USPTO Examiner WITHERS GRANT S - Art Unit 2891

Recent Applications

Detailed information about the 100 most recent patent applications.

Application NumberTitleFiling DateDisposal DateDispositionTime (months)Office ActionsRestrictionsInterviewAppeal
19257402GAN-BASED DEVICE BASED ON PATTERNED OHMIC CONTACT AND MANUFACTURING METHOD THEREOFJuly 2025August 2025Allow200NoNo
19241538SEMICONDUCTOR DEVICE WITH VERTICALLY STACKED GAN COMPLEMENTARY FETSJune 2025August 2025Allow200NoNo
19027364HIGH MOBILITY TRANSISTOR WITH ALGAN BUFFER LAYERJanuary 2025April 2025Allow300YesNo
19004515WIDE BANDGAP SEMICONDUCTOR STRUCTURE FOR IRRADIATION CHARACTERISTIC TEST AND PREPARATION METHOD THEREOFDecember 2024March 2025Allow300NoNo
18916467P-GAN HIGH ELECTRON MOBILITY TRANSISTOR (HEMT) WITH MOS2-BASED 2D BARRIEROctober 2024December 2024Allow200NoNo
18895947SEMICONDUCTOR DEVICESeptember 2024November 2024Allow200NoNo
18846163SEMICONDUCTOR DEVICE FOR POWER AMPLIFICATIONSeptember 2024March 2025Allow600NoNo
18786937NVM-ALEFT-ISD-LTSEEJuly 2024June 2025Allow1011NoNo
18754058HETEROGENEOUS INTEGRATION OF RADIO FREQUENCY TRANSISTOR CHIPLETS HAVING INTERCONNECTIONS TO HOST WAFER CIRCUITS FOR OPTIMIZING OPERATING CONDITIONSJune 2024November 2024Allow510YesNo
18743061HIGH ELECTRON MOBILITY TRANSISTOR AND METHOD FOR FABRICATING THE SAMEJune 2024March 2025Allow900NoNo
18732645HIGH ELECTRON MOBILITY TRANSISTOR AND METHOD FOR FABRICATING THE SAMEJune 2024March 2025Allow900YesNo
18647027GAN HEMT TRANSISTOR WITH IMPACT ENERGY RELEASE CAPABILITY FOR USE IN AEROSPACE IRRADIATION ENVIRONMENT AND PREPARATION METHOD THEREOFApril 2024January 2025Allow910NoNo
18638735MONOLITHICALLY INTEGRATED GAN-BASED HALF-BRIDGE CIRCUIT AND HALF-BRIDGE CIRCUITApril 2024June 2024Allow200NoNo
18608890MANUFACTURING METHOD OF SEMICONDUCTOR DEVICEMarch 2024December 2024Allow910NoNo
18413078SEMICONDUCTOR DEVICE HAVING FIN STRUCTUREJanuary 2024October 2024Allow900NoNo
18578607SEMICONDUCTOR DEVICEJanuary 2024July 2024Allow600NoNo
18410823OPTOELECTRONIC DEVICE AND METHOD FOR MANUFACTURING THE SAMEJanuary 2024September 2024Allow900NoNo
18391678NITRIDE SEMICONDUCTOR DEVICEDecember 2023September 2024Allow900NoNo
18568277GAN POWER SEMICONDUCTOR DEVICE INTEGRATED WITH SELF-FEEDBACK GATE CONTROL STRUCTUREDecember 2023May 2024Allow500NoNo
18484469MANUFACTURING METHOD FOR COMPOUND SEMICONDUCTOR DEVICEOctober 2023January 2025Allow1611NoNo
18477372HEMT TRANSISTOR INCLUDING AN IMPROVED GATE REGION AND RELATED MANUFACTURING PROCESSSeptember 2023November 2024Allow1410NoNo
18206620HEMT AND METHOD OF FABRICATING THE SAMEJune 2023May 2024Allow1200YesNo
18321643SEMICONDUCTOR LAYER STRUCTUREMay 2023July 2024Allow1400YesNo
18318423SEMICONDUCTOR DEVICE AND METHOD FOR PRODUCING SAMEMay 2023September 2024Allow1600NoNo
18311249SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOFMay 2023October 2025Allow3001NoNo
18134582SEMICONDUCTOR DEVICEApril 2023September 2024Allow1710NoNo
18248990SEMICONDUCTOR DEVICE AND SEMICONDUCTOR COMPONENT INCLUDING THE SAMEApril 2023July 2025Allow2700NoNo
18105888Layout pattern of semiconductor cell and forming method thereofFebruary 2023August 2025Allow3000NoNo
18099293BYPASSED GATE TRANSISTORS HAVING IMPROVED STABILITYJanuary 2023December 2024Allow2310NoNo
18097005SEMICONDUCTOR DEVICE FOR RF INTEGRATED CIRCUITJanuary 2023August 2024Allow1900NoNo
18093434Selective Laser Annealing MethodJanuary 2023December 2024Allow2311NoNo
18092916HEMT AND METHOD OF FABRICATING THE SAMEJanuary 2023April 2024Allow1600NoNo
