USPTO Examiner BRATLAND JR KENNETH A - Art Unit 1714

Recent Applications

Detailed information about the 100 most recent patent applications.

Application NumberTitleFiling DateDisposal DateDispositionTime (months)Office ActionsRestrictionsInterviewAppeal
18655053Physical vapor transport system comprising a doping capsule with inner and outer crucibles with a capillary channel formed in an inner and outer crucible lidMay 2024December 2025Allow1910NoNo
18601996METHODS FOR CRYSTAL GROWTH BY REPLACING A SUBLIMATED TARGET SOURCE MATERIAL WITH A CANDIDATE SOURCE MATERIALMarch 2024August 2025Allow1710NoNo
18394999Carrier-Assisted Method for Parting Crystalline Material Along Laser Damage RegionDecember 2023July 2025Allow1940NoNo
18492482METHODS OF FORMING SILICON CARBIDE COATED BASE SUBSTRATES AT MULTIPLE TEMPERATURESOctober 2023October 2024Allow1110YesNo
18381565ADVANCED TEMPERATURE CONTROL FOR WAFER CARRIER IN PLASMA PROCESSING CHAMBEROctober 2023December 2024Allow1310NoNo
18380453METHOD FOR PREPARING A P-TYPE ZRCOSB-BASED HALF-HEUSLER SINGLE CRYSTAL ALLOY WITH A CHEMICAL COMPOSITION OF ZRCOSB1-XSNX BY VERTICAL BRIDGMAN DIRECTIONAL CRYSTALLIZATIONOctober 2023February 2026Allow2820NoNo
18373510MANUFACTURING METHOD OF COMPOSITE OXIDE WHICH IS REPRESENTED BY FORMULA LIMPO4, WHERE M MEANS IRON AND MANGANESESeptember 2023December 2025Allow2710NoNo
18372803GAS-PHASE REACTOR SYSTEM-WITH A REACTION CHAMBER, A SOLID PRECURSOR SOURCE VESSEL, A GAS DISTRIBUTION SYSTEM, AND A FLANGE ASSEMBLYSeptember 2023August 2024Allow1110NoNo
18549050SIMULTANEOUS GROWTH OF EPITAXIAL MONOCRYSTALLINE SILICON CARBIDE LAYERS ON FIRST AND SECOND RESPECTIVE SUBSTRATESSeptember 2023February 2026Allow2910NoNo
18548077PROCESS OF AUTOMATIC CRYSTAL BAR COLLECTIONAugust 2023March 2026Abandon3010NoNo
18548087UPPER CYLINDER APPLIED IN SINGLE CRYSTAL FURNACE AND INCLUDING BOSS FOR PLACING COVER PLATE OF DIVERSION CYLINDERAugust 2023November 2025Allow2710NoNo
18546046METHOD FOR CONTROLLING SUPPLY OF SOLID SILICON TO PRELIMINARY CRUCIBLE OF INGOT GROWTH APPARATUSAugust 2023October 2025Allow2610NoNo
18274828CRUCIBLE AND CRUCIBLE ASSEMBLY, FOR PREPARING CATHODE ACTIVE MATERIALJuly 2023September 2025Allow2610NoNo
18274401METHODS OF GROWING LARGE CRYSTALS OF ALL-INORGANIC AND HYBRID ORGANIC-INORGANIC CESIUM LEAD BROMIDE PEROVSKITES FROM SOLUTIONJuly 2023February 2026Allow3111NoNo
18355734QUALITY CONTROL METHOD FOR GROWING SILICON CARBIDE CRYSTALJuly 2023February 2026Allow3111NoNo
18344863Method of performing crystal growth processes on a first crystal seed by adjusting a ratio difference of an axial temperature gradient and a radial temperature gradientJune 2023September 2025Allow2610NoNo
18205532Method for growing halide perovskite nanocrystals through in-situ chemical vapor depositionJune 2023January 2026Abandon3110NoNo
18323775METHODS FOR ADDING A PLURALITY OF DOPANT BATCHES TO AN INGOT PULLER APPARATUSMay 2023February 2026Allow3321NoNo
18323770INGOT PULLER APPARATUS HAVING DOPANT FEEDERS FOR ADDING A PLURALITY OF DOPANT BATCHESMay 2023December 2025Allow3011NoNo
18201023SYSTEMS AND METHODS FOR PULSED BEAM DEPOSITION OF EPITAXIAL CRYSTAL LAYERSMay 2023November 2025Abandon3011NoNo
18037647METHOD FOR MEASURING DISTANCE BETWEEN LOWER END SURFACE OF HEAT SHIELDING MEMBER AND SURFACE OF RAW MATERIAL MELT, METHOD FOR CONTROLLING DISTANCE BETWEEN LOWER END SURFACE OF HEAT SHIELDING MEMBER AND SURFACE OF RAW MATERIAL MELT AND METHOD FOR MANUFACTURING SILICON SINGLE CRYSTALMay 2023December 2025Allow3120YesNo
