Detailed information about the 100 most recent patent applications.
| Application Number | Title | Filing Date | Disposal Date | Disposition | Time (months) | Office Actions | Restrictions | Interview | Appeal |
|---|---|---|---|---|---|---|---|---|---|
| 18893967 | METHOD FOR MANUFACTURING SEMICONDUCTOR STACK STRUCTURE WITH ULTRA THIN DIE | September 2024 | April 2025 | Allow | 6 | 1 | 1 | No | No |
| 18791575 | INHERENT AREA SELECTIVE DEPOSITION OF SILICON-CONTAINING DIELECTRIC ON METAL SUBSTRATE | August 2024 | April 2025 | Allow | 9 | 0 | 0 | No | No |
| 18439018 | PROCESSING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, PROCESSING APPARATUS, AND RECORDING MEDIUM | February 2024 | March 2025 | Allow | 13 | 1 | 0 | No | No |
| 18416243 | Integrated Circuitry, A Memory Array Comprising Strings Of Memory Cells, A Method Used In Forming A Conductive Via, A Method Used In Forming A Memory Array Comprising Strings Of Memory Cells | January 2024 | November 2024 | Allow | 10 | 0 | 0 | No | No |
| 18412645 | MANUFACTURING METHOD FOR SILICON NITRIDE THIN FILM, THIN FILM TRANSISTOR AND DISPLAY PANEL | January 2024 | November 2024 | Allow | 10 | 0 | 0 | No | No |
| 18410333 | METHOD OF FORMING AN ELECTRONIC STRUCTURE USING REFORMING GAS, SYSTEM FOR PERFORMING THE METHOD, AND STRUCTURE FORMED USING THE METHOD | January 2024 | January 2025 | Allow | 12 | 1 | 0 | No | No |
| 18402971 | RF SWITCH DEVICE WITH A SIDEWALL SPACER HAVING A LOW DIELECTRIC CONSTANT | January 2024 | August 2024 | Allow | 8 | 0 | 0 | No | No |
| 18374832 | METHODS FOR DEPOSITING GAP FILLING FLUIDS AND RELATED SYSTEMS AND DEVICES | September 2023 | January 2025 | Allow | 16 | 1 | 0 | No | No |
| 18458486 | METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING APPARATUS, AND RECORDING MEDIUM | August 2023 | April 2025 | Allow | 20 | 1 | 0 | No | No |
| 18357300 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING APPARATUS, AND RECORDING MEDIUM | July 2023 | December 2024 | Allow | 16 | 1 | 0 | No | No |
| 18223543 | HIGH ELECTRON MOBILITY TRANSISTOR AND METHOD FOR FABRICATING THE SAME | July 2023 | June 2024 | Allow | 11 | 1 | 0 | No | No |
| 18349930 | SYSTEMS AND METHODS FOR ANALYZING DEFECTS IN CVD FILMS | July 2023 | January 2025 | Allow | 18 | 1 | 0 | No | No |
| 18342048 | TOPOLOGY SELECTIVE AND SACRIFICIAL SILICON NITRIDE LAYER FOR GENERATING SPACERS FOR A SEMICONDUCTOR DEVICE DRAIN | June 2023 | November 2024 | Allow | 17 | 1 | 0 | No | No |
| 18342296 | METHOD OF USING DUAL FREQUENCY RF POWER IN A PROCESS CHAMBER | June 2023 | July 2024 | Allow | 12 | 0 | 0 | No | No |
| 18195196 | NITROGEN-RICH SILICON NITRIDE FILMS FOR THIN FILM TRANSISTORS | May 2023 | June 2024 | Allow | 13 | 1 | 0 | No | No |
| 18134802 | CHALCOGEN PRECURSORS FOR DEPOSITION OF SILICON NITRIDE | April 2023 | August 2024 | Allow | 16 | 2 | 0 | No | No |
| 18125509 | PEALD Nitride Films | March 2023 | August 2024 | Allow | 17 | 1 | 0 | No | No |
| 18185205 | METHOD OF LINEARIZED FILM OXIDATION GROWTH | March 2023 | November 2024 | Allow | 20 | 1 | 0 | No | No |
| 18119347 | SUBSTRATES FOR OPTICAL AND ELECTRON MICROSCOPY OF 2D MATERIALS | March 2023 | June 2025 | Allow | 27 | 0 | 0 | No | No |
