Detailed information about the 100 most recent patent applications.
| Application Number | Title | Filing Date | Disposal Date | Disposition | Time (months) | Office Actions | Restrictions | Interview | Appeal |
|---|---|---|---|---|---|---|---|---|---|
| 19014165 | DYNAMIC VACUUM SEAL SYSTEM FOR PHYSICAL VAPOR DEPOSITION SPUTTER APPLICATIONS | January 2025 | March 2025 | Allow | 2 | 0 | 0 | No | No |
| 18945649 | SUBSTRATE PROCESSING APPARATUS | November 2024 | June 2025 | Allow | 7 | 0 | 0 | No | No |
| 18923813 | PVD TARGET AND USE THEREOF | October 2024 | March 2025 | Allow | 5 | 1 | 0 | No | No |
| 18752780 | PVD APPARATUS AND METHOD | June 2024 | June 2025 | Allow | 12 | 0 | 0 | No | No |
| 18722727 | Method for Producing a Substoichiometric Layer of Titanium, Vanadium, Tungsten or Molybdenum Oxide | June 2024 | June 2025 | Allow | 12 | 1 | 0 | No | No |
| 18658455 | WAFER PROCESSING APPARATUS AND WAFER PROCESSING METHOD | May 2024 | June 2025 | Allow | 13 | 2 | 0 | No | No |
| 18698353 | SPUTTERING TARGET, METHOD FOR PRODUCING SAME, AND METHOD FOR PRODUCING SPUTTERING FILM USING SPUTTERING TARGET | April 2024 | June 2025 | Allow | 15 | 1 | 0 | No | No |
| 18611678 | PREPARATION METHOD FOR TUNGSTEN SULFIDE SOLID LUBRICATING FILM BASED ON HIGH POWER IMPULSE MAGNETRON SPUTTERING | March 2024 | March 2025 | Allow | 12 | 1 | 0 | No | No |
| 18435175 | CALIBRATION JIG AND CALIBRATION METHOD | February 2024 | October 2024 | Allow | 8 | 0 | 0 | No | No |
| 18430398 | SUBSTRATE PROCESSING MODULE AND METHOD OF MOVING A WORKPIECE | February 2024 | March 2025 | Allow | 14 | 1 | 0 | No | No |
| 18536612 | METHODS AND APPARATUS FOR PHYSICAL VAPOR DEPOSITION (PVD) DIELECTRIC DEPOSITION | December 2023 | June 2025 | Allow | 18 | 2 | 0 | Yes | No |
| 18287318 | MAGNETRON SPUTTER DEVICE | October 2023 | December 2024 | Allow | 14 | 1 | 0 | No | No |
| 18554754 | SPUTTERING APPARATUS FOR COATING OF 3D-OBJECTS | October 2023 | December 2024 | Allow | 14 | 1 | 0 | No | No |
| 18283593 | ELECTRODE AND METHOD OF PRODUCING THE ELECTRODE | September 2023 | March 2025 | Allow | 18 | 1 | 0 | No | No |
| 18548418 | DEPOSITION OF NON-STOICHIOMETRIC METAL COMPOUND LAYER | August 2023 | March 2025 | Allow | 19 | 2 | 0 | No | No |
| 18548404 | TUNGSTEN SUBOXIDE CERAMIC TARGET | August 2023 | March 2025 | Allow | 19 | 2 | 0 | No | No |
| 18337764 | FILM FORMATION APPARATUS | June 2023 | March 2025 | Allow | 21 | 2 | 0 | Yes | No |
| 18311491 | SPUTTERING TARGET, METHOD OF BONDING TARGET MATERIAL AND BACKING PLATE, AND METHOD OF MANUFACTURING SPUTTERING TARGET | May 2023 | March 2024 | Allow | 11 | 1 | 0 | No | No |
| 18137855 | Multi-chamber Configuration | April 2023 | April 2025 | Abandon | 24 | 2 | 0 | No | No |
| 18133408 | DEPOSITION APPARATUS AND DEPOSITION METHOD USING THE SAME | April 2023 | March 2024 | Allow | 12 | 1 | 0 | No | No |
| 18031071 | RF SPUTTERING APPARATUS FOR CONTROLLING ATOMIC LAYER OF THIN FILM | April 2023 | October 2024 | Allow | 18 | 1 | 0 | No | No |
