember 2022December 2025Abandon3911NoNo
17904774SEMICONDUCTOR PROCESSING CHAMBER WITH DUAL-LIFT MECHANISM FOR EDGE RING ELEVATION MANAGEMENTAugust 2022May 2025Allow3200YesNo
17904321PLASMA PROCESSING DEVICE AND PLASMA PROCESSING METHODAugust 2022November 2025Allow3911NoNo
17885488SEMICONDUCTOR PROCESSING STATION AND SEMICONDUCTOR PROCESS USING THE SAMEAugust 2022October 2025Allow3800NoNo
17817338PLASMA PROCESSING APPARATUS AND SEMICONDUCTOR DEVICE MANUFACTURING METHODAugust 2022June 2025Allow3400YesNo
17842222SUBSTRATE TREATING APPARATUS AND SUBSTRATE TREATING METHODJune 2022September 2025Allow3921YesNo
17833408THROTTLE VALVE AND FORELINE CLEANING USING A MICROWAVE SOURCEJune 2022September 2025Allow3931YesNo
17744000RECOMBINATION CHANNELS FOR ANGLE CONTROL OF NEUTRAL REACTIVE SPECIESMay 2022March 2025Abandon3421YesNo
17737224PLASMA PROCESSING APPARATUS AND METHOD THEREFORMay 2022November 2024Abandon3110NoNo
17661848Apparatus for Edge Control During Plasma ProcessingMay 2022August 2025Allow4031YesNo
17713232SUBSTRATE PROCESSING APPARATUSApril 2022September 2025Allow4201YesNo
17713666APPARATUS FOR INDIRECT ATMOSPHERIC PRESSURE PLASMA PROCESSINGApril 2022May 2024Allow2520YesNo
17709301CHEMICAL-DOSE SUBSTRATE DEPOSITION MONITORINGMarch 2022October 2025Allow4301NoNo
17704844TEMPERATURE CONTROLLER, SUBSTRATE PROCESSING APPARATUS, AND PRESSURE CONTROL METHODMarch 2022May 2025Allow3711YesNo
17763915TREATING ARRANGEMENT WITH LOADING/UNLOADING GROUP AND EPITAXIAL REACTORMarch 2022September 2025Allow4210YesNo
17763890TREATING ARRANGEMENT WITH TRANSFER CHAMBER AND EPITAXIAL REACTORMarch 2022September 2025Allow4210YesNo
17763933TREATING ARRANGEMENT WITH STORAGE CHAMBER AND EPITAXIAL REACTORMarch 2022September 2025Allow4210YesNo
17701673PLASMA PROCESSING SYSTEM AND METHOD OF MOUNTING ANNULAR MEMBERMarch 2022April 2025Allow3601YesNo
17702105DEPOSITION APPARATUSMarch 2022September 2025Abandon4221YesNo
17697023FILM FORMING APPARATUSMarch 2022March 2025Allow3621YesNo
17696594INTEGRATED SHOWERHEADMarch 2022May 2025Allow3811YesNo
17696496VIBRATING DEPOSITION DEVICEMarch 2022December 2023Allow2100NoNo
17686609GAS TREATMENT APPARATUSMarch 2022September 2025Allow4221YesNo
17682745SUBSTRATE PROCESSING DEVICE, SUBSTRATE PROCESSING METHOD, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICEFebruary 2022May 2025Allow3921YesNo
17552208PLASMA-ENHANCED THIN-FILM-DEPOSITION EQUIPMENTDecember 2021October 2024Abandon3410NoNo
17545130SUPPORT UNIT AND APPARATUS FOR TREATING SUBSTRATEDecember 2021July 2025Allow4321NoNo
17510704PLASMA PROCESSING APPARATUSOctober 2021February 2025Allow3920YesNo
17509200APPARATUS FOR CONTROLLING IMPEDANCE AND SYSTEM FOR TREATING SUBSTRATE WITH THE APPARATUSOctober 2021September 2024Abandon3420YesNo
17495760PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING COILOctober 2021September 2025Allow4721YesNo
17469895ETCHING METHOD AND PLASMA PROCESSING APPARATUSSeptember 2021March 2025Allow4222YesNo
17470294ATOMIC LAYER DEPOSITION PART COATING CHAMBERSeptember 2021April 2024Allow3122YesNo
17468839PLASMA PROCESSING APPARATUSSeptember 2021January 2024Allow2901YesNo
17466285SEMICONDUCTOR MANUFACTURING APPARATUSSeptember 2021April 2025Abandon4321YesNo
17458872SUBSTRATE TREATING APPARATUS AND COVER RING THEREOFAugust 2021April 2025Abandon4360NoNo
17412969Pressure Control System for a Multi-Head Processing Chamber of a Plasma Processing ApparatusAugust 2021March 2025Allow4321NoNo
