USPTO Examiner GAMBETTA KELLY M - Art Unit 1718

Recent Applications

Detailed information about the 100 most recent patent applications.

Application NumberTitleFiling DateDisposal DateDispositionTime (months)Office ActionsRestrictionsInterviewAppeal
18914767DEPOSITION OF OXIDE THIN FILMSOctober 2024March 2026Allow1711NoNo
18770097Anti-Coking Iron Spinel SurfaceJuly 2024February 2026Allow1910NoNo
18632344PLASMA ELECTROLYTIC POLISHED DIESEL ENGINE COMPONENTSApril 2024February 2026Allow2211NoNo
18602760FILL ON DEMAND AMPOULE REFILLMarch 2024March 2026Abandon2430NoNo
18684972DEVICE FOR CHEMICAL VAPOUR DEPOSITIONFebruary 2024January 2026Allow2311YesNo
18464831PROPRIETARY CURE MODULE AND METHOD FOR IMPREGNATING GRAPHITESeptember 2023February 2026Allow2920NoNo
18280559THIN-FILM FORMING RAW MATERIAL, WHICH IS USED IN ATOMIC LAYER DEPOSITION METHOD, THIN-FILM, METHOD OF PRODUCING THIN-FILM, AND ZINC COMPOUNDSeptember 2023March 2026Allow3021NoNo
18234386ELECTRODE PLATE ROLLING APPARATUS AND ELECTRODE PLATE ROLLING METHODAugust 2023January 2026Allow2930NoNo
18357557METAL PLATING RETENTION ON ADDITIVELY MANUFACTURE PLASTIC PARTS FOR AN AIRCRAFTJuly 2023July 2025Allow2411YesNo
18218484PARAMETER SETTING METHOD AND SUBSTRATE PROCESSING APPARATUSJuly 2023October 2025Allow2731YesNo
18259773METHOD FOR MANUFACTURING MAGNETIC DISK, MAGNETIC DISK, AND MAGNETIC DISK PRECURSORJune 2023October 2025Allow2731NoNo
18340685OPTICAL DEVICE AND METHOD OF MANUFACTUREJune 2023December 2025Allow3030NoNo
18269228Powder for an electrically insulating coatingJune 2023February 2026Allow3221NoNo
18108929ATOMIC LAYER DEPOSITION METHOD ENHANCING THE NUCLEATION AND CRYSTALLINITY OF A BORON NITRIDE INTERFACE COATING ON A SILICON CARBIDE FIBERFebruary 2023January 2026Allow3510NoNo
18041190VIBRO-THERMALLY ASSISTED CHEMICAL VAPOR INFILTRATIONFebruary 2023November 2025Allow3330YesNo
18062010VAPOR-PHASE PRECURSOR SEEDING FOR DIAMOND FILM DEPOSITIONDecember 2022October 2025Allow3410NoNo
18057648METHOD FOR TREATING SURFACE OF SUBSTRATE, METHOD FOR REGION-SELECTIVELY PRODUCING FILM ON SURFACE OF SUBSTRATE, AND SURFACE TREATMENT AGENTNovember 2022December 2025Allow3721YesNo
17880797SELECTIVE DEPOSITION FOR SUB 20 NM PITCH EUV PATTERNINGAugust 2022March 2026Allow4320NoNo
17619987CHAMBER-ACCUMULATION EXTENSION VIA IN-SITU PASSIVATIONDecember 2021March 2026Allow5161YesNo
17518410ULTRATHIN GRAPHENE/POLYMER LAMINATE FILMSNovember 2021January 2026Allow5060YesNo
16069803THREE-DIMENSIONAL PRINTER WITH A SUPPORTING ELEMENT INSERTION APPARATUSJuly 2018June 2021Allow3621YesNo
15731809Latent fingerprint development on porous surfacesAugust 2017November 2019Allow2710YesNo
15359549SYSTEM AND METHOD FOR CONTINUOUSLY PULLING SUBSTRATES THROUGH A COATERNovember 2016April 2019Allow2911YesNo
15307000METHOD FOR PREPARING TUBULAR GRAPHENE COMPOSITE MEMBRANEOctober 2016May 2018Abandon1930YesNo
15033071PLASMA ENHANCED ALD SYSTEMApril 2016May 2019Allow3631NoNo
14891608EASY-CLEAN SURFACE AND METHOD OF MAKING THE SAMENovember 2015January 2019Allow3841NoNo
14785657TRANSFER ROLLER, ENCAPSULATING GLUE FILM COATING SYSTEM, AND METHOD OF ENCAPSULATING THE GLUE FILMOctober 2015December 2019Allow5051YesNo
14578685Thermal Plasma Treatment MethodDecember 2014January 2017Allow2520NoNo
14294868METHOD OF FABRICATING LIGHT-SCATTERING SUBSTRATEJune 2014August 2016Allow2630NoNo
14174505APPARATUS AND METHOD FOR TREATING A MESH POCKET OF A LACROSSE STICKFebruary 2014April 2015Allow1410NoNo
