USPTO Examiner BENNETT CHARLEE - Art Unit 1718

Recent Applications

Detailed information about the 100 most recent patent applications.

Application NumberTitleFiling DateDisposal DateDispositionTime (months)Office ActionsRestrictionsInterviewAppeal
18723129SUBSTRATE ROTATING APPARATUS, PROCESSING SYSTEM, AND PROCESSING METHODJune 2024May 2025Allow1110YesNo
18699311CHEMICAL VAPOR DEPOSITION DEVICE CAPABLE OF RECIPROCATING ROTATION AND LIFTINGApril 2024November 2024Allow710NoNo
18692172APPARATUS FOR PLASMA SURFACE TREATMENTMarch 2024April 2025Allow1311YesNo
18414914SUBSTRATE SUPPORTING PLATE, THIN FILM DEPOSITION APPARATUS INCLUDING THE SAME, AND THIN FILM DEPOSITION METHODJanuary 2024December 2024Allow1101NoNo
18402969SUBSTRATE RETAINING APPARATUS, SYSTEM INCLUDING THE APPARATUS, AND METHOD OF USING SAMEJanuary 2024February 2025Allow1410NoNo
18510680PLASMA PROCESSING APPARATUS, CALCULATION METHOD, AND CALCULATION PROGRAMNovember 2023January 2025Allow1420YesNo
18499589METHOD OF PROCESSING SUBSTRATE, SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCTOR PROCESSING APPARATUS, AND RECORDING MEDIUMNovember 2023February 2025Allow1511NoNo
18481886ELECTROSTATIC CHUCK FOR USE IN SEMICONDUCTOR PROCESSINGOctober 2023May 2025Allow1920YesNo
18456589APPARATUS FOR PROCESSING SUBSTRATEAugust 2023June 2025Abandon2220YesNo
18356553COAXIAL LIFT DEVICE WITH DYNAMIC LEVELINGJuly 2023March 2025Abandon2020YesNo
18356579COAXIAL LIFT DEVICE WITH DYNAMIC LEVELINGJuly 2023April 2025Abandon2320YesNo
18207322GAS DISTRIBUTION SYSTEM AND REACTOR SYSTEM INCLUDING SAMEJune 2023March 2024Allow910NoNo
18123153SUBSTRATE PEDESTAL INCLUDING BACKSIDE GAS-DELIVERY TUBEMarch 2023April 2025Allow2540YesNo
18100660SUBSTRATE LIFT MECHANISM AND REACTOR INCLUDING SAMEJanuary 2023May 2024Allow1510NoNo
18085583PLASMA PROCESSING APPARATUSDecember 2022May 2025Allow2900NoNo
17992995FAST RESPONSE PEDESTAL ASSEMBLY FOR SELECTIVE PRECLEANNovember 2022January 2024Allow1310NoNo
17990481APPARATUS FOR PROCESSING A SUBSTRATE AND METHOD OF OPERATING THE SAMENovember 2022April 2025Allow2900YesNo
17985764HIGH POWER ELECTROSTATIC CHUCK DESIGN WITH RADIO FREQUENCY COUPLINGNovember 2022December 2023Allow1311YesNo
17958962PLASMA PROCESSING APPARATUS, CALCULATION METHOD, AND CALCULATION PROGRAMOctober 2022August 2023Allow1010NoNo
17956110PLASMA PROCESSING APPARATUS AND MOUNTING TABLE THEREOFSeptember 2022January 2025Allow2740YesNo
17889054SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND RECORDING MEDIUMAugust 2022November 2023Allow1511YesNo
17870893METHOD FOR PROCESSING SUBSTRATEJuly 2022October 2023Allow1510NoNo
17809096METHOD OF ETCHING FILM AND PLASMA PROCESSING APPARATUSJune 2022September 2024Allow2700NoNo
17843652WAFER EDGE RING LIFTING SOLUTIONJune 2022May 2024Allow2321YesNo