| 18190442 | PLASMA PROCESSING APPARATUS | March 2023 | December 2024 | Allow | 20 | 1 | 0 | No | No |
| 18185626 | APPARATUS AND METHOD FOR DEPOSITING HARD CARBON LAYERS | March 2023 | March 2025 | Allow | 24 | 2 | 0 | No | No |
| 18180132 | METHOD FOR PRODUCING CHROMIUM SINTERED BODY, METHOD FOR PRODUCING SPUTTERING TARGET, AND METHOD FOR PRODUCING SUBSTRATE WITH CHROMIUM FILM | March 2023 | June 2025 | Allow | 27 | 2 | 0 | No | No |
| 18179424 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD | March 2023 | July 2024 | Allow | 17 | 1 | 0 | No | No |
| 18177244 | Magnetic Film and Perpendicular Magnetic Recording Medium | March 2023 | December 2023 | Allow | 10 | 0 | 0 | No | No |
| 18041793 | FREE-STANDING LITHIUM PHOSPHORUS OXYNITRIDE THINK FILMS AND METHODS OF THEIR MANUFACTURE | February 2023 | June 2024 | Allow | 16 | 0 | 0 | No | No |
| 18020017 | SLIT DIAPHRAGM | February 2023 | September 2024 | Allow | 20 | 1 | 0 | No | No |
| 18097152 | ORGANIC CONTAMINATION FREE SURFACE MACHINING | January 2023 | November 2023 | Allow | 10 | 1 | 0 | No | No |
| 18093138 | Programmable Electrostatic Chuck to Enhance Aluminum Film Morphology | January 2023 | June 2024 | Allow | 17 | 1 | 0 | Yes | No |
| 18093141 | Programmable ESC to Enhance Aluminum Film Morphology | January 2023 | May 2024 | Allow | 17 | 1 | 0 | Yes | No |
| 18074496 | Method and Apparatus for Controlling Stress Variation in a Material Layer Formed Via Pulsed DC Physical Vapor Deposition | December 2022 | December 2023 | Allow | 12 | 1 | 0 | No | No |
| 18058817 | DEVICE AND METHOD FOR SPUTTERING AND DEPOSITING METAL ON SURFACE OF MAGNETIC POWDER MATERIALS | November 2022 | January 2025 | Allow | 26 | 0 | 1 | No | No |
| 17985175 | MAGNET SYSTEM, SPUTTERING DEVICE AND HOUSING COVER | November 2022 | September 2024 | Allow | 23 | 1 | 0 | Yes | No |
| 18054562 | MAGNET SYSTEM, SPUTTERING DEVICE AND METHOD | November 2022 | August 2024 | Allow | 21 | 1 | 0 | Yes | No |
| 17924516 | GOLD NANOPARTICLE MANUFACTURING METHOD | November 2022 | September 2024 | Abandon | 23 | 1 | 0 | No | No |
| 18048957 | Sputtering System with a Plurality of Cathode Assemblies | October 2022 | September 2023 | Allow | 11 | 1 | 0 | No | No |
| 17996718 | YTTRIUM INGOT AND SPUTTERING TARGET IN WHICH THE YTTRIUM INGOT IS USED | October 2022 | July 2024 | Allow | 20 | 1 | 0 | No | No |
| 18047350 | SPUTTERING-BASED CATALYST DEPOSITION ON PARTICLES FOR MEMBRANE ELECTRODE ASSEMBLY (MEA) CATALYST LAYER | October 2022 | June 2025 | Allow | 32 | 3 | 0 | No | No |
| 17967556 | PHYSICAL VAPOR DEPOSITION OF PIEZOELECTRIC FILMS | October 2022 | April 2024 | Allow | 18 | 1 | 0 | No | No |
| 18045087 | SEMICONDUCTOR APPARATUS AND MAGNETIC STRUCTURE OF SEMICONDUCTOR APPARATUS | October 2022 | September 2024 | Allow | 24 | 1 | 0 | No | No |
| 17956562 | FILM FORMING APPARATUS AND FILM FORMING METHOD | September 2022 | June 2025 | Allow | 33 | 3 | 0 | No | No |
