USPTO Examiner MCDONALD RODNEY GLENN - Art Unit 1794

Recent Applications

Detailed information about the 100 most recent patent applications.

Application NumberTitleFiling DateDisposal DateDispositionTime (months)Office ActionsRestrictionsInterviewAppeal
18642828METHOD OF MANUFACTURING SPINAL CAGE FOR IMPROVING BONE UNION RATEApril 2024January 2025Allow910NoNo
18629457SPUTTERING APPARATUSApril 2024November 2024Allow700NoNo
18617573PVD SYSTEM AND COLLIMATORMarch 2024May 2025Allow1420NoNo
18682253A METHOD FOR PATTERNING A SUBSTRATE, A METHOD FOR FORMING A MICROSTRUCTURE ON A SUBSTRATE, AND A METHOD FOR FABRICATING A FLUIDIC DEVICEFebruary 2024March 2025Allow1310NoNo
18535774CYLINDRICAL CATHODE AND CHAMBER USING SAME FOR SPUTTERINGDecember 2023February 2025Allow1410NoNo
18384430POTASSIUM SODIUM NIOBATE SPUTTERING TARGET AND PRODUCTION METHOD THEREOFOctober 2023October 2024Allow1210NoNo
18477060FILM FORMING APPARATUS AND FILM FORMING METHODSeptember 2023April 2025Allow1930NoNo
18472556DEPOSITION APPARATUS, DEPOSITION TARGET STRUCTURE, AND METHODSeptember 2023October 2024Allow1310NoNo
18547678SPUTTERING TARGETAugust 2023October 2024Allow1410NoNo
18447543SHUTTER DISC FOR A SEMICONDUCTOR PROCESSING TOOLAugust 2023September 2024Allow1310YesNo
18231907GAS MIXING METHOD TO ENHANCE PLASMAAugust 2023December 2024Allow1620NoNo
18350138NANOTWINNED NICKEL FILMS WITH HIGH STRENGTH AND DUCTILITYJuly 2023February 2025Allow2021YesNo
18350410FILM FORMING APPARATUSJuly 2023February 2025Allow1920YesNo
18349140VACUUM DEPOSITION INTO TRENCHES AND VIAS AND ETCH OF TRENCHES AND VIAJuly 2023October 2024Allow1620YesNo
18346967VACUUM DEPOSITION INTO TRENCHES AND VIASJuly 2023October 2024Allow1620NoNo
18344898METHOD OF FORMING TRANSPARENT LAYERS FOR A SOLAR CELLJune 2023April 2025Allow2111YesNo
18214355SCANNED ANGLED ETCHING APPARATUS AND TECHNIQUES PROVIDING SEPARATE CO-LINEAR RADICALS AND IONSJune 2023August 2024Allow1420NoNo
18214498Magnetron Design for Improved Bottom Coverage and UniformityJune 2023August 2024Allow1410YesNo
18339920FILM FORMING POSITION MISALIGNMENT CORRECTION METHOD AND FILM FORMING SYSTEMJune 2023August 2024Allow1410NoNo
18337430PHYSICAL VAPOR DEPOSITION (PVD) WITH TARGET EROSION PROFILE MONITORINGJune 2023February 2025Allow2020NoNo
18037565NEW TRANSPARENT CONDUCTIVE OXIDE THIN FILM AND USE THEREOFMay 2023December 2023Allow710NoNo
18036827PLATINUM-BASED SPUTTERING TARGET, AND METHOD FOR PRODUCING THE SAMEMay 2023February 2025Allow2111NoNo
18195985DEVICE FOR REDUCING MISALIGNMENT BETWEEN SPUTTERING TARGET AND SHIELDMay 2023May 2024Allow1200NoNo
18250218SEMICONDUCTOR PROCESS APPARATUS AND PROCESS CHAMBERApril 2023November 2024Allow1910NoNo
18026575COATING APPARATUS AND COATING METHOD HAVING DIVIDED PULSESMarch 2023February 2025Allow2320NoNo
18026437Sputtering Target and Method for Producing Sputtering TargetMarch 2023September 2024Allow1810NoNo
18044887TARGET AND FILM FORMING APPARATUSMarch 2023October 2024Allow1910NoNo
18109385MICRO-ELECTROMECHANICAL SYSTEM (MEMS) BASED INERTIAL SENSOR AND METHOD OF FABRICATION THEREOFFebruary 2023March 2025Abandon2520NoNo
18108866FILM FORMING APPARATUS AND METHOD FOR REDUCING ARCINGFebruary 2023September 2023Allow710NoNo
17918684BISMUTH FERRITE FILM MATERIAL, METHOD FOR INTEGRALLY PREPARING BISMUTH FERRITE FILM ON SILICON SUBSTRATE AT LOW TEMPERATURE AND APPLICATIONFebruary 2023December 2024Allow2620NoNo
18162274SEMICONDUCTOR PROCESSING TOOL AND METHODS OF OPERATIONJanuary 2023March 2024Allow1400NoNo
18016969SPUTTER DESPOSITION SYSTEMJanuary 2023October 2024Allow2111NoNo