18091035LIGHT-EMITTING DEVICEDecember 2022September 2024Allow2100YesNo
18089799Power Device with Current SenseDecember 2022May 2025Allow2800NoNo
18012240GROUP III NITRIDE TRANSISTOR STRUCTURE CAPABLE OF REDUCING LEAKAGE CURRENT AND FABRICATING METHOD THEREOFDecember 2022August 2023Allow810NoNo
18077539DEVICES FOR INTEGRATED FRONT-END CIRCUITSDecember 2022June 2024Allow1821YesNo
18075433HIGH ELECTRON MOBILITY TRANSISTOR AND METHOD FOR FABRICATING THE SAMEDecember 2022April 2024Allow1600NoNo
18075427HIGH ELECTRON MOBILITY TRANSISTOR AND METHOD FOR FABRICATING THE SAMEDecember 2022April 2024Allow1600NoNo
17924642SEMICONDUCTOR DEVICE FOR POWER AMPLIFICATIONNovember 2022August 2024Allow2141YesNo
17977174STAND-BY CIRCUITOctober 2022May 2025Allow3000NoNo
18050181Manufacturing Method of Forming Semiconductor Device and Semiconductor DeviceOctober 2022July 2025Allow3301NoNo
17921781Group III Nitride-Based Transistor DeviceOctober 2022April 2025Allow3000NoNo
17959048HIGH-LINEARITY GaN HEMT RADIO FREQUENCY POWER DEVICE FOR IMPROVING TRANSCONDUCTANCE UNDER LARGE SIGNALOctober 2022July 2025Allow3310NoNo
17916635N-FACE POLAR GAN-BASED DEVICE AND COMPOSITE SUBSTRATE THEREOF, AND METHOD OF MANUFACTURING COMPOSITE SUBSTRATEOctober 2022October 2025Allow3610NoNo
17951203N-POLAR III-NITRIDE DEVICE STRUCTURES WITH A P-TYPE LAYERSeptember 2022February 2023Allow500NoNo
17934389ELECTRICALLY PROGRAMMABLE FUSE OVER CRYSTALLINE SEMICONDUCTOR MATERIALSSeptember 2022June 2025Allow3301NoNo
17906808NITRIDE SEMICONDUCTOR DEVICESeptember 2022June 2025Allow3310YesNo
17930188Leakage Current Reduction in Electrical Isolation Gate StructuresSeptember 2022December 2024Allow2700NoNo
17902383HIGH ELECTRON MOBILITY TRANSISTOR AND METHOD OF MANUFACTURING THE SAMESeptember 2022September 2024Allow2511YesNo
17902649LIGHT SOURCE DEVICESeptember 2022November 2024Allow2720NoNo
17901332SEMICONDUCTOR MEMORY DEVICE AND MANUFACTURING METHOD OF THE SEMICONDUCTOR MEMORY DEVICESeptember 2022September 2024Allow2410NoNo
17881984BARRIER STRUCTURE CONFIGURED TO INCREASE PERFORMANCE OF III-V DEVICESAugust 2022May 2025Allow3430NoNo
17873300NITRIDE SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAMEJuly 2022August 2025Abandon3601NoNo
17806400SEMICONDUCTOR LAYER STRUCTUREJune 2022February 2023Allow810YesNo
17805787NITRIDE SEMICONDUCTOR DEVICEJune 2022July 2025Abandon3821NoNo
17781713SEMICONDUCTOR MODULE AND POWER CONVERSION APPARATUSJune 2022November 2024Allow2900NoNo
17830210SEMICONDUCTOR MODULE CASE AND METHOD FOR PRODUCING SEMICONDUCTOR MODULE CASEJune 2022April 2025Allow3410NoNo
17827809METHOD OF FABRICATING HIGH ELECTRON MOBILITY TRANSISTORMay 2022December 2023Allow1900NoNo
17748487SEMICONDUCTOR DEVICE FOR RF INTEGRATED CIRCUITMay 2022September 2022Allow400NoNo
17743720Group III Nitride-Based Transistor DeviceMay 2022July 2024Allow2720YesNo
17660721CONNECTION ARRANGEMENTS FOR INTEGRATED LATERAL DIFFUSION FIELD EFFECT TRANSISTORS HAVING A BACKSIDE CONTACTApril 2022July 2024Allow2701NoNo
17728389COMPOUND SEMICONDUCTOR DEVICE, AMPLIFIER, AND METHOD FOR MANUFACTURING COMPOUND SEMICONDUCTOR DEVICEApril 2022March 2025Allow3500NoNo
17765765SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICEMarch 2022September 2023Allow1721YesNo
17707564SEMICONDUCTOR DEVICEMarch 2022June 2024Allow2610NoNo
17703779HEMT TRANSISTOR WITH ADJUSTED GATE-SOURCE DISTANCE, AND MANUFACTURING METHOD THEREOFMarch 2022April 2024Allow2510YesNo
17655405MULTILAYER SEMICONDUCTOR STRUCTURE, SEMICONDUCTOR DEVICE, AND METHOD FOR MANUFACTURING MULTILAYER SEMICONDUCTOR STRUCTUREMarch 2022November 2024Allow3231NoNo