| 17936471 | SPUTTERING APPARATUS AND CVD MASK COATING METHOD USING THE SAME | September 2022 | March 2025 | Allow | 30 | 2 | 0 | Yes | No |
| 17935035 | Plasma Source Ion Implanter with Preparation Chamber for Linear or Cross Transferring Workpiece | September 2022 | December 2024 | Allow | 27 | 0 | 0 | No | No |
| 17906927 | CR-SI SINTERED BODY, SPUTTERING TARGET, AND METHOD FOR PRODUCING THIN FILM | September 2022 | September 2024 | Allow | 24 | 1 | 0 | No | No |
| 17946434 | DC PLASMA CONTROL FOR ELECTRON ENHANCED MATERIAL PROCESSING | September 2022 | March 2023 | Allow | 6 | 1 | 0 | Yes | No |
| 17942808 | DC PLASMA CONTROL FOR ELECTRON ENHANCED MATERIAL PROCESSING | September 2022 | March 2023 | Allow | 6 | 1 | 0 | Yes | No |
| 17889209 | ENERGY-SAVING WINDOW FILM USED FOR INSULATING GLASS AND PREPARATION METHOD AND APPLICATION THEREOF | August 2022 | September 2024 | Allow | 25 | 1 | 0 | No | No |
| 17760310 | DEVICE AND METHOD FOR PRODUCING LAYERS WITH IMPROVED UNIFORMITY IN COATING SYSTEMS WITH HORIZONTALLY ROTATING SUBSTRATE AND ADDITIONAL PLASMA SOURCES | August 2022 | November 2024 | Allow | 28 | 2 | 0 | No | No |
| 17816781 | Sputtering Target | August 2022 | July 2024 | Abandon | 24 | 1 | 0 | No | No |
| 17816374 | METHOD FOR MANUFACTURING SEMICONDUCTOR STRUCTURE | July 2022 | October 2023 | Allow | 14 | 1 | 0 | No | No |
| 17871810 | SEALING ARTICLE COMPRISING METAL COATING, METHOD OF MAKING AND METHOD OF USING THE SAME | July 2022 | October 2023 | Allow | 15 | 1 | 1 | No | No |
| 17758782 | IMPROVED CATHODE ARC SOURCE, FILTERS THEREOF AND METHOD OF FILTERING MACROPARTICLES | July 2022 | September 2023 | Allow | 15 | 2 | 0 | No | No |
| 17857370 | APPARATUS FOR REDUCING TUNGSTEN RESITIVITY | July 2022 | March 2023 | Allow | 9 | 0 | 0 | No | No |
| 17853911 | DEPOSITION DEVICE HAVING CONTACT STRUCTURE AND DEPOSITION SYSTEM HAVING SAME | June 2022 | March 2025 | Allow | 33 | 0 | 0 | No | No |
| 17848573 | INTERNALLY DIVISIBLE PROCESS CHAMBER USING A SHUTTER DISK ASSEMBLY | June 2022 | October 2023 | Allow | 15 | 0 | 0 | No | No |
| 17843076 | FILM FORMING APPARATUS, PROCESSING CONDITION DETERMINATION METHOD, AND FILM FORMING METHOD | June 2022 | April 2025 | Allow | 34 | 1 | 0 | Yes | No |
| 17841270 | Oxide Semiconductor Sputtering Target And Method Of Fabricating Thin-Film Transistor Using Same | June 2022 | June 2024 | Allow | 24 | 1 | 0 | No | No |
| 17838805 | METHODS AND APPARATUS FOR PASSIVATING A TARGET | June 2022 | March 2023 | Allow | 9 | 0 | 0 | No | No |
| 17832897 | PLASMA ETCHING TOOLS AND SYSTEMS | June 2022 | February 2025 | Allow | 33 | 3 | 1 | No | No |
| 17776291 | PLASMA GENERATION DEVICE COMPRISING POROUS CERAMIC DIELECTRIC | May 2022 | March 2025 | Allow | 34 | 1 | 0 | No | No |
| 17740563 | Versatile Vacuum Deposition Sources and System thereof | May 2022 | September 2024 | Allow | 28 | 1 | 0 | Yes | No |
| 17737536 | APPARATUS FOR IMPROVED HIGH PRESSURE PLASMA PROCESSING | May 2022 | April 2025 | Allow | 35 | 1 | 0 | No | No |