17395529SUBSTRATE PROCESSING APPARATUS AND GAS SWITCHING METHOD FOR SUBSTRATE PROCESSING APPARATUSAugust 2021August 2024Allow3721NoNo
17392259SUBSTRATE PROCESSING APPARATUSAugust 2021July 2024Abandon3530NoNo
17426965TEXTURED SILICON SEMICONDUCTOR PROCESSING CHAMBER COMPONENTSJuly 2021August 2025Abandon4941YesNo
17357006PLASMA PROCESSING APPARATUSJune 2021October 2024Abandon4040YesNo
17354879VENTED SUSCEPTORJune 2021June 2025Allow4821YesNo
17304406PLASMA PROCESSING APPARATUSJune 2021June 2024Abandon3640YesNo
17352383PLASMA PROCESSING SYSTEM, PLASMA PROCESSING APPARATUS, AND METHOD FOR REPLACING EDGE RINGJune 2021July 2025Allow4941YesNo
17348897COATING BY ALD FOR SUPPRESSING METALLIC WHISKERSJune 2021March 2024Abandon3331NoNo
17349027PLASMA PROCESSING APPARATUSJune 2021March 2024Allow3311NoNo
17337067Plasma Processing Apparatus with Tunable Electrical CharacteristicJune 2021June 2025Allow4902NoNo
17317880MAGNETICALLY COUPLED RF FILTER FOR SUBSTRATE PROCESSING CHAMBERSMay 2021September 2024Allow4011NoNo
17199277WAFER SUPPORT AND EQUIPMENT FOR THIN-FILM DEPOSITION OR PRE-CLEANING USING THE SAMEMarch 2021April 2025Abandon4921NoNo
17173702SUBSTRATE PROCESSING APPARATUSFebruary 2021February 2024Abandon3621YesNo
17153862SYSTEMS AND METHODS FOR STABILIZING REACTION CHAMBER PRESSUREJanuary 2021August 2024Allow4240YesNo
17130770PLASMA PROCESSING APPARATUSDecember 2020May 2024Abandon4121NoNo
17047617FOCUS-RING CONVEYING MEMBER AND PLASMA PROCESSING DEVICE INCLUDING FOCUS-RING CONVEYING MEMBEROctober 2020June 2024Abandon4421YesNo
17063088PLASMA PROCESSING APPARATUSOctober 2020February 2024Abandon4141YesNo
17010561EXHAUST COMPONENT CLEANING METHOD AND SUBSTRATE PROCESSING APPARATUS INCLUDING EXHAUST COMPONENTSeptember 2020April 2025Abandon5561NoNo
17004260PLASMA PROCESSING SYSTEM AND METHOD OF PROCESSING SUBSTRATEAugust 2020February 2024Allow4231YesNo
16987674PLACING TABLE AND SUBSTRATE PROCESSING APPARATUSAugust 2020March 2025Abandon5560YesNo
16956387SYSTEM FOR ELECTRICALLY DECOUPLED, HOMOGENEOUS TEMPERATURE CONTROL OF AN ELECTRODE BY MEANS OF HEAT CONDUCTION TUBES, AND PROCESSING FACILITY COMPRISING SUCH A SYSTEMJune 2020September 2024Allow5141YesNo
16905018SUBSTRATE TREATING APPARATUS AND SUBSTRATE TREATING SYSTEM HAVING THE SAMEJune 2020April 2024Allow4631YesNo
16898259MODULAR MICROWAVE SOURCE WITH MULTIPLE METAL HOUSINGSJune 2020March 2024Allow4511NoNo
16894293PLASMA ELECTRIC FIELD MONITOR, PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHODJune 2020October 2024Abandon5241NoNo
16891626BAFFLE IMPLEMENTATION FOR IMPROVING BOTTOM PURGE GAS FLOW UNIFORMITYJune 2020August 2024Allow5121YesNo
16888557Ring Structures and Systems for Use in a Plasma ChamberMay 2020October 2024Abandon5231YesNo
16863541METAL OXIDE PRECLEAN CHAMBER WITH IMPROVED SELECTIVITY AND FLOW CONDUCTANCEApril 2020May 2024Allow4930YesNo
16855559PRECLEAN CHAMBER UPPER SHIELD WITH SHOWERHEADApril 2020April 2024Allow4831YesNo
16646408APPARATUS FOR PREVENTING CONTAMINATION OF SELF-PLASMA CHAMBERMarch 2020January 2024Allow4631YesNo
16812075CAPACITIVE SENSORS AND CAPACITIVE SENSING LOCATIONS FOR PLASMA CHAMBER CONDITION MONITORINGMarch 2020June 2025Allow6061NoNo
16774409VAPOR DEPOSITION APPARATUSJanuary 2020April 2024Allow5151NoNo
16664117HIGH CONDUCTANCE INNER SHIELD FOR PROCESS CHAMBEROctober 2019May 2024Allow5551YesNo
16664155HIGH CONDUCTANCE LOWER SHIELD FOR PROCESS CHAMBEROctober 2019April 2024Abandon5341YesNo

