USPTO Examiner BENNETT CHARLEE - Art Unit 1718

Recent Applications

Detailed information about the 100 most recent patent applications.

Application NumberTitleFiling DateDisposal DateDispositionTime (months)Office ActionsRestrictionsInterviewAppeal
18723129SUBSTRATE ROTATING APPARATUS, PROCESSING SYSTEM, AND PROCESSING METHODJune 2024May 2025Allow1110YesNo
18699311CHEMICAL VAPOR DEPOSITION DEVICE CAPABLE OF RECIPROCATING ROTATION AND LIFTINGApril 2024November 2024Allow710NoNo
18627178VENTED SUSCEPTORApril 2024January 2026Allow2220NoNo
18607968SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND RECORDING MEDIUMMarch 2024September 2025Allow1811NoNo
18692172APPARATUS FOR PLASMA SURFACE TREATMENTMarch 2024April 2025Allow1311YesNo
18587724APPARATUS, SYSTEMS, AND METHODS OF MEASURING EDGE RING DISTANCE FOR THERMAL PROCESSING CHAMBERSFebruary 2024March 2026Allow2520YesNo
18439493SELECTIVE DEPOSITION USING DIFFERENTIAL SURFACE CHARGINGFebruary 2024January 2026Allow2311NoNo
18414914SUBSTRATE SUPPORTING PLATE, THIN FILM DEPOSITION APPARATUS INCLUDING THE SAME, AND THIN FILM DEPOSITION METHODJanuary 2024December 2024Allow1101NoNo
18402969SUBSTRATE RETAINING APPARATUS, SYSTEM INCLUDING THE APPARATUS, AND METHOD OF USING SAMEJanuary 2024February 2025Allow1410NoNo
18519476MULTI-DISC CHEMICAL VAPOR DEPOSITION SYSTEMNovember 2023November 2025Abandon2410NoNo
18510680PLASMA PROCESSING APPARATUS, CALCULATION METHOD, AND CALCULATION PROGRAMNovember 2023January 2025Allow1420YesNo
18499589METHOD OF PROCESSING SUBSTRATE, SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCTOR PROCESSING APPARATUS, AND RECORDING MEDIUMNovember 2023February 2025Allow1511NoNo
18377141EDGE RINGS PROVIDING KINEMATIC COUPLING AND CORRESPONDING SUBSTRATE PROCESSING SYSTEMSOctober 2023August 2025Allow2221YesNo
18481886ELECTROSTATIC CHUCK FOR USE IN SEMICONDUCTOR PROCESSINGOctober 2023May 2025Allow1920YesNo
18469141HIGH THROUGHPUT POWDER TREATMENT SYSTEMSSeptember 2023November 2025Allow2611NoNo
18456589APPARATUS FOR PROCESSING SUBSTRATEAugust 2023June 2025Abandon2220YesNo
18447603METHODS FOR THERMAL TREATMENT OF SUBSTRATESAugust 2023December 2025Allow2830NoNo
18356579COAXIAL LIFT DEVICE WITH DYNAMIC LEVELINGJuly 2023April 2025Abandon2320YesNo
18356553COAXIAL LIFT DEVICE WITH DYNAMIC LEVELINGJuly 2023March 2025Abandon2020YesNo
18220705INCREASING THE GAS EFFICIENCY FOR AN ELECTROSTATIC CHUCKJuly 2023August 2025Allow2521NoNo
18207322GAS DISTRIBUTION SYSTEM AND REACTOR SYSTEM INCLUDING SAMEJune 2023March 2024Allow910NoNo
18203864APPARATUS FOR MONITORING A PLASMA PROCESSMay 2023December 2025Allow3110YesNo
18325094ALD PROCESSING APPARATUS AND PROCESSING METHODMay 2023September 2025Allow2811YesNo
18321607SEPARATION OF PLASMA SUPPRESSION AND WAFER EDGE TO IMPROVE EDGE FILM THICKNESS UNIFORMITYMay 2023September 2025Abandon2821NoNo
18199519APPARATUS AND METHOD FOR DELIVERING A PLURALITY OF WAVEFORM SIGNALS DURING PLASMA PROCESSINGMay 2023August 2025Allow2700YesNo
18123153SUBSTRATE PEDESTAL INCLUDING BACKSIDE GAS-DELIVERY TUBEMarch 2023April 2025Allow2540YesNo
18111118PLASMA PROCESSING APPARATUS AND STORAGE MEDIUMFebruary 2023September 2025Allow3110NoNo
18106739SUPPORT RING WITH PLASMA SPRAY COATINGFebruary 2023July 2025Allow3031YesNo
18100660SUBSTRATE LIFT MECHANISM AND REACTOR INCLUDING SAMEJanuary 2023May 2024Allow1510NoNo
18156217ROBOT, APPARATUS INCLUDING ROBOT, AND METHOD FOR MANUFACTURING SEMICONDUCTOR STRUCTURE USING THE SAMEJanuary 2023February 2026Allow3721NoNo
18146409LASER-ENHANCED CHEMICAL VAPOR DEPOSITIONDecember 2022September 2025Allow3310YesNo
18085583PLASMA PROCESSING APPARATUSDecember 2022May 2025Allow2900NoNo