17761611DISPLAY DEVICEMarch 2022June 2024Allow2700NoNo
17687164NITRIDE SEMICONDUCTOR DEVICEMarch 2022September 2023Allow1800YesNo
17572050High Voltage Blocking III-V Semiconductor DeviceJanuary 2022October 2023Allow2200NoNo
17646817METHODS AND STRUCTURES FOR CHANGING WAFER BOWJanuary 2022November 2023Allow2311NoNo
17624336GALLIUM NITRIDE POWER DEVICE AND MANUFACTURING METHOD THEREOFDecember 2021July 2022Allow600NoNo
17559786SEMICONDUCTOR MEMORY DEVICE FOR SUPPRESSING VARIATIONS OF IMPURITY CONCENTRATIONSDecember 2021June 2025Allow4230NoNo
17540486NON-VOLATILE MEMORY CELL, NON-VOLATILE MEMORY CELL ARRAY, AND METHOD OF MANUFACTURING THE SAMEDecember 2021November 2023Allow2410NoNo
17456943LATERAL BIPOLAR TRANSISTOR STRUCTURE WITH BASE LAYER OF VARYING HORIZONTAL WIDTH AND METHODS TO FORM SAMENovember 2021November 2023Allow2311NoNo
17595738WAFER, OPTICAL EMISSION DEVICE, METHOD OF PRODUCING A WAFER, AND METHOD OF CHARACTERIZING A SYSTEM FOR PRODUCING A WAFERNovember 2021September 2024Allow3431YesNo
17519319METHOD OF FORMING A GaN SENSOR HAVING A CONTROLLED AND STABLE THRESHOLD VOLTAGE IN THE SENSING AREANovember 2021August 2023Allow2100YesNo
17509220Passivated and Faceted for Fin Field Effect TransistorOctober 2021September 2023Allow2200YesNo
17594636HIGH-THRESHOLD-VOLTAGE NORMALLY-OFF HIGH-ELECTRON-MOBILITY TRANSISTOR AND PREPARATION METHOD THEREFOROctober 2021February 2025Allow3911NoNo
17494639SEMICONDUCTOR DEVICEOctober 2021June 2024Allow3221YesNo
17492032BYPASSED GATE TRANSISTORS HAVING IMPROVED STABILITYOctober 2021July 2025Allow4520YesNo
17487117High Voltage Gallium Nitride Field Effect TransistorSeptember 2021June 2025Abandon4511NoNo
17479934DISPLAY APPARATUS AND METHOD OF MANUFACTURING THE SAMESeptember 2021March 2025Allow4130NoNo
17439695Method for Structuring a Semiconductor Surface and Semiconductor Body Comprising a Semiconductor Surface Having at Least One StructureSeptember 2021June 2024Allow3311YesNo
17474475SEMICONDUCTOR DEVICESeptember 2021January 2025Allow4020NoNo
17468315SEMICONDUCTOR DEVICESeptember 2021April 2025Allow4320YesNo
17458827TYPE III-V SEMICONDUCTOR DEVICE WITH MULTI-LAYER BARRIER REGIONAugust 2021August 2024Allow3500YesNo
17400123SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOFAugust 2021March 2025Abandon4321NoNo
17401301SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOFAugust 2021August 2024Allow3611NoNo
17398546SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAMEAugust 2021March 2025Allow4321YesNo
17370287HIGH ELECTRON MOBILITY TRANSISTORJuly 2021March 2024Allow3210NoNo
17362317FERROELECTRIC STRUCTURE FOR SEMICONDUCTOR DEVICESJune 2021September 2023Allow2700NoNo
17355364Ferroelectric Device and Methods of Fabrication ThereofJune 2021January 2025Allow4331NoNo
17349327FIELD EFFECT TRANSISTOR INCLUDING GRADUALLY VARYING COMPOSITION CHANNELJune 2021September 2023Allow2711YesNo
17330865NANOSCALE LIGHT EMITTING DIODE, AND METHODS OF MAKING SAMEMay 2021March 2023Allow2200YesNo
17236311NARROW BAND FILTER WITH HIGH TRANSMISSIONApril 2021July 2024Allow3901NoNo
17228602OPTOELECTRONIC DEVICE AND METHOD FOR MANUFACTURING THE SAMEApril 2021October 2023Allow3020YesNo
17205192SENSORS FOR SIMULTANEOUS PASSIVE IMAGING AND RANGE FINDINGMarch 2021September 2023Allow3020YesNo
17200916HIGH ELECTRON MOBILITY TRANSISTORMarch 2021April 2024Allow3731YesNo
17185979SEMICONDUCTOR DEVICEFebruary 2021January 2024Allow3431YesNo
17187176Self-Protective Layer Formed on High-K Dielectric LayerFebruary 2021October 2023Allow3220YesNo

