Detailed information about the 100 most recent patent applications.
| Application Number | Title | Filing Date | Disposal Date | Disposition | Time (months) | Office Actions | Restrictions | Interview | Appeal |
|---|---|---|---|---|---|---|---|---|---|
| 18913440 | METHODS AND APPARATUS FOR COMPRESSING MATERIAL DURING ADDITIVE MANUFACTURING | October 2024 | May 2025 | Allow | 7 | 1 | 1 | Yes | No |
| 18838765 | CHEMICAL VAPOR INFILTRATION DENSIFICATION METHOD USING SINGLE-PILE PLATES FOR A SEMI-FORCED FLOW | August 2024 | February 2025 | Allow | 6 | 0 | 0 | Yes | No |
| 18633942 | SILICON CARBIDE THIN FILMS AND VAPOR DEPOSITION METHODS THEREOF | April 2024 | April 2025 | Allow | 12 | 1 | 0 | Yes | No |
| 18419036 | METHODS AND APPARATUS FOR COMPRESSING MATERIAL DURING ADDITIVE MANUFACTURING | January 2024 | July 2024 | Allow | 5 | 1 | 0 | Yes | No |
| 18539977 | CONFORMAL DEPOSITION OF SILICON CARBIDE FILMS | December 2023 | November 2024 | Allow | 11 | 1 | 0 | No | No |
| 18540854 | SEMICONDUCTOR PROCESSING APPARATUS AND MIXING INLET DEVICE | December 2023 | January 2025 | Allow | 14 | 1 | 0 | No | No |
| 18501395 | DOPED OR UNDOPED SILICON CARBIDE DEPOSITION AND REMOTE HYDROGEN PLASMA EXPOSURE FOR GAPFILL | November 2023 | January 2025 | Allow | 14 | 1 | 0 | Yes | No |
| 18380803 | METHODS OF SELECTIVE ATOMIC LAYER DEPOSITION | October 2023 | March 2025 | Allow | 17 | 1 | 0 | No | No |
| 18475316 | LOADING DEVICE, ARRANGEMENT AND METHOD FOR LOADING A REACTION CHAMBER | September 2023 | September 2024 | Allow | 12 | 2 | 1 | Yes | No |
| 18475338 | GAS FEEDING CUP AND A GAS MANIFOLD ASSEMBLY | September 2023 | June 2024 | Allow | 9 | 2 | 0 | Yes | No |
| 18475291 | ATOMIC LAYER DEPOSITION REACTOR ARRANGEMENT AND A METHOD FOR OPERATING AN ATOMIC LAYER DEPOSITION REACTOR ARRANGEMENT | September 2023 | June 2024 | Allow | 8 | 1 | 1 | Yes | No |
| 18370033 | Tungsten Film-Forming Method, Film-Forming System and Storage Medium | September 2023 | June 2025 | Abandon | 20 | 2 | 0 | No | No |
| 18229678 | PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD | August 2023 | April 2025 | Allow | 20 | 3 | 1 | Yes | No |
| 18212599 | REACTOR FOR COATING PARTICLES IN STATIONARY CHAMBER WITH ROTATING PADDLES | June 2023 | July 2024 | Allow | 13 | 1 | 0 | Yes | No |
| 18323460 | INTERSECTING MODULE | May 2023 | July 2024 | Allow | 14 | 1 | 0 | No | No |
| 18312606 | DEVICE AND METHOD FOR SUBSTRATE TRANSPORT IN VACUUM PROCESSING SYSTEMS | May 2023 | July 2024 | Allow | 14 | 1 | 1 | Yes | No |
| 18127210 | QUANTUM PRINTING NANOSTRUCTURES WITHIN CARBON NANOPORES | March 2023 | December 2023 | Allow | 8 | 0 | 0 | No | No |
| 18190246 | LOW TEMPERATURE DEPOSITION OF IRIDIUM CONTAINING FILMS | March 2023 | February 2024 | Allow | 10 | 1 | 0 | Yes | No |
| 18245618 | POWDER CONVEYING APPARATUS, GAS SUPPLY APPARATUS, AND METHOD FOR REMOVING POWDER | March 2023 | July 2024 | Allow | 16 | 2 | 0 | Yes | No |
| 18180585 | Apparatus and Method of Manufacturing Oxide Film and Display Apparatus Including the Oxide Film | March 2023 | December 2024 | Allow | 22 | 1 | 0 | Yes | No |