18139605METHOD FOR PURIFYING A THALLIUM COMPOUND USING A CARBON POWDERApril 2023March 2025Abandon2220NoNo
18123598METHOD FOR PRODUCING A GROUP III NITRIDE SEMICONDUCTOR INCLUDING CONTROLLING SURFACE MODIFICATION WEIGHT RATIOMarch 2023October 2024Abandon1920NoNo
18121823METALORGANIC CHEMICAL VAPOR PHASE DEPOSITION APPARATUS HAVING BUBBLER WITH FIRST SUPPLY SECTION LEADING TO REACTOR, FIRST, SECOND AND THIRD MASS FLOW CONTROLLER AND PRESSURE SENSORMarch 2023October 2025Allow3260YesYes
18181146APPARATUS FOR FORMING SINGLE CRYSTAL PIEZOELECTRIC LAYERS USING LOW-VAPOR PRESSURE METALORGANIC PRECURSORS IN CVD SYSTEMS AND METHODS OF FORMING SINGLE CRYSTAL PIEZOELECTRIC LAYERS USING THE SAMEMarch 2023December 2024Abandon2121NoNo
18177724PREPARATION METHOD OF P-TYPE HIGH-RESISTANCE AND ULTRA-HIGH-RESISTANCE CZOCHRALSKI MONOCRYSTALLINE SILICON SUBSTRATEMarch 2023November 2025Abandon3210NoNo
18022417Method of cleaning a Group III-nitride single crystal substrate comprising cleaning a nitrogen-polar face with a detergent including a fluoroorganic compoundFebruary 2023July 2023Allow500NoNo
18169883Apparatus for growing a SiC single crystal ingot comprising a filter unit having a porous body surrounding an opening unit that is located under a seed crystalFebruary 2023November 2023Allow910NoNo
18040128ANTI-CRACKING SUCTION DEVICE COMPRISING OUTER CYLINDER, INNER CYLINDER, SUCTION TUBE, AND FIRST GAP BETWEEN INNER AND OUTER CYLINDERSJanuary 2023July 2025Allow3010NoNo
18007486METHOD FOR SUPPLEMENTARY DOPING OF MONOCRYSTALLINE SILICON BY LOWERING A DEVICE COMPRISING A CONTAINING MEMBER PROVIDED WITH FIRST AND SECOND THROUGH-HOLESJanuary 2023July 2025Allow3021NoNo
18040077WATER-COOLED SCREEN FOR IMPROVING PULLING RATE OF SILICON CRYSTAL AND MOULD FOR PREPARING THE SAMEJanuary 2023November 2025Abandon3421NoNo
18040114HEAT LEAKAGE PREVENTION DEVICE AND SINGLE CRYSTAL FURNACE SYSTEMJanuary 2023September 2025Allow3210NoNo
18018188QUARTZ GLASS CRUCIBLE FOR GROWING A SINGLE CRYSTAL SILICON INGOT BY A CZOCHRALSKI (CZ) METHODJanuary 2023May 2025Allow2720NoNo
18018165CZ CRUCIBLE WITH A GAP BETWEEN AN INNER QUARTZ CRUCIBLE AND AN OUTER GRAPHITE CRUCIBLEJanuary 2023April 2025Allow2720NoNo
18006810method of forming a halide perovskite crystal by dispersing a halide perovskite material into a solution, forming a metastable intermediate phase, and transitioning to a halide perovskite crystal filmJanuary 2023September 2025Allow3220NoNo
18156885APPARATUS FOR SYNCHRONOUS GROWTH OF SILICON CARBIDE CRYSTALS IN MULTIPLE INDEPENDENT CRUCIBLES ARRANGED LINEARLYJanuary 2023July 2025Allow3021NoNo
18097600Method for preparing a self-supporting substrate from a film base structure comprising a first substrate layer, a first film layer, and a second substrate layerJanuary 2023March 2025Allow2620NoNo
18068980A METHOD FOR SIMULTANEOUSLY MANUFACTURING MORE THAN ONE SINGLE CRYSTAL OF A SEMICONDUCTOR MATERIAL BY PHYSICAL VAPOR TRANSPORTDecember 2022July 2024Allow1910NoNo
18082904Method for Manufacturing Epitaxial Films with Multiple Stress StatesDecember 2022October 2025Abandon3421NoYes
17928391SILICON CARBIDE INGOT MANUFACTURING METHOD, SILICON CARBIDE INGOTS, AND GROWTH SYSTEM THEREFORNovember 2022May 2025Abandon3020NoNo
