Detailed information about the 100 most recent patent applications.
| Application Number | Title | Filing Date | Disposal Date | Disposition | Time (months) | Office Actions | Restrictions | Interview | Appeal |
|---|---|---|---|---|---|---|---|---|---|
| 18612641 | FILM FORMING APPARATUS | March 2024 | May 2025 | Allow | 13 | 0 | 0 | No | No |
| 18237934 | METHODS AND APPARATUS FOR CONTROLLING ION FRACTION IN PHYSICAL VAPOR DEPOSITION PROCESSES | August 2023 | July 2024 | Allow | 11 | 1 | 0 | No | No |
| 18547597 | HOT-ROLLED COPPER ALLOY SHEET AND SPUTTERING TARGET | August 2023 | February 2025 | Abandon | 18 | 0 | 1 | No | No |
| 18145400 | NONMAGNETIC MATERIAL-DISPERSED FE-PT BASED SPUTTERING TARGET | December 2022 | November 2024 | Allow | 23 | 4 | 1 | Yes | No |
| 18067485 | PREPARATION METHOD OF NIOBIUM DISELENIDE FILM WITH ULTRA-LOW FRICTION AND LOW ELECTRICAL NOISE UNDER SLIDING ELECTRICAL CONTACT IN VACUUM | December 2022 | February 2025 | Allow | 26 | 2 | 0 | No | No |
| 18008459 | SUPPORT BODY, MANUFACTURING APPARATUS FOR SUPPORT BODY, AND MANUFACTURING METHOD FOR SUPPORT BODY | December 2022 | April 2025 | Allow | 28 | 2 | 1 | Yes | No |
| 18072483 | DEPOSITION METHOD FOR TUNING MAGNETIC FIELD DISTRIBUTION OF DEPOSITION EQUIPMENT | November 2022 | September 2024 | Allow | 21 | 2 | 1 | Yes | No |
| 17986766 | ANALYTE SENSORS AND METHODS FOR FABRICATING ANALYTE SENSORS | November 2022 | July 2024 | Allow | 20 | 0 | 0 | Yes | No |
| 17946139 | Electrically and Magnetically Enhanced Ionized Physical Vapor Deposition Unbalanced Sputtering Source | September 2022 | February 2024 | Abandon | 17 | 1 | 1 | No | No |
| 17822107 | MULTIFOCAL MAGNETRON DESIGN FOR PHYSICAL VAPOR DEPOSITION PROCESSING ON A SINGLE CATHODE | August 2022 | December 2024 | Allow | 28 | 2 | 1 | Yes | No |
| 17891883 | COPPER-BASED ALLOY SPUTTERING TARGET AND METHOD FOR MAKING THE SAME | August 2022 | February 2025 | Abandon | 30 | 2 | 1 | No | No |
| 17891809 | CATHODE UNIT FOR MAGNETRON SPUTTERING APPARATUS AND MAGNETRON SPUTTERING APPARATUS | August 2022 | August 2024 | Allow | 24 | 2 | 0 | Yes | No |
| 17794329 | MOVABLE MAGNET ARRAY FOR MAGNETRON SPUTTERING | July 2022 | October 2024 | Allow | 27 | 1 | 0 | Yes | No |
| 17867100 | SPUTTERING APPARATUS, FILM FORMATION METHOD, AND METHOD FOR MANUFACTURING PRODUCT | July 2022 | September 2024 | Allow | 26 | 2 | 1 | Yes | No |
| 17811899 | METHOD FOR FORMING LAYER | July 2022 | March 2025 | Allow | 32 | 4 | 0 | Yes | No |
| 17848745 | MODULAR SPUTTERING TARGET WITH PRECIOUS METAL INSERT AND SKIRT | June 2022 | March 2025 | Allow | 33 | 4 | 0 | Yes | No |
| 17783609 | METHOD AND APPARATUS FOR DEPOSITION OF PIEZO-ELECTRIC MATERIALS | June 2022 | May 2025 | Allow | 35 | 2 | 1 | Yes | No |
| 17776721 | SPUTTER DEPOSITION | May 2022 | November 2024 | Allow | 30 | 2 | 1 | Yes | No |
| 17737361 | ELECTROMAGNET PULSING EFFECT ON PVD STEP COVERAGE | May 2022 | February 2024 | Allow | 21 | 2 | 1 | Yes | No |
| 17715642 | SYSTEMS AND METHODS FOR PHYSICAL VAPOR DEPOSITION OF SILICON NITRIDE COATINGS HAVING ANTIMICROBIAL AND OSTEOGENIC ENHANCEMENTS | April 2022 | December 2024 | Abandon | 32 | 4 | 1 | No | No |