14077482METHOD AND APPARATUS CAPABLE OF SYNTHESIZING HIGH-DENSITY WIRES IN PORES AND ON SURFACE OF POROUS MATERIALNovember 2013February 2016Allow2711NoNo
13851324ALLOY POWDER FOR OXIDATION-RESISTANT COATING, AND ALLOY MATERIAL FORMED OF THE POWDER AND EXCELLENT IN OXIDATION RESISTANCE CHARACTERISTICSMarch 2013August 2015Allow2911NoNo
13783505Three-Dimensional Vertically Aligned Functionalized Multilayer GrapheneMarch 2013March 2016Allow3620NoNo
13817533COPPER SUBSTRATE FOR DEPOSITION OF GRAPHENEFebruary 2013December 2015Allow3421YesNo
13716829Methods and Apparatus for Combinatorial PECVD or PEALDDecember 2012March 2015Allow2631YesNo
13512889Method of Surfacing Metallic Nanoparticles With CarbonSeptember 2012October 2015Allow4120YesNo
13621799METHOD FOR PROVIDING AN IMPROVED HARD BIAS STRUCTURESeptember 2012September 2013Allow1220YesYes
13539818DOUBLE LAYER UV VARIABLE DATA TEXTJuly 2012July 2013Allow1320NoNo
13321409FORMING REACTIVE ELEMENT MODIFIED ALUMINIDE COATINGS WITH LOW REACTIVE ELEMENT CONTENT USING VAPOR PHASE TECHNIQUESMay 2012October 2015Allow4740NoNo
13455700BRAND MARKETING AND POSITIVE ID USING INKLESS FINGERPRINT TECHNOLOGYApril 2012June 2014Allow2610NoNo
13449189ELECTRON BEAM PLASMA CHAMBERApril 2012April 2014Allow2420YesNo
13407356MINE SHAFT LINER PLATE SYSTEM AND METHODFebruary 2012April 2014Allow2521YesNo
13309934APPARATUS AND METHOD FOR IMPROVED RECOVERY OF LATENT FINGERPRINTSDecember 2011January 2015Allow3731YesNo
13373469MANUFACTURE METHOD FOR FORMING ANTIQUE COLOR ON METAL SURFACENovember 2011September 2013Allow2210NoNo
13283809MANUFACTURING METHOD OF CRYSTALLINE SEMICONDUCTOR FILM AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICEOctober 2011July 2014Allow3311NoNo
13267309METHODS FOR ENHANCING TANTALUM FILAMENT LIFE IN HOT WIRE CHEMICAL VAPOR DEPOSITION PROCESSESOctober 2011November 2013Allow2621YesNo
13089909CHEMICAL VAPOR DEPOSITION OF HIGH CONDUCTIVITY, ADHERENT THIN FILMS OF RUTHENIUMApril 2011May 2012Allow1320NoNo
13074610INVISIBLE COMPOSITE SECURITY ELEMENTMarch 2011October 2014Allow4351YesNo
13065197Bead processing systemMarch 2011April 2013Allow2501NoNo
13059040METHOD FOR VARNISHING SECURITY DOCUMENTS, ESPECIALLY INTAGLIO-PRINTED SECURITY DOCUMENT SUCH AS BANKNOTES, AND VARNISHING MACHINE FOR CARRYING OUT THE SAMEFebruary 2011January 2014Allow3521NoNo
12938109METHODS FOR GROWING AND HARVESTING CARBON NANOTUBESNovember 2010September 2012Allow2310YesNo
12885139APPARATUS AND METHODS FOR FORMING ENERGY STORAGE AND PHOTOVOLTAIC DEVICES IN A LINEAR SYSTEMSeptember 2010September 2012Allow2401YesNo
12883889PLASMA, UV AND ION/NEUTRAL ASSISTED ALD OR CVD IN A BATCH TOOLSeptember 2010January 2012Allow1620NoNo
12851999RING PLASMA JET METHOD AND APPARATUS FOR MAKING AN OPTICAL FIBER PREFORMAugust 2010February 2012Allow1820NoNo
12840464Encapsulated Ceramic Element and Method of Making the SameJuly 2010February 2013Allow3111NoNo
12739219GLASS VENEER ON CERAMICSJuly 2010February 2013Allow3410NoNo
12818529THREE-DIMENSIONAL CARBON FIBERS AND METHOD AND APPARATUS FOR THEIR PRODUCTIONJune 2010March 2011Allow910YesNo
12746215MANUFACTURING OF LOW-FRICTION ELEMENTSJune 2010May 2013Allow3612NoNo
12515570METHOD FOR APPLYING AN ANTI-CORROSION COATING ON PARTS OF A DUCT INCLUDING THE USE OF A SILANE AQUEOUS SOLUTION AND AN EPOXY POWDERY PAINTJune 2009March 2012Allow3410NoNo
12374109METHOD FOR DEPOSITING HARD METALLIC COATINGSMay 2009January 2013Allow4821YesNo