18071117METHODS FOR PRODUCING 2D MATERIALS BY MOVING FORMING LAYERS DISPOSED ON CARRIERS THROUGH A REACTION CHAMBER OPEN TO THE ATMOSPHERENovember 2022August 2024Allow2110NoNo
17992819METHOD OF SELECTIVELY CONTROLLING NUCLEATION FOR CRYSTALLINE COMPOUND FORMATION BY IRRADIATING A PRECURSOR WITH A PULSED ENERGY SOURCENovember 2022February 2024Allow1520NoNo
18054439Method of preparing a silicon carbide crystal by deposition onto at least a pair of conductive heating elementsNovember 2022February 2025Allow2721NoNo
17919194METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATES AND METHOD FOR SUPPRESSING INTRODUCTION OF DISPLACEMENT TO GROWTH LAYEROctober 2022September 2025Allow3511NoNo
17996091METHOD FOR MANUFACTURING A SEMICONDUCTOR SUBSTRATE AND METHOD FOR SUPPRESSING OCCURRENCE OF CRACKS IN A GROWTH LAYEROctober 2022October 2025Allow3611NoNo
17996184METHOD FOR MANUFACTURING A SEMICONDUCTOR SUBSTRATE BY FORMING A GROWTH LAYER ON AN UNDERLYING SUBSTRATE HAVING THROUGH HOLESOctober 2022June 2025Allow3321NoNo
17995989BISMUTH-SUBSTITUTED RARE EARTH IRON GARNET SINGLE CRYSTAL, FARADAY ROTATOR, OPTICAL ISOLATOR, AND METHOD FOR PRODUCING BISMUTH-SUBSTITUTED RARE EARTH IRON GARNET SINGLE CRYSTALOctober 2022March 2024Allow1800NoNo
17917721METHOD OF MANUFACTURING A BETA-Ga2O3-BASED SINGLE CRYSTAL FILM BY FLOWING A Ga CHLORIDE GAS, AN OXYGEN GAS, AND A DOPANT GASOctober 2022October 2024Allow2420NoNo
17914720Heater In Hot-Zone of Single Crystal Pulling Apparatus and Single Crystal Pulling ApparatusSeptember 2022July 2025Allow3430NoNo
17912437SYSTEM FOR PRODUCING OZONE-INFUSED CRYSTALLINE SOLIDSSeptember 2022November 2025Allow3811NoNo
17897685INGOT PULLER APPARATUS THAT AXIALLY POSITION MAGNETIC POLESAugust 2022October 2025Allow3811NoNo
17907875SINGLE-CRYSTAL PULLING APPARATUS WITH SADDLE-SHAPED SUPERCONDUCTING COILS AND SINGLE-CRYSTAL PULLING METHODAugust 2022July 2024Allow2310NoNo
17897677SYNTHETIC CRUCIBLES WITH RIM COATINGAugust 2022January 2026Allow4151NoNo
17905125METHOD FOR PRODUCING A LAYER OF ALUMINUM NITRIDE (ALN) ON A STRUCTURE OF SILICON OR III-V MATERIALSAugust 2022February 2025Allow3020YesNo
17801198ACTIVE EDGE CONTROL OF A CRYSTALLINE SHEET FORMED ON THE SURFACE OF A MELTAugust 2022July 2025Allow3530NoNo
17886986FILM FORMATION APPARATUS AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICEAugust 2022May 2025Abandon3321YesNo
17819409METHOD OF FORMING MONOCRYSTALLINE NICKEL-TITANIUM FILMS ON SINGLE CRYSTAL SILICON SUBSTRATES USING SEED LAYERSAugust 2022August 2024Allow2411YesNo
17799083GALLIUM NITRIDE VAPOR PHASE EPITAXY APPARATUS USED IN VAPOR PHASE EPITAXY NOT USING ORGANIC METAL AS A GALLIUM RAW MATERIAL AND MANUFACTURING METHOD THEREFORAugust 2022September 2023Allow1310NoNo
17818384METHOD OF DEPOSITING GA2O3 CRYSTAL FILM ACCORDING TO HYDRIDE VAPOR PHASE EPITAXY BY SUPPLYING GACL GAS, OXYGEN, AND HCL GASAugust 2022May 2025Allow3431YesNo
17878794INGOT PULLER APPARATUS HAVING COOLING JACKET DEVICE WITH COOLING FLUID TUBESAugust 2022June 2024Allow2310NoNo
17794039A METHOD FOR PRODUCING A SILICON SINGLE CRYSTAL DOPED WITH NITROGEN AND HAVING A CONTROLLED AMOUNT OF CARBON IMPURITIESJuly 2022May 2024Allow2210NoNo
17790913QUARTZ GLASS CRUCIBLE WITH CRYSTALLIZATION-ACCELERATOR-CONTAINING LAYER HAVING GRADIENT CONCENTRATIONJuly 2022May 2024Allow2210NoNo