| 17763896 | TRANSPARENT ELECTRICALLY CONDUCTIVE FILM AND PRODUCING METHOD THEREOF | March 2022 | June 2024 | Abandon | 26 | 0 | 1 | No | No |
| 17693666 | SPUTTERING TARGETS AND DEVICES INCLUDING MO, NB, AND TA, AND METHODS | March 2022 | March 2024 | Abandon | 24 | 0 | 1 | No | No |
| 17687673 | SPUTTER MAGNETRON FOR OPERATING WITH OTHER PLASMA SOURCES | March 2022 | October 2024 | Abandon | 32 | 1 | 1 | Yes | No |
| 17631855 | SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD | January 2022 | June 2025 | Allow | 41 | 2 | 1 | Yes | No |
| 17574950 | PROFILED SPUTTERING TARGET AND METHOD OF MAKING THE SAME | January 2022 | September 2024 | Allow | 32 | 4 | 1 | Yes | No |
| 17554589 | MULTI RACETRACK CATHODIC ARC | December 2021 | September 2024 | Allow | 33 | 2 | 0 | Yes | No |
| 17619354 | NICKEL ALLOY SPUTTERING TARGET | December 2021 | April 2024 | Abandon | 28 | 1 | 0 | No | No |
| 17617555 | METHOD OF DEPOSITING A MATERIAL ON A SUBSTRATE | December 2021 | August 2024 | Abandon | 32 | 1 | 1 | No | No |
| 17614479 | BIAS MAGNETIC FIELD CONTROL METHOD, MAGNETIC THIN FILM DEPOSITION METHOD,CHAMBER, AND APPARATUS | November 2021 | June 2024 | Abandon | 30 | 2 | 1 | No | No |
| 17525403 | SHIELDING MECHANISM AND THIN-FILM-DEPOSITION EQUIPMENT USING THE SAME | November 2021 | January 2024 | Allow | 26 | 2 | 1 | No | No |
| 17517626 | SYSTEMS AND METHODS FOR IN-SITU ETCHING PRIOR TO PHYSICAL VAPOR DEPOSITION IN THE SAME CHAMBER | November 2021 | August 2024 | Abandon | 33 | 4 | 1 | No | No |
| 17507252 | TILTED PVD SOURCE WITH ROTATING PEDESTAL | October 2021 | December 2023 | Allow | 26 | 2 | 1 | Yes | No |
| 17601991 | DEVICE AND METHOD FOR COATING SUBSTRATES HAVING PLANAR OR SHAPED SURFACES BY MEANS OF MAGNETRON SPUTTERING | October 2021 | June 2025 | Allow | 44 | 3 | 1 | Yes | No |
| 17495730 | Magnetically Enhanced High Density Plasma-Chemical Vapor Deposition Plasma Source For Depositing Diamond and Diamond-Like Films | October 2021 | October 2024 | Allow | 36 | 2 | 1 | Yes | No |
| 17490840 | METHODS AND APPARATUS FOR CONTROLLING ION FRACTION IN PHYSICAL VAPOR DEPOSITION PROCESSES | September 2021 | July 2023 | Allow | 22 | 2 | 0 | No | No |
| 17488126 | MAGNETIC-FIELD-DISTRIBUTION TUNER, DEPOSITION EQUIPMENT AND METHOD OF DEPOSITION | September 2021 | March 2023 | Abandon | 18 | 1 | 1 | No | No |
| 17469228 | FILM FORMING METHOD, FILM FORMING APPARATUS, AND PROGRAM | September 2021 | May 2024 | Allow | 32 | 4 | 1 | Yes | No |
| 17435120 | TUNGSTEN OXIDE SPUTTERING TARGET | August 2021 | May 2024 | Abandon | 33 | 1 | 0 | No | No |
| 17407668 | COMPONENT AND SEMICONDUCTOR MANUFACTURING DEVICE | August 2021 | February 2024 | Abandon | 30 | 2 | 0 | No | No |
| 17408221 | SYSTEMS AND METHODS FOR AN IMPROVED MAGNETRON ELECTROMAGNETIC ASSEMBLY | August 2021 | January 2023 | Allow | 17 | 2 | 0 | Yes | No |
| 17445247 | MAGNETRON PLASMA APPARATUS | August 2021 | March 2023 | Abandon | 19 | 0 | 1 | No | No |