17804027PLASMA PROCESSING APPARATUSMay 2022October 2024Allow2910NoNo
17778923SUBSTRATE SUPPORT DEVICE FOR A REACTION CHAMBER OF AN EPITAXIAL REACTOR WITH GAS FLOW ROTATION, REACTION CHAMBER AND EPITAXIAL REACTORMay 2022September 2024Allow2841YesNo
17730967SUSCEPTORS WITH FILM DEPOSITION CONTROL FEATURESApril 2022April 2025Allow3531YesYes
17768814STRUCTURAL BODY AND HEATING APPARATUSApril 2022August 2024Allow2810YesNo
17766379PLASMA PROCESSING APPARATUS AND CEILING WALLApril 2022January 2025Allow3410NoNo
17708217APPARATUS TRAPPING AN EXHAUST MATERIAL FROM A SUBSTRATE-PROCESSING PROCESS AND APPARATUS FOR PROCESSING A SUBSTRATE INCLUDING THE TRAPPING APPARATUSMarch 2022April 2025Allow3711YesNo
17764141COMPONENT FOR PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING APPARATUS INCLUDING COMPONENTMarch 2022September 2024Allow3010NoNo
17696361WORK PROCESSING APPARATUSMarch 2022November 2024Allow3210NoNo
17653180SEMICONDUCTOR MANUFACTURING APPARATUSMarch 2022November 2024Abandon3210NoNo
17682436METHOD OF PROCESSING SUBSTRATE, SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCTOR PROCESSING APPARATUS, AND RECORDING MEDIUMFebruary 2022July 2023Allow1721NoNo
17681606BOTTOM AND MIDDLE EDGE RINGSFebruary 2022August 2024Allow3040YesNo
17652243ELECTROSTATIC CHUCK FOR USE IN SEMICONDUCTOR PROCESSINGFebruary 2022July 2023Allow1610NoNo
17547303APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR TREATING SUBSTRATEDecember 2021May 2025Allow4111YesNo
17544139Cooled Shield for ICP SourceDecember 2021July 2024Allow3211YesNo
17595928WINDOW FOR PLASMA OES DIAGNOSIS, AND PLASMA APPARATUS USING SAMENovember 2021October 2024Allow3410NoNo
17534329SUPPORT UNIT, SUBSTRATE TREATING APPARATUS INCLUDING THE SAME AND TEMPERATURE CONTROL METHODNovember 2021September 2024Allow3411YesNo
17455978SYSTEM AND METHOD FOR WAFER BREAKAGE PREVENTIONNovember 2021December 2024Abandon3711NoNo
17520735SUBSTRATE PROCESSING APPARATUSNovember 2021October 2024Abandon3520NoNo
17520353SUBSTRATE SUPPORTING ASSEMBLY AND SUBSTRATE PROCESSING APPARATUSNovember 2021January 2025Allow3840YesNo
17500494COOLING SHEET ATTACHMENT APPARATUS TO FOCUSING RING FOR SEMICONDUCTOR MANUFACTURING APPARATUSOctober 2021October 2024Allow3610YesNo
17601792VAPOR DEPOSITION DEVICE AND CARRIER USED IN SAMEOctober 2021June 2025Allow4430YesNo
17438354LAMELLAR CERAMIC STRUCTURESeptember 2021March 2025Allow4240YesNo
17593081SUSCEPTOR ARRANGEMENT OF A CVD REACTORSeptember 2021July 2024Allow3420YesNo
17463834ELECTROSTATIC CHUCK APPARATUS AND SEMICONDUCTOR MANUFACTURING APPARATUSSeptember 2021August 2023Allow2300NoNo
17408002METHOD AND APPARATUS TO ELIMINATE CONTAMINANT PARTICLES FROM AN ACCELERATED NEUTRAL ATOM BEAM AND THEREBY PROTECT A BEAM TARGETAugust 2021December 2023Allow2811YesNo
