USPTO Examiner BAND MICHAEL A - Art Unit 1794

Recent Applications

Detailed information about the 100 most recent patent applications.

Application NumberTitleFiling DateDisposal DateDispositionTime (months)Office ActionsRestrictionsInterviewAppeal
18612641FILM FORMING APPARATUSMarch 2024May 2025Allow1300NoNo
18237934METHODS AND APPARATUS FOR CONTROLLING ION FRACTION IN PHYSICAL VAPOR DEPOSITION PROCESSESAugust 2023July 2024Allow1110NoNo
18547597HOT-ROLLED COPPER ALLOY SHEET AND SPUTTERING TARGETAugust 2023February 2025Abandon1801NoNo
18145400NONMAGNETIC MATERIAL-DISPERSED FE-PT BASED SPUTTERING TARGETDecember 2022November 2024Allow2341YesNo
18067485PREPARATION METHOD OF NIOBIUM DISELENIDE FILM WITH ULTRA-LOW FRICTION AND LOW ELECTRICAL NOISE UNDER SLIDING ELECTRICAL CONTACT IN VACUUMDecember 2022February 2025Allow2620NoNo
18008459SUPPORT BODY, MANUFACTURING APPARATUS FOR SUPPORT BODY, AND MANUFACTURING METHOD FOR SUPPORT BODYDecember 2022April 2025Allow2821YesNo
18072483DEPOSITION METHOD FOR TUNING MAGNETIC FIELD DISTRIBUTION OF DEPOSITION EQUIPMENTNovember 2022September 2024Allow2121YesNo
17986766ANALYTE SENSORS AND METHODS FOR FABRICATING ANALYTE SENSORSNovember 2022July 2024Allow2000YesNo
17946139Electrically and Magnetically Enhanced Ionized Physical Vapor Deposition Unbalanced Sputtering SourceSeptember 2022February 2024Abandon1711NoNo
17822107MULTIFOCAL MAGNETRON DESIGN FOR PHYSICAL VAPOR DEPOSITION PROCESSING ON A SINGLE CATHODEAugust 2022December 2024Allow2821YesNo
17891883COPPER-BASED ALLOY SPUTTERING TARGET AND METHOD FOR MAKING THE SAMEAugust 2022February 2025Abandon3021NoNo
17891809CATHODE UNIT FOR MAGNETRON SPUTTERING APPARATUS AND MAGNETRON SPUTTERING APPARATUSAugust 2022August 2024Allow2420YesNo
17794329MOVABLE MAGNET ARRAY FOR MAGNETRON SPUTTERINGJuly 2022October 2024Allow2710YesNo
17867100SPUTTERING APPARATUS, FILM FORMATION METHOD, AND METHOD FOR MANUFACTURING PRODUCTJuly 2022September 2024Allow2621YesNo
17811899METHOD FOR FORMING LAYERJuly 2022March 2025Allow3240YesNo
17848745MODULAR SPUTTERING TARGET WITH PRECIOUS METAL INSERT AND SKIRTJune 2022March 2025Allow3340YesNo
17783609METHOD AND APPARATUS FOR DEPOSITION OF PIEZO-ELECTRIC MATERIALSJune 2022May 2025Allow3521YesNo
17776721SPUTTER DEPOSITIONMay 2022November 2024Allow3021YesNo
17737361ELECTROMAGNET PULSING EFFECT ON PVD STEP COVERAGEMay 2022February 2024Allow2121YesNo
17715642SYSTEMS AND METHODS FOR PHYSICAL VAPOR DEPOSITION OF SILICON NITRIDE COATINGS HAVING ANTIMICROBIAL AND OSTEOGENIC ENHANCEMENTSApril 2022December 2024Abandon3241NoNo
17763896TRANSPARENT ELECTRICALLY CONDUCTIVE FILM AND PRODUCING METHOD THEREOFMarch 2022June 2024Abandon2601NoNo
17693666SPUTTERING TARGETS AND DEVICES INCLUDING MO, NB, AND TA, AND METHODSMarch 2022March 2024Abandon2401NoNo