| 18042963 | METHOD FOR COATING FIBERS IN A FLUIDIZED BED | February 2023 | October 2023 | Allow | 8 | 1 | 1 | Yes | No |
| 18173688 | THIN FILM DEPOSITION APPARATUS | February 2023 | October 2023 | Allow | 8 | 1 | 0 | No | No |
| 18107359 | APPARATUS, METHOD, AND RECORDING MEDIUM STORING COMMAND FOR CONTROLLING THIN-FILM DEPOSITION PROCESS | February 2023 | March 2025 | Allow | 25 | 3 | 0 | Yes | No |
| 18103812 | DYNAMIC ELECTRICAL AND FLUID DELIVERY SYSTEM WITH INDEXING MOTION FOR BATCH PROCESSING CHAMBERS | January 2023 | January 2024 | Allow | 11 | 1 | 0 | No | No |
| 18101666 | SUBSTRATE PROCESSING APPARATUS AND METHOD FOR PROCESSING SUBSTRATES | January 2023 | June 2025 | Allow | 28 | 2 | 0 | Yes | No |
| 18100637 | METHODS FOR SELECTIVELY DEPOSITING AN AMORPHOUS SILICON FILM ON A SUBSTRATE | January 2023 | July 2025 | Allow | 29 | 3 | 0 | Yes | No |
| 18099339 | Organic Vapor Jet Printing System | January 2023 | January 2024 | Allow | 11 | 2 | 0 | Yes | No |
| 18096867 | SOLID PRECURSOR FEED SYSTEM FOR THIN FILM DEPOSITIONS | January 2023 | June 2023 | Allow | 5 | 0 | 0 | No | No |
| 17991226 | FILM FORMING METHOD | November 2022 | September 2024 | Allow | 22 | 2 | 1 | Yes | No |
| 17988978 | QUANTUM PRINTING METHODS | November 2022 | January 2024 | Allow | 14 | 1 | 0 | No | No |
| 18053368 | SURFACE TREATMENT APPARATUS | November 2022 | April 2025 | Allow | 29 | 0 | 0 | No | No |
| 17920578 | DIVERTLESS GAS-DOSING | October 2022 | May 2025 | Allow | 31 | 1 | 0 | No | No |
| 17962499 | POWDER COATING DEVICE | October 2022 | March 2025 | Allow | 29 | 0 | 0 | No | No |
| 17957624 | MINIMIZATION OF CHEMICAL VAPOR INFILTRATION TOOLING HOLE LENGTH THROUGH WINDOWS | September 2022 | January 2024 | Allow | 16 | 1 | 1 | Yes | No |
| 17957628 | CERAMIC MATRIX COMPOSITE TOOLING FOR CHEMICAL VAPOR INFILTRATION PROCESS | September 2022 | August 2024 | Allow | 23 | 2 | 1 | Yes | No |
| 17913375 | VAPORIZATION SYSTEM | September 2022 | April 2025 | Allow | 31 | 1 | 0 | Yes | No |
| 17948647 | METAL MACROSTRUCTURES | September 2022 | April 2024 | Allow | 19 | 2 | 0 | Yes | No |
| 17944481 | Quantum Printing Apparatus and Method of Using Same | September 2022 | May 2023 | Allow | 8 | 0 | 0 | No | No |
| 17900577 | PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS | August 2022 | April 2024 | Allow | 20 | 0 | 0 | No | No |
| 17801544 | POWDER ATOMIC LAYER DEPOSITION EQUIPMENT AND GAS SUPPLY METHOD THEREFOR | August 2022 | May 2025 | Allow | 33 | 2 | 1 | No | No |
| 17798654 | APPARATUS, SYSTEM AND METHOD FOR PROVIDING A SUBSTRATE CHUCK | August 2022 | April 2025 | Allow | 32 | 2 | 0 | No | No |
| 17881368 | EVAPORATOR FOR EFFECTIVE SURFACE AREA EVAPORATION | August 2022 | July 2025 | Allow | 35 | 2 | 0 | Yes | No |
| 17880412 | RADIATION SHIELD | August 2022 | May 2025 | Allow | 34 | 1 | 1 | Yes | No |
| 17810773 | CHEMICAL VAPOR DEPOSITION FURNACE WITH A CLEANING GAS SYSTEM TO PROVIDE A CLEANING GAS | July 2022 | May 2024 | Allow | 22 | 2 | 1 | Yes | No |