18002614CARRIER RINGS WITH RADIALLY-VARIED PLASMA IMPEDANCEDecember 2022February 2026Abandon3810NoNo
18073862WAFER SUSCEPTORDecember 2022November 2025Allow3510NoNo
17999830ELECTROSTATIC CHUCKNovember 2022December 2025Allow3710NoNo
17992995FAST RESPONSE PEDESTAL ASSEMBLY FOR SELECTIVE PRECLEANNovember 2022January 2024Allow1310NoNo
17990481APPARATUS FOR PROCESSING A SUBSTRATE AND METHOD OF OPERATING THE SAMENovember 2022April 2025Allow2900YesNo
17985764HIGH POWER ELECTROSTATIC CHUCK DESIGN WITH RADIO FREQUENCY COUPLINGNovember 2022December 2023Allow1311YesNo
17979572FARADAY FACEPLATENovember 2022November 2025Allow3710YesNo
18050375COATED SUBSTRATE SUPPORT ASSEMBLY FOR SUBSTRATE PROCESSING IN PROCESSING CHAMBERSOctober 2022July 2025Abandon3331YesYes
17958962PLASMA PROCESSING APPARATUS, CALCULATION METHOD, AND CALCULATION PROGRAMOctober 2022August 2023Allow1010NoNo
17956110PLASMA PROCESSING APPARATUS AND MOUNTING TABLE THEREOFSeptember 2022January 2025Allow2740YesNo
17934878JIGS AND METHODS OF TEACHING SUBSTRATE HANDLING IN SEMICONDUCTOR PROCESSING SYSTEMS USING JIGSSeptember 2022March 2026Allow4111YesNo
17951636SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD USING THE SAMESeptember 2022January 2026Allow4021YesNo
17891300SEMICONDUCTOR MANUFACTURING APPARATUS AND MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICEAugust 2022January 2026Allow4011NoNo
17889054SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND RECORDING MEDIUMAugust 2022November 2023Allow1511YesNo
17870893METHOD FOR PROCESSING SUBSTRATEJuly 2022October 2023Allow1510NoNo
17793715EDGE RING TRANSFER WITH AUTOMATED ROTATIONAL PRE-ALIGNMENTJuly 2022November 2025Allow4011YesNo
17758546Device For Generating A Dielectric Barrier Discharge And Method For Treating An Object To Be ActivatedJuly 2022July 2025Allow3611YesNo
17809096METHOD OF ETCHING FILM AND PLASMA PROCESSING APPARATUSJune 2022September 2024Allow2700NoNo
17846155DIRECTIONAL SELECTIVE JUNCTION CLEAN WITH FIELD POLYMER PROTECTIONSJune 2022September 2025Allow3921YesNo
17843652WAFER EDGE RING LIFTING SOLUTIONJune 2022May 2024Allow2321YesNo
17842057APPARATUS FOR PROVIDING A GAS MIXTURE TO A REACTION CHAMBER AND METHOD OF USING SAMEJune 2022July 2025Allow3721YesNo
17757173LINEARLY MOVING MECHANISM AND METHOD OF SUPPRESSING PARTICLE SCATTERINGJune 2022October 2025Allow4011YesNo
17805066SHOWERHEAD AND SUBSTRATE PROCESSING APPARATUSJune 2022December 2025Allow4220YesNo
17826901BATCH TYPE SUBSTRATE PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAMEMay 2022August 2025Allow3911YesNo
17804027PLASMA PROCESSING APPARATUSMay 2022October 2024Allow2910NoNo
17778923SUBSTRATE SUPPORT DEVICE FOR A REACTION CHAMBER OF AN EPITAXIAL REACTOR WITH GAS FLOW ROTATION, REACTION CHAMBER AND EPITAXIAL REACTORMay 2022September 2024Allow2841YesNo
17664324LOWER DEPOSITION CHAMBER CCP ELECTRODE CLEANING SOLUTIONMay 2022January 2026Allow4431YesNo
17778757SUBSTRATE PROCESSING APPARATUSMay 2022October 2025Allow4120YesNo
17730967SUSCEPTORS WITH FILM DEPOSITION CONTROL FEATURESApril 2022April 2025Allow3531YesYes
17768814STRUCTURAL BODY AND HEATING APPARATUSApril 2022August 2024Allow2810YesNo
17766379PLASMA PROCESSING APPARATUS AND CEILING WALLApril 2022January 2025Allow3410NoNo
17708217APPARATUS TRAPPING AN EXHAUST MATERIAL FROM A SUBSTRATE-PROCESSING PROCESS AND APPARATUS FOR PROCESSING A SUBSTRATE INCLUDING THE TRAPPING APPARATUSMarch 2022April 2025Allow3711YesNo
17764141COMPONENT FOR PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING APPARATUS INCLUDING COMPONENTMarch 2022September 2024Allow3010NoNo
17696361WORK PROCESSING APPARATUSMarch 2022November 2024Allow3210NoNo