17687673SPUTTER MAGNETRON FOR OPERATING WITH OTHER PLASMA SOURCESMarch 2022October 2024Abandon3211YesNo
17631855SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHODJanuary 2022June 2025Allow4121YesNo
17574950PROFILED SPUTTERING TARGET AND METHOD OF MAKING THE SAMEJanuary 2022September 2024Allow3241YesNo
17554589MULTI RACETRACK CATHODIC ARCDecember 2021September 2024Allow3320YesNo
17619354NICKEL ALLOY SPUTTERING TARGETDecember 2021April 2024Abandon2810NoNo
17617555METHOD OF DEPOSITING A MATERIAL ON A SUBSTRATEDecember 2021August 2024Abandon3211NoNo
17614479BIAS MAGNETIC FIELD CONTROL METHOD, MAGNETIC THIN FILM DEPOSITION METHOD,CHAMBER, AND APPARATUSNovember 2021June 2024Abandon3021NoNo
17525403SHIELDING MECHANISM AND THIN-FILM-DEPOSITION EQUIPMENT USING THE SAMENovember 2021January 2024Allow2621NoNo
17517626SYSTEMS AND METHODS FOR IN-SITU ETCHING PRIOR TO PHYSICAL VAPOR DEPOSITION IN THE SAME CHAMBERNovember 2021August 2024Abandon3341NoNo
17507252TILTED PVD SOURCE WITH ROTATING PEDESTALOctober 2021December 2023Allow2621YesNo
17601991DEVICE AND METHOD FOR COATING SUBSTRATES HAVING PLANAR OR SHAPED SURFACES BY MEANS OF MAGNETRON SPUTTERINGOctober 2021June 2025Allow4431YesNo
17495730Magnetically Enhanced High Density Plasma-Chemical Vapor Deposition Plasma Source For Depositing Diamond and Diamond-Like FilmsOctober 2021October 2024Allow3621YesNo
17490840METHODS AND APPARATUS FOR CONTROLLING ION FRACTION IN PHYSICAL VAPOR DEPOSITION PROCESSESSeptember 2021July 2023Allow2220NoNo
17488126MAGNETIC-FIELD-DISTRIBUTION TUNER, DEPOSITION EQUIPMENT AND METHOD OF DEPOSITIONSeptember 2021March 2023Abandon1811NoNo
17469228FILM FORMING METHOD, FILM FORMING APPARATUS, AND PROGRAMSeptember 2021May 2024Allow3241YesNo
17435120TUNGSTEN OXIDE SPUTTERING TARGETAugust 2021May 2024Abandon3310NoNo
17407668COMPONENT AND SEMICONDUCTOR MANUFACTURING DEVICEAugust 2021February 2024Abandon3020NoNo
17408221SYSTEMS AND METHODS FOR AN IMPROVED MAGNETRON ELECTROMAGNETIC ASSEMBLYAugust 2021January 2023Allow1720YesNo
17445247MAGNETRON PLASMA APPARATUSAugust 2021March 2023Abandon1901NoNo
17427120SPUTTERING TARGETJuly 2021April 2024Abandon3210NoNo
17389264SYSTEMS AND METHODS FOR A MAGNETRON WITH A SEGMENTED TARGET CONFIGURATIONJuly 2021December 2024Abandon4160YesNo
17385052Sputtering Cathode, Sputtering Cathode Assembly, and Sputtering ApparatusJuly 2021April 2022Allow911NoNo
17384240SHIELD COOLING ASSEMBLY, REACTION CHAMBER AND SEMICONDUCTOR PROCESSING APPARATUSJuly 2021January 2025Allow4240YesNo
17304396SILICON-GERMANIUM BASED OPTICAL FILTERJune 2021December 2024Abandon4141YesNo
17352168Magnetically Enhanced High Density Plasma-Chemical Vapor Deposition Plasma Source For Depositing Diamond and Diamond-Like FilmsJune 2021September 2023Abandon2721YesNo
17414446VACUUM SYSTEM AND METHOD TO DEPOSIT A COMPOUND LAYERJune 2021September 2024Allow3921YesNo