18098993MULTICATHODE PVD SYSTEM FOR HIGH ASPECT RATIO BARRIER SEED DEPOSITIONJanuary 2023September 2024Allow2030YesNo
18097757METHOD FOR PREPARING HIGH-ENTROPY ALLOY COMPOSITES REINFORCED BY DIAMOND PARTICLESJanuary 2023July 2023Allow610NoNo
18094757SPUTTER TRAP HAVING A THIN HIGH PURITY COATING LAYER AND METHOD OF MAKING THE SAMEJanuary 2023February 2024Allow1310NoNo
17994455PREPARATION METHOD FOR PEROVSKITE FILM, AND RELATED PEROVSKITE FILM AND SOLAR CELLNovember 2022October 2023Allow1121NoNo
18054574MAGNET SYSTEM AND SPUTTERING DEVICENovember 2022September 2024Allow2210YesNo
17922169MANUFACTURING APPARATUS AND METHOD FOR MICROWAVE DEVICENovember 2022December 2024Allow2620NoNo
17979392PISTON CRANK AGITATION MECHANISM FOR PHYSICAL VAPOR DEPOSITION CONFORMAL COATINGS ON POWDERNovember 2022May 2025Allow3111NoNo
17921088SEMICONDUCTOR PROCESSING APPARATUS AND MAGNETRON MECHANISMOctober 2022December 2024Allow2620NoNo
17913353METHOD FOR MONITORING PROCESS CONDITIONS OF, AND METHOD FOR CONTROLLING, A PLASMA PVD PROCESSSeptember 2022August 2024Allow2310NoNo
17932805METHODS OF AND APPARATUS FOR MAGNETRON SPUTTERINGSeptember 2022August 2023Allow1110NoNo
17905976APPARATUS AND PROCESS WITH A DC-PULSED CATHODE ARRAYSeptember 2022July 2024Abandon2310NoNo
17899077DEPOSITION EQUIPMENT WITH SHIELDING MECHANISMAugust 2022March 2024Allow1910NoNo
17890913Method for Growing Crystalline Optical Films on Si Substrates which may optionally have an Extremely Small Optical Loss in the Infra-Red Spectrum with Hydrogenation of the Crystalline Optical FilmsAugust 2022June 2024Allow2220NoNo
17883965Interconnect Structures and Methods and Apparatuses for Forming the SameAugust 2022April 2025Allow3230YesNo
17878227METHOD FOR MODIFYING CARBON FIBER AND PRODUCT THEREOFAugust 2022December 2023Abandon1620NoNo
17814551ANALYZING METHODJuly 2022April 2025Allow3310NoNo
17871455PROCESS KITS AND RELATED METHODS FOR PROCESSING CHAMBERS TO FACILITATE DEPOSITION PROCESS ADJUSTABILITYJuly 2022July 2025Allow3511YesNo
17865144ETCH UNIFORMITY IMPROVEMENT FOR SINGLE TURN INTERNAL COIL PVD CHAMBERJuly 2022June 2024Allow2310NoNo
17855517SYSTEM AND METHOD FOR MEASURING MAGNETIC FIELDS IN PVD SYSTEMJune 2022April 2025Allow3410NoNo
17781050CUV2O6-BASED PHOTOELECTRIC SENSOR AND APPLICATION THEREOF IN DETECTION OF ARGININEMay 2022May 2025Allow3521NoNo
17751245PVD DEPOSITED TERNARY AND QUATERNARY NITI ALLOYS AND METHODS OF MAKING SAMEMay 2022April 2024Allow2311NoNo
17749531METHOD OF MAKING AN ELECTRODE HAVING MULTI-WALLED CARBON NANOTUBESMay 2022December 2024Abandon3161YesNo
17776709SPUTTER DEPOSITION APPARATUS AND METHODMay 2022June 2025Allow3721NoNo
17739830ION BEAM PROCESSING APPARATUS, ELECTRODE ASSEMBLY, AND METHOD OF CLEANING ELECTRODE ASSEMBLYMay 2022June 2024Allow2520NoNo
17662107SHUTTER DISC FOR A SEMICONDUCTOR PROCESSING TOOLMay 2022July 2023Allow1410NoNo
17735307SPUTTERING DEVICEMay 2022October 2024Allow2940NoNo
17773678PHYSICAL VAPOR DEPOSITION CHAMBER AND PHYSICAL VAPOR DEPOSITION APPARATUSMay 2022April 2023Allow1110NoNo
17773526SPUTTERING TARGET FOR HEAT-ASSISTED MAGNETIC RECORDING MEDIUMApril 2022July 2024Abandon2720NoNo
17723005ION BEAM DEPOSITION TARGET LIFE ENHANCEMENTApril 2022October 2023Allow1820YesNo
17659018VACUUM PROCESSING APPARATUSApril 2022April 2024Allow2430YesNo
17717521SPUTTERING APPARATUSApril 2022December 2023Allow2120NoNo
17701610PVD SYSTEM AND COLLIMATORMarch 2022December 2023Allow2020YesNo
17698566INTERFACIAL LAYER FOR OPTICAL FILM PERFORMANCEMarch 2022June 2024Allow2730YesNo
17761084A MAGNETRON PLASMA SPUTTERING ARRANGEMENTMarch 2022August 2024Allow2920NoNo