| 17427120 | SPUTTERING TARGET | July 2021 | April 2024 | Abandon | 32 | 1 | 0 | No | No |
| 17389264 | SYSTEMS AND METHODS FOR A MAGNETRON WITH A SEGMENTED TARGET CONFIGURATION | July 2021 | December 2024 | Abandon | 41 | 6 | 0 | Yes | No |
| 17385052 | Sputtering Cathode, Sputtering Cathode Assembly, and Sputtering Apparatus | July 2021 | April 2022 | Allow | 9 | 1 | 1 | No | No |
| 17384240 | SHIELD COOLING ASSEMBLY, REACTION CHAMBER AND SEMICONDUCTOR PROCESSING APPARATUS | July 2021 | January 2025 | Allow | 42 | 4 | 0 | Yes | No |
| 17304396 | SILICON-GERMANIUM BASED OPTICAL FILTER | June 2021 | December 2024 | Abandon | 41 | 4 | 1 | Yes | No |
| 17352168 | Magnetically Enhanced High Density Plasma-Chemical Vapor Deposition Plasma Source For Depositing Diamond and Diamond-Like Films | June 2021 | September 2023 | Abandon | 27 | 2 | 1 | Yes | No |
| 17414446 | VACUUM SYSTEM AND METHOD TO DEPOSIT A COMPOUND LAYER | June 2021 | September 2024 | Allow | 39 | 2 | 1 | Yes | No |
| 17311906 | ROTARY MAGNETRON SPUTTERING WITH INDIVIDUALLY ADJUSTABLE MAGNETIC FIELD | June 2021 | June 2025 | Allow | 48 | 4 | 1 | Yes | No |
| 17333732 | METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE | May 2021 | August 2023 | Allow | 26 | 2 | 1 | Yes | No |
| 17295191 | CR-SI SINTERED BODY | May 2021 | December 2023 | Allow | 31 | 2 | 1 | Yes | No |
| 17318519 | LaCoO3 THIN FILM DEPOSITION BY DC METAL CO-SPUTTERING | May 2021 | September 2024 | Abandon | 40 | 5 | 1 | No | No |
| 17308372 | APPARATUS AND METHOD FOR PHYSICAL VAPOR DEPOSITION | May 2021 | February 2024 | Allow | 33 | 2 | 1 | Yes | No |
| 17241237 | DC Magnetron Sputtering | April 2021 | March 2023 | Allow | 23 | 2 | 0 | Yes | No |
| 17232399 | METHOD OF MAKING COATED ARTICLE HAVING ANTIBACTERIAL AND/OR ANTIFUNGAL COATING AND RESULTING PRODUCT | April 2021 | May 2023 | Abandon | 25 | 1 | 0 | No | No |
| 17215939 | SPUTTERING APPARATUS INCLUDING GAS DISTRIBUTION SYSTEM | March 2021 | February 2023 | Allow | 22 | 2 | 1 | Yes | No |
| 17278083 | DEPOSITION APPARATUS AND DEPOSITION METHOD | March 2021 | April 2024 | Abandon | 37 | 0 | 1 | No | No |
| 17276627 | Mn-Ta-W-Cu-O-BASED SPUTTERING TARGET, AND PRODUCTION METHOD THEREFOR | March 2021 | March 2025 | Allow | 48 | 2 | 1 | Yes | No |
| 17249641 | ELECTROCHROMIC DEVICES | March 2021 | March 2024 | Abandon | 36 | 1 | 0 | No | No |
| 17172327 | CATHODE UNIT AND FILM FORMING APPARATUS | February 2021 | October 2022 | Allow | 20 | 2 | 1 | Yes | No |
| 17152070 | Physical Vapor Deposition Apparatus And Methods With Gradient Thickness Target | January 2021 | March 2024 | Abandon | 38 | 4 | 1 | Yes | No |
| 17139445 | Method and Apparatus for Depositing a Material | December 2020 | September 2023 | Allow | 33 | 4 | 1 | Yes | No |
| 17131159 | FABRIC COLORING METHOD AND COLORED FABRIC | December 2020 | August 2022 | Allow | 20 | 2 | 1 | Yes | No |
| 17127527 | SPUTTERING A LAYER ON A SUBSTRATE USING A HIGH-ENERGY DENSITY PLASMA MAGNETRON | December 2020 | August 2023 | Allow | 32 | 2 | 1 | Yes | No |
| 17110518 | MULTICATHODE DEPOSITION SYSTEM AND METHODS | December 2020 | April 2024 | Allow | 41 | 4 | 1 | Yes | Yes |
