USPTO Examiner MCDONALD RODNEY GLENN - Art Unit 1794

Recent Applications

Detailed information about the 100 most recent patent applications.

Application NumberTitleFiling DateDisposal DateDispositionTime (months)Office ActionsRestrictionsInterviewAppeal
19098014OPTIMIZING CADMIUM (CD) ALLOY SOLAR CELLS WITH SPUTTERED COPPER-DOPPED ZINC TELLURIDE (ZNTE:CU) BACK CONTACTS IN THE PRESENCE OF HYDROGENApril 2025July 2025Allow410YesNo
19009396OPTIMIZING CADMIUM (CD) ALLOY SOLAR CELLS WITH SPUTTERED COPPER-DOPPED ZINC TELLURIDE (ZNTE:CU) BACK CONTACTS IN THE PRESENCE OF HYDROGENJanuary 2025July 2025Allow611YesNo
18971510MULTICATHODE PVD SYSTEM FOR HIGH ASPECT RATIO BARRIER SEED DEPOSITIONDecember 2024November 2025Allow1130YesNo
18938913FILM FORMING APPARATUS AND FILM FORMING METHODNovember 2024October 2025Allow1220NoNo
18931664SYSTEM FOR TARGET ARCING MAPPING AND PLASMA DIAGNOSISOctober 2024May 2025Allow600NoNo
18919831SPUTTER SYSTEM WITH MAGNET MOTION SOURCEOctober 2024September 2025Allow1110YesNo
18890298ION BEAM PROCESSING APPARATUS, ELECTRODE ASSEMBLY, AND METHOD OF CLEANING ELECTRODE ASSEMBLYSeptember 2024October 2025Allow1310NoNo
18887477PVD Deposited Ternary and Quaternary NiTi Alloys and Methods of Making SameSeptember 2024September 2025Allow1220NoNo
18840392PRODUCTION METHOD FOR SINGLE CRYSTAL SEMICONDUCTOR FILM, PRODUCTION METHOD FOR MULTILAYER FILM OF SINGLE CRYSTAL SEMICONDUCTOR FILM, AND SEMICONDUCTOR ELEMENTAugust 2024October 2025Abandon1401NoNo
18792991PULSED VOLTAGE WAVEFORM DELIVERY FOR DEPOSITIONAugust 2024July 2025Allow1110YesNo
18778683WAFER MANUFACTURING APPARATUSJuly 2024July 2025Allow1210YesNo
18769687PHYSICAL VAPOR DEPOSITION APPARATUSJuly 2024July 2025Allow1310NoNo
18748650SEMICONDUCTOR PROCESSING TOOL AND METHODS OF OPERATIONJune 2024December 2025Allow1821YesNo
18654389Methods And Apparatus For Depositing Amorphous Indium Tin Oxide FilmMay 2024July 2025Allow1410NoNo
18642828METHOD OF MANUFACTURING SPINAL CAGE FOR IMPROVING BONE UNION RATEApril 2024January 2025Allow910NoNo
18629457SPUTTERING APPARATUSApril 2024November 2024Allow700NoNo
18617573PVD SYSTEM AND COLLIMATORMarch 2024May 2025Allow1420NoNo
18682253A METHOD FOR PATTERNING A SUBSTRATE, A METHOD FOR FORMING A MICROSTRUCTURE ON A SUBSTRATE, AND A METHOD FOR FABRICATING A FLUIDIC DEVICEFebruary 2024March 2025Allow1310NoNo
18293582SPUTTERING MACHINES, SUBSTRATE HOLDERS, AND SPUTTERING PROCESSES WITH MAGNETIC BIASINGJanuary 2024March 2026Allow2530YesNo
18427078SEMICONDUCTOR PROCESSING TOOL AND METHODS OF OPERATIONJanuary 2024October 2025Allow2120YesNo
18414343LITHIUM SECONDARY BATTERY AND PREPARATION METHOD THEREFORJanuary 2024December 2025Abandon2310NoNo
18406062FILM FORMING APPARATUS AND METHOD FOR REDUCING ARCINGJanuary 2024July 2025Allow1920NoNo
18403941DEPOSITION APPARATUS AND DEPOSITION METHODJanuary 2024August 2025Allow2030NoNo
18535774CYLINDRICAL CATHODE AND CHAMBER USING SAME FOR SPUTTERINGDecember 2023February 2025Allow1410NoNo
18567451CONDUCTIVE SILICON SPUTTERING TARGETSDecember 2023February 2026Abandon2730YesNo
18562259APPARATUS AND METHOD FOR COATING THE INNER SURFACE OF A HOLLOW ARTICLENovember 2023July 2025Allow2000NoNo
18384430POTASSIUM SODIUM NIOBATE SPUTTERING TARGET AND PRODUCTION METHOD THEREOFOctober 2023October 2024Allow1210NoNo
18477060FILM FORMING APPARATUS AND FILM FORMING METHODSeptember 2023April 2025Allow1930NoNo
18472556DEPOSITION APPARATUS, DEPOSITION TARGET STRUCTURE, AND METHODSeptember 2023October 2024Allow1310NoNo
18459189SUBSTRATE PROCESSING APPARATUSAugust 2023January 2026Allow2900NoNo
18547678SPUTTERING TARGETAugust 2023October 2024Allow1410NoNo
18447543SHUTTER DISC FOR A SEMICONDUCTOR PROCESSING TOOLAugust 2023September 2024Allow1310YesNo