Appeals Overview

This analysis examines appeal outcomes and the strategic value of filing appeals for examiner WITHERS, GRANT S.

Patent Trial and Appeal Board (PTAB) Decisions

Total PTAB Decisions
1
Examiner Affirmed
1
(100.0%)
Examiner Reversed
0
(0.0%)
Reversal Percentile
14.2%
Lower than average

What This Means

With a 0.0% reversal rate, the PTAB affirms the examiner's rejections in the vast majority of cases. This reversal rate is in the bottom 25% across the USPTO, indicating that appeals face significant challenges here.

Strategic Value of Filing an Appeal

Total Appeal Filings
4
Allowed After Appeal Filing
2
(50.0%)
Not Allowed After Appeal Filing
2
(50.0%)
Filing Benefit Percentile
81.4%
Higher than average

Understanding Appeal Filing Strategy

Filing a Notice of Appeal can sometimes lead to allowance even before the appeal is fully briefed or decided by the PTAB. This occurs when the examiner or their supervisor reconsiders the rejection during the mandatory appeal conference (MPEP § 1207.01) after the appeal is filed.

In this dataset, 50.0% of applications that filed an appeal were subsequently allowed. This appeal filing benefit rate is in the top 25% across the USPTO, indicating that filing appeals is particularly effective here. The act of filing often prompts favorable reconsideration during the mandatory appeal conference.

Strategic Recommendations

Appeals to PTAB face challenges. Ensure your case has strong merit before committing to full Board review.

Filing a Notice of Appeal is strategically valuable. The act of filing often prompts favorable reconsideration during the mandatory appeal conference.

Examiner WITHERS, GRANT S - Prosecution Strategy Guide

Executive Summary

Examiner WITHERS, GRANT S works in Art Unit 2891 and has examined 553 patent applications in our dataset. With an allowance rate of 90.8%, this examiner has an above-average tendency to allow applications. Applications typically reach final disposition in approximately 19 months.

Allowance Patterns

Examiner WITHERS, GRANT S's allowance rate of 90.8% places them in the 75% percentile among all USPTO examiners. This examiner has an above-average tendency to allow applications.

Office Action Patterns

On average, applications examined by WITHERS, GRANT S receive 1.44 office actions before reaching final disposition. This places the examiner in the 23% percentile for office actions issued. This examiner issues significantly fewer office actions than most examiners.

