USPTO Examiner VAN LUAN V - Art Unit 1795

Recent Applications

Detailed information about the 100 most recent patent applications.

Application NumberTitleFiling DateDisposal DateDispositionTime (months)Office ActionsRestrictionsInterviewAppeal
17108572AIR PURIFICATION MODULE AND AIR PURIFIER FORMED THEREOFDecember 2020May 2023Abandon3010NoNo
17096193GERMICIDAL DUCT ASSEMBLYNovember 2020June 2023Abandon3110NoNo
16963445OZONE GENERATORJuly 2020October 2022Abandon2720YesNo
16610237OZONE GENERATORNovember 2019September 2021Abandon2210NoNo
16422371LIQUID TREATMENT APPARATUSMay 2019November 2021Abandon3011NoNo
16375448System and Method for Enhanced Chemical Reaction, Dissociation, and Separation by Electrostatic/Microwave and/or Radio Frequency Controlled Resonant Electron InteractionApril 2019October 2021Abandon3001NoNo
16294670FORMATION OF LAYERS OF AMPHIPHILIC MOLECULESMarch 2019February 2021Abandon2420NoNo
16200434TAGGED MULTI-NUCLEOTIDES USEFUL FOR NUCLEIC ACID SEQUENCINGNovember 2018July 2019Abandon800NoNo
16161828HAND DRYER WITH UV DISINFECTION DEVICEOctober 2018April 2021Allow3020YesNo
16132620CAPACITATIVE ELECTROKINETIC DEWATERING OF SUSPENSIONSSeptember 2018March 2021Abandon3001NoNo
16084733MGO-PARTIALLY STABILIZED ZIRCONIA SOLID ELECTROLYTE DOPED WITH MN OR COSeptember 2018August 2023Abandon6060NoNo
16079195Gas Sensor Electrode and Method for Producing SameAugust 2018November 2020Abandon2710NoNo
16079029COAL GASIFICATIONAugust 2018August 2021Abandon3621NoNo
16016377NON-FARADAIC, CAPACITIVELY COUPLED MEASUREMENT IN A NANOPORE CELL ARRAYJune 2018November 2018Abandon400NoNo
15778864METAL HOLLOW FIBER ELECTRODEMay 2018January 2021Abandon3201NoNo
15770046ELECTROCHEMICAL EXFOLIATION OF 2D MATERIALSApril 2018November 2021Abandon4311NoNo
15916550SYSTEMS, DEVICES, AND METHODS FOR MEASURING WHOLE BLOOD HEMATOCRIT BASED ON INITIAL FILL VELOCITYMarch 2018January 2021Abandon3420YesNo
15749124Detection of Pesticide Residues in AgricultureJanuary 2018October 2020Abandon3210YesNo
15881838ACCURATE ANALYTE MEASUREMENTS FOR ELECTROCHEMICAL TEST STRIP BASED ON SENSED PHYSICAL CHARACTERISTIC(S) OF THE SAMPLE CONTAINING THE ANALYTE AND DERIVED BIOSENSOR PARAMETERSJanuary 2018December 2020Abandon3411NoNo
15881463EXTRACTION AND RECOVERY OF LITHIUM FROM BRINEJanuary 2018January 2021Abandon3601NoNo
15879329INSTRUMENT AND CARTRIDGE FOR PERFORMING ASSAYS IN A CLOSED SAMPLE PREPARATION AND REACTION SYSTEM EMPLOYING ELECTROWETTING FLUID MANIPULATIONJanuary 2018January 2021Abandon3620YesNo
15783388CAPILLARY ELECTROPHORESIS-ELECTROSPRAY IONIZATION-MASS SPECTROMETRY SYSTEMOctober 2017February 2021Abandon4020NoNo
15628621METHOD OF DISCOVERING FLUORO-CONTAINING COMPOUNDSJune 2017February 2021Abandon4430NoNo
15586246Synthesis of Nanoparticles by Sonofragmentation of Ultra-Thin SubstratesMay 2017March 2022Abandon5821NoYes