17849761STRAINED DIAMOND GROWING AND DOPING METHOD BASED ON CHEMICAL VAPOR DEPOSITION (CVD) METHODJune 2022October 2022Allow400NoNo
17848927Manufacturing apparatus for a group-III nitride crystal comprising a raw material chamber and a nurturing chamber in which a group III-element oxide gas and a nitrogen element-containing gas react to produce a group-III nitride crystal on a seed substrateJune 2022October 2023Allow1601NoNo
17849579METHOD OF PROVIDING A WRINKLE PATTERN OR PRODUCING A SUBSTRATE HAVING A WRINKLE PATTERN OF A SINGLE LAYERJune 2022July 2024Allow2420NoNo
17788568Method for manufacturing monocrystalline silicon by the Czochralski process by pulling a first straight body having a first diameter and a second straight body having a second diameter larger than the first diameterJune 2022February 2025Allow3211NoNo
17846768A MANUFACTURING METHOD FOR A GROUP-III NITRIDE CRYSTAL THAT REQUIRES A FLOW AMOUNT OF A CARRIER GAS SUPPLIED INTO A RAW MATERIAL CHAMBER AT A TEMPERATURE INCREASE STEP SATISFIES TWO RELATIONAL EQUATIONS (I) AND (II)June 2022October 2023Allow1610YesNo
17845837Method for protecting a lunar material within a gemstone by synthetically growing the gemstone onto and around the lunar materialJune 2022September 2025Allow3920YesYes
17844148A METHOD FOR REDUCING LATERAL GROWTH OF GaN CRYSTALS IN AN AMMONOTHERMAL CRYSTAL GROWING PROCESSJune 2022September 2023Allow1510NoNo
17786794Cylinder assembly for improving region of defect-free growth of crystal ingot for single crystal pulling apparatus and single crystal pulling apparatusJune 2022July 2024Allow2510NoNo
17785583Apparatus for manufacturing a single crystal by the Czochralski method comprising a cooling cylinder with an auxiliary cooling cylinder fitted inside the cooling cylinderJune 2022April 2024Allow2210NoNo
17834807METHODS FOR DETERMINING SUITABILITY OF CZOCHRALSKI GROWTH CONDITIONS FOR PRODUCING SUBSTRATES FOR EPITAXYJune 2022December 2024Allow3011NoNo
17776511SUBSTRATE DIRECTED SYNTHESIS OF TRANSITION-METAL DICHALCOGENIDE CRYSTALS WITH TUNABLE DIMENSIONALITY AND OPTICAL PROPERTIESMay 2022December 2024Abandon3111NoNo
17662099Methods for preparing a monolayer or few-layer crystalline black phosphorous film on a two-dimensional surface by focusing a pulsed laser beam on a black phosphorous targetMay 2022October 2023Allow1711NoNo
17661389Method for heating a wide bandgap substrate by providing a resistive heating element which emits radiative heat in a mid-infrared bandApril 2022January 2023Allow901NoNo
17772895Method of producing a silicon single crystal based on concentration profiles of vacancies and interstitial silicon atoms during pulling of a silicon single crystal by the Czochralski processApril 2022January 2025Allow3310YesNo
17771875METHOD FOR MANUFACTURING EPITAXIAL SUBSTRATE BY IRRADIATING A SURFACE OF A GROUP III NITRIDE SEMICONDUCTOR LAYER WITH ULTRAVIOLET LIGHT IN AN ATMOSPHERE CONTAINING OXYGENApril 2022February 2026Allow4531NoNo
17659113APPARATUS FOR DETECTING FACET REGION OF SIC INGOTApril 2022March 2025Abandon3521YesNo
17765476METHOD FOR REDUCING STRUCTURAL DAMAGE TO THE SURFACE OF MONOCRYSTALLINE ALUMINIUM-NITRIDE SUBSTRATES, AND MONOCRYSTALLINE ALUMINIUM-NITRIDE SUBSTRATES THAT CAN BE PRODUCED BY A METHOD OF THIS TYPEMarch 2022March 2026Abandon4740YesNo
17699566METHODS, SYSTEMS, AND APPARATUSES FOR A REACTORMarch 2022June 2023Abandon1410NoNo