17311906ROTARY MAGNETRON SPUTTERING WITH INDIVIDUALLY ADJUSTABLE MAGNETIC FIELDJune 2021June 2025Allow4841YesNo
17333732METHODS AND APPARATUS FOR PROCESSING A SUBSTRATEMay 2021August 2023Allow2621YesNo
17295191CR-SI SINTERED BODYMay 2021December 2023Allow3121YesNo
17318519LaCoO3 THIN FILM DEPOSITION BY DC METAL CO-SPUTTERINGMay 2021September 2024Abandon4051NoNo
17308372APPARATUS AND METHOD FOR PHYSICAL VAPOR DEPOSITIONMay 2021February 2024Allow3321YesNo
17241237DC Magnetron SputteringApril 2021March 2023Allow2320YesNo
17232399METHOD OF MAKING COATED ARTICLE HAVING ANTIBACTERIAL AND/OR ANTIFUNGAL COATING AND RESULTING PRODUCTApril 2021May 2023Abandon2510NoNo
17215939SPUTTERING APPARATUS INCLUDING GAS DISTRIBUTION SYSTEMMarch 2021February 2023Allow2221YesNo
17278083DEPOSITION APPARATUS AND DEPOSITION METHODMarch 2021April 2024Abandon3701NoNo
17276627Mn-Ta-W-Cu-O-BASED SPUTTERING TARGET, AND PRODUCTION METHOD THEREFORMarch 2021March 2025Allow4821YesNo
17249641ELECTROCHROMIC DEVICESMarch 2021March 2024Abandon3610NoNo
17172327CATHODE UNIT AND FILM FORMING APPARATUSFebruary 2021October 2022Allow2021YesNo
17152070Physical Vapor Deposition Apparatus And Methods With Gradient Thickness TargetJanuary 2021March 2024Abandon3841YesNo
17139445Method and Apparatus for Depositing a MaterialDecember 2020September 2023Allow3341YesNo
17131159FABRIC COLORING METHOD AND COLORED FABRICDecember 2020August 2022Allow2021YesNo
17127527SPUTTERING A LAYER ON A SUBSTRATE USING A HIGH-ENERGY DENSITY PLASMA MAGNETRONDecember 2020August 2023Allow3221YesNo
17110518MULTICATHODE DEPOSITION SYSTEM AND METHODSDecember 2020April 2024Allow4141YesYes
15734889SPUTTERING APPARATUSDecember 2020April 2022Abandon1710NoNo
17109596Processing System For Small SubstratesDecember 2020July 2023Abandon3111NoNo
17106526Sputtering Cathode, Sputtering Cathode Assembly, and Sputtering ApparatusNovember 2020June 2021Allow710YesNo
17101933METHODS AND APPARATUS FOR CONTROLLING ION FRACTION IN PHYSICAL VAPOR DEPOSITION PROCESSESNovember 2020August 2022Abandon2120NoNo
17056241METHOD OF MAKING A DECORATIVE ARTICLE, SUCH AS A JEWELLERY PIECENovember 2020July 2023Allow3231YesNo
17089100Heat-Transfer Roller for Sputtering and Method of Making the SameNovember 2020February 2022Abandon1620NoNo
17050718SPUTTERING TARGET FOR MAGNETIC RECORDING MEDIUMOctober 2020December 2022Abandon2521NoNo
17075484SPUTTERING METHODOctober 2020March 2023Allow2921YesNo
17044687C-CONTAINING SPUTTERING TARGET AND METHOD FOR PRODUCING SAMEOctober 2020March 2024Abandon4101NoNo
16971101METHOD FOR MANUFACTURING DECORATIVE MEMBER, AND DECORATIVE MEMBERSeptember 2020May 2024Allow4442YesNo
17030109Sputtering Cathode, Sputtering Cathode Assembly, and Sputtering ApparatusSeptember 2020June 2021Allow911YesNo
