Detailed information about the 100 most recent patent applications.
| Application Number | Title | Filing Date | Disposal Date | Disposition | Time (months) | Office Actions | Restrictions | Interview | Appeal |
|---|---|---|---|---|---|---|---|---|---|
| 19290642 | METHODS AND APPARATUS FOR COMPRESSING MATERIAL DURING ADDITIVE MANUFACTURING | August 2025 | December 2025 | Allow | 4 | 0 | 0 | Yes | No |
| 19059174 | METHODS OF FORMING TRANSISTOR INTERCONNECTS ON TOP OF A SEMICONDUCTOR DEVICE SUBSTRATE | February 2025 | February 2026 | Abandon | 12 | 2 | 0 | No | No |
| 18942000 | METHODS OF FORMING TRANSISTOR INTERCONNECTS ON TOP OF A SEMICONDUCTOR DEVICE SUBSTRATE | November 2024 | January 2025 | Allow | 2 | 3 | 0 | No | No |
| 18615744 | MULTI-REGION DIFFUSION BARRIER CONTAINING TITANIUM, SILICON AND NITROGEN | March 2024 | February 2026 | Allow | 22 | 2 | 0 | No | No |
| 18595053 | THIN FILM DEPOSITION APPARATUS | March 2024 | September 2025 | Abandon | 18 | 1 | 0 | No | No |
| 18482560 | ARC REDUCTION AND RF CONTROL FOR ELECTROSTATIC CHUCKS IN SEMICONDUCTOR PROCESSING | October 2023 | March 2026 | Allow | 29 | 1 | 1 | No | No |
| 18238573 | METHOD, ASSEMBLY AND SYSTEM FOR GAS INJECTION AND CONTROL | August 2023 | January 2026 | Allow | 29 | 0 | 0 | Yes | No |
| 18456229 | Semiconductor Processing System, and Control Assembly and Method Thereof | August 2023 | January 2026 | Allow | 29 | 2 | 0 | No | No |
| 18217885 | PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD | July 2023 | January 2026 | Allow | 30 | 1 | 0 | No | No |
| 18324623 | MASK STICK AND MASK ASSEMBLY INCLUDING THE SAME | May 2023 | December 2025 | Allow | 31 | 1 | 0 | Yes | No |
| 18314988 | MASK FRAME ASSEMBLY AND METHOD OF MANUFACTURING THE SAME | May 2023 | December 2025 | Allow | 31 | 1 | 0 | Yes | No |
| 18141909 | SEMICONDUCTOR PROCESS EQUIPMENT | May 2023 | November 2025 | Allow | 31 | 1 | 1 | Yes | No |
| 18141428 | Batch Mode Silicon Carbide Epitaxial Reactor | April 2023 | February 2026 | Allow | 33 | 1 | 0 | Yes | No |
| 18193897 | METHOD OF CONTROLLING PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING APPARATUS | March 2023 | January 2026 | Allow | 34 | 2 | 0 | Yes | No |
| 18125322 | PLASMA PROCESSING APPARATUS | March 2023 | February 2026 | Allow | 35 | 1 | 0 | No | No |
| 18178664 | Ultra High Purity Conditions for Atomic Scale Processing | March 2023 | December 2025 | Allow | 34 | 4 | 1 | Yes | No |
| 18116270 | MPCVD DEVICE CAPABLE OF REALIZING EFFECTIVE DOPING | March 2023 | October 2025 | Allow | 32 | 1 | 0 | No | No |
| 18109178 | ALD DEVICE FOR METALLIC FILM | February 2023 | November 2025 | Allow | 33 | 1 | 0 | No | No |
| 18107558 | FLOW VELOCITY INCREASING DEVICE AND APPARATUS FOR DEPOSITING THIN FILM INCLUDING THE SAME | February 2023 | January 2026 | Allow | 36 | 2 | 0 | Yes | No |
| 18164032 | PLASMA PROCESSING APPARATUS | February 2023 | October 2025 | Allow | 32 | 1 | 0 | Yes | No |