17397530PLASMA PROCESSING APPARATUS AND METHODS OF MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAMEAugust 2021February 2025Allow4231YesNo
17386191RECIPROCATING ROTARY CVD EQUIPMENT AND APPLICATION METHODJuly 2021February 2025Allow4241YesNo
17423687APPARATUS FOR PROCESSING SUBSTRATEJuly 2021December 2023Abandon2910NoNo
17377079SEMICONDUCTOR WAFER CARRIER STRUCTURE AND METAL-ORGANIC CHEMICAL VAPOR DEPOSITION DEVICEJuly 2021February 2025Abandon4341YesNo
17355020SHIELDING MECHANISM AND SUBSTRATE-PROCESSING DEVICE WITH THE SAMEJune 2021November 2023Abandon2810NoNo
17353643SUBSTRATE SUPPORT WITH MULTIPLE EMBEDDED ELECTRODESJune 2021March 2024Abandon3321NoNo
17311599SUSCEPTOR OF A CVD REACTORJune 2021February 2025Allow4421YesNo
17242150PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHODApril 2021December 2024Allow4321YesNo
17231299METHOD OF FORMING AN ENHANCED UNEXPOSED PHOTORESIST LAYERApril 2021October 2024Allow4320NoNo
17230047INJECTOR CONFIGURED FOR ARRANGEMENT WITHIN A REACTOR OF A VERTICAL FURNACE AND VERTICAL FURNACEApril 2021June 2025Allow5030YesNo
17221891PLASMA PROCESSING EQUIPMENTApril 2021July 2023Allow2811YesNo
17219316STAGE, FILM-FORMING APPARATUS, AND FILM-PROCESSING APPARATUSMarch 2021September 2024Allow4230YesNo
17218882LEVEL MONITORING AND ACTIVE ADJUSTMENT OF A SUBSTRATE SUPPORT ASSEMBLYMarch 2021October 2024Allow4241YesYes
17211951SUBSTRATE PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICEMarch 2021May 2022Allow1421YesNo
17209259COATING PROCESSES FOR VACUUM CHAMBER ARRANGEMENTS AND APPARATUS THEREOFMarch 2021January 2023Allow2200NoNo
17202131METHOD AND APPARATUS FOR SELECTIVE NITRIDATION PROCESSMarch 2021October 2022Allow1900YesNo
17200981MAGAZINE SUPPORTING EQUIPMENT AND SEMICONDUCTOR MANUFACTURING APPARATUS INCLUDING THE SAMEMarch 2021November 2023Allow3211YesNo
17186873SUBSTRATE SUPPORT WITH MULTIPLE EMBEDDED ELECTRODESFebruary 2021September 2024Allow4341YesYes
17167820MULTIPLE TEMPERATURE RANGE SUSCEPTOR, ASSEMBLY, REACTOR AND SYSTEM INCLUDING THE SUSCEPTOR, AND METHODS OF USING THE SAMEFebruary 2021June 2023Allow2820NoNo
17263078LIFT THIMBLE SYSTEM, REACTION CHAMBER, AND SEMICONDUCTOR PROCESSING EQUIPMENTJanuary 2021February 2023Allow2511NoNo
17151366SUBSTRATE SUPPORT WITH IMPROVED PROCESS UNIFORMITYJanuary 2021January 2024Allow3620YesNo
17145171EDGE RING AND SUBSTRATE PROCESSING APPARATUSJanuary 2021August 2024Abandon4331NoNo
17250221ARRANGEMENT FOR MEASURING THE SURFACE TEMPERATURE OF A SUSCEPTOR IN A CVD REACTORDecember 2020April 2025Allow5231YesNo
17113848CARRIER PLATE FOR USE IN PLASMA PROCESSING SYSTEMSDecember 2020January 2023Allow2510NoNo
17092599SUBSTRATE SUPPORTING PLATE, THIN FILM DEPOSITION APPARATUS INCLUDING THE SAME, AND THIN FILM DEPOSITION METHODNovember 2020January 2024Allow3811NoNo
17070821PLASMA ENHANCED CVD WITH PERIODIC HIGH VOLTAGE BIASOctober 2020May 2024Allow4350NoNo