| 17721428 | SPUTTERING APPARATUS AND METHOD FOR FABRICATING SEMICONDUCTOR DEVICE USING THE SAME | April 2022 | March 2023 | Allow | 11 | 1 | 0 | No | No |
| 17714502 | METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE USING IMPROVED SHIELD CONFIGURATIONS | April 2022 | February 2023 | Allow | 10 | 1 | 0 | No | No |
| 17713603 | PULSED-DC POWER GENERATOR AND METHOD OF AUTOMATICALLY ADJUSTING ARC EXTINCTION PARAMETERS | April 2022 | October 2024 | Allow | 30 | 1 | 0 | No | No |
| 17657262 | FILM FORMATION APPARATUS | March 2022 | March 2025 | Allow | 35 | 1 | 0 | Yes | No |
| 17642462 | MULTI-LAYER COATING | March 2022 | December 2024 | Allow | 33 | 1 | 1 | No | No |
| 17688120 | PLASMA PROCESSING TOOL AND OPERATING METHOD THEREOF | March 2022 | March 2025 | Allow | 37 | 1 | 0 | No | No |
| 17666703 | Titanium Sputtering Target, Production Method Therefor, And Method For Producing Titanium-Containing Thin Film | February 2022 | August 2024 | Allow | 30 | 1 | 0 | No | No |
| 17589498 | SYSTEM FOR FORMING NANO-LAMINATE OPTICAL COATING | January 2022 | October 2023 | Allow | 20 | 1 | 0 | No | No |
| 17580813 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD | January 2022 | April 2023 | Allow | 15 | 1 | 0 | Yes | No |
| 17628065 | SPUTTERING TARGET FOR MAGNETIC RECORDING MEDIUM | January 2022 | September 2024 | Allow | 32 | 2 | 0 | No | No |
| 17626394 | FE-PT-BN-BASED SPUTTERING TARGET AND PRODUCTION METHOD THEREFOR | January 2022 | December 2023 | Abandon | 23 | 0 | 0 | No | No |
| 17626244 | MOVEMENT SYSTEMS FOR SPUTTER COATING OF NON-FLAT SUBSTRATES | January 2022 | June 2024 | Allow | 29 | 1 | 0 | No | No |
| 17597191 | SPUTTERING TARGET AND METHOD OF PRODUCING SPUTTERING TARGET | December 2021 | February 2024 | Allow | 25 | 1 | 0 | No | No |
| 17563237 | IGZO SPUTTERING TARGET | December 2021 | August 2023 | Allow | 20 | 1 | 0 | No | No |
| 17552505 | DEPOSITION SYSTEM WITH A MULTI-CATHODE | December 2021 | March 2023 | Allow | 15 | 1 | 0 | No | No |
| 17547626 | METHOD OF FORMING MATERIAL LAYER | December 2021 | March 2025 | Allow | 39 | 3 | 0 | Yes | No |
| 17524330 | DC PLASMA CONTROL FOR ELECTRON ENHANCED MATERIAL PROCESSING | November 2021 | August 2022 | Allow | 9 | 1 | 1 | No | No |
| 17606199 | ANODE FOR PVD PROCESSES | October 2021 | April 2025 | Allow | 42 | 3 | 0 | Yes | No |
| 17507122 | APPARATUS FOR GENERATING MAGNETIC FIELDS ON SUBSTRATES DURING SEMICONDUCTOR PROCESSING | October 2021 | March 2024 | Allow | 29 | 1 | 0 | Yes | No |
| 17503994 | Deposition System With Multi-Cathode And Method Of Manufacture Thereof | October 2021 | January 2023 | Allow | 15 | 0 | 0 | No | No |
| 17482833 | SINGLE BEAM PLASMA SOURCE | September 2021 | September 2024 | Allow | 36 | 1 | 0 | No | No |
| 17474403 | FILM FORMATION APPARATUS | September 2021 | January 2024 | Allow | 28 | 1 | 0 | Yes | No |