12464039SCANNING PROBE ASSISTED LOCALIZED CNT GROWTHMay 2009March 2012Allow3511YesNo
12436936METHODS OF DEPOSITING MATERIALS OVER SUBSTRATES, AND METHODS OF FORMING LAYERS OVER SUBSTRATESMay 2009May 2010Allow1220NoNo
12405621DOUBLE LAYER UV VARIABLE DATA TEXTMarch 2009March 2012Allow3610NoNo
12345389METHOD AND APPARATUS TO FORM SOLAR CELL ABSORBER LAYERS WITH PLANAR SURFACEDecember 2008August 2012Allow4421YesNo
11885399METHOD FOR FORMING TANTALUM NITRIDE FILMNovember 2008December 2011Allow5220NoNo
12188468CHEMICAL VAPOR DEPOSITION METHOD AND SYSTEM FOR SEMICONDUCTOR DEVICESAugust 2008August 2011Allow3620YesNo
11577777FORMATION OF SELENIDE, SULFIDE OR MIXED SELENIDE-SULFIDE FILMS ON METAL OR METAL COATED SUBSTRATESJuly 2008December 2011Allow5621NoNo
12135914TEMPLATED GROWTH OF GRAPHENIC MATERIALSJune 2008August 2011Allow3910NoNo
12099027DEPOSITION OF TA- OR NB-DOPED HIGH-K FILMSApril 2008July 2011Allow4011YesNo
11915918METHOD AND APPARATUS FOR HYDROGENATION OF THIN FILM SILICON ON GLASSJanuary 2008April 2011Allow4011NoNo
11922918FILM DEPOSITION METHOD AND FILM DEPOSITION APPARATUS OF METAL FILMDecember 2007March 2011Allow3911NoNo
11965689MULTI-REGION PROCESSING SYSTEM AND HEADSDecember 2007April 2011Allow3911NoNo
11982600CONTROLLING WOOD STAINING AND COLOR DURING POST-HARVEST PROCESSINGNovember 2007March 2012Allow5320YesNo
11931963METHOD OF PREVENTING ABNORMAL LARGE GRAINS FROM BEING INCLUDED INTO THIN NANO-CRYSTALLINE DIAMOND FILMOctober 2007March 2011Allow4110NoNo
11925681METHODS FOR ATOMIC LAYER DEPOSITION OF HAFNIUM-CONTAINING HIGH-K DIELECTRIC MATERIALSOctober 2007June 2012Allow5540NoYes
11850860ONE-DIMENSIONAL METAL AND METAL OXIDE NANOSTRUCTURESSeptember 2007April 2011Allow4441NoNo
11829050RADICAL-ENHANCED ATOMIC LAYER DEPOSITION SYSTEM AND METHODJuly 2007March 2012Allow5631NoNo
11775618METHOD FOR FABRICATING CUINS2 THIN FILM BY METAL ORGANIC CHEMICAL VAPOR DEPOSITION, CUINS2 THIN FILM FABRICATED BY THE SAME AND METHOD FOR FABRICATING IN2S3 THIN FILM THEREFROMJuly 2007May 2011Allow4621NoNo
11749900INFRARED REFLECTING LAYER SYSTEM FOR TRANSPARENT SUBSTRATEMay 2007October 2011Allow5321NoNo
11797740GASIFICATION MONITOR, METHOD FOR DETECTING MIST, FILM FORMING METHOD AND FILM FORMING APPARATUSMay 2007October 2010Allow4120YesNo
10575240VAPOUR DEPOSITION METHODJanuary 2007February 2012Allow6040YesNo
10562868METHOD FOR DEPOSITION OF TITANIUM OXIDE BY A PLASMA SOURCEJanuary 2007February 2011Allow6023NoYes
10551051METHOD FOR HIGH-EFFICIENCY SYNTHESIS OF CARBON NANOSTRUCTUREJuly 2006April 2010Allow5511YesNo
11448400Process for applying coatings with metallic chromiumJune 2006February 2013Allow60110NoNo
11355573SECURE TAG CODINGFebruary 2006June 2011Allow6041NoYes
11227570THIN ALIGNMENT LAYERS FOR LIQUID CRYSTAL DISPLAYSSeptember 2005January 2011Allow6040NoNo
11090173METHOD FOR MANUFACTURING FILM OR PIEZOELECTRIC FILMMarch 2005February 2011Allow6020NoYes
11032060METHOD OF FORMING A METAL FILM FOR ELECTRODEJanuary 2005June 2010Allow6040YesNo
10929381CARBON-NANO TUBE STRUCTURE, METHOD OF MANUFACTURING THE SAME, AND FIELD EMITTER AND DISPLAY DEVICE EACH ADOPTING THE SAMEAugust 2004September 2010Allow6040NoYes
10851561FORMATION OF A SILICON OXYNITRIDE LAYER ON A HIGH-K DIELECTRIC MATERIALMay 2004October 2011Allow6060YesYes
10835411METHOD OF FORMING A TEOS CAP LAYER AT LOW TEMPERATURE AND REDUCED DEPOSITION RATEApril 2004July 2010Allow6040YesYes
10719040SOLVENT VAPOR ANNEALING OF ORGANIC FILMSNovember 2003June 2010Allow6060YesYes