| 18179293 | METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING APPARATUS, AND RECORDING MEDIUM | March 2023 | May 2023 | Allow | 3 | 0 | 0 | No | No |
| 18176692 | METHOD OF DEPOSITING ATOMIC LAYER AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | March 2023 | July 2025 | Allow | 28 | 0 | 0 | No | No |
| 18109365 | ELECTRONIC DEVICE FABRICATION USING AREA-SELECTIVE DEPOSITION | February 2023 | June 2025 | Allow | 28 | 0 | 0 | No | No |
| 18155507 | Cyclic Low Temperature Film Growth Processes | January 2023 | August 2024 | Allow | 19 | 1 | 0 | No | No |
| 18003145 | REDUCING INTRALEVEL CAPACITANCE IN SEMICONDUCTOR DEVICES | December 2022 | May 2025 | Allow | 28 | 0 | 0 | No | No |
| 18003133 | IMPURITY REDUCTION IN SILICON-CONTAINING FILMS | December 2022 | May 2025 | Allow | 28 | 0 | 0 | No | No |
| 18068110 | Slot Contacts and Method Forming Same | December 2022 | February 2024 | Allow | 14 | 0 | 0 | No | No |
| 18074849 | SYSTEMS AND METHODS FOR DEPOSITING LOW-K DIELECTRIC FILMS | December 2022 | August 2024 | Allow | 20 | 1 | 0 | Yes | No |
| 17990867 | METHODS OF FILLING RECESSES ON SUBSTRATE SURFACES AND FORMING VOIDS THEREIN | November 2022 | April 2025 | Allow | 29 | 0 | 0 | No | No |
| 17983131 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING APPARATUS, AND RECORDING MEDIUM | November 2022 | January 2024 | Allow | 14 | 1 | 0 | No | No |
| 18053220 | Integrated Circuit Features with Obtuse Angles and Method of Forming Same | November 2022 | May 2024 | Allow | 18 | 1 | 0 | No | No |
| 17977635 | METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING APPARATUS, AND RECORDING MEDIUM | October 2022 | December 2023 | Allow | 14 | 1 | 0 | No | No |
| 17971265 | METHOD FOR DEPOSITING A GAP-FILL LAYER BY PLASMA-ASSISTED DEPOSITION | October 2022 | December 2023 | Allow | 14 | 1 | 0 | No | No |
| 17968549 | VERTICAL TRANSISTOR AND METHOD OF FORMING THE VERTICAL TRANSISTOR | October 2022 | May 2024 | Allow | 19 | 1 | 0 | Yes | No |
| 17963841 | HIGHLY ETCH SELECTIVE AMORPHOUS CARBON FILM | October 2022 | February 2024 | Allow | 16 | 1 | 0 | No | No |
| 17963059 | HIGHLY ETCH SELECTIVE AMORPHOUS CARBON FILM | October 2022 | June 2024 | Allow | 20 | 2 | 0 | Yes | No |
| 17961224 | CARBON HARD MASKS FOR PATTERNING APPLICATIONS AND METHODS RELATED THERETO | October 2022 | August 2023 | Allow | 10 | 1 | 0 | No | No |
| 17957552 | BACKSIDE WAFER TREATMENTS TO REDUCE DISTORTIONS AND OVERLAY ERRORS DURING WAFER CHUCKING | September 2022 | April 2025 | Allow | 30 | 0 | 0 | No | No |
| 17936607 | SELECTIVE DEPOSITION OF ORGANIC MATERIAL | September 2022 | March 2025 | Allow | 30 | 0 | 0 | No | No |
| 17944583 | METHOD OF FORMING AN ELECTRONIC STRUCTURE USING REFORMING GAS, SYSTEM FOR PERFORMING THE METHOD, AND STRUCTURE FORMED USING THE METHOD | September 2022 | October 2023 | Allow | 13 | 1 | 0 | No | No |
| 17885570 | HIGH-RESISTANCE RESISTOR BASED ON SILICON CARBIDE AND MANUFACTURING METHOD THEREOF | August 2022 | January 2025 | Allow | 30 | 0 | 0 | No | No |
| 17878443 | SOURCE-BODY SELF-ALIGNED METHOD OF A VERTICAL DOUBLE DIFFUSED METAL OXIDE SEMICONDUCTOR FIELD EFFECT TRANSISTOR | August 2022 | January 2025 | Allow | 30 | 0 | 0 | No | No |
