USPTO Examiner KUNEMUND ROBERT M - Art Unit 1714

Recent Applications

Detailed information about the 100 most recent patent applications.

Application NumberTitleFiling DateDisposal DateDispositionTime (months)Office ActionsRestrictionsInterviewAppeal
18730316A method for crystallization of active pharmaceutical ingredientsJuly 2024March 2025Allow800NoNo
18636784FORMING OPTICAL COMPONENTS USING SELECTIVE AREA EPITAXYApril 2024January 2025Allow910NoNo
18626962SYSTEMS FOR PRODUCTION OF LOW OXYGEN CONTENT SILICONApril 2024November 2024Allow810NoNo
18616770MULTILAYER STRUCTUREMarch 2024January 2025Abandon1010NoNo
18690530PVT-METHOD AND DEVICE FOR PRODUCING SINGLE CRYSTALS IN A SAFE MANNER WITH REGARD TO THE PROCESSMarch 2024December 2024Allow900NoNo
18434568ULTRAPURE MINERALIZER AND IMPROVED METHODS FOR NITRIDE CRYSTAL GROWTHFebruary 2024December 2024Allow1010NoNo
18426526DIAMONDS AND HETERO-EPITAXIAL METHOD OF FORMING DIAMONDSJanuary 2024April 2025Allow1420NoNo
18391435Enhanced Perovskite Materials for Photovoltaic DevicesDecember 2023January 2025Allow1310NoNo
18491738METHODS AND DEVICES FOR GROWING SCINTILLATION CRYSTALSOctober 2023June 2024Allow810NoNo
18369370CHEMICAL VAPOR DEPOSITION GROWTH OF HEXAGONAL BORON NITRIDE FILMS AND NANOSTRUCTURESSeptember 2023May 2025Allow2010NoNo
18369372CYLINDRICAL SILICON INGOT MANUFACTURING METHODSeptember 2023May 2025Allow2010NoNo
18451511Substrate For Epitaxial Growth, Manufacturing Method of the Same, Semiconductor Device Including the Same and Manufacturing Method Using the SameAugust 2023June 2025Abandon2210NoNo
18225981HIGH-THROUGHPUT CRYSTALLOGRAPHIC SCREENING DEVICE AND METHOD FOR CRYSTALIZING MEMBRANE PROTEINS USING A SUB PHYSIOLOGICAL RESTING MEMBRANE POTENTIAL ACROSS A LIPID MATRIX OF VARIABLE COMPOSITIONJuly 2023June 2024Allow1110NoNo
18351402TEMPLATE FOR GROWING A CRYSTAL OF A TWO-DIMENSIONAL MATERIALJuly 2023June 2025Allow2300NoNo
18214052SINGLE CRYSTAL MANUFACTURING APPARATUS AND METHODJune 2023August 2024Allow1320NoNo
18336024SILICON INGOT, SILICON BLOCK, SILICON SUBSTRATE, METHOD FOR MANUFACTURING SILICON INGOT, AND SOLAR CELLJune 2023August 2024Abandon1410NoNo
18205886SILICON WAFER AND MANUFACTURING METHOD OF THE SAMEJune 2023August 2024Allow2710NoNo
18255448CONTINUOUS PROCESS AND SYSTEM FOR THE PRODUCTION OF SODIUM BICARBONATE CRYSTALSJune 2023May 2025Allow2300NoNo
18321823PREPARATION AND APPLICATION OF HIGHLY COHERENT DIAMOND NITROGEN VACANCY AND DIAMOND ANVILMay 2023December 2023Allow700NoNo
18143557METHOD OF MANUFACTURE OF SINGLE CRYSTAL SYNTHETIC DIAMOND MATERIALMay 2023May 2024Allow1210YesNo
18142415FABRICATION OF FILMS HAVING CONTROLLED STOICHIOMETRY USING MOLECULAR BEAM EPITAXYMay 2023March 2024Allow1010NoNo
18307447STRUCTURES WITH BORON- AND GALLIUM-DOPED SILICON GERMANIUM LAYERS AND METHODS AND SYSTEMS FOR FORMING SAMEApril 2023June 2025Allow2610YesNo
18137150RECOVERING A CAUSTIC SOLUTION VIA CALCIUM CARBONATE CRYSTAL AGGREGATESApril 2023March 2024Allow1110NoNo
18302378SELF-STANDING GaN SUBSTRATE, GaN CRYSTAL, METHOD FOR PRODUCING GaN SINGLE CRYSTAL, AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICEApril 2023June 2024Allow1410NoNo