17653180SEMICONDUCTOR MANUFACTURING APPARATUSMarch 2022November 2024Abandon3210NoNo
17682436METHOD OF PROCESSING SUBSTRATE, SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCTOR PROCESSING APPARATUS, AND RECORDING MEDIUMFebruary 2022July 2023Allow1721NoNo
17681606BOTTOM AND MIDDLE EDGE RINGSFebruary 2022August 2024Allow3040YesNo
17681633BOTTOM AND MIDDLE EDGE RINGSFebruary 2022August 2025Allow4260YesNo
17679966Substrate Processing Apparatus, Non-transitory Computer-readable Recording Medium, Substrate Processing Method and Method of Manufacturing Semiconductor DeviceFebruary 2022February 2026Allow4821YesNo
17652243ELECTROSTATIC CHUCK FOR USE IN SEMICONDUCTOR PROCESSINGFebruary 2022July 2023Allow1610NoNo
17622274AN ATOMIC LAYER DEPOSITION APPARATUSDecember 2021February 2026Allow5030NoNo
17547303APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR TREATING SUBSTRATEDecember 2021May 2025Allow4111YesNo
17544139Cooled Shield for ICP SourceDecember 2021July 2024Allow3211YesNo
17595928WINDOW FOR PLASMA OES DIAGNOSIS, AND PLASMA APPARATUS USING SAMENovember 2021October 2024Allow3410NoNo
17534329SUPPORT UNIT, SUBSTRATE TREATING APPARATUS INCLUDING THE SAME AND TEMPERATURE CONTROL METHODNovember 2021September 2024Allow3411YesNo
17455978SYSTEM AND METHOD FOR WAFER BREAKAGE PREVENTIONNovember 2021December 2024Abandon3711NoNo
17529684PRE-CLEAN CHAMBER ASSEMBLY ARCHITECTURE FOR IMPROVED SERVICEABILITYNovember 2021February 2026Allow5140YesNo
17525190APPARATUS FOR PLASMA PROCESSING AND PLASMA PROCESSING SYSTEMNovember 2021October 2025Allow4730YesNo
17520735SUBSTRATE PROCESSING APPARATUSNovember 2021October 2024Abandon3520NoNo
17520353SUBSTRATE SUPPORTING ASSEMBLY AND SUBSTRATE PROCESSING APPARATUSNovember 2021January 2025Allow3840YesNo
17504625SUBSTRATE PROCESSING APPARATUSOctober 2021January 2026Abandon5130YesNo
17500494COOLING SHEET ATTACHMENT APPARATUS TO FOCUSING RING FOR SEMICONDUCTOR MANUFACTURING APPARATUSOctober 2021October 2024Allow3610YesNo
17601792VAPOR DEPOSITION DEVICE AND CARRIER USED IN SAMEOctober 2021June 2025Allow4430YesNo
17473118SHADOW RING LIFT TO IMPROVE WAFER EDGE PERFORMANCESeptember 2021July 2025Allow4631YesNo
17438354LAMELLAR CERAMIC STRUCTURESeptember 2021March 2025Allow4240YesNo
17593081SUSCEPTOR ARRANGEMENT OF A CVD REACTORSeptember 2021July 2024Allow3420YesNo
17463834ELECTROSTATIC CHUCK APPARATUS AND SEMICONDUCTOR MANUFACTURING APPARATUSSeptember 2021August 2023Allow2300NoNo
17460318SEMICONDUCTOR APPARATUS FOR DEPOSITION PROCESSAugust 2021January 2026Allow5350YesNo
17408002METHOD AND APPARATUS TO ELIMINATE CONTAMINANT PARTICLES FROM AN ACCELERATED NEUTRAL ATOM BEAM AND THEREBY PROTECT A BEAM TARGETAugust 2021December 2023Allow2811YesNo
17310750CVD REACTOR HAVING MEANS FOR LOCALLY INFLUENCING THE SUSCEPTOR TEMPERATUREAugust 2021December 2025Allow5241NoNo
17397530PLASMA PROCESSING APPARATUS AND METHODS OF MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAMEAugust 2021February 2025Allow4231YesNo
17386191RECIPROCATING ROTARY CVD EQUIPMENT AND APPLICATION METHODJuly 2021February 2025Allow4241YesNo
17423687APPARATUS FOR PROCESSING SUBSTRATEJuly 2021December 2023Abandon2910NoNo
17377079SEMICONDUCTOR WAFER CARRIER STRUCTURE AND METAL-ORGANIC CHEMICAL VAPOR DEPOSITION DEVICEJuly 2021February 2025Abandon4341YesNo
17355020SHIELDING MECHANISM AND SUBSTRATE-PROCESSING DEVICE WITH THE SAMEJune 2021November 2023Abandon2810NoNo
17353643SUBSTRATE SUPPORT WITH MULTIPLE EMBEDDED ELECTRODESJune 2021March 2024Abandon3321NoNo
17311599SUSCEPTOR OF A CVD REACTORJune 2021February 2025Allow4421YesNo
17242150PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHODApril 2021December 2024Allow4321YesNo

