Detailed information about the 100 most recent patent applications.
| Application Number | Title | Filing Date | Disposal Date | Disposition | Time (months) | Office Actions | Restrictions | Interview | Appeal |
|---|---|---|---|---|---|---|---|---|---|
| 19098014 | OPTIMIZING CADMIUM (CD) ALLOY SOLAR CELLS WITH SPUTTERED COPPER-DOPPED ZINC TELLURIDE (ZNTE:CU) BACK CONTACTS IN THE PRESENCE OF HYDROGEN | April 2025 | July 2025 | Allow | 4 | 1 | 0 | Yes | No |
| 19009396 | OPTIMIZING CADMIUM (CD) ALLOY SOLAR CELLS WITH SPUTTERED COPPER-DOPPED ZINC TELLURIDE (ZNTE:CU) BACK CONTACTS IN THE PRESENCE OF HYDROGEN | January 2025 | July 2025 | Allow | 6 | 1 | 1 | Yes | No |
| 18971510 | MULTICATHODE PVD SYSTEM FOR HIGH ASPECT RATIO BARRIER SEED DEPOSITION | December 2024 | November 2025 | Allow | 11 | 3 | 0 | Yes | No |
| 18938913 | FILM FORMING APPARATUS AND FILM FORMING METHOD | November 2024 | October 2025 | Allow | 12 | 2 | 0 | No | No |
| 18931664 | SYSTEM FOR TARGET ARCING MAPPING AND PLASMA DIAGNOSIS | October 2024 | May 2025 | Allow | 6 | 0 | 0 | No | No |
| 18919831 | SPUTTER SYSTEM WITH MAGNET MOTION SOURCE | October 2024 | September 2025 | Allow | 11 | 1 | 0 | Yes | No |
| 18890298 | ION BEAM PROCESSING APPARATUS, ELECTRODE ASSEMBLY, AND METHOD OF CLEANING ELECTRODE ASSEMBLY | September 2024 | October 2025 | Allow | 13 | 1 | 0 | No | No |
| 18887477 | PVD Deposited Ternary and Quaternary NiTi Alloys and Methods of Making Same | September 2024 | September 2025 | Allow | 12 | 2 | 0 | No | No |
| 18840392 | PRODUCTION METHOD FOR SINGLE CRYSTAL SEMICONDUCTOR FILM, PRODUCTION METHOD FOR MULTILAYER FILM OF SINGLE CRYSTAL SEMICONDUCTOR FILM, AND SEMICONDUCTOR ELEMENT | August 2024 | October 2025 | Abandon | 14 | 0 | 1 | No | No |
| 18792991 | PULSED VOLTAGE WAVEFORM DELIVERY FOR DEPOSITION | August 2024 | July 2025 | Allow | 11 | 1 | 0 | Yes | No |
| 18778683 | WAFER MANUFACTURING APPARATUS | July 2024 | July 2025 | Allow | 12 | 1 | 0 | Yes | No |
| 18769687 | PHYSICAL VAPOR DEPOSITION APPARATUS | July 2024 | July 2025 | Allow | 13 | 1 | 0 | No | No |
| 18748650 | SEMICONDUCTOR PROCESSING TOOL AND METHODS OF OPERATION | June 2024 | December 2025 | Allow | 18 | 2 | 1 | Yes | No |
| 18654389 | Methods And Apparatus For Depositing Amorphous Indium Tin Oxide Film | May 2024 | July 2025 | Allow | 14 | 1 | 0 | No | No |
| 18642828 | METHOD OF MANUFACTURING SPINAL CAGE FOR IMPROVING BONE UNION RATE | April 2024 | January 2025 | Allow | 9 | 1 | 0 | No | No |
| 18629457 | SPUTTERING APPARATUS | April 2024 | November 2024 | Allow | 7 | 0 | 0 | No | No |
| 18617573 | PVD SYSTEM AND COLLIMATOR | March 2024 | May 2025 | Allow | 14 | 2 | 0 | No | No |
| 18682253 | A METHOD FOR PATTERNING A SUBSTRATE, A METHOD FOR FORMING A MICROSTRUCTURE ON A SUBSTRATE, AND A METHOD FOR FABRICATING A FLUIDIC DEVICE | February 2024 | March 2025 | Allow | 13 | 1 | 0 | No | No |
| 18293582 | SPUTTERING MACHINES, SUBSTRATE HOLDERS, AND SPUTTERING PROCESSES WITH MAGNETIC BIASING | January 2024 | March 2026 | Allow | 25 | 3 | 0 | Yes | No |