16982125Tungsten Silicide Target Member And Method For Manufacturing Same, And Method For Manufacturing Tungsten Silicide FilmSeptember 2020May 2025Allow5641NoYes
16997782ENHANCED CATHODIC ARC SOURCE FOR ARC PLASMA DEPOSITIONAugust 2020May 2022Allow2101YesNo
16969809METHOD FOR PRODUCING AMORPHOUS THIN FILMAugust 2020September 2022Allow2521YesNo
16987984FILM FORMING APPARATUS, METHOD FOR MANUFACTURING FILM-FORMED PRODUCT, AND METHOD FOR MANUFACTURING ELECTRONIC COMPONENTAugust 2020March 2022Abandon2010NoNo
16938465HIGH PRESSURE RF-DC SPUTTERING AND METHODS TO IMPROVE FILM UNIFORMITY AND STEP-COVERAGE OF THIS PROCESSJuly 2020April 2022Abandon2011NoNo
16929347TARGET STRUCTURE AND FILM FORMING APPARATUSJuly 2020July 2023Allow3661YesNo
16960384Sputtering Target and Magnetic FilmJuly 2020November 2023Allow4021YesNo
16902194METHODS AND APPARATUS FOR REDUCING SPUTTERING OF A GROUNDED SHIELD IN A PROCESS CHAMBERJune 2020October 2023Allow4031YesYes
16897762HEAT-TRANSFER ROLLER FOR SPUTTERING AND METHOD OF MAKING THE SAMEJune 2020February 2022Abandon2151YesNo
16880481Optimum Surface Texture GeometryMay 2020April 2022Abandon2310NoNo
16868940DUAL POWER FEED ROTARY SPUTTERING CATHODEMay 2020March 2022Abandon2310NoNo
15929467METHOD TO PRODUCE HIGH DENSITY DIAMOND LIKE CARBON THIN FILMSMay 2020July 2022Abandon2621NoNo
16753898TARGET MATERIAL FOR DEPOSITION OF MOLYBDENUM OXIDE LAYERSApril 2020August 2023Allow4021YesNo
16838295Sputtering Cathode, Sputtering Cathode Assembly, and Sputtering ApparatusApril 2020October 2024Abandon5451YesYes
16805628MICROMECHANIC STRUCTURE AND METHOD FOR MAKING THE MICROMECHANIC STRUCTUREFebruary 2020February 2023Abandon3601NoNo
16642364METHOD FOR COATING ON SURFACE OF MEDICAL PEEK MATERIAL, TITANIUM HAVING MICROPOROUS STRUCTUREFebruary 2020August 2023Allow4120YesNo
16782499MODIFIABLE MAGNET CONFIGURATION FOR ARC VAPORIZATION SOURCESFebruary 2020August 2022Allow3121NoNo
16730947SELECTIVE STEP COVERAGE FOR MICRO-FABRICATED STRUCTURESDecember 2019July 2022Allow3121YesNo
16469266DEVICE, METHOD AND USE FOR THE COATING OF LENSESDecember 2019July 2023Allow5041YesNo
16619840COATING CONTROL USING FORWARD PARAMETER CORRECTION AND ADAPTED REVERSE ENGINEERINGDecember 2019February 2023Allow3821YesNo
16619154MOTH-EYE TRANSFER MOLD, METHOD OF MANUFACTURING MOTH-EYE TRANSFER MOLD, AND METHOD OF TRANSFERRING MOTH-EYE STRUCTUREDecember 2019June 2021Allow1921YesNo
16607829SOFT MAGNETIC MULTILAYER DESPOSITION APPARATUS, METHODS OF MANUFACTURING AND MAGNETIC MULTILAYEROctober 2019July 2024Abandon5722YesNo
16653339APPARATUS FOR PHYSICAL VAPOR DEPOSITION AND METHOD FOR FORMING A LAYEROctober 2019August 2024Allow5881YesNo
16541635APPARATUS AND A METHOD OF CONTROLLING THICKNESS VARIATION IN A MATERIAL LAYER FORMED USING PHYSICAL VAPOUR DEPOSITIONAugust 2019October 2023Allow5061YesNo

