Detailed information about the 100 most recent patent applications.
| Application Number | Title | Filing Date | Disposal Date | Disposition | Time (months) | Office Actions | Restrictions | Interview | Appeal |
|---|---|---|---|---|---|---|---|---|---|
| 18642828 | METHOD OF MANUFACTURING SPINAL CAGE FOR IMPROVING BONE UNION RATE | April 2024 | January 2025 | Allow | 9 | 1 | 0 | No | No |
| 18629457 | SPUTTERING APPARATUS | April 2024 | November 2024 | Allow | 7 | 0 | 0 | No | No |
| 18617573 | PVD SYSTEM AND COLLIMATOR | March 2024 | May 2025 | Allow | 14 | 2 | 0 | No | No |
| 18682253 | A METHOD FOR PATTERNING A SUBSTRATE, A METHOD FOR FORMING A MICROSTRUCTURE ON A SUBSTRATE, AND A METHOD FOR FABRICATING A FLUIDIC DEVICE | February 2024 | March 2025 | Allow | 13 | 1 | 0 | No | No |
| 18535774 | CYLINDRICAL CATHODE AND CHAMBER USING SAME FOR SPUTTERING | December 2023 | February 2025 | Allow | 14 | 1 | 0 | No | No |
| 18384430 | POTASSIUM SODIUM NIOBATE SPUTTERING TARGET AND PRODUCTION METHOD THEREOF | October 2023 | October 2024 | Allow | 12 | 1 | 0 | No | No |
| 18477060 | FILM FORMING APPARATUS AND FILM FORMING METHOD | September 2023 | April 2025 | Allow | 19 | 3 | 0 | No | No |
| 18472556 | DEPOSITION APPARATUS, DEPOSITION TARGET STRUCTURE, AND METHOD | September 2023 | October 2024 | Allow | 13 | 1 | 0 | No | No |
| 18547678 | SPUTTERING TARGET | August 2023 | October 2024 | Allow | 14 | 1 | 0 | No | No |
| 18447543 | SHUTTER DISC FOR A SEMICONDUCTOR PROCESSING TOOL | August 2023 | September 2024 | Allow | 13 | 1 | 0 | Yes | No |
| 18231907 | GAS MIXING METHOD TO ENHANCE PLASMA | August 2023 | December 2024 | Allow | 16 | 2 | 0 | No | No |
| 18350138 | NANOTWINNED NICKEL FILMS WITH HIGH STRENGTH AND DUCTILITY | July 2023 | February 2025 | Allow | 20 | 2 | 1 | Yes | No |
| 18350410 | FILM FORMING APPARATUS | July 2023 | February 2025 | Allow | 19 | 2 | 0 | Yes | No |
| 18349140 | VACUUM DEPOSITION INTO TRENCHES AND VIAS AND ETCH OF TRENCHES AND VIA | July 2023 | October 2024 | Allow | 16 | 2 | 0 | Yes | No |
| 18346967 | VACUUM DEPOSITION INTO TRENCHES AND VIAS | July 2023 | October 2024 | Allow | 16 | 2 | 0 | No | No |
| 18344898 | METHOD OF FORMING TRANSPARENT LAYERS FOR A SOLAR CELL | June 2023 | April 2025 | Allow | 21 | 1 | 1 | Yes | No |
| 18214355 | SCANNED ANGLED ETCHING APPARATUS AND TECHNIQUES PROVIDING SEPARATE CO-LINEAR RADICALS AND IONS | June 2023 | August 2024 | Allow | 14 | 2 | 0 | No | No |
| 18214498 | Magnetron Design for Improved Bottom Coverage and Uniformity | June 2023 | August 2024 | Allow | 14 | 1 | 0 | Yes | No |
| 18339920 | FILM FORMING POSITION MISALIGNMENT CORRECTION METHOD AND FILM FORMING SYSTEM | June 2023 | August 2024 | Allow | 14 | 1 | 0 | No | No |
| 18337430 | PHYSICAL VAPOR DEPOSITION (PVD) WITH TARGET EROSION PROFILE MONITORING | June 2023 | February 2025 | Allow | 20 | 2 | 0 | No | No |
| 18037565 | NEW TRANSPARENT CONDUCTIVE OXIDE THIN FILM AND USE THEREOF | May 2023 | December 2023 | Allow | 7 | 1 | 0 | No | No |