15430927TARGETED DELIVERY OF REAGENTS TO SPOTS ON A PLANAR SUPPORT THROUGH PATTERNED TRANSFER SHEETSFebruary 2017February 2021Abandon4840NoNo
15415565ELECTROCHEMICAL SENSOR AND MEASURING METHOD USING THE SAMEJanuary 2017June 2018Abandon1600NoNo
14632731PH MICROSENSOR FOR GLUCOSE AND OTHER ANALYTE SENSOR FAULT DETECTIONFebruary 2015September 2020Abandon6041NoYes
14361538CARBON-BASED MATERIAL, ELECTRODE CATALYST, OXYGEN REDUCTION ELECTRODE CATALYST, GAS DIFFUSION ELECTRODE, AQUEOUS SOLUTION ELECTROLYSIS DEVICE, AND METHOD OF PREPARING CARBON-BASED MATERIALMay 2014December 2018Abandon5451YesYes
14223192SEGMENTED ELECTRODES FOR WATER DESALINATIONMarch 2014July 2021Abandon6060NoYes
13646655GENERATION OF VARIABLE CONCENTRATIONS OF CHLORINE DIOXIDEOctober 2012November 2020Abandon60110NoNo
13405088FLOW-THROUGH ELECTRODE CAPACITIVE DESALINATIONFebruary 2012May 2021Abandon6090NoYes
12573131READILY-DENSIFIED TITANIUM DIBORIDE AND PROCESS FOR MAKING SAMEOctober 2009December 2011Allow2710NoNo
12371397METHOD AND APPARATUS FOR APPLYING A VOLTAGE TO SUBSTRATE DURING PLATINGFebruary 2009March 2010Allow1311NoNo
12281595METHOD FOR ELECTROCHEMICALLY STRUCTURING A CONDUCTIVE OR SEMICONDUCTOR MATERIAL, AND DEVICE FOR IMPLEMENTING ITNovember 2008August 2012Allow4720NoNo
12242792Electrochemical Fabrication Method and Apparatus for Producing Three-Dimensional Structures Having Improved Surface FinishSeptember 2008June 2010Abandon2010NoNo
12242802Electrochemical Fabrication Method and Apparatus for Producing Three-Dimensional Structures Having Improved Surface FinishSeptember 2008August 2010Abandon2310NoNo
12127653PLATING APPARATUSMay 2008December 2009Abandon1910NoNo
12099976Complex Microdevices and Apparatus and Methods for Fabricating Such DevicesApril 2008January 2010Abandon2110NoNo
12061200METHOD FOR FABRICATION OF A CONDUCTIVE BUMP STRUCTURE OF A CIRCUIT BOARDApril 2008December 2009Allow2010NoNo
11920545PROCESS OF MAKING AN OPTICAL LENSNovember 2007July 2012Allow5630YesNo
11932708PLATING METHOD AND APPARATUS FOR CONTROLLING DEPOSITION ON PREDETERMINED PORTIONS OF A WORKPIECEOctober 2007January 2010Allow2721YesYes
11927680Electrochemically Fabricated Hermetically Sealed Microstructures and Methods of and Apparatus for Producing Such StructuresOctober 2007December 2009Abandon2610NoNo
11927361Method for Electrochemical FabricationOctober 2007July 2010Abandon3320NoNo
11927342Method of Electrochemical FabricationOctober 2007February 2010Abandon2720NoNo
11927309Method for Electrochemical FabricationOctober 2007September 2010Abandon3520YesYes
11927327Method for Electrochemical FabricationOctober 2007September 2010Abandon3520NoYes
11927287METHOD FOR ELECTROCHEMICAL FABRICATIONOctober 2007July 2009Allow2110NoNo
11861348PATTERNED MAGNETIC RECORDING MEDIUM AND METHOD OF MANUFACTURING THE SAMESeptember 2007October 2009Abandon2511NoNo
11779362ELECTROPLATING APPARATUSJuly 2007June 2010Allow3500NoNo
