Detailed information about the 100 most recent patent applications.
| Application Number | Title | Filing Date | Disposal Date | Disposition | Time (months) | Office Actions | Restrictions | Interview | Appeal |
|---|---|---|---|---|---|---|---|---|---|
| 13670962 | Graphite Crucible for Silicon Crystal Production and Method of Ingot Removal | November 2012 | February 2016 | Abandon | 39 | 1 | 0 | No | No |
| 13503283 | DEVICE FOR OBTAINING A MULTICRYSTALLINE SEMICONDUCTOR MATERIAL, IN PARTICULAR SILICON, AND METHOD FOR CONTROLLING THE TEMPERATURE THEREIN | August 2012 | December 2015 | Abandon | 43 | 1 | 0 | No | No |
| 13515714 | CRYSTAL GROWING APPARATUS, METHOD FOR MANUFACTURING NITRIDE COMPOUND SEMICONDUCTOR CRYSTAL, AND NITRIDE COMPOUND SEMICONDUCTOR CRYSTAL | June 2012 | October 2015 | Abandon | 40 | 1 | 0 | No | No |
| 13510357 | METHOD AND APPARATUS FOR REMOVING PHOSPHORUS AND BORON FROM POLYSILICON BY CONTINUOUSLY SMELTING | May 2012 | October 2015 | Abandon | 41 | 1 | 0 | No | No |
| 13443965 | Single crystal growth method for vertical high temperature and high pressure group III-V compound | April 2012 | August 2015 | Abandon | 40 | 1 | 0 | No | No |
| 13394982 | SUBLIMATION GROWTH OF SIC SINGLE CRYSTALS | March 2012 | November 2015 | Abandon | 44 | 2 | 0 | Yes | No |
| 12819857 | Solid Hollow Fiber Cooling Crystallization Methods | June 2010 | December 2011 | Abandon | 18 | 1 | 0 | No | No |
| 12503469 | WASHING MACHINE EQUIPPED WITH A RADIATION DRYING UNIT | July 2009 | January 2011 | Abandon | 18 | 1 | 0 | No | No |
| 12345605 | SINGLE WAFER DRYER AND DRYING METHODS | December 2008 | December 2010 | Abandon | 24 | 1 | 0 | No | No |
| 12290326 | Jewelry cleaning unit | October 2008 | October 2011 | Abandon | 36 | 1 | 0 | No | No |
| 12298038 | WASHING MACHINE WITH A DISPENSER UNIT | October 2008 | October 2011 | Abandon | 36 | 1 | 0 | No | No |
| 12245745 | WAFER EDGE CLEANING | October 2008 | October 2010 | Abandon | 25 | 2 | 1 | No | No |
| 12234028 | METHOD OF CONTROLLING DISHWASHER | September 2008 | March 2011 | Abandon | 29 | 2 | 1 | No | No |
| 10574188 | Cleaning Contaminated Materials | September 2008 | October 2010 | Abandon | 55 | 2 | 0 | No | No |
| 12204662 | DISHWASHER | September 2008 | September 2011 | Abandon | 37 | 1 | 0 | No | No |
| 12191476 | REMOVABLE DISHWASHER FILTRATION SYSTEM | August 2008 | December 2011 | Abandon | 40 | 2 | 0 | No | No |
| 12278656 | WATER RECOVERY ASSEMBLY | August 2008 | July 2011 | Abandon | 35 | 1 | 0 | No | No |
| 12135509 | WET PROCESSING APPARATUS AND METHOD FOR DISCHARGING PARTICLES ALONG HORIZONTAL LIQUID FLOW | June 2008 | July 2011 | Abandon | 37 | 1 | 1 | No | No |
| 12131350 | DISHWASHER WITH WATER REPLACEMENT | June 2008 | October 2010 | Abandon | 29 | 2 | 1 | No | No |
| 12114336 | Water Delivery System For Multi-Position Spray Arm Of A Dishwasher | May 2008 | October 2011 | Abandon | 43 | 2 | 0 | Yes | No |
| 11792994 | Cleaning apparatus, cleaning system using cleaning apparatus, cleaning method of substrate-to-be-cleaned | April 2008 | October 2010 | Abandon | 40 | 0 | 1 | No | No |
| 11992754 | Device for Fabricating a Ribbon of Silicon or Other Crystalline Materials and Method of Fabrication | March 2008 | July 2011 | Abandon | 40 | 1 | 0 | No | No |
| 12088386 | METHOD OF INJECTING DOPANT GAS | March 2008 | December 2011 | Abandon | 45 | 2 | 0 | No | No |
| 12053922 | SUBSTRATE TREATING APPARATUS | March 2008 | October 2011 | Abandon | 42 | 2 | 1 | No | No |
| 12054133 | OPTIMIZED LASER PYROLYSIS REACTOR AND METHODS THEREFOR | March 2008 | December 2011 | Abandon | 45 | 1 | 0 | Yes | No |
| 12024152 | Dishwashing Machine With Heating Control | February 2008 | July 2011 | Abandon | 42 | 2 | 1 | Yes | No |
| 11662178 | Laundry Device | January 2008 | August 2011 | Abandon | 53 | 2 | 1 | No | No |
| 11995143 | Method for Wiping a Window, and Wiper System, in Particular for a Motor Vehicle | January 2008 | December 2010 | Abandon | 35 | 1 | 0 | No | No |