| 18036827 | PLATINUM-BASED SPUTTERING TARGET, AND METHOD FOR PRODUCING THE SAME | May 2023 | February 2025 | Allow | 21 | 1 | 1 | No | No |
| 18195985 | DEVICE FOR REDUCING MISALIGNMENT BETWEEN SPUTTERING TARGET AND SHIELD | May 2023 | May 2024 | Allow | 12 | 0 | 0 | No | No |
| 18250218 | SEMICONDUCTOR PROCESS APPARATUS AND PROCESS CHAMBER | April 2023 | November 2024 | Allow | 19 | 1 | 0 | No | No |
| 18026575 | COATING APPARATUS AND COATING METHOD HAVING DIVIDED PULSES | March 2023 | February 2025 | Allow | 23 | 2 | 0 | No | No |
| 18026437 | Sputtering Target and Method for Producing Sputtering Target | March 2023 | September 2024 | Allow | 18 | 1 | 0 | No | No |
| 18044887 | TARGET AND FILM FORMING APPARATUS | March 2023 | October 2024 | Allow | 19 | 1 | 0 | No | No |
| 18109385 | MICRO-ELECTROMECHANICAL SYSTEM (MEMS) BASED INERTIAL SENSOR AND METHOD OF FABRICATION THEREOF | February 2023 | March 2025 | Abandon | 25 | 2 | 0 | No | No |
| 18108866 | FILM FORMING APPARATUS AND METHOD FOR REDUCING ARCING | February 2023 | September 2023 | Allow | 7 | 1 | 0 | No | No |
| 17918684 | BISMUTH FERRITE FILM MATERIAL, METHOD FOR INTEGRALLY PREPARING BISMUTH FERRITE FILM ON SILICON SUBSTRATE AT LOW TEMPERATURE AND APPLICATION | February 2023 | December 2024 | Allow | 26 | 2 | 0 | No | No |
| 18162274 | SEMICONDUCTOR PROCESSING TOOL AND METHODS OF OPERATION | January 2023 | March 2024 | Allow | 14 | 0 | 0 | No | No |
| 18016969 | SPUTTER DESPOSITION SYSTEM | January 2023 | October 2024 | Allow | 21 | 1 | 1 | No | No |
| 18098993 | MULTICATHODE PVD SYSTEM FOR HIGH ASPECT RATIO BARRIER SEED DEPOSITION | January 2023 | September 2024 | Allow | 20 | 3 | 0 | Yes | No |
| 18097757 | METHOD FOR PREPARING HIGH-ENTROPY ALLOY COMPOSITES REINFORCED BY DIAMOND PARTICLES | January 2023 | July 2023 | Allow | 6 | 1 | 0 | No | No |
| 18094757 | SPUTTER TRAP HAVING A THIN HIGH PURITY COATING LAYER AND METHOD OF MAKING THE SAME | January 2023 | February 2024 | Allow | 13 | 1 | 0 | No | No |
| 17994455 | PREPARATION METHOD FOR PEROVSKITE FILM, AND RELATED PEROVSKITE FILM AND SOLAR CELL | November 2022 | October 2023 | Allow | 11 | 2 | 1 | No | No |
| 18054574 | MAGNET SYSTEM AND SPUTTERING DEVICE | November 2022 | September 2024 | Allow | 22 | 1 | 0 | Yes | No |
| 17922169 | MANUFACTURING APPARATUS AND METHOD FOR MICROWAVE DEVICE | November 2022 | December 2024 | Allow | 26 | 2 | 0 | No | No |
| 17979392 | PISTON CRANK AGITATION MECHANISM FOR PHYSICAL VAPOR DEPOSITION CONFORMAL COATINGS ON POWDER | November 2022 | May 2025 | Allow | 31 | 1 | 1 | No | No |
| 17921088 | SEMICONDUCTOR PROCESSING APPARATUS AND MAGNETRON MECHANISM | October 2022 | December 2024 | Allow | 26 | 2 | 0 | No | No |
| 17913353 | METHOD FOR MONITORING PROCESS CONDITIONS OF, AND METHOD FOR CONTROLLING, A PLASMA PVD PROCESS | September 2022 | August 2024 | Allow | 23 | 1 | 0 | No | No |
| 17932805 | METHODS OF AND APPARATUS FOR MAGNETRON SPUTTERING | September 2022 | August 2023 | Allow | 11 | 1 | 0 | No | No |