| 18427078 | SEMICONDUCTOR PROCESSING TOOL AND METHODS OF OPERATION | January 2024 | October 2025 | Allow | 21 | 2 | 0 | Yes | No |
| 18414343 | LITHIUM SECONDARY BATTERY AND PREPARATION METHOD THEREFOR | January 2024 | December 2025 | Abandon | 23 | 1 | 0 | No | No |
| 18406062 | FILM FORMING APPARATUS AND METHOD FOR REDUCING ARCING | January 2024 | July 2025 | Allow | 19 | 2 | 0 | No | No |
| 18403941 | DEPOSITION APPARATUS AND DEPOSITION METHOD | January 2024 | August 2025 | Allow | 20 | 3 | 0 | No | No |
| 18535774 | CYLINDRICAL CATHODE AND CHAMBER USING SAME FOR SPUTTERING | December 2023 | February 2025 | Allow | 14 | 1 | 0 | No | No |
| 18567451 | CONDUCTIVE SILICON SPUTTERING TARGETS | December 2023 | February 2026 | Abandon | 27 | 3 | 0 | Yes | No |
| 18562259 | APPARATUS AND METHOD FOR COATING THE INNER SURFACE OF A HOLLOW ARTICLE | November 2023 | July 2025 | Allow | 20 | 0 | 0 | No | No |
| 18384430 | POTASSIUM SODIUM NIOBATE SPUTTERING TARGET AND PRODUCTION METHOD THEREOF | October 2023 | October 2024 | Allow | 12 | 1 | 0 | No | No |
| 18477060 | FILM FORMING APPARATUS AND FILM FORMING METHOD | September 2023 | April 2025 | Allow | 19 | 3 | 0 | No | No |
| 18472556 | DEPOSITION APPARATUS, DEPOSITION TARGET STRUCTURE, AND METHOD | September 2023 | October 2024 | Allow | 13 | 1 | 0 | No | No |
| 18459189 | SUBSTRATE PROCESSING APPARATUS | August 2023 | January 2026 | Allow | 29 | 0 | 0 | No | No |
| 18547678 | SPUTTERING TARGET | August 2023 | October 2024 | Allow | 14 | 1 | 0 | No | No |
| 18447543 | SHUTTER DISC FOR A SEMICONDUCTOR PROCESSING TOOL | August 2023 | September 2024 | Allow | 13 | 1 | 0 | Yes | No |
| 18231907 | GAS MIXING METHOD TO ENHANCE PLASMA | August 2023 | December 2024 | Allow | 16 | 2 | 0 | No | No |
| 18364557 | APPARATUS WITH HEATED FILTER AND OPERATION METHOD OF THE SAME | August 2023 | March 2026 | Allow | 32 | 1 | 0 | No | No |
| 18352831 | RESIN SURFACE HYDROPHILIZATION METHOD, PLASMA PROCESSING DEVICE, LAMINATE BODY, AND LAMINATE BODY MANUFACTURING METHODRESIN SURFACE HYDROPHILIZATION METHOD, PLASMA PROCESSING DEVICE, LAMINATE BODY, AN LAMINATE BODY MANUFACTURING METHOD | July 2023 | September 2025 | Allow | 26 | 0 | 0 | No | No |
| 18350307 | SEMICONDUCTOR WAFER MANUFACTURING APPARATUS | July 2023 | February 2026 | Allow | 31 | 1 | 0 | Yes | No |
| 18350410 | FILM FORMING APPARATUS | July 2023 | February 2025 | Allow | 19 | 2 | 0 | Yes | No |
| 18350138 | NANOTWINNED NICKEL FILMS WITH HIGH STRENGTH AND DUCTILITY | July 2023 | February 2025 | Allow | 20 | 2 | 1 | Yes | No |
| 18271635 | PLASMA PROCESSING METHOD AND PLASMA PROCESSING DEVICE | July 2023 | October 2025 | Allow | 28 | 0 | 0 | No | No |
| 18349140 | VACUUM DEPOSITION INTO TRENCHES AND VIAS AND ETCH OF TRENCHES AND VIA | July 2023 | October 2024 | Allow | 16 | 2 | 0 | Yes | No |
| 18346967 | VACUUM DEPOSITION INTO TRENCHES AND VIAS | July 2023 | October 2024 | Allow | 16 | 2 | 0 | No | No |
| 18344898 | METHOD OF FORMING TRANSPARENT LAYERS FOR A SOLAR CELL | June 2023 | April 2025 | Allow | 21 | 1 | 1 | Yes | No |