11812175METHOD OF PLATING AND METHOD OF MANUFACTURING A MICRO DEVICEJune 2007September 2010Allow3910YesNo
11808744SURFACE TREATMENT APPARATUS FOR SMALL OBJECTJune 2007July 2010Allow3701NoNo
11799358MOLD TOOLING WITH INTEGRATED CONFORMAL THERMAL MANAGEMENT FLUID CHANNELS AND METHODMay 2007January 2010Allow3211NoNo
11788642SELECTIVE PLATING SYSTEMApril 2007August 2010Allow4010NoNo
11788609SYSTEM AND METHOD FOR ELECTROPLATING METAL COMPONENTSApril 2007August 2010Allow4010YesNo
10580740Method for Electroplating and Contact Projection ArrangementApril 2007December 2009Abandon4321NoNo
11734274MANUFACTURING METHOD OF NON-ETCHED CIRCUIT BOARDApril 2007July 2010Allow3910NoNo
11734257CIRCUIT SUBSTRATE AND SURFACE TREATMENT PROCESS THEREOFApril 2007June 2010Abandon3841YesNo
11693018PROCESSING SOLUTION TANKMarch 2007June 2010Allow3901NoNo
11728208Method of manufacturing injection needle and injection needleMarch 2007December 2009Abandon3211NoNo
11685050METHOD OF MANUFACTURING A DIELECTRIC COMPONENT, AND DIELECTRIC COMPONENTS MANUFACTURED BY SUCH A METHODMarch 2007June 2009Allow2731NoNo
11674912ELECTRO-CHEMICAL PROCESSOR WITH WAFER RETAINERFebruary 2007June 2010Allow4010YesNo
11668299Method of and Apparatus for Forming Three-Dimensional Structures Integral With Semiconductor Based CircuitryJanuary 2007September 2010Abandon4310NoNo
11699768APPARATUS AND METHODS FOR ELECTROCHEMICAL PROCESSING OF MICROFEATURE WAFERSJanuary 2007July 2010Allow4210YesNo
11658347METHOD FOR PRODUCING SEPARATOR AND ELECTRODEPOSITION COATING DEVICEJanuary 2007December 2009Allow3500YesNo
11625269METHOD FOR ELECTROPLATING METAL WIREJanuary 2007March 2010Allow3810NoNo
11622749APPARATUS AND METHODS FOR PRODUCING NANOPARTICLES IN A DENSE FLUID MEDIUMJanuary 2007September 2010Allow4400NoNo
11622279Method For Electrochemical FabricationJanuary 2007July 2010Abandon4220YesNo
11621429Methods of and Apparatus for Molding Structures Using Sacrificial Metal PatternsJanuary 2007April 2010Abandon3910NoNo
11620436METHOD FOR PLANARIZATION DURING PLATINGJanuary 2007April 2010Abandon3910NoNo
11646843Multi-cell masks and methods and apparatus for using such masks to form three-dimensional structuresDecember 2006May 2010Abandon4110NoNo
11638137Method of electrolytically depositing materials in a pattern directed by surfactant distributionDecember 2006March 2010Abandon4010NoNo
11636997Wired circuit boardDecember 2006February 2010Abandon3810NoNo
11566200ELECTROPLATING ON ROLL-TO-ROLL FLEXIBLE SOLAR CELL SUBSTRATESDecember 2006May 2010Allow4120YesNo
11566202HIGH-ASPECT RATIO ANODE AND APPARATUS FOR HIGH-SPEED ELECTROPLATING ON A SOLAR CELL SUBSTRATEDecember 2006December 2009Allow3610NoNo
10574552ELECTROCHEMICAL MICROMANUFACTURING SYSTEM AND METHODNovember 2006July 2009Allow4000NoNo
11606629Plating process enhanced by squeegee roller apparatusNovember 2006March 2010Abandon4010NoNo
10567779PRINTED WIRING BOARD AND PRODUCTION METHOD THEREOFNovember 2006April 2010Allow5021YesNo