17690107Magnetically Enhanced High Density Plasma-Chemical Vapor Deposition Plasma Source For Depositing Diamond and Diamond-Like FilmsMarch 2022June 2023Allow1510NoNo
17684911Pulsed DC Power For Deposition Of FilmMarch 2022February 2025Allow3640NoNo
17672248System and Method for Uniform Ion MillingFebruary 2022April 2025Allow3821NoNo
17667362TARGET STRUCTURE OF PHYSICAL VAPOR DEPOSITIONFebruary 2022January 2023Allow1110NoNo
17631188FILM FORMING APPARATUS AND FILM FORMING METHODJanuary 2022July 2024Allow3010NoNo
17578903PERIMETER TRENCH FORMATION AND DELINEATION ETCH DELAYERINGJanuary 2022April 2024Allow2710NoNo
17597246CATHODIC ARC SOURCEDecember 2021April 2025Allow3911YesNo
17564771SHIELDING DEVICE AND THIN-FILM-DEPOSITION EQUIPMENT WITH THE SAMEDecember 2021February 2024Allow2600NoNo
17616828METHOD FOR COATING A SUBSTRATE WITH TANTALUM NITRIDEDecember 2021March 2024Allow2810YesNo
17596204FABRICATION METHOD OF SILICON NANONEEDLE ARRAY WITH ULTRA-HIGH ASPECT RATIODecember 2021November 2023Abandon2330NoNo
17614471METHOD OF ION-PLASMA APPLICATION OF CORROSION-RESISTANT FILM COATINGS ON ARTICLES MADE FROM ZIRCONIUM ALLOYSNovember 2021February 2025Allow3930NoNo
17609470MOVABLE WORK PIECE CARRIER DEVICE FOR HOLDING WORK PIECES TO BE TREATEDNovember 2021April 2024Allow2910NoNo
17609356RUTHENIUM-BASED SPUTTERING TARGET AND METHOD FOR MANUFACTURING SAMENovember 2021March 2025Allow4021NoNo
17608617MASK STRUCTURE AND FCVA APPARATUSNovember 2021March 2022Allow500NoNo
17608683HIGH EFFICIENCY ROTATABLE SPUTTER TARGETNovember 2021September 2023Allow2210NoNo
17285558PLASMA FILM FORMING APPARATUS AND PLASMA FILM FORMING METHODNovember 2021March 2025Abandon4730NoNo
17507262THIN-FILM-DEPOSITION EQUIPMENT FOR DETECTING SHIELDING MECHANISMOctober 2021September 2022Allow1100NoNo
17506105POSITION-DETECTABLE SHIELDING DEVICE AND THIN-FILM-DEPOSITION EQUIPMENT WITH THE SAMEOctober 2021October 2022Allow1210NoNo
17502490METHOD FOR ADJUSTING CONTACT POSITION OF LIFT PINS, METHOD FOR DETECTING CONTACT POSITION OF LIFT PINS, AND SUBSTRATE PLACEMENT MECHANISMOctober 2021February 2024Allow2810NoNo
17497535DOUBLE-LAYER SHIELDING DEVICE AND THIN-FILM-DEPOSITION EQUIPMENT WITH THE SAMEOctober 2021August 2022Allow1000NoNo
17602352SPUTTERING TARGET AND METHOD OF MANUFACTURING THE SAME, AND MEMORY DEVICE MANUFACTURING METHODOctober 2021March 2024Abandon2910NoNo
17450209SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUSOctober 2021December 2024Allow3810NoNo
17494017SHIELDING DEVICE AND THIN-FILM-DEPOSITION EQUIPMENT WITH THE SAMEOctober 2021December 2023Allow2710NoNo
17491762REDUCED RIPPLE IN SWITCH MODE POWER SUPPLY WITH SNUBBEROctober 2021August 2024Allow3511NoNo
17490574MAGNETRON SPUTTERING APPARATUS AND MAGNETRON SPUTTERING METHODSeptember 2021October 2023Allow2430NoNo
17599736MAGNET BAR WITH ATTACHED SENSORSeptember 2021February 2024Abandon2920NoNo
17598473Sputtering Target And Method For Manufacturing Sputtering TargetSeptember 2021June 2024Allow3320NoNo
17484654SHIELDING DEVICE AND THIN-FILM-DEPOSITION EQUIPMENT WITH THE SAMESeptember 2021October 2022Allow1310NoNo
17441705SPUTTERING TARGETSeptember 2021March 2024Abandon3010NoNo
17439123Niobium Sputtering TargetSeptember 2021February 2024Allow2930NoNo
17474831PVD CHAMBER SHIELD STRUCTURE INCLUDING IMPROVED COTAING LAYER OR SHIELDSeptember 2021November 2023Abandon2630NoNo
17473038SHIELDING DEVICE AND THIN-FILM-DEPOSITION EQUIPMENT WITH THE SAMESeptember 2021February 2024Allow2940NoNo
17447308ARGON-HELIUM BASED COATINGSeptember 2021February 2025Allow4130YesNo
17437646IMPROVED CATHODE ARC SOURCESeptember 2021December 2023Allow2720NoNo