| 17796552 | DISPLAY SUBSTRATE, METHOD FOR MANUFACTURING THE DISPLAY SUBSTRATE AND DISPLAY DEVICE | July 2022 | March 2025 | Allow | 32 | 0 | 0 | No | No |
| 17815519 | STRUCTURE FOR FRINGING CAPACITANCE CONTROL | July 2022 | October 2023 | Allow | 15 | 1 | 0 | No | No |
| 17873597 | FORMING FILMS WITH IMPROVED FILM QUALITY | July 2022 | January 2025 | Allow | 30 | 0 | 0 | No | No |
| 17814565 | METAL-ORGANIC PULSED LASER DEPOSITION FOR STOICHIOMETRIC COMPLEX OXIDE THIN FILMS | July 2022 | May 2023 | Allow | 10 | 0 | 0 | No | No |
| 17794723 | DISPLAY DEVICE AND METHOD FOR MANUFACTURING SAME | July 2022 | February 2025 | Allow | 31 | 0 | 0 | No | No |
| 17759072 | UV CURE FOR LOCAL STRESS MODULATION | July 2022 | January 2025 | Allow | 30 | 0 | 0 | No | No |
| 17867010 | Methods For Stabilization Of Self-Assembled Monolayers (SAMs) Using Sequentially Pulsed Initiated Chemical Vapor Deposition (spiCVD) | July 2022 | March 2025 | Allow | 32 | 1 | 0 | No | No |
| 17812721 | METHOD FOR MANUFACTURING SHALLOW TRENCH ISOLATION STRUCTURE, SHALLOW TRENCH ISOLATION STRUCTURE AND SEMICONDUCTOR STRUCTURE | July 2022 | April 2025 | Allow | 34 | 1 | 0 | No | No |
| 17859929 | METHOD FOR SELECTIVE DEPOSITION OF SILICON NITRIDE LAYER AND STRUCTURE INCLUDING SELECTIVELY-DEPOSITED SILICON NITRIDE LAYER | July 2022 | October 2023 | Allow | 15 | 1 | 0 | No | No |
| 17859731 | Integrated Circuit Structure With Non-Gated Well Tap Cell | July 2022 | October 2023 | Allow | 15 | 1 | 0 | No | No |
| 17809747 | METHOD OF PROCESSING WAFER | June 2022 | April 2025 | Allow | 33 | 1 | 0 | Yes | No |
| 17758071 | STATION-TO-STATION CONTROL OF BACKSIDE BOW COMPENSATION DEPOSITION | June 2022 | December 2024 | Allow | 29 | 0 | 0 | No | No |
| 17808352 | FORMING METHOD OF SEMICONDUCTOR STRUCTURE AND SEMICONDUCTOR STRUCTURE | June 2022 | April 2025 | Allow | 34 | 1 | 0 | No | No |
| 17847637 | MICRO LIGHT-EMITTING ELEMENT, MICRO LIGHT-EMITTING ELEMENT ARRAY INCLUDING THE MICRO LIGHT-EMITTING ELEMENT, AND DISPLAY DEVICE INCLUDING THE MICRO LIGHT-EMITTING ELEMENT ARRAY | June 2022 | May 2025 | Allow | 34 | 1 | 0 | Yes | No |
| 17843436 | METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING APPARATUS AND RECORDING MEDIUM | June 2022 | September 2023 | Allow | 15 | 1 | 0 | No | No |
| 17843373 | SEMICONDUCTOR DEVICE AND METHOD FOR FORMING THE SAME | June 2022 | September 2023 | Allow | 15 | 1 | 0 | Yes | No |
| 17840797 | LOW-K FILMS | June 2022 | May 2023 | Allow | 11 | 0 | 0 | No | No |
| 17805715 | MULTIGATE DEVICE STRUCTURE WITH ENGINEERED CLADDING AND METHOD MAKING THE SAME | June 2022 | October 2024 | Allow | 29 | 0 | 0 | No | No |
| 17783071 | SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE | June 2022 | March 2025 | Allow | 33 | 1 | 0 | No | No |
| 17831593 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE WITH WORD LINES | June 2022 | November 2024 | Allow | 29 | 0 | 0 | No | No |
| 17832338 | Multi-Gate Devices And Method Of Forming The Same | June 2022 | June 2025 | Allow | 37 | 1 | 1 | No | No |
| 17748640 | Wafer Bonding Method and Bonded Device Structure | May 2022 | April 2025 | Allow | 34 | 1 | 0 | Yes | No |