Appeals Overview

This analysis examines appeal outcomes and the strategic value of filing appeals for examiner GAMBETTA, KELLY M.

Patent Trial and Appeal Board (PTAB) Decisions

Total PTAB Decisions
4
Examiner Affirmed
1
(25.0%)
Examiner Reversed
3
(75.0%)
Reversal Percentile
88.9%
Higher than average

What This Means

With a 75.0% reversal rate, the PTAB has reversed the examiner's rejections more often than affirming them. This reversal rate is in the top 25% across the USPTO, indicating that appeals are more successful here than in most other areas.

Strategic Value of Filing an Appeal

Total Appeal Filings
10
Allowed After Appeal Filing
8
(80.0%)
Not Allowed After Appeal Filing
2
(20.0%)
Filing Benefit Percentile
94.7%
Higher than average

Understanding Appeal Filing Strategy

Filing a Notice of Appeal can sometimes lead to allowance even before the appeal is fully briefed or decided by the PTAB. This occurs when the examiner or their supervisor reconsiders the rejection during the mandatory appeal conference (MPEP § 1207.01) after the appeal is filed.

In this dataset, 80.0% of applications that filed an appeal were subsequently allowed. This appeal filing benefit rate is in the top 25% across the USPTO, indicating that filing appeals is particularly effective here. The act of filing often prompts favorable reconsideration during the mandatory appeal conference.

Strategic Recommendations

Appeals to PTAB show good success rates. If you have a strong case on the merits, consider fully prosecuting the appeal to a Board decision.

Filing a Notice of Appeal is strategically valuable. The act of filing often prompts favorable reconsideration during the mandatory appeal conference.

Examiner GAMBETTA, KELLY M - Prosecution Strategy Guide

Executive Summary

Examiner GAMBETTA, KELLY M works in Art Unit 1718 and has examined 74 patent applications in our dataset. With an allowance rate of 98.6%, this examiner allows applications at a higher rate than most examiners at the USPTO. Applications typically reach final disposition in approximately 37 months.

Allowance Patterns

Examiner GAMBETTA, KELLY M's allowance rate of 98.6% places them in the 92% percentile among all USPTO examiners. This examiner is more likely to allow applications than most examiners at the USPTO.

Office Action Patterns

On average, applications examined by GAMBETTA, KELLY M receive 2.41 office actions before reaching final disposition. This places the examiner in the 69% percentile for office actions issued. This examiner issues a slightly above-average number of office actions.

Prosecution Timeline

The median time to disposition (half-life) for applications examined by GAMBETTA, KELLY M is 37 months. This places the examiner in the 32% percentile for prosecution speed. Prosecution timelines are slightly slower than average with this examiner.

Interview Effectiveness

Conducting an examiner interview provides a -3.1% benefit to allowance rate for applications examined by GAMBETTA, KELLY M. This interview benefit is in the 7% percentile among all examiners. Note: Interviews show limited statistical benefit with this examiner compared to others, though they may still be valuable for clarifying issues.