Appeals Overview

This analysis examines appeal outcomes and the strategic value of filing appeals for examiner MCDONALD, RODNEY GLENN.

Patent Trial and Appeal Board (PTAB) Decisions

Total PTAB Decisions
23
Examiner Affirmed
16
(69.6%)
Examiner Reversed
7
(30.4%)
Reversal Percentile
46.3%
Lower than average

What This Means

With a 30.4% reversal rate, the PTAB reverses the examiner's rejections in a meaningful percentage of cases. This reversal rate is below the USPTO average, indicating that appeals face more challenges here than typical.

Strategic Value of Filing an Appeal

Total Appeal Filings
43
Allowed After Appeal Filing
10
(23.3%)
Not Allowed After Appeal Filing
33
(76.7%)
Filing Benefit Percentile
28.1%
Lower than average

Understanding Appeal Filing Strategy

Filing a Notice of Appeal can sometimes lead to allowance even before the appeal is fully briefed or decided by the PTAB. This occurs when the examiner or their supervisor reconsiders the rejection during the mandatory appeal conference (MPEP § 1207.01) after the appeal is filed.

In this dataset, 23.3% of applications that filed an appeal were subsequently allowed. This appeal filing benefit rate is below the USPTO average, suggesting that filing an appeal has limited effectiveness in prompting favorable reconsideration.

Strategic Recommendations

Appeals to PTAB face challenges. Ensure your case has strong merit before committing to full Board review.

Filing a Notice of Appeal shows limited benefit. Consider other strategies like interviews or amendments before appealing.

Examiner MCDONALD, RODNEY GLENN - Prosecution Strategy Guide

Executive Summary

Examiner MCDONALD, RODNEY GLENN works in Art Unit 1794 and has examined 524 patent applications in our dataset. With an allowance rate of 75.0%, this examiner has a below-average tendency to allow applications. Applications typically reach final disposition in approximately 29 months.

Allowance Patterns

Examiner MCDONALD, RODNEY GLENN's allowance rate of 75.0% places them in the 32% percentile among all USPTO examiners. This examiner has a below-average tendency to allow applications.

Office Action Patterns

On average, applications examined by MCDONALD, RODNEY GLENN receive 2.25 office actions before reaching final disposition. This places the examiner in the 77% percentile for office actions issued. This examiner issues more office actions than most examiners, which may indicate thorough examination or difficulty in reaching agreement with applicants.

Prosecution Timeline

The median time to disposition (half-life) for applications examined by MCDONALD, RODNEY GLENN is 29 months. This places the examiner in the 45% percentile for prosecution speed. Prosecution timelines are slightly slower than average with this examiner.