18231907GAS MIXING METHOD TO ENHANCE PLASMAAugust 2023December 2024Allow1620NoNo
18364557APPARATUS WITH HEATED FILTER AND OPERATION METHOD OF THE SAMEAugust 2023March 2026Allow3210NoNo
18352831RESIN SURFACE HYDROPHILIZATION METHOD, PLASMA PROCESSING DEVICE, LAMINATE BODY, AND LAMINATE BODY MANUFACTURING METHODRESIN SURFACE HYDROPHILIZATION METHOD, PLASMA PROCESSING DEVICE, LAMINATE BODY, AN LAMINATE BODY MANUFACTURING METHODJuly 2023September 2025Allow2600NoNo
18350307SEMICONDUCTOR WAFER MANUFACTURING APPARATUSJuly 2023February 2026Allow3110YesNo
18350410FILM FORMING APPARATUSJuly 2023February 2025Allow1920YesNo
18350138NANOTWINNED NICKEL FILMS WITH HIGH STRENGTH AND DUCTILITYJuly 2023February 2025Allow2021YesNo
18271635PLASMA PROCESSING METHOD AND PLASMA PROCESSING DEVICEJuly 2023October 2025Allow2800NoNo
18349140VACUUM DEPOSITION INTO TRENCHES AND VIAS AND ETCH OF TRENCHES AND VIAJuly 2023October 2024Allow1620YesNo
18346967VACUUM DEPOSITION INTO TRENCHES AND VIASJuly 2023October 2024Allow1620NoNo
18344898METHOD OF FORMING TRANSPARENT LAYERS FOR A SOLAR CELLJune 2023April 2025Allow2111YesNo
18344865CRYSTAL GROWTH FURNACE SYSTEMJune 2023March 2026Abandon3310NoNo
18214498Magnetron Design for Improved Bottom Coverage and UniformityJune 2023August 2024Allow1410YesNo
18214355SCANNED ANGLED ETCHING APPARATUS AND TECHNIQUES PROVIDING SEPARATE CO-LINEAR RADICALS AND IONSJune 2023August 2024Allow1420NoNo
18339920FILM FORMING POSITION MISALIGNMENT CORRECTION METHOD AND FILM FORMING SYSTEMJune 2023August 2024Allow1410NoNo
18337430PHYSICAL VAPOR DEPOSITION (PVD) WITH TARGET EROSION PROFILE MONITORINGJune 2023February 2025Allow2020NoNo
18257973SUBSTRATE SUPPORTING APPARATUSJune 2023September 2025Allow2700NoNo
18210409SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHODJune 2023February 2026Allow3210NoNo
18332843SUBSTRATE PROCESSING APPARATUSJune 2023January 2026Allow3110NoNo
18331321Interconnect Structures and Methods and Apparatuses for Forming the SameJune 2023October 2025Allow2910NoNo
18201055Method and Apparatus for Deposition of Metal NitridesMay 2023January 2026Allow3140YesNo
18037565NEW TRANSPARENT CONDUCTIVE OXIDE THIN FILM AND USE THEREOFMay 2023December 2023Allow710NoNo
18197051TRAY ASSEMBLIES FOR PRECURSOR DELIVERY SYSTEMS AND RELATED METHODSMay 2023December 2025Allow3110NoNo
18036827PLATINUM-BASED SPUTTERING TARGET, AND METHOD FOR PRODUCING THE SAMEMay 2023February 2025Allow2111NoNo
18195985DEVICE FOR REDUCING MISALIGNMENT BETWEEN SPUTTERING TARGET AND SHIELDMay 2023May 2024Allow1200NoNo
18250218SEMICONDUCTOR PROCESS APPARATUS AND PROCESS CHAMBERApril 2023November 2024Allow1910NoNo
18130879PLASMA PROCESSING APPARATUSApril 2023September 2025Allow3010NoNo
18193382DOPED NICKEL OXIDE TARGET AND PREPARATION METHOD AND APPLICATION THEREOFMarch 2023December 2025Allow3240YesNo
18191377SUBSTRATE HOLDERMarch 2023October 2025Allow3110NoNo
18026575COATING APPARATUS AND COATING METHOD HAVING DIVIDED PULSESMarch 2023February 2025Allow2320NoNo
18026437Sputtering Target and Method for Producing Sputtering TargetMarch 2023September 2024Allow1810NoNo
18044887TARGET AND FILM FORMING APPARATUSMarch 2023October 2024Allow1910NoNo
18171058REACTIVE SPUTTER DEPOSITION OF DIELECTRIC FILMSFebruary 2023October 2025Allow3260YesNo
18109385MICRO-ELECTROMECHANICAL SYSTEM (MEMS) BASED INERTIAL SENSOR AND METHOD OF FABRICATION THEREOFFebruary 2023March 2025Abandon2520NoNo
18108866FILM FORMING APPARATUS AND METHOD FOR REDUCING ARCINGFebruary 2023September 2023Allow710NoNo
18105918PLASMA PROCESSING APPARATUS AND METHOD OF MANUFACTUREFebruary 2023August 2025Allow3010YesNo