18298692BORON NITRIDE LAYER, APPARATUS INCLUDING THE SAME, AND METHOD OF FABRICATING THE BORON NITRIDE LAYERApril 2023July 2024Allow1500YesNo
18298713SYSTEMS FOR PRODUCTION OF LOW OXYGEN CONTENT SILICONApril 2023March 2024Allow1110NoNo
18247859METHOD FOR PRODUCING A SUBSTRATE FOR THE EPITAXIAL GROWTH OF A LAYER OF A GALIUM-BASED III-N ALLOYApril 2023January 2025Allow2110NoNo
18193483FERROELECTRIC THIN FILM AND FORMING METHOD THEREOFMarch 2023March 2025Allow2410NoNo
18028921INGOT GROWING APPARATUSMarch 2023March 2025Allow2300NoNo
18028682DEVICE FOR PRODUCING SILICON CARBIDE SINGLE CRYSTALSMarch 2023February 2025Allow2300NoNo
18189054METHOD FOR GROWING LONG-SEED DKDP CRYSTAL BY TWO-DIMENSIONAL MOTIONMarch 2023April 2025Allow2510YesNo
18188177SUBSTRATE PROCESSING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUM AND SUBSTRATE PROCESSING APPARATUSMarch 2023June 2025Allow2710YesNo
18024539METHOD FOR CVD DEPOSITION OF N-TYPE DOPED SILICON CARBIDE AND EPITAXIAL REACTORMarch 2023February 2025Allow2310YesNo
18024317METHOD FOR CONTROLLED GROWTH OF NANOCRYSTALSMarch 2023November 2024Allow2000NoNo
18176505METHOD FOR FABRICATION OF HALIDE PEROVSKITE SINGLE CRYSTAL COMPRISING LOW-TEMPERATURE SOLVATION PROCESSMarch 2023April 2025Allow2610NoNo
18172900INGOT GROWING APPARATUS AND METHOD THEREOFFebruary 2023May 2025Allow2710NoNo
18109904VAPOR DEPOSITION DEVICE AND METHOD OF PRODUCING EPITAXIAL WAFERFebruary 2023April 2025Allow2610NoNo
18040991METHOD FOR DEPOSITING AN EPITAXIAL LAYER ON A SUBSTRATE WAFERFebruary 2023February 2025Allow2410NoNo
18106333ADDITIVELY MANUFACTURED SINGLE-CRYSTAL METALLIC COMPONENTS, AND METHODS FOR PRODUCING THE SAMEFebruary 2023May 2024Allow1510NoNo
18100520Enhanced Perovskite Materials for Photovoltaic DevicesJanuary 2023September 2023Allow810NoNo
18006507LASER-BASED AFTERHEATING FOR CRYSTAL GROWTHJanuary 2023June 2025Abandon2920NoNo
18153282METHOD AND WAFER PROCESSING FURNACE FOR FORMING AN EPITAXIAL STACK OF SEMICONDUCTOR EPITAXIAL LAYERS ON A PLURALITY OF SUBSTRATESJanuary 2023May 2025Allow2821NoNo
18153272METHOD AND WAFER PROCESSING FURNACE FOR FORMING AN EPITAXIAL STACK ON A PLURALITY OF SUBSTRATESJanuary 2023March 2025Allow2611NoNo
18152544METHODS FOR PRODUCING A PRODUCT INGOT HAVING LOW OXYGEN CONTENTJanuary 2023March 2025Allow2610NoNo
18087156SILICON CARBIDE POWDER AND METHOD FOR MANUFACTURING SILICON CARBIDE INGOT USING THE SAMEDecember 2022February 2025Allow2610NoNo
18069987SINGLE CRYSTAL FURNACE CHARGING SYSTEM AND CHARGING METHODDecember 2022February 2025Allow2610NoNo
18068735EPITAXIAL ALKALI HALIDE LAYERS FOR III-V SUBSTRATE RECYCLINGDecember 2022November 2024Allow2310YesNo
18010335A FABRICATION PROCESS FOR FLEXIBLE SINGLE-CRYSTAL PEROVSKITE DEVICESDecember 2022May 2025Allow2920NoNo
18077455PRODUCTION APPARATUS FOR METAL OXIDE SINGLE CRYSTAL AND PRODUCTION METHOD FOR METAL OXIDE SINGLE CRYSTALDecember 2022November 2024Allow2420NoNo
18063646OPEN CZOCHRALSKI FURNACE FOR SINGLE CRYSTAL GROWTHDecember 2022September 2023Allow920NoNo
18062598OPEN CZOCHRALSKI FURNACE FOR SINGLE CRYSTAL GROWTHDecember 2022January 2024Allow1310NoNo