| 18163587 | APPARATUS FOR PROCESSING A SUBSTRATE | February 2023 | December 2025 | Allow | 34 | 1 | 0 | Yes | No |
| 18156102 | SYSTEM AND METHOD FOR AUTO CORRECTION OF SUBSTRATE MISALIGNMENT | January 2023 | March 2026 | Allow | 37 | 1 | 1 | No | No |
| 18095657 | IGNITION CONTROL METHOD, FILM FORMING METHOD, AND FILM FORMING APPARATUS | January 2023 | November 2025 | Allow | 34 | 1 | 0 | Yes | No |
| 18091949 | THIN FILM DEPOSITION APPARATUS HAVING MULTI-STAGE HEATERS AND THIN FILM DEPOSITION METHOD USING THE SAME | December 2022 | January 2026 | Allow | 36 | 1 | 1 | Yes | No |
| 18089388 | COATING INTERIOR SURFACES OF COMPLEX BODIES BY ATOMIC LAYER DEPOSITION | December 2022 | March 2026 | Allow | 39 | 2 | 0 | Yes | No |
| 18003098 | CONFORMAL THERMAL CVD WITH CONTROLLED FILM PROPERTIES AND HIGH DEPOSITION RATE | December 2022 | December 2025 | Allow | 36 | 1 | 0 | No | No |
| 18068692 | SUBSTRATE RETAINER, SUBSTRATE PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | December 2022 | March 2026 | Abandon | 39 | 1 | 1 | No | No |
| 18076788 | ENDPOINT DETECTION METHOD FOR CHAMBER COMPONENT REFURBISHMENT | December 2022 | November 2025 | Allow | 36 | 1 | 1 | No | No |
| 17991379 | BATCH PROCESSING CHAMBERS FOR PLASMA-ENHANCED DEPOSITION | November 2022 | October 2025 | Allow | 35 | 1 | 1 | No | No |
| 17991316 | SOURCE GAS SUPPLY METHOD, SOURCE GAS SUPPLY MECHANISM, AND FILM FORMING SYSTEM | November 2022 | November 2025 | Allow | 36 | 2 | 0 | Yes | No |
| 17968056 | DEUTERIUM-CONTAINING FILMS | October 2022 | January 2026 | Allow | 39 | 2 | 0 | No | No |
| 17968561 | INJECTION MODULE FOR A PROCESS CHAMBER | October 2022 | February 2026 | Allow | 40 | 2 | 1 | Yes | No |
| 17995292 | SEAM MITIGATION AND INTEGRATED LINER FOR GAP FILL | September 2022 | February 2026 | Allow | 40 | 2 | 1 | Yes | No |
| 17954960 | SUBSTRATE PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME | September 2022 | February 2026 | Allow | 41 | 1 | 1 | Yes | No |
| 17951111 | DEPOSITION APPARATUS AND DEPOSITION METHOD USING THE SAME | September 2022 | January 2026 | Abandon | 40 | 4 | 0 | No | No |
| 17801485 | ATOMIZING APPARATUS FOR FILM FORMATION AND FILM FORMING APPARATUS USING THE SAME | August 2022 | January 2026 | Allow | 41 | 2 | 0 | No | No |
| 17875379 | ROLL-TO-ROLL ATOMIC LAYER DEPOSITION APPARATUS | July 2022 | December 2025 | Allow | 41 | 2 | 0 | No | No |
| 17587871 | SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND RECORDING MEDIUM | January 2022 | March 2026 | Allow | 49 | 4 | 1 | Yes | No |
| 17296321 | METHOD FOR AIDING THE MASKING OF WORKPIECE SURFACES TO BE PAINTED OR TREATED | May 2021 | October 2025 | Allow | 53 | 4 | 0 | Yes | No |
| 16067799 | DRAWING DEVICE AND DRAWING METHOD | July 2018 | November 2020 | Allow | 28 | 1 | 1 | No | No |
| 16067461 | BIOPRINTER SPRAY HEAD ASSEMBLY AND BIOPRINTER | June 2018 | October 2020 | Allow | 27 | 1 | 0 | No | No |