17918684BISMUTH FERRITE FILM MATERIAL, METHOD FOR INTEGRALLY PREPARING BISMUTH FERRITE FILM ON SILICON SUBSTRATE AT LOW TEMPERATURE AND APPLICATIONFebruary 2023December 2024Allow2620NoNo
18162274SEMICONDUCTOR PROCESSING TOOL AND METHODS OF OPERATIONJanuary 2023March 2024Allow1400NoNo
18161826ELECTROCHROMIC DEVICES AND METHODSJanuary 2023October 2025Allow3210NoNo
18100048CASTABLE ALUMINUM ALLOYS FOR WAFER HANDLING CHAMBERS IN SEMICONDUCTOR PROCESSING SYSTEMSJanuary 2023November 2025Allow3411NoNo
18098993MULTICATHODE PVD SYSTEM FOR HIGH ASPECT RATIO BARRIER SEED DEPOSITIONJanuary 2023September 2024Allow2030YesNo
18016969SPUTTER DESPOSITION SYSTEMJanuary 2023October 2024Allow2111NoNo
18097757METHOD FOR PREPARING HIGH-ENTROPY ALLOY COMPOSITES REINFORCED BY DIAMOND PARTICLESJanuary 2023July 2023Allow610NoNo
18016407VACUUM COATING APPARATUS FOR UNIFORMLY DISTRIBUTING METAL VAPOR USING UNIFORM MIXING BUFFER STRUCTUREJanuary 2023January 2026Allow3610NoNo
18152986PRESSURE ADJUSTING VALVE AND SEMICONDUCTOR MANUFACTURING APPARATUSJanuary 2023January 2026Allow3610NoNo
18094757SPUTTER TRAP HAVING A THIN HIGH PURITY COATING LAYER AND METHOD OF MAKING THE SAMEJanuary 2023February 2024Allow1310NoNo
18014432SPUTTERING TARGET MATERIAL AND OXIDE SEMICONDUCTORJanuary 2023October 2025Abandon3301NoNo
18146569SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUSDecember 2022March 2026Allow3820YesNo
18145145LIFT PIN ASSEMBLY AND SUBSTRATE TREATING APPARATUSDecember 2022November 2025Allow3510NoNo
18010551COOLING BLOCK AND PLASMA REACTOR HAVING SAMEDecember 2022August 2025Allow3210NoNo
18010322METHOD OF MOUNTING WIRES TO SUBSTRATE SUPPORT CERAMICDecember 2022August 2025Allow3201NoNo
18078841Method of Selective Metal Deposition Using Separated Reactant Activation and Plasma Discharging ZoneDecember 2022November 2025Allow3510NoNo
18074419WAFER SUSCEPTORDecember 2022February 2026Allow3920NoNo
18000440SHOWER PLATE AND FILM DEPOSITION APPARATUSDecember 2022October 2025Allow3410NoNo
17994455PREPARATION METHOD FOR PEROVSKITE FILM, AND RELATED PEROVSKITE FILM AND SOLAR CELLNovember 2022October 2023Allow1121NoNo
17999914HEATING DEVICE AND SEMICONDUCTOR PROCESSING APPARATUSNovember 2022November 2025Allow3510NoNo
17927509AIN Layer, Its Fabrication Process and Epitaxial WaferNovember 2022February 2026Allow3921NoNo
17922169MANUFACTURING APPARATUS AND METHOD FOR MICROWAVE DEVICENovember 2022December 2024Allow2620NoNo
18054574MAGNET SYSTEM AND SPUTTERING DEVICENovember 2022September 2024Allow2210YesNo
17979392PISTON CRANK AGITATION MECHANISM FOR PHYSICAL VAPOR DEPOSITION CONFORMAL COATINGS ON POWDERNovember 2022May 2025Allow3111NoNo
17921088SEMICONDUCTOR PROCESSING APPARATUS AND MAGNETRON MECHANISMOctober 2022December 2024Allow2620NoNo
17913353METHOD FOR MONITORING PROCESS CONDITIONS OF, AND METHOD FOR CONTROLLING, A PLASMA PVD PROCESSSeptember 2022August 2024Allow2310NoNo
17912825RF MAGNETIC FIELD SENSOR FOR HARMONIC MEASUREMENTS AND UNIFORMITY CONTROLSeptember 2022September 2025Allow3611NoNo
17932805METHODS OF AND APPARATUS FOR MAGNETRON SPUTTERINGSeptember 2022August 2023Allow1110NoNo
17905976APPARATUS AND PROCESS WITH A DC-PULSED CATHODE ARRAYSeptember 2022July 2024Abandon2310NoNo
17899077DEPOSITION EQUIPMENT WITH SHIELDING MECHANISMAugust 2022March 2024Allow1910NoNo
17890913Method for Growing Crystalline Optical Films on Si Substrates which may optionally have an Extremely Small Optical Loss in the Infra-Red Spectrum with Hydrogenation of the Crystalline Optical FilmsAugust 2022June 2024Allow2220NoNo
17883965Interconnect Structures and Methods and Apparatuses for Forming the SameAugust 2022April 2025Allow3230YesNo
17878227METHOD FOR MODIFYING CARBON FIBER AND PRODUCT THEREOFAugust 2022December 2023Abandon1620NoNo