17761607Method for providing a GaN single crystal film on a buffer layer on a ScAlMgO4 substrate and performing cooling so that the GaN film is peeled from the ScAlMgO4 substrateMarch 2022February 2024Allow2321NoNo
17640054INHIBITING DRIPPED GRANULAR DOPANT FROM ADHEREING TO A GROWING SILICON SINGLE CRYSTAL BEFORE THE DOPANT MELTSMarch 2022September 2024Allow3020NoNo
17636370Method for producing semiconductor wafers of monocrystalline silicon by pulling a single silicon crystal from a melt contained in a crucible and continually changing the rotational direction of the crucibleFebruary 2022October 2023Allow2000NoNo
17650672METHOD FOR PRODUCING an a- or B-GALLIUM OXIDE CRYSTAL BY BRING AN AQUEOUS SOLUTION INCLUDING GA IONS INTO A SUPERCRITICAL STATEFebruary 2022August 2024Allow3030YesNo
17633096METHOD FOR PRODUCING A SIC SEED CRYSTAL FOR GROWTH OF A SIC INGOT BY HEAT-TREATING IN A MAIN CONTAINER MADE OF A SIC MATERIALFebruary 2022January 2025Allow3611NoNo
17633118Method for producing a SiC substrate via an etching step, growth step, and peeling stepFebruary 2022July 2024Allow2940YesNo
17582613APPARATUS FOR FORMING SINGLE CRYSTAL PIEZOELECTRIC LAYERS USING LOW-VAPOR PRESSURE METALORGANIC PRECURSORS IN CVD REACTORS WITH TEMPERATURE-CONTROLLED INJECTOR COLUMNS AND METHODS OF FORMING SINGLE CRYSTAL PIEZOELECTRIC LAYERS USING THE SAMEJanuary 2022January 2025Abandon3621NoNo
17628745Method for producing a group III compound crystal by hydride vapor phase epitaxy on a seed substrate formed on a group III nitride base substrateJanuary 2022November 2023Allow2211NoNo
17628505Method for Growing Rare Earth Oxide Crystal on a Semiconductor SubstrateJanuary 2022November 2023Allow2220NoNo
17627412SILICON INGOT, SILICON BLOCK, SILICON SUBSTRATE, MANUFACTURING METHOD FOR SILICON INGOT, AND SOLAR CELLJanuary 2022December 2024Abandon3501NoNo
17576784DEPOSITION OF ALPHA-GALLIUM OXIDE THIN FILMSJanuary 2022September 2023Abandon2011NoNo
17573748EPITAXIAL METHODS INCLUDING A HALOBORANE FORMULA FOR GROWING BORON-CONTAINING STRUCTURES HAVING INCREASED BORON CONCENTRATIONSJanuary 2022August 2025Allow4341YesNo
17646062SiC growth apparatus comprised of a base having a plurality of graphite plates having anisotropy of a thermal expansion coefficient and method of manufacturing a SiC crystal using the apparatusDecember 2021March 2023Allow1510NoNo
17562438CRUCIBLE HAVING AN IMPROVED CRYSTAL GROWTH BASE FOR MANUFACTURING SILICON CARBIDE SINGLE CRYSTAL AND METHOD OF USEDecember 2021March 2023Allow1510NoNo
17555680PRODUCTION APPARATUS FOR GALLIUM OXIDE CRYSTAL CAPABLE OF PREVENTING HARMFUL SUBSTANCES FORMED IN FURNACE FROM BEING DIFFUSED TO SURROUNDINGS OF FURNACEDecember 2021July 2023Allow1920NoNo
17555660NANOCOMPOSITE-SEEDED EPITAXIAL GROWTH OF SINGLE-DOMAIN LITHIUM NIOBATE THIN FILMS FOR SURFACE ACOUSTIC WAVE DEVICESDecember 2021April 2023Allow1611NoNo
17552524Kinetic Model for Molecular Beam Epitaxy Growth of III-V Bismide AlloysDecember 2021March 2025Allow3921YesNo
17619064METHOD FOR PRODUCING SILICON SEMICONDUCTOR WAFERS HAVING LOW CONCENTRATIONS OF PINHOLESDecember 2021August 2025Allow4421NoYes
17547730METHOD FOR PREPARING AN OPTICAL ZNS MATERIAL FROM ZINC AND SULFUR RAW MATERIAL SOURCES BY USING A FEEDING DEVICE TO REPLENISH THE SULFUR RAW MATERIAL SOURCEDecember 2021June 2023Allow1811NoNo
17615877ANISOTROPIC EPITAXIAL GROWTH OF SILICON GERMANIUMDecember 2021March 2026Allow5140YesYes