| 17730944 | DUAL GATE DIELECTRIC LAYERS GROWN WITH AN INHIBITOR LAYER | April 2022 | November 2023 | Allow | 19 | 1 | 0 | No | No |
| 17660767 | MICROELECTRONIC DEVICES INCLUDING A SELECTIVELY REMOVABLE CAP DIELECTRIC MATERIAL, METHODS OF FORMING THE MICROELECTRONIC DEVICES, AND RELATED SYSTEMS | April 2022 | March 2025 | Allow | 35 | 1 | 1 | No | No |
| 17770744 | CIRCUIT BOARD ASSEMBLY, PHOTOSENSITIVE ASSEMBLY, CAMERA MODULE, AND PREPARATION METHODS FOR CIRCUIT BOARD ASSEMBLY AND PHOTOSENSITIVE ASSEMBLY | April 2022 | February 2025 | Allow | 34 | 1 | 0 | No | No |
| 17725750 | IMAGE SENSOR | April 2022 | August 2024 | Allow | 27 | 0 | 0 | No | No |
| 17726515 | Power Device and Manufacturing Method Thereof | April 2022 | August 2024 | Allow | 28 | 0 | 0 | No | No |
| 17724758 | SEMICONDUCTOR LIGHT EMITTING DEVICE AND SEMICONDUCTOR LIGHT EMITTING DEVICE ARRAY | April 2022 | January 2025 | Allow | 33 | 1 | 0 | Yes | No |
| 17719502 | METHODS AND APPARATUS FOR SELECTIVE ETCH STOP CAPPING AND SELECTIVE VIA OPEN FOR FULLY LANDED VIA ON UNDERLYING METAL | April 2022 | March 2025 | Allow | 35 | 1 | 0 | Yes | No |
| 17715103 | SEMICONDUCTOR PACKAGE AND METHOD OF FABRICATING THE SAME | April 2022 | August 2024 | Allow | 28 | 0 | 0 | No | No |
| 17766770 | METHOD FOR MANUFACTURING MIRROR DEVICE | April 2022 | December 2024 | Allow | 32 | 1 | 0 | No | No |
| 17710517 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICES AND SEMICONDUCTOR DEVICES | March 2022 | February 2025 | Allow | 35 | 1 | 0 | No | No |
| 17710627 | SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME | March 2022 | April 2025 | Allow | 36 | 1 | 1 | No | No |
| 17706888 | RF SWITCH DEVICE WITH A SIDEWALL SPACER HAVING A LOW DIELECTRIC CONSTANT | March 2022 | September 2023 | Allow | 18 | 1 | 0 | Yes | No |
| 17707002 | SEMICONDUCTOR PACKAGE AND METHOD OF MANUFACTURING SAME | March 2022 | July 2024 | Allow | 28 | 0 | 0 | No | No |
| 17707942 | SEMICONDUCTOR DEVICE | March 2022 | August 2023 | Allow | 17 | 1 | 0 | Yes | No |
| 17764425 | ELECTROLUMINESCENT DEVICE, DISPLAY SUBSTRATE, AND DISPLAY APPARATUS | March 2022 | December 2024 | Allow | 32 | 1 | 0 | No | No |
| 17706301 | SILICON CARBIDE SEMICONDUCTOR DEVICE | March 2022 | June 2024 | Allow | 27 | 0 | 0 | No | No |
| 17705158 | METHOD AND SYSTEM FOR FORMING SILICON NITRIDE LAYER USING LOW RADIO FREQUENCY PLASMA PROCESS | March 2022 | June 2025 | Allow | 39 | 1 | 0 | No | No |
| 17763536 | NITRIDE SEMICONDUCTOR DEVICE | March 2022 | December 2024 | Allow | 32 | 1 | 0 | No | No |
| 17693204 | INTEGRATED CIRCUIT WITH NANOSTRUCTURE TRANSISTORS AND BOTTOM DIELECTRIC INSULATORS | March 2022 | February 2025 | Allow | 36 | 1 | 1 | Yes | No |
| 17678212 | SEMICONDUCTOR DEVICE WITH PROGRAMMABLE STRUCTURE AND METHOD FOR FABRICATING THE SAME | February 2022 | September 2024 | Allow | 31 | 1 | 0 | No | No |
| 17672939 | INTEGRATED CIRCUIT DEVICES | February 2022 | May 2023 | Allow | 15 | 0 | 0 | No | No |
| 17635399 | DISPLAY PANEL AND MOBILE TERMINAL | February 2022 | February 2025 | Allow | 36 | 2 | 0 | No | No |
| 17671222 | Selective Deposition of Barrier Layer | February 2022 | November 2023 | Allow | 21 | 2 | 0 | No | No |