| 17905976 | APPARATUS AND PROCESS WITH A DC-PULSED CATHODE ARRAY | September 2022 | July 2024 | Abandon | 23 | 1 | 0 | No | No |
| 17899077 | DEPOSITION EQUIPMENT WITH SHIELDING MECHANISM | August 2022 | March 2024 | Allow | 19 | 1 | 0 | No | No |
| 17890913 | Method for Growing Crystalline Optical Films on Si Substrates which may optionally have an Extremely Small Optical Loss in the Infra-Red Spectrum with Hydrogenation of the Crystalline Optical Films | August 2022 | June 2024 | Allow | 22 | 2 | 0 | No | No |
| 17883965 | Interconnect Structures and Methods and Apparatuses for Forming the Same | August 2022 | April 2025 | Allow | 32 | 3 | 0 | Yes | No |
| 17878227 | METHOD FOR MODIFYING CARBON FIBER AND PRODUCT THEREOF | August 2022 | December 2023 | Abandon | 16 | 2 | 0 | No | No |
| 17814551 | ANALYZING METHOD | July 2022 | April 2025 | Allow | 33 | 1 | 0 | No | No |
| 17871455 | PROCESS KITS AND RELATED METHODS FOR PROCESSING CHAMBERS TO FACILITATE DEPOSITION PROCESS ADJUSTABILITY | July 2022 | July 2025 | Allow | 35 | 1 | 1 | Yes | No |
| 17865144 | ETCH UNIFORMITY IMPROVEMENT FOR SINGLE TURN INTERNAL COIL PVD CHAMBER | July 2022 | June 2024 | Allow | 23 | 1 | 0 | No | No |
| 17855517 | SYSTEM AND METHOD FOR MEASURING MAGNETIC FIELDS IN PVD SYSTEM | June 2022 | April 2025 | Allow | 34 | 1 | 0 | No | No |
| 17781050 | CUV2O6-BASED PHOTOELECTRIC SENSOR AND APPLICATION THEREOF IN DETECTION OF ARGININE | May 2022 | May 2025 | Allow | 35 | 2 | 1 | No | No |
| 17751245 | PVD DEPOSITED TERNARY AND QUATERNARY NITI ALLOYS AND METHODS OF MAKING SAME | May 2022 | April 2024 | Allow | 23 | 1 | 1 | No | No |
| 17749531 | METHOD OF MAKING AN ELECTRODE HAVING MULTI-WALLED CARBON NANOTUBES | May 2022 | December 2024 | Abandon | 31 | 6 | 1 | Yes | No |
| 17776709 | SPUTTER DEPOSITION APPARATUS AND METHOD | May 2022 | June 2025 | Allow | 37 | 2 | 1 | No | No |
| 17739830 | ION BEAM PROCESSING APPARATUS, ELECTRODE ASSEMBLY, AND METHOD OF CLEANING ELECTRODE ASSEMBLY | May 2022 | June 2024 | Allow | 25 | 2 | 0 | No | No |
| 17662107 | SHUTTER DISC FOR A SEMICONDUCTOR PROCESSING TOOL | May 2022 | July 2023 | Allow | 14 | 1 | 0 | No | No |
| 17735307 | SPUTTERING DEVICE | May 2022 | October 2024 | Allow | 29 | 4 | 0 | No | No |
| 17773678 | PHYSICAL VAPOR DEPOSITION CHAMBER AND PHYSICAL VAPOR DEPOSITION APPARATUS | May 2022 | April 2023 | Allow | 11 | 1 | 0 | No | No |
| 17773526 | SPUTTERING TARGET FOR HEAT-ASSISTED MAGNETIC RECORDING MEDIUM | April 2022 | July 2024 | Abandon | 27 | 2 | 0 | No | No |
| 17723005 | ION BEAM DEPOSITION TARGET LIFE ENHANCEMENT | April 2022 | October 2023 | Allow | 18 | 2 | 0 | Yes | No |
| 17659018 | VACUUM PROCESSING APPARATUS | April 2022 | April 2024 | Allow | 24 | 3 | 0 | Yes | No |
| 17717521 | SPUTTERING APPARATUS | April 2022 | December 2023 | Allow | 21 | 2 | 0 | No | No |
| 17701610 | PVD SYSTEM AND COLLIMATOR | March 2022 | December 2023 | Allow | 20 | 2 | 0 | Yes | No |