| 12005270 | Method for forming a microcrystalline silicon film | December 2007 | January 2012 | Abandon | 49 | 4 | 0 | No | No |
| 11870912 | DEVICE FOR PREPARATION AND DISPENSING OF BEVERAGES, WITH CLEANING DEVICE | October 2007 | January 2011 | Abandon | 39 | 2 | 1 | No | No |
| 11910977 | Semiconductor Wafer Cleaning System | October 2007 | October 2011 | Abandon | 48 | 4 | 0 | No | No |
| 11867916 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD | October 2007 | March 2011 | Abandon | 41 | 2 | 1 | No | No |
| 11896563 | Method for producing silicon single crystal and method for producing silicon wafer | September 2007 | December 2011 | Abandon | 51 | 1 | 1 | No | No |
| 11847656 | METHOD FOR MANUFACTURING A SEMICONDUCTOR SUBSTRATE | August 2007 | January 2012 | Abandon | 52 | 3 | 1 | No | No |
| 11794809 | Substrate Processing Method and Apparatus | July 2007 | November 2010 | Abandon | 41 | 2 | 0 | No | No |
| 11794796 | Plasma cleaning method | July 2007 | December 2010 | Abandon | 42 | 1 | 0 | No | No |
| 11792658 | Method for Cleaning a Workpiece With the Aid of Halogen Ions | June 2007 | October 2010 | Abandon | 40 | 2 | 0 | No | No |
| 11758383 | BRUSH AND METHODS OF CLEANING A BRUSH | June 2007 | March 2011 | Abandon | 45 | 1 | 1 | No | No |
| 11791383 | Dishwashing Machine Equipped with a Sorption Drying Device | May 2007 | June 2012 | Abandon | 60 | 5 | 0 | Yes | Yes |
| 11748654 | SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS | May 2007 | February 2011 | Abandon | 45 | 2 | 1 | No | No |
| 11796989 | Method for removing carbide-based coatings | April 2007 | October 2010 | Abandon | 42 | 2 | 0 | No | No |
| 11741722 | METHODS AND APPARATUS FOR OPERATING AN INKJET PRINTING SYSTEM | April 2007 | December 2010 | Abandon | 44 | 2 | 1 | No | No |
| 11710995 | Cleaning apparatus, cleaning method and product manufacturing method | February 2007 | March 2011 | Abandon | 48 | 3 | 1 | No | No |
| 10555598 | Device and Method for Preventing Foreign Matters from Adhering in Dishwasher | February 2007 | June 2011 | Abandon | 60 | 2 | 1 | No | No |
| 11699300 | Method for cleaning a nebulizer | January 2007 | April 2012 | Abandon | 60 | 2 | 0 | No | Yes |
| 10576983 | Tableware-washing process including a biocide | December 2006 | December 2010 | Abandon | 55 | 2 | 0 | No | No |
| 11639429 | System and method for cleaning a contactor device | December 2006 | March 2011 | Abandon | 51 | 2 | 1 | No | No |
| 11565160 | Hydrogen Peroxide Foam Treatment | November 2006 | November 2010 | Abandon | 48 | 2 | 1 | No | No |
| 11561868 | IN-SITU CHAMBER CLEANING FOR AN RTP CHAMBER | November 2006 | November 2012 | Abandon | 60 | 2 | 0 | No | Yes |
| 11551819 | CLEANING APPARATUS WITH DISPOSABLE ELEMENTS AND METHODS OF CLEANING | October 2006 | October 2010 | Abandon | 47 | 2 | 1 | No | No |
| 11536292 | METHODS TO ACCELERATE PHOTOIMAGEABLE MATERIAL STRIPPING FROM A SUBSTRATE | September 2006 | October 2010 | Abandon | 49 | 3 | 1 | No | No |
| 11519899 | Supercritical CO2 cleaning system and method | September 2006 | October 2010 | Abandon | 49 | 3 | 1 | No | No |
| 11508249 | Crude oil storage and tank maintenance | August 2006 | June 2011 | Abandon | 57 | 2 | 1 | No | No |
| 11507780 | Method and apparatus for cleaning tanks and other containers | August 2006 | June 2011 | Abandon | 58 | 2 | 1 | No | No |
| 11480148 | Substrate processing apparatus and substrate processing method | June 2006 | October 2010 | Abandon | 52 | 1 | 2 | No | No |
| 11400575 | Apparatus and method for cleaning a substrate | April 2006 | December 2010 | Abandon | 56 | 2 | 1 | No | No |
| 11398058 | Single wafer dryer and drying methods | April 2006 | March 2011 | Abandon | 59 | 7 | 0 | No | No |
| 11369590 | Copper deposition chamber having integrated bevel clean with edge bevel removal detection | March 2006 | October 2010 | Abandon | 55 | 3 | 1 | Yes | No |
This analysis examines appeal outcomes and the strategic value of filing appeals for examiner KORNAKOV, MIKHAIL.