| 18344865 | CRYSTAL GROWTH FURNACE SYSTEM | June 2023 | March 2026 | Abandon | 33 | 1 | 0 | No | No |
| 18214498 | Magnetron Design for Improved Bottom Coverage and Uniformity | June 2023 | August 2024 | Allow | 14 | 1 | 0 | Yes | No |
| 18214355 | SCANNED ANGLED ETCHING APPARATUS AND TECHNIQUES PROVIDING SEPARATE CO-LINEAR RADICALS AND IONS | June 2023 | August 2024 | Allow | 14 | 2 | 0 | No | No |
| 18339920 | FILM FORMING POSITION MISALIGNMENT CORRECTION METHOD AND FILM FORMING SYSTEM | June 2023 | August 2024 | Allow | 14 | 1 | 0 | No | No |
| 18337430 | PHYSICAL VAPOR DEPOSITION (PVD) WITH TARGET EROSION PROFILE MONITORING | June 2023 | February 2025 | Allow | 20 | 2 | 0 | No | No |
| 18257973 | SUBSTRATE SUPPORTING APPARATUS | June 2023 | September 2025 | Allow | 27 | 0 | 0 | No | No |
| 18210409 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD | June 2023 | February 2026 | Allow | 32 | 1 | 0 | No | No |
| 18332843 | SUBSTRATE PROCESSING APPARATUS | June 2023 | January 2026 | Allow | 31 | 1 | 0 | No | No |
| 18331321 | Interconnect Structures and Methods and Apparatuses for Forming the Same | June 2023 | October 2025 | Allow | 29 | 1 | 0 | No | No |
| 18201055 | Method and Apparatus for Deposition of Metal Nitrides | May 2023 | January 2026 | Allow | 31 | 4 | 0 | Yes | No |
| 18037565 | NEW TRANSPARENT CONDUCTIVE OXIDE THIN FILM AND USE THEREOF | May 2023 | December 2023 | Allow | 7 | 1 | 0 | No | No |
| 18197051 | TRAY ASSEMBLIES FOR PRECURSOR DELIVERY SYSTEMS AND RELATED METHODS | May 2023 | December 2025 | Allow | 31 | 1 | 0 | No | No |
| 18036827 | PLATINUM-BASED SPUTTERING TARGET, AND METHOD FOR PRODUCING THE SAME | May 2023 | February 2025 | Allow | 21 | 1 | 1 | No | No |
| 18195985 | DEVICE FOR REDUCING MISALIGNMENT BETWEEN SPUTTERING TARGET AND SHIELD | May 2023 | May 2024 | Allow | 12 | 0 | 0 | No | No |
| 18250218 | SEMICONDUCTOR PROCESS APPARATUS AND PROCESS CHAMBER | April 2023 | November 2024 | Allow | 19 | 1 | 0 | No | No |
| 18130879 | PLASMA PROCESSING APPARATUS | April 2023 | September 2025 | Allow | 30 | 1 | 0 | No | No |
| 18193382 | DOPED NICKEL OXIDE TARGET AND PREPARATION METHOD AND APPLICATION THEREOF | March 2023 | December 2025 | Allow | 32 | 4 | 0 | Yes | No |
| 18191377 | SUBSTRATE HOLDER | March 2023 | October 2025 | Allow | 31 | 1 | 0 | No | No |
| 18026575 | COATING APPARATUS AND COATING METHOD HAVING DIVIDED PULSES | March 2023 | February 2025 | Allow | 23 | 2 | 0 | No | No |
| 18026437 | Sputtering Target and Method for Producing Sputtering Target | March 2023 | September 2024 | Allow | 18 | 1 | 0 | No | No |
| 18044887 | TARGET AND FILM FORMING APPARATUS | March 2023 | October 2024 | Allow | 19 | 1 | 0 | No | No |
| 18171058 | REACTIVE SPUTTER DEPOSITION OF DIELECTRIC FILMS | February 2023 | October 2025 | Allow | 32 | 6 | 0 | Yes | No |
| 18109385 | MICRO-ELECTROMECHANICAL SYSTEM (MEMS) BASED INERTIAL SENSOR AND METHOD OF FABRICATION THEREOF | February 2023 | March 2025 | Abandon | 25 | 2 | 0 | No | No |