| 17667700 | DEPOSITION OF SILICON-BASED DIELECTRIC FILMS | February 2022 | April 2025 | Allow | 38 | 1 | 0 | No | No |
| 17584185 | JBS DEVICE WITH IMPROVED ELECTRICAL PERFORMANCES, AND MANUFACTURING PROCESS OF THE JBS DEVICE | January 2022 | September 2024 | Allow | 32 | 1 | 0 | No | No |
| 17572137 | LASER-ASSISTED METHOD FOR PARTING CRYSTALLINE MATERIAL | January 2022 | October 2023 | Allow | 21 | 1 | 1 | No | No |
| 17621643 | METHOD FOR TRANSFERRING LIGHT-EMITTING DIODE AND LIGHT-EMITTING BASE PLATE | December 2021 | August 2024 | Allow | 31 | 1 | 0 | No | No |
| 17643839 | PASSIVATION LAYER AND PREPARATION METHOD THEREOF, FLEXIBLE THIN FILM TRANSISTOR AND PREPARATION METHOD THEREOF, AND ARRAY SUBSTRATE | December 2021 | March 2024 | Allow | 27 | 0 | 0 | No | No |
| 17643416 | PCM CELL WITH NANOHEATER SURROUNDED WITH AIRGAPS | December 2021 | January 2025 | Allow | 37 | 0 | 0 | No | No |
| 17457819 | METHOD FOR MANUFACTURING MEMORY AND MEMORY | December 2021 | June 2024 | Allow | 30 | 0 | 0 | No | No |
| 17542740 | EARLY-IMPACT MOTION LIMITER FOR MEMS DEVICE | December 2021 | February 2024 | Allow | 27 | 0 | 0 | No | No |
| 17616339 | PEROVSKITE INK FORMULATIONS | December 2021 | September 2024 | Allow | 34 | 1 | 0 | No | No |
| 17541790 | SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING THE SAME | December 2021 | May 2024 | Allow | 30 | 0 | 0 | No | No |
| 17457273 | METHOD FOR MANUFACTURING SEMICONDUCTOR STRUCTURE | December 2021 | May 2024 | Allow | 29 | 0 | 0 | No | No |
| 17539260 | DEVICE AND METHOD | December 2021 | December 2024 | Abandon | 37 | 1 | 0 | No | No |
| 17456009 | SEMICONDUCTOR STRUCTURE AND METHOD FOR MANUFACTURING THE SAME | November 2021 | July 2024 | Allow | 32 | 1 | 0 | No | No |
| 17456071 | Method for Manufacturing Semiconductor Structure | November 2021 | April 2024 | Allow | 29 | 0 | 0 | No | No |
This analysis examines appeal outcomes and the strategic value of filing appeals for examiner SARKAR, ASOK K.
With a 14.3% reversal rate, the PTAB affirms the examiner's rejections in the vast majority of cases. This reversal rate is in the bottom 25% across the USPTO, indicating that appeals face significant challenges here.
Filing a Notice of Appeal can sometimes lead to allowance even before the appeal is fully briefed or decided by the PTAB. This occurs when the examiner or their supervisor reconsiders the rejection during the mandatory appeal conference (MPEP § 1207.01) after the appeal is filed.
In this dataset, 26.9% of applications that filed an appeal were subsequently allowed. This appeal filing benefit rate is below the USPTO average, suggesting that filing an appeal has limited effectiveness in prompting favorable reconsideration.
⚠ Appeals to PTAB face challenges. Ensure your case has strong merit before committing to full Board review.
⚠ Filing a Notice of Appeal shows limited benefit. Consider other strategies like interviews or amendments before appealing.
Examiner SARKAR, ASOK K works in Art Unit 2891 and has examined 1,643 patent applications in our dataset. With an allowance rate of 91.4%, this examiner has an above-average tendency to allow applications. Applications typically reach final disposition in approximately 18 months.