Appeals Overview

This analysis examines appeal outcomes and the strategic value of filing appeals for examiner MCDONALD, RODNEY GLENN.

Patent Trial and Appeal Board (PTAB) Decisions

Total PTAB Decisions
25
Examiner Affirmed
17
(68.0%)
Examiner Reversed
8
(32.0%)
Reversal Percentile
48.5%
Lower than average

What This Means

With a 32.0% reversal rate, the PTAB reverses the examiner's rejections in a meaningful percentage of cases. This reversal rate is below the USPTO average, indicating that appeals face more challenges here than typical.

Strategic Value of Filing an Appeal

Total Appeal Filings
45
Allowed After Appeal Filing
11
(24.4%)
Not Allowed After Appeal Filing
34
(75.6%)
Filing Benefit Percentile
33.3%
Lower than average

Understanding Appeal Filing Strategy

Filing a Notice of Appeal can sometimes lead to allowance even before the appeal is fully briefed or decided by the PTAB. This occurs when the examiner or their supervisor reconsiders the rejection during the mandatory appeal conference (MPEP § 1207.01) after the appeal is filed.

In this dataset, 24.4% of applications that filed an appeal were subsequently allowed. This appeal filing benefit rate is below the USPTO average, suggesting that filing an appeal has limited effectiveness in prompting favorable reconsideration.

Strategic Recommendations

Appeals to PTAB face challenges. Ensure your case has strong merit before committing to full Board review.

Filing a Notice of Appeal shows limited benefit. Consider other strategies like interviews or amendments before appealing.

Examiner MCDONALD, RODNEY GLENN - Prosecution Strategy Guide

Executive Summary

Examiner MCDONALD, RODNEY GLENN works in Art Unit 1794 and has examined 464 patent applications in our dataset. With an allowance rate of 72.4%, this examiner has a below-average tendency to allow applications. Applications typically reach final disposition in approximately 32 months.

Allowance Patterns

Examiner MCDONALD, RODNEY GLENN's allowance rate of 72.4% places them in the 36% percentile among all USPTO examiners. This examiner has a below-average tendency to allow applications.

Office Action Patterns

On average, applications examined by MCDONALD, RODNEY GLENN receive 2.35 office actions before reaching final disposition. This places the examiner in the 67% percentile for office actions issued. This examiner issues a slightly above-average number of office actions.