18062597OPEN CZOCHRALSKI FURNACE FOR SINGLE CRYSTAL GROWTHDecember 2022September 2023Allow1010NoNo
18062595OPEN CZOCHRALSKI FURNACE FOR SINGLE CRYSTAL GROWTHDecember 2022September 2023Allow920NoNo
18073898HEAT EXCHANGE DEVICE AND SINGLE CRYSTAL FURNACEDecember 2022April 2025Abandon2810NoNo
18073228METHOD OF PRODUCING LARGE GaAs AND GaP INFRARED WINDOWSDecember 2022September 2024Allow2200NoNo
18073179METHOD OF PRODUCING LARGE EMI SHIELDED GaAs INFRARED WINDOWSDecember 2022March 2025Allow2820NoNo
17928951Multi-Layer Semiconductor Material Structure and Preparation Method ThereofDecember 2022December 2024Allow2410NoNo
17993200SILICON CARBIDE SINGLE CRYSTAL SUBSTRATENovember 2022June 2023Allow610NoNo
17919106MANUFACTURING METHOD OF MODIFIED ALUMINUM NITRIDE RAW MATERIAL, MODIFIED ALUMINUM NITRIDE RAW MATERIAL, MANUFACTURING METHOD OF ALUMINUM NITRIDE CRYSTALS, AND DOWNFALL DEFECT PREVENTION METHODOctober 2022June 2025Allow3230NoNo
18046319SYSTEMS AND METHODS FOR CONTROLLING A GAS DOPANT VAPORIZATION RATE DURING A CRYSTAL GROWTH PROCESSOctober 2022November 2024Allow2510NoNo
18046314SYSTEMS AND METHODS FOR CONTROLLING A GAS DOPANT VAPORIZATION RATE DURING A CRYSTAL GROWTH PROCESSOctober 2022October 2024Allow2510NoNo
17964039METHOD FOR PRODUCING SILICON INGOT SINGLE CRYSTALOctober 2022September 2024Allow2310NoNo
17961663CONTROLLED SURFACE CHEMISTRY FOR POLYTYPIC AND MICROSTRUCTURAL SELECTIVE GROWTH ON HEXAGONAL SiC SUBSTRATESOctober 2022October 2024Allow2410NoNo
17907517METHOD FOR MANUFACTURING A COMPOSITE STRUCTURE COMPRISING A THIN LAYER MADE OF MONOCRYSTALLINE SIC ON A CARRIER SUBSTRATE MADE OF SICSeptember 2022July 2024Allow2210NoNo
17905985N-TYPE DOPED GERMANIUM MONOCRYSTALS AND WAFERS DERIVED THEREFROMSeptember 2022June 2025Allow3330NoNo
17909149FLUIDIZED BED GRANULATOR OR FLUIDIZED BED/SPOUTED BED GRANULATORSeptember 2022August 2024Allow2310NoNo
17900740PREPARATION OF CONSERVED HOMOLOGY 1 DOMAINS COMPLEXED TO LIGANDSAugust 2022September 2024Allow2510YesNo
17893802A METHOD OF PRODUCING A TWO-DIMENSIONAL MATERIALAugust 2022July 2023Allow1110NoNo
17819666MANUFACTURING METHOD OF SINGLE-CRYSTAL SILICON SUBSTRATEAugust 2022August 2024Allow2410YesNo
17884092APPARATUS, METHOD, AND PROCESS FOR DIRECTIONAL SOLIDIFICATION BY LIQUID METAL SPRAYING ENHANCED COOLING (LMSC)August 2022August 2024Allow2410YesNo
17797874MANUFACTURING METHOD FOR SEMICONDUCTOR SILICON WAFERAugust 2022March 2024Allow2000NoNo
17881646PREPARATION OF SINGLE-CRYSTAL LAYERED CATHODE MATERIALS FOR LITHIUM- AND SODIUM-ION BATTERIESAugust 2022April 2024Allow2100NoNo
17797073PROCESS FOR SYNTHESIZING INDIUM PHOSPHIDE BY LIQUID PHOSPHORUS INJECTION METHODAugust 2022September 2024Allow2510NoNo
17816558METHOD FOR MANUFACTURING A MONOCRYSTALLINE LAYER OF GAAS MATERIAL AND SUBSTRATE FOR EPITAXIAL GROWTH OF A MONOCRYSTALLINE LAYER OF GAAS MATERIALAugust 2022August 2023Allow1220NoNo
17794108Field-Editing Technology For Quantum Materials Synthesis Using A Magnetic Field Laser FurnaceJuly 2022August 2023Allow1310NoNo
17865873ACTIVE CLEANING VACUUM SYSTEM AND METHODJuly 2022April 2023Allow910NoNo