17033177PROCESS KIT WITH ADJUSTABLE TUNING RING FOR EDGE UNIFORMITY CONTROLSeptember 2020March 2023Allow6011YesNo
17032099SUBSTRATE PROCESSING SYSTEM INCLUDING ELECTROSTATIC CHUCK AND METHOD FOR MANUFACTURING ELECTROSTATIC CHUCKSeptember 2020May 2023Allow3120NoNo
17042091APPARATUS FOR PROCESSING SUBSTRATESeptember 2020August 2024Allow4640YesNo
17021643COMPONENT FOR USE IN PLASMA PROCESSING APPARATUS, PLASMA PROCESSING APPARATUS, AND METHOD FOR MANUFACTURING THE COMPONENTSeptember 2020June 2022Allow2110NoNo
17017487EDGE RING AND PLASMA PROCESSING APPARATUSSeptember 2020August 2023Allow3521YesNo
17000701METHOD AND DEVICE TO REDUCE EPITAXIAL DEFECTS DUE TO CONTACT STRESS UPON A SEMICONDCUTOR WAFERAugust 2020December 2024Allow5251YesNo
16944271SUBSTRATE LIFT MECHANISM AND REACTOR INCLUDING SAMEJuly 2020October 2022Allow2610NoNo
16965419SAMPLE HOLDERJuly 2020December 2022Allow2910YesNo
16939683Thermal Reflector Device for Semiconductor Fabrication ToolJuly 2020December 2022Allow2920NoNo
16939160SHEATH AND TEMPERATURE CONTROL OF PROCESS KITJuly 2020September 2023Allow3831YesNo
16960818REPLACEABLE AND/OR COLLAPSIBLE EDGE RING ASSEMBLIES FOR PLASMA SHEATH TUNING INCORPORATING EDGE RING POSITIONING AND CENTERING FEATURESJuly 2020June 2023Allow3521YesNo
16918299SUPPORT UNIT AND SUBSTRATE TREATING APPARATUS INCLUDING THE SAMEJuly 2020October 2023Allow4031YesNo
16903505DEPOSITION SYSTEM WITH VACUUM PRE-LOADED DEPOSITION HEADJune 2020August 2022Allow2620YesNo
16878582HEATING APPARATUS AND CHEMICAL VAPOR DEPOSITION SYSTEMMay 2020November 2023Abandon4230YesNo
16878443SEMICONDUCTOR REACTION CHAMBER SHOWERHEADMay 2020July 2022Allow2640NoNo
16871567SUBSTRATE PROCESSING APPARATUSMay 2020August 2023Abandon3921NoNo
16868539HEATING APPARATUS AND CHEMICAL VAPOR DEPOSITION SYSTEMMay 2020November 2022Allow3020YesNo
16864282SEMICONDUCTOR MANUFACTURING DEVICE MEMBER, METHOD FOR MANUFACTURING THE SAME, AND FORMING DIEMay 2020April 2024Abandon4841YesNo
16863835SUBSTRATE PEDESTAL INCLUDING BACKSIDE GAS-DELIVERY TUBEApril 2020December 2022Allow3131YesNo
16852154APPARATUS, SYSTEMS, AND METHODS OF MEASURING EDGE RING DISTANCE FOR THERMAL PROCESSING CHAMBERSApril 2020October 2023Allow4521YesNo
16848211SUBSTRATE PROCESSING APPARATUSApril 2020October 2023Abandon4331YesNo
16834132WAFER INSPECTION APPARATUSESMarch 2020February 2023Allow3410YesNo
16834597ELECTROSTATIC HOLDING APPARATUS WITH A LAYERED COMPOSITE ELECTRODE DEVICE AND METHOD FOR THE PRODUCTION THEREOFMarch 2020July 2022Allow2810NoNo
16825352VACUUM CHUCK, SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME AND RELATED METHOD OF MANUFACTUREMarch 2020August 2022Allow2910YesNo
16823462Temperature control roller, transporting arrangement and vacuum arrangementMarch 2020September 2022Allow3021YesNo