Prosecution Timeline

The median time to disposition (half-life) for applications examined by MCDONALD, RODNEY GLENN is 32 months. This places the examiner in the 50% percentile for prosecution speed. Prosecution timelines are slightly faster than average with this examiner.

Interview Effectiveness

Conducting an examiner interview provides a +20.7% benefit to allowance rate for applications examined by MCDONALD, RODNEY GLENN. This interview benefit is in the 65% percentile among all examiners. Recommendation: Interviews provide an above-average benefit with this examiner and are worth considering.

Request for Continued Examination (RCE) Effectiveness

When applicants file an RCE with this examiner, 20.8% of applications are subsequently allowed. This success rate is in the 23% percentile among all examiners. Strategic Insight: RCEs show lower effectiveness with this examiner compared to others. Consider whether a continuation application might be more strategic, especially if you need to add new matter or significantly broaden claims.

After-Final Amendment Practice

This examiner enters after-final amendments leading to allowance in 29.7% of cases where such amendments are filed. This entry rate is in the 43% percentile among all examiners. Strategic Recommendation: This examiner shows below-average receptiveness to after-final amendments. You may need to file an RCE or appeal rather than relying on after-final amendment entry.

Pre-Appeal Conference Effectiveness

When applicants request a pre-appeal conference (PAC) with this examiner, 19.0% result in withdrawal of the rejection or reopening of prosecution. This success rate is in the 27% percentile among all examiners. Note: Pre-appeal conferences show below-average success with this examiner. Consider whether your arguments are strong enough to warrant a PAC request.

Appeal Withdrawal and Reconsideration

This examiner withdraws rejections or reopens prosecution in 49.0% of appeals filed. This is in the 14% percentile among all examiners. Of these withdrawals, 20.8% occur early in the appeal process (after Notice of Appeal but before Appeal Brief). Strategic Insight: This examiner rarely withdraws rejections during the appeal process compared to other examiners. If you file an appeal, be prepared to fully prosecute it to a PTAB decision. Per MPEP § 1207, the examiner will prepare an Examiner's Answer maintaining the rejections.

Petition Practice

When applicants file petitions regarding this examiner's actions, 35.3% are granted (fully or in part). This grant rate is in the 23% percentile among all examiners. Strategic Note: Petitions are rarely granted regarding this examiner's actions compared to other examiners. Ensure you have a strong procedural basis before filing a petition, as the Technology Center Director typically upholds this examiner's decisions.

Examiner Cooperation and Flexibility

Examiner's Amendments: This examiner makes examiner's amendments in 0.0% of allowed cases (in the 8% percentile). This examiner rarely makes examiner's amendments compared to other examiners. You should expect to make all necessary claim amendments yourself through formal amendment practice.

Quayle Actions: This examiner issues Ex Parte Quayle actions in 3.6% of allowed cases (in the 76% percentile). Per MPEP § 714.14, a Quayle action indicates that all claims are allowable but formal matters remain. This examiner frequently uses Quayle actions compared to other examiners, which is a positive indicator that once substantive issues are resolved, allowance follows quickly.

Prosecution Strategy Recommendations

Based on the statistical analysis of this examiner's prosecution patterns, here are tailored strategic recommendations:

    Relevant MPEP Sections for Prosecution Strategy

    • MPEP § 713.10: Examiner interviews - available before Notice of Allowance or transfer to PTAB
    • MPEP § 714.12: After-final amendments - may be entered "under justifiable circumstances"
    • MPEP § 1002.02(c): Petitionable matters to Technology Center Director
    • MPEP § 1004: Actions requiring primary examiner signature (allowances, final rejections, examiner's answers)
    • MPEP § 1207.01: Appeal conferences - mandatory for all appeals
    • MPEP § 1214.07: Reopening prosecution after appeal

    Important Disclaimer

    Not Legal Advice: The information provided in this report is for informational purposes only and does not constitute legal advice. You should consult with a qualified patent attorney or agent for advice specific to your situation.

    No Guarantees: We do not provide any guarantees as to the accuracy, completeness, or timeliness of the statistics presented above. Patent prosecution statistics are derived from publicly available USPTO data and are subject to data quality limitations, processing errors, and changes in USPTO practices over time.

    Limitation of Liability: Under no circumstances will IronCrow AI be liable for any outcome, decision, or action resulting from your reliance on the statistics, analysis, or recommendations presented in this report. Past prosecution patterns do not guarantee future results.

    Use at Your Own Risk: While we strive to provide accurate and useful prosecution statistics, you should independently verify any information that is material to your prosecution strategy and use your professional judgment in all patent prosecution matters.