| 17433140 | Vacuum Processing Apparatus | August 2021 | December 2023 | Allow | 27 | 1 | 0 | Yes | No |
| 17433203 | METHOD FOR PRODUCING TARGETS FOR PHYSICAL VAPOR DEPOSITION (PVD) | August 2021 | December 2024 | Allow | 40 | 3 | 0 | No | No |
| 17445231 | INITIAL TREATMENT METHOD FOR TARGET MATERIAL FOR PHYSICAL VAPOR DEPOSITION PROCESS, AND CONTROLLER | August 2021 | May 2024 | Abandon | 33 | 2 | 0 | No | No |
| 17427730 | AG ALLOY SPUTTERING TARGET, AND AG ALLOY FILM | August 2021 | April 2024 | Abandon | 32 | 1 | 0 | No | No |
| 17426668 | Ag ALLOY SPUTTERING TARGET, AND Ag ALLOY FILM | July 2021 | November 2023 | Abandon | 28 | 1 | 0 | No | No |
| 17388638 | SPUTTERING APPARATUS AND FILM FORMING METHOD | July 2021 | April 2023 | Allow | 21 | 1 | 1 | No | No |
| 17384867 | SPUTTERING TARGET AND METHOD FOR MANUFACTURING THE SAME | July 2021 | March 2023 | Allow | 20 | 1 | 0 | No | No |
| 17425386 | Sputtering Target Product And Method For Producing Recycled Sputtering Target Product | July 2021 | April 2024 | Allow | 32 | 1 | 0 | No | No |
| 17384058 | APPARATUS AND METHOD FOR PERFORMING SPUTTERING PROCESS | July 2021 | August 2023 | Allow | 25 | 2 | 0 | No | No |
| 17425280 | ION BEAM DELAYERING SYSTEM AND METHOD, AND ENDPOINT MONITORING SYSTEM AND METHOD THEREFOR | July 2021 | July 2024 | Abandon | 36 | 1 | 0 | No | No |
| 17380806 | APPARATUS AND METHOD FABRICATING SEMICONDUCTOR DEVICE | July 2021 | March 2024 | Allow | 32 | 1 | 0 | No | No |
| 17423470 | METHOD FOR PREPARING BISMUTH OXIDE NANOWIRE FILMS BY HEATING IN UPSIDE DOWN POSITION | July 2021 | December 2024 | Allow | 41 | 0 | 1 | No | No |
| 17369968 | SPUTTERING EQUIPMENT AND OPERATION METHOD THEREOF | July 2021 | December 2022 | Allow | 18 | 1 | 0 | No | No |
| 17354121 | FILM FORMING APPARATUS AND FILM FORMING METHOD | June 2021 | September 2023 | Allow | 27 | 2 | 0 | No | No |
| 17416001 | A MAGNET ARRANGEMENT FOR A PLASMA SOURCE FOR PERFORMING PLASMA TREATMENTS | June 2021 | November 2023 | Allow | 29 | 2 | 0 | No | No |
This analysis examines appeal outcomes and the strategic value of filing appeals for examiner BERMAN, JASON.
With a 50.0% reversal rate, the PTAB reverses the examiner's rejections in a meaningful percentage of cases. This reversal rate is above the USPTO average, indicating that appeals have better success here than typical.
Filing a Notice of Appeal can sometimes lead to allowance even before the appeal is fully briefed or decided by the PTAB. This occurs when the examiner or their supervisor reconsiders the rejection during the mandatory appeal conference (MPEP § 1207.01) after the appeal is filed.
In this dataset, 34.5% of applications that filed an appeal were subsequently allowed. This appeal filing benefit rate is above the USPTO average, suggesting that filing an appeal can be an effective strategy for prompting reconsideration.
✓ Appeals to PTAB show good success rates. If you have a strong case on the merits, consider fully prosecuting the appeal to a Board decision.