| 18108866 | FILM FORMING APPARATUS AND METHOD FOR REDUCING ARCING | February 2023 | September 2023 | Allow | 7 | 1 | 0 | No | No |
| 18105918 | PLASMA PROCESSING APPARATUS AND METHOD OF MANUFACTURE | February 2023 | August 2025 | Allow | 30 | 1 | 0 | Yes | No |
| 17918684 | BISMUTH FERRITE FILM MATERIAL, METHOD FOR INTEGRALLY PREPARING BISMUTH FERRITE FILM ON SILICON SUBSTRATE AT LOW TEMPERATURE AND APPLICATION | February 2023 | December 2024 | Allow | 26 | 2 | 0 | No | No |
| 18162274 | SEMICONDUCTOR PROCESSING TOOL AND METHODS OF OPERATION | January 2023 | March 2024 | Allow | 14 | 0 | 0 | No | No |
| 18161826 | ELECTROCHROMIC DEVICES AND METHODS | January 2023 | October 2025 | Allow | 32 | 1 | 0 | No | No |
| 18100048 | CASTABLE ALUMINUM ALLOYS FOR WAFER HANDLING CHAMBERS IN SEMICONDUCTOR PROCESSING SYSTEMS | January 2023 | November 2025 | Allow | 34 | 1 | 1 | No | No |
| 18098993 | MULTICATHODE PVD SYSTEM FOR HIGH ASPECT RATIO BARRIER SEED DEPOSITION | January 2023 | September 2024 | Allow | 20 | 3 | 0 | Yes | No |
| 18016969 | SPUTTER DESPOSITION SYSTEM | January 2023 | October 2024 | Allow | 21 | 1 | 1 | No | No |
| 18097757 | METHOD FOR PREPARING HIGH-ENTROPY ALLOY COMPOSITES REINFORCED BY DIAMOND PARTICLES | January 2023 | July 2023 | Allow | 6 | 1 | 0 | No | No |
| 18016407 | VACUUM COATING APPARATUS FOR UNIFORMLY DISTRIBUTING METAL VAPOR USING UNIFORM MIXING BUFFER STRUCTURE | January 2023 | January 2026 | Allow | 36 | 1 | 0 | No | No |
| 18152986 | PRESSURE ADJUSTING VALVE AND SEMICONDUCTOR MANUFACTURING APPARATUS | January 2023 | January 2026 | Allow | 36 | 1 | 0 | No | No |
| 18094757 | SPUTTER TRAP HAVING A THIN HIGH PURITY COATING LAYER AND METHOD OF MAKING THE SAME | January 2023 | February 2024 | Allow | 13 | 1 | 0 | No | No |
| 18014432 | SPUTTERING TARGET MATERIAL AND OXIDE SEMICONDUCTOR | January 2023 | October 2025 | Abandon | 33 | 0 | 1 | No | No |
| 18146569 | SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS | December 2022 | March 2026 | Allow | 38 | 2 | 0 | Yes | No |
| 18145145 | LIFT PIN ASSEMBLY AND SUBSTRATE TREATING APPARATUS | December 2022 | November 2025 | Allow | 35 | 1 | 0 | No | No |
| 18010551 | COOLING BLOCK AND PLASMA REACTOR HAVING SAME | December 2022 | August 2025 | Allow | 32 | 1 | 0 | No | No |
| 18010322 | METHOD OF MOUNTING WIRES TO SUBSTRATE SUPPORT CERAMIC | December 2022 | August 2025 | Allow | 32 | 0 | 1 | No | No |
| 18078841 | Method of Selective Metal Deposition Using Separated Reactant Activation and Plasma Discharging Zone | December 2022 | November 2025 | Allow | 35 | 1 | 0 | No | No |
| 18074419 | WAFER SUSCEPTOR | December 2022 | February 2026 | Allow | 39 | 2 | 0 | No | No |
| 18000440 | SHOWER PLATE AND FILM DEPOSITION APPARATUS | December 2022 | October 2025 | Allow | 34 | 1 | 0 | No | No |
| 17994455 | PREPARATION METHOD FOR PEROVSKITE FILM, AND RELATED PEROVSKITE FILM AND SOLAR CELL | November 2022 | October 2023 | Allow | 11 | 2 | 1 | No | No |
| 17999914 | HEATING DEVICE AND SEMICONDUCTOR PROCESSING APPARATUS | November 2022 | November 2025 | Allow | 35 | 1 | 0 | No | No |