| 17810094 | SEMICONDUCTOR DEPOSITION REACTOR AND COMPONENTS FOR REDUCED QUARTZ DEVITRIFICATION | June 2022 | December 2024 | Allow | 30 | 1 | 0 | No | No |
| 17810115 | MANIFOLDS FOR UNIFORM VAPOR DEPOSITION | June 2022 | June 2025 | Allow | 35 | 2 | 0 | No | No |
| 17847306 | LIQUID PRECURSOR VAPOR PRESSURE CONTROL | June 2022 | January 2025 | Allow | 31 | 2 | 0 | No | No |
| 17788192 | TRANSFER APPARATUS AND FILM DEPOSITION APPARATUS USING TRANSFER APPARATUS | June 2022 | February 2025 | Allow | 32 | 1 | 0 | No | No |
| 17844153 | Combination CVD/ALD method, source and pulse profile modification | June 2022 | January 2025 | Allow | 31 | 1 | 0 | Yes | No |
| 17784628 | Method and System for Production of Layered CU-Graphene Ultra Conductor Wire | June 2022 | February 2025 | Abandon | 32 | 1 | 0 | No | No |
| 17829144 | PLASMA PROCESSING DEVICE | May 2022 | November 2024 | Allow | 29 | 1 | 0 | No | No |
| 17664881 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD | May 2022 | January 2025 | Allow | 32 | 1 | 0 | No | No |
| 17779181 | SUBSTRATE PROCESSING APPARATUS AND METHOD | May 2022 | April 2025 | Allow | 35 | 2 | 0 | No | No |
| 17729067 | DEVICE FOR ETCHING THE PERIPHERY EDGE OF A SUBSTRATE COMPRISING SUBSTRATE SENSING UNIT | April 2022 | August 2024 | Allow | 28 | 1 | 0 | No | No |
| 17723913 | QUANTUM PRINTING NANOSTRUCTURES WITHIN CARBON NANOPORES | April 2022 | January 2023 | Allow | 9 | 1 | 0 | Yes | No |
| 17723915 | QUANTUM PRINTING NANOSTRUCTURES WITHIN CARBON NANOPORES | April 2022 | January 2023 | Allow | 9 | 1 | 0 | No | No |
| 17659514 | INFORMATION PROCESSING SYSTEM, TEMPERATURE CONTROL METHOD, AND HEAT TREATMENT APPARATUS | April 2022 | May 2025 | Allow | 37 | 2 | 0 | Yes | No |
| 17658935 | DOPED OR UNDOPED SILICON CARBIDE DEPOSITION AND REMOTE HYDROGEN PLASMA EXPOSURE FOR GAPFILL | April 2022 | May 2023 | Abandon | 13 | 2 | 0 | No | No |
| 17658937 | DOPED OR UNDOPED SILICON CARBIDE DEPOSITION AND REMOTE HYDROGEN PLASMA EXPOSURE FOR GAPFILL | April 2022 | May 2023 | Abandon | 13 | 2 | 0 | No | No |
| 17714363 | SEMICONDUCTOR PROCESSING APPARATUS AND SEMICONDUCTOR PROCESSING METHOD USING THE SAME | April 2022 | January 2025 | Allow | 34 | 1 | 1 | Yes | No |
| 17714383 | METHODS FOR DEPOSITING A TRANSITION METAL NITRIDE FILM ON A SUBSTRATE BY ATOMIC LAYER DEPOSITION AND RELATED DEPOSITION APPARATUS | April 2022 | January 2024 | Allow | 21 | 3 | 1 | Yes | No |
| 17711260 | Apparatus and Method for Vacuum Deposition | April 2022 | June 2023 | Allow | 14 | 2 | 1 | Yes | No |
| 17708511 | TARGETED TEMPORAL ALD | March 2022 | March 2025 | Allow | 35 | 2 | 0 | Yes | No |
| 17656324 | METHOD FOR FORMING FILM AND PROCESSING APPARATUS | March 2022 | June 2024 | Allow | 27 | 2 | 1 | No | No |
| 17762302 | VACUUM COATING DEVICE | March 2022 | August 2024 | Allow | 29 | 1 | 0 | Yes | No |
| 17654126 | PLASMA PROCESSING APPARATUS | March 2022 | September 2024 | Allow | 31 | 1 | 0 | Yes | No |
| 17689453 | Lid Separation Device For Vacuum Chamber | March 2022 | September 2024 | Allow | 30 | 1 | 1 | No | No |