17812186METHOD FOR GROWING GALLIUM OXIDE SINGLE CRYSTAL BY CASTING AND SEMICONDUCTOR DEVICE CONTAINING GALLIUM OXIDE SINGLE CRYSTALJuly 2022December 2023Allow1720NoNo
17858776METHOD OF MANUFACTURING POLYCRYSTALLINE SILICON INGOT USING A CRUCIBLE IN WHICH AN OXYGEN EXHAUST PASSAGE IS FORMED BY SINGLE CRYSTAL OR POLYCRYSTALLINE RODSJuly 2022November 2023Allow1610NoNo
17790639SYSTEM FOR PRODUCING MAGNESIUM CHLORIDE AQUEOUS SOLUTION AND SYSTEM FOR PRODUCING MAGNESIUMJuly 2022March 2025Allow3300NoNo
17838956In-situ Laser Annealing of Te growth defects in CdZnTe (iLAST-CZT)June 2022March 2023Allow900NoNo
17837044EPITAXIAL GROWTH DEVICEJune 2022April 2025Allow3410NoNo
17834238Method for preparing large size Beta-type Ammonium tetramolybdate monocrystal particleJune 2022September 2023Allow1620NoNo
17826359CRYSTAL GROWTH DOPING APPARATUS AND CRYSTAL GROWTH DOPING METHODMay 2022March 2024Allow2200NoNo
17780162INGOT TEMPERATURE CONTROLLER AND WIRE SAWING DEVICE HAVING SAMEMay 2022July 2024Allow2610NoNo
17743039METHOD FOR DEPOSITING BORON CONTAINING SILICON GERMANIUM LAYERSMay 2022December 2023Allow1920YesNo
17755937NANOWIRES NETWORKMay 2022March 2025Allow3420NoNo
17775901ONLINE MEASUREMENT DEVICE FOR CRYSTAL SIZE AND SHAPE IN HIGH-SOLID-CONTENT CRYSTALLIZATION PROCESSMay 2022May 2024Allow2400NoNo
17741595HIGH-THROUGHPUT CRYSTALLOGRAPHIC SCREENING DEVICE AND METHOD FOR CRYSTALIZING MEMBRANE PROTEINS USING A SUB PHYSIOLOGICAL RESTING MEMBRANE POTENTIAL ACROSS A LIPID MATRIX OF VARIABLE COMPOSITIONMay 2022March 2023Allow1010NoNo
17734416METHOD AND APPARATUS FOR PRODUCING ALN WHISKERS , ALN WHISKER BODIES, ALN WHISKERS, RESIN MOLDED BODY, AND METHOD FOR PRODUCING RESIN MOLDED BODYMay 2022November 2023Allow1910NoNo
17660687COMPOSITIONS AND AGGREGATES COMPRISING BORON NITRIDE NANOTUBE STRUCTURES, AND METHODS OF MAKINGApril 2022August 2023Allow1510NoNo
17722014METHOD AND APPARATUS FOR LASER ANNEALINGApril 2022July 2024Allow2710NoNo
17658421APPARATUS FOR MANIPULATING CRYSTAL MORPHOLOGY TO ACHIEVE STABLE FLUIDIZATIONApril 2022April 2023Allow1300NoNo
17764116SIC SINGLE CRYSTAL MANUFACTURING METHOD, SIC SINGLE CRYSTAL MANUFACTURING DEVICE, AND SIC SINGLE CRYSTAL WAFERMarch 2022January 2024Allow2220NoNo
17702158CRYSTAL MANUFACTURING METHOD, CRYSTAL MANUFACTURING APPARATUS AND SINGLE CRYSTALMarch 2022August 2023Allow1710NoNo
17702219ORGANIC SOLID CRYSTAL - METHOD AND STRUCTUREMarch 2022February 2024Allow2310NoNo
17762101DEVICE AND METHOD FOR PULLING A SINGLE CRYSTAL OF SEMICONDUCTOR MATERIALMarch 2022August 2024Allow2910NoNo
17761322PREPARATION METHOD OF CONDUCTIVE GALLIUM OXIDE BASED ON DEEP LEARNING AND VERTICAL BRIDGMAN GROWTH METHODMarch 2022June 2024Allow2710NoNo
17761030PREPARATION METHOD OF HIGH RESISTANCE GALLIUM OXIDE BASED ON DEEP LEARNING AND VERTICAL BRIDGMAN GROWTH METHODMarch 2022April 2024Allow2520YesNo
17760945QUALITY PREDICTION METHOD, PREPARATION METHOD AND SYSTEM OF CONDUCTIVE GALLIUM OXIDE BASED ON DEEP LEARNING AND EDGE-DEFINED FILM-FED GROWTH METHODMarch 2022April 2024Allow2520NoNo
17760938QUALITY PREDICTION METHOD, PREPARATION METHOD AND SYSTEM OF HIGH RESISTANCE GALLIUM OXIDE BASED ON DEEP LEARNING AND CZOCHRALSKI METHODMarch 2022April 2024Allow2520NoNo