Prosecution Timeline

The median time to disposition (half-life) for applications examined by WITHERS, GRANT S is 19 months. This places the examiner in the 95% percentile for prosecution speed. Applications move through prosecution relatively quickly with this examiner.

Interview Effectiveness

Conducting an examiner interview provides a +12.0% benefit to allowance rate for applications examined by WITHERS, GRANT S. This interview benefit is in the 47% percentile among all examiners. Recommendation: Interviews provide a below-average benefit with this examiner.

Request for Continued Examination (RCE) Effectiveness

When applicants file an RCE with this examiner, 36.1% of applications are subsequently allowed. This success rate is in the 82% percentile among all examiners. Strategic Insight: RCEs are highly effective with this examiner compared to others. If you receive a final rejection, filing an RCE with substantive amendments or arguments has a strong likelihood of success.

After-Final Amendment Practice

This examiner enters after-final amendments leading to allowance in 28.9% of cases where such amendments are filed. This entry rate is in the 41% percentile among all examiners. Strategic Recommendation: This examiner shows below-average receptiveness to after-final amendments. You may need to file an RCE or appeal rather than relying on after-final amendment entry.

Pre-Appeal Conference Effectiveness

When applicants request a pre-appeal conference (PAC) with this examiner, 0.0% result in withdrawal of the rejection or reopening of prosecution. This success rate is in the 15% percentile among all examiners. Note: Pre-appeal conferences show limited success with this examiner compared to others. While still worth considering, be prepared to proceed with a full appeal brief if the PAC does not result in favorable action.

Appeal Withdrawal and Reconsideration

This examiner withdraws rejections or reopens prosecution in 80.0% of appeals filed. This is in the 73% percentile among all examiners. Strategic Insight: This examiner shows above-average willingness to reconsider rejections during appeals. The mandatory appeal conference (MPEP § 1207.01) provides an opportunity for reconsideration.

Petition Practice

When applicants file petitions regarding this examiner's actions, 41.7% are granted (fully or in part). This grant rate is in the 33% percentile among all examiners. Strategic Note: Petitions show below-average success regarding this examiner's actions. Ensure you have a strong procedural basis before filing.

Examiner Cooperation and Flexibility

Examiner's Amendments: This examiner makes examiner's amendments in 0.7% of allowed cases (in the 64% percentile). This examiner makes examiner's amendments more often than average to place applications in condition for allowance (MPEP § 1302.04).

Quayle Actions: This examiner issues Ex Parte Quayle actions in 1.6% of allowed cases (in the 66% percentile). This examiner issues Quayle actions more often than average when claims are allowable but formal matters remain (MPEP § 714.14).

Prosecution Strategy Recommendations

Based on the statistical analysis of this examiner's prosecution patterns, here are tailored strategic recommendations:

  • RCEs are effective: This examiner has a high allowance rate after RCE compared to others. If you receive a final rejection and have substantive amendments or arguments, an RCE is likely to be successful.

Relevant MPEP Sections for Prosecution Strategy

  • MPEP § 713.10: Examiner interviews - available before Notice of Allowance or transfer to PTAB
  • MPEP § 714.12: After-final amendments - may be entered "under justifiable circumstances"
  • MPEP § 1002.02(c): Petitionable matters to Technology Center Director
  • MPEP § 1004: Actions requiring primary examiner signature (allowances, final rejections, examiner's answers)
  • MPEP § 1207.01: Appeal conferences - mandatory for all appeals
  • MPEP § 1214.07: Reopening prosecution after appeal

Important Disclaimer

Not Legal Advice: The information provided in this report is for informational purposes only and does not constitute legal advice. You should consult with a qualified patent attorney or agent for advice specific to your situation.

No Guarantees: We do not provide any guarantees as to the accuracy, completeness, or timeliness of the statistics presented above. Patent prosecution statistics are derived from publicly available USPTO data and are subject to data quality limitations, processing errors, and changes in USPTO practices over time.

Limitation of Liability: Under no circumstances will IronCrow AI be liable for any outcome, decision, or action resulting from your reliance on the statistics, analysis, or recommendations presented in this report. Past prosecution patterns do not guarantee future results.

Use at Your Own Risk: While we strive to provide accurate and useful prosecution statistics, you should independently verify any information that is material to your prosecution strategy and use your professional judgment in all patent prosecution matters.