Appeals Overview

This analysis examines appeal outcomes and the strategic value of filing appeals for examiner BRATLAND JR, KENNETH A.

Patent Trial and Appeal Board (PTAB) Decisions

Total PTAB Decisions
34
Examiner Affirmed
22
(64.7%)
Examiner Reversed
12
(35.3%)
Reversal Percentile
56.6%
Higher than average

What This Means

With a 35.3% reversal rate, the PTAB reverses the examiner's rejections in a meaningful percentage of cases. This reversal rate is above the USPTO average, indicating that appeals have better success here than typical.

Strategic Value of Filing an Appeal

Total Appeal Filings
79
Allowed After Appeal Filing
33
(41.8%)
Not Allowed After Appeal Filing
46
(58.2%)
Filing Benefit Percentile
69.6%
Higher than average

Understanding Appeal Filing Strategy

Filing a Notice of Appeal can sometimes lead to allowance even before the appeal is fully briefed or decided by the PTAB. This occurs when the examiner or their supervisor reconsiders the rejection during the mandatory appeal conference (MPEP § 1207.01) after the appeal is filed.

In this dataset, 41.8% of applications that filed an appeal were subsequently allowed. This appeal filing benefit rate is above the USPTO average, suggesting that filing an appeal can be an effective strategy for prompting reconsideration.

Strategic Recommendations

Appeals to PTAB show good success rates. If you have a strong case on the merits, consider fully prosecuting the appeal to a Board decision.

Filing a Notice of Appeal is strategically valuable. The act of filing often prompts favorable reconsideration during the mandatory appeal conference.

Examiner BRATLAND JR, KENNETH A - Prosecution Strategy Guide

Executive Summary

Examiner BRATLAND JR, KENNETH A works in Art Unit 1714 and has examined 827 patent applications in our dataset. With an allowance rate of 54.4%, this examiner allows applications at a lower rate than most examiners at the USPTO. Applications typically reach final disposition in approximately 36 months.

Allowance Patterns

Examiner BRATLAND JR, KENNETH A's allowance rate of 54.4% places them in the 15% percentile among all USPTO examiners. This examiner is less likely to allow applications than most examiners at the USPTO.

Office Action Patterns

On average, applications examined by BRATLAND JR, KENNETH A receive 2.54 office actions before reaching final disposition. This places the examiner in the 74% percentile for office actions issued. This examiner issues a slightly above-average number of office actions.

Prosecution Timeline

The median time to disposition (half-life) for applications examined by BRATLAND JR, KENNETH A is 36 months. This places the examiner in the 35% percentile for prosecution speed. Prosecution timelines are slightly slower than average with this examiner.