Appeals Overview

This analysis examines appeal outcomes and the strategic value of filing appeals for examiner BENNETT, CHARLEE.

Patent Trial and Appeal Board (PTAB) Decisions

Total PTAB Decisions
14
Examiner Affirmed
7
(50.0%)
Examiner Reversed
7
(50.0%)
Reversal Percentile
69.6%
Higher than average

What This Means

With a 50.0% reversal rate, the PTAB reverses the examiner's rejections in a meaningful percentage of cases. This reversal rate is above the USPTO average, indicating that appeals have better success here than typical.

Strategic Value of Filing an Appeal

Total Appeal Filings
39
Allowed After Appeal Filing
19
(48.7%)
Not Allowed After Appeal Filing
20
(51.3%)
Filing Benefit Percentile
75.3%
Higher than average

Understanding Appeal Filing Strategy

Filing a Notice of Appeal can sometimes lead to allowance even before the appeal is fully briefed or decided by the PTAB. This occurs when the examiner or their supervisor reconsiders the rejection during the mandatory appeal conference (MPEP § 1207.01) after the appeal is filed.

In this dataset, 48.7% of applications that filed an appeal were subsequently allowed. This appeal filing benefit rate is in the top 25% across the USPTO, indicating that filing appeals is particularly effective here. The act of filing often prompts favorable reconsideration during the mandatory appeal conference.

Strategic Recommendations

Appeals to PTAB show good success rates. If you have a strong case on the merits, consider fully prosecuting the appeal to a Board decision.

Filing a Notice of Appeal is strategically valuable. The act of filing often prompts favorable reconsideration during the mandatory appeal conference.

Examiner BENNETT, CHARLEE - Prosecution Strategy Guide

Executive Summary

Examiner BENNETT, CHARLEE works in Art Unit 1718 and has examined 505 patent applications in our dataset. With an allowance rate of 54.3%, this examiner allows applications at a lower rate than most examiners at the USPTO. Applications typically reach final disposition in approximately 43 months.

Allowance Patterns

Examiner BENNETT, CHARLEE's allowance rate of 54.3% places them in the 10% percentile among all USPTO examiners. This examiner is less likely to allow applications than most examiners at the USPTO.

Office Action Patterns

On average, applications examined by BENNETT, CHARLEE receive 3.05 office actions before reaching final disposition. This places the examiner in the 96% percentile for office actions issued. This examiner issues more office actions than most examiners, which may indicate thorough examination or difficulty in reaching agreement with applicants.

Prosecution Timeline

The median time to disposition (half-life) for applications examined by BENNETT, CHARLEE is 43 months. This places the examiner in the 3% percentile for prosecution speed. Applications take longer to reach final disposition with this examiner compared to most others.

Interview Effectiveness

Conducting an examiner interview provides a +39.0% benefit to allowance rate for applications examined by BENNETT, CHARLEE. This interview benefit is in the 88% percentile among all examiners. Recommendation: Interviews are highly effective with this examiner and should be strongly considered as a prosecution strategy. Per MPEP § 713.10, interviews are available at any time before the Notice of Allowance is mailed or jurisdiction transfers to the PTAB.

Request for Continued Examination (RCE) Effectiveness

When applicants file an RCE with this examiner, 11.7% of applications are subsequently allowed. This success rate is in the 3% percentile among all examiners. Strategic Insight: RCEs show lower effectiveness with this examiner compared to others. Consider whether a continuation application might be more strategic, especially if you need to add new matter or significantly broaden claims.

After-Final Amendment Practice

This examiner enters after-final amendments leading to allowance in 28.1% of cases where such amendments are filed. This entry rate is in the 31% percentile among all examiners. Strategic Recommendation: This examiner shows below-average receptiveness to after-final amendments. You may need to file an RCE or appeal rather than relying on after-final amendment entry.