| 17927509 | AIN Layer, Its Fabrication Process and Epitaxial Wafer | November 2022 | February 2026 | Allow | 39 | 2 | 1 | No | No |
| 17922169 | MANUFACTURING APPARATUS AND METHOD FOR MICROWAVE DEVICE | November 2022 | December 2024 | Allow | 26 | 2 | 0 | No | No |
| 18054574 | MAGNET SYSTEM AND SPUTTERING DEVICE | November 2022 | September 2024 | Allow | 22 | 1 | 0 | Yes | No |
| 17979392 | PISTON CRANK AGITATION MECHANISM FOR PHYSICAL VAPOR DEPOSITION CONFORMAL COATINGS ON POWDER | November 2022 | May 2025 | Allow | 31 | 1 | 1 | No | No |
| 17921088 | SEMICONDUCTOR PROCESSING APPARATUS AND MAGNETRON MECHANISM | October 2022 | December 2024 | Allow | 26 | 2 | 0 | No | No |
| 17913353 | METHOD FOR MONITORING PROCESS CONDITIONS OF, AND METHOD FOR CONTROLLING, A PLASMA PVD PROCESS | September 2022 | August 2024 | Allow | 23 | 1 | 0 | No | No |
| 17912825 | RF MAGNETIC FIELD SENSOR FOR HARMONIC MEASUREMENTS AND UNIFORMITY CONTROL | September 2022 | September 2025 | Allow | 36 | 1 | 1 | No | No |
| 17932805 | METHODS OF AND APPARATUS FOR MAGNETRON SPUTTERING | September 2022 | August 2023 | Allow | 11 | 1 | 0 | No | No |
| 17905976 | APPARATUS AND PROCESS WITH A DC-PULSED CATHODE ARRAY | September 2022 | July 2024 | Abandon | 23 | 1 | 0 | No | No |
| 17899077 | DEPOSITION EQUIPMENT WITH SHIELDING MECHANISM | August 2022 | March 2024 | Allow | 19 | 1 | 0 | No | No |
| 17890913 | Method for Growing Crystalline Optical Films on Si Substrates which may optionally have an Extremely Small Optical Loss in the Infra-Red Spectrum with Hydrogenation of the Crystalline Optical Films | August 2022 | June 2024 | Allow | 22 | 2 | 0 | No | No |
| 17883965 | Interconnect Structures and Methods and Apparatuses for Forming the Same | August 2022 | April 2025 | Allow | 32 | 3 | 0 | Yes | No |
| 17878227 | METHOD FOR MODIFYING CARBON FIBER AND PRODUCT THEREOF | August 2022 | December 2023 | Abandon | 16 | 2 | 0 | No | No |
This analysis examines appeal outcomes and the strategic value of filing appeals for examiner MCDONALD, RODNEY GLENN.
With a 32.0% reversal rate, the PTAB reverses the examiner's rejections in a meaningful percentage of cases. This reversal rate is below the USPTO average, indicating that appeals face more challenges here than typical.
Filing a Notice of Appeal can sometimes lead to allowance even before the appeal is fully briefed or decided by the PTAB. This occurs when the examiner or their supervisor reconsiders the rejection during the mandatory appeal conference (MPEP § 1207.01) after the appeal is filed.
In this dataset, 24.4% of applications that filed an appeal were subsequently allowed. This appeal filing benefit rate is below the USPTO average, suggesting that filing an appeal has limited effectiveness in prompting favorable reconsideration.
⚠ Appeals to PTAB face challenges. Ensure your case has strong merit before committing to full Board review.
⚠ Filing a Notice of Appeal shows limited benefit. Consider other strategies like interviews or amendments before appealing.