11599766APPARATUS AND METHOD FOR ELECTROFORMING HIGH ASPECT RATIO MICRO-PARTSNovember 2006July 2009Allow3200NoNo
11544720METHOD FOR FABRICATING A MULTILAYER WIRING BOARD, MULTILAYER WIRING BOARD, AND ELECTRONIC DEVICE USING THE SAMEOctober 2006April 2010Allow4312YesNo
11539477ANOLYTE FOR COPPER PLATINGOctober 2006December 2009Allow3810NoNo
11544899METHODS OF AND APPARATUS FOR ELECTROCHEMICALLY FABRICATING STRUCTURES VIA INTERLACED LAYERS OR VIA SELECTIVE ETCHING AND FILLING OF VOIDSOctober 2006May 2010Allow4420NoNo
11539611PROXIMITY PROCESSING USING CONTROLLED BATCH VOLUME WITH AN INTEGRATED PROXIMTIY HEADOctober 2006April 2010Allow4301YesNo
10554772METHODS AND APPARATUS FOR CATHODE PLATE PRODUCTIONOctober 2006February 2010Allow5110YesNo
11525813Layer forming method, layer forming apparatus, workpiece processing apparatus, interconnect forming method, and substrate interconnect structureSeptember 2006February 2010Abandon4001NoNo
11516065NONCONTACT LOCALIZED ELECTROCHEMICAL DEPOSITION OF METAL THIN FILMSSeptember 2006December 2009Allow3910NoNo
11510048METHODS AND APPARATUS FOR CONTROLLED-ANGLE WAFER POSITIONINGAugust 2006November 2009Allow3810NoNo
11506586MESOSCALE AND MICROSCALE DEVICE FABRICATION METHODS USING SPLIT STRUCTURES AND ALIGNMENT ELEMENTSAugust 2006July 2009Allow3500NoNo
11506316Semiconductor substrate polishing methods and equipmentAugust 2006June 2010Abandon4620NoNo
11502665Method for producing a light guide plate and method for making a core insert for a light guide plateAugust 2006June 2010Abandon4620NoNo
11498681HOT EMBOSSING TOOLING WITH INTEGRATED HEATING/COOLING FLUID CHANNELS AND METHODAugust 2006January 2010Allow4121NoNo
11487122METHOD FOR HORIZONTALLY ELECTROPLATING, ELECTRO DEPOSITION AND ELECTROLESS-PLATING THIN FILM ON SUBSTRATEJuly 2006July 2010Allow4831NoNo
11482813Conductive sheet having conductive layer with improved adhesion and product including the sameJuly 2006July 2008Abandon2431YesNo
11476762PLATING BARREL, BARREL PLATING APPARATUS AND DRAIN EQUIPMENTJune 2006July 2010Allow4930YesNo
11426865CU ECP PLANARIZATION BY INSERTION OF POLYMER TREATMENT STEP BETWEEN GAP FILL AND BULK FILL STEPSJune 2006January 2010Abandon4310NoNo
11420764MICRONEEDLES AND METHODS OF FABRICATINGMay 2006November 2009Allow4211NoNo
11441578MICRO-TURBINES, ROLLER BEARINGS, BUSHINGS, AND DESIGN OF HOLLOW CLOSED STRUCTURES AND FABRICATION METHODS FOR CREATING SUCH STRUCTURESMay 2006September 2009Allow4001NoNo
11419904SELECTIVE PLATING APPARATUS AND SELECTIVE PLATING METHODMay 2006January 2010Allow4420NoNo
11435809Electrochemically fabricated hermetically sealed microstructures and methods of and apparatus for producing such structuresMay 2006December 2009Abandon4310NoNo
11432396ELECTROPLATING JIGMay 2006June 2010Allow4930NoNo
11432929Selective electroplating onto recessed surfacesMay 2006December 2009Abandon4410NoNo