| 15734889 | SPUTTERING APPARATUS | December 2020 | April 2022 | Abandon | 17 | 1 | 0 | No | No |
| 17109596 | Processing System For Small Substrates | December 2020 | July 2023 | Abandon | 31 | 1 | 1 | No | No |
| 17106526 | Sputtering Cathode, Sputtering Cathode Assembly, and Sputtering Apparatus | November 2020 | June 2021 | Allow | 7 | 1 | 0 | Yes | No |
| 17101933 | METHODS AND APPARATUS FOR CONTROLLING ION FRACTION IN PHYSICAL VAPOR DEPOSITION PROCESSES | November 2020 | August 2022 | Abandon | 21 | 2 | 0 | No | No |
| 17056241 | METHOD OF MAKING A DECORATIVE ARTICLE, SUCH AS A JEWELLERY PIECE | November 2020 | July 2023 | Allow | 32 | 3 | 1 | Yes | No |
| 17089100 | Heat-Transfer Roller for Sputtering and Method of Making the Same | November 2020 | February 2022 | Abandon | 16 | 2 | 0 | No | No |
| 17050718 | SPUTTERING TARGET FOR MAGNETIC RECORDING MEDIUM | October 2020 | December 2022 | Abandon | 25 | 2 | 1 | No | No |
| 17075484 | SPUTTERING METHOD | October 2020 | March 2023 | Allow | 29 | 2 | 1 | Yes | No |
| 17044687 | C-CONTAINING SPUTTERING TARGET AND METHOD FOR PRODUCING SAME | October 2020 | March 2024 | Abandon | 41 | 0 | 1 | No | No |
| 16971101 | METHOD FOR MANUFACTURING DECORATIVE MEMBER, AND DECORATIVE MEMBER | September 2020 | May 2024 | Allow | 44 | 4 | 2 | Yes | No |
| 17030109 | Sputtering Cathode, Sputtering Cathode Assembly, and Sputtering Apparatus | September 2020 | June 2021 | Allow | 9 | 1 | 1 | Yes | No |
| 16982125 | Tungsten Silicide Target Member And Method For Manufacturing Same, And Method For Manufacturing Tungsten Silicide Film | September 2020 | May 2025 | Allow | 56 | 4 | 1 | No | Yes |
| 16997782 | ENHANCED CATHODIC ARC SOURCE FOR ARC PLASMA DEPOSITION | August 2020 | May 2022 | Allow | 21 | 0 | 1 | Yes | No |
| 16969809 | METHOD FOR PRODUCING AMORPHOUS THIN FILM | August 2020 | September 2022 | Allow | 25 | 2 | 1 | Yes | No |
| 16987984 | FILM FORMING APPARATUS, METHOD FOR MANUFACTURING FILM-FORMED PRODUCT, AND METHOD FOR MANUFACTURING ELECTRONIC COMPONENT | August 2020 | March 2022 | Abandon | 20 | 1 | 0 | No | No |
| 16938465 | HIGH PRESSURE RF-DC SPUTTERING AND METHODS TO IMPROVE FILM UNIFORMITY AND STEP-COVERAGE OF THIS PROCESS | July 2020 | April 2022 | Abandon | 20 | 1 | 1 | No | No |
| 16929347 | TARGET STRUCTURE AND FILM FORMING APPARATUS | July 2020 | July 2023 | Allow | 36 | 6 | 1 | Yes | No |
| 16960384 | Sputtering Target and Magnetic Film | July 2020 | November 2023 | Allow | 40 | 2 | 1 | Yes | No |
| 16902194 | METHODS AND APPARATUS FOR REDUCING SPUTTERING OF A GROUNDED SHIELD IN A PROCESS CHAMBER | June 2020 | October 2023 | Allow | 40 | 3 | 1 | Yes | Yes |
| 16897762 | HEAT-TRANSFER ROLLER FOR SPUTTERING AND METHOD OF MAKING THE SAME | June 2020 | February 2022 | Abandon | 21 | 5 | 1 | Yes | No |
| 16880481 | Optimum Surface Texture Geometry | May 2020 | April 2022 | Abandon | 23 | 1 | 0 | No | No |
| 16868940 | DUAL POWER FEED ROTARY SPUTTERING CATHODE | May 2020 | March 2022 | Abandon | 23 | 1 | 0 | No | No |