Interview Effectiveness

Conducting an examiner interview provides a +17.9% benefit to allowance rate for applications examined by MCDONALD, RODNEY GLENN. This interview benefit is in the 64% percentile among all examiners. Recommendation: Interviews provide an above-average benefit with this examiner and are worth considering.

Request for Continued Examination (RCE) Effectiveness

When applicants file an RCE with this examiner, 21.7% of applications are subsequently allowed. This success rate is in the 17% percentile among all examiners. Strategic Insight: RCEs show lower effectiveness with this examiner compared to others. Consider whether a continuation application might be more strategic, especially if you need to add new matter or significantly broaden claims.

After-Final Amendment Practice

This examiner enters after-final amendments leading to allowance in 31.6% of cases where such amendments are filed. This entry rate is in the 38% percentile among all examiners. Strategic Recommendation: This examiner shows below-average receptiveness to after-final amendments. You may need to file an RCE or appeal rather than relying on after-final amendment entry.

Pre-Appeal Conference Effectiveness

When applicants request a pre-appeal conference (PAC) with this examiner, 20.0% result in withdrawal of the rejection or reopening of prosecution. This success rate is in the 25% percentile among all examiners. Note: Pre-appeal conferences show limited success with this examiner compared to others. While still worth considering, be prepared to proceed with a full appeal brief if the PAC does not result in favorable action.

Appeal Withdrawal and Reconsideration

This examiner withdraws rejections or reopens prosecution in 48.9% of appeals filed. This is in the 10% percentile among all examiners. Of these withdrawals, 22.7% occur early in the appeal process (after Notice of Appeal but before Appeal Brief). Strategic Insight: This examiner rarely withdraws rejections during the appeal process compared to other examiners. If you file an appeal, be prepared to fully prosecute it to a PTAB decision. Per MPEP § 1207, the examiner will prepare an Examiner's Answer maintaining the rejections.

Petition Practice

When applicants file petitions regarding this examiner's actions, 28.6% are granted (fully or in part). This grant rate is in the 20% percentile among all examiners. Strategic Note: Petitions are rarely granted regarding this examiner's actions compared to other examiners. Ensure you have a strong procedural basis before filing a petition, as the Technology Center Director typically upholds this examiner's decisions.

Examiner Cooperation and Flexibility

Examiner's Amendments: This examiner makes examiner's amendments in 0.0% of allowed cases (in the 7% percentile). This examiner rarely makes examiner's amendments compared to other examiners. You should expect to make all necessary claim amendments yourself through formal amendment practice.

Quayle Actions: This examiner issues Ex Parte Quayle actions in 2.5% of allowed cases (in the 68% percentile). This examiner issues Quayle actions more often than average when claims are allowable but formal matters remain (MPEP § 714.14).

Prosecution Strategy Recommendations

Based on the statistical analysis of this examiner's prosecution patterns, here are tailored strategic recommendations:

  • Expect multiple rounds of prosecution: This examiner issues more office actions than average. Address potential issues proactively in your initial response and consider requesting an interview early in prosecution.

Relevant MPEP Sections for Prosecution Strategy

  • MPEP § 713.10: Examiner interviews - available before Notice of Allowance or transfer to PTAB
  • MPEP § 714.12: After-final amendments - may be entered "under justifiable circumstances"
  • MPEP § 1002.02(c): Petitionable matters to Technology Center Director
  • MPEP § 1004: Actions requiring primary examiner signature (allowances, final rejections, examiner's answers)
  • MPEP § 1207.01: Appeal conferences - mandatory for all appeals
  • MPEP § 1214.07: Reopening prosecution after appeal

Important Disclaimer

Not Legal Advice: The information provided in this report is for informational purposes only and does not constitute legal advice. You should consult with a qualified patent attorney or agent for advice specific to your situation.

No Guarantees: We do not provide any guarantees as to the accuracy, completeness, or timeliness of the statistics presented above. Patent prosecution statistics are derived from publicly available USPTO data and are subject to data quality limitations, processing errors, and changes in USPTO practices over time.

Limitation of Liability: Under no circumstances will IronCrow AI be liable for any outcome, decision, or action resulting from your reliance on the statistics, analysis, or recommendations presented in this report. Past prosecution patterns do not guarantee future results.

Use at Your Own Risk: While we strive to provide accurate and useful prosecution statistics, you should independently verify any information that is material to your prosecution strategy and use your professional judgment in all patent prosecution matters.