| 17698566 | INTERFACIAL LAYER FOR OPTICAL FILM PERFORMANCE | March 2022 | June 2024 | Allow | 27 | 3 | 0 | Yes | No |
| 17761084 | A MAGNETRON PLASMA SPUTTERING ARRANGEMENT | March 2022 | August 2024 | Allow | 29 | 2 | 0 | No | No |
| 17690107 | Magnetically Enhanced High Density Plasma-Chemical Vapor Deposition Plasma Source For Depositing Diamond and Diamond-Like Films | March 2022 | June 2023 | Allow | 15 | 1 | 0 | No | No |
| 17684911 | Pulsed DC Power For Deposition Of Film | March 2022 | February 2025 | Allow | 36 | 4 | 0 | No | No |
| 17672248 | System and Method for Uniform Ion Milling | February 2022 | April 2025 | Allow | 38 | 2 | 1 | No | No |
| 17667362 | TARGET STRUCTURE OF PHYSICAL VAPOR DEPOSITION | February 2022 | January 2023 | Allow | 11 | 1 | 0 | No | No |
| 17631188 | FILM FORMING APPARATUS AND FILM FORMING METHOD | January 2022 | July 2024 | Allow | 30 | 1 | 0 | No | No |
| 17578903 | PERIMETER TRENCH FORMATION AND DELINEATION ETCH DELAYERING | January 2022 | April 2024 | Allow | 27 | 1 | 0 | No | No |
| 17597246 | CATHODIC ARC SOURCE | December 2021 | April 2025 | Allow | 39 | 1 | 1 | Yes | No |
| 17564771 | SHIELDING DEVICE AND THIN-FILM-DEPOSITION EQUIPMENT WITH THE SAME | December 2021 | February 2024 | Allow | 26 | 0 | 0 | No | No |
| 17616828 | METHOD FOR COATING A SUBSTRATE WITH TANTALUM NITRIDE | December 2021 | March 2024 | Allow | 28 | 1 | 0 | Yes | No |
| 17596204 | FABRICATION METHOD OF SILICON NANONEEDLE ARRAY WITH ULTRA-HIGH ASPECT RATIO | December 2021 | November 2023 | Abandon | 23 | 3 | 0 | No | No |
| 17614471 | METHOD OF ION-PLASMA APPLICATION OF CORROSION-RESISTANT FILM COATINGS ON ARTICLES MADE FROM ZIRCONIUM ALLOYS | November 2021 | February 2025 | Allow | 39 | 3 | 0 | No | No |
| 17609470 | MOVABLE WORK PIECE CARRIER DEVICE FOR HOLDING WORK PIECES TO BE TREATED | November 2021 | April 2024 | Allow | 29 | 1 | 0 | No | No |
| 17609356 | RUTHENIUM-BASED SPUTTERING TARGET AND METHOD FOR MANUFACTURING SAME | November 2021 | March 2025 | Allow | 40 | 2 | 1 | No | No |
| 17608617 | MASK STRUCTURE AND FCVA APPARATUS | November 2021 | March 2022 | Allow | 5 | 0 | 0 | No | No |
| 17608683 | HIGH EFFICIENCY ROTATABLE SPUTTER TARGET | November 2021 | September 2023 | Allow | 22 | 1 | 0 | No | No |
| 17285558 | PLASMA FILM FORMING APPARATUS AND PLASMA FILM FORMING METHOD | November 2021 | March 2025 | Abandon | 47 | 3 | 0 | No | No |
| 17507262 | THIN-FILM-DEPOSITION EQUIPMENT FOR DETECTING SHIELDING MECHANISM | October 2021 | September 2022 | Allow | 11 | 0 | 0 | No | No |
| 17506105 | POSITION-DETECTABLE SHIELDING DEVICE AND THIN-FILM-DEPOSITION EQUIPMENT WITH THE SAME | October 2021 | October 2022 | Allow | 12 | 1 | 0 | No | No |
| 17502490 | METHOD FOR ADJUSTING CONTACT POSITION OF LIFT PINS, METHOD FOR DETECTING CONTACT POSITION OF LIFT PINS, AND SUBSTRATE PLACEMENT MECHANISM | October 2021 | February 2024 | Allow | 28 | 1 | 0 | No | No |
| 17497535 | DOUBLE-LAYER SHIELDING DEVICE AND THIN-FILM-DEPOSITION EQUIPMENT WITH THE SAME | October 2021 | August 2022 | Allow | 10 | 0 | 0 | No | No |