| 15929467 | METHOD TO PRODUCE HIGH DENSITY DIAMOND LIKE CARBON THIN FILMS | May 2020 | July 2022 | Abandon | 26 | 2 | 1 | No | No |
| 16753898 | TARGET MATERIAL FOR DEPOSITION OF MOLYBDENUM OXIDE LAYERS | April 2020 | August 2023 | Allow | 40 | 2 | 1 | Yes | No |
| 16838295 | Sputtering Cathode, Sputtering Cathode Assembly, and Sputtering Apparatus | April 2020 | October 2024 | Abandon | 54 | 5 | 1 | Yes | Yes |
| 16805628 | MICROMECHANIC STRUCTURE AND METHOD FOR MAKING THE MICROMECHANIC STRUCTURE | February 2020 | February 2023 | Abandon | 36 | 0 | 1 | No | No |
| 16642364 | METHOD FOR COATING ON SURFACE OF MEDICAL PEEK MATERIAL, TITANIUM HAVING MICROPOROUS STRUCTURE | February 2020 | August 2023 | Allow | 41 | 2 | 0 | Yes | No |
| 16782499 | MODIFIABLE MAGNET CONFIGURATION FOR ARC VAPORIZATION SOURCES | February 2020 | August 2022 | Allow | 31 | 2 | 1 | No | No |
| 16730947 | SELECTIVE STEP COVERAGE FOR MICRO-FABRICATED STRUCTURES | December 2019 | July 2022 | Allow | 31 | 2 | 1 | Yes | No |
| 16469266 | DEVICE, METHOD AND USE FOR THE COATING OF LENSES | December 2019 | July 2023 | Allow | 50 | 4 | 1 | Yes | No |
| 16619840 | COATING CONTROL USING FORWARD PARAMETER CORRECTION AND ADAPTED REVERSE ENGINEERING | December 2019 | February 2023 | Allow | 38 | 2 | 1 | Yes | No |
| 16619154 | MOTH-EYE TRANSFER MOLD, METHOD OF MANUFACTURING MOTH-EYE TRANSFER MOLD, AND METHOD OF TRANSFERRING MOTH-EYE STRUCTURE | December 2019 | June 2021 | Allow | 19 | 2 | 1 | Yes | No |
| 16607829 | SOFT MAGNETIC MULTILAYER DESPOSITION APPARATUS, METHODS OF MANUFACTURING AND MAGNETIC MULTILAYER | October 2019 | July 2024 | Abandon | 57 | 2 | 2 | Yes | No |
| 16653339 | APPARATUS FOR PHYSICAL VAPOR DEPOSITION AND METHOD FOR FORMING A LAYER | October 2019 | August 2024 | Allow | 58 | 8 | 1 | Yes | No |
| 16541635 | APPARATUS AND A METHOD OF CONTROLLING THICKNESS VARIATION IN A MATERIAL LAYER FORMED USING PHYSICAL VAPOUR DEPOSITION | August 2019 | October 2023 | Allow | 50 | 6 | 1 | Yes | No |
This analysis examines appeal outcomes and the strategic value of filing appeals for examiner BAND, MICHAEL A.
With a 46.2% reversal rate, the PTAB reverses the examiner's rejections in a meaningful percentage of cases. This reversal rate is above the USPTO average, indicating that appeals have better success here than typical.
Filing a Notice of Appeal can sometimes lead to allowance even before the appeal is fully briefed or decided by the PTAB. This occurs when the examiner or their supervisor reconsiders the rejection during the mandatory appeal conference (MPEP § 1207.01) after the appeal is filed.
In this dataset, 28.4% of applications that filed an appeal were subsequently allowed. This appeal filing benefit rate is below the USPTO average, suggesting that filing an appeal has limited effectiveness in prompting favorable reconsideration.
✓ Appeals to PTAB show good success rates. If you have a strong case on the merits, consider fully prosecuting the appeal to a Board decision.
⚠ Filing a Notice of Appeal shows limited benefit. Consider other strategies like interviews or amendments before appealing.