✓ Filing a Notice of Appeal is strategically valuable. The act of filing often prompts favorable reconsideration during the mandatory appeal conference.
Examiner BERMAN, JASON works in Art Unit 1794 and has examined 431 patent applications in our dataset. With an allowance rate of 80.5%, this examiner has a below-average tendency to allow applications. Applications typically reach final disposition in approximately 30 months.
Examiner BERMAN, JASON's allowance rate of 80.5% places them in the 44% percentile among all USPTO examiners. This examiner has a below-average tendency to allow applications.
On average, applications examined by BERMAN, JASON receive 1.90 office actions before reaching final disposition. This places the examiner in the 60% percentile for office actions issued. This examiner issues a slightly above-average number of office actions.
The median time to disposition (half-life) for applications examined by BERMAN, JASON is 30 months. This places the examiner in the 40% percentile for prosecution speed. Prosecution timelines are slightly slower than average with this examiner.
Conducting an examiner interview provides a +13.3% benefit to allowance rate for applications examined by BERMAN, JASON. This interview benefit is in the 55% percentile among all examiners. Recommendation: Interviews provide an above-average benefit with this examiner and are worth considering.
When applicants file an RCE with this examiner, 29.2% of applications are subsequently allowed. This success rate is in the 45% percentile among all examiners. Strategic Insight: RCEs show below-average effectiveness with this examiner. Carefully evaluate whether an RCE or continuation is the better strategy.
This examiner enters after-final amendments leading to allowance in 42.3% of cases where such amendments are filed. This entry rate is in the 58% percentile among all examiners. Strategic Recommendation: This examiner shows above-average receptiveness to after-final amendments. If your amendments clearly overcome the rejections and do not raise new issues, consider filing after-final amendments before resorting to an RCE.
When applicants request a pre-appeal conference (PAC) with this examiner, 40.0% result in withdrawal of the rejection or reopening of prosecution. This success rate is in the 34% percentile among all examiners. Note: Pre-appeal conferences show below-average success with this examiner. Consider whether your arguments are strong enough to warrant a PAC request.
This examiner withdraws rejections or reopens prosecution in 71.4% of appeals filed. This is in the 53% percentile among all examiners. Of these withdrawals, 35.0% occur early in the appeal process (after Notice of Appeal but before Appeal Brief). Strategic Insight: This examiner shows above-average willingness to reconsider rejections during appeals. The mandatory appeal conference (MPEP § 1207.01) provides an opportunity for reconsideration.
When applicants file petitions regarding this examiner's actions, 34.8% are granted (fully or in part). This grant rate is in the 29% percentile among all examiners. Strategic Note: Petitions show below-average success regarding this examiner's actions. Ensure you have a strong procedural basis before filing.
Examiner's Amendments: This examiner makes examiner's amendments in 0.0% of allowed cases (in the 7% percentile). This examiner rarely makes examiner's amendments compared to other examiners. You should expect to make all necessary claim amendments yourself through formal amendment practice.
Quayle Actions: This examiner issues Ex Parte Quayle actions in 0.0% of allowed cases (in the 7% percentile). This examiner rarely issues Quayle actions compared to other examiners. Allowances typically come directly without a separate action for formal matters.
Based on the statistical analysis of this examiner's prosecution patterns, here are tailored strategic recommendations:
Not Legal Advice: The information provided in this report is for informational purposes only and does not constitute legal advice. You should consult with a qualified patent attorney or agent for advice specific to your situation.
No Guarantees: We do not provide any guarantees as to the accuracy, completeness, or timeliness of the statistics presented above. Patent prosecution statistics are derived from publicly available USPTO data and are subject to data quality limitations, processing errors, and changes in USPTO practices over time.
Limitation of Liability: Under no circumstances will IronCrow AI be liable for any outcome, decision, or action resulting from your reliance on the statistics, analysis, or recommendations presented in this report. Past prosecution patterns do not guarantee future results.
Use at Your Own Risk: While we strive to provide accurate and useful prosecution statistics, you should independently verify any information that is material to your prosecution strategy and use your professional judgment in all patent prosecution matters.