| 17602352 | SPUTTERING TARGET AND METHOD OF MANUFACTURING THE SAME, AND MEMORY DEVICE MANUFACTURING METHOD | October 2021 | March 2024 | Abandon | 29 | 1 | 0 | No | No |
| 17450209 | SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS | October 2021 | December 2024 | Allow | 38 | 1 | 0 | No | No |
| 17494017 | SHIELDING DEVICE AND THIN-FILM-DEPOSITION EQUIPMENT WITH THE SAME | October 2021 | December 2023 | Allow | 27 | 1 | 0 | No | No |
| 17491762 | REDUCED RIPPLE IN SWITCH MODE POWER SUPPLY WITH SNUBBER | October 2021 | August 2024 | Allow | 35 | 1 | 1 | No | No |
| 17490574 | MAGNETRON SPUTTERING APPARATUS AND MAGNETRON SPUTTERING METHOD | September 2021 | October 2023 | Allow | 24 | 3 | 0 | No | No |
| 17599736 | MAGNET BAR WITH ATTACHED SENSOR | September 2021 | February 2024 | Abandon | 29 | 2 | 0 | No | No |
| 17598473 | Sputtering Target And Method For Manufacturing Sputtering Target | September 2021 | June 2024 | Allow | 33 | 2 | 0 | No | No |
| 17484654 | SHIELDING DEVICE AND THIN-FILM-DEPOSITION EQUIPMENT WITH THE SAME | September 2021 | October 2022 | Allow | 13 | 1 | 0 | No | No |
| 17441705 | SPUTTERING TARGET | September 2021 | March 2024 | Abandon | 30 | 1 | 0 | No | No |
| 17439123 | Niobium Sputtering Target | September 2021 | February 2024 | Allow | 29 | 3 | 0 | No | No |
| 17474831 | PVD CHAMBER SHIELD STRUCTURE INCLUDING IMPROVED COTAING LAYER OR SHIELD | September 2021 | November 2023 | Abandon | 26 | 3 | 0 | No | No |
| 17473038 | SHIELDING DEVICE AND THIN-FILM-DEPOSITION EQUIPMENT WITH THE SAME | September 2021 | February 2024 | Allow | 29 | 4 | 0 | No | No |
| 17447308 | ARGON-HELIUM BASED COATING | September 2021 | February 2025 | Allow | 41 | 3 | 0 | Yes | No |
| 17437646 | IMPROVED CATHODE ARC SOURCE | September 2021 | December 2023 | Allow | 27 | 2 | 0 | No | No |
This analysis examines appeal outcomes and the strategic value of filing appeals for examiner MCDONALD, RODNEY GLENN.
With a 30.4% reversal rate, the PTAB reverses the examiner's rejections in a meaningful percentage of cases. This reversal rate is below the USPTO average, indicating that appeals face more challenges here than typical.
Filing a Notice of Appeal can sometimes lead to allowance even before the appeal is fully briefed or decided by the PTAB. This occurs when the examiner or their supervisor reconsiders the rejection during the mandatory appeal conference (MPEP § 1207.01) after the appeal is filed.
In this dataset, 23.3% of applications that filed an appeal were subsequently allowed. This appeal filing benefit rate is below the USPTO average, suggesting that filing an appeal has limited effectiveness in prompting favorable reconsideration.
⚠ Appeals to PTAB face challenges. Ensure your case has strong merit before committing to full Board review.
⚠ Filing a Notice of Appeal shows limited benefit. Consider other strategies like interviews or amendments before appealing.