Examiner BAND, MICHAEL A works in Art Unit 1794 and has examined 337 patent applications in our dataset. With an allowance rate of 57.6%, this examiner allows applications at a lower rate than most examiners at the USPTO. Applications typically reach final disposition in approximately 39 months.
Examiner BAND, MICHAEL A's allowance rate of 57.6% places them in the 12% percentile among all USPTO examiners. This examiner is less likely to allow applications than most examiners at the USPTO.
On average, applications examined by BAND, MICHAEL A receive 3.25 office actions before reaching final disposition. This places the examiner in the 98% percentile for office actions issued. This examiner issues more office actions than most examiners, which may indicate thorough examination or difficulty in reaching agreement with applicants.
The median time to disposition (half-life) for applications examined by BAND, MICHAEL A is 39 months. This places the examiner in the 10% percentile for prosecution speed. Applications take longer to reach final disposition with this examiner compared to most others.
Conducting an examiner interview provides a +60.1% benefit to allowance rate for applications examined by BAND, MICHAEL A. This interview benefit is in the 97% percentile among all examiners. Recommendation: Interviews are highly effective with this examiner and should be strongly considered as a prosecution strategy. Per MPEP § 713.10, interviews are available at any time before the Notice of Allowance is mailed or jurisdiction transfers to the PTAB.
When applicants file an RCE with this examiner, 19.9% of applications are subsequently allowed. This success rate is in the 13% percentile among all examiners. Strategic Insight: RCEs show lower effectiveness with this examiner compared to others. Consider whether a continuation application might be more strategic, especially if you need to add new matter or significantly broaden claims.
This examiner enters after-final amendments leading to allowance in 5.2% of cases where such amendments are filed. This entry rate is in the 2% percentile among all examiners. Strategic Recommendation: This examiner rarely enters after-final amendments compared to other examiners. You should generally plan to file an RCE or appeal rather than relying on after-final amendment entry. Per MPEP § 714.12, primary examiners have discretion in entering after-final amendments, and this examiner exercises that discretion conservatively.
When applicants request a pre-appeal conference (PAC) with this examiner, 19.0% result in withdrawal of the rejection or reopening of prosecution. This success rate is in the 24% percentile among all examiners. Note: Pre-appeal conferences show limited success with this examiner compared to others. While still worth considering, be prepared to proceed with a full appeal brief if the PAC does not result in favorable action.
This examiner withdraws rejections or reopens prosecution in 52.7% of appeals filed. This is in the 18% percentile among all examiners. Of these withdrawals, 27.6% occur early in the appeal process (after Notice of Appeal but before Appeal Brief). Strategic Insight: This examiner rarely withdraws rejections during the appeal process compared to other examiners. If you file an appeal, be prepared to fully prosecute it to a PTAB decision. Per MPEP § 1207, the examiner will prepare an Examiner's Answer maintaining the rejections.
When applicants file petitions regarding this examiner's actions, 35.1% are granted (fully or in part). This grant rate is in the 30% percentile among all examiners. Strategic Note: Petitions show below-average success regarding this examiner's actions. Ensure you have a strong procedural basis before filing.
Examiner's Amendments: This examiner makes examiner's amendments in 0.3% of allowed cases (in the 54% percentile). This examiner makes examiner's amendments more often than average to place applications in condition for allowance (MPEP § 1302.04).
Quayle Actions: This examiner issues Ex Parte Quayle actions in 0.0% of allowed cases (in the 7% percentile). This examiner rarely issues Quayle actions compared to other examiners. Allowances typically come directly without a separate action for formal matters.
Based on the statistical analysis of this examiner's prosecution patterns, here are tailored strategic recommendations:
Not Legal Advice: The information provided in this report is for informational purposes only and does not constitute legal advice. You should consult with a qualified patent attorney or agent for advice specific to your situation.
No Guarantees: We do not provide any guarantees as to the accuracy, completeness, or timeliness of the statistics presented above. Patent prosecution statistics are derived from publicly available USPTO data and are subject to data quality limitations, processing errors, and changes in USPTO practices over time.
Limitation of Liability: Under no circumstances will IronCrow AI be liable for any outcome, decision, or action resulting from your reliance on the statistics, analysis, or recommendations presented in this report. Past prosecution patterns do not guarantee future results.
Use at Your Own Risk: While we strive to provide accurate and useful prosecution statistics, you should independently verify any information that is material to your prosecution strategy and use your professional judgment in all patent prosecution matters.