Appeals Overview

This analysis examines appeal outcomes and the strategic value of filing appeals for examiner KUNEMUND, ROBERT M.

Patent Trial and Appeal Board (PTAB) Decisions

Total PTAB Decisions
19
Examiner Affirmed
9
(47.4%)
Examiner Reversed
10
(52.6%)
Reversal Percentile
80.0%
Higher than average

What This Means

With a 52.6% reversal rate, the PTAB has reversed the examiner's rejections more often than affirming them. This reversal rate is in the top 25% across the USPTO, indicating that appeals are more successful here than in most other areas.

Strategic Value of Filing an Appeal

Total Appeal Filings
72
Allowed After Appeal Filing
34
(47.2%)
Not Allowed After Appeal Filing
38
(52.8%)
Filing Benefit Percentile
74.1%
Higher than average

Understanding Appeal Filing Strategy

Filing a Notice of Appeal can sometimes lead to allowance even before the appeal is fully briefed or decided by the PTAB. This occurs when the examiner or their supervisor reconsiders the rejection during the mandatory appeal conference (MPEP § 1207.01) after the appeal is filed.

In this dataset, 47.2% of applications that filed an appeal were subsequently allowed. This appeal filing benefit rate is above the USPTO average, suggesting that filing an appeal can be an effective strategy for prompting reconsideration.

Strategic Recommendations

Appeals to PTAB show good success rates. If you have a strong case on the merits, consider fully prosecuting the appeal to a Board decision.

Filing a Notice of Appeal is strategically valuable. The act of filing often prompts favorable reconsideration during the mandatory appeal conference.

Examiner KUNEMUND, ROBERT M - Prosecution Strategy Guide

Executive Summary

Examiner KUNEMUND, ROBERT M works in Art Unit 1714 and has examined 1,288 patent applications in our dataset. With an allowance rate of 85.6%, this examiner has an above-average tendency to allow applications. Applications typically reach final disposition in approximately 30 months.

Allowance Patterns

Examiner KUNEMUND, ROBERT M's allowance rate of 85.6% places them in the 57% percentile among all USPTO examiners. This examiner has an above-average tendency to allow applications.

Office Action Patterns

On average, applications examined by KUNEMUND, ROBERT M receive 1.57 office actions before reaching final disposition. This places the examiner in the 40% percentile for office actions issued. This examiner issues fewer office actions than average, which may indicate efficient prosecution or a more lenient examination style.

Prosecution Timeline

The median time to disposition (half-life) for applications examined by KUNEMUND, ROBERT M is 30 months. This places the examiner in the 39% percentile for prosecution speed. Prosecution timelines are slightly slower than average with this examiner.

Interview Effectiveness

Conducting an examiner interview provides a +13.3% benefit to allowance rate for applications examined by KUNEMUND, ROBERT M. This interview benefit is in the 54% percentile among all examiners. Recommendation: Interviews provide an above-average benefit with this examiner and are worth considering.