| 16021367 | METHODS FOR PRINTING CONDUCTIVE OBJECTS | June 2018 | August 2020 | Allow | 25 | 1 | 0 | No | No |
| 16066820 | COATING PART PRECURSORS | June 2018 | November 2020 | Allow | 29 | 2 | 0 | Yes | No |
| 15841306 | PRODUCTION METHOD FOR CARBON NANOTUBES | December 2017 | March 2019 | Allow | 15 | 1 | 0 | Yes | No |
| 15836920 | PRODUCTION METHOD FOR CARBON NANOTUBES | December 2017 | August 2019 | Allow | 20 | 2 | 0 | Yes | No |
| 15518506 | MULTI-MASK ALIGNMENT SYSTEM AND METHOD | April 2017 | April 2019 | Allow | 24 | 2 | 1 | Yes | No |
| 15467541 | METHODS OF ADDITIVE MANUFACTURING FOR CERAMICS USING MICROWAVES | March 2017 | August 2019 | Allow | 29 | 1 | 0 | Yes | No |
| 15461493 | METHOD FOR MEASURING HEIGHT DIFFERENCE BETWEEN NOZZLE HEADS AND 3D PRINTING APPARATUS USING THE METHOD | March 2017 | October 2019 | Allow | 31 | 2 | 0 | Yes | No |
| 15457443 | FILM FORMATION APPARATUS AND FILM FORMATION METHOD | March 2017 | May 2019 | Allow | 26 | 4 | 1 | Yes | No |
| 15118810 | APPARATUS AND METHOD FOR THIN-FILM PROCESSING APPLICATIONS | August 2016 | April 2018 | Allow | 20 | 1 | 0 | Yes | No |
| 15114242 | FORMING FACSIMILE FORMATION CORE SAMPLES USING THREE-DIMENSIONAL PRINTING | July 2016 | February 2019 | Allow | 30 | 1 | 0 | Yes | No |
| 15188154 | PLASMA CHEMICAL VAPOR DEPOSITION DEVICE | June 2016 | September 2018 | Allow | 27 | 1 | 0 | Yes | No |
| 15131062 | SYSTEM FOR GLASS SHEET SEMICONDUCTOR COATING AND RESULTANT PRODUCT | April 2016 | July 2017 | Allow | 15 | 1 | 0 | No | No |
| 15130675 | VANADIUM-CONTAINING FILM FORMING COMPOSITIONS AND VAPOR DEPOSITION OF VANADIUM-CONTAINING FILMS | April 2016 | February 2017 | Allow | 10 | 0 | 0 | No | No |
| 15130576 | TANTALUM-CONTAINING FILM FORMING COMPOSITIONS AND VAPOR DEPOSITION OF TANTALUM-CONTAINING FILMS | April 2016 | May 2017 | Allow | 13 | 1 | 0 | No | No |
| 15094902 | VAPOR DEPOSITION METHOD AND METHOD FOR PRODUCING AN ORGANIC ELECTROLUMINESCENCE DISPLAY DEVICE | April 2016 | June 2017 | Allow | 14 | 1 | 0 | No | No |
| 14842343 | SURFACING OF ADDITIVELY MANUFACTURED COMPONENTS AND CORRESPONDING MANUFACTURED COMPONENTS OF A TURBOMACHINE | September 2015 | October 2017 | Allow | 26 | 4 | 0 | Yes | No |
| 14764052 | METHOD FOR THE PRODUCTION OF A CURVED CERAMIC SOUND ATTENUATION PANEL | July 2015 | December 2016 | Allow | 17 | 1 | 0 | No | No |
| 14705563 | PRODUCTION OF FIBRE COMPOSITE COMPONENT PART BASED ON ALUMINIUM AND POLYURETHANE | May 2015 | November 2017 | Allow | 31 | 2 | 0 | Yes | No |
| 14689447 | Apparatus For Susceptor Temperature Verification And Methods Of Use | April 2015 | May 2017 | Allow | 25 | 2 | 1 | No | No |
| 14402244 | FILM-FORMING APPARATUS AND FILM-FORMING METHOD | November 2014 | April 2017 | Allow | 29 | 3 | 1 | No | No |
| 14398898 | RADICAL REACTOR WITH INVERTED ORIENTATION | November 2014 | June 2016 | Allow | 19 | 1 | 0 | Yes | No |