| 17684523 | FILM DEPOSITION SYSTEMS AND METHODS | March 2022 | July 2024 | Allow | 29 | 1 | 0 | Yes | No |
| 17639288 | VAPORIZED FEED DEVICE | February 2022 | February 2024 | Allow | 24 | 1 | 0 | No | No |
| 17753084 | PLASMA VIEWPORT | February 2022 | December 2024 | Allow | 33 | 2 | 0 | No | No |
| 17635389 | HIGH-THROUGHPUT VAPOR DEPOSITION APPARATUS AND VAPOR DEPOSITION METHOD | February 2022 | September 2024 | Allow | 31 | 2 | 1 | No | No |
| 17671206 | Substrate Processing Apparatus, Substrate Processing Method, Method of Manufacturing Semiconductor Device and Non-transitory Computer-readable Recording Medium | February 2022 | August 2024 | Allow | 30 | 2 | 1 | Yes | No |
| 17586505 | CONFORMAL DEPOSITION OF SILICON CARBIDE FILMS | January 2022 | September 2023 | Allow | 20 | 4 | 1 | Yes | No |
| 17584848 | PROCESSING APPARATUS AND PROCESSING METHOD | January 2022 | February 2024 | Allow | 25 | 1 | 0 | No | No |
| 17584273 | METHOD OF AREA-SELECTIVE DEPOSITION AND METHOD OF FABRICATING AN ELECTRONIC DEVICE USING THE SAME | January 2022 | July 2024 | Allow | 29 | 2 | 0 | No | No |
| 17628682 | SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS | January 2022 | April 2024 | Abandon | 26 | 0 | 1 | No | No |
| 17648337 | POWDER TRANSFER APPARATUS, GAS SUPPLY APPARATUS, AND POWDER REMOVAL METHOD | January 2022 | February 2024 | Allow | 25 | 1 | 1 | No | No |
| 17575903 | METHOD AND APPARATUS FOR PRECURSOR GAS INJECTION | January 2022 | December 2024 | Allow | 35 | 2 | 1 | Yes | No |
| 17625730 | SUBSTRATE PROCESSING APPARATUS | January 2022 | April 2024 | Allow | 27 | 1 | 0 | No | No |
| 17569236 | THIN-FILM-DEPOSITION MACHINE | January 2022 | October 2023 | Allow | 22 | 1 | 0 | No | No |
| 17562882 | ATOMIC-LAYER-DEPOSITION EQUIPMENT AND ATOMICLAYER-DEPOSITION METHOD BY USING THE SAME | December 2021 | November 2023 | Allow | 23 | 1 | 0 | No | No |
| 17622316 | PRECURSOR SOURCE ARRANGEMENT AND ATOMIC LAYER DEPOSITION APPARATUS | December 2021 | March 2024 | Allow | 51 | 1 | 0 | No | No |
| 17596693 | PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM | December 2021 | May 2025 | Allow | 41 | 4 | 0 | Yes | No |
| 17551698 | AUXILIARY PLASMA SOURCE FOR ROBUST IGNITION AND RESTRIKES IN A PLASMA CHAMBER | December 2021 | June 2025 | Allow | 42 | 2 | 1 | Yes | No |
| 17643064 | FILM DEPOSITION DEVICE AND SUBSTRATE SUPPORT DEVICE | December 2021 | October 2024 | Abandon | 35 | 4 | 0 | Yes | No |
| 17543884 | CONTROL PROGRAM, CONTAINER AND SEMICONDUCTOR DEVICE MANUFACTURING SYSTEM FOR CHARGING OF WAFER TYPE SENSOR AND AUTO TEACHING | December 2021 | May 2025 | Allow | 41 | 3 | 0 | Yes | No |
| 17543711 | Thermal Reactor for Generating Reactive Species for Chemical Vapor Deposition of Thin Films | December 2021 | June 2024 | Allow | 30 | 2 | 1 | Yes | No |
| 17530161 | SUBSTRATE PROCESSING APPARATUS WITH AN INJECTOR | November 2021 | October 2024 | Allow | 35 | 4 | 0 | Yes | No |
| 17523914 | WAFER CARRIER AND METAL ORGANIC CHEMICAL VAPOR DEPOSITION APPARATUS | November 2021 | May 2024 | Abandon | 30 | 1 | 0 | No | No |