Appeals Overview

This analysis examines appeal outcomes and the strategic value of filing appeals for examiner KENDALL, BENJAMIN R.

Patent Trial and Appeal Board (PTAB) Decisions

Total PTAB Decisions
4
Examiner Affirmed
1
(25.0%)
Examiner Reversed
3
(75.0%)
Reversal Percentile
89.4%
Higher than average

What This Means

With a 75.0% reversal rate, the PTAB has reversed the examiner's rejections more often than affirming them. This reversal rate is in the top 25% across the USPTO, indicating that appeals are more successful here than in most other areas.

Strategic Value of Filing an Appeal

Total Appeal Filings
4
Allowed After Appeal Filing
3
(75.0%)
Not Allowed After Appeal Filing
1
(25.0%)
Filing Benefit Percentile
94.3%
Higher than average

Understanding Appeal Filing Strategy

Filing a Notice of Appeal can sometimes lead to allowance even before the appeal is fully briefed or decided by the PTAB. This occurs when the examiner or their supervisor reconsiders the rejection during the mandatory appeal conference (MPEP § 1207.01) after the appeal is filed.

In this dataset, 75.0% of applications that filed an appeal were subsequently allowed. This appeal filing benefit rate is in the top 25% across the USPTO, indicating that filing appeals is particularly effective here. The act of filing often prompts favorable reconsideration during the mandatory appeal conference.

Strategic Recommendations

Appeals to PTAB show good success rates. If you have a strong case on the merits, consider fully prosecuting the appeal to a Board decision.

Filing a Notice of Appeal is strategically valuable. The act of filing often prompts favorable reconsideration during the mandatory appeal conference.

Examiner KENDALL, BENJAMIN R - Prosecution Strategy Guide

Executive Summary

Examiner KENDALL, BENJAMIN R works in Art Unit 2896 and has examined 56 patent applications in our dataset. With an allowance rate of 62.5%, this examiner allows applications at a lower rate than most examiners at the USPTO. Applications typically reach final disposition in approximately 46 months.

Allowance Patterns

Examiner KENDALL, BENJAMIN R's allowance rate of 62.5% places them in the 22% percentile among all USPTO examiners. This examiner is less likely to allow applications than most examiners at the USPTO.

Office Action Patterns

On average, applications examined by KENDALL, BENJAMIN R receive 3.30 office actions before reaching final disposition. This places the examiner in the 92% percentile for office actions issued. This examiner issues more office actions than most examiners, which may indicate thorough examination or difficulty in reaching agreement with applicants.

Prosecution Timeline

The median time to disposition (half-life) for applications examined by KENDALL, BENJAMIN R is 46 months. This places the examiner in the 11% percentile for prosecution speed. Applications take longer to reach final disposition with this examiner compared to most others.