Request for Continued Examination (RCE) Effectiveness

When applicants file an RCE with this examiner, 30.3% of applications are subsequently allowed. This success rate is in the 60% percentile among all examiners. Strategic Insight: RCEs show above-average effectiveness with this examiner. Consider whether your amendments or new arguments are strong enough to warrant an RCE versus filing a continuation.

After-Final Amendment Practice

This examiner enters after-final amendments leading to allowance in 40.8% of cases where such amendments are filed. This entry rate is in the 62% percentile among all examiners. Strategic Recommendation: This examiner shows above-average receptiveness to after-final amendments. If your amendments clearly overcome the rejections and do not raise new issues, consider filing after-final amendments before resorting to an RCE.

Pre-Appeal Conference Effectiveness

When applicants request a pre-appeal conference (PAC) with this examiner, 0.0% result in withdrawal of the rejection or reopening of prosecution. This success rate is in the 2% percentile among all examiners. Note: Pre-appeal conferences show limited success with this examiner compared to others. While still worth considering, be prepared to proceed with a full appeal brief if the PAC does not result in favorable action.

Appeal Withdrawal and Reconsideration

This examiner withdraws rejections or reopens prosecution in 69.2% of appeals filed. This is in the 55% percentile among all examiners. Of these withdrawals, 22.2% occur early in the appeal process (after Notice of Appeal but before Appeal Brief). Strategic Insight: This examiner shows above-average willingness to reconsider rejections during appeals. The mandatory appeal conference (MPEP § 1207.01) provides an opportunity for reconsideration.

Petition Practice

When applicants file petitions regarding this examiner's actions, 90.9% are granted (fully or in part). This grant rate is in the 88% percentile among all examiners. Strategic Note: Petitions are frequently granted regarding this examiner's actions compared to other examiners. Per MPEP § 1002.02(c), various examiner actions are petitionable to the Technology Center Director, including prematureness of final rejection, refusal to enter amendments, and requirement for information. If you believe an examiner action is improper, consider filing a petition.

Examiner Cooperation and Flexibility

Examiner's Amendments: This examiner makes examiner's amendments in 10.8% of allowed cases (in the 94% percentile). Per MPEP § 1302.04, examiner's amendments are used to place applications in condition for allowance when only minor changes are needed. This examiner frequently uses this tool compared to other examiners, indicating a cooperative approach to getting applications allowed. Strategic Insight: If you are close to allowance but minor claim amendments are needed, this examiner may be willing to make an examiner's amendment rather than requiring another round of prosecution.

Quayle Actions: This examiner issues Ex Parte Quayle actions in 2.7% of allowed cases (in the 72% percentile). This examiner issues Quayle actions more often than average when claims are allowable but formal matters remain (MPEP § 714.14).

Prosecution Strategy Recommendations

Based on the statistical analysis of this examiner's prosecution patterns, here are tailored strategic recommendations:

  • Examiner cooperation: This examiner frequently makes examiner's amendments to place applications in condition for allowance. If you are close to allowance, the examiner may help finalize the claims.

Relevant MPEP Sections for Prosecution Strategy

  • MPEP § 713.10: Examiner interviews - available before Notice of Allowance or transfer to PTAB
  • MPEP § 714.12: After-final amendments - may be entered "under justifiable circumstances"
  • MPEP § 1002.02(c): Petitionable matters to Technology Center Director
  • MPEP § 1004: Actions requiring primary examiner signature (allowances, final rejections, examiner's answers)
  • MPEP § 1207.01: Appeal conferences - mandatory for all appeals
  • MPEP § 1214.07: Reopening prosecution after appeal

Important Disclaimer

Not Legal Advice: The information provided in this report is for informational purposes only and does not constitute legal advice. You should consult with a qualified patent attorney or agent for advice specific to your situation.

No Guarantees: We do not provide any guarantees as to the accuracy, completeness, or timeliness of the statistics presented above. Patent prosecution statistics are derived from publicly available USPTO data and are subject to data quality limitations, processing errors, and changes in USPTO practices over time.

Limitation of Liability: Under no circumstances will IronCrow AI be liable for any outcome, decision, or action resulting from your reliance on the statistics, analysis, or recommendations presented in this report. Past prosecution patterns do not guarantee future results.

Use at Your Own Risk: While we strive to provide accurate and useful prosecution statistics, you should independently verify any information that is material to your prosecution strategy and use your professional judgment in all patent prosecution matters.