Appeals Overview

This analysis examines appeal outcomes and the strategic value of filing appeals for examiner BAND, MICHAEL A.

Patent Trial and Appeal Board (PTAB) Decisions

Total PTAB Decisions
26
Examiner Affirmed
14
(53.8%)
Examiner Reversed
12
(46.2%)
Reversal Percentile
67.7%
Higher than average

What This Means

With a 46.2% reversal rate, the PTAB reverses the examiner's rejections in a meaningful percentage of cases. This reversal rate is above the USPTO average, indicating that appeals have better success here than typical.

Strategic Value of Filing an Appeal

Total Appeal Filings
67
Allowed After Appeal Filing
19
(28.4%)
Not Allowed After Appeal Filing
48
(71.6%)
Filing Benefit Percentile
38.7%
Lower than average

Understanding Appeal Filing Strategy

Filing a Notice of Appeal can sometimes lead to allowance even before the appeal is fully briefed or decided by the PTAB. This occurs when the examiner or their supervisor reconsiders the rejection during the mandatory appeal conference (MPEP § 1207.01) after the appeal is filed.

In this dataset, 28.4% of applications that filed an appeal were subsequently allowed. This appeal filing benefit rate is below the USPTO average, suggesting that filing an appeal has limited effectiveness in prompting favorable reconsideration.

Strategic Recommendations

Appeals to PTAB show good success rates. If you have a strong case on the merits, consider fully prosecuting the appeal to a Board decision.

Filing a Notice of Appeal shows limited benefit. Consider other strategies like interviews or amendments before appealing.

Examiner BAND, MICHAEL A - Prosecution Strategy Guide

Executive Summary

Examiner BAND, MICHAEL A works in Art Unit 1794 and has examined 337 patent applications in our dataset. With an allowance rate of 57.6%, this examiner allows applications at a lower rate than most examiners at the USPTO. Applications typically reach final disposition in approximately 39 months.

Allowance Patterns

Examiner BAND, MICHAEL A's allowance rate of 57.6% places them in the 12% percentile among all USPTO examiners. This examiner is less likely to allow applications than most examiners at the USPTO.

Office Action Patterns

On average, applications examined by BAND, MICHAEL A receive 3.25 office actions before reaching final disposition. This places the examiner in the 98% percentile for office actions issued. This examiner issues more office actions than most examiners, which may indicate thorough examination or difficulty in reaching agreement with applicants.

Prosecution Timeline

The median time to disposition (half-life) for applications examined by BAND, MICHAEL A is 39 months. This places the examiner in the 10% percentile for prosecution speed. Applications take longer to reach final disposition with this examiner compared to most others.

Interview Effectiveness

Conducting an examiner interview provides a +60.1% benefit to allowance rate for applications examined by BAND, MICHAEL A. This interview benefit is in the 97% percentile among all examiners. Recommendation: Interviews are highly effective with this examiner and should be strongly considered as a prosecution strategy. Per MPEP § 713.10, interviews are available at any time before the Notice of Allowance is mailed or jurisdiction transfers to the PTAB.

Request for Continued Examination (RCE) Effectiveness

When applicants file an RCE with this examiner, 19.9% of applications are subsequently allowed. This success rate is in the 13% percentile among all examiners. Strategic Insight: RCEs show lower effectiveness with this examiner compared to others. Consider whether a continuation application might be more strategic, especially if you need to add new matter or significantly broaden claims.

After-Final Amendment Practice

This examiner enters after-final amendments leading to allowance in 5.2% of cases where such amendments are filed. This entry rate is in the 2% percentile among all examiners. Strategic Recommendation: This examiner rarely enters after-final amendments compared to other examiners. You should generally plan to file an RCE or appeal rather than relying on after-final amendment entry. Per MPEP § 714.12, primary examiners have discretion in entering after-final amendments, and this examiner exercises that discretion conservatively.