Interview Effectiveness

Conducting an examiner interview provides a +10.2% benefit to allowance rate for applications examined by KENDALL, BENJAMIN R. This interview benefit is in the 43% percentile among all examiners. Recommendation: Interviews provide a below-average benefit with this examiner.

Request for Continued Examination (RCE) Effectiveness

When applicants file an RCE with this examiner, 20.0% of applications are subsequently allowed. This success rate is in the 21% percentile among all examiners. Strategic Insight: RCEs show lower effectiveness with this examiner compared to others. Consider whether a continuation application might be more strategic, especially if you need to add new matter or significantly broaden claims.

After-Final Amendment Practice

This examiner enters after-final amendments leading to allowance in 5.4% of cases where such amendments are filed. This entry rate is in the 6% percentile among all examiners. Strategic Recommendation: This examiner rarely enters after-final amendments compared to other examiners. You should generally plan to file an RCE or appeal rather than relying on after-final amendment entry. Per MPEP § 714.12, primary examiners have discretion in entering after-final amendments, and this examiner exercises that discretion conservatively.

Appeal Withdrawal and Reconsideration

This examiner withdraws rejections or reopens prosecution in 42.9% of appeals filed. This is in the 9% percentile among all examiners. Strategic Insight: This examiner rarely withdraws rejections during the appeal process compared to other examiners. If you file an appeal, be prepared to fully prosecute it to a PTAB decision. Per MPEP § 1207, the examiner will prepare an Examiner's Answer maintaining the rejections.

Petition Practice

When applicants file petitions regarding this examiner's actions, 66.7% are granted (fully or in part). This grant rate is in the 73% percentile among all examiners. Strategic Note: Petitions show above-average success regarding this examiner's actions. Petitionable matters include restriction requirements (MPEP § 1002.02(c)(2)) and various procedural issues.

Examiner Cooperation and Flexibility

Examiner's Amendments: This examiner makes examiner's amendments in 0.0% of allowed cases (in the 28% percentile). This examiner makes examiner's amendments less often than average. You may need to make most claim amendments yourself.

Quayle Actions: This examiner issues Ex Parte Quayle actions in 0.0% of allowed cases (in the 34% percentile). This examiner issues Quayle actions less often than average. Allowances may come directly without a separate action for formal matters.

Prosecution Strategy Recommendations

Based on the statistical analysis of this examiner's prosecution patterns, here are tailored strategic recommendations:

  • Prepare for rigorous examination: With a below-average allowance rate, ensure your application has strong written description and enablement support. Consider filing a continuation if you need to add new matter.
  • Expect multiple rounds of prosecution: This examiner issues more office actions than average. Address potential issues proactively in your initial response and consider requesting an interview early in prosecution.
  • Plan for RCE after final rejection: This examiner rarely enters after-final amendments. Budget for an RCE in your prosecution strategy if you receive a final rejection.
  • Plan for extended prosecution: Applications take longer than average with this examiner. Factor this into your continuation strategy and client communications.

Relevant MPEP Sections for Prosecution Strategy

  • MPEP § 713.10: Examiner interviews - available before Notice of Allowance or transfer to PTAB
  • MPEP § 714.12: After-final amendments - may be entered "under justifiable circumstances"
  • MPEP § 1002.02(c): Petitionable matters to Technology Center Director
  • MPEP § 1004: Actions requiring primary examiner signature (allowances, final rejections, examiner's answers)
  • MPEP § 1207.01: Appeal conferences - mandatory for all appeals
  • MPEP § 1214.07: Reopening prosecution after appeal

Important Disclaimer

Not Legal Advice: The information provided in this report is for informational purposes only and does not constitute legal advice. You should consult with a qualified patent attorney or agent for advice specific to your situation.

No Guarantees: We do not provide any guarantees as to the accuracy, completeness, or timeliness of the statistics presented above. Patent prosecution statistics are derived from publicly available USPTO data and are subject to data quality limitations, processing errors, and changes in USPTO practices over time.

Limitation of Liability: Under no circumstances will IronCrow AI be liable for any outcome, decision, or action resulting from your reliance on the statistics, analysis, or recommendations presented in this report. Past prosecution patterns do not guarantee future results.

Use at Your Own Risk: While we strive to provide accurate and useful prosecution statistics, you should independently verify any information that is material to your prosecution strategy and use your professional judgment in all patent prosecution matters.