Interview Effectiveness

Conducting an examiner interview provides a +19.3% benefit to allowance rate for applications examined by BRATLAND JR, KENNETH A. This interview benefit is in the 62% percentile among all examiners. Recommendation: Interviews provide an above-average benefit with this examiner and are worth considering.

Request for Continued Examination (RCE) Effectiveness

When applicants file an RCE with this examiner, 16.6% of applications are subsequently allowed. This success rate is in the 13% percentile among all examiners. Strategic Insight: RCEs show lower effectiveness with this examiner compared to others. Consider whether a continuation application might be more strategic, especially if you need to add new matter or significantly broaden claims.

After-Final Amendment Practice

This examiner enters after-final amendments leading to allowance in 25.6% of cases where such amendments are filed. This entry rate is in the 35% percentile among all examiners. Strategic Recommendation: This examiner shows below-average receptiveness to after-final amendments. You may need to file an RCE or appeal rather than relying on after-final amendment entry.

Pre-Appeal Conference Effectiveness

When applicants request a pre-appeal conference (PAC) with this examiner, 29.6% result in withdrawal of the rejection or reopening of prosecution. This success rate is in the 31% percentile among all examiners. Note: Pre-appeal conferences show below-average success with this examiner. Consider whether your arguments are strong enough to warrant a PAC request.

Appeal Withdrawal and Reconsideration

This examiner withdraws rejections or reopens prosecution in 57.0% of appeals filed. This is in the 29% percentile among all examiners. Of these withdrawals, 20.0% occur early in the appeal process (after Notice of Appeal but before Appeal Brief). Strategic Insight: This examiner shows below-average willingness to reconsider rejections during appeals. Be prepared to fully prosecute appeals if filed.

Petition Practice

When applicants file petitions regarding this examiner's actions, 49.1% are granted (fully or in part). This grant rate is in the 45% percentile among all examiners. Strategic Note: Petitions show below-average success regarding this examiner's actions. Ensure you have a strong procedural basis before filing.

Examiner Cooperation and Flexibility

Examiner's Amendments: This examiner makes examiner's amendments in 0.2% of allowed cases (in the 54% percentile). This examiner makes examiner's amendments more often than average to place applications in condition for allowance (MPEP § 1302.04).

Quayle Actions: This examiner issues Ex Parte Quayle actions in 4.9% of allowed cases (in the 80% percentile). Per MPEP § 714.14, a Quayle action indicates that all claims are allowable but formal matters remain. This examiner frequently uses Quayle actions compared to other examiners, which is a positive indicator that once substantive issues are resolved, allowance follows quickly.

Prosecution Strategy Recommendations

Based on the statistical analysis of this examiner's prosecution patterns, here are tailored strategic recommendations:

  • Prepare for rigorous examination: With a below-average allowance rate, ensure your application has strong written description and enablement support. Consider filing a continuation if you need to add new matter.

Relevant MPEP Sections for Prosecution Strategy

  • MPEP § 713.10: Examiner interviews - available before Notice of Allowance or transfer to PTAB
  • MPEP § 714.12: After-final amendments - may be entered "under justifiable circumstances"
  • MPEP § 1002.02(c): Petitionable matters to Technology Center Director
  • MPEP § 1004: Actions requiring primary examiner signature (allowances, final rejections, examiner's answers)
  • MPEP § 1207.01: Appeal conferences - mandatory for all appeals
  • MPEP § 1214.07: Reopening prosecution after appeal

Important Disclaimer

Not Legal Advice: The information provided in this report is for informational purposes only and does not constitute legal advice. You should consult with a qualified patent attorney or agent for advice specific to your situation.

No Guarantees: We do not provide any guarantees as to the accuracy, completeness, or timeliness of the statistics presented above. Patent prosecution statistics are derived from publicly available USPTO data and are subject to data quality limitations, processing errors, and changes in USPTO practices over time.

Limitation of Liability: Under no circumstances will IronCrow AI be liable for any outcome, decision, or action resulting from your reliance on the statistics, analysis, or recommendations presented in this report. Past prosecution patterns do not guarantee future results.

Use at Your Own Risk: While we strive to provide accurate and useful prosecution statistics, you should independently verify any information that is material to your prosecution strategy and use your professional judgment in all patent prosecution matters.