| 17508512 | METHOD AND APPARATUS FOR LASER DRILLING BLIND VIAS | October 2021 | May 2025 | Allow | 42 | 4 | 1 | Yes | No |
| 17605590 | APPARATUS AND METHOD FOR ATOMIC LAYER DEPOSITION (ALD) | October 2021 | January 2024 | Allow | 26 | 1 | 1 | Yes | No |
| 17507771 | COMPOSITIONS AND PROCESSES FOR DEPOSITING CARBON-DOPED SILICON-CONTAINING FILMS | October 2021 | March 2023 | Allow | 17 | 1 | 0 | No | No |
| 17505802 | COATED ELECTRICAL ASSEMBLY | October 2021 | August 2024 | Allow | 34 | 2 | 0 | No | No |
| 17450742 | SELECTIVE DEPOSITION ON METAL OR METALLIC SURFACES RELATIVE TO DIELECTRIC SURFACES | October 2021 | February 2025 | Abandon | 40 | 5 | 0 | Yes | No |
| 17491778 | ONE-BODY SHADOW FRAME SUPPORT WITH FLOW CONTROLLER | October 2021 | October 2023 | Allow | 25 | 1 | 1 | Yes | No |
| 17489864 | GROUP 6 TRANSITION METAL-CONTAINING COMPOUNDS FOR VAPOR DEPOSITION OF GROUP 6 TRANSITION METAL-CONTAINING FILMS | September 2021 | September 2022 | Allow | 12 | 0 | 0 | No | No |
| 17600180 | INSULATED PIPE CONTAINING POLYURETHANE FOAM WHICH IS FOAMED BY AN ENVIRONMENTALLY FRIENDLY FOAMING AGENT AND HAS A LOW DEGREE OF BRITTLENESS | September 2021 | January 2024 | Allow | 27 | 1 | 0 | No | No |
| 17486286 | Silicon Carbide Thin Films and Vapor Deposition Methods Thereof | September 2021 | March 2024 | Allow | 30 | 4 | 0 | Yes | No |
| 17486352 | SOLID PRECURSOR FEED SYSTEM FOR THIN FILM DEPOSITIONS | September 2021 | October 2022 | Allow | 13 | 0 | 0 | No | No |
| 17448787 | ALD OF METAL-CONTAINING FILMS USING CYCLOPENTADIENYL COMPOUNDS | September 2021 | July 2023 | Abandon | 21 | 2 | 0 | No | No |
This analysis examines appeal outcomes and the strategic value of filing appeals for examiner MILLER, JR, JOSEPH ALBERT.
With a 18.5% reversal rate, the PTAB affirms the examiner's rejections in the vast majority of cases. This reversal rate is below the USPTO average, indicating that appeals face more challenges here than typical.
Filing a Notice of Appeal can sometimes lead to allowance even before the appeal is fully briefed or decided by the PTAB. This occurs when the examiner or their supervisor reconsiders the rejection during the mandatory appeal conference (MPEP § 1207.01) after the appeal is filed.
In this dataset, 31.4% of applications that filed an appeal were subsequently allowed. This appeal filing benefit rate is below the USPTO average, suggesting that filing an appeal has limited effectiveness in prompting favorable reconsideration.
⚠ Appeals to PTAB face challenges. Ensure your case has strong merit before committing to full Board review.
⚠ Filing a Notice of Appeal shows limited benefit. Consider other strategies like interviews or amendments before appealing.
Examiner MILLER, JR, JOSEPH ALBERT works in Art Unit 1715 and has examined 1,173 patent applications in our dataset. With an allowance rate of 69.3%, this examiner allows applications at a lower rate than most examiners at the USPTO. Applications typically reach final disposition in approximately 29 months.