| 14457700 | METHODS FOR APPLYING A FOAMABLE REACTION MIXTURE, HIGH PRESSURE DEVICE AND DEVICE FOR PRODUCING SANDWICH COMPOSITE ELEMENTS | August 2014 | March 2016 | Allow | 19 | 0 | 1 | No | No |
| 14453314 | METHOD FOR FORMING MONOLAYER GRAPHENE-BORON NITRIDE HETEROSTRUCTURES | August 2014 | April 2016 | Allow | 20 | 1 | 0 | No | No |
| 14281242 | VAPORIZING UNIT, FILM FORMING APPARATUS, FILM FORMING METHOD, COMPUTER PROGRAM AND STORAGE MEDIUM | May 2014 | February 2016 | Allow | 20 | 1 | 0 | No | No |
| 14217055 | METHODS OF MANUFACTURE OF ENGINEERED MATERIALS AND DEVICES | March 2014 | August 2016 | Allow | 29 | 3 | 0 | Yes | No |
| 14187685 | METHOD AND SYSTEM FOR MANUFACTURING A TARGET FOR THE EMISSION OF PHOTON RADIATION, PARTICULARLY X RAYS, OR OF PARTICLES, PARTICULARLY PROTONS OR ELECTRONS, BY LASER FIRING | February 2014 | June 2015 | Allow | 16 | 0 | 1 | No | No |
| 14124014 | PLASMA DEPOSITION APPARATUS AND PLASMA DEPOSITION METHOD | December 2013 | November 2015 | Allow | 24 | 2 | 1 | No | No |
| 14081464 | GROWTH REACTOR SYSTEMS AND METHODS FOR LOW-TEMPERATURE SYNTHESIS OF NANOWIRES | November 2013 | May 2015 | Allow | 18 | 1 | 0 | No | No |
| 14004894 | VAPOR DEPOSITION PARTICLE EMITTING DEVICE, VAPOR DEPOSITION APPARATUS, VAPOR DEPOSITION METHOD | September 2013 | November 2014 | Allow | 14 | 0 | 0 | No | No |
| 14012424 | MANUFACTURING METHOD OF FUNCTIONAL FILM | August 2013 | January 2015 | Allow | 17 | 1 | 0 | No | No |
| 13666575 | METHOD FOR THE PLASMA-ENHANCED TREATMENT OF INTERNAL SURFACES OF A HOLLOW BODY, FLUID SEPARATOR, AND USE THEREOF | November 2012 | November 2014 | Allow | 24 | 1 | 1 | No | No |
| 13586525 | MANUFACTURING OF DIFFRACTIVE PIGMENTS BY FLUIDIZED BED CHEMICAL VAPOR DEPOSITION | August 2012 | April 2017 | Allow | 56 | 8 | 1 | Yes | No |
| 13584644 | METHODS FOR MANUFACTURING ARCHITECTURAL CONSTRUCTS | August 2012 | May 2014 | Allow | 21 | 1 | 1 | Yes | No |
| 13453321 | METHOD OF FORMING A PROTECTIVE FILM FOR A MAGNETIC RECORDING MEDIUM, A PROTECTIVE FILM FORMED BY THE METHOD AND A MAGNETIC RECORDING MEDIUM HAVING THE PROTECTIVE FILM | April 2012 | June 2014 | Allow | 26 | 5 | 0 | No | No |
| 13428445 | PLASMA VAPOR DEPOSITION SYSTEM AND METHOD FOR MAKING MULTI-JUNCTION SILICON THIN FILM SOLAR CELL MODULES AND PANELS | March 2012 | August 2013 | Allow | 17 | 1 | 0 | No | No |
| 13368265 | COMBINED INJECTION MODULE FOR SEQUENTIALLY INJECTING SOURCE PRECURSOR AND REACTANT PRECURSOR | February 2012 | June 2014 | Allow | 28 | 3 | 1 | Yes | No |
| 13256832 | METHOD AND COMPOSITION FOR DEPOSITING RUTHENIUM WITH ASSISTIVE METAL SPECIES | November 2011 | June 2013 | Allow | 21 | 3 | 0 | Yes | No |
| 13201210 | PROCESS TO DEPOSIT DIAMOND LIKE CARBON AS SURFACE OF A SHAPED OBJECT | November 2011 | October 2015 | Allow | 50 | 4 | 1 | No | No |
| 13251992 | METHODS OF FORMING MATERIAL ON A SUBSTRATE, AND A METHOD OF FORMING A FIELD EFFECT TRANSISTOR GATE OXIDE ON A SUBSTRATE | October 2011 | August 2012 | Allow | 10 | 2 | 0 | No | No |