Examiner MCDONALD, RODNEY GLENN works in Art Unit 1794 and has examined 524 patent applications in our dataset. With an allowance rate of 75.0%, this examiner has a below-average tendency to allow applications. Applications typically reach final disposition in approximately 29 months.
Examiner MCDONALD, RODNEY GLENN's allowance rate of 75.0% places them in the 32% percentile among all USPTO examiners. This examiner has a below-average tendency to allow applications.
On average, applications examined by MCDONALD, RODNEY GLENN receive 2.25 office actions before reaching final disposition. This places the examiner in the 77% percentile for office actions issued. This examiner issues more office actions than most examiners, which may indicate thorough examination or difficulty in reaching agreement with applicants.
The median time to disposition (half-life) for applications examined by MCDONALD, RODNEY GLENN is 29 months. This places the examiner in the 45% percentile for prosecution speed. Prosecution timelines are slightly slower than average with this examiner.
Conducting an examiner interview provides a +17.9% benefit to allowance rate for applications examined by MCDONALD, RODNEY GLENN. This interview benefit is in the 64% percentile among all examiners. Recommendation: Interviews provide an above-average benefit with this examiner and are worth considering.
When applicants file an RCE with this examiner, 21.7% of applications are subsequently allowed. This success rate is in the 17% percentile among all examiners. Strategic Insight: RCEs show lower effectiveness with this examiner compared to others. Consider whether a continuation application might be more strategic, especially if you need to add new matter or significantly broaden claims.
This examiner enters after-final amendments leading to allowance in 31.6% of cases where such amendments are filed. This entry rate is in the 38% percentile among all examiners. Strategic Recommendation: This examiner shows below-average receptiveness to after-final amendments. You may need to file an RCE or appeal rather than relying on after-final amendment entry.
When applicants request a pre-appeal conference (PAC) with this examiner, 20.0% result in withdrawal of the rejection or reopening of prosecution. This success rate is in the 25% percentile among all examiners. Note: Pre-appeal conferences show limited success with this examiner compared to others. While still worth considering, be prepared to proceed with a full appeal brief if the PAC does not result in favorable action.
This examiner withdraws rejections or reopens prosecution in 48.9% of appeals filed. This is in the 10% percentile among all examiners. Of these withdrawals, 22.7% occur early in the appeal process (after Notice of Appeal but before Appeal Brief). Strategic Insight: This examiner rarely withdraws rejections during the appeal process compared to other examiners. If you file an appeal, be prepared to fully prosecute it to a PTAB decision. Per MPEP § 1207, the examiner will prepare an Examiner's Answer maintaining the rejections.
When applicants file petitions regarding this examiner's actions, 28.6% are granted (fully or in part). This grant rate is in the 20% percentile among all examiners. Strategic Note: Petitions are rarely granted regarding this examiner's actions compared to other examiners. Ensure you have a strong procedural basis before filing a petition, as the Technology Center Director typically upholds this examiner's decisions.
Examiner's Amendments: This examiner makes examiner's amendments in 0.0% of allowed cases (in the 7% percentile). This examiner rarely makes examiner's amendments compared to other examiners. You should expect to make all necessary claim amendments yourself through formal amendment practice.
Quayle Actions: This examiner issues Ex Parte Quayle actions in 2.5% of allowed cases (in the 68% percentile). This examiner issues Quayle actions more often than average when claims are allowable but formal matters remain (MPEP § 714.14).
Based on the statistical analysis of this examiner's prosecution patterns, here are tailored strategic recommendations:
Not Legal Advice: The information provided in this report is for informational purposes only and does not constitute legal advice. You should consult with a qualified patent attorney or agent for advice specific to your situation.
No Guarantees: We do not provide any guarantees as to the accuracy, completeness, or timeliness of the statistics presented above. Patent prosecution statistics are derived from publicly available USPTO data and are subject to data quality limitations, processing errors, and changes in USPTO practices over time.
Limitation of Liability: Under no circumstances will IronCrow AI be liable for any outcome, decision, or action resulting from your reliance on the statistics, analysis, or recommendations presented in this report. Past prosecution patterns do not guarantee future results.
Use at Your Own Risk: While we strive to provide accurate and useful prosecution statistics, you should independently verify any information that is material to your prosecution strategy and use your professional judgment in all patent prosecution matters.