Examiner MILLER, JR, JOSEPH ALBERT's allowance rate of 69.3% places them in the 23% percentile among all USPTO examiners. This examiner is less likely to allow applications than most examiners at the USPTO.
On average, applications examined by MILLER, JR, JOSEPH ALBERT receive 2.14 office actions before reaching final disposition. This places the examiner in the 72% percentile for office actions issued. This examiner issues a slightly above-average number of office actions.
The median time to disposition (half-life) for applications examined by MILLER, JR, JOSEPH ALBERT is 29 months. This places the examiner in the 44% percentile for prosecution speed. Prosecution timelines are slightly slower than average with this examiner.
Conducting an examiner interview provides a +16.2% benefit to allowance rate for applications examined by MILLER, JR, JOSEPH ALBERT. This interview benefit is in the 60% percentile among all examiners. Recommendation: Interviews provide an above-average benefit with this examiner and are worth considering.
When applicants file an RCE with this examiner, 27.2% of applications are subsequently allowed. This success rate is in the 37% percentile among all examiners. Strategic Insight: RCEs show below-average effectiveness with this examiner. Carefully evaluate whether an RCE or continuation is the better strategy.
This examiner enters after-final amendments leading to allowance in 28.8% of cases where such amendments are filed. This entry rate is in the 33% percentile among all examiners. Strategic Recommendation: This examiner shows below-average receptiveness to after-final amendments. You may need to file an RCE or appeal rather than relying on after-final amendment entry.
When applicants request a pre-appeal conference (PAC) with this examiner, 91.7% result in withdrawal of the rejection or reopening of prosecution. This success rate is in the 66% percentile among all examiners. Strategic Recommendation: Pre-appeal conferences show above-average effectiveness with this examiner. If you have strong arguments, a PAC request may result in favorable reconsideration.
This examiner withdraws rejections or reopens prosecution in 60.3% of appeals filed. This is in the 32% percentile among all examiners. Of these withdrawals, 36.6% occur early in the appeal process (after Notice of Appeal but before Appeal Brief). Strategic Insight: This examiner shows below-average willingness to reconsider rejections during appeals. Be prepared to fully prosecute appeals if filed.
When applicants file petitions regarding this examiner's actions, 60.0% are granted (fully or in part). This grant rate is in the 76% percentile among all examiners. Strategic Note: Petitions are frequently granted regarding this examiner's actions compared to other examiners. Per MPEP § 1002.02(c), various examiner actions are petitionable to the Technology Center Director, including prematureness of final rejection, refusal to enter amendments, and requirement for information. If you believe an examiner action is improper, consider filing a petition.
Examiner's Amendments: This examiner makes examiner's amendments in 2.3% of allowed cases (in the 79% percentile). Per MPEP § 1302.04, examiner's amendments are used to place applications in condition for allowance when only minor changes are needed. This examiner frequently uses this tool compared to other examiners, indicating a cooperative approach to getting applications allowed. Strategic Insight: If you are close to allowance but minor claim amendments are needed, this examiner may be willing to make an examiner's amendment rather than requiring another round of prosecution.
Quayle Actions: This examiner issues Ex Parte Quayle actions in 1.2% of allowed cases (in the 59% percentile). This examiner issues Quayle actions more often than average when claims are allowable but formal matters remain (MPEP § 714.14).
Based on the statistical analysis of this examiner's prosecution patterns, here are tailored strategic recommendations:
Not Legal Advice: The information provided in this report is for informational purposes only and does not constitute legal advice. You should consult with a qualified patent attorney or agent for advice specific to your situation.
No Guarantees: We do not provide any guarantees as to the accuracy, completeness, or timeliness of the statistics presented above. Patent prosecution statistics are derived from publicly available USPTO data and are subject to data quality limitations, processing errors, and changes in USPTO practices over time.
Limitation of Liability: Under no circumstances will IronCrow AI be liable for any outcome, decision, or action resulting from your reliance on the statistics, analysis, or recommendations presented in this report. Past prosecution patterns do not guarantee future results.
Use at Your Own Risk: While we strive to provide accurate and useful prosecution statistics, you should independently verify any information that is material to your prosecution strategy and use your professional judgment in all patent prosecution matters.