Pre-Appeal Conference Effectiveness

When applicants request a pre-appeal conference (PAC) with this examiner, 88.9% result in withdrawal of the rejection or reopening of prosecution. This success rate is in the 65% percentile among all examiners. Strategic Recommendation: Pre-appeal conferences show above-average effectiveness with this examiner. If you have strong arguments, a PAC request may result in favorable reconsideration.

Appeal Withdrawal and Reconsideration

This examiner withdraws rejections or reopens prosecution in 68.9% of appeals filed. This is in the 49% percentile among all examiners. Of these withdrawals, 41.9% occur early in the appeal process (after Notice of Appeal but before Appeal Brief). Strategic Insight: This examiner shows below-average willingness to reconsider rejections during appeals. Be prepared to fully prosecute appeals if filed.

Petition Practice

When applicants file petitions regarding this examiner's actions, 72.7% are granted (fully or in part). This grant rate is in the 88% percentile among all examiners. Strategic Note: Petitions are frequently granted regarding this examiner's actions compared to other examiners. Per MPEP § 1002.02(c), various examiner actions are petitionable to the Technology Center Director, including prematureness of final rejection, refusal to enter amendments, and requirement for information. If you believe an examiner action is improper, consider filing a petition.

Examiner Cooperation and Flexibility

Examiner's Amendments: This examiner makes examiner's amendments in 0.0% of allowed cases (in the 3% percentile). This examiner rarely makes examiner's amendments compared to other examiners. You should expect to make all necessary claim amendments yourself through formal amendment practice.

Quayle Actions: This examiner issues Ex Parte Quayle actions in 1.5% of allowed cases (in the 61% percentile). This examiner issues Quayle actions more often than average when claims are allowable but formal matters remain (MPEP § 714.14).

Prosecution Strategy Recommendations

Based on the statistical analysis of this examiner's prosecution patterns, here are tailored strategic recommendations:

  • Prepare for rigorous examination: With a below-average allowance rate, ensure your application has strong written description and enablement support. Consider filing a continuation if you need to add new matter.
  • Expect multiple rounds of prosecution: This examiner issues more office actions than average. Address potential issues proactively in your initial response and consider requesting an interview early in prosecution.
  • Prioritize examiner interviews: Interviews are highly effective with this examiner. Request an interview after the first office action to clarify issues and potentially expedite allowance.
  • Plan for extended prosecution: Applications take longer than average with this examiner. Factor this into your continuation strategy and client communications.

Relevant MPEP Sections for Prosecution Strategy

  • MPEP § 713.10: Examiner interviews - available before Notice of Allowance or transfer to PTAB
  • MPEP § 714.12: After-final amendments - may be entered "under justifiable circumstances"
  • MPEP § 1002.02(c): Petitionable matters to Technology Center Director
  • MPEP § 1004: Actions requiring primary examiner signature (allowances, final rejections, examiner's answers)
  • MPEP § 1207.01: Appeal conferences - mandatory for all appeals
  • MPEP § 1214.07: Reopening prosecution after appeal

Important Disclaimer

Not Legal Advice: The information provided in this report is for informational purposes only and does not constitute legal advice. You should consult with a qualified patent attorney or agent for advice specific to your situation.

No Guarantees: We do not provide any guarantees as to the accuracy, completeness, or timeliness of the statistics presented above. Patent prosecution statistics are derived from publicly available USPTO data and are subject to data quality limitations, processing errors, and changes in USPTO practices over time.

Limitation of Liability: Under no circumstances will IronCrow AI be liable for any outcome, decision, or action resulting from your reliance on the statistics, analysis, or recommendations presented in this report. Past prosecution patterns do not guarantee future results.

Use at Your Own Risk: While we strive to provide accurate and useful prosecution statistics, you should independently verify any information that is material to your prosecution strategy and use your professional judgment in all patent prosecution matters.