Examiner SARKAR, ASOK K's allowance rate of 91.4% places them in the 75% percentile among all USPTO examiners. This examiner has an above-average tendency to allow applications.
On average, applications examined by SARKAR, ASOK K receive 1.02 office actions before reaching final disposition. This places the examiner in the 13% percentile for office actions issued. This examiner issues significantly fewer office actions than most examiners.
The median time to disposition (half-life) for applications examined by SARKAR, ASOK K is 18 months. This places the examiner in the 95% percentile for prosecution speed. Applications move through prosecution relatively quickly with this examiner.
Conducting an examiner interview provides a +0.4% benefit to allowance rate for applications examined by SARKAR, ASOK K. This interview benefit is in the 13% percentile among all examiners. Note: Interviews show limited statistical benefit with this examiner compared to others, though they may still be valuable for clarifying issues.
When applicants file an RCE with this examiner, 39.6% of applications are subsequently allowed. This success rate is in the 89% percentile among all examiners. Strategic Insight: RCEs are highly effective with this examiner compared to others. If you receive a final rejection, filing an RCE with substantive amendments or arguments has a strong likelihood of success.
This examiner enters after-final amendments leading to allowance in 39.6% of cases where such amendments are filed. This entry rate is in the 53% percentile among all examiners. Strategic Recommendation: This examiner shows above-average receptiveness to after-final amendments. If your amendments clearly overcome the rejections and do not raise new issues, consider filing after-final amendments before resorting to an RCE.
When applicants request a pre-appeal conference (PAC) with this examiner, 166.7% result in withdrawal of the rejection or reopening of prosecution. This success rate is in the 91% percentile among all examiners. Strategic Recommendation: Pre-appeal conferences are highly effective with this examiner compared to others. Before filing a full appeal brief, strongly consider requesting a PAC. The PAC provides an opportunity for the examiner and supervisory personnel to reconsider the rejection before the case proceeds to the PTAB.
This examiner withdraws rejections or reopens prosecution in 74.1% of appeals filed. This is in the 58% percentile among all examiners. Of these withdrawals, 60.0% occur early in the appeal process (after Notice of Appeal but before Appeal Brief). Strategic Insight: This examiner shows above-average willingness to reconsider rejections during appeals. The mandatory appeal conference (MPEP § 1207.01) provides an opportunity for reconsideration.
When applicants file petitions regarding this examiner's actions, 46.8% are granted (fully or in part). This grant rate is in the 54% percentile among all examiners. Strategic Note: Petitions show above-average success regarding this examiner's actions. Petitionable matters include restriction requirements (MPEP § 1002.02(c)(2)) and various procedural issues.
Examiner's Amendments: This examiner makes examiner's amendments in 7.1% of allowed cases (in the 93% percentile). Per MPEP § 1302.04, examiner's amendments are used to place applications in condition for allowance when only minor changes are needed. This examiner frequently uses this tool compared to other examiners, indicating a cooperative approach to getting applications allowed. Strategic Insight: If you are close to allowance but minor claim amendments are needed, this examiner may be willing to make an examiner's amendment rather than requiring another round of prosecution.
Quayle Actions: This examiner issues Ex Parte Quayle actions in 0.7% of allowed cases (in the 52% percentile). This examiner issues Quayle actions more often than average when claims are allowable but formal matters remain (MPEP § 714.14).
Based on the statistical analysis of this examiner's prosecution patterns, here are tailored strategic recommendations:
Not Legal Advice: The information provided in this report is for informational purposes only and does not constitute legal advice. You should consult with a qualified patent attorney or agent for advice specific to your situation.
No Guarantees: We do not provide any guarantees as to the accuracy, completeness, or timeliness of the statistics presented above. Patent prosecution statistics are derived from publicly available USPTO data and are subject to data quality limitations, processing errors, and changes in USPTO practices over time.
Limitation of Liability: Under no circumstances will IronCrow AI be liable for any outcome, decision, or action resulting from your reliance on the statistics, analysis, or recommendations presented in this report. Past prosecution patterns do not guarantee future results.
Use at Your Own Risk: While we strive to provide accurate and useful prosecution statistics, you should independently verify any information that is material to your prosecution strategy and use your professional judgment in all patent prosecution matters.