Appeals Overview

This analysis examines appeal outcomes and the strategic value of filing appeals for examiner BENNETT, CHARLEE.

Patent Trial and Appeal Board (PTAB) Decisions

Total PTAB Decisions
14
Examiner Affirmed
7
(50.0%)
Examiner Reversed
7
(50.0%)
Reversal Percentile
70.3%
Higher than average

What This Means

With a 50.0% reversal rate, the PTAB reverses the examiner's rejections in a meaningful percentage of cases. This reversal rate is above the USPTO average, indicating that appeals have better success here than typical.

Strategic Value of Filing an Appeal

Total Appeal Filings
38
Allowed After Appeal Filing
18
(47.4%)
Not Allowed After Appeal Filing
20
(52.6%)
Filing Benefit Percentile
76.1%
Higher than average

Understanding Appeal Filing Strategy

Filing a Notice of Appeal can sometimes lead to allowance even before the appeal is fully briefed or decided by the PTAB. This occurs when the examiner or their supervisor reconsiders the rejection during the mandatory appeal conference (MPEP § 1207.01) after the appeal is filed.

In this dataset, 47.4% of applications that filed an appeal were subsequently allowed. This appeal filing benefit rate is in the top 25% across the USPTO, indicating that filing appeals is particularly effective here. The act of filing often prompts favorable reconsideration during the mandatory appeal conference.

Strategic Recommendations

Appeals to PTAB show good success rates. If you have a strong case on the merits, consider fully prosecuting the appeal to a Board decision.

Filing a Notice of Appeal is strategically valuable. The act of filing often prompts favorable reconsideration during the mandatory appeal conference.

Examiner BENNETT, CHARLEE - Prosecution Strategy Guide

Executive Summary

Examiner BENNETT, CHARLEE works in Art Unit 1718 and has examined 485 patent applications in our dataset. With an allowance rate of 53.0%, this examiner allows applications at a lower rate than most examiners at the USPTO. Applications typically reach final disposition in approximately 44 months.

Allowance Patterns

Examiner BENNETT, CHARLEE's allowance rate of 53.0% places them in the 14% percentile among all USPTO examiners. This examiner is less likely to allow applications than most examiners at the USPTO.

Office Action Patterns

On average, applications examined by BENNETT, CHARLEE receive 3.17 office actions before reaching final disposition. This places the examiner in the 90% percentile for office actions issued. This examiner issues more office actions than most examiners, which may indicate thorough examination or difficulty in reaching agreement with applicants.

Prosecution Timeline

The median time to disposition (half-life) for applications examined by BENNETT, CHARLEE is 44 months. This places the examiner in the 14% percentile for prosecution speed. Applications take longer to reach final disposition with this examiner compared to most others.

Interview Effectiveness

Conducting an examiner interview provides a +42.5% benefit to allowance rate for applications examined by BENNETT, CHARLEE. This interview benefit is in the 89% percentile among all examiners. Recommendation: Interviews are highly effective with this examiner and should be strongly considered as a prosecution strategy. Per MPEP § 713.10, interviews are available at any time before the Notice of Allowance is mailed or jurisdiction transfers to the PTAB.