With a 0.0% reversal rate, the PTAB affirms the examiner's rejections in the vast majority of cases. This reversal rate is in the bottom 25% across the USPTO, indicating that appeals face significant challenges here.
Filing a Notice of Appeal can sometimes lead to allowance even before the appeal is fully briefed or decided by the PTAB. This occurs when the examiner or their supervisor reconsiders the rejection during the mandatory appeal conference (MPEP § 1207.01) after the appeal is filed.
In this dataset, 0.0% of applications that filed an appeal were subsequently allowed. This appeal filing benefit rate is in the bottom 25% across the USPTO, indicating that filing appeals is less effective here than in most other areas.
⚠ Appeals to PTAB face challenges. Ensure your case has strong merit before committing to full Board review.
⚠ Filing a Notice of Appeal shows limited benefit. Consider other strategies like interviews or amendments before appealing.
Examiner KORNAKOV, MIKHAIL works in Art Unit 1714 and has examined 58 patent applications in our dataset. With an allowance rate of 0.0%, this examiner allows applications at a lower rate than most examiners at the USPTO. Applications typically reach final disposition in approximately 44 months.
Examiner KORNAKOV, MIKHAIL's allowance rate of 0.0% places them in the 0% percentile among all USPTO examiners. This examiner is less likely to allow applications than most examiners at the USPTO.
On average, applications examined by KORNAKOV, MIKHAIL receive 1.91 office actions before reaching final disposition. This places the examiner in the 43% percentile for office actions issued. This examiner issues fewer office actions than average, which may indicate efficient prosecution or a more lenient examination style.
The median time to disposition (half-life) for applications examined by KORNAKOV, MIKHAIL is 44 months. This places the examiner in the 15% percentile for prosecution speed. Applications take longer to reach final disposition with this examiner compared to most others.
Conducting an examiner interview provides a +0.0% benefit to allowance rate for applications examined by KORNAKOV, MIKHAIL. This interview benefit is in the 13% percentile among all examiners. Note: Interviews show limited statistical benefit with this examiner compared to others, though they may still be valuable for clarifying issues.
When applicants file an RCE with this examiner, 0.0% of applications are subsequently allowed. This success rate is in the 0% percentile among all examiners. Strategic Insight: RCEs show lower effectiveness with this examiner compared to others. Consider whether a continuation application might be more strategic, especially if you need to add new matter or significantly broaden claims.
This examiner enters after-final amendments leading to allowance in 0.0% of cases where such amendments are filed. This entry rate is in the 0% percentile among all examiners. Strategic Recommendation: This examiner rarely enters after-final amendments compared to other examiners. You should generally plan to file an RCE or appeal rather than relying on after-final amendment entry. Per MPEP § 714.12, primary examiners have discretion in entering after-final amendments, and this examiner exercises that discretion conservatively.
This examiner withdraws rejections or reopens prosecution in 0.0% of appeals filed. This is in the 0% percentile among all examiners. Strategic Insight: This examiner rarely withdraws rejections during the appeal process compared to other examiners. If you file an appeal, be prepared to fully prosecute it to a PTAB decision. Per MPEP § 1207, the examiner will prepare an Examiner's Answer maintaining the rejections.
When applicants file petitions regarding this examiner's actions, 200.0% are granted (fully or in part). This grant rate is in the 98% percentile among all examiners. Strategic Note: Petitions are frequently granted regarding this examiner's actions compared to other examiners. Per MPEP § 1002.02(c), various examiner actions are petitionable to the Technology Center Director, including prematureness of final rejection, refusal to enter amendments, and requirement for information. If you believe an examiner action is improper, consider filing a petition.
Examiner's Amendments: This examiner makes examiner's amendments in 0.0% of allowed cases (in the 3% percentile). This examiner rarely makes examiner's amendments compared to other examiners. You should expect to make all necessary claim amendments yourself through formal amendment practice.
Based on the statistical analysis of this examiner's prosecution patterns, here are tailored strategic recommendations:
Not Legal Advice: The information provided in this report is for informational purposes only and does not constitute legal advice. You should consult with a qualified patent attorney or agent for advice specific to your situation.
No Guarantees: We do not provide any guarantees as to the accuracy, completeness, or timeliness of the statistics presented above. Patent prosecution statistics are derived from publicly available USPTO data and are subject to data quality limitations, processing errors, and changes in USPTO practices over time.
Limitation of Liability: Under no circumstances will IronCrow AI be liable for any outcome, decision, or action resulting from your reliance on the statistics, analysis, or recommendations presented in this report. Past prosecution patterns do not guarantee future results.
Use at Your Own Risk: While we strive to provide accurate and useful prosecution statistics, you should independently verify any information that is material to your prosecution strategy and use your professional judgment in all patent prosecution matters.