Examiner MCDONALD, RODNEY GLENN works in Art Unit 1794 and has examined 464 patent applications in our dataset. With an allowance rate of 72.4%, this examiner has a below-average tendency to allow applications. Applications typically reach final disposition in approximately 32 months.
Examiner MCDONALD, RODNEY GLENN's allowance rate of 72.4% places them in the 36% percentile among all USPTO examiners. This examiner has a below-average tendency to allow applications.
On average, applications examined by MCDONALD, RODNEY GLENN receive 2.35 office actions before reaching final disposition. This places the examiner in the 67% percentile for office actions issued. This examiner issues a slightly above-average number of office actions.
The median time to disposition (half-life) for applications examined by MCDONALD, RODNEY GLENN is 32 months. This places the examiner in the 50% percentile for prosecution speed. Prosecution timelines are slightly faster than average with this examiner.
Conducting an examiner interview provides a +20.7% benefit to allowance rate for applications examined by MCDONALD, RODNEY GLENN. This interview benefit is in the 65% percentile among all examiners. Recommendation: Interviews provide an above-average benefit with this examiner and are worth considering.
When applicants file an RCE with this examiner, 20.8% of applications are subsequently allowed. This success rate is in the 23% percentile among all examiners. Strategic Insight: RCEs show lower effectiveness with this examiner compared to others. Consider whether a continuation application might be more strategic, especially if you need to add new matter or significantly broaden claims.
This examiner enters after-final amendments leading to allowance in 29.7% of cases where such amendments are filed. This entry rate is in the 43% percentile among all examiners. Strategic Recommendation: This examiner shows below-average receptiveness to after-final amendments. You may need to file an RCE or appeal rather than relying on after-final amendment entry.
When applicants request a pre-appeal conference (PAC) with this examiner, 19.0% result in withdrawal of the rejection or reopening of prosecution. This success rate is in the 27% percentile among all examiners. Note: Pre-appeal conferences show below-average success with this examiner. Consider whether your arguments are strong enough to warrant a PAC request.
This examiner withdraws rejections or reopens prosecution in 49.0% of appeals filed. This is in the 14% percentile among all examiners. Of these withdrawals, 20.8% occur early in the appeal process (after Notice of Appeal but before Appeal Brief). Strategic Insight: This examiner rarely withdraws rejections during the appeal process compared to other examiners. If you file an appeal, be prepared to fully prosecute it to a PTAB decision. Per MPEP § 1207, the examiner will prepare an Examiner's Answer maintaining the rejections.
When applicants file petitions regarding this examiner's actions, 35.3% are granted (fully or in part). This grant rate is in the 23% percentile among all examiners. Strategic Note: Petitions are rarely granted regarding this examiner's actions compared to other examiners. Ensure you have a strong procedural basis before filing a petition, as the Technology Center Director typically upholds this examiner's decisions.
Examiner's Amendments: This examiner makes examiner's amendments in 0.0% of allowed cases (in the 8% percentile). This examiner rarely makes examiner's amendments compared to other examiners. You should expect to make all necessary claim amendments yourself through formal amendment practice.
Quayle Actions: This examiner issues Ex Parte Quayle actions in 3.6% of allowed cases (in the 76% percentile). Per MPEP § 714.14, a Quayle action indicates that all claims are allowable but formal matters remain. This examiner frequently uses Quayle actions compared to other examiners, which is a positive indicator that once substantive issues are resolved, allowance follows quickly.
Based on the statistical analysis of this examiner's prosecution patterns, here are tailored strategic recommendations:
Not Legal Advice: The information provided in this report is for informational purposes only and does not constitute legal advice. You should consult with a qualified patent attorney or agent for advice specific to your situation.
No Guarantees: We do not provide any guarantees as to the accuracy, completeness, or timeliness of the statistics presented above. Patent prosecution statistics are derived from publicly available USPTO data and are subject to data quality limitations, processing errors, and changes in USPTO practices over time.
Limitation of Liability: Under no circumstances will IronCrow AI be liable for any outcome, decision, or action resulting from your reliance on the statistics, analysis, or recommendations presented in this report. Past prosecution patterns do not guarantee future results.
Use at Your Own Risk: While we strive to provide accurate and useful prosecution statistics, you should independently verify any information that is material to your prosecution strategy and use your professional judgment in all patent prosecution matters.