Request for Continued Examination (RCE) Effectiveness

When applicants file an RCE with this examiner, 12.3% of applications are subsequently allowed. This success rate is in the 7% percentile among all examiners. Strategic Insight: RCEs show lower effectiveness with this examiner compared to others. Consider whether a continuation application might be more strategic, especially if you need to add new matter or significantly broaden claims.

After-Final Amendment Practice

This examiner enters after-final amendments leading to allowance in 26.6% of cases where such amendments are filed. This entry rate is in the 37% percentile among all examiners. Strategic Recommendation: This examiner shows below-average receptiveness to after-final amendments. You may need to file an RCE or appeal rather than relying on after-final amendment entry.

Pre-Appeal Conference Effectiveness

When applicants request a pre-appeal conference (PAC) with this examiner, 88.9% result in withdrawal of the rejection or reopening of prosecution. This success rate is in the 67% percentile among all examiners. Strategic Recommendation: Pre-appeal conferences show above-average effectiveness with this examiner. If you have strong arguments, a PAC request may result in favorable reconsideration.

Appeal Withdrawal and Reconsideration

This examiner withdraws rejections or reopens prosecution in 68.2% of appeals filed. This is in the 54% percentile among all examiners. Of these withdrawals, 43.3% occur early in the appeal process (after Notice of Appeal but before Appeal Brief). Strategic Insight: This examiner shows above-average willingness to reconsider rejections during appeals. The mandatory appeal conference (MPEP § 1207.01) provides an opportunity for reconsideration.

Petition Practice

When applicants file petitions regarding this examiner's actions, 80.0% are granted (fully or in part). This grant rate is in the 84% percentile among all examiners. Strategic Note: Petitions are frequently granted regarding this examiner's actions compared to other examiners. Per MPEP § 1002.02(c), various examiner actions are petitionable to the Technology Center Director, including prematureness of final rejection, refusal to enter amendments, and requirement for information. If you believe an examiner action is improper, consider filing a petition.

Examiner Cooperation and Flexibility

Examiner's Amendments: This examiner makes examiner's amendments in 0.0% of allowed cases (in the 4% percentile). This examiner rarely makes examiner's amendments compared to other examiners. You should expect to make all necessary claim amendments yourself through formal amendment practice.

Quayle Actions: This examiner issues Ex Parte Quayle actions in 1.6% of allowed cases (in the 65% percentile). This examiner issues Quayle actions more often than average when claims are allowable but formal matters remain (MPEP § 714.14).

Prosecution Strategy Recommendations

Based on the statistical analysis of this examiner's prosecution patterns, here are tailored strategic recommendations:

  • Prepare for rigorous examination: With a below-average allowance rate, ensure your application has strong written description and enablement support. Consider filing a continuation if you need to add new matter.
  • Expect multiple rounds of prosecution: This examiner issues more office actions than average. Address potential issues proactively in your initial response and consider requesting an interview early in prosecution.
  • Prioritize examiner interviews: Interviews are highly effective with this examiner. Request an interview after the first office action to clarify issues and potentially expedite allowance.
  • Plan for extended prosecution: Applications take longer than average with this examiner. Factor this into your continuation strategy and client communications.

Relevant MPEP Sections for Prosecution Strategy

  • MPEP § 713.10: Examiner interviews - available before Notice of Allowance or transfer to PTAB
  • MPEP § 714.12: After-final amendments - may be entered "under justifiable circumstances"
  • MPEP § 1002.02(c): Petitionable matters to Technology Center Director
  • MPEP § 1004: Actions requiring primary examiner signature (allowances, final rejections, examiner's answers)
  • MPEP § 1207.01: Appeal conferences - mandatory for all appeals
  • MPEP § 1214.07: Reopening prosecution after appeal

Important Disclaimer

Not Legal Advice: The information provided in this report is for informational purposes only and does not constitute legal advice. You should consult with a qualified patent attorney or agent for advice specific to your situation.

No Guarantees: We do not provide any guarantees as to the accuracy, completeness, or timeliness of the statistics presented above. Patent prosecution statistics are derived from publicly available USPTO data and are subject to data quality limitations, processing errors, and changes in USPTO practices over time.

Limitation of Liability: Under no circumstances will IronCrow AI be liable for any outcome, decision, or action resulting from your reliance on the statistics, analysis, or recommendations presented in this report. Past prosecution patterns do not guarantee future results.

Use at Your Own Risk: While we strive to provide accurate and useful prosecution statistics, you should independently verify any information that is material to your prosecution strategy and use your professional judgment in all patent prosecution matters.