| 13189644 | BISAMINEAZAALLYLIC LIGANDS AND THEIR USE IN ATOMIC LAYER DEPOSITION METHODS | July 2011 | March 2013 | Allow | 19 | 1 | 0 | Yes | No |
| 13188605 | WAFER PROCESSING METHOD WITH CARRIER HUB REMOVAL | July 2011 | March 2012 | Allow | 8 | 0 | 0 | No | No |
| 13182494 | Preparation of Epitaxial Graphene Surfaces for Atomic Layer Deposition of Dielectrics | July 2011 | May 2013 | Allow | 22 | 1 | 1 | No | No |
| 13178005 | FILM FORMATION METHOD FOR FORMING HAFNIUM OXIDE FILM | July 2011 | July 2013 | Allow | 24 | 1 | 0 | Yes | No |
| 12895678 | METHOD FOR FORMING DIELECTRIC FILM AND METHOD FOR FORMING CAPACITOR IN SEMICONDUCTOR DEVICE USING THE SAME | September 2010 | August 2011 | Allow | 11 | 2 | 0 | No | No |
| 12880615 | FILM DEPOSITION METHOD | September 2010 | August 2013 | Allow | 35 | 1 | 0 | No | No |
| 12855645 | PLASMA DEPOSITION OF AMORPHOUS SEMICONDUCTORS AT MICROWAVE FREQUENCIES | August 2010 | September 2011 | Allow | 13 | 1 | 0 | No | No |
| 12719594 | METHOD FOR APPLYING A THERMAL BARRIER COATING | March 2010 | March 2013 | Allow | 36 | 4 | 0 | Yes | No |
| 12715905 | METHOD OF PRODUCTION OF FLUORINATED CARBON NANOSTRUCTURES | March 2010 | January 2011 | Allow | 11 | 1 | 0 | No | No |
| 12684354 | ELECTROCONDUCTIVE TIN OXIDE HAVING HIGH MOBILITY AND LOW ELECTRON CONCENTRATION | January 2010 | November 2011 | Allow | 22 | 1 | 1 | No | No |
| 12608682 | Synthesis of Higher Diamondoids | October 2009 | October 2012 | Allow | 36 | 1 | 0 | No | No |
| 12572224 | METHOD AND APPARATUS FOR PRECISION SURFACE MODIFICATION IN NANO-IMPRINT LITHOGRAPHY | October 2009 | November 2013 | Allow | 50 | 1 | 1 | No | No |
| 12521604 | METHOD OF CURING METAL ALKOXIDE-CONTAINING FILMS | June 2009 | May 2012 | Allow | 35 | 2 | 0 | Yes | No |
| 12282475 | SEASONING METHOD FOR FILM-FORMING APPARATUS | May 2009 | August 2012 | Allow | 48 | 3 | 0 | No | No |
| 12447615 | METHOD OF FORMING A FILM BY DEPOSITION FROM A PLASMA | April 2009 | August 2012 | Allow | 40 | 3 | 0 | Yes | No |
| 12311184 | VACUUM TREATMENT METHOD | March 2009 | May 2012 | Allow | 38 | 2 | 1 | Yes | No |
| 12316417 | THIN FILM DEPOSITION VIA A SPATIALLY-COORDINATED AND TIME-SYNCHRONIZED PROCESS | December 2008 | January 2012 | Allow | 37 | 2 | 0 | Yes | No |
| 12274984 | PLASMA GENERATING ELECTRODE ASSEMBLY | November 2008 | October 2010 | Allow | 23 | 2 | 0 | No | No |
| 12070389 | PRECURSOR SELECTION METHOD FOR CHEMICAL VAPOR DEPOSITION TECHNIQUES | February 2008 | February 2012 | Allow | 48 | 2 | 0 | Yes | No |
| 12070367 | FABRICATION METHOD OF SIZE-CONTROLLED, SPATIALLY DISTRIBUTED NANOSTRUCTURES BY ATOMIC LAYER DEPOSITION | February 2008 | September 2011 | Allow | 43 | 2 | 0 | No | No |
No appeal data available for this record. This may indicate that no appeals have been filed or decided for applications in this dataset.