Appeals Overview

This analysis examines appeal outcomes and the strategic value of filing appeals for examiner VAN, LUAN V.

Patent Trial and Appeal Board (PTAB) Decisions

Total PTAB Decisions
13
Examiner Affirmed
9
(69.2%)
Examiner Reversed
4
(30.8%)
Reversal Percentile
48.4%
Lower than average

What This Means

With a 30.8% reversal rate, the PTAB reverses the examiner's rejections in a meaningful percentage of cases. This reversal rate is below the USPTO average, indicating that appeals face more challenges here than typical.

Strategic Value of Filing an Appeal

Total Appeal Filings
28
Allowed After Appeal Filing
6
(21.4%)
Not Allowed After Appeal Filing
22
(78.6%)
Filing Benefit Percentile
29.2%
Lower than average

Understanding Appeal Filing Strategy

Filing a Notice of Appeal can sometimes lead to allowance even before the appeal is fully briefed or decided by the PTAB. This occurs when the examiner or their supervisor reconsiders the rejection during the mandatory appeal conference (MPEP § 1207.01) after the appeal is filed.

In this dataset, 21.4% of applications that filed an appeal were subsequently allowed. This appeal filing benefit rate is below the USPTO average, suggesting that filing an appeal has limited effectiveness in prompting favorable reconsideration.

Strategic Recommendations

Appeals to PTAB face challenges. Ensure your case has strong merit before committing to full Board review.

Filing a Notice of Appeal shows limited benefit. Consider other strategies like interviews or amendments before appealing.

Examiner VAN, LUAN V - Prosecution Strategy Guide

Executive Summary

Examiner VAN, LUAN V works in Art Unit 1795 and has examined 213 patent applications in our dataset. With an allowance rate of 37.1%, this examiner allows applications at a lower rate than most examiners at the USPTO. Applications typically reach final disposition in approximately 45 months.

Allowance Patterns

Examiner VAN, LUAN V's allowance rate of 37.1% places them in the 7% percentile among all USPTO examiners. This examiner is less likely to allow applications than most examiners at the USPTO.

Office Action Patterns

On average, applications examined by VAN, LUAN V receive 2.27 office actions before reaching final disposition. This places the examiner in the 59% percentile for office actions issued. This examiner issues a slightly above-average number of office actions.

Prosecution Timeline

The median time to disposition (half-life) for applications examined by VAN, LUAN V is 45 months. This places the examiner in the 13% percentile for prosecution speed. Applications take longer to reach final disposition with this examiner compared to most others.

Interview Effectiveness

Conducting an examiner interview provides a +34.0% benefit to allowance rate for applications examined by VAN, LUAN V. This interview benefit is in the 81% percentile among all examiners. Recommendation: Interviews are highly effective with this examiner and should be strongly considered as a prosecution strategy. Per MPEP § 713.10, interviews are available at any time before the Notice of Allowance is mailed or jurisdiction transfers to the PTAB.

Request for Continued Examination (RCE) Effectiveness

When applicants file an RCE with this examiner, 10.4% of applications are subsequently allowed. This success rate is in the 6% percentile among all examiners. Strategic Insight: RCEs show lower effectiveness with this examiner compared to others. Consider whether a continuation application might be more strategic, especially if you need to add new matter or significantly broaden claims.

After-Final Amendment Practice

This examiner enters after-final amendments leading to allowance in 17.7% of cases where such amendments are filed. This entry rate is in the 22% percentile among all examiners. Strategic Recommendation: This examiner rarely enters after-final amendments compared to other examiners. You should generally plan to file an RCE or appeal rather than relying on after-final amendment entry. Per MPEP § 714.12, primary examiners have discretion in entering after-final amendments, and this examiner exercises that discretion conservatively.

Pre-Appeal Conference Effectiveness

When applicants request a pre-appeal conference (PAC) with this examiner, 0.0% result in withdrawal of the rejection or reopening of prosecution. This success rate is in the 4% percentile among all examiners. Note: Pre-appeal conferences show limited success with this examiner compared to others. While still worth considering, be prepared to proceed with a full appeal brief if the PAC does not result in favorable action.