Pre-Appeal Conference Effectiveness

When applicants request a pre-appeal conference (PAC) with this examiner, 19.0% result in withdrawal of the rejection or reopening of prosecution. This success rate is in the 24% percentile among all examiners. Note: Pre-appeal conferences show limited success with this examiner compared to others. While still worth considering, be prepared to proceed with a full appeal brief if the PAC does not result in favorable action.

Appeal Withdrawal and Reconsideration

This examiner withdraws rejections or reopens prosecution in 52.7% of appeals filed. This is in the 18% percentile among all examiners. Of these withdrawals, 27.6% occur early in the appeal process (after Notice of Appeal but before Appeal Brief). Strategic Insight: This examiner rarely withdraws rejections during the appeal process compared to other examiners. If you file an appeal, be prepared to fully prosecute it to a PTAB decision. Per MPEP § 1207, the examiner will prepare an Examiner's Answer maintaining the rejections.

Petition Practice

When applicants file petitions regarding this examiner's actions, 35.1% are granted (fully or in part). This grant rate is in the 30% percentile among all examiners. Strategic Note: Petitions show below-average success regarding this examiner's actions. Ensure you have a strong procedural basis before filing.

Examiner Cooperation and Flexibility

Examiner's Amendments: This examiner makes examiner's amendments in 0.3% of allowed cases (in the 54% percentile). This examiner makes examiner's amendments more often than average to place applications in condition for allowance (MPEP § 1302.04).

Quayle Actions: This examiner issues Ex Parte Quayle actions in 0.0% of allowed cases (in the 7% percentile). This examiner rarely issues Quayle actions compared to other examiners. Allowances typically come directly without a separate action for formal matters.

Prosecution Strategy Recommendations

Based on the statistical analysis of this examiner's prosecution patterns, here are tailored strategic recommendations:

  • Prepare for rigorous examination: With a below-average allowance rate, ensure your application has strong written description and enablement support. Consider filing a continuation if you need to add new matter.
  • Expect multiple rounds of prosecution: This examiner issues more office actions than average. Address potential issues proactively in your initial response and consider requesting an interview early in prosecution.
  • Prioritize examiner interviews: Interviews are highly effective with this examiner. Request an interview after the first office action to clarify issues and potentially expedite allowance.
  • Plan for RCE after final rejection: This examiner rarely enters after-final amendments. Budget for an RCE in your prosecution strategy if you receive a final rejection.
  • Plan for extended prosecution: Applications take longer than average with this examiner. Factor this into your continuation strategy and client communications.

Relevant MPEP Sections for Prosecution Strategy

  • MPEP § 713.10: Examiner interviews - available before Notice of Allowance or transfer to PTAB
  • MPEP § 714.12: After-final amendments - may be entered "under justifiable circumstances"
  • MPEP § 1002.02(c): Petitionable matters to Technology Center Director
  • MPEP § 1004: Actions requiring primary examiner signature (allowances, final rejections, examiner's answers)
  • MPEP § 1207.01: Appeal conferences - mandatory for all appeals
  • MPEP § 1214.07: Reopening prosecution after appeal

Important Disclaimer

Not Legal Advice: The information provided in this report is for informational purposes only and does not constitute legal advice. You should consult with a qualified patent attorney or agent for advice specific to your situation.

No Guarantees: We do not provide any guarantees as to the accuracy, completeness, or timeliness of the statistics presented above. Patent prosecution statistics are derived from publicly available USPTO data and are subject to data quality limitations, processing errors, and changes in USPTO practices over time.

Limitation of Liability: Under no circumstances will IronCrow AI be liable for any outcome, decision, or action resulting from your reliance on the statistics, analysis, or recommendations presented in this report. Past prosecution patterns do not guarantee future results.

Use at Your Own Risk: While we strive to provide accurate and useful prosecution statistics, you should independently verify any information that is material to your prosecution strategy and use your professional judgment in all patent prosecution matters.