Examiner MILLER, JR, JOSEPH ALBERT works in Art Unit 1712 and has examined 76 patent applications in our dataset. With an allowance rate of 100.0%, this examiner allows applications at a higher rate than most examiners at the USPTO. Applications typically reach final disposition in approximately 27 months.
Examiner MILLER, JR, JOSEPH ALBERT's allowance rate of 100.0% places them in the 94% percentile among all USPTO examiners. This examiner is more likely to allow applications than most examiners at the USPTO.
On average, applications examined by MILLER, JR, JOSEPH ALBERT receive 1.91 office actions before reaching final disposition. This places the examiner in the 46% percentile for office actions issued. This examiner issues fewer office actions than average, which may indicate efficient prosecution or a more lenient examination style.
The median time to disposition (half-life) for applications examined by MILLER, JR, JOSEPH ALBERT is 27 months. This places the examiner in the 71% percentile for prosecution speed. Prosecution timelines are slightly faster than average with this examiner.
Conducting an examiner interview provides a +0.0% benefit to allowance rate for applications examined by MILLER, JR, JOSEPH ALBERT. This interview benefit is in the 13% percentile among all examiners. Note: Interviews show limited statistical benefit with this examiner compared to others, though they may still be valuable for clarifying issues.
When applicants file an RCE with this examiner, 32.9% of applications are subsequently allowed. This success rate is in the 70% percentile among all examiners. Strategic Insight: RCEs show above-average effectiveness with this examiner. Consider whether your amendments or new arguments are strong enough to warrant an RCE versus filing a continuation.
This examiner enters after-final amendments leading to allowance in 42.9% of cases where such amendments are filed. This entry rate is in the 65% percentile among all examiners. Strategic Recommendation: This examiner shows above-average receptiveness to after-final amendments. If your amendments clearly overcome the rejections and do not raise new issues, consider filing after-final amendments before resorting to an RCE.
When applicants file petitions regarding this examiner's actions, 25.0% are granted (fully or in part). This grant rate is in the 13% percentile among all examiners. Strategic Note: Petitions are rarely granted regarding this examiner's actions compared to other examiners. Ensure you have a strong procedural basis before filing a petition, as the Technology Center Director typically upholds this examiner's decisions.
Examiner's Amendments: This examiner makes examiner's amendments in 9.2% of allowed cases (in the 93% percentile). Per MPEP § 1302.04, examiner's amendments are used to place applications in condition for allowance when only minor changes are needed. This examiner frequently uses this tool compared to other examiners, indicating a cooperative approach to getting applications allowed. Strategic Insight: If you are close to allowance but minor claim amendments are needed, this examiner may be willing to make an examiner's amendment rather than requiring another round of prosecution.
Quayle Actions: This examiner issues Ex Parte Quayle actions in 5.3% of allowed cases (in the 81% percentile). Per MPEP § 714.14, a Quayle action indicates that all claims are allowable but formal matters remain. This examiner frequently uses Quayle actions compared to other examiners, which is a positive indicator that once substantive issues are resolved, allowance follows quickly.
Based on the statistical analysis of this examiner's prosecution patterns, here are tailored strategic recommendations:
Not Legal Advice: The information provided in this report is for informational purposes only and does not constitute legal advice. You should consult with a qualified patent attorney or agent for advice specific to your situation.
No Guarantees: We do not provide any guarantees as to the accuracy, completeness, or timeliness of the statistics presented above. Patent prosecution statistics are derived from publicly available USPTO data and are subject to data quality limitations, processing errors, and changes in USPTO practices over time.
Limitation of Liability: Under no circumstances will IronCrow AI be liable for any outcome, decision, or action resulting from your reliance on the statistics, analysis, or recommendations presented in this report. Past prosecution patterns do not guarantee future results.
Use at Your Own Risk: While we strive to provide accurate and useful prosecution statistics, you should independently verify any information that is material to your prosecution strategy and use your professional judgment in all patent prosecution matters.