Appeal Withdrawal and Reconsideration

This examiner withdraws rejections or reopens prosecution in 40.9% of appeals filed. This is in the 9% percentile among all examiners. Strategic Insight: This examiner rarely withdraws rejections during the appeal process compared to other examiners. If you file an appeal, be prepared to fully prosecute it to a PTAB decision. Per MPEP § 1207, the examiner will prepare an Examiner's Answer maintaining the rejections.

Petition Practice

When applicants file petitions regarding this examiner's actions, 96.2% are granted (fully or in part). This grant rate is in the 89% percentile among all examiners. Strategic Note: Petitions are frequently granted regarding this examiner's actions compared to other examiners. Per MPEP § 1002.02(c), various examiner actions are petitionable to the Technology Center Director, including prematureness of final rejection, refusal to enter amendments, and requirement for information. If you believe an examiner action is improper, consider filing a petition.

Examiner Cooperation and Flexibility

Examiner's Amendments: This examiner makes examiner's amendments in 22.5% of allowed cases (in the 98% percentile). Per MPEP § 1302.04, examiner's amendments are used to place applications in condition for allowance when only minor changes are needed. This examiner frequently uses this tool compared to other examiners, indicating a cooperative approach to getting applications allowed. Strategic Insight: If you are close to allowance but minor claim amendments are needed, this examiner may be willing to make an examiner's amendment rather than requiring another round of prosecution.

Quayle Actions: This examiner issues Ex Parte Quayle actions in 0.0% of allowed cases (in the 9% percentile). This examiner rarely issues Quayle actions compared to other examiners. Allowances typically come directly without a separate action for formal matters.

Prosecution Strategy Recommendations

Based on the statistical analysis of this examiner's prosecution patterns, here are tailored strategic recommendations:

  • Prepare for rigorous examination: With a below-average allowance rate, ensure your application has strong written description and enablement support. Consider filing a continuation if you need to add new matter.
  • Prioritize examiner interviews: Interviews are highly effective with this examiner. Request an interview after the first office action to clarify issues and potentially expedite allowance.
  • Plan for RCE after final rejection: This examiner rarely enters after-final amendments. Budget for an RCE in your prosecution strategy if you receive a final rejection.
  • Plan for extended prosecution: Applications take longer than average with this examiner. Factor this into your continuation strategy and client communications.
  • Examiner cooperation: This examiner frequently makes examiner's amendments to place applications in condition for allowance. If you are close to allowance, the examiner may help finalize the claims.

Relevant MPEP Sections for Prosecution Strategy

  • MPEP § 713.10: Examiner interviews - available before Notice of Allowance or transfer to PTAB
  • MPEP § 714.12: After-final amendments - may be entered "under justifiable circumstances"
  • MPEP § 1002.02(c): Petitionable matters to Technology Center Director
  • MPEP § 1004: Actions requiring primary examiner signature (allowances, final rejections, examiner's answers)
  • MPEP § 1207.01: Appeal conferences - mandatory for all appeals
  • MPEP § 1214.07: Reopening prosecution after appeal

Important Disclaimer

Not Legal Advice: The information provided in this report is for informational purposes only and does not constitute legal advice. You should consult with a qualified patent attorney or agent for advice specific to your situation.

No Guarantees: We do not provide any guarantees as to the accuracy, completeness, or timeliness of the statistics presented above. Patent prosecution statistics are derived from publicly available USPTO data and are subject to data quality limitations, processing errors, and changes in USPTO practices over time.

Limitation of Liability: Under no circumstances will IronCrow AI be liable for any outcome, decision, or action resulting from your reliance on the statistics, analysis, or recommendations presented in this report. Past prosecution patterns do not guarantee future results.

Use at Your Own Risk: While we strive to provide accurate and useful prosecution statistics, you should independently verify any information that is material to your prosecution strategy and use your professional judgment in all patent prosecution matters.