Request for Continued Examination (RCE) Effectiveness

When applicants file an RCE with this examiner, 29.7% of applications are subsequently allowed. This success rate is in the 48% percentile among all examiners. Strategic Insight: RCEs show below-average effectiveness with this examiner. Carefully evaluate whether an RCE or continuation is the better strategy.

After-Final Amendment Practice

This examiner enters after-final amendments leading to allowance in 66.5% of cases where such amendments are filed. This entry rate is in the 87% percentile among all examiners. Strategic Recommendation: This examiner is highly receptive to after-final amendments compared to other examiners. Per MPEP § 714.12, after-final amendments may be entered "under justifiable circumstances." Consider filing after-final amendments with a clear showing of allowability rather than immediately filing an RCE, as this examiner frequently enters such amendments.

Pre-Appeal Conference Effectiveness

When applicants request a pre-appeal conference (PAC) with this examiner, 66.7% result in withdrawal of the rejection or reopening of prosecution. This success rate is in the 50% percentile among all examiners. Strategic Recommendation: Pre-appeal conferences show above-average effectiveness with this examiner. If you have strong arguments, a PAC request may result in favorable reconsideration.

Appeal Withdrawal and Reconsideration

This examiner withdraws rejections or reopens prosecution in 74.3% of appeals filed. This is in the 59% percentile among all examiners. Of these withdrawals, 43.6% occur early in the appeal process (after Notice of Appeal but before Appeal Brief). Strategic Insight: This examiner shows above-average willingness to reconsider rejections during appeals. The mandatory appeal conference (MPEP § 1207.01) provides an opportunity for reconsideration.

Petition Practice

When applicants file petitions regarding this examiner's actions, 51.9% are granted (fully or in part). This grant rate is in the 64% percentile among all examiners. Strategic Note: Petitions show above-average success regarding this examiner's actions. Petitionable matters include restriction requirements (MPEP § 1002.02(c)(2)) and various procedural issues.

Examiner Cooperation and Flexibility

Examiner's Amendments: This examiner makes examiner's amendments in 3.0% of allowed cases (in the 82% percentile). Per MPEP § 1302.04, examiner's amendments are used to place applications in condition for allowance when only minor changes are needed. This examiner frequently uses this tool compared to other examiners, indicating a cooperative approach to getting applications allowed. Strategic Insight: If you are close to allowance but minor claim amendments are needed, this examiner may be willing to make an examiner's amendment rather than requiring another round of prosecution.

Quayle Actions: This examiner issues Ex Parte Quayle actions in 1.5% of allowed cases (in the 61% percentile). This examiner issues Quayle actions more often than average when claims are allowable but formal matters remain (MPEP § 714.14).

Prosecution Strategy Recommendations

Based on the statistical analysis of this examiner's prosecution patterns, here are tailored strategic recommendations:

  • Consider after-final amendments: This examiner frequently enters after-final amendments. If you can clearly overcome rejections with claim amendments, file an after-final amendment before resorting to an RCE.
  • Examiner cooperation: This examiner frequently makes examiner's amendments to place applications in condition for allowance. If you are close to allowance, the examiner may help finalize the claims.

Relevant MPEP Sections for Prosecution Strategy

  • MPEP § 713.10: Examiner interviews - available before Notice of Allowance or transfer to PTAB
  • MPEP § 714.12: After-final amendments - may be entered "under justifiable circumstances"
  • MPEP § 1002.02(c): Petitionable matters to Technology Center Director
  • MPEP § 1004: Actions requiring primary examiner signature (allowances, final rejections, examiner's answers)
  • MPEP § 1207.01: Appeal conferences - mandatory for all appeals
  • MPEP § 1214.07: Reopening prosecution after appeal

Important Disclaimer

Not Legal Advice: The information provided in this report is for informational purposes only and does not constitute legal advice. You should consult with a qualified patent attorney or agent for advice specific to your situation.

No Guarantees: We do not provide any guarantees as to the accuracy, completeness, or timeliness of the statistics presented above. Patent prosecution statistics are derived from publicly available USPTO data and are subject to data quality limitations, processing errors, and changes in USPTO practices over time.

Limitation of Liability: Under no circumstances will IronCrow AI be liable for any outcome, decision, or action resulting from your reliance on the statistics, analysis, or recommendations presented in this report. Past prosecution patterns do not guarantee future results.

Use at Your Own Risk: While we strive to provide accurate and useful prosecution statistics, you should independently verify any information that is material to your prosecution strategy and